A remote plasma source apparatus and a remote plasma source system

Abstract

The utility model discloses a kind of remote plasma source device and remote plasma source system. Remote plasma source device includes: radio frequency power module, impedance matching module, ignition module and reaction chamber;Reaction chamber includes first flange, insulating cylinder, first electrode, metal shield and second flange;First flange includes air inlet;Insulating cylinder is located in the side of first flange, the inner chamber of insulating cylinder is communicated with air inlet;First electrode is fixed in the outer wall side of insulating cylinder;Metal shield is located in the outer wall side of first electrode away from insulating cylinder, and first electrode is used to receive the radio frequency energy output by radio frequency power module;Ignition module includes voltage conversion unit and ignition electrode, and voltage conversion unit is electrically connected between radio frequency power module and ignition electrode. The utility model provides a kind of remote plasma source device and remote plasma source device, simple structure, small volume, high reliability, can also improve the ionization efficiency of plasma.

Description

Technical Field

[0001] This utility model relates to the field of plasma technology, and in particular to a remote plasma source device and a remote plasma source system. Background Technology

[0002] Remote Plasma Sources (RPS) offer several significant advantages that have led to their widespread adoption in high-end etching equipment. First, RPS reduces physical damage to material surfaces. Since high-energy ions are filtered out before reaching the process chamber, this effectively minimizes physical damage to the treated surface, thus protecting the integrity of the material surface. Second, RPS offers high selectivity, making it suitable for complex structures. This allows it to excel in processing materials with intricate structures, enabling precise process control and minimizing errors and damage. Furthermore, RPS improves process uniformity. By optimizing plasma transport and distribution, process uniformity is ensured, enhancing overall processing quality.

[0003] Remote plasma source devices are typically used in systems that generate plasma outside a process chamber and supply it remotely. The most representative semiconductor manufacturing process utilizing remote plasma source devices is the cleaning process inside the process chamber; however, they are also used in other semiconductor manufacturing processes.

[0004] Currently, remote plasma source devices suffer from problems such as low ionization efficiency, poor reliability, complex structure, and large size. Utility Model Content

[0005] This invention provides a remote plasma source device and a remote plasma source system, which has a simple structure, small size, and high reliability.

[0006] This utility model provides a remote plasma source device, which includes: a radio frequency power supply module, an impedance matching module, an ignition module, and a reaction chamber;

[0007] The reaction chamber includes a first flange, an insulating cylinder, a first electrode, a metal shield, and a second flange. The first flange includes an air inlet. The insulating cylinder is located on one side of the first flange, and its inner cavity communicates with the air inlet. The first electrode is fixed to the outer wall of the insulating cylinder. The metal shield is located on the outer wall of the first electrode away from the insulating cylinder, and the second flange is located on the side of the insulating cylinder away from the first flange. The metal shield and the first electrode are spaced apart, and the metal shield is reused as the second electrode. The first electrode is used to receive radio frequency energy output by the radio frequency power module. The metal shield and the first electrode are used to ionize the process gas inside the insulating cylinder to generate plasma. The second flange includes an air outlet and an ignition through-hole. The air outlet communicates with the inner cavity of the insulating cylinder, and the ignition through-hole communicates with the inner cavity of the insulating cylinder.

[0008] The radio frequency power module is electrically connected to the impedance matching module, and the impedance matching module is electrically connected to the first electrode in the reaction chamber.

[0009] The ignition module includes a voltage conversion unit and an ignition electrode. The voltage conversion unit is electrically connected between the radio frequency power module and the ignition electrode, and the ignition electrode is located in the ignition through hole.

[0010] Optionally, the impedance matching module includes an impedance matching unit, a protective cover, and at least one heat dissipation unit;

[0011] The impedance matching unit is located inside the protective cover, and the heat dissipation unit is located outside the protective cover;

[0012] The first end of the impedance matching unit is electrically connected to the radio frequency power module, and the second end of the impedance matching unit is electrically connected to the first electrode.

