High-power irradiation electron accelerator air path constant temperature device
The SF6 gas circulation system solves the problem of poor heat dissipation at the center of the waveguide in traditional water-cooled electron accelerators, and achieves constant temperature control of the vacuum waveguide ceramic window, protecting the equipment and improving product quality.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- SHANGHAI YANFU TECHNOLOGY CO LTD
- Filing Date
- 2025-06-23
- Publication Date
- 2026-06-09
AI Technical Summary
Traditional electron accelerators use a water-cooled cooling system, which prevents heat from being effectively dissipated from the center of the waveguide and the ceramic window. This leads to increased heat and a sharp rise in pressure, which can easily cause damage to the ceramic window and affect equipment safety.
An SF6 gas circulation system is adopted, which forms a unidirectional circulation gas path through a gas path control system including SF6 gas cylinders, refrigeration devices, vacuum pumps and other components, and regulates the temperature and pressure of the vacuum waveguide ceramic window to achieve constant temperature control.
It achieves a balanced distribution of temperature and pressure within the sealed vacuum chamber, protecting waveguide equipment and improving product quality and equipment operational stability.
Smart Images
Figure CN224343424U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of electron accelerator technology, specifically to a gas path constant temperature device for a high-power irradiated electron accelerator. Background Technology
[0002] The cooling and temperature control unit for electron accelerators is a specialized piece of equipment used for cooling and maintaining the temperature of electron accelerators.
[0003] Traditional electron accelerator cooling and temperature control units use an independently installed open structure, including a cooling water tank, circulating water pump, heat exchanger, flow meter, and control valve. They are connected via on-site piping. A flow divider is installed at the outlet of the circulating water pump, and a manual valve is installed at the branch port of the flow divider. A flow meter is then installed. The flow rate in the pipeline is adjusted by regulating the control valve. When the flow rate is adjusted to a suitable level, the flow meter reading is recorded as the basis for opening the valves in the future.
[0004] Traditional electron accelerators use water-cooled structures for cooling, which has a poor cooling effect, as the flow of water only removes heat from the waveguide surface.
[0005] However, microwaves are transmitted through the center of the waveguide and the center of the ceramic window. If only the heat on the surface of the waveguide is carried away, the heat in the center of the waveguide and the center of the ceramic window cannot be dissipated in a timely and effective manner. This will easily lead to a sharp increase in the internal pressure of the waveguide cavity as the heat increases after the power is increased, which will eventually lead to the ceramic window breakage that is common in the industry, causing serious damage to important components of the waveguide equipment. Utility Model Content
[0006] To address the technical problems existing in the prior art, the purpose of this utility model is to provide a gas path constant temperature device for a high-power irradiated electron accelerator, which provides the required stable temperature conditions for the ceramic window section of the vacuum waveguide through SF6 gas circulation.
[0007] The objective of this utility model is achieved through the following technical solution: a gas path constant temperature device for a high-power irradiated electron accelerator, comprising a chassis and a gas path control system installed in the chassis. The gas path control system includes an SF6 gas cylinder, a refrigeration device, and a vacuum pump connected sequentially through pipelines. The refrigeration device is used to regulate the temperature of the SF6 gas in the pipelines, and the vacuum pump is used to push the temperature-regulated SF6 gas. The SF6 gas can be pushed to a vacuum waveguide ceramic window for heat exchange and then returned to the gas path control system through pipelines to form a unidirectional circulating gas path.
[0008] Furthermore, the gas path control system also includes a first vacuum valve, a second vacuum valve, and a third vacuum valve. The first vacuum valve is directly connected to the outlet of the SF6 gas cylinder to control the opening and closing of the SF6 gas cylinder. The second vacuum valve serves as the inlet of the gas path control system and is connected to the first vacuum valve and the refrigeration device through pipes. The refrigeration device, the vacuum pump, and the third vacuum valve are connected in series to form a unidirectional gas path. The third vacuum valve serves as the outlet of the gas path control system and is connected to the outlet passage to connect to the vacuum waveguide ceramic window. The second vacuum valve is connected to the return passage to connect to the vacuum waveguide ceramic window to form the unidirectional circulating gas path.
