Quantitative supply device
By designing a quantitative supply device and utilizing a combination of pressure sensor and stirring rod, the problem of uneven supply of polishing slurry to the elastic abrasive blocks was solved, achieving quantitative and uniform supply of polishing slurry and improving polishing quality and efficiency.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- FOSHAN KENIOBIUM TECHNOLOGY CO LTD
- Filing Date
- 2025-02-17
- Publication Date
- 2026-05-15
AI Technical Summary
Existing elastic abrasive polishing slurry supply devices lack a quantitative addition function, resulting in excessively high slurry concentration, abrasive particle accumulation and agglomeration, and uneven polishing.
A quantitative supply device is designed, comprising a polishing slurry storage tank, a support box, a pressure sensor, a metering tank, a liquid pump, and a stirring rod. The weight of the polishing slurry is measured by the pressure sensor, the stirring rod is driven by a motor to stir evenly, and the liquid pump controls the quantitative supply to prevent excessive addition and accumulation.
This achieves a quantitative supply of polishing fluid, preventing excessive concentration, avoiding abrasive particle accumulation, and ensuring polishing uniformity and production efficiency.
Smart Images

Figure CN224239245U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of quantitative supply technology, specifically a quantitative supply device. Background Technology
[0002] In the production of elastic abrasive blocks, the use of polishing slurry is a crucial step. Polishing slurry not only helps improve the surface finish of the abrasive blocks but also enhances their performance and lifespan. Polishing slurry typically contains a variety of components such as abrasives, dispersants, and surfactants. In the production of elastic abrasive blocks, polishing slurry suitable for polishing elastic materials such as polyurethane should be selected to ensure the smoothness and finish of the abrasive block surface. The polishing slurry is evenly applied to the surface of the elastic abrasive block, and then polishing is performed using polishing equipment (such as polishing machines, grinding machines, etc.). In the production process of elastic abrasive blocks, the quantitative supply of polishing slurry is a key link to ensure polishing quality and production efficiency. However, the existing supply of polishing slurry for elastic abrasive blocks does not have the function of quantitative addition. Excessive addition of polishing slurry can easily lead to an excessively high concentration of polishing slurry, which increases the number of abrasive grains per unit volume. During polishing, abrasive grains are prone to accumulation and agglomeration, resulting in uneven polishing. Utility Model Content
[0003] The purpose of this invention is to provide a quantitative supply device to solve the problem mentioned in the background art that the supply of existing elastic grinding block polishing liquid does not have the function of quantitative addition. Excessive addition of polishing liquid can easily lead to an increase in the number of abrasive particles per unit volume when the concentration of polishing liquid is too high. During polishing, abrasive particles are prone to accumulation and agglomeration, resulting in uneven polishing.
[0004] To achieve the above objectives, this utility model provides the following technical solution: a quantitative supply device, comprising:
[0005] Polishing fluid storage tank;
[0006] A support box is installed on one side of the polishing fluid storage tank;
[0007] The pressure sensor is installed inside the support box;
[0008] A metering container is slidably disposed inside the support box, and the bottom of the metering container is connected to a pressure sensor;
[0009] A through-hole is located at the top of the metering tank;
[0010] The No. 1 liquid pump is installed on one side of the support box;
[0011] The outlet pipe is located on one side of the polishing liquid storage tank, and the input end of the No. 1 liquid pump is connected to the outlet pipe through a pipeline.
[0012] The inlet pipe is installed at the output end of the No. 1 liquid pump. The inlet pipe is fixedly connected to the support box and is located inside the through hole.
[0013] A liquid extraction pipe is installed on one side of the metering tank, and a movable port is opened on one side of the support box. The liquid extraction pipe is movably connected to the movable port.
[0014] As a preferred embodiment of this utility model, it further includes a supporting top frame, which is fixedly connected to the top of the polishing liquid storage tank. A motor is installed on the top of the supporting top frame. A stirring rod is rotatably arranged inside the polishing liquid storage tank. The output end of the motor is fixedly connected to the stirring rod. An inner supporting frame is fixedly connected to the inner side of the polishing liquid storage tank. The bottom end of the stirring rod is rotatably connected to the inner supporting frame. The stirring rod is rotatably connected to the supporting top frame.
[0015] As a preferred embodiment of this utility model: the outer side of the metering tank is fixedly connected with a limiting slider at equal intervals, the inner side of the support box is provided with a limiting groove at equal intervals, and the limiting slider is slidably connected to the limiting groove.
[0016] As a preferred embodiment of this utility model: a support frame is provided on one side of the support box, a second liquid pump is installed on the top of the support frame, the input end of the second liquid pump is fixedly connected to the liquid extraction pipe, and the output end of the second liquid pump is connected to a spray head through a liquid pipe.
[0017] As a preferred embodiment of this utility model, a feed pipe is fixedly connected to one side of the polishing liquid storage tank.
