A protection device for isostatic pressing graphite baking furnace for semiconductor

By using a rotary drum in an isostatic graphite calcining furnace, the graphite rods are made to roll in the loading trough, which solves the problems of uneven calcination and cracking, and achieves the effects of uniform heating and crack prevention.

CN224415739UActive Publication Date: 2026-06-26ACER HIGH-TECH MATERIALS (NINGXIA) CO LTD

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
ACER HIGH-TECH MATERIALS (NINGXIA) CO LTD
Filing Date
2025-06-30
Publication Date
2026-06-26

AI Technical Summary

Technical Problem

In the semiconductor manufacturing process, the uneven calcination and cracking of isostatic graphite materials are particularly problematic, especially when multiple materials are calcined simultaneously. Materials far from the flame calcinate slowly, and prolonged contact with the flame leads to excessive temperature differences, making them prone to cracking.

Method used

A protective device for an isostatic graphite calcination furnace for semiconductors is adopted, including a mandrel, a rotating drum, and a retaining ring. The rotation of the rotating drum causes the isostatic graphite rod to roll in the placement groove, and the flame is used for calcination in a circulating manner to ensure uniform heating and prevent cracking.

Benefits of technology

It achieves uniform heating of isostatically pressed graphite materials, avoids cracking, and improves production efficiency and protection effect.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model discloses a kind of isostatic pressing graphite baking furnace protection devices for semiconductor, comprising: mandrel, rotary drum and baffle ring, the mandrel concentrically arranged in the inside of rotary drum, the outer wall of rotary drum is recessed and is provided with the length direction of rotary drum along extension's insertion slot, the isostatic pressing graphite bar stock can be rollably arranged in insertion slot, the baffle ring is spaced on the outer wall of rotary drum and is set in the length direction of rotary drum.The semiconductor isostatic pressing graphite baking furnace protection device described in the utility model can be switched with the rotation of rotary drum, and the flame of combustion device is recycled to carry out baking, the isostatic pressing graphite bar stock is rolled in insertion slot due to gravity, improve heating uniformity, avoid the cracking of isostatic pressing graphite material.
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Description

Technical Field

[0001] This utility model relates to the field of isostatic graphite calcination technology, and in particular to a protection device for an isostatic graphite calcination furnace for semiconductors. Background Technology

[0002] The production process of isostatic graphite for semiconductors involves grinding, isostatic pressing, calcination, and graphitization. Calcination requires a high temperature of 1200℃ to remove moisture and other volatile components from the isostatic graphite raw material, thereby improving the purity and density of the isostatic graphite material.

[0003] To reduce energy consumption, isostatic graphite calcination furnaces often use flames generated by igniting gas to heat and calcine the isostatic graphite. For example, the invention patent with announcement number CN116892831B discloses a pressure calcination furnace for preparing isostatic graphite for semiconductor large silicon wafer manufacturing, which uses a combustion device to ignite gas and heat and calcine the isostatic graphite through flames.

[0004] In actual production, to improve efficiency, multiple isostatically pressed graphite materials need to be placed in a calcining furnace and calcined simultaneously. However, the isostatically pressed graphite materials cannot move within the furnace, resulting in slower calcination rates for those materials further away from the flame, and uneven heating among the multiple materials. Furthermore, the side of the isostatically pressed graphite material facing the flame heats up faster, and prolonged flame calcination can easily lead to excessive temperature differences on both sides of a single isostatically pressed graphite material, causing cracking. Improvements are needed to address this issue. Utility Model Content

[0005] The purpose of this invention is to provide a protective device for an isostatic graphite calcination furnace for semiconductors, which improves heating uniformity and protection effect, and prevents cracking of isostatic graphite materials.

[0006] To achieve this objective, the present invention adopts the following technical solution:

[0007] A protective device for an isostatic graphite calcination furnace for semiconductors, used to protect isostatic graphite rods during calcination, includes: a mandrel, a rotating drum, and retaining rings. The mandrel is concentrically arranged inside the rotating drum. An insertion groove extending along the length of the rotating drum is recessed on the outer wall of the rotating drum. The isostatic graphite rod is rotatably arranged in the insertion groove. The retaining rings are spaced along the length of the rotating drum on the outer wall of the rotating drum.

[0008] The rotating drum is provided with connecting sleeves that are fitted onto the spindle at intervals.

[0009] A connecting rod is provided between the outer circle of the connecting sleeve and the inner wall of the rotating cylinder.

[0010] The insertion slots are arranged in a ring array on the outer wall of the rotating cylinder.

[0011] The cross-sectional length of the insertion groove is greater than the diameter of the isostatically pressed graphite rod.

[0012] The cross-sectional width of the insertion groove is not less than the diameter of the isostatically pressed graphite rod.