[0013] The protective cover is detachably connected to the reaction chamber.

[0014] Optionally, the remote plasma source device provided in this embodiment also includes a conductive structure;

[0015] The metal shielding cover includes a first through hole;

[0016] The first end of the conductive structure is electrically connected to the impedance matching module, and the second end of the conductive structure passes through the first through hole and is electrically connected to the first electrode.

[0017] Optionally, the remote plasma source device provided in this embodiment further includes a plurality of first connection structures and a plurality of second connection structures;

[0018] The first connection structure is used to fix the metal shielding cover to the first flange;

[0019] The second connection structure is used to fix the metal shielding cover to the second flange.

[0020] Optionally, the remote plasma source device provided in this embodiment also includes a fixed structure;

[0021] The first electrode includes a metal open ring, a first metal sheet, and a second metal sheet;

[0022] The first metal sheet is integrally connected to the metal open ring, and the second metal sheet is integrally connected to the metal open ring;

[0023] The first metal sheet and the second metal sheet are located on opposite sides of the opening of the metal opening ring;

[0024] The first metal sheet includes a fourth through hole, and the second metal sheet includes a fifth through hole;

[0025] The fixing structure passes through the fourth through hole and the fifth through hole to fix the first electrode to the outer wall side of the insulating cylinder.

[0026] Optionally, the fixing structure is conductive;

[0027] The conductive structure is located between the first metal sheet and the second metal sheet, and the fixing structure is electrically connected to the conductive structure. The conductive structure includes a sixth through hole.

[0028] The fixing structure passes through the fourth through hole, the sixth through hole and the fifth through hole in sequence to fix the first electrode to the outer wall side of the insulating cylinder.

[0029] Optionally, the first electrode may be in the shape of a hollow cylinder.

[0030] Optionally, the diameter of the insulating cylinder ranges from 4cm to 30cm;

[0031] The diameter of the metal shielding cover ranges from 10cm to 60cm;

[0032] The diameter of the insulating cylinder is smaller than the diameter of the metal shield.

[0033] Optionally, the first flange includes a first groove, and the second flange includes a second groove;

[0034] The bottom of the first groove is connected to the air inlet, and the sidewall of the first groove is in contact with a portion of the insulating cylinder near the first flange; the bottom of the second groove is connected to the air outlet, and the sidewall of the second groove is in contact with a portion of the insulating cylinder near the second flange.

[0035] According to another aspect of the present invention, a remote plasma source system is provided, which includes a gas supply device and a remote plasma source device provided in any embodiment of the present invention.

[0036] This invention provides a remote plasma source device. The metal shield in the reaction chamber can be reused as a first electrode, and the first electrode can be reused as a second electrode. The electric field generated between the metal shield and the first electrode ionizes the process gas inside the insulating cylinder into plasma. Therefore, there is no need to additionally set up a capacitor structure for ionizing the process gas inside the insulating cylinder, which simplifies the structure of the remote plasma source device, saves internal space of the insulating cylinder, and reduces the volume of the remote plasma source device. This invention improves the uniformity of the plasma and the reliability of the ionized process gas by using the capacitor structure formed by the metal shield and the first electrode. The metal shield, while reusing as the first electrode, also reduces radio frequency energy leakage. In summary, the remote plasma source device provided by this invention has a simple structure, small size, and high reliability.

[0037] It should be understood that the description in this section is not intended to identify key or essential features of the embodiments of this utility model, nor is it intended to limit the scope of this utility model. Other features of this utility model will become readily apparent from the following description. Attached Figure Description

[0038] To more clearly illustrate the technical solutions in the embodiments of this utility model, the drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0039] Figure 1 This is a schematic diagram of a remote plasma source device according to an embodiment of the present invention;

[0040] Figure 2 This is a schematic diagram of a reaction chamber without a metal shielding cover according to an embodiment of the present invention;

[0041] Figure 3 This is an exploded structural diagram of a reaction chamber according to an embodiment of the present utility model;

[0042] Figure 4 This is a schematic diagram of the structure of another remote plasma source device according to an embodiment of the present utility model;

[0043] Figure 5 for Figure 4The diagram shows an exploded view of the remote plasma source device.

