Apparatus for treating sulfuric acid aerosol and gas-phase molecular contaminants

Abstract

The utility model provides a device for handling sulfuric acid gas gel and gas suspension molecular pollutant, the device includes at least one particle pretreatment groove and at least one filter groove, when waste gas flow enters particle pretreatment groove, through micron spray means, the particle that waste gas flow contains with sulfuric acid gas gel and gas suspension molecular pollutant is prompted to grow after its particle through nucleation, condensation and solidification mechanism, then waste gas flow enters filter groove, and the waste gas flow treated through particle pretreatment groove is cleaned with wet type washing technology, the device can effectively remove the solid, liquid, gas gel state such as sulfuric acid gas gel and gaseous pollutant suspended in the airflow generated in semiconductor technology.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor manufacturing technology, and in particular to an apparatus for treating sulfuric acid aerosols and suspended molecular contaminants. Background Technology

[0002] Semiconductor manufacturing processes often utilize large quantities of acidic and alkaline solutions and organic solvents for etching or cleaning. Some of these chemicals are collected by the exhaust system due to natural evaporation or emission. As industry capacity increases, the amount of waste gas generated during manufacturing also increases. These chemicals may escape into the work environment, affecting personnel health and product yield, and may also cause serious air pollution through emission pipes, collectively known as airborne molecular contamination (AMC). Some cleaning solutions used in semiconductor cleaning processes, such as SC-1 (APM) solution, SC-2 (HPM) solution, DHF solution, BHF solution, and SPM solution, can generate airborne molecular contaminants.

[0003] SC-1 (APM) solution is a mixture of NH4OH, H2O2, and H2O. It removes particulate matter and organic matter through the oxidation of particles or electrostatic repulsion. The main reaction mechanism is as follows: hydrogen peroxide (H2O2) acts as a strong oxidant, oxidizing the particles and the wafer surface. This oxide layer forms on the particles, causing them to peel off (breaking the adhesion between the particles and the chip surface), further eroding and decomposing them in the ammonia (NH4OH) solution. The oxide layer formed on the wafer surface after oxidation prevents particles from re-contacting the wafer surface. In addition, SC-1 solution can also remove particles through electrostatic repulsion. NH4OH in the solution releases (OH-) - And slightly etch the wafer surface, causing a slight roughness on the wafer surface, this OH - Ions cause the wafer surface and microparticles to become negatively charged. Because both are negatively charged, the microparticles are expelled from the wafer surface. In typical SC-1, the ratio of NH4OH:H2O2:H2O is 0.05–1:1:5, and the temperature is 70–90℃. Substances suspended in the gas stream will generate NH4OH. + / NH3,NH4 + The ratio of NH3 to humidity depends on the pH level of the environment, as shown in the following reaction formula:

[0004]

[0005] SC-2 (HPM) solution is a mixture of HCl, H₂O₂, and H₂O. Because metal chlorides are readily soluble in water, the SC-2 process first oxidizes the metal with hydrogen peroxide (H₂O₂), then reacts with the metal ions using HCl (hydrochloric acid) to generate soluble chlorides, thereby removing metal impurities. In the process, the ratio of HCl:H₂O₂:H₂O is 1:1:6, the temperature is 70°C, and the resulting substances suspended in the gas stream will produce Cl₂, HCl, and HOCl, as shown in the following reaction equation:

[0006] HCl + H₂O₂ → HOCl + H₂O

[0007]

[0008] DHF solution is a mixture of HF and H2O, while BHF solution is a mixture of HF, NH4F, and H2O. Both are used to remove oxide layers from wafer surfaces. Diluted hydrofluoric acid (HF) is typically used at a concentration of 0.5 wt.% to 2 wt.%; alternatively, a buffer solution of HF and ammonium fluoride (NH4F) at a ratio of HF:NH4F = 1:200 to 400 is used for etching silicon oxide with photoresist patterns. The addition of NH4F effectively buffers strong acids and bases, suppressing significant changes in pH and stabilizing the process. DHF derivatives will produce HF, while BHF will simultaneously produce NH4F. + / NH3 plus HF.

[0009] SPM solution is a mixture of H2SO4 and H2O2. This cleaning process involves removing the photoresist with ozone plasma followed by sulfuric acid cleaning. Since the main components of photoresist are hydrocarbon organic compounds, such as 1,2-propanediol methyl ether acetate (PGMEA) or resin, when sulfuric acid (H2SO4) and hydrogen peroxide (H2O2) are mixed, persulfate (H2SO5), also known as piranha acid or caro's acid, is generated. Its strong oxidizing and dehydrating properties effectively break carbon-hydrogen bonds (CH2O2). x- This process removes organic impurities. Typically, the H2SO4 / H2O2 ratio is 2–4:1, and the process temperature is 120–180°C. The substances suspended in the gas stream will then produce H2SO4 and H2SO5, as shown in the following reaction formula:

[0010]

[0011] H2SO5 is relatively unstable. In addition to its reversible decomposition into H2SO4 and H2O2, it may also decompose into H2SO4 and O2, as shown in the following reaction formula:

[0012] H₂SO₅ → H₂SO₄ + 1 / 2O₂

[0013] Because the process temperature is below 200℃, not only gaseous H2SO4, but also sulfuric acid aerosol tends to condense as the flue gas temperature decreases, forming the well-known sulfuric acid aerosol, which is not only difficult to detect but also difficult to remove.

[0014] Known technologies all utilize the solubility of pollutants in water to separate and remove AMCs from waste gases. These technologies can be categorized into chemical scrubbing (chemical reaction) and physical scrubbing (solubility). There are numerous types of AMCs. For acidic and alkaline waste gases, chemical scrubbing is typically used, requiring the addition of acid or alkali solutions to the water to increase removal efficiency through acid-base neutralization. However, this method is ineffective for removing sulfuric acid aerosols. Currently, scrubbing devices are often introduced to treat pollutants (acids, alkalis, and organic matter) in waste gases. While previous technologies have shown good removal efficiency for acidic and alkaline pollutants, they have consistently failed to achieve satisfactory results in removing aerosol pollutants and organic gases. Utility Model Content

[0015] This invention provides an apparatus for treating sulfuric acid aerosols and suspended molecular pollutants. The invention employs micron-level spraying to induce the growth of particles containing sulfuric acid aerosols and suspended molecular pollutants in the waste gas stream through nucleation, aggregation, and solidification mechanisms. Wet scrubbing technology is then used to clean the waste gas stream, effectively removing solid, liquid, and aerosol-like pollutants, such as sulfuric acid aerosols and gaseous pollutants, suspended in the gas stream during semiconductor manufacturing processes.

[0016] According to a first aspect of the present invention, the device can process and remove sulfuric acid aerosols and suspended molecular pollutants contained in one or more airflows. It includes at least one air inlet, one air outlet, at least one particulate pretreatment tank, and at least one filter tank. The particulate pretreatment tank is provided with a plurality of atomizing nozzles, and the filter tank includes at least one packing unit with a plurality of nozzles and a demister layer. At least one airflow sequentially passes through the at least one air inlet, the particulate pretreatment tank, the packing unit of the filter tank, and the demister layer, and exits the device from the air outlet. The atomizing nozzles of the particulate pretreatment tank are configured to spray high-pressure atomized spray liquid toward the at least one airflow, wherein the spray angle of the atomizing nozzles is set to 20 to 70 degrees and the spray liquid height of the atomizing nozzles is set to 10 to 1000 cm, so that the particles in the at least one airflow grow from a particle size of 0.1-2.5 micrometers to 50-100 micrometers; the nozzles are disposed between the packing unit and the demister layer, and the distance between the nozzles and the packing unit is 10 to 40 cm. The nozzles are configured to spray washing liquid toward the packing unit and the at least one airflow that has been treated by the particulate pretreatment tank through the packing unit at a spray angle of 60 to 150 degrees to clean the at least one airflow, thereby removing sulfuric acid aerosols, suspended molecular contaminants and other impurities in the at least one airflow.

