Low-pressure crystallization equipment

Abstract

The utility model relates to the technical field of photovoltaic cells, and discloses a low-pressure devitrification device, which comprises a flash evaporation mechanism, at least one extraction opening and at least one vacuum breaking opening are further formed in the inner wall of a closed cavity, the extraction opening is used for being connected with an external vacuumizing device, and the vacuum breaking opening is used for being connected with an external environment; the carrying table and the heating module are both located in the sealed cavity, a plurality of supporting pieces are further arranged on the upper surface of the carrying table, the upper ends of the supporting pieces are used for bearing a substrate, and the heating module is installed between the substrate and the carrying table. According to the low-pressure crystallization equipment provided by the utility model, the rapid heating technology is integrated in the flash evaporation mechanism, and temperature control can be matched in the low-pressure crystallization process, so that the two processes of low-pressure crystallization and annealing can be continuously carried out, the uncertainty in the intermediate circulation process is reduced, and the production efficiency is improved. It is ensured that annealing of the perovskite can be completed synchronously in the crystallization process, the grain size of the perovskite is increased, the defects of the perovskite are reduced, and the assembly efficiency is improved.

Description

Technical Field

[0001] This utility model relates to the field of photovoltaic cell technology, specifically to low-pressure crystallization equipment. Background Technology

[0002] In related technologies, existing perovskite VCD equipment is mainly used in key steps of the perovskite solar cell manufacturing process, such as solvent evaporation after solution coating and thin film crystallization. These devices typically include components such as vacuum pumps and vacuum piping to control the pressure inside the processing chamber.

[0003] However, in existing mass-produced perovskite VCD equipment, the main optimization focus is on the uniformity and duration of vacuuming, while effective management measures are lacking in temperature control during the crystallization process. Currently, low-pressure crystallization and heating annealing of perovskite are two separate steps. After low-pressure crystallization, the substrate needs to be removed from the crystallization chamber and transferred to an annealing furnace for further processing. This discontinuous operation increases the uncertainty in the intermediate transfer process, which may lead to crystal growth defects and affect the quality of the final product. Utility Model Content

[0004] In view of this, the present invention provides a low-pressure crystallization device to solve the problems of low product quality, high cost and complicated operation in related technologies.

[0005] In a first aspect, this utility model provides a low-pressure crystallization device, comprising:

[0006] The flash evaporation mechanism forms a sealed chamber inside. The inner wall of the sealed chamber is provided with at least one air extraction port and at least one venting port. The air extraction port is used to connect to an external vacuum device and the venting port is used to connect to the external environment.

[0007] The stage and the heating module substrate are both located in the sealed cavity. The upper surface of the stage is also provided with several support members. The upper end of the support members is used to support the substrate. The heating module is installed between the substrate and the stage.

[0008] Beneficial effects: This utility model provides a low-pressure crystallization device. By integrating rapid heating technology inside the flash evaporation mechanism, temperature control can be used in conjunction with the low-pressure crystallization process, enabling the low-pressure crystallization and annealing processes to be carried out continuously. This reduces uncertainties in the intermediate transfer process, ensures that the perovskite annealing can be completed simultaneously during the crystallization process, increases the perovskite grain size, reduces perovskite defects, and improves module efficiency.

[0009] In one optional implementation, the heating module is a resistance heating module or an infrared heating module.

[0010] Beneficial effects: Resistance heating works by passing an electric current through a resistive material (usually a metal or alloy), generating heat due to the resistance, which is then transferred to the object to be heated. Infrared heating, on the other hand, utilizes infrared radiation from the electromagnetic spectrum to directly act on the surface of a material, causing the material to absorb energy and heat up. This method does not require a medium to conduct heat and can directly heat the target.

[0011] In one optional embodiment, a heat diffusion plate is further provided at the upper end of the support member, the heating module is located between the heat diffusion plate and the stage, and the upper surface of the heat diffusion plate is used to place the substrate.

[0012] Beneficial effects: The main function of the heat diffusion plate is to help disperse the heat from the heating module, allowing the heat to be distributed more evenly on the substrate placed on it. Therefore, by using a heat diffusion plate, localized overheating caused by direct heating can be effectively prevented, sensitive materials can be protected from damage, and defects caused by uneven temperature can be reduced.

[0013] In one alternative embodiment, the heat diffusion plate is a graphite plate.

[0014] Beneficial effects: (1) High thermal conductivity: Graphite has excellent thermal conductivity, which can quickly transfer heat from the heating module to the entire substrate surface in a short time, ensuring rapid and uniform heating. (2) High temperature resistance: Graphite materials are stable in high temperature environments and are not easily deformed or damaged, making them suitable for applications that require long-term high-temperature processing. (3) Chemical stability: Graphite has good corrosion resistance to most chemicals and will not react with the surrounding environment in a vacuum or inert gas environment, ensuring long-term reliability.

[0015] In one alternative embodiment, the flash evaporation mechanism includes a flash evaporation chamber and a flash evaporation cover that together define the sealed chamber. The platform is fixed to the inner wall of the flash evaporation cover, and the flash evaporation chamber has an inlet and outlet. The flash evaporation cover is detachably and sealably installed at the inlet and outlet, so that the platform can be moved out of or into the sealed chamber.

[0016] Beneficial effects: By directly mounting the stage onto the inner wall of the flash evaporation chamber, the substrate loading and unloading process is simplified, improving work efficiency. Furthermore, the tight fit between the flash evaporation chamber and the flash chamber ensures excellent chamber sealing during low-pressure crystallization, helping to maintain the required low-pressure environment and improve processing results.