[0044] Figure 6 This is a schematic diagram of a remote plasma source system provided according to an embodiment of the present utility model. Detailed Implementation

[0045] To enable those skilled in the art to better understand the present invention, the technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort should fall within the protection scope of the present invention.

[0046] It should be noted that the terms "first," "second," etc., in the specification, claims, and accompanying drawings of this utility model are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence. It should be understood that such data can be interchanged where appropriate so that the embodiments of the utility model described herein can be implemented in orders other than those illustrated or described herein. Furthermore, the terms "comprising" and "having," and any variations thereof, are intended to cover non-exclusive inclusion; for example, a process, method, system, product, or apparatus that comprises a series of steps or units is not necessarily limited to those steps or units explicitly listed, but may include other steps or units not explicitly listed or inherent to such processes, methods, products, or apparatus.

[0047] Figure 1 This is a schematic diagram of a remote plasma source device according to an embodiment of the present invention. Figure 2 This is a schematic diagram of a reaction chamber without a metal shielding cover according to an embodiment of the present invention. Figure 3 This is an exploded structural diagram of a reaction chamber according to an embodiment of the present invention, with reference to... Figure 1 The remote plasma source device provided in this embodiment includes: a radio frequency power supply module 200, an impedance matching module 300, an ignition module 400, and a reaction chamber 100. (Reference) Figure 2 and Figure 3The reaction chamber includes a first flange 110, an insulating cylinder 120, a first electrode 130, a metal shield 140, and a second flange 150. The first flange 110 includes an air inlet 101. The insulating cylinder 120 is located on one side of the first flange 110, and its inner cavity communicates with the air inlet 101. The first electrode 130 is fixed to the outer wall of the insulating cylinder 120. The metal shield 140 is located on the outer wall of the first electrode 130 away from the insulating cylinder 120, and the second flange 150 is located on the side of the insulating cylinder 120 away from the first flange 110. The metal shield 140 and the first electrode 130 are spaced apart, and the metal shield 140 is reused as the second electrode. The first electrode 130 is used to receive the output from the radio frequency power module 200. The emitted radio frequency energy, metal shield 140 and first electrode 130 are used to ionize the process gas in insulating cylinder 120 to generate plasma; second flange 150 includes an outlet 102 and an ignition through hole, the outlet 102 is connected to the inner cavity of insulating cylinder 120; ignition through hole is connected to the inner cavity of insulating cylinder 120; radio frequency power module 200 is electrically connected to impedance matching module 300, impedance matching module 300 is electrically connected to first electrode 130 in reaction chamber 100; ignition module 400 includes voltage conversion unit 410 and ignition electrode 420, voltage conversion unit 410 is electrically connected between radio frequency power module 200 and ignition electrode 420, and ignition electrode 160 in ignition module 400 is located in ignition through hole.

[0048] Specifically, when the RF power module 200 is turned on, it can send an AC voltage signal to the voltage conversion unit 410 in the ignition module 400. For example, the AC voltage signal can be 220V AC voltage. The voltage conversion unit 410 converts the AC voltage signal into a DC high-voltage signal and sends the DC high-voltage signal to the ignition electrode 420. For example, the DC high-voltage signal can reach several kilovolts, such as 1.5KV. After receiving the DC high-voltage signal, the ignition electrode 420 can more easily ionize the process gas in the inner cavity of the insulating cylinder 120, thereby shortening the ionization time of the process gas and enabling the remote plasma source device to enter the working mode more quickly. After ignition, the RF power module 200 sends RF energy to the first electrode 130 and stops sending AC voltage signals to the ignition module 400.