[0017] In one embodiment of the above-described device of the present invention, the filter tank further includes another packing unit disposed between the packing unit and the demisting layer. The other packing unit is provided with several other nozzles disposed between the other packing unit and the demisting layer, and the distance between the other nozzles and the other packing unit is 10 to 40 centimeters. The other nozzles are configured to spray another washing liquid toward the other packing unit and the at least one airflow passing through the other packing unit at a spray angle of 60 to 150 degrees.

[0018] In one embodiment of the device described above, the flow direction of the at least one airflow through the particle pretreatment tank is opposite to the spray direction of the high-pressure atomized spray liquid, thereby increasing the contact time between the at least one airflow and the high-pressure spray liquid. Furthermore, the flow direction of the at least one airflow through the filter tank is opposite to the spray direction of the washing liquid and / or the other washing liquid. In this way, the contact time between the at least one airflow and the washing liquid and / or the other washing liquid can be extended.

[0019] In one embodiment of the above-described device of this utility model, the high-pressure atomizing spray liquid contains water or an alkaline solution with a pH value of 8 to 13.

[0020] In one embodiment of the above-described device of this utility model, the washing liquid and / or another washing liquid contains water or an alkaline solution with a pH value of 8 to 13.

[0021] In one embodiment of the above-described device of the present invention, the washing liquid includes circulating water and the other washing liquid includes fresh water; wherein the circulating water refers to water that flows continuously and is reused inside the device.

[0022] In one embodiment of the above-described device of the present invention, the washing liquid includes circulating water and the other washing liquid includes a mixture of fresh water and circulating water; wherein the circulating water refers to water that flows continuously and is reused inside the device.

[0023] In one embodiment of the above-described device of this utility model, the filler unit and / or the other filler unit comprises chemically synthesized fibers with added antibacterial components. The chemically synthesized fibers include, but are not limited to, any one or any combination of two or more of the following: polyester, nylon, and polyurethane fibers (Spandex); the antibacterial components include, but are not limited to, any one or any combination of two or more of the following: polystyrene, polyacrylonitrile, polyethylene, polypropylene, polyester, polyurethane, and polyamide.

[0024] In one embodiment of the above-described device of this utility model, the content of the antibacterial component is 1 wt.% to 10 wt.%.

[0025] In one embodiment of the above-described device of this utility model, the demisting layer comprises Al added. x Si y O z The chemically synthesized fiber of the catalyst includes, but is not limited to, any one or a combination of two or more of the following: polyester, nylon and polyurethane fibers (Spandex).

[0026] In one embodiment of the above-described device of this utility model, the Al within the demisting layer x Si y O z The catalyst content is 1 wt.% to 10 wt.%.

[0027] According to a second aspect of the present invention, an apparatus for treating and removing sulfuric acid aerosols and suspended molecular contaminants contained in one or more airflows includes at least one air inlet, one air outlet, a first particulate pretreatment tank, a first filter tank, a second particulate pretreatment tank, and a second filter tank. The first particulate pretreatment tank is provided with a plurality of first atomizing nozzles. The first filter tank includes at least one first packing unit provided with a plurality of first nozzles and a first demister layer. The second particulate pretreatment tank is provided with a plurality of second atomizing nozzles, and the second filter tank includes at least one second packing unit provided with a plurality of second nozzles and a second demister layer. At least one airflow sequentially passes through the at least one air inlet, through the first particulate pretreatment tank, the first packing unit and the first demister layer of the first filter tank, the second particulate pretreatment tank, the second packing unit and the second demister layer of the second filter tank, and exits the apparatus from the air outlet. The first atomizing nozzles of the first particle pretreatment tank are configured to spray a first high-pressure atomized spray liquid toward the at least one airflow, wherein the spray angle of the first atomizing nozzles is set to 20 to 70 degrees and the spray liquid height of the first atomizing nozzles is set to 10 to 1000 cm, so that the particles in the at least one airflow grow from a particle size of 0.1-2.5 micrometers to 50-100 micrometers. The first nozzles are disposed between the first packing unit and the first demisting layer, and the distance between the first nozzles and the first packing unit is 10 to 40 cm. The first nozzles are configured to spray a first washing liquid at a spray angle of 60 to 150 degrees toward the first packing unit and the at least one airflow that has been treated by the first particle pretreatment tank after passing through the first packing unit, so as to clean the at least one airflow. The second atomizing nozzles of the second particle pretreatment tank are configured to spray a second high-pressure atomized spray liquid toward the at least one airflow flowing into the second particle pretreatment tank, wherein the spray angle of the second atomizing nozzles is set to 20 to 70 degrees and the height of the second high-pressure atomized spray liquid is set to 10 to 1000 cm, so that the particles in the at least one airflow grow from a particle size of 0.1-2.5 micrometers to 50-100 micrometers. The second nozzles are disposed between the second packing unit and the second demister layer, and the distance between the second nozzles and the second packing unit is 10 to 40 centimeters. The second nozzles are configured to spray the second washing liquid at a spray angle of 60 to 150 degrees toward the second packing unit and the at least one airflow that has been treated by the second particle pretreatment tank through the second packing unit, so as to further clean the at least one airflow and remove sulfuric acid aerosols, suspended molecular contaminants and other impurities in the at least one airflow.

[0028] In one embodiment of the above-described device of this utility model, the first filter tank includes a third packing unit disposed between the first packing unit and the first demisting layer. The third packing unit is provided with a plurality of third nozzles disposed between the third packing unit and the first demisting layer, and the distance between the third nozzles and the third packing unit is 10 to 40 centimeters. The third nozzles are configured to spray a third washing liquid at a spray angle of 60 to 150 degrees toward the third packing unit and the at least one airflow passing through the third packing unit. The second filter tank includes a fourth packing unit disposed between the second packing unit and the second demisting layer. The fourth packing unit is provided with a plurality of fourth nozzles disposed between the fourth packing unit and the second demisting layer, and the distance between the fourth nozzles and the fourth packing unit is 10 to 40 centimeters. The fourth nozzles are configured to spray a fourth washing liquid at a spray angle of 60 to 150 degrees toward the fourth packing unit and the at least one airflow passing through the fourth packing unit.

[0029] In one embodiment of the above-described device of this utility model, the first high-pressure atomizing spray liquid and the second high-pressure atomizing spray liquid contain water or an alkaline solution with a pH value of 8 to 13.

[0030] In one embodiment of the above-described device of this utility model, the first washing liquid, the second washing liquid, the third washing liquid, and the fourth washing liquid contain water or an alkaline solution with a pH value of 8 to 13.

[0031] In one embodiment of the above-described device of this utility model, the flow direction of the at least one airflow through the first particle pretreatment tank, the first filter tank, the second particle pretreatment tank and the second filter tank is opposite to the spraying direction of the first high-pressure atomized spray liquid, the first washing liquid, the second high-pressure atomized spray liquid and the second washing liquid.

