Self-cleaning and reverse flushing mechanism for sewage pump impeller

By designing a self-cleaning and backwashing mechanism in the sewage pump, the impeller is backwashed by water flow, which solves the problem of impeller dynamic imbalance caused by impurity deposition and realizes the self-cleaning and dynamic balance restoration of the impeller.

CN224339233UActive Publication Date: 2026-06-09BOLIYUAN TECH (NANJING) CO LTD

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
BOLIYUAN TECH (NANJING) CO LTD
Filing Date
2025-06-13
Publication Date
2026-06-09

AI Technical Summary

Technical Problem

In existing sewage pumps, impurities accumulate at the gap between the impeller outlet and the volute. After long-term operation, this leads to poor water flow and uneven adhesion of impurities, resulting in eccentric mass and impeller dynamic imbalance.

Method used

Design a self-cleaning and backwashing mechanism for a sewage pump impeller. The pump introduces water flow to the support plate, and the nozzle sprays water to backwash the impeller. Combined with an electric push rod and a friction rod, the support plate swings to expand the rinsing range and clean the dirt on the impeller surface.

Benefits of technology

It effectively removes dirt from the impeller surface, restores the impeller's dynamic balance, ensures smooth water flow, and avoids impeller imbalance caused by eccentric mass.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model discloses a kind of self-cleaning and reverse flushing mechanism of sewage pump impeller, it is related to sewage pump technical field, including pump machine body and chamber, the inside vertical installation of chamber has impeller, the bottom of pump machine body is provided with water inlet pipe, the side end of chamber is provided with sewage outlet, the inside of sewage outlet is provided with fixed box, the inside of fixed box is provided with multiple cleaning mechanism, each the cleaning mechanism includes support plate, sealing cover and spray head body, electric push rod starts, push force is applied to support plate, to make support plate slide in fixed box, simultaneously drive friction rod and guide rail strip contact and produce friction;Arc plate is installed in the inside of guide rail strip staggeredly, cooperate friction rod end oval structure and the inside arc track of guide rail strip, to make friction rod drive support plate swing in fixed box, drive spray head body synchronous swing, expand the range of washing, realize the reverse flushing of different area of impeller.
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Description

Technical Field

[0001] This utility model relates to the field of sewage pump technology, and in particular to a sewage pump impeller self-cleaning and backwashing mechanism. Background Technology

[0002] Currently, existing sewage pumps (such as patent publication number: CN218235499U) disclose a sewage pump that effectively avoids impeller blockage caused by repeated transmission of fibrous material between blades by setting a single blade to form a single channel for medium flow. This avoids the sewage pump from malfunctioning or even burning out the motor. At the same time, the sewage pump in this application has a simplified structural design, is not easily damaged, and is highly practical.

[0003] In the aforementioned patent, when hard particles pass through the impeller with the water flow, they are easily deposited in the gap between the impeller outlet and the volute due to centrifugal force. After long-term operation, the impurities will form sediment, which will hinder the smooth discharge of water. The uneven attachment of impurities to the impeller blades will form an eccentric mass, resulting in an imbalance of the impeller dynamic balance. Utility Model Content

[0004] To address the shortcomings of existing technologies, this utility model provides a self-cleaning and reverse flushing mechanism for a sewage pump impeller, which solves the technical problems that after long-term operation, impurities will form sediment, hindering the smooth discharge of water, and that impurities will not adhere evenly to the impeller blades, resulting in eccentric mass and causing impeller dynamic imbalance.

[0005] To achieve the above objectives, this utility model provides the following technical solution:

[0006] A sewage pump impeller self-cleaning and backwashing mechanism includes a pump body and a chamber, wherein an impeller is vertically installed inside the chamber, and a water inlet pipe is provided at the bottom end of the pump body.

[0007] A drain outlet is provided at the side end of the chamber, and a fixing box is provided inside the drain outlet. Multiple cleaning mechanisms are provided inside the fixing box, and each cleaning mechanism includes a support plate, a sealing cover and a nozzle body.

[0008] Preferably, a friction rod is fixedly installed at the bottom end of each of the support plates, and the end of the friction rod has an elliptical structure;

[0009] Each of the support plates is provided with a sliding sleeve at both ends, and a rotating shaft is slidably mounted at each end of the sliding sleeve.

[0010] Preferably, a compression tube is fixedly installed at the side end of each of the support plates, and two electric push rods are fixedly installed at the side end of each of the support plates;

[0011] A base plate is fixedly installed at the bottom of the fixed box, and a pipe is fixedly installed at the end of the base plate. The pipe is connected to multiple compression pipes and is connected to the output end of the pump.

[0012] Two guide rails connected to the friction rods are fixedly installed at the top of the base plate.

[0013] Compared with the prior art, the present invention has the following beneficial effects;

[0014] In this invention, a pump is used to guide water into the interior of a pipe, which is connected to two compression pipes. The water is then guided into the interior of a support plate. Through the nozzle body at the top of the support plate, water is sprayed into the interior of the chamber, which backwashes the rotating impeller inside the chamber. The impact force of the water flow is used to clean the dirt on the surface of the impeller.