[0018] As a preferred embodiment of this utility model, an electrically controlled valve is installed on the liquid inlet pipe.
[0019] Compared with the prior art, the beneficial effects of this utility model are as follows: By setting up a metering tank and a pressure sensor, this utility model enables the pressure sensor to measure the weight of the polishing liquid added in the metering tank and control the amount of polishing liquid added, preventing excessive supply of polishing liquid in a single operation and causing the polishing liquid concentration to be too high. By setting up a motor, a stirring rod and a supporting inner frame, the output end of the motor drives the stirring rod to rotate, and the stirring rod stirs the polishing liquid stored in the polishing liquid storage tank, preventing the polishing liquid from becoming uneven when stored in the polishing liquid storage tank for a long time. Attached Figure Description
[0020] Figure 1 This is a schematic diagram of the overall structure of this utility model;
[0021] Figure 2 This is a schematic diagram of the internal structure of the limiting groove of this utility model;
[0022] Figure 3This is a schematic diagram of the internal structure of the support box of this utility model;
[0023] Figure 4 This is a schematic diagram of the internal structure of the polishing liquid storage tank of this utility model.
[0024] In the diagram: 1. Polishing fluid storage tank; 2. Support box; 3. No. 1 liquid pump; 4. Movable port; 5. Metering tank; 6. Suction pipe; 7. Through hole; 8. Inlet pipe; 9. Electrically controlled valve; 10. Limiting slider; 11. Limiting groove; 12. Support frame; 13. No. 2 liquid pump; 14. Spray head; 15. Support top frame; 16. Motor; 17. Stirring rod; 18. Inner support frame; 19. Feed pipe; 20. Outlet pipe; 21. Pressure sensor. Detailed Implementation
[0025] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.
[0026] Please see Figures 1 to 4 This utility model provides a technical solution: a quantitative supply device, comprising: a polishing liquid storage tank 1, a support box 2, a primary pump 3, a quantitative tank 5, a suction pipe 6, a through hole 7, an inlet pipe 8, an outlet pipe 20, and a pressure sensor 21. The support box 2 is disposed on one side of the polishing liquid storage tank 1; the pressure sensor 21 is installed inside the support box 2; the quantitative tank 5 is slidably disposed inside the support box 2, and its bottom is connected to the pressure sensor 21; the through hole 7 is opened at the top of the quantitative tank 5; the primary pump 3 is installed on one side of the support box 2; the outlet pipe 20 is fixedly connected to one side of the polishing liquid storage tank 1, and the input end of the primary pump 3 is connected to the outlet pipe 20 via a pipe; the inlet pipe 8 is fixedly connected to the output end of the primary pump 3, and is fixedly connected to the support box 2, located inside the through hole 7; the suction pipe 6 is fixedly connected to one side of the quantitative tank 5, and a movable port 4 is opened on one side of the support box 2, with the suction pipe 6 movably connected to the movable port 4.
[0027] It is understood that this utility model stores polishing liquid in a polishing liquid storage tank 1, drives a stirring rod 17 to rotate via the output end of a motor 16, and stirs the polishing liquid in the storage tank 1 evenly via the stirring rod 17. The polishing liquid in the storage tank 1 is then drawn out by a first liquid pump 3 and enters a metering tank 5 through an inlet pipe 8. The weight of polishing liquid added to the metering tank 5 is detected in real time by a pressure sensor 21. When the required weight of polishing liquid is reached, the electric control valve 9 on the inlet pipe 8 and the first liquid pump 3 are closed to stop the addition of polishing liquid. The polishing liquid in the metering tank 5 is then drawn out through a suction pipe 6 at the input end of a second liquid pump 13 and fed into a spray head 14 via a liquid pipe. The polishing liquid is then sprayed out through the spray head 14, thus completing the metered supply of polishing liquid.
[0028] Please see Figures 1 to 4 The quantitative supply device also includes a support top frame 15, which is fixedly connected to the top of the polishing liquid storage tank 1. A motor 16 is installed on the top of the support top frame 15. A stirring rod 17 is rotatably arranged inside the polishing liquid storage tank 1. The output end of the motor 16 is fixedly connected to the stirring rod 17. An inner support frame 18 is fixedly connected to the inner side of the polishing liquid storage tank 1. The bottom end of the stirring rod 17 is rotatably connected to the inner support frame 18. The stirring rod 17 is rotatably connected to the support top frame 15.
[0029] It is understood that the present invention drives the stirring rod 17 to rotate through the output end of the motor 16, and stirs the polishing liquid in the polishing liquid storage tank 1 evenly through the stirring rod 17, so as to prevent the polishing liquid from becoming layered or uneven during long-term storage.
[0030] Please see Figures 1 to 4 Limiting sliders 10 are fixed at equal intervals on the outer side of the metering tank 5, and limiting grooves 11 are opened at equal intervals on the inner side of the support box 2. The limiting sliders 10 and the limiting grooves 11 are slidably connected.