[0049] The output frequency of the RF power module 200 can range from 400 kHz to 40 MHz, and the output frequency of the RF power module 200 is adjustable. The RF power module 200 is used to provide RF energy to the reaction chamber 100 to ionize the process gas and generate plasma. The RF power module 200 is also used to adjust its output frequency so that the reverse power is less than the set threshold when the reverse power in the remote plasma source device exceeds a set threshold. An impedance matching module 300 is connected between the RF power module 200 and the reaction chamber 100. The impedance matching module 300 is used to achieve impedance matching between the RF power module 200 and the reaction chamber 100. The impedance matching module 300 may include a fixed capacitor and a fixed inductor connected in series, or it may include a fixed inductor and an adjustable capacitor connected in series, etc.

[0050] The first flange 110 and the second flange 150 are used together to fix the insulating cylinder 120. The connections between the first flange 110 and the insulating cylinder 120, as well as the connections between the second flange 150 and the insulating cylinder 120, are sealed. This arrangement prevents process gases and plasma inside the insulating cylinder 120 from leaking through the connections. Both the first flange 110 and the second flange 150 can be made of metallic materials. The materials of both the first flange 110 and the second flange 150 can be the same as the material of the metal shield 140.

[0051] The insulating cylinder 120, the first electrode 130, and the metal shield 140 can all be hollow cylinders. The first electrode 130 can be fixed to the outer wall of the insulating cylinder 120 by welding. Alternatively, the first electrode 130 can be an open metal ring, fixed to the outer wall of the insulating cylinder 120 by screws. The metal shield 140 can be fixedly connected to the first flange 110 and the second flange 150 by welding, or it can be detachably connected to the first flange 110 and the second flange 150 by screws. The metal shield 140 may also include multiple heat dissipation holes.

[0052] In the height direction of the insulating cylinder 120, the height of the metal shield 140 is greater than the height of the first electrode 130. The height of the first electrode 130 can be one-half or one-third of the height of the insulating cylinder 120, etc.

[0053] The remote plasma source device provided in this embodiment includes an inlet 101 and an outlet 102. The inlet 101 is used to receive process gas, such as argon. The process gas enters the insulating cylinder 120. Since the metal shield 140 surrounds the first electrode 130, when the first electrode 130 receives the radio frequency energy output from the radio frequency power module 200, the first electrode 130 and the metal shield 140 can ionize the process gas into plasma. The remote plasma source device provided in this embodiment can clean the equipment to be cleaned. For example, during cleaning, the pipeline is in a low-pressure state, with the pressure value in the range of 1 to 10 Torr or wider. Cleaning gas is introduced through the pipeline, and the radio frequency power module 500 is turned on. The radio frequency power module 500 can automatically detect the impedance change of the remote plasma source device 100. The radio frequency power module 500 and the impedance matching module 600 can realize automatic impedance matching between the radio frequency power module 500 and the remote plasma source device 100. The radio frequency power module 500 can automatically adjust the frequency when the impedance change of the remote plasma source device 100 is relatively large. Radio frequency energy is applied to the first electrode through a radio frequency cable. Since the first electrode is close to the insulating cylinder, the radio frequency excitation energy is large. Under the excitation of the radio frequency energy, the process gas inside the insulating cylinder generates high-density plasma. The plasma reacts with the valve deposits, decomposes the deposits, and the decomposed gaseous substances are extracted by an electronic pump to achieve the purpose of cleaning.

[0054] In this embodiment, the first electrode 130 and the metal shield 140 can form a capacitor structure for ionizing the process gas, eliminating the need to set up a capacitor structure for ionizing the gas again inside the insulating cylinder 120. This frees up the internal space of the insulating cylinder 120, allowing for further miniaturization of the remote plasma source device. This embodiment generates plasma by ionizing the process gas through the capacitor structure formed by the first electrode 130 and the metal shield 140. Under low-pressure conditions, this capacitor structure produces a relatively uniform plasma distribution, suitable for processes requiring large-area uniform processing.