[0009] Specifically, the gas path control system further includes a first pressure relief valve and a second pressure relief valve, wherein the first pressure relief valve is connected in series between the second vacuum valve and the refrigeration device, and the second pressure relief valve is connected in series between the vacuum pump and the third vacuum valve.
[0010] Furthermore, the gas path control system also includes a vacuum pumping device and a fourth vacuum valve, wherein the vacuum pumping device is connected in parallel between the second pressure relief valve and the third vacuum valve via the fourth vacuum valve.
[0011] Furthermore, the gas path control system also includes a first filter and a second filter, which are connected in series at the front and rear ends of the refrigeration device and the vacuum pump, respectively.
[0012] Furthermore, the gas path control system also includes a flow meter connected in series between the second filter and the second pressure relief valve, and the flow meter is used to control the gas flow rate of the gas path control system.
[0013] Furthermore, the gas circuit control system also includes a pressure gauge and a pressure transmitter, which are connected in series between the flow meter and the second pressure relief valve.
[0014] Furthermore, the gas path control system also includes a vacuum tank, and the vacuum pump is placed inside the vacuum tank, the inside of which is a lead cylinder structure.
[0015] Specifically, the chassis is composed of multiple panels, and a support base is provided on the upper panel for mounting the SF6 gas cylinder.
[0016] Furthermore, one side panel of the chassis is equipped with a switch and connection terminals, and multiple casters are provided under the panel at the bottom of the chassis.
[0017] Compared with the prior art, the present invention has at least the following beneficial effects:
[0018] 1. This invention provides the necessary stable temperature conditions for the ceramic window section of the vacuum waveguide through SF6 gas circulation. It enables constant temperature control of SF6 within the sealed vacuum chamber, resulting in a more balanced temperature and pressure distribution in various areas of the sealed space, thereby leading to higher quality products produced and processed by the high-energy irradiated electron accelerator equipment.
[0019] 2. The first pressure relief valve and the second pressure relief valve of this utility model are respectively located near the inlet and outlet of the gas circuit control system, which can promptly relieve pressure in response to sudden pressure increase inside the gas circuit control system, thus protecting this utility model and the waveguide equipment connected thereto.
[0020] 3. The first and second filters of this utility model effectively prevent debris or particles that may fall from the aging or broken fan blades of the vacuum pump from entering the gas path control system and damaging the components of the waveguide equipment, thus effectively protecting this utility model and the connected waveguide equipment.
[0021] 4. The pressure gauge of this utility model is used to monitor the pressure in the gas circuit control system and inside the waveguide in real time. The pressure transmitter is a double-insurance structure to prevent the pressure of SF6 gas in the gas circuit from being lost if one of the components in the gas circuit control system is damaged, thus ensuring that the pressure display in the gas circuit is accurate and controllable.
[0022] 5. The vacuum pump of this utility model is protected by a vacuum tank with a lead cylinder structure to prevent the pump body from being irradiated for a long time, which could cause damage to the pump body and leakage of SF6 gas. Attached Figure Description
[0023] Figure 1 This is a schematic diagram of the structure of this utility model.
[0024] Figure 2 This is a schematic diagram of the structure of the present invention with part of the machine panel removed.
[0025] Figure 3 This is a schematic diagram of the gas path control system of this utility model, wherein the arrows indicate the direction of other flows.
[0026] Figure 4 This is another perspective view of the pneumatic control system of this utility model.
[0027] Figure 5 An exploded view of the vacuum tank containing the vacuum pump.
[0028] Figure 6 This is a pipeline flow diagram of the gas circuit control system of this utility model.