[0015] In this invention, the electric push rod is activated, applying a pushing force to the support plate, causing the support plate to slide within the fixed box. Simultaneously, it drives the friction rod to contact the guide rail and generate friction. The inner side of the guide rail is staggered with arc-shaped plates, which, together with the elliptical structure at the end of the friction rod and the arc-shaped trajectory on the inner side of the guide rail, cause the friction rod to drive the support plate to swing within the fixed box, which in turn drives the nozzle body to swing synchronously, expanding the rinsing range and achieving reverse rinsing of different areas of the impeller. Attached Figure Description

[0016] The above description is only an overview of the technical solution of this utility model. In order to better understand the technical means of this utility model and to implement it in accordance with the contents of the specification, the preferred embodiments of this utility model are described in detail below with reference to the accompanying drawings.

[0017] Figure 1 This is a structural diagram of the pump body of this utility model;

[0018] Figure 2 This is a structural diagram of the sewage outlet of this utility model;

[0019] Figure 3 This is a structural diagram of the fixing box of this utility model;

[0020] Figure 4 This is a structural diagram of the support plate of this utility model.

[0021] In the diagram: 11. Pump body; 12. Chamber; 13. Drain outlet; 14. Fixing box; 15. Base plate; 16. Pipe; 17. Support plate; 18. Sealing cover; 19. Friction rod; 21. Guide rail; 22. Sliding sleeve; 23. Rotating shaft; 24. Compression pipe; 25. Electric push rod; 26. Nozzle body. Detailed Implementation

[0022] This application provides a sewage pump impeller self-cleaning and backwashing mechanism, which effectively solves the problems of impurities forming sediment after long-term operation, hindering the smooth discharge of water, and impurities unevenly adhering to the impeller blades, forming eccentric mass and causing impeller dynamic imbalance. The pump guides water into the interior of the pipe, which is connected to two compression pipes, and guides the water into the interior of the support plate. Through the nozzle body at the top of the support plate, water is sprayed into the interior of the chamber to backwash the rotating impeller inside the chamber, using the impact force of the water flow to clean the dirt on the impeller surface.

[0023] Example

[0024] like Figures 1-4 As shown, the technical solution in this application embodiment effectively solves the technical problems that after long-term operation, impurities will form sediment, hindering the smooth discharge of water, and that impurities will unevenly adhere to the impeller blades, forming eccentric mass and causing impeller dynamic imbalance. The overall idea is as follows:

[0025] To address the problems existing in the prior art, this utility model provides a sewage pump impeller self-cleaning and backwashing mechanism, including a pump body 11 and a chamber 12. An impeller is vertically installed inside the chamber 12. A water inlet pipe is provided at the bottom end of the pump body 11. The pump body 11 drives the impeller to rotate at high speed. The liquid inside the impeller is thrown to the outer edge of the impeller under the action of centrifugal force, and a low-pressure area is formed at the center of the impeller. The sewage suction pipe enters the center of the impeller from the water inlet to fill the vacuum area, and then is discharged through the sewage outlet 13.

[0026] A drain port 13 is provided at the side end of the chamber 12. A fixed box 14 is provided inside the drain port 13. Multiple cleaning mechanisms are provided inside the fixed box 14. Each cleaning mechanism includes a support plate 17, a sealing cover 18 and a nozzle body 26. The sealing cover 18 is stacked and uses rubber operation. The friction rod 19 stretches the sealing cover 18 while moving and swinging. The sealing cover 18 has the ability to stretch and deform. The sealing cover 18 plays a protective role for the inside of the fixed box 14.

[0027] Each support plate 17 is fixedly installed with a friction rod 19 at its bottom end. The end of the friction rod 19 is elliptical in shape and slides inside the guide rail 21. In conjunction with the arc-shaped trajectory of the inner side of the guide rail 21, the friction rod 19 drives the support plate 17 to swing inside the fixed box 14.

[0028] Each support plate 17 is provided with a sliding sleeve 22 at both ends of its sides. A rotating shaft 23 is slidably mounted on the side end of each sliding sleeve 22. The guide rail 21 drives the friction rod 19 to move, allowing the support plate 17 to swing inside the fixed box 14. The end of the rotating shaft 23 is rotatably connected to the fixed box 14. The rotating shaft 23 supports the rotation of the friction rod 19. At the same time, the support plate 17 drives the sliding sleeve 22 to slide and engage with the rotating shaft 23, allowing the support plate 17 to slide and adjust its position while swinging left and right.

[0029] Each support plate 17 is fixedly installed with a compression tube 24 at its side end, and two electric push rods 25 are fixedly installed at the side end of each support plate 17. The electric push rods 25 generate a pushing force on the support plate 17, allowing the support plate 17 to slide inside the fixed box 14, while the friction rod 19 rubs against the inside of the guide rail 21.

[0030] A base plate 15 is fixedly installed at the bottom of the fixed box 14, and a pipe 16 is fixedly installed at the end of the base plate 15. The pipe 16 is connected to multiple compression pipes 24 and is connected to the output end of the pump. The pump guides the water flow into the interior of the pipe 16. The pipe 16 is connected to two compression pipes 24 and guides the water flow into the interior of the support plate 17. The nozzle body 26 at the top of the support plate 17 sprays water into the interior of the chamber 12 to backwash the rotating impeller inside the chamber 12.