[0017] In one optional embodiment, a first sliding member is provided on the inner wall of the flash chamber, and a second sliding member is provided on the platform. The first sliding member and the second sliding member are slidably engaged so that the platform is slidably connected to the flash chamber.

[0018] Beneficial effects: In this way, during the closing of the flash evaporation cover, the stage smoothly enters the flash evaporation chamber through the sliding engagement between its second sliding member (slide rail) and the first sliding member (slide groove) inside the flash evaporation chamber. After processing, the stage smoothly retracts from the flash evaporation chamber again through the sliding structure between the first and second sliding members, returning to its initial position, so that the processed substrate can be removed.

[0019] In one optional embodiment, the first sliding member is a groove and there are two of them. The two grooves are respectively installed on the inner walls of opposite sides of the flash evaporation chamber. The two grooves are parallel to each other and both extend in the horizontal direction.

[0020] The second sliding member is a slide rail, and there are two of them. The two slide rails are formed on the opposite sides of the platform, and the two slide rails are slidably engaged in the two slide grooves respectively.

[0021] Beneficial effects: The design of the first and second sliding parts makes the loading and unloading of the platform more convenient and smooth, reducing loading and unloading time and improving overall work efficiency. Furthermore, the precise sliding fit ensures the stability and accuracy of the platform during movement, helping to maintain high-quality production process standards.

[0022] In one alternative embodiment, the upper surface of the stage is provided with a plurality of positioning elements for positioning the substrate.

[0023] Beneficial effects: The positioning components can prevent the substrate and heat diffusion plate from moving during vacuuming, heating, etc., especially to avoid sliding or shifting when the stage enters and exits the flash chamber; the main function of the support components is to provide physical support for them by abutting against the lower surface of the heat diffusion plate at their upper end, ensuring stability throughout the process (such as vacuuming, heating, etc.).

[0024] In one alternative embodiment, the low-pressure crystallization apparatus further includes:

[0025] A linear drive mechanism is fixed to the outside of the flash chamber, and the drive part of the linear drive mechanism is connected to the flash cover.

[0026] Beneficial effects: The linear drive mechanism can automatically control the opening and closing of the flash evaporation lid, reducing the need for manual operation and making the entire process smoother and more efficient. Furthermore, the linear drive mechanism allows for precise control of the flash evaporation lid's movement speed and position, ensuring consistency and accuracy in every operation.

[0027] In one optional embodiment, both the exhaust port and the vent are located on the flash chamber, and the flash chamber is also provided with an air inlet for introducing passivating gas into the sealed chamber.

[0028] Beneficial effects: By setting the exhaust port, venting port and air inlet on the same equipment, the low-pressure crystallization and annealing processes are highly integrated, reducing equipment complexity and floor space. Attached Figure Description

[0029] To more clearly illustrate the specific embodiments of this utility model or the technical solutions in the prior art, the drawings used in the description of the specific embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of this utility model. For those skilled in the art, other drawings can be obtained from these drawings without creative effort.

[0030] Figure 1 This is one of the structural schematic diagrams of the internal structure of the flash evaporation mechanism of the low-pressure crystallization equipment according to an embodiment of the present utility model;

[0031] Figure 2 This is the second schematic diagram of the internal structure of the flash evaporation mechanism of the low-pressure crystallization equipment according to an embodiment of this utility model;

[0032] Figure 3 This is a schematic diagram of the flash evaporation mechanism of the low-pressure crystallization equipment according to an embodiment of the present invention when the flash evaporation cover is closed;

[0033] Figure 4 This is a schematic diagram of the flash evaporation mechanism of the low-pressure crystallization equipment according to an embodiment of the present invention when the flash evaporation cover is opened;

[0034] Figure 5 This is one of the structural schematic diagrams of the low-pressure crystallization device according to an embodiment of the present invention when the flash evaporation cover is opened;

[0035] Figure 6 This is the second schematic diagram of the low-pressure crystallization device in this embodiment of the invention when the flash cover is open;

[0036] Figure 7 This is a schematic diagram of the structure of a perovskite solar cell prepared by the low-pressure crystallization device according to an embodiment of the present invention.

[0037] Explanation of reference numerals in the attached figures:

[0038] 1. Top electrode conductive material; 2. Second carrier transport layer; 3. Perovskite absorber layer; 4. First carrier transport layer; 5. TCO substrate conductive layer; 6. Equipment shell; 7. Flash evaporation mechanism; 8. Flash evaporation chamber; 9. Flash evaporation cover; 10. Stage; 11. Heating module; 12. Substrate; 13. Heat diffusion plate; 14. Positioning component; 15. Support component; 16. Cylinder; 17. Guide rod; 18. Guide sleeve; 19. Air inlet; 20. Air extraction port; 21. Vent opening. Detailed Implementation

[0039] To make the objectives, technical solutions, and advantages of the embodiments of this utility model clearer, the technical solutions of the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this utility model, not all embodiments. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the protection scope of this utility model.

[0040] In the description of the embodiments of this utility model, it should be noted that the terms "center," "longitudinal," "lateral," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," and "outer," etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing the embodiments of this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on the embodiments of this utility model. In addition, the terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0041] In the description of the embodiments of this utility model, it should be noted that, unless otherwise explicitly specified and limited, the terms "connected" and "linked" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium. Those skilled in the art can understand the specific meaning of the above terms in the embodiments of this utility model based on the specific circumstances.

[0042] In this embodiment of the utility model, unless otherwise explicitly specified and limited, "above" or "below" the second feature can mean that the first feature is in direct contact with the second feature, or that the first feature is in indirect contact with the second feature through an intermediate medium. Furthermore, "above," "on top of," and "over" the second feature can mean that the first feature is directly above or diagonally above the second feature, or simply that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature can mean that the first feature is directly below or diagonally below the second feature, or simply that the first feature is at a lower horizontal level than the second feature.

