A multifunctional high-efficiency boron-fluorine ion implantation chamber

By introducing a curved gradient flow guiding structure and a multi-layer sealing assembly into the boron-fluorine ion implantation chamber, the problems of uneven ion distribution and poor chamber airtightness were solved, achieving efficient boron-fluorine ion implantation and improving the yield and process adaptability of semiconductor devices.

CN224519869UActive Publication Date: 2026-07-17JIANGYIN AIJIEXIN VACUUM TECH CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
JIANGYIN AIJIEXIN VACUUM TECH CO LTD
Filing Date
2025-08-04
Publication Date
2026-07-17

AI Technical Summary

Technical Problem

Existing high-efficiency boron-fluorine ion implantation chambers suffer from uneven ion distribution, poor chamber airtightness, and insufficient functional scalability, which affect the yield and process stability of semiconductor devices.

Method used

The internal injection components with curved gradient flow guiding structure, multi-layer sealing components, and quick-release multi-functional interface design ensure uniform ion distribution and improve chamber airtightness and compatibility.

Benefits of technology

This method achieves uniform distribution of boron and fluorine ions, improves the doping consistency of semiconductor materials, enhances the airtightness and functional adaptability of the chamber, and improves the device manufacturing yield and production line process switching efficiency.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model relates to semiconductor ion implantation equipment technical field, and disclose a kind of multi-functional high-efficiency boron fluoride ion implantation chamber, including support connecting mechanism, sealing assembly, support connecting mechanism contains chamber main body, internal injection component, multifunctional component assembly interface, upper sealing ring assembly groove, side sealing ring assembly groove, top connecting hole, top auxiliary sealing ring assembly groove, side fixed base, assembly interface sealing ring assembly groove, through slot, toughened glass sheet.The utility model is through the curved surface gradual change flow guide structure of internal injection component, boron fluoride ion distribution in chamber is accurately controlled, ion distribution uniformity is significantly improved, guarantee semiconductor material doping consistency, effectively improve device manufacturing yield, adapt high-precision semiconductor process demand.
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Claims

1. A multifunctional high-efficiency boron-fluorine ion implantation chamber, comprising a support and connection mechanism (1) and a sealing assembly (2), wherein the support and connection mechanism (1) comprises a chamber body (11), an internal implantation assembly (12), a multifunctional assembly interface (13), an upper sealing ring assembly groove (14), a side sealing ring assembly groove (15), a top connection hole (16), a top auxiliary sealing ring assembly groove (17), a side fixing seat (18), an assembly interface sealing ring assembly groove (19), a through groove (110), and a tempered glass sheet (111); wherein the sealing assembly (2) comprises a main sealing ring (21), an auxiliary sealing gasket (22), a connection hole adapter through hole (23), a side sealing gasket (24), and a small sealing gasket (25); Its features are: The upper side of the chamber body (11) is provided with an internal injection component (12) for boron-fluorine ion implantation reaction, and the lower outer side of the chamber body (11) is provided with multiple multifunctional component assembly interfaces (13) at equal angles. The top opening of the chamber body (11) is provided with an upper sealing ring assembly groove (14), the side opening of the internal injection component (12) is provided with a side sealing ring assembly groove (15), the top opening of the chamber body (11) is provided with four top connection holes (16) at equal angles, the top auxiliary sealing ring assembly groove (17) is provided on the outer periphery of the top connection hole (16) of the chamber body (11), and the side of the chamber body (11) is provided with an assembly interface sealing ring assembly groove (19) on the outer periphery of the multi-functional component assembly interface (13). The main sealing ring (21) is adapted to the upper sealing ring assembly groove (14), the side sealing gasket (24) is adapted to the side sealing ring assembly groove (15), the auxiliary sealing gasket (22) is adapted to the top auxiliary sealing ring assembly groove (17), the small sealing gasket (25) is matched with the assembly interface sealing ring assembly groove (19), and the connecting hole adapted to the through hole (23) is opened between the upper and lower side walls of the auxiliary sealing gasket (22) and corresponds to the top connecting hole (16).

2. The multi-functional high efficiency borofluoride ion implantation chamber according to claim 1, wherein: The internal injection component (12) is a curved gradient flow guide structure.

3. The multi-functional high efficiency borofluoride ion implantation chamber as claimed in claim 1, wherein: The multi-functional component assembly interface (13) adopts a quick-release interface standard design.

4. The multi-functional high efficiency borofluoride ion implantation chamber as claimed in claim 1, wherein: The through groove (110) is located on the other side above the main body of the chamber (11), and the tempered glass sheet (111) is installed in the through groove (110).

5. The multi-functional high efficiency borofluoride ion implantation chamber as claimed in claim 1, wherein: The side fixing seat (18) is located around the inner injection component (12) and is set at an equal angle. The side fixing seat (18) is provided with M6 bolt holes.

6. The multi-functional high efficiency borofluoride ion implantation chamber as claimed in claim 1, wherein: The main sealing ring (21), side sealing gasket (24), auxiliary sealing gasket (22) and small sealing gasket (25) are all made of fluororubber.

7. The multi-functional high efficiency borofluoride ion implantation chamber as claimed in claim 1, wherein: The diameter tolerance of the top connecting hole (16) and the connecting hole adapter through hole (23) is controlled within ±0.03mm.