[0031] It is understood that this utility model improves the stability of the metering tank 5 within the support box 2 by limiting the sliding of the metering tank 5 within the support box 2, and by having the metering tank 5 drive the limiting slider 10 on the outside to limit the sliding of the limiting groove 11 on the inside of the support box 2.
[0032] Please see Figures 1 to 4 A support frame 12 is provided on one side of the support box 2. A second liquid pump 13 is installed on the top of the support frame 12. The input end of the second liquid pump 13 is fixedly connected to the liquid extraction pipe 6. The output end of the second liquid pump 13 is connected to the spray head 14 through the liquid pipe.
[0033] It is understood that the present invention supports the No. 2 liquid pump 13 through the support frame 12, and extracts a certain amount of polishing liquid from the metering tank 5 through the liquid extraction pipe 6 at the input end of the No. 2 liquid pump 13, and delivers it to the spray head 14 through the liquid pipe to spray out the polishing liquid and polish the elastic grinding block.
[0034] Please see Figures 1 to 4 A feed pipe 19 is fixedly connected to one side of the polishing liquid storage tank 1.
[0035] It is understood that the present invention injects the stored polishing liquid into the polishing liquid storage tank 1 through the feed pipe 19.
[0036] Please see Figures 1 to 4 An electrically controlled valve 9 is installed on the inlet pipe 8.
[0037] It is understood that this utility model controls the connection status of the liquid inlet pipe 8 through the electronically controlled valve 9, thereby controlling the entry of polishing liquid into the metering tank 5.
[0038] In the description of this utility model, it should be understood that the terms "coaxial", "bottom", "one end", "top", "middle", "other end", "upper", "side", "top", "inner", "front", "center", "both ends", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings. They are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model.
[0039] Furthermore, the terms "first," "second," "third," and "fourth" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first," "second," "third," or "fourth" may explicitly or implicitly include at least one of those features.
[0040] In this utility model, unless otherwise explicitly specified and limited, the terms "installation", "setting", "connection", "fixing", "screw connection", etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal connection of two components or the interaction between two components. Unless otherwise explicitly limited, those skilled in the art can understand the specific meaning of the above terms in this utility model according to the specific circumstances.
[0041] Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present invention, the scope of which is defined by the appended claims and their equivalents.
Claims
1. A quantitative supply device, characterized in that, include: Polishing fluid storage tank (1); Support box (2), the support box (2) is set on one side of polishing liquid storage tank (1); Pressure sensor (21) is installed inside support box (2); A metering tank (5) is slidably disposed inside the support box (2), and the bottom of the metering tank (5) is connected to the pressure sensor (21). Through hole (7), through hole (7) is opened at the top of metering tank (5); Liquid pump No. 1 (3) is installed on one side of support box (2); The outlet pipe (20) is located on one side of the polishing liquid storage tank (1), and the input end of the No. 1 liquid pump (3) is connected to the outlet pipe (20) through a pipe. The inlet pipe (8) is installed on the output end of the No. 1 liquid pump (3). The inlet pipe (8) is fixedly connected to the support box (2). The inlet pipe (8) is located inside the through hole (7). A liquid extraction pipe (6) is provided on one side of the metering tank (5). A movable port (4) is provided on one side of the support box (2). The liquid extraction pipe (6) is movably connected to the movable port (4).
2. The quantitative supply device according to claim 1, characterized in that: It also includes a support top frame (15), which is fixed to the top of the polishing liquid storage tank (1). A motor (16) is installed on the top of the support top frame (15). A stirring rod (17) is rotatably installed inside the polishing liquid storage tank (1). The output end of the motor (16) is fixed to the stirring rod (17). An inner support frame (18) is fixed to the inner side of the polishing liquid storage tank (1). The bottom end of the stirring rod (17) is rotatably connected to the inner support frame (18). The stirring rod (17) is rotatably connected to the support top frame (15).
3. The quantitative supply device according to claim 1, characterized in that: The metering tank (5) is fixedly connected to a limiting slider (10) at equal intervals on the outside, and the supporting box (2) is provided with a limiting groove (11) at equal intervals on the inside. The limiting slider (10) and the limiting groove (11) are slidably connected.
4. The quantitative supply device according to claim 1, characterized in that: A support frame (12) is provided on one side of the support box (2), and a second liquid pump (13) is installed on the top of the support frame (12). The input end of the second liquid pump (13) is fixedly connected to the liquid extraction pipe (6), and the output end of the second liquid pump (13) is connected to a spray head (14) through a liquid pipe.
5. A quantitative supply device according to claim 1, characterized in that: A feed pipe (19) is fixedly connected to one side of the polishing liquid storage tank (1).
6. A quantitative supply device according to claim 1, characterized in that: An electrically controlled valve (9) is installed on the liquid inlet pipe (8).