[0043] The following describes a low-pressure crystallization device according to this invention. It should be noted that this device can be used for low-pressure crystallization on substrates to prepare thin-film solar cells. This device can serve as a mass-production perovskite VCD (vacuum-cured-dry) device. It should be explained that a perovskite VCD device refers to a vacuum-cured-dry (VCD) device specifically designed for perovskite material processing. This type of equipment is mainly used in key steps of perovskite solar cell manufacturing, such as solvent evaporation after solution coating and thin-film crystallization. For ease of description, the following explanation will use the application of a low-pressure crystallization device to perovskite solar cells as an example, without loss of generality.

[0044] like Figures 1 to 7 As shown, the low-pressure crystallization device according to an embodiment of the present invention includes a flash evaporation mechanism 7, a stage 10, and a heating module 11.

[0045] The flash evaporation mechanism 7 forms a sealed chamber inside. At least one air extraction port 20 and at least one vent 21 are provided on the inner wall of the sealed chamber. The air extraction port 20 is used to connect to an external vacuum device and the vent 21 is used to connect to the external environment.

[0046] The stage 10 and the heating module 11 are both located in a sealed chamber. The upper surface of the stage 10 is also provided with several support members 15. The upper end of the support member 15 is used to support the substrate 12. The heating module 11 is installed between the substrate 12 and the stage 10.

[0047] The main components and their functions of the low-pressure crystallization device according to an embodiment of this utility model are described below:

[0048] The flash evaporation mechanism 7 forms the basic framework of the entire device, creating a sealed chamber inside. The inner wall of this sealed chamber is equipped with at least one extraction port 20 and at least one vent 21. The flash evaporation mechanism 7 connects to an external vacuum device via the extraction port 20, which can rapidly reduce the pressure within the chamber, creating an ideal low-pressure environment. The vent 21 is used to quickly restore the normal gas pressure within the chamber after the process is completed.

[0049] The stage 10 is located within a sealed chamber and supports the heating module 11, the support 15, and the substrate 12. In some embodiments, the stage 10 is designed to allow movement relative to the flash evaporation mechanism 7, facilitating substrate loading and unloading. The heating module 11 is installed between the stage 10 and the substrate 12, responsible for heating the substrate 12. Its main function is to coordinate temperature control during the low-pressure crystallization process and work in conjunction with the passivation gas to ensure the continuous execution of both the low-pressure crystallization and annealing processes. It is understood that the heating module 11 can quickly respond and adjust to the required temperature to meet different process requirements. By precisely controlling the temperature, the heating module 11 helps to promote the evaporation rate of the solvent inside the perovskite wet film, thereby optimizing the crystallization process, while also providing a stable high-temperature environment in subsequent stages to complete the annealing treatment.

[0050] The support member 15 is mounted above the stage 10, and its upper end is used to place the substrate 12 or the heat diffusion plate 13. The position of the support member 15 ensures that the substrate 12 placed on it can effectively receive heat from the heating module 11 and be evenly transferred to the substrate 12. In this way, the support member 15 can ensure that the substrate 12 can be stably and correctly placed in the heating area, thereby ensuring uniform heating.

[0051] Based on the detailed structural description of the low-pressure crystallization equipment described above, the specific working principle of this utility model is as follows: The low-pressure crystallization equipment of this utility model integrates rapid heating technology in the flash evaporation mechanism 7 to achieve temperature control during the low-pressure crystallization process. Combined with the effect of passivating gas, this allows the low-pressure crystallization and annealing processes to be carried out continuously. This method reduces the uncertainty caused by substrate transfer in traditional processes, ensuring that the perovskite material can complete crystallization and annealing under optimal conditions, thereby increasing the perovskite grain size, reducing defects, and improving the efficiency of the final component.

[0052] Furthermore, the specific working process of the low-pressure crystallization device of this utility model is as follows:

[0053] (1) Preparation stage: First, the substrate 12 containing the perovskite wet film is placed on the upper end of the support 15 (a heat diffusion plate 13 can be provided between the substrate 12 and the support 15). The support 15 is located on the stage 10, and the entire setup is located in the sealed chamber formed by the flash evaporation mechanism 7.

[0054] (2) Establish a low-pressure environment: After closing the sealed chamber, connect an external vacuum device through the air extraction port 20 to quickly reduce the pressure inside the chamber to the required low-pressure state in order to promote the evaporation of solvent in the perovskite wet film and the initial crystallization.

[0055] (3) Heating and crystallization proceed simultaneously: Once the predetermined low-pressure state is reached, the heating module 11 is activated to heat the substrate, accelerating the evaporation of the solvent and promoting the crystallization of the perovskite material. During this process, passivating gas can be introduced to further optimize the quality of the perovskite layer.

[0056] (4) Low-pressure crystallization and annealing continuous treatment: After the low-pressure crystallization is completed, the vacuum environment is not interrupted, and the heating temperature is continued to be increased to the annealing temperature required, so that the perovskite material can be annealed at the same time under low pressure. This step helps to eliminate residual stress and improve crystal quality.

[0057] (5) Restoring atmospheric pressure and subsequent processing: After the annealing process is completed, gas is introduced into the chamber through the vent 21 to gradually restore the pressure to normal atmospheric pressure. Then, the device is opened to remove the substrate after low-pressure crystallization and annealing, in preparation for the next process (such as depositing an electron transport layer or a metal electrode layer).

[0058] This design effectively integrates low-pressure crystallization and annealing processes, which not only simplifies the production process but also improves the performance and stability of perovskite solar cells.