[0055] The insulating cylinder 120 can be adjacent to the outer wall of the first electrode 130 without any gap, which allows the radio frequency energy to be transmitted to the inner cavity of the insulating cylinder 120 to generate high-density plasma. The first electrode 130 and the metal shield 140 are spaced apart and insulated from each other, and the medium between the first electrode 130 and the metal shield 140 can be air. In this embodiment, the metal shield 140 is also used to reduce radio frequency energy leakage and reduce space radiation.

[0056] This embodiment provides a remote plasma source device. By incorporating an ignition module, the ionization time of the process gas is shortened, enabling the remote plasma source device to enter operating mode more quickly. Furthermore, the metal shield in the reaction chamber is reused as a second electrode. After ignition, the electric field generated between the metal shield and the first electrode ionizes the process gas within the insulating cylinder into plasma. Therefore, there is no need for an additional capacitor structure for ionizing the process gas within the insulating cylinder, simplifying the structure of the remote plasma source device, saving internal space, and reducing its size. This embodiment improves plasma uniformity and reliability by using a capacitor structure formed by the metal shield and the first electrode to ionize the process gas. The metal shield, while reusing as a second electrode, also reduces radio frequency energy leakage. In summary, the remote plasma source device provided in this embodiment has a simple structure, small size, high reliability, and improves plasma ionization efficiency.

[0057] Optional, Figure 4 This is a structural schematic diagram of another remote plasma source device provided according to an embodiment of the present invention. Figure 5 for Figure 4 The exploded view of the remote plasma source device shown is for reference. Figure 4 and Figure 5 The impedance matching module 300 includes an impedance matching unit, a protective cover 310, and at least one heat dissipation unit 320. The impedance matching unit is located inside the protective cover 310, and the heat dissipation unit 320 is located outside the protective cover 310. The first end of the impedance matching unit is electrically connected to the radio frequency power module, and the second end of the impedance matching unit is electrically connected to the first electrode 130. The protective cover 310 is detachably connected to the reaction chamber 100.

[0058] Specifically, the impedance matching unit may include a fixed capacitor and a fixed inductor connected in series, or a fixed inductor and an adjustable capacitor connected in series. The impedance matching unit is located inside a protective cover 310, which protects the impedance matching unit from damage by external objects. The protective cover 310 may also include multiple heat dissipation holes.

[0059] The impedance matching module 300 may include two heat dissipation units 320, which are used to reduce the temperature of the impedance matching unit in the impedance matching module. The heat dissipation unit 320 may be a fan.

[0060] The voltage conversion unit 410 in the ignition module 400 can be located in the protective cover 310. The protective cover 310 includes a voltage input port. The radio frequency power module is electrically connected to the voltage input port and transmits the AC voltage signal to the voltage conversion unit 410 through the voltage input port.

[0061] Optional, continue to refer to Figure 3 The remote plasma source device provided in this embodiment also includes a conductive structure; the metal shield 140 includes a first through hole 151; the first end of the conductive structure is electrically connected to the impedance matching module, and the second end of the conductive structure passes through the first through hole 151 and is electrically connected to the first electrode 130.

[0062] Specifically, the first electrode 130 is electrically connected to the radio frequency power module, which can provide radio frequency energy to the first electrode 130. When the second electrode is grounded, the first electrode 130 can transmit radio frequency energy to the inner cavity of the insulating cylinder 120 to ionize the process gas and generate plasma.

[0063] A first through hole 151 is provided on the side wall of the metal shield 140, so that the conductive structure that electrically connects the radio frequency power module and the first electrode 130 can pass through the first through hole 151 and be electrically connected to the first electrode 130, thereby realizing the electrical connection between the first electrode 130 and the radio frequency power module.

[0064] It should be noted that the conductive structure and the metal shield 140 are mutually insulated, and the size of the first through hole 151 matches the size of the conductive structure.