[0031] Two guide rails 21 connected to friction rods 19 are fixedly installed at the top of the base plate 15. Multiple arc-shaped plates are installed alternately on the inner side of the guide rails 21. The friction rods 19 slide inside the guide rails 21. The friction rods 19 rub against the inner side of the guide rails 21, generating a swing, which drives the support plate 17 to swing inside the fixed box 14, so that the two nozzle bodies 26 at the top of the support plate 17 can backwash the impeller while swinging at a uniform speed.

[0032] Working principle:

[0033] The first step involves the pump body 11 driving the impeller in the chamber 12 to rotate at high speed. The impeller uses centrifugal force to throw the liquid to the outer edge and center to form a low-pressure zone. Wastewater is drawn into the center of the impeller through the inlet pipe to fill the vacuum, and finally discharged from the drain outlet 13. This is the equipment's routine sewage discharge operation process and is the basic operating environment for the self-cleaning and backwashing functions.

[0034] The fixed box 14 has multiple cleaning mechanisms built in. The pump output end is connected to the base plate 15 and the compression pipe 24 through the pipe 16 to provide a power source for subsequent water spray. When the electric push rod 25 is activated, it applies a pushing force to the support plate 17, causing the support plate 17 to slide in the fixed box 14. At the same time, it drives the friction rod 19 to contact the guide rail 21 and generate friction. The inner side of the guide rail 21 is staggered with arc plates, which, together with the elliptical structure at the end of the friction rod 19 and the arc trajectory on the inner side of the guide rail 21, cause the friction rod 19 to drive the support plate 17 to swing in the fixed box 14.

[0035] In the second step, the sliding sleeves 22 on both sides of the support plate 17 slide and connect with the rotating shaft 23. The end of the rotating shaft 23 is rotatably connected to the fixed box 14, which not only supports the rotation of the friction rod 19, but also allows the support plate 17 to flexibly adjust its position when swinging left and right. During this process, the sealing cover 18 is stretched and deformed as the support plate 17 and the friction rod 19 move and swing, which protects the internal components of the fixed box 14.

[0036] The pump directs water into the pipe 16, which then flows through the compression pipe 24 to the support plate 17. The water is then sprayed into the chamber 12 by the nozzle body 26 at the top of the support plate 17, where it is sprayed onto the rotating impeller. Simultaneously, the support plate 17 is continuously and uniformly oscillating due to the combined action of the electric push rod 25, the friction rod 19, and the guide rail 21. This causes the nozzle body 26 to oscillate synchronously, achieving reverse flushing of different areas of the impeller. The water flow impact force is used to clean the dirt on the impeller surface, completing the self-cleaning operation.

[0037] Finally, it should be noted that the above embodiments are merely examples for clearly illustrating the present invention and are not intended to limit the implementation. Those skilled in the art can make other variations or modifications based on the above description. It is neither necessary nor possible to exhaustively list all possible implementations here. However, obvious variations or modifications derived therefrom are still within the protection scope of this invention.

Claims

1. A self-cleaning and back-flushing mechanism for a sewage pump impeller, comprising a pump machine body (11) and a chamber (12), characterized in that, The impeller is vertically installed in the chamber (12), and the bottom end of the pump body (11) is provided with a water inlet pipe The side end of the chamber (12) is provided with a sewage outlet (13), and the inside of the sewage outlet (13) is provided with a fixing box (14). The inside of the fixing box (14) is provided with a plurality of cleaning mechanisms, each of which comprises a support plate (17), a sealing cover (18) and a spray head body (26).

2. A self-cleaning and back-flushing mechanism for a vane of a sewage pump as claimed in claim 1, characterized in that, The bottom end of each support plate (17) is fixedly installed with a friction rod (19), and the end of the friction rod (19) is in an oval structure.

3. A self-cleaning and back-flushing mechanism for a vane of a sewage pump as claimed in claim 1, characterized in that, The two side ends of each support plate (17) are provided with a sliding sleeve (22), and the side end of each sliding sleeve (22) is slidingly installed with a rotating shaft (23).

4. A self-cleaning and back-flushing mechanism for a vane of a sewage pump as claimed in claim 1, characterized in that, The side end of each support plate (17) is fixedly installed with a compression pipe (24), and the side end of each support plate (17) is fixedly installed with two electric push rods (25).

5. A self-cleaning and back-flushing mechanism for a vane of a sewage pump according to any one of claims 1-4, characterized in that, The bottom end of the fixing box (14) is fixedly installed with a bottom plate (15), and the end of the bottom plate (15) is fixedly installed with a pipeline (16), which is in communication with a plurality of compression pipes (24), and the pipeline (16) is connected with the output end of the pump.

6. A self-cleaning and back-flushing mechanism for a vane of a waste pump as claimed in claim 5, characterized in that, The top end of the bottom plate (15) is fixedly installed with two guide rail strips (21) connected with the friction rods (19).