[0032] In one embodiment of the device described above, the flow direction of the at least one airflow through the first particle pretreatment tank, the first filter tank, the second particle pretreatment tank, and the second filter tank is opposite to the spraying direction of the first high-pressure atomized spray liquid, the first washing liquid, the second washing liquid, the second high-pressure atomized spray liquid, the third washing liquid, and the fourth washing liquid. In this way, the contact time between the at least one airflow and the spray liquids and / or the washing liquids can be extended.

[0033] In one embodiment of the above-described device of this utility model, the first packing unit, the second packing unit, the third packing unit, and the fourth packing unit comprise chemically synthesized fibers with added antibacterial components. The chemically synthesized fibers comprise, but are not limited to, any one or any combination of two or more of the following: polyester, nylon, and polyurethane fibers (Spandex); the antibacterial components are selected from any one or any combination of two or more of the following: polystyrene, polyacrylonitrile, polyethylene, polypropylene, polyester, polyurethane, and polyamide.

[0034] In one embodiment of the above-described device of this utility model, the first demisting layer and the second demisting layer contain added Al x Si y O z The chemically synthesized fiber of the catalyst includes, but is not limited to, any one or a combination of two or more of the following: polyester, nylon and polyurethane fibers (Spandex).

[0035] Compared with the prior art, the technical solution of this utility model has the following beneficial effects:

[0036] This invention employs micron-spraying to induce microparticles containing sulfuric acid aerosols and suspended molecular pollutants in the waste gas stream to grow through nucleation, aggregation, and solidification mechanisms. The waste gas stream is then cleaned using wet scrubbing technology. This effectively removes solid, liquid, and aerosol pollutants, such as sulfuric acid aerosols and gaseous pollutants, that are suspended in the gas stream during semiconductor manufacturing processes. This solves the problem that the removal efficiency of aerosol pollutants and organic gases has not yet achieved good results. Attached Figure Description

[0037] Figure 1 This is a cross-sectional schematic diagram of the apparatus for treating sulfuric acid aerosols and suspended molecular pollutants according to the first embodiment of the present invention;

[0038] Figure 1A for Figure 1 A cross-sectional schematic diagram of the atomizing nozzle of the particulate pretreatment tank in the device shows the spray angle range of the atomizing nozzle and the height of the sprayed liquid.

[0039] Figure 1B for Figure 1 A schematic diagram of the cross-section of the filter tank in the device shows the spray angle range and the distance between the spray angle and the packing unit;

[0040] Figure 2 This is a cross-sectional schematic diagram of the apparatus for treating sulfuric acid aerosols and suspended molecular pollutants according to the second embodiment of the present invention;

[0041] Figure 3This is a cross-sectional schematic diagram of the apparatus for treating sulfuric acid aerosols and suspended molecular pollutants according to the third embodiment of the present invention;

[0042] Figure 4 This is a cross-sectional schematic diagram of the apparatus for treating sulfuric acid aerosols and suspended molecular pollutants according to the fourth embodiment of the present invention;

[0043] Figure 5 See Table 1;

[0044] Figure 6 See Table 2-1;

[0045] Figure 7 See Table 2-2;

[0046] Figure 8 See Table 3;

[0047] Figure 9 See Table 4;

[0048] Figure 10 This is a schematic diagram of the first water washing system 1000 of this utility model;

[0049] Figure 11 This is a schematic diagram of the second water washing system 2000 of this utility model;

[0050] Figure 12 This is a schematic diagram of the third water washing system 3000 of this utility model;

[0051] Figure 13 This is a schematic diagram of the fourth water washing system 3000 of this utility model;

[0052] Figure 14 See Table 5;

[0053] Figure 15 See Table 6;

[0054] Figure 16 See Table 7;

[0055] Figure 17 See Table 8.

[0056] Explanation of reference numerals in the attached figures:

[0057] 100. Apparatus for treating sulfuric acid aerosols and suspended molecular pollutants;

[0058] 200. Apparatus for treating sulfuric acid aerosols and suspended molecular pollutants;

[0059] 300. Apparatus for treating sulfuric acid aerosols and suspended molecular pollutants;

[0060] 400. Apparatus for treating sulfuric acid aerosols and suspended molecular pollutants;

[0061] 101a, air inlet; 101b, air inlet; 201a, air inlet; 201b, air inlet; 301a, air inlet; 301b, air inlet; 401a, air inlet; 401b, air inlet;

[0062] 102, air outlet; 202, air outlet; 302, air outlet; 402, air outlet;

[0063] 110. Particulate pretreatment tank; 210. Particulate pretreatment tank;

[0064] 112. Atomizing nozzle; 212. Atomizing nozzle;

[0065] 114. Side path; 214. Side path; 314. Side path; 414. Side path;

[0066] 120. Filter tank; 220. Filter tank;

[0067] 122, Packing Unit; 222, Packing Unit;

[0068] 124. Nozzle; 223. Nozzle;

[0069] 126. Demisting layer; 226. Demisting layer;

[0070] 128. Pump device; 228. Pump device; 348. Pump device; 448. Pump device;

[0071] 130. Liquid storage tank; 230. Liquid storage tank;

[0072] 224. Another packing unit; 225. Another nozzle;

[0073] 310. First particulate pretreatment tank; 410. First particulate pretreatment tank;

[0074] 312, First atomizing nozzle; 412, First atomizing nozzle;

[0075] 320. First filter tank; 420. First filter tank;

[0076] 322, First packing unit; 422, First packing unit;

[0077] 324. First nozzle; 423. First nozzle;

[0078] 326. First demister layer; 426. First demister layer;

[0079] 330, Second particulate pretreatment tank; 430, Second particulate pretreatment tank;

[0080] 332, Second atomizing nozzle; 432, Second atomizing nozzle;

[0081] 340. Second filter tank; 440. Second filter tank;

[0082] 342, Second packing unit; 442, Second packing unit;

[0083] 344. Second nozzle; 443. Second nozzle;

[0084] 346. Second demister layer; 446. Second demister layer;

[0085] 350. First storage tank; 360. Second storage tank;

[0086] 424. Third packing unit; 425. Third nozzle;

[0087] 444. Fourth packing unit; 445. Fourth nozzle;

[0088] 1000. First water washing system;

[0089] 1100, Pump unit; 2100, Pump unit; 2200, Pump unit; 3100, Pump unit; 3200, Pump unit; 4100, Pump unit; 4200, Pump unit;

[0090] 2000, Second Washing System;

[0091] 3000, Third washing system; 3300, Three-way valve;

[0092] 4000, Fourth Water Washing System;

[0093] θ1, spray angle; H1, spray height; θ2, spray angle; H2, distance;

[0094] T1, Pipeline; T2, Pipeline; T3, Pipeline; T4, Pipeline; T5, Pipeline; T6, Pipeline; T7, Pipeline; T8, Pipeline. Detailed Implementation

[0095] The following will describe in detail exemplary embodiments of the present invention with reference to the accompanying drawings. These exemplary embodiments are intended to make the disclosure of the present invention comprehensive and complete, and to fully convey the present invention concept to those skilled in the art. Since the present invention concept may have various modified embodiments, only exemplary embodiments are shown in the drawings and described in the detailed description of the present invention concept. However, the present invention concept is not limited to the specific embodiments, and it should be understood that the present invention concept covers all modifications, equivalents, and substitutions within its scope. The same reference numerals may be used to refer to the same elements. In the drawings, the dimensions of the structures may be exaggerated, reduced, or drawn schematically for illustrative purposes and to improve clarity.