[0065] Optional, continue to refer to Figure 3 The remote plasma source device provided in this embodiment also includes a plurality of first connection structures and a plurality of second connection structures (not shown in the figure); the first connection structure is used to fix the metal shield 140 on the first flange 110, and the second connection structure is used to fix the metal shield 140 on the second flange 150.

[0066] Specifically, the first connecting structure and the second connecting structure can be the same, and both the first connecting structure and the second connecting structure can be screws.

[0067] The sidewall of the first flange 110 includes multiple first threaded holes 201, the sidewall of the second flange 150 includes multiple second threaded holes 202, the area of ​​the metal shield 140 near the first flange 110 includes multiple second through holes 141, and the area of ​​the metal shield 140 near the second flange 150 includes multiple third through holes 142. Each second through hole 141 corresponds one-to-one with each first threaded hole 201, each third through hole 142 corresponds one-to-one with each second threaded hole 202, each first connecting structure corresponds one-to-one with each second through hole 141, and each second connecting structure corresponds one-to-one with each third through hole 142.

[0068] A screw (first connecting structure) can pass through the second through hole 141 and be fixed in the first screw hole 201 to fix the metal shield 140 to the first flange 110, wherein the head of the screw is located on the side of the second through hole 141 away from the first screw hole 201. A screw (second connecting structure) can pass through the third through hole 142 and be fixed in the second screw hole 202 to fix the metal shield 140 to the second flange 150, wherein the head of the screw is located on the side of the third through hole 142 away from the second screw hole 202.

[0069] In this embodiment, the metal shield 140 is detachably connected to the first flange 110 and the second flange 150 through the first connecting structure and the second connecting structure, which facilitates the disassembly and replacement of the metal shield 140 and also facilitates the fabrication of a remote plasma source device.

[0070] Optional, continue to refer to Figure 2 The remote plasma source device provided in this embodiment also includes a fixing structure (not shown in the figure); the first electrode 130 includes a metal open ring 131, a first metal sheet 132 and a second metal sheet 133; the first metal sheet 132 is integrally connected to the metal open ring 131, and the second metal sheet 133 is integrally connected to the metal open ring 131; the first metal sheet 132 and the second metal sheet 133 are located on both sides of the opening of the metal open ring 131; the first metal sheet 132 includes a fourth through hole, and the second metal sheet 133 includes a fifth through hole; the fixing structure passes through the fourth through hole and the fifth through hole to fix the first electrode 130 to the outer wall side of the insulating cylinder 120.

[0071] Specifically, the first metal sheet 132 and the second metal sheet 133 are arranged opposite to each other, both located on the outer wall side of the metal open ring 131, and both can be perpendicular to the outer wall side of the metal open ring 131. The distance between the openings of the metal open ring 131 can be much smaller than the circumference of the inner ring of the metal open ring 131. For example, the ratio of the distance between the openings of the metal open ring 131 to the circumference of the inner ring of the metal open ring 131 can be greater than 0 and less than or equal to 5%.

[0072] In this embodiment, the diameter of the metal opening ring 131 can be adjusted by regulating the distance between the first metal plate 132 and the second metal plate 133. This adjustment allows for better contact between the first electrode 130 and the outer wall of the insulating cylinder 120, and the first electrode 130 is fixed to the outer wall of the insulating cylinder 120 using a fixing structure. Therefore, this embodiment eliminates the need for welding to fix the first electrode 130 to the outer wall of the insulating cylinder 120, avoiding the welding process of welding metal onto an insulator. This reduces the difficulty of connecting the first electrode 130 to the insulating cylinder 120, thereby reducing the manufacturing difficulty of the remote plasma source device and improving manufacturing efficiency.

[0073] Optionally, the fixing structure is conductive; the conductive structure is located between the first metal sheet and the second metal sheet, and the fixing structure is electrically connected to the conductive structure. The conductive structure includes a sixth through hole; the fixing structure passes through the fourth through hole, the sixth through hole and the fifth through hole in sequence to fix the first electrode to the outer wall side of the insulating cylinder.

