Ventricular septal defect treatment instrument
By designing a treatment device for ventricular septal defects, utilizing a delivery sheath and push rod to release the patch, combined with left ventricular pressure differential and suturing techniques, the problem of difficulty in inserting occluders into small ventricular septal defects in existing technologies has been solved, achieving efficient repair of multiple ventricular septal defects and reducing residual shunts.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- BEIJING SHENDI MEDICAL TECH CO LTD
- Filing Date
- 2025-02-12
- Publication Date
- 2026-05-26
AI Technical Summary
Existing techniques for repairing ventricular septal defects, especially multiple ventricular septal defects, present problems such as difficulty in placing the occluder into the small ventricular septal defect, leading to surgical failure and residual shunt, particularly when directly suturing the right ventricular side or using existing occlusion devices.
A device for treating ventricular septal defects is provided, including a patch, a delivery sheath, a push rod, and a limiting device. The defect location is detected by the head of the delivery sheath, the patch is released and fixed to the left ventricular side by the push rod, and the patch is secured by sutures or fixation claws. The small ventricular septal defect is repaired by utilizing the pressure difference in the left ventricle.
It enables accurate repair of multiple ventricular septal defects, reduces residual shunts, is suitable for minimally invasive surgery, is especially suitable for repairing smaller defects, and improves the success rate of surgery.
Smart Images

Figure CN224269353U_ABST