[0096] Terms used to describe various elements, such as "first" and "second," are only used to distinguish one element from another and should not be used to limit the elements. These terms are for identification purposes only.

[0097] While terms such as “first,” “second,” and “third” may be used herein to describe various elements, components, regions, and / or portions, these elements, components, regions, and / or portions should not be limited by these terms. These terms are used only to distinguish one element, component, region, or portion from another. Therefore, a “first” element, component, region, or portion discussed below may also be referred to as a “second” element, component, region, or portion without departing from the teachings of the exemplary embodiments of this utility model.

[0098] The first embodiment of this utility model shows an apparatus 100 for treating sulfuric acid aerosols and suspended molecular pollutants. Figure 1The device 100 includes air inlets 101a and 101b on one side of the device 100 and an air outlet 102 on the opposite side of the device 100. The device 100 includes a particulate pretreatment tank 110 and a filter tank 120. The particulate pretreatment tank 110 is in fluid communication with the air inlets 101a and 101b, and the filter tank 120 is in fluid communication with the particulate pretreatment tank 110 and the air outlet 102. The particulate pretreatment tank 110 has several atomizing nozzles 112 disposed at a suitable position near the bottom of the particulate pretreatment tank 110. The filter tank 120 has a packing unit 122 and a demister layer 126. The packing unit 122 is disposed at a suitable position near the bottom of the filter tank 120, and the demister layer 126 is disposed at a suitable position near the top of the filter tank 120. A plurality of nozzles 124 are disposed between the packing unit 122 and the demister layer 126. Different airflows, such as different waste gas flows generated by different semiconductor processes, can enter the corresponding air inlets 101a and 101b respectively. Those skilled in the art will understand that the number of air inlets in the device 100 can be one or more as needed, so that the device 100 can simultaneously process multiple waste gas flows from different semiconductor processes. For example, the device 100 can process and clean waste gas from single-wafer cleaning processes, coating machines, and stripping machines. This invention can process and clean solid, liquid, and aerosol-like contaminants suspended in the airflow, such as sulfuric acid aerosol and gaseous pollutants. The air inlets 101a and 101b are preferably inclined relative to the device 100 to ensure that any liquid entering the particulate pretreatment tank 110 can flow back into the particulate pretreatment tank 110. The airflow to be processed in this invention flows downwards into the particulate pretreatment tank 110 through the air inlet 101a or the air inlet 101b, then upwards through the packing unit 122 and the demister layer 126 of the filter tank 120, and then exits the device 100 from the air outlet 102 through a pipe appropriately configured between the filter tank 120 and the air outlet 102. A pump device 128 is disposed in an appropriate position inside the device 100 near the air outlet 102 to guide the airflow within the device 100 in the direction of the airflow indicated by the blank arrow.

[0099] In the particulate pretreatment tank 110 stage, the atomizing nozzles 112 spray high-pressure atomized spray liquid upwards toward the airflow flowing downwards through the particulate pretreatment tank 110. The high-pressure atomized spray liquid can be a mixture of high-pressure air and water or a mixture of high-pressure air and an alkaline solution with a pH of 8 to 13. The atomizing nozzles 112 are configured to spray the high-pressure atomized spray liquid toward the airflow in a direction opposite to the flow direction of the airflow in the particulate pretreatment tank 110, and as... Figure 1AAs shown, the high-pressure atomized spray liquid ejected by the atomizing nozzles 112 has a spray angle θ1 (i.e., the angle of the spray range) of 20 to 70 degrees and a spray height H1 of 10 to 1000 centimeters, so as to promote the growth of particles in the airflow from a particle size of 0.1-2.5 micrometers to 50-100 micrometers, so that the sulfuric acid aerosols in the particles grow from a particle size of 0.1-2.5 micrometers to 50-100 micrometers. A storage tank 130 is disposed inside the device 100 below the particle pretreatment tank 110 and the filter tank 120 to collect the waste liquid discharged downward during the particle growth. Subsequently, the waste liquid is discharged from the storage tank 130 to the outside in the direction indicated by the bold dashed arrow.

[0100] After being processed by the particulate pretreatment tank 110, the airflow then flows upward through the packing unit 122 and the demister layer 126 in the filter tank 120. This invention employs a wet scrubbing technique in the filter tank 120 to clean the airflow. The packing unit 122 preferably comprises a structural packing composed of multiple stacked sub-packing units, which can be selected from, but are not limited to, any of the following shapes: cuboids, cubes, cylinders, and cut blocks that can be assembled into cylinders. The structural packing has regular fluid channels inside, facilitating smooth fluid flow within the packing unit 122. The structural packing may contain chemically synthesized fibers with added antibacterial components, including, but not limited to, any one or a combination of two or more of the following: polyester, nylon, and polyurethane fibers (Spandex); the antibacterial components include, but are not limited to, any one or a combination of two or more of the following: polystyrene, polyacrylonitrile, polyethylene, polypropylene, polyester, polyurethane, and polyamide. The antibacterial component can inhibit the growth of bacteria and microorganisms and prevent the fluid channels inside the packing unit 122 from being blocked. The experimental results of the inhibition rate of bacterial and microbial growth of the above-mentioned chemical synthetic fibers with added antibacterial components are shown in Table A below, which shows that the chemical synthetic fibers with added antibacterial components of 1 wt.% to 10 wt.% have an inhibition rate of more than 99% for bacterial and microbial growth.

[0101]

[0102] The chemically synthesized fiber samples in Table A were supplemented with antibacterial components at concentrations of 0 wt.%, 1 wt.%, 3 wt.%, 5 wt.%, and 10 wt.%, respectively. The antibacterial properties of these samples were tested according to JIS L1902 or AATCC 100 standards and the following procedures:

[0103] a) Cultivate bacteria (such as Staphylococcus aureus, Escherichia coli) and expose them to the test sample;

[0104] b) After 24 hours, measure the survival rate of the bacteria.

[0105] Test results show that when the amount of antibacterial component added is 1 wt.% or more, it can greatly inhibit the growth of bacteria and microorganisms in the structural filler of this utility model.

[0106] The nozzle 124 is disposed between the packing unit 122 and the demister layer 126. For example... Figure 1B As shown, the nozzles 124 are positioned at a distance H2 of 10 to 40 cm from the packing unit 122, and the nozzles 124 spray washing liquid downwards toward the packing unit 122 and upwards through the airflow. The spray angle θ2 (i.e., the angle of the washing liquid spray range) of the nozzles 124 is 60 to 150 degrees to clean the airflow after treatment in the particulate pretreatment tank 110, thereby removing solid, liquid, and aerosol-like contaminants such as sulfuric acid aerosols and gaseous pollutants suspended in the airflow. The washing liquid may contain water or an alkaline solution with a pH of 8 to 13. Afterwards, the airflow flows upwards through the demister layer 126, where large droplets are collected to form a liquid film, and then flow downwards into the storage tank 130 by gravity. The demister layer 126 may contain added Al. x Si y O z The catalyst is a chemically synthesized fiber, comprising, but not limited to, a selection from, or a combination of, any two or more of the following: polyester, nylon, and polyurethane fibers (Spandex). One purpose of adding the catalyst is to filter toxic pollutants in the airflow. In other words, the catalyst promotes the decomposition of toxic pollutants in the airflow passing through the demister layer 126. When silicon aluminum oxide (Al...) x Si y O z When used as a catalyst in the demisting layer of this invention, if x = 1, then y = 1, 2, 3, or 4 and z = 3, 6, 8, or 10; if x = 2, then y = 1 or 2 and z = 5, 6, 7, or 9. This silicon-aluminum oxide (Al...) x Si y O z Specifically, it can be AlSiO3, AlSi2O6, AlSi3O8, or AlSi4O3. 10 Al2SiO5, Al2SiO6, Al2Si2O6, Al2Si2O7, or Al2Si2O9. Table B below shows that the chemically synthesized fibers of this invention with 1 wt.% to 10 wt.% catalyst have a degradation efficiency of greater than 90% for isopropanol (IPA). Table B uses isopropanol as the test contaminant to evaluate the catalytic degradation ability of the chemically synthesized fibers of this invention. The test results show that when the catalyst addition is 1 wt.% or more, the isopropanol degradation efficiency can reach more than 90%.