[0013] The beneficial effects of this utility model are as follows: A protective device for an isostatic graphite calcination furnace for semiconductors allows the isostatic graphite rods in the placement tank to switch as the drum rotates, cyclically utilizing the flame of the combustion device for calcination. This avoids the problem of a single isostatic graphite rod being in contact with the flame for an extended period, ensuring that other isostatic graphite rods also have the opportunity to contact the flame, thus ensuring the heating effect. Furthermore, during the rotation of the drum, the isostatic graphite rods tumble in the placement tank due to gravity, which facilitates switching the surface in contact with the flame, improving heating uniformity, preventing cracking of the isostatic graphite material, and strengthening the crack protection against cracking of the isostatic graphite material. Attached Figure Description

[0014] Figure 1 This is a schematic diagram of the structure of this utility model;

[0015] Figure 2 yes Figure 1 The left view. Detailed Implementation

[0016] The following is combined with Figures 1 to 2 The technical solution of this utility model will be further illustrated through specific embodiments.

[0017] like Figure 1 The protective device for the isostatic graphite calcining furnace shown is used to protect the isostatic graphite rod 6 during calcination. It includes a mandrel 3, a rotating drum 1, and a retaining ring 7. The mandrel 3 is concentrically arranged inside the rotating drum 1, which is horizontally placed inside the calcining furnace. The rotation of the mandrel 3 is driven by a motor located outside the calcining furnace.

[0018] The rotating drum 1 is provided with connecting sleeves 2 that are fitted onto the mandrel 3 at intervals. A connecting rod 4 is provided between the outer circle of the connecting sleeve 2 and the inner wall of the rotating drum 1 to maintain the distance between the inner wall of the rotating drum 1 and the outer wall of the mandrel 3. During the rotation of the mandrel 3, the rotation of the rotating drum 1 is driven by the connecting sleeves 2 and the connecting rod 4.

[0019] An insertion groove 5 extending along the length of the rotating cylinder 1 is recessed on the outer wall of the rotating cylinder 1. The isostatic graphite rod 6 is rotatably disposed in the insertion groove 5. The isostatic graphite rod 6 can be inserted from one end of the insertion groove 5, making loading and unloading convenient.

[0020] In this embodiment, the cross-sectional length of the insertion groove 5 is greater than the diameter of the isostatic graphite rod 6, and the cross-sectional width of the insertion groove 5 is not less than the diameter of the isostatic graphite rod 6. The large cross-sectional length of the insertion groove 5 allows the isostatic graphite rod 6 to tumble due to gravity during the rotation of the rotating drum 1, switching the surface in contact with the flame, improving heating uniformity, avoiding cracking of the isostatic graphite material 6, and effectively strengthening the crack protection of the isostatic graphite material 6.

[0021] like Figure 1 As shown, a fixed plate 8 is provided in the calcining furnace, located below or to one side of the rotating drum 1. A combustion device 9 is provided on the fixed plate 8 at intervals, pointing towards the rotating drum 1. The flame is injected into the insertion groove 5 through the combustion device 9 to heat the isostatically pressed graphite rod 6 in the insertion groove 5.

[0022] like Figure 2 As shown, the retaining rings 7 are spaced along the length of the rotating cylinder 1 on the outer wall of the rotating cylinder 1 to limit the isostatically pressed graphite rods 6 placed in the groove 5, and to prevent the isostatically pressed graphite rods 6 from flying out of the groove 5 during the rotation of the rotating cylinder 1.

[0023] In this embodiment, multiple insertion slots 5 are arranged in a ring array on the outer wall of the rotating drum 1, which can simultaneously place multiple isostatic graphite rods 6. The rotating drum 1 is used for circulating flame calcination, which improves production efficiency.

[0024] The above description is only a preferred embodiment of this utility model. For those skilled in the art, there will be changes in the specific implementation method and application scope based on the idea of ​​this utility model. The content of this specification should not be construed as a limitation of this utility model.

Claims

1. A protective device for an isostatic pressing graphite calcination furnace for semiconductors, used for protection during the calcination of isostatic pressing graphite rods, characterized in that, include: The mandrel, the rotating cylinder, and the retaining rings are provided. The mandrel is concentrically arranged on the inner side of the rotating cylinder. The outer wall of the rotating cylinder is recessed and has an insertion groove extending along the length of the rotating cylinder. The isostatically pressed graphite rod is rotatably arranged in the insertion groove. The retaining rings are spaced along the length of the rotating cylinder on the outer wall of the rotating cylinder.

2. The isostatic pressing graphite baking furnace protection device for semiconductor according to claim 1, characterized by The rotating drum is provided with connecting sleeves that are fitted onto the mandrel at intervals.

3. The isostatic pressing graphite baking furnace protection device for semiconductor according to claim 2, characterized by A connecting rod is provided between the outer circle of the connecting sleeve and the inner wall of the rotating cylinder.

4. The isostatic pressing graphite baking furnace protection device for semiconductor according to claim 1, characterized by The insertion slots are arranged in a ring array on the outer wall of the rotating cylinder.

5. The isostatic pressing graphite baking furnace protection device for semiconductor according to claim 1, characterized by The cross-sectional length of the insertion groove is greater than the diameter of the isostatically pressed graphite rod.

6. The isostatic pressing graphite baking furnace protection device for semiconductor according to claim 1, characterized by The cross-sectional width of the insertion groove is not less than the diameter of the isostatically pressed graphite rod.