[0059] In related technologies, existing perovskite VCD equipment is mainly used in key steps of the perovskite solar cell manufacturing process, such as solvent evaporation after solution coating and thin film crystallization. These devices typically include components such as vacuum pumps and vacuum piping to control the pressure inside the processing chamber.

[0060] However, in existing mass-produced perovskite VCD equipment, the main optimization focus is on the uniformity and duration of vacuuming, while effective management measures are lacking in temperature control during the crystallization process. Currently, low-pressure crystallization and heating annealing of perovskite are two separate steps. After low-pressure crystallization, the substrate needs to be removed from the crystallization chamber and transferred to an annealing furnace for further processing. This discontinuous operation increases the uncertainty in the intermediate transfer process, which may lead to crystal growth defects and affect the quality of the final product.

[0061] Therefore, in order to solve the technical defects existing in the above-mentioned related technologies, this utility model provides a low-pressure crystallization device. By integrating rapid heating technology inside the flash evaporation mechanism 7, temperature control can be used in conjunction with the low-pressure crystallization process, so that the two processes of low-pressure crystallization and annealing can be carried out continuously, reducing the uncertainty in the intermediate transfer process, ensuring that the perovskite annealing can be completed simultaneously during the crystallization process, increasing the grain size of perovskite, reducing perovskite defects, and improving module efficiency.

[0062] Furthermore, the low-pressure crystallization equipment of this invention has at least the following advantages compared with related technologies:

[0063] (1) Process integration and continuity: By integrating rapid heating technology inside the flash evaporation unit 7 and enabling the low-pressure crystallization and annealing processes to be carried out continuously in a closed chamber, this invention reduces the need to transfer the substrate from one device to another in traditional processes. This seamless connection not only simplifies the operation process but also reduces the risk of contamination or physical damage that may be introduced during the transfer process.

[0064] (2) Optimized temperature control: The heating module 11 is located between the substrate 12 and the stage 10, which can precisely control the temperature changes during the processing and ensure that the optimal temperature conditions are maintained throughout the low-pressure crystallization and subsequent annealing process. This helps to promote the optimal crystallization state of the perovskite material, reduce crystal defects, and thus improve the photoelectric conversion efficiency of the final product.

[0065] (3) Improve production efficiency and product quality: Since the low-pressure crystallization and annealing processes can be completed continuously in the same equipment without interrupting the vacuum environment to transfer the substrate, the entire manufacturing cycle is greatly shortened.

[0066] (4) Reduced production costs: The integrated equipment design reduces the need for additional independent annealing equipment, thereby reducing the costs of equipment procurement, maintenance, and floor space. At the same time, it indirectly reduces the unit production cost by improving production efficiency and product yield.

[0067] According to some embodiments of this utility model, the heating module 11 is a resistance heating module or an infrared heating module. It can be understood that resistance heating involves passing an electric current through a resistive material (usually a metal or alloy), generating heat due to the resistance, which is then transferred to the object to be heated. Infrared heating utilizes infrared radiation from the electromagnetic spectrum to directly act on the surface of a material, causing the material to absorb energy and heat up. This method does not require a medium to conduct heat and can directly heat the target.

[0068] For example, the resistance heating module 11 includes a heating element, a support frame, a heat insulation layer, and a temperature sensor. The heating element is typically made of resistance wire or resistance strip, materials with high resistivity that can effectively convert electrical energy into heat energy. The support frame is used to fix the heating element, ensuring its uniform distribution beneath the entire substrate 12 to provide uniform heat distribution. The heat insulation layer is located around the heating element to prevent heat from diffusing into directions where heating is not needed, improving energy utilization efficiency. The temperature sensor is used to monitor the temperature of the heating area in real time and provide feedback to the control system for precise adjustment.

[0069] For example, the infrared heating module 11 includes an infrared lamp or panel, a reflector, a cooling system, a temperature sensor, and a temperature controller. The infrared lamp or panel, as the primary heat source, emits infrared radiation within a specific wavelength range, directly acting on the surface of the substrate 12. The reflector focuses the infrared radiation, ensuring heat is concentrated in the target area and improving heating efficiency. Since the infrared lamp generates a significant amount of heat during operation, a fan or other form of cooling system is required to protect the device from overheating damage. The temperature controller works in conjunction with the temperature sensor to automatically adjust the operating state of the infrared light source according to a set value, maintaining the required temperature conditions.

[0070] like Figure 1 and Figure 2 As shown, according to some embodiments of the present invention, a heat diffusion plate 13 is also provided at the upper end of the support member 15, the heating module 11 is located between the heat diffusion plate 13 and the stage 10, and the upper surface of the heat diffusion plate 13 is used to place the substrate 12.

[0071] It is understood that the main function of the heat diffusion plate 13 is to help disperse the heat from the heating module 11, so that the heat can be distributed more evenly on the substrate 12. Therefore, by using the heat diffusion plate 13, local overheating caused by direct heating can be effectively prevented, sensitive materials can be protected from damage, and defects caused by uneven temperature can be reduced.

[0072] For example, the heat diffusion plate 13 is a graphite plate. The advantages of using a graphite plate as a heat diffusion plate 13 are as follows: (1) High thermal conductivity: Graphite has excellent thermal conductivity and can quickly conduct heat from the heating module 11 to the entire substrate surface in a short time, ensuring rapid and uniform heating. (2) High temperature resistance: Graphite material is stable in high temperature environments and is not prone to deformation or damage, making it suitable for applications requiring long-term high-temperature processing. (3) Chemical stability: Graphite has good corrosion resistance to most chemicals and will not react with the surrounding environment in a vacuum or inert gas environment, ensuring long-term reliability.