[0107]

[0108]

[0109] After being cleaned in stage 120 of the filter tank, the airflow flows through a suitable pipeline to the outlet 102 and is discharged.

[0110] A bypass 114 is provided inside the device 100 near the top of the particulate pretreatment tank 110 so that airflow can be avoided during disassembly and maintenance of the device 100.

[0111] Figure 5 Table 1 shows the experimental results of the device 100 of this invention in treating and cleaning sulfuric acid aerosol and suspended molecular pollutants. When the pH value of the spray liquid in the particulate pretreatment tank 110 is 10.2 and the pH value of the washing liquid in the filter tank 120 is 12.7, the removal rate of sulfuric acid aerosol is as high as 86.9%.

[0112] The second embodiment of this utility model shows a device 200 for treating sulfuric acid aerosols and suspended molecular pollutants. Figure 2The difference between device 200 and device 100 lies in that device 200 adds another packing unit to its filter tank 220. Device 200 includes air inlets 201a and 201b on one side of device 200 and an air outlet 202 on the opposite side. Device 200 includes a particulate pretreatment tank 210 and a filter tank 220. The particulate pretreatment tank 210 is in fluid communication with the air inlets 201a and 201b, and the filter tank 220 is in fluid communication with the particulate pretreatment tank 210 and the air outlet 202. The particulate pretreatment tank 210 has several atomizing nozzles 212, positioned at an appropriate location near the bottom of the particulate pretreatment tank 210. The filter tank 220 has a packing unit 222 and a demisting layer 226. The packing unit 222 is disposed at a suitable position near the bottom of the filter tank 220, while the demister layer 226 is disposed at a suitable position near the top of the filter tank 220. Another packing unit 224 is disposed between the packing unit 222 and the demister layer 226. Multiple nozzles 223 are disposed between the packing unit 222 and the other packing unit 224, and multiple other nozzles 225 are disposed between the other packing unit 224 and the demister layer 226. Different airflows, such as different waste gas flows generated by different semiconductor processes, can enter the corresponding air inlets 201a and 201b respectively. Those skilled in the art will understand that the number of air inlets of the present invention device 200 can be one or more as needed, so that the present invention device 200 can simultaneously process multiple waste gas flows from different semiconductor processes. For example, the device 200 can treat and clean exhaust gases from single-wafer cleaning processes, coating machines, and stripping machines, and can treat and clean solid, liquid, and aerosol-like contaminants suspended in the airflow, such as sulfuric acid aerosols and gaseous pollutants. The air inlets 201a and 201b are preferably inclined relative to the device 200 to ensure that any liquid entering the particulate pretreatment tank 210 can flow back into the particulate pretreatment tank 210. The airflow to be treated flows downwards into the particulate pretreatment tank 210 through the air inlet 201a or 201b, then upwards through the packing unit 222, the other packing unit 224, and the demister layer 226 of the filter tank 220, and finally exits the device 200 from the outlet 202 through a suitably configured conduit between the filter tank 220 and the outlet 202. A pump device 228 is disposed at an appropriate position inside the device 200 near the air outlet 202 to guide the airflow within the device 200 to move in the direction of airflow indicated by the blank arrow.

[0113] In the particulate pretreatment tank 210 stage, the atomizing nozzles 212 spray high-pressure atomized spray liquid upwards toward the airflow flowing downwards through the particulate pretreatment tank 210. The high-pressure atomized spray liquid can be a mixture of high-pressure air and water or a mixture of high-pressure air and an alkaline solution with a pH of 8 to 13. The atomizing nozzles 212 are configured to spray the high-pressure atomized spray liquid toward the airflow in a direction opposite to the flow direction of the airflow in the particulate pretreatment tank 210, and as... Figure 1A As shown, the high-pressure atomized spray liquid ejected by the atomizing nozzles 212 has a spray angle θ1 (i.e., the angle of the spray range) of 20 degrees to 70 degrees, and a spray height H1 of 10 cm to 1000 cm, so as to promote the growth of particles in the airflow from a particle size of 0.1-2.5 micrometers to 50-100 micrometers, so that the sulfuric acid aerosols in the particles grow from a particle size of 0.1-2.5 micrometers to 50-100 micrometers. A storage tank 230 is provided inside the device 200 below the particle pretreatment tank 210 and the filter tank 220 to collect the waste liquid discharged downward during the particle growth. Subsequently, the waste liquid is discharged from the storage tank 230 to the outside in the direction indicated by the bold dashed arrow.

[0114] After being processed by the particulate pretreatment tank 210, the airflow then flows upward through the packing unit 222, the other packing unit 224, and the demister layer 226 in the filter tank 220. This invention employs a wet scrubbing technique in the filter tank 220 to clean the airflow. The packing unit 222 preferably comprises a structural packing composed of multiple stacked sub-packing units, which can be selected from, but are not limited to, any of the following shapes: cuboids, cubes, cylinders, and cut blocks that can be assembled into cylinders. The structural packing has regular fluid channels inside, facilitating smooth fluid flow within the packing unit 222. The structural packing may contain chemically synthesized fibers with added antibacterial components, including, but not limited to, any one or a combination of two or more of the following: polyester, nylon, and polyurethane fibers (Spandex); the antibacterial components include, but are not limited to, any one or a combination of two or more of the following: polystyrene, polyacrylonitrile, polyethylene, polypropylene, polyester, polyurethane, and polyamide. The antibacterial component can inhibit the growth of bacteria and microorganisms, preventing blockage of the fluid channels inside the packing unit 222. The nozzles 223 are disposed between the packing unit 222 and the other packing unit 224, such as... Figure 1BAs shown, the nozzles 223 are positioned at a distance H2 of 10 to 40 cm from the packing unit 222, and the nozzles 223 spray washing liquid downwards toward the packing unit 222 and upwards through the airflow. The spray angle θ2 of the washing liquid sprayed by the nozzles 223 is 60 to 150 degrees (i.e., the angle of the washing liquid spray range), to clean the airflow after treatment in the particulate pretreatment tank 210, thereby removing solid, liquid, and aerosol-like contaminants such as sulfuric acid aerosols and gaseous pollutants suspended in the airflow. The washing liquid may contain water or an alkaline solution with a pH of 8 to 13. Next, the airflow flows upwards through another packing unit 224, which is similar to the packing unit 222, and the other nozzles 225 are similar to the nozzles 223. The other nozzles 225 are disposed between the other packing unit 224 and the demister layer 226. Figure 1B As shown, the other nozzles 225 are positioned at a distance H2 of 10 to 40 cm from the other packing unit 224, and the other nozzles 225 spray washing liquid downwards toward the other packing unit 224 and upwards through the packing unit 224. The spray angle θ2 (i.e., the angle of the washing liquid spray range) of the other nozzles 225 spraying the washing liquid is 60 to 150 degrees to perform secondary cleaning of the airflow, thereby removing solid, liquid, and aerosol-like contaminants, such as sulfuric acid aerosols and gaseous pollutants, that may still remain in the airflow after cleaning through the packing unit 222 section. The other washing liquid may contain water or an alkaline solution with a pH of 8 to 13. Afterwards, the airflow flows upwards through the demister layer 226, where large droplets are collected to form a liquid film, and then flow downwards into the storage tank 230 by gravity. The demister layer 226 may contain added Al. x Si y O z The catalyst is a chemically synthesized fiber, comprising, but not limited to, any one or a combination of two or more of the following: polyester, nylon, and polyurethane fibers (Spandex). That is, the demisting layer 226 of the second embodiment of this invention can use the same catalyst as the demisting layer 126 of the first embodiment, and has the same purpose and effect. The airflow, after being cleaned in the filter tank 220 stage, flows through a suitable conduit to the outlet 202 and is discharged. A bypass 214 is provided inside the device 200 near the top of the particulate pretreatment tank 210 to facilitate uninterrupted airflow during disassembly and maintenance of the device 200.