[0029] In the picture:
[0030] 100-Chassis; 101-Front panel; 102-Switch; 103-Connection terminal; 104-Support base; 105-Cassette wheel;
[0031] 200-Gas circuit control system; 201-SF6 gas cylinder; 202-First vacuum valve; 203-Second vacuum valve; 204-First pressure relief valve; 205-First filter; 206-Refrigeration unit; 207-Vacuum pump; 208-Second filter; 209-Flow meter; 210-Pressure gauge; 211-Pressure transmitter; 212-Second pressure relief valve; 213-Third vacuum valve; 215-Vacuum pumping device; 216-Fourth vacuum valve; 217-Gas outlet passage; 218-Return passage; 219-Vacuum tank;
[0032] 300-Vacuum Ceramic Window. Detailed Implementation
[0033] To facilitate understanding of this utility model, the technical solutions and advantages of the utility model will be further described in detail below with reference to the accompanying drawings and embodiments. Any mechanisms or methods not elaborated in this utility model can be referred to in the prior art. The specific structures and features of this utility model are illustrated below by way of example and should not constitute any limitation on this utility model. Furthermore, any technical feature mentioned below (including implicit or disclosed features), as well as any technical feature directly shown or implied in the figures, can be arbitrarily combined or deleted among these technical features to form more other embodiments that may not be directly or indirectly mentioned in this utility model. The accompanying drawings show preferred embodiments of this utility model. However, this utility model can be implemented in many different forms and is not limited to the embodiments described herein. Rather, these embodiments are provided to provide a more thorough and complete understanding of the disclosure of this utility model.
[0034] like Figure 1-6 As shown, the high-power irradiated electron accelerator gas path constant temperature device of this embodiment includes a chassis 100 and a gas path control system 200 installed in the chassis 100.
[0035] Specifically, the enclosure 100 is composed of six panels. One side panel 101 is equipped with the switch 102 and connection terminal 103 of the thermostat. The upper panel is equipped with a support base 104 for mounting the SF6 gas cylinder 201 of the gas circuit control system 200. The lower panel is equipped with multiple casters 105 for easy movement of the thermostat.
[0036] The gas path control system 200 includes an SF6 gas cylinder 201, a first vacuum valve 202, a second vacuum valve 203, a first pressure relief valve 204, a first filter 205, a refrigeration unit 206, a vacuum pump 207, a second filter 208, a flow meter 209, a pressure gauge 210, a pressure transmitter 211, a second pressure relief valve 212, a third vacuum valve 213, a vacuum pumping device 215, and a fourth vacuum valve 216. The SF6 gas cylinder 201, the first vacuum valve 202, the second vacuum valve 203, and the third vacuum valve 213 are located above the chassis 1000, while the other components of the gas path control system 200 are located inside the chassis 1000.
[0037] The SF6 gas cylinder 201, first vacuum valve 202, second vacuum valve 203, first pressure relief valve 204, first filter 205, refrigeration unit 206, vacuum pump 207, second filter 208, flow meter 209, pressure gauge 210, pressure transmitter 211, second pressure relief valve 212, and third vacuum valve 213 are connected in series to form a unidirectional gas path. The third vacuum valve 213 is connected to the vacuum ceramic window 300 of the waveguide through the gas outlet passage 217, and the second vacuum valve 203 is connected to the vacuum ceramic window 300 through the return passage 218, so that the second vacuum valve 203, first pressure relief valve 204, first filter 205, refrigeration unit 206, vacuum pump 207, second filter 208, flow meter 209, pressure gauge 210, pressure transmitter 211, second pressure relief valve 212, third vacuum valve 213, and vacuum ceramic window 300 form a unidirectional closed loop to regulate the temperature and pressure inside the waveguide. The vacuum pumping device 215 is connected to the passage between the second pressure relief valve 212 and the third vacuum valve 213 via the fourth vacuum valve 216. That is, closing the fourth vacuum valve 216 will not block the flow of the aforementioned one-way circulating gas path.
[0038] Specifically, the SF6 gas cylinder 201 serves as the gas source for the gas path control system 200 in this embodiment. Its opening and closing are controlled by the first vacuum valve 202, which is a detachable external vacuum valve. During the operation of the high-energy electron accelerator, the waveguide equipment, as an important component of high-energy microwave transmission, needs to maintain a good working condition for a long time and around the clock. The waveguide equipment absorbs a significant amount of heat generated during microwave transmission, requiring an efficient heat dissipation structure to maintain its optimal working condition. Microwave transmission involves high-energy electrons; if the waveguide lacks an insulating medium, high power conditions may lead to breakdown. SF6 is chemically stable and does not easily decompose, allowing it to better maintain pressure in a vacuum-sealed waveguide. Therefore, SF6 gas is typically used in waveguide sections. In this embodiment, SF6 serves as the filling gas inside the waveguide and also as the fluid controlling the internal temperature and pressure of the waveguide, thus providing stable temperature and pressure regulation for the waveguide.