[0074] Specifically, the radio frequency energy in the conductive structure can be transmitted to the first electrode through the fixing structure. The fixing structure may include screws and nuts. The screws in the fixing structure can pass through the fourth through hole, the sixth through hole, and the fifth through hole in sequence, and the nuts fix the relative position between the first metal plate and the second metal plate, thereby fixing the first electrode to the outer wall side of the insulating cylinder and realizing electrical contact between the conductive structure and the fixing structure, and thus realizing electrical connection between the fixing structure and the conductive structure.

[0075] Optionally, the first electrode may be in the shape of a hollow cylinder.

[0076] Specifically, the first electrode can be fitted onto the outer wall of the insulating cylinder. The shape of the first electrode includes a hollow cylinder, which increases the relative area between the first electrode and the metal shield, thereby improving the plasma ionization effect.

[0077] Optionally, the diameter of the insulating cylinder ranges from 4cm to 30cm; the diameter of the metal shield ranges from 10cm to 60cm. Since the diameter of the insulating cylinder is smaller than that of the metal shield, the remote plasma source device provided in this embodiment is small in size and can meet the cleaning needs of devices to be cleaned at specific locations.

[0078] Specifically, the diameter of the insulating cylinder can be 4cm, 5cm, 6cm, 10cm, 15cm, 18cm, 20cm, 25cm, or 30cm, etc. The diameter of the metal shielding cover can be 10cm, 12cm, 30cm, 40cm, 50cm, 55cm, or 60cm, etc.

[0079] Optional, continue to refer to Figure 2 The first flange 110 includes a first groove, and the second flange 150 includes a second groove; the bottom of the first groove is connected to the air inlet 101, and the sidewall of the first groove is in contact with a portion of the insulating cylinder 120 near the first flange 110; the bottom of the second groove is connected to the air outlet 102, and the sidewall of the second groove is in contact with a portion of the insulating cylinder 120 near the second flange 150.

[0080] Specifically, a first groove is provided in the first flange 110 and a second groove is provided in the second flange 150. The first and second grooves can better fix the insulating cylinder 120, improve the airtightness of the connection between the first flange 110 and the insulating cylinder 120, and improve the airtightness of the connection between the second flange 150 and the insulating cylinder 120.

[0081] Figure 6 This is a schematic diagram of a remote plasma source system according to an embodiment of the present invention, with reference to... Figure 6 The remote plasma source system provided in this embodiment includes a gas supply device 1100 and a remote plasma source device 1200 provided in any embodiment of this utility model.

[0082] Specifically, the gas supply device 1100 can supply process gas to the reaction chamber in the remote plasma source device. The type of process gas can be at least one of argon, helium, oxygen, nitrogen, hydrogen, CF4, SF6, NF3, ammonia, methane, acetylene, carbon monoxide, carbon dioxide, water vapor, chlorine, fluorine, xenon, krypton, etc.

[0083] The remote plasma source device provided in this embodiment includes the remote plasma source device 1200 provided in any embodiment of this utility model. Therefore, it has the beneficial effects of the remote plasma source device 1200 provided in any embodiment of this utility model, which will not be described in detail here.

[0084] It should be understood that the various forms of the process shown above can be used, with steps reordered, added, or deleted. For example, the steps described in this utility model can be executed in parallel, sequentially, or in different orders, as long as the desired result of the technical solution of this utility model can be achieved, and this is not limited herein.

[0085] The specific embodiments described above do not constitute a limitation on the scope of protection of this utility model. Those skilled in the art should understand that various modifications, combinations, sub-combinations, and substitutions can be made according to design requirements and other factors. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of this utility model should be included within the scope of protection of this utility model.