[0115] When fresh water is used in the particulate pretreatment tank 210 to generate a high-pressure atomized spray, this invention can also provide various water washing systems applicable to the device 200. In this invention, "fresh water" refers to an external water source that has not yet been used to remove contaminants. Figure 10This diagram shows a first water washing system 1000 applied to the device 200. An external water source supplies fresh water to the atomizing nozzles 212 through pipe T1 and pump device 1100 to generate high-pressure atomized spray liquid in the particle pretreatment tank 210, and simultaneously supplies fresh water to the nozzles 223 and the other nozzles 225 as the washing liquid and the other washing liquid. Figure 14 Table 5 shows that when the device 200 uses the first water washing system 1000, the removal rate of sulfuric acid aerosol exceeds 90% and the removal rate of other contaminants exceeds 95%.

[0116] Figure 11 This diagram shows a second water washing system 2000 applied to the device 200. An external water source supplies fresh water to the atomizing nozzles 212 via pipe T2 and pump 2100 to generate high-pressure atomized spray liquid in the particle pretreatment tank 210, and simultaneously supplies fresh water to the other nozzles 225 as another washing liquid for the other packing unit 224. The waste liquid collected in the storage tank 230 during the particle growth stage in the particle pretreatment tank 210 and the wet washing stage in the filter tank 220 serves as circulating water in the second water washing system 2000, and is supplied to the nozzles 223 via pipe T3 and pump 2200 as washing liquid for the packing unit 222. The circulating water in this invention refers to water that continuously flows and is reused within the device. The second water washing system 2000 uses 50% fresh water. Figure 15 Table 6 shows that when the device 200 uses the second water washing system 2000, the removal rate of sulfuric acid aerosol exceeds 90% and the removal rate of other contaminants exceeds 95%. The device 200 using the second water washing system 2000 can maintain the removal effect while reducing water consumption.

[0117] Figure 12This diagram shows a third water washing system 3000 applied to the device 200. An external water source supplies fresh water to the atomizing nozzles 212 via pipe T4 and pump 3100 to generate high-pressure atomized spray liquid in the particle pretreatment tank 210. The waste liquid collected in the storage tank 230 during the particle growth stage in the particle pretreatment tank 210 and the wet washing stage in the filter tank 220 serves as circulating water in the third water washing system 3000, and is supplied to the nozzles 223 via pipe T5 and pump 3200 as washing liquid for the packing unit 222. The circulating water in this invention refers to water that continuously flows and is reused within the device. Furthermore, a mixture of fresh water and circulating water is supplied to another nozzle 225 as another washing liquid for the other packing unit 224. In one embodiment of this invention, the ratio of fresh water to circulating water supplied to the other nozzles 225 can be adjusted by a three-way valve 3300. Fresh water is supplied from an external water source via pipeline T6, while circulating water from the storage tank 230 is transported to the three-way valve 3300 via pipeline T5 and pump device 3200, mixed with the fresh water, and then supplied to the other nozzles 225. Those skilled in the art will understand that the ratio of fresh water to circulating water can be adjusted as needed by the three-way valve 3300. Figure 16 Table 7 shows that when the device 200 uses the third water washing system 3000 and the proportion of fresh water used by the third water washing system 3000 is 50-100%, the removal rate of sulfuric acid aerosol exceeds 90% and the removal rate of other pollutants exceeds 95%. Figure 17 Table 8 shows that when the device 200 uses the third water washing system 3000, and the proportion of fresh water used in the third water washing system 3000 is 0-50%, the removal rate of sulfuric acid aerosol exceeds 90%, and the removal rate of other pollutants exceeds 95%. The device 200 using this third water washing system 3000 can maintain the removal effect while reducing water consumption.

[0118] When exhaust gas is not supplied to the device 200, the device 200 still needs to continue operating. The water washing system of this utility model can be switched to a water-saving mode, such as... Figure 13 The fourth water washing system 4000 is shown. When the device 200 uses the fourth water washing system 4000, circulating water from the storage tank 230 is supplied to the atomizing nozzles 212 via pipeline T7 and pump device 4100, and to the nozzles 223 and the other nozzles 225 via pipeline T8 and pump device 4200. The circulating water in this invention refers to water that flows continuously and is reused inside the device of this invention.

[0119] The third embodiment of this utility model shows an apparatus 300 for treating sulfuric acid aerosols and suspended molecular pollutants. Figure 3The difference between device 300 and device 100 lies in the addition of another particulate pretreatment tank and another filter tank in device 300. Device 300 includes an air inlet 301a and an air inlet 301b located on one side of device 300, and an air outlet 302 located on the opposite side of device 300. Device 300 includes a first particulate pretreatment tank 310, a first filter tank 320, a second particulate pretreatment tank 330, and a second filter tank 340. The first particulate pretreatment tank 310 is fluidly connected to the air inlets 301a and 301b. The first filter tank 320 is fluidly connected to the first particulate pretreatment tank 310 and the second particulate pretreatment tank 330. The second filter tank 340 is fluidly connected to the second particulate pretreatment tank 330 and the air outlet 302. The first particulate pretreatment tank 310 has several first atomizing nozzles 312 located at an appropriate position near the bottom of the first particulate pretreatment tank 310. The first filter tank 320 has a first packing unit 322 and a first demister layer 326. The first packing unit 322 is disposed at a suitable position near the bottom of the first filter tank 320, and the first demister layer 326 is disposed at a suitable position near the top of the first filter tank 320. A plurality of first nozzles 324 are disposed between the first packing unit 322 and the first demister layer 326. The second particle pretreatment tank 330 has a plurality of second atomizing nozzles 332 disposed at a suitable position near the bottom of the second particle pretreatment tank 330. The second filter tank 340 has a second packing unit 342 and a second demister layer 346. The second packing unit 342 is disposed at a suitable position near the bottom of the second filter tank 340, and the second demister layer 346 is disposed at a suitable position near the top of the second filter tank 340. A plurality of second nozzles 344 are disposed between the second packing unit 342 and the second demister layer 346. Different airflows, such as different waste gas flows generated by different semiconductor processes, can enter the corresponding air inlets 301a and 301b respectively. Those skilled in the art will understand that the number of air inlets in the device 300 can be one or more as needed, to facilitate the simultaneous processing of multiple waste gas flows from different semiconductor processes. For example, the device 300 can process and clean waste gas from single-wafer cleaning processes, coating machines, and stripping machines, and can also process and clean solid, liquid, and aerosol-like contaminants suspended in the airflow, such as sulfuric acid aerosol and gaseous pollutants. Preferably, the air inlets 301a and 301b are inclined relative to the device 300 to ensure that any liquid entering the first particulate pretreatment tank 310 can flow back into the first particulate pretreatment tank 310.The airflow to be processed in this invention flows downward into the first particulate pretreatment tank 310 through the air inlet 301a or the air inlet 301b, then upward through the first packing unit 322 and the first demister layer 326 of the first filter tank 320, then downward through the second particulate pretreatment tank 330, then upward through the second packing unit 342 and the second demister layer 346 of the second filter tank 340, and finally exits the device 300 from the air outlet 302 through a pipe appropriately configured between the second filter tank 340 and the air outlet 302. A pump device 348 is disposed at an appropriate position inside the device 300 near the air outlet 302 to guide the airflow within the device 300 in the direction of the airflow indicated by the blank arrow.