[0039] The second vacuum valve 203 serves as the inlet to the aforementioned unidirectional circulating gas path. It is connected via pipelines to the first vacuum valve 202, the first pressure relief valve 204, and the vacuum ceramic window 300. Externally, the second vacuum valve 203 connects to the waveguide's vacuum ceramic window 300 via a return passage 218, recovering the gas that has absorbed heat from the vacuum ceramic window 300 and allowing it to flow back into the gas path control system 200 for recooling. Internally, the second vacuum valve 203 connects to the SF6 cylinder 201 via the first vacuum valve 202 to obtain SF6 gas. When both the first vacuum valve 202 and the second vacuum valve 203 are open simultaneously, the SF6 cylinder 201 outputs SF6 gas to the unidirectional circulating gas path. When the gas path control system 200 is in temperature regulation mode, the first vacuum valve 202 is typically closed while the second vacuum valve 203 is open.
[0040] The second vacuum valve 203 serves as the inlet of the gas path control system 200, and the first pressure relief valve 204 is located next to the second vacuum valve 203; the third vacuum valve 213 serves as the outlet of the gas path control system 200, and the second pressure relief valve 212 is located next to the third vacuum valve 213. When the internal pressure of the gas path control system 200 increases sharply, the first pressure relief valve 204 and the second pressure relief valve 212 can be used in a timely manner to relieve pressure, protecting the constant temperature device and its connected waveguide equipment.
[0041] The refrigeration device 206 is used to regulate the temperature of SF6 gas. Stable low-temperature SF6 gas is obtained through the refrigeration device 206 and then delivered to the vacuum ceramic window 300 of the waveguide to absorb heat.
[0042] Vacuum pump 207 serves as the power unit for the gas path control system 200, driving the SF6 gas in a unidirectional flow. After vacuum pump 207 starts, it forces the SF6 gas to flow sequentially through the second filter 208, flow meter 209, pressure gauge 210, pressure transmitter 211, second pressure relief valve 212, and third vacuum valve 213. Then, it leaves the gas path control system 200 through outlet passage 217 and enters the vacuum waveguide ceramic window 14 to regulate the waveguide temperature. After heat exchange within the waveguide, the gas flows back to the gas path control system 200 through return passage 218, and then sequentially flows through the second vacuum valve 203, first pressure relief valve 204, first filter 205, cooling device 206, and vacuum pump 207, causing the SF6 gas to circulate repeatedly in the unidirectional gas path. Furthermore, the cooling device 206 also starts operating simultaneously when vacuum pump 207 is running, thus ensuring that the SF6 temperature and pressure within the unidirectional gas path are at the optimal state required for the operation of the high-energy irradiated electron accelerator.
[0043] The vacuum pump 207 is placed inside the vacuum tank 219 because the application scenario is a high-irradiation environment. The tank has a lead cylinder structure to prevent the pump from being damaged by prolonged irradiation and to prevent SF6 gas leakage. The first filter 205 and the second filter 208 are respectively installed at the front and rear ends of the cooling device 206 and the vacuum pump 207, located at the inlet and outlet ends of the vacuum pump 207. The first filter 205 at the inlet end is to prevent impurities in the SF6 gas from entering the waveguide device and causing sparking when it enters the gas path. The second filter 208 at the outlet end is because the vacuum pump 207 has fan blades, and during use, the fan blades may age or break, potentially causing fragments or particles to fall off. To protect the waveguide device and the electrical components of the gas path control system 200 of this embodiment, the first filter 205 and the second filter 208 are installed at both ends of the cooling device 206 and the vacuum pump 207 to prevent impurities from flowing into the waveguide device and other electrical components of this embodiment.