Claims

1. A remote plasma source device, characterized by, include: RF power supply module, impedance matching module, ignition module, and reaction chamber; The reaction chamber includes a first flange, an insulating cylinder, a first electrode, a metal shield, and a second flange. The first flange includes an air inlet. The insulating cylinder is located on one side of the first flange, and its inner cavity communicates with the air inlet. The first electrode is fixed to the outer wall of the insulating cylinder. The metal shield is located on the outer wall of the first electrode away from the insulating cylinder, and the second flange is located on the side of the insulating cylinder away from the first flange. The metal shield and the first electrode are spaced apart, and the metal shield is reused as the second electrode. The first electrode is used to receive radio frequency energy output by the radio frequency power module. The metal shield and the first electrode are used to ionize the process gas inside the insulating cylinder to generate plasma. The second flange includes an air outlet and an ignition through-hole. The air outlet communicates with the inner cavity of the insulating cylinder, and the ignition through-hole communicates with the inner cavity of the insulating cylinder. The radio frequency power module is electrically connected to the impedance matching module, and the impedance matching module is electrically connected to the first electrode in the reaction chamber. The ignition module includes a voltage conversion unit and an ignition electrode. The voltage conversion unit is electrically connected between the radio frequency power module and the ignition electrode, and the ignition electrode is located in the ignition through hole.

2. The remote plasma source device of claim 1, wherein, The impedance matching module includes an impedance matching unit, a protective cover, and at least one heat dissipation unit. The impedance matching unit is located inside the protective cover, and the heat dissipation unit is located outside the protective cover; The first end of the impedance matching unit is electrically connected to the radio frequency power module, and the second end of the impedance matching unit is electrically connected to the first electrode. The protective cover is detachably connected to the reaction chamber.

3. The remote plasma source device of claim 1, wherein, It also includes conductive structures; The metal shielding cover includes a first through hole; The first end of the conductive structure is electrically connected to the impedance matching module, and the second end of the conductive structure passes through the first through hole and is electrically connected to the first electrode.

4. The remote plasma source device of claim 1, wherein, It also includes multiple first connection structures and multiple second connection structures; The first connection structure is used to fix the metal shielding cover to the first flange; The second connection structure is used to fix the metal shielding cover to the second flange.

5. The remote plasma source device of claim 3, wherein, It also includes fixed structures; The first electrode includes a metal open ring, a first metal sheet, and a second metal sheet; The first metal sheet is integrally connected to the metal open ring, and the second metal sheet is integrally connected to the metal open ring; The first metal sheet and the second metal sheet are located on opposite sides of the opening of the metal opening ring; The first metal sheet includes a fourth through hole, and the second metal sheet includes a fifth through hole; The fixing structure passes through the fourth through hole and the fifth through hole to fix the first electrode to the outer wall side of the insulating cylinder.

6. The remote plasma source device of claim 5, wherein, The fixed structure is conductive; The conductive structure is located between the first metal sheet and the second metal sheet, and the fixing structure is electrically connected to the conductive structure. The conductive structure includes a sixth through hole. The fixing structure passes through the fourth through hole, the sixth through hole and the fifth through hole in sequence to fix the first electrode to the outer wall side of the insulating cylinder.

7. The remote plasma source device according to claim 1, characterized in that, The first electrode has the shape of a hollow cylinder.

8. The remote plasma source device according to claim 1, characterized in that, The diameter of the insulating cylinder ranges from 4cm to 30cm; The diameter of the metal shielding cover ranges from 10cm to 60cm; The diameter of the insulating cylinder is smaller than the diameter of the metal shield.

9. The remote plasma source device according to any one of claims 1-8, characterized in that, The first flange includes a first groove, and the second flange includes a second groove; The bottom of the first groove is connected to the air inlet, and the sidewall of the first groove is in contact with a portion of the insulating cylinder near the first flange; the bottom of the second groove is connected to the air outlet, and the sidewall of the second groove is in contact with a portion of the insulating cylinder near the second flange.

10. A remote plasma source system, characterized in that, It includes a gas supply device and a remote plasma source device as described in any one of claims 1-9.

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