[0073] In one specific embodiment, a heating module 11 (which can be a resistance heating module or an infrared heating module 11) is mounted between the stage 10 and the substrate 12, while a graphite plate is positioned above the heating module 11 and immediately below the substrate 12. This arrangement ensures that heat is first transferred to the graphite plate and then uniformly diffused from the graphite plate to the entire substrate 12. This method not only improves heating efficiency but also significantly enhances temperature uniformity and stability, which is beneficial for obtaining high-quality perovskite crystal structures.

[0074] Furthermore, to further optimize thermal management, a temperature monitoring device can be added to the system to monitor and adjust the actual temperature of the graphite plate and substrate in real time, ensuring optimal conditions are maintained throughout the entire processing. This helps improve the performance and consistency of the final product, while also providing greater flexibility and control over the production process.

[0075] like Figure 3 and Figure 4 As shown, according to some embodiments of the present invention, the flash evaporation mechanism 7 includes a flash evaporation box body 8 and a flash evaporation cover body 9 that together define a sealed chamber. The platform 10 is fixed on the inner wall of the flash evaporation cover body 9. The flash evaporation box body 8 is provided with an inlet and outlet. The flash evaporation cover body 9 is opened and closed to seal the inlet and outlet, so that the platform 10 can be moved out or extended into the sealed chamber.

[0076] In this embodiment, the interior of the flash chamber 8 forms a sealed chamber for low-pressure crystallization processing. The inlet and outlet of the flash chamber 8 are used for the entry and exit of the stage 10 and the substrate 12 thereon. A flash cover 9 is closable and covers the inlet and outlet of the flash chamber 8. When closed, it, together with the flash chamber 8, defines a completely sealed chamber; when open, it allows the stage 10 to extend into or out of the sealed chamber through the inlet and outlet. The stage 10 is fixed to the inner wall of the flash cover 9, allowing it to move with the movement of the flash cover 9, thus facilitating the insertion and removal of the substrate 12 into or out of the sealed chamber.

[0077] Specifically, the working mechanism of the flash evaporation mechanism 7 is as follows: First, the flash evaporation cover 9 is in the open state, exposing the inlet and outlet of the flash evaporation chamber 8. At this time, the stage 10 is also in an external position, making it convenient for the operator to place the substrate 12 containing the perovskite wet film on the stage 10. Subsequently, the flash evaporation cover 9 is closed, so that it fits tightly against the inlet and outlet of the flash evaporation chamber 8, forming a completely sealed chamber. During this process, the stage 10 enters the flash evaporation chamber 8 along with the flash evaporation cover 9, ready to begin the low-pressure crystallization treatment.

[0078] Once the sealed chamber is formed, the pressure inside the chamber can be reduced by connecting an external vacuum device through the evacuation port 20, and the heating module 11 can be activated to heat-treat the substrate 12. During this process, the temperature and pressure conditions can be adjusted as needed to promote the optimal crystallization state of the perovskite material. After treatment, heating is stopped and the chamber pressure is restored to normal atmospheric pressure through the vent 21. Then, the flash evaporation cover 9 is opened, allowing the stage 10 and the treated substrate 12 to be removed from the flash evaporation chamber 8, ready for subsequent process steps.

[0079] In this way, by directly mounting the stage 10 on the inner wall of the flash cover 9, the loading and unloading process of the substrate 12 is simplified, and work efficiency is improved. Furthermore, the tight fit between the flash cover 9 and the flash chamber 8 ensures good sealing of the chamber during low-pressure crystallization, helping to maintain the required low-pressure environment and improve processing results.

[0080] In addition, the above design not only solves the inconvenience and potential risks caused by multiple substrate transfers in traditional equipment, but also enhances the functionality and practicality of the entire low-pressure crystallization equipment by optimizing the structural layout.

[0081] According to some embodiments of the present invention, a first sliding member is provided on the inner wall of the flash chamber 8, and a second sliding member is provided on the platform 10. The first sliding member and the second sliding member are slidably engaged so that the platform 10 and the flash chamber 8 can be slidably connected.

[0082] In this embodiment, the first sliding member is disposed on the inner wall of the flash chamber 8, existing in one or more pairs, extending horizontally to ensure that the platform 10 can smoothly enter and exit the flash chamber 8. The second sliding member is installed on the platform 10 and matches the first sliding member. Its design purpose is to form a sliding fit with the first sliding member on the flash chamber 8, so that the platform 10 can smoothly perform linear reciprocating motion within the flash chamber 8.

[0083] Furthermore, the first sliding element can be in the form of a groove, typically two in number, installed on the inner walls of opposite sides of the flash chamber 8. These two grooves are parallel to each other and extend horizontally, providing guidance and support for the platform 10. The second sliding element can be in the form of a rail, installed on the opposite edges of the platform 10. Each rail corresponds to one groove, ensuring that the platform 10 can move smoothly within the flash chamber 8 without shifting or jamming.

[0084] Thus, during the closing of the flash cover 9, the stage 10 smoothly enters the flash chamber 8 through the sliding engagement between its second sliding member (slide rail) and the first sliding member (slide groove) inside the flash chamber 8. After processing, the stage 10 smoothly exits from the flash chamber 8 again through the sliding structure between the first and second sliding members, returning to its initial position, so that the processed substrate 12 can be removed.

[0085] In summary, the design of the first and second sliding parts makes the loading and unloading operation of the platform 10 more convenient and smoother, reducing loading and unloading time and improving overall work efficiency. Furthermore, the precise sliding fit ensures the stability and accuracy of the platform 10 during movement, helping to maintain high-quality production process standards.