[0044] The flow meter 209 is used to control the gas flow rate of the gas path control system 200. Specifically, the flow meter 209 is a rotor flow meter.
[0045] Pressure gauge 210 is used to display the gas pressure of the gas circuit control system 200. When the pressure of the gas circuit control system 200 increases, the operator can be notified in time and respond promptly to protect the waveguide equipment and this constant temperature device.
[0046] The pressure transmitter 211, as a device that converts pressure into pneumatic or electrical signals for control and remote transmission, not only displays the gas pressure of the gas circuit control system 200, but also converts the gas pressure parameters sensed by the pressure measuring component sensor into standard electrical signals to supply secondary instruments such as indicators, alarms, recorders, and regulators for measurement, indication, and process regulation. The pressure gauge 210 and the pressure transmitter 211 are connected in series to prevent the inability to know the SF6 gas pressure in the gas circuit if one component in the gas circuit fails, ensuring accurate and controllable pressure display in the gas circuit—a double-safety structure.
[0047] As mentioned above, the second pressure relief valve 212 is located next to the fourth vacuum valve 216 as a pressure protection device to protect the waveguide equipment and this thermostat.
[0048] The vacuum pumping device 215 is used to purge air from the gas path control system 200 before SF6 gas is introduced. The fourth vacuum valve 216 controls the connection between the vacuum pumping device 215 and the unidirectional circulation gas path. When the gas path control system 200 is in temperature regulation mode, the first vacuum valve 202 and the third vacuum valve 213 are closed, and the second vacuum valve 203 and the fourth vacuum valve 216 are open, forming a closed unidirectional circulation gas path. The vacuum pumping device uses a high-vacuum bellows to connect to the equipment for vacuuming via a KF vacuum valve interface. After vacuuming is completed, the angle valve is closed, and the vacuum pumping device is removed. The fourth vacuum valve 216 is a detachable external vacuum valve.
[0049] The working steps of this embodiment are as follows:
[0050] S1, the gas path control system 200 of this embodiment is connected to the waveguide. Specifically, the third vacuum valve 213 is connected to one end of the vacuum ceramic window 300 of the waveguide through the gas outlet passage 217, and the second vacuum valve 203 is connected to the other end of the vacuum ceramic window 300 of the waveguide through the return passage 218, forming a circulation passage.
[0051] S2. Before filling with SF6 gas, the air in the passage must first be removed. Specifically, first close the first vacuum valve 202 and open the second vacuum valve 203, the third vacuum valve 213, and the fourth vacuum valve 216. Start the vacuum pumping device 215 to extract the air from the passage, bringing it to a vacuum negative pressure state (-0.02MPa). Observe the pressure gauge 210 carefully. After the vacuum is completed, close the fourth vacuum valve 216 and turn off the vacuum pumping device 215.
[0052] S3. With the passage under vacuum (-0.02 MPa), SF6 gas is introduced into the passage. Specifically, the first vacuum valve 202, the second vacuum valve 203, and the third vacuum valve 213 are opened, and the fourth vacuum valve 216 is closed. The SF6 cylinder 201 is opened, and high-purity SF6 gas is introduced into the passage to 0.02 MPa. The pressure gauge 210 is observed. After the gas injection is complete, the first vacuum valve 202 is closed. At this time, the first vacuum valve 202 and the fourth vacuum valve 216 are closed, and the second vacuum valve 203 and the third vacuum valve 213 are open, forming a vacuum closed-loop gas path.
[0053] S4. Start vacuum pump 207 to drive SF6 gas to flow unidirectionally, forming a unidirectional circulation gas path. SF6 gas, after its temperature is regulated by cooling device 206, flows out of gas path control system 200 through outlet passage 217 and enters vacuum waveguide ceramic window 14 to regulate the waveguide temperature. After heat exchange within the waveguide, SF6 gas flows back to gas path control system 200 through return passage 218, re-enters cooling device 206 for temperature regulation, and is then pushed back into the waveguide by vacuum pump 207, repeating the cycle.