[0120] In the first particulate pretreatment tank 310 stage, the first atomizing nozzles 312 spray a first high-pressure atomized spray liquid upwards toward the airflow flowing downwards through the first particulate pretreatment tank 310. The first high-pressure atomized spray liquid can be a mixture of high-pressure air and water or a mixture of high-pressure air and an alkaline solution with a pH value of 8 to 13. The first atomizing nozzles 312 are configured to spray the first high-pressure atomized spray liquid toward the airflow in a direction opposite to the flow direction of the airflow in the first particulate pretreatment tank 310, and as... Figure 1A As shown, the first atomizing nozzles 312 spray the first high-pressure atomized spray liquid with a spray angle θ1 (i.e., the angle of the spray range) of 20 to 70 degrees and a spray height H1 of 10 to 1000 centimeters, so as to promote the growth of particles in the airflow from a particle size of 0.1-2.5 micrometers to 50-100 micrometers, so that the sulfuric acid aerosols in the particles grow from a particle size of 0.1-2.5 micrometers to 50-100 micrometers. A first storage tank 350 is disposed inside the device 300 below the first particle pretreatment tank 310 and the first filter tank 320 to collect the waste liquid discharged downward during the particle growth. Subsequently, the waste liquid is discharged from the first storage tank 350 to the outside in the direction indicated by the bold dashed arrow.

[0121] After being processed by the first particulate pretreatment tank 310, the airflow then flows upward through the first packing unit 322 and the first demisting layer 326 in the first filter tank 320. This invention employs a wet scrubbing technique in the first filter tank 320 to clean the airflow. The first packing unit 322 preferably comprises a structural packing composed of multiple stacked sub-packing units. These sub-packing units can be selected from, but are not limited to, any of the following shapes: cuboids, cubes, cylinders, and cut blocks that can be assembled into cylinders. The structural packing has regular fluid channels inside, facilitating smooth fluid flow within the first packing unit 322. The structural packing may contain chemically synthesized fibers with added antibacterial components. These chemically synthesized fibers include, but are not limited to, any one or any combination of two or more of the following: polyester, nylon, and polyurethane fibers (Spandex); the antibacterial components include, but are not limited to, any one or any combination of two or more of the following: polystyrene, polyacrylonitrile, polyethylene, polypropylene, polyester, polyurethane, and polyamide. The antibacterial component can inhibit the growth of bacteria and microorganisms, preventing blockage of the fluid channels inside the first packing unit 322. The first nozzles 324 are disposed between the first packing unit 322 and the first demister layer 326, such as... Figure 1B As shown, the first nozzles 324 are positioned at a distance H2 of 10 to 40 cm from the first packing unit 322. The first nozzles 324 spray a first washing liquid downwards toward the first packing unit 322 and upwards through the airflow. The spray angle θ2 (i.e., the angle of the washing liquid spray range) of the first nozzles 324 spraying the first washing liquid is 60 to 150 degrees to clean the airflow treated by the first particulate pretreatment tank 310, removing solid, liquid, and aerosol-like contaminants such as sulfuric acid aerosols and gaseous pollutants suspended in the airflow. The first washing liquid may contain water or an alkaline solution with a pH of 8 to 13. Next, the airflow flows upwards through the first demister layer 326, where large droplets are collected to form a liquid film, and then flow downwards by gravity to the first storage tank 350. The first demister layer 326 may contain added Al. x Si y O z The catalyst is a chemically synthesized fiber, comprising, but not limited to, any one or a combination of two or more of the following: polyester, nylon, and polyurethane fibers (Spandex). That is, the first demister layer 326 in the third embodiment of this invention can use the same catalyst as the demister layer 126 in the first embodiment, and has the same purpose and effect. The airflow, after being cleaned in the first filter tank 320 stage, flows downwards through the second particulate pretreatment tank 330.

[0122] In the second particulate pretreatment tank 330 stage, the second atomizing nozzles 332 spray a second high-pressure atomized spray liquid upwards toward the airflow flowing downwards through the second particulate pretreatment tank 330. The second high-pressure atomized spray liquid can be a mixture of high-pressure air and water or a mixture of high-pressure air and an alkaline solution with a pH value of 8 to 13. The second atomizing nozzles 332 are configured to spray the second high-pressure atomized spray liquid toward the airflow in a direction opposite to the flow direction of the airflow in the second particulate pretreatment tank 330, and as... Figure 1A As shown, the second atomizing nozzles 332 spray the second high-pressure atomized spray liquid with a spray angle θ1 (i.e., the angle of the spray range) of 20 to 70 degrees and a spray height H1 of 10 to 1000 centimeters, so as to promote the growth of particles in the airflow from a particle size of 0.1-2.5 micrometers to 50-100 micrometers, so that the sulfuric acid aerosol in the particles grows from a particle size of 0.1-2.5 micrometers to 50-100 micrometers. The arrangement of the second particle pretreatment tank 330 can facilitate more complete particle growth in the airflow. A second liquid storage tank 360 is arranged inside the device 300 below the second particle pretreatment tank 330 and the second filter tank 340 to collect the waste liquid discharged downward during particle growth. Subsequently, the waste liquid is discharged to the outside from the second liquid storage tank 360 in the direction indicated by the bold dashed arrow. After being processed by the second particulate pretreatment tank 330, the airflow then flows upward through the second packing unit 342 and the second demisting layer 346 in the second filter tank 340. This invention employs a wet scrubbing technique in the second filter tank 340 to clean the airflow. The second packing unit 342 preferably comprises a structural packing composed of multiple stacked sub-packing units. These sub-packing units can be selected from, but are not limited to, any of the following shapes: cuboids, cubes, cylinders, and cut blocks that can be assembled into cylinders. The structural packing has regular fluid channels inside, facilitating smooth fluid flow within the second packing unit 342. The structural packing may contain chemically synthesized fibers with added antibacterial components. These chemically synthesized fibers include, but are not limited to, any one or a combination of two or more of the following: polyester, nylon, and polyurethane fibers (Spandex); the antibacterial components include, but are not limited to, any one or a combination of two or more of the following: polystyrene, polyacrylonitrile, polyethylene, polypropylene, polyester, polyurethane, and polyamide. The antibacterial component can inhibit the growth of bacteria and microorganisms, preventing blockage of the fluid channels inside the second packing unit 342. The second nozzles 344 are disposed between the second packing unit 342 and the second demister layer 346, such as... Figure 1BAs shown, the second nozzles 344 are positioned at a distance H2 of 10 to 40 cm from the second packing unit 342. The second nozzles 344 spray a second washing liquid downwards toward the second packing unit 342 and upwards through the airflow. The spray angle θ2 (i.e., the angle of the washing liquid spray range) of the second nozzles 344 spraying the second washing liquid is 60 to 150 degrees to clean the airflow after treatment in the second particulate pretreatment tank 330, removing any solid, liquid, or aerosol-like contaminants, such as sulfuric acid aerosols and gaseous pollutants, that may still remain in the airflow. The second washing liquid may contain water or an alkaline solution with a pH of 8 to 13. Next, the airflow flows upwards through the second demister layer 346, where large droplets are collected to form a liquid film, and then flow downwards by gravity to the second storage tank 360. The second demister layer 346 may contain added Al. x Si y O z The catalyst is a chemically synthesized fiber, comprising, but not limited to, any one or a combination of two or more of the following: polyester, nylon, and polyurethane fibers (Spandex). That is, the second demister layer 346 in the third embodiment of this invention can use the same catalyst as the demister layer 126 in the first embodiment, and has the same purpose and effect. The airflow, after being cleaned in the second filter tank 340 stage, flows through a suitable conduit to the outlet 302 and is discharged. A bypass 314 is provided inside the device 300 near the top of the first particulate pretreatment tank 310 to facilitate uninterrupted airflow during disassembly and maintenance of the device 300.