[0086] This design not only simplifies the operation process but also enhances the reliability and stability of the equipment, effectively improving the quality and efficiency of perovskite solar cell manufacturing.

[0087] like Figure 3 and Figure 4 As shown, according to some embodiments of the present invention, the upper surface of the platform 10 is provided with a plurality of positioning members 14, which are respectively locked onto the outer edge of the heat diffusion plate 13.

[0088] It is understood that the positioning component 14 can achieve the functions of fixing and alignment. That is, on the one hand, the positioning component 14 can prevent the substrate 12 and the heat diffusion plate 13 from moving during vacuuming, heating and other processes, especially to avoid sliding or shifting when the stage 10 enters and exits the flash chamber 8. On the other hand, the positioning component 14 can ensure that the substrate 12 and the heat diffusion plate 13 are placed in the same position every time, which helps to improve process repeatability and product consistency.

[0089] In some specific embodiments, the positioning element 14 can be different forms of physical constraint devices, such as protrusions, grooves, clamps, etc. In this case, the positioning element is designed to match the shape of the heat diffusion plate 13 to achieve a stable locking effect. In order to cooperate with the positioning element 14, the outer edge of the heat diffusion plate 13 also needs to be specially designed, such as setting corresponding notches or edge shapes, so as to better mate with the positioning element 14.

[0090] For example, multiple small protrusions (positioning pins) are arranged around the upper surface of the stage 10, and the position and spacing of these protrusions correspond to the holes or notches on the outer edge of the heat diffusion plate 13. When the heat diffusion plate 13 is placed on the stage 10, the holes or notches on its outer edge fit precisely onto these protrusions, thereby achieving precise positioning and fixation.

[0091] For example, the upper surface of the stage 10 is designed with grooves whose shape matches the bottom contour of the heat diffusion plate 13. The heat diffusion plate 13 is placed directly in the corresponding grooves, and its lateral movement is restricted by a tight fit, ensuring that it is accurately placed in the same position each time.

[0092] For example, adjustable clamps are installed on both sides of the stage 10. Once the heat diffusion plates 13 are in place, they can be securely fixed to the stage 10 by tightening the clamps. This method provides greater flexibility and is suitable for heat diffusion plates 13 of different sizes or shapes.

[0093] like Figure 3 and Figure 4 As shown, according to some embodiments of the present invention, the upper surface of the platform 10 is also provided with a plurality of support members 15, the upper ends of the support members 15 abutting against the lower surface of the heat diffusion plate 13.

[0094] In this embodiment, the main function of the support member 15 is to provide physical support by abutting its upper end against the lower surface of the heat diffusion plate 13, ensuring stability throughout the entire process (such as vacuuming, heating, etc.). For some thinner or larger heat diffusion plates 13, the support member 15 can effectively distribute the weight load and reduce the risk of deformation caused by uneven local stress.

[0095] In this way, by rationally arranging the support components 15, the overall performance of the equipment can be significantly improved, ensuring efficient and stable operation under various operating conditions.

[0096] For example, multiple small cylindrical support members 15 are evenly distributed on the upper surface of the stage 10. They are of the same height and slightly lower than the height of the positioning member 14 to ensure that the heat diffusion plate 13 can be placed stably on it. These cylindrical support members 15 can be directly fixed to the stage 10, or they can be designed to be height-adjustable to accommodate heat diffusion plates 13 of different thicknesses.

[0097] For example, the platform 10 has several slender support strips arranged along its length and in contact with the lower surface of the heat diffusion plate 13. The strip-shaped support members 15 can provide a wider support area, suitable for larger heat diffusion plates 13, and ensure more uniform overall stress distribution.

[0098] For example, the device can use a support member 15 made of a material with a certain degree of elasticity, such as a rubber or spring support member 15, which can automatically adjust the support force according to the actual weight of the heat diffusion plate 13. The elastic support member 15 can buffer external vibrations or impacts to a certain extent, protecting sensitive materials from damage.

[0099] like Figure 3 and Figure 4 As shown, according to some embodiments of the present invention, the low-pressure crystallization equipment further includes a linear drive mechanism, which is fixed on the outside of the flash chamber 8, and the drive part of the linear drive mechanism is connected to the flash cover 9 for transmission.

[0100] In this embodiment, the linear drive mechanism can be a cylinder 16 or a motor as the drive source. Taking a motor as an example, the linear drive mechanism includes components such as a motor, a lead screw, and a guide rail. The motor provides power, and the lead screw converts the rotational motion into linear motion, while the guide rail ensures the straightness and stability of the motion. The drive unit refers to the part of the linear drive mechanism directly connected to the flash cover 9, responsible for transmitting the driving force so that the flash cover 9 can open and close along a predetermined trajectory. The drive unit of the linear drive mechanism and the flash cover 9 are connected by an appropriate mechanical connection method (such as a connecting rod, hinge, etc.) to ensure effective force transmission and smooth movement of the cover.

[0101] In this way, the linear drive mechanism can automatically control the opening and closing of the flash cover 9, reducing the need for manual operation and making the entire process smoother and more efficient. Furthermore, the linear drive mechanism allows for precise control of the movement speed and position of the flash cover 9, ensuring consistency and accuracy in every operation.

[0102] like Figure 3 and Figure 4 As shown, according to some embodiments of the present invention, both the exhaust port 20 and the vent 21 are provided on the flash evaporation chamber 8, and the flash evaporation chamber 8 is also provided with an air inlet 19 for introducing passivating gas into the sealed chamber.

[0103] It is understandable that, in addition to the exhaust port 20 and the vent 21, the flash chamber 8 also has a dedicated air inlet 19 for introducing passivating gas into the sealed chamber. The role of the passivating gas is to assist in the crystallization of materials during low-pressure crystallization, and it can further improve the quality of the perovskite layer, reduce surface defects, and improve battery performance during annealing.

[0104] In this way, by setting the exhaust port 20, the venting port 21 and the air inlet 19 on the same equipment, the low-pressure crystallization and annealing processes are highly integrated, reducing the complexity of the equipment and the floor space required.

[0105] The following diagram illustrates a low-pressure crystallization apparatus for perovskite solar cells.

[0106] like Figure 5 and Figure 6 As shown, the low-pressure crystallization equipment includes a main unit and an HMI (Human Machine Interface) control interface. The main unit includes a housing 6 and essential components such as a vacuum pump, flash evaporation mechanism 7, vacuum lines, and vacuum breaking lines installed within the housing 6. The HMI control interface is installed on the outside of the housing 6, enabling overall control of the VCD equipment and recording its operating parameters.

[0107] Inside the main body of the equipment, a vacuum pump is connected to the evacuation port 20 on the flash evaporation mechanism 7 via a vacuum pipeline for rapid vacuuming, reducing the vacuum level inside the sealed chamber and removing organic gases from the perovskite wet film. A vacuum valve is installed at the evacuation port 20 to control the opening and closing of the vacuum pipeline, reducing the pressure inside the sealed chamber from atmospheric to vacuum. The main body of the equipment also houses a control unit, including an electrical control system and a control system, which work in conjunction with the HMI control interface to provide complete control of the equipment. An evacuation valve is installed at the evacuation port 21 on the flash evaporation mechanism 7. This evacuation valve includes a first evacuation valve and a second evacuation valve located downstream of the first evacuation valve. The first evacuation valve is used for the first stage of slow evacuation to prevent substrate 12 displacement; the second evacuation valve is used for the second stage of rapid evacuation to accelerate the transition from vacuum to atmospheric pressure in the flash evaporation chamber 8.

[0108] like Figure 3 and Figure 4 As shown, the flash evaporation mechanism 7 includes a flash evaporation chamber 8, a flash evaporation cover 9, a platform 10, a heating module, and a substrate 12. The flash evaporation cover 9 is closable and covers the inlet and outlet of the flash evaporation chamber 8. The end of the platform 10 is fixed to the inner wall of the flash evaporation cover 9, and the left and right sides of the platform 10 form slide rails respectively. The left and right sides of the inner wall of the flash evaporation chamber 8 form grooves respectively. The grooves and slide rails are parallel to the horizontal direction.

[0109] like Figure 3 and Figure 4 As shown, two sets of linear drive mechanisms are fixed on the outer walls of the left and right sides of the flash chamber 8, respectively. The driving parts of the two sets of linear drive mechanisms are respectively connected to the left and right ends of the flash cover 9. The linear drive mechanism includes a cylinder 16 and a linear motion guide assembly. The cylinder body of the cylinder 16 is fixed on the flash chamber 8 and its driving end is fixed on the flash cover 9. The linear motion guide assembly includes a guide rod 17 and a guide sleeve 18. The guide sleeve 18 is fixed on the flash chamber 8, and the end of the guide rod 17 is fixed on the flash cover 9. The guide rod 17 is telescopically fitted inside the guide sleeve 18.

[0110] like Figure 1 and Figure 2 As shown, in the sealed chamber, the substrate 12, graphite plate, heating module 11, and stage 10 are stacked sequentially from top to bottom. The stage 10 has four sets of positioning members 14, each set including two positioning posts that are locked onto one outer edge of the graphite plate. The stage 10 also has a support member 15, which includes four support rods, the tops of which are respectively installed at the four corners of the graphite plate. The flash chamber 8 also has an inlet 19 for introducing passivating gas into the sealed chamber.

[0111] Figure 7The diagram shows the specific structure of the perovskite solar cell prepared using the device of this invention. From top to bottom, the cell consists of a top electrode conductive material 1, a second carrier transport layer 2, a perovskite absorber layer 3, a first carrier transport layer 4, and a TCO substrate conductive layer 5.

[0112] Specifically, the fabrication process of the perovskite solar cell is as follows: A bottom electrode layer is formed on the conductive layer 5 of the TCO substrate, and the bottom electrode layer is etched by P1 laser. The first carrier transport layer 4 and the perovskite absorber layer 3 are then deposited sequentially. The substrate with the deposited perovskite absorber layer 3 is subjected to VCD and annealing processes to prepare a 20nm nickel oxide layer on a 10cm*10cm FTO glass substrate. Then, 35μL of a perovskite precursor solution is coated onto the nickel oxide layer to obtain a substrate 12 covered with a perovskite wet film. After VCD and annealing, a 30nm C60 electron transport layer and an 80nm thick copper cell layer are sequentially prepared on the perovskite layer to obtain the perovskite solar cell. The specific process of VCD process and annealing is as follows: The substrate 12 containing the perovskite wet film is placed on the stage 10, the VCD cabinet is sealed, and the solvent is removed by evacuation. At the same time, the heating module 11 is heated to increase the solvent evaporation rate. After the low-pressure crystallization process is completed, the vacuum state is maintained, and the heating temperature is increased to the annealing temperature until the annealing is completed.

[0113] Furthermore, based on the above-described equipment and process flow of this utility model, two specific embodiments are given below:

[0114] Example 1: The substrate 12 is placed on a graphite plate. The infrared heating module 11 is first set to 25% of its power, and the vacuum pump is used to evacuate the sealed chamber for 1 minute. Then, the vacuum pump is maintained in the vacuum state, and the infrared power is increased to 75% and maintained for 10 minutes. After that, the heating is turned off, the flash evaporation mechanism 7 is evacuated, and CDA is continuously introduced to cool the substrate 12 and the graphite plate. A 30nm C60 electron transport layer and an 80nm thick copper battery layer are sequentially prepared on the perovskite layer to obtain a perovskite battery.

[0115] Example 2: The substrate 12 is placed on a graphite plate. The infrared heating module 11 is first set to 20% of its power, and the vacuum chamber is evacuated for 1 minute using a vacuum pump. Then, the vacuum pump is maintained, and the infrared power is increased to 75% and maintained for 8 minutes. After maintaining the infrared power at 75%, CH3F gas is introduced to 50 Pa and maintained for 2 minutes. The heating is then turned off, and the vacuum is restored to -1 Pa. CDA is then introduced to 800 Pa. This cycle is repeated 5 times. The flash evaporation mechanism 7 is then ventilated, and CDA is continuously introduced to cool the substrate 12 and the graphite plate. A 30 nm C60 electron transport layer and an 80 nm thick copper battery layer are sequentially prepared on the perovskite layer to obtain a perovskite battery.

[0116] In addition, a comparative example of a device based on related technologies is given below:

[0117] Comparative Example 1: A substrate coated with perovskite solution was vacuumed to 130 Pa using a VCD process for 3 seconds and maintained at vacuum for 30-40 seconds. The substrate was then transferred to an annealing furnace. Preheating was set at 70℃ for 1 minute, and the curing stage was set at 130℃ for 13 minutes. After the substrate cooled, a 30 nm C60 electron transport layer and an 80 nm thick copper cell layer were sequentially fabricated on the perovskite layer to obtain a perovskite cell.

[0118] Based on the two embodiments and comparative examples above, the battery parameters were obtained through experiments, as shown in Table 1 below:

[0119] Table 1

[0120] Voltage / V Current / A Fill factor efficiency / % Example 1 14.32 1.78 76.58 19.52 Example 2 14.55 1.79 77.35 20.14 Comparative Example 1 14.21 1.67 73.49 17.44

[0121] As shown in Table 1, it is clear that, under the same conditions, the conversion efficiency of the perovskite solar cell prepared by the device of this invention is significantly higher than that of the perovskite solar cell prepared by the device in the related technology.

[0122] Although embodiments of the present invention have been described in conjunction with the accompanying drawings, those skilled in the art can make various modifications and variations without departing from the spirit and scope of the present invention, and such modifications and variations all fall within the scope defined by the appended claims.

Claims

1. A low-pressure crystallization device, characterized in that, include: The flash evaporation mechanism (7) forms a closed chamber inside. The inner wall of the closed chamber is provided with at least one air extraction port (20) and at least one venting port (21). The air extraction port (20) is used to connect to an external vacuum device and the venting port (21) is used to connect to the external environment. The stage (10) and the heating module (11) are both located in the sealed cavity. The upper surface of the stage (10) is also provided with several support members (15). The upper end of the support member (15) is used to support the substrate (12). The heating module (11) is installed between the substrate (12) and the stage (10).

2. The low-pressure crystallization equipment according to claim 1, characterized in that, The heating module (11) is a resistance heating module (11) or an infrared heating module (11).

3. The low-pressure crystallization equipment according to claim 1, characterized in that, The upper end of the support member (15) is also provided with a heat diffusion plate (13), the heating module (11) is located between the heat diffusion plate (13) and the stage (10), and the upper surface of the heat diffusion plate (13) is used to place the substrate (12).

4. The low-pressure crystallization equipment according to claim 3, characterized in that, The heat diffusion plate (13) is a graphite plate.

5. The low-pressure crystallization apparatus according to any one of claims 1 to 4, characterized in that, The flash evaporation mechanism (7) includes a flash evaporation chamber (8) and a flash evaporation cover (9) that together define the sealed chamber. The platform (10) is fixed on the inner wall of the flash evaporation cover (9). The flash evaporation chamber (8) is provided with an inlet and an outlet. The flash evaporation cover (9) is opened and closed to seal the inlet and outlet so that the platform (10) can be moved out of or into the sealed chamber.

6. The low-pressure crystallization apparatus according to claim 5, characterized in that, The inner wall of the flash evaporation chamber (8) is provided with a first sliding member, and the platform (10) is provided with a second sliding member. The first sliding member and the second sliding member are slidably engaged so that the platform (10) and the flash evaporation chamber (8) can be slidably connected.

7. The low-pressure crystallization apparatus according to claim 6, characterized in that, The first sliding member is a sliding groove and there are two of them. The two sliding grooves are respectively installed on the inner walls of opposite sides of the flash evaporation chamber (8). The two sliding grooves are parallel to each other and both extend in the horizontal direction. The second sliding member is a slide rail and there are two of them. The two slide rails are formed on the opposite sides of the platform (10). The two slide rails are slidably fitted into the two slide grooves respectively.

8. The low-pressure crystallization apparatus according to claim 5, characterized in that, The upper surface of the stage (10) is provided with a plurality of positioning elements (14) for positioning the substrate (12).

9. The low-pressure crystallization apparatus according to claim 5, characterized in that, Also includes: A linear drive mechanism is fixed on the outside of the flash chamber (8), and the drive part of the linear drive mechanism is connected to the flash cover (9) for transmission.

10. The low-pressure crystallization apparatus according to claim 5, characterized in that, The air extraction port (20) and the air vent (21) are both located on the flash evaporation chamber (8), and the flash evaporation chamber (8) is also provided with an air inlet (19) for introducing passivating gas into the sealed chamber.

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