[0054] Compared with existing technologies, the high-power irradiated electron accelerator gas path temperature control device in this embodiment provides the required stable temperature and pressure conditions for the vacuum waveguide ceramic window section through SF6 gas circulation. This enables constant temperature control of the SF6 within the sealed vacuum chamber, resulting in a more balanced temperature and pressure distribution across different areas of the enclosed space, thereby leading to higher quality products manufactured and processed by the high-energy irradiated electron accelerator equipment.
[0055] The above embodiments are merely preferred embodiments of the present utility model and should not be construed as limiting the scope of protection of the present utility model. For those skilled in the art, it will be understood that various changes, modifications, substitutions and variations can be made to these embodiments without departing from the principles and spirit of the present utility model. The scope of the present utility model is defined by the appended claims and their equivalents.
Claims
1. A gas path constant temperature device for a high-power irradiated electron accelerator, characterized in that, The system includes a chassis and a gas path control system installed in the chassis. The gas path control system includes an SF6 gas cylinder, a refrigeration device, and a vacuum pump connected in sequence through pipelines. The refrigeration device is used to regulate the temperature of the SF6 gas in the pipelines, and the vacuum pump is used to push the temperature-regulated SF6 gas. The SF6 gas can be pushed to a vacuum waveguide ceramic window for heat exchange and then returned to the gas path control system through pipelines to form a unidirectional circulating gas path.
2. The gas path isothermal device for a high-power irradiated electron accelerator as described in claim 1, characterized in that, The gas path control system further includes a first vacuum valve, a second vacuum valve, and a third vacuum valve. The first vacuum valve is directly connected to the outlet of the SF6 gas cylinder to control the opening and closing of the SF6 gas cylinder. The second vacuum valve serves as the inlet of the gas path control system and is connected to the first vacuum valve and the refrigeration device through pipes. The refrigeration device, the vacuum pump, and the third vacuum valve are connected in series to form a unidirectional gas path. The third vacuum valve serves as the outlet of the gas path control system and is connected to the outlet passage to connect to the vacuum waveguide ceramic window. The second vacuum valve is connected to the return passage to connect to the vacuum waveguide ceramic window to form the unidirectional circulating gas path.
3. The gas path constant temperature device for a high-power irradiated electron accelerator as described in claim 2, characterized in that, The gas circuit control system further includes a first pressure relief valve and a second pressure relief valve. The first pressure relief valve is connected in series between the second vacuum valve and the refrigeration device, and the second pressure relief valve is connected in series between the vacuum pump and the third vacuum valve.
4. The gas path constant temperature device for a high-power irradiated electron accelerator as described in claim 3, characterized in that, The gas path control system also includes a vacuum pumping device and a fourth vacuum valve. The vacuum pumping device is connected between the second pressure relief valve and the third vacuum valve via the fourth vacuum valve.
5. The gas path constant temperature device for a high-power irradiated electron accelerator as described in claim 2, characterized in that, The gas path control system also includes a first filter and a second filter, which are connected in series at the front and rear ends of the refrigeration unit and the vacuum pump, respectively.
6. The gas path constant temperature device for a high-power irradiated electron accelerator as described in claim 5, characterized in that, The gas path control system also includes a flow meter connected in series between the second filter and the second pressure relief valve. The flow meter is used to control the gas flow rate of the gas path control system.
7. The gas path constant temperature device for a high-power irradiated electron accelerator as described in claim 6, characterized in that, The gas circuit control system also includes a pressure gauge and a pressure transmitter, which are connected in series between the flow meter and the second pressure relief valve.
8. The gas path constant temperature device for a high-power irradiated electron accelerator as described in claim 1, characterized in that, The gas path control system also includes a vacuum tank, and the vacuum pump is placed inside the vacuum tank, which has a lead cylinder structure inside.
9. The gas path constant temperature device for a high-power irradiated electron accelerator as described in claim 1, characterized in that, The chassis is composed of multiple panels, and a support base is provided on the upper panel for mounting the SF6 gas cylinder.
10. The gas path isothermal device for a high-power irradiated electron accelerator as described in claim 9, characterized in that, One side panel of the chassis is equipped with a switch and connection terminals, and multiple casters are located under the panel at the bottom of the chassis.