[0123] Figure 6 Table 2-1 shows the experimental results of the device 300 of this utility model in treating and cleaning sulfuric acid aerosol and suspended molecular pollutants. When the pH value of the first spray liquid in the first particulate pretreatment tank 310 and the second spray liquid in the second particulate pretreatment tank 330 is 11.2, and the pH value of the first washing liquid in the first filter tank 320 and the second washing liquid in the second filter tank 340 is 11.4, the removal rate of sulfuric acid aerosol is as high as 90% or more, and the removal rate of other pollutants is as high as 99% or more. In comparison, Figure 7 Table 2-2 shows that when the pH value of the first spray liquid in the first particulate pretreatment tank 310 and the second spray liquid in the second particulate pretreatment tank 330 is 6.2, and the pH value of the first washing liquid in the first filter tank 320 and the second washing liquid in the second filter tank 340 is 6.8, the removal rate of sulfuric acid aerosol is over 80%, and the removal rate of other pollutants is over 85%.

[0124] Figure 8 Table 3 shows another experimental result of the device 300 of this utility model in treating and cleaning sulfuric acid aerosol and suspended molecular pollutants. The pH value of the first spray liquid in the first particulate pretreatment tank 310 and the second spray liquid in the second particulate pretreatment tank 330 is 8.1, and the pH value of the first washing liquid in the first filter tank 320 and the second washing liquid in the second filter tank 340 is 8.2. The removal rate of sulfuric acid aerosol is as high as 90% or more, and the removal rate of other pollutants is as high as 99% or more.

[0125] Furthermore, Figure 9 Table 4 shows another experimental result of the device 300 of this utility model in treating and cleaning sulfuric acid aerosol and suspended molecular pollutants. The pH value of the first spray liquid in the first particulate pretreatment tank 310 and the second spray liquid in the second particulate pretreatment tank 330 is 13.2, and the pH value of the first washing liquid in the first filter tank 320 and the second washing liquid in the second filter tank 340 is 13.5. The removal rate of sulfuric acid aerosol is as high as 90% or more, and the removal rate of other pollutants is as high as 95% or more.

[0126] The fourth embodiment of this utility model shows an apparatus 400 for treating sulfuric acid aerosols and suspended molecular pollutants. Figure 4The difference between device 400 and device 300 is that device 400 adds another packing unit and several other atomizing nozzles to the first filter tank and the second filter tank, respectively. Device 400 includes an air inlet 401a and an air inlet 401b disposed on one side of device 400 and an air outlet 402 disposed on the opposite side of device 400. Device 400 includes a first particle pretreatment tank 410, a first filter tank 420, a second particle pretreatment tank 430, and a second filter tank 440. The first particle pretreatment tank 410 is fluidly connected to the air inlets 401a and 401b, the first filter tank 420 is fluidly connected to the first particle pretreatment tank 410 and the second particle pretreatment tank 430, and the second filter tank 440 is fluidly connected to the second particle pretreatment tank 430 and the air outlet 402. The first particulate pretreatment tank 410 has several first atomizing nozzles 412, disposed at an appropriate position near the bottom of the first particulate pretreatment tank 410. The first filter tank 420 has a first packing unit 422 and a first demister layer 426. The first packing unit 422 is disposed at an appropriate position near the bottom of the first filter tank 420, and the first demister layer 426 is disposed at an appropriate position near the top of the first filter tank 420. The first filter tank 420 further has a third packing unit 424 disposed between the first packing unit 422 and the first demister layer 426. A plurality of first nozzles 423 are disposed between the first packing unit 422 and the third packing unit 424. A plurality of third nozzles 425 are disposed between the third packing unit 424 and the first demister layer 426. The second particulate pretreatment tank 430 has a plurality of second atomizing nozzles 432, disposed at an appropriate position near the bottom of the second particulate pretreatment tank 430. The second filter tank 440 has a second packing unit 442 and a second demister layer 446. The second packing unit 442 is disposed at a suitable position near the bottom of the second filter tank 440, and the second demister layer 446 is disposed at a suitable position near the top of the second filter tank 440. The second filter tank 440 also has a fourth packing unit 444 disposed between the second packing unit 442 and the second demister layer 446. A plurality of second nozzles 443 are disposed between the second packing unit 442 and the fourth packing unit 444. A plurality of fourth nozzles 445 are disposed between the fourth packing unit 444 and the second demister layer 446. Different airflows, such as different waste gas flows generated by different semiconductor processes, can enter the corresponding air inlets 401a and 401b respectively. Those skilled in the art will understand that the number of air inlets of the device 400 of this utility model can be one or more as needed, so as to facilitate the device 400 of this utility model to simultaneously process multiple waste gas flows from different semiconductor processes.For example, the device 400 can treat and clean exhaust gases from single-wafer cleaning processes, coating machines, and stripping machines, and can also treat and clean solid, liquid, and aerosol-like contaminants suspended in the airflow, such as sulfuric acid aerosols and gaseous pollutants. The air inlets 401a and 401b are preferably inclined relative to the device 400 to ensure that any liquid entering the first particulate pretreatment tank 410 can flow back into the first particulate pretreatment tank 410. The airflow to be processed in this invention flows downwards into the first particulate pretreatment tank 410 through the air inlet 401a or the air inlet 401b, then upwards through the first packing unit 422, the third packing unit 424, and the first demister layer 426 of the first filter tank 420, then downwards through the second particulate pretreatment tank 430, then upwards through the second packing unit 442, the fourth packing unit 444, and the second demister layer 446 of the second filter tank 440, and finally exits the device 400 from the air outlet 402 through a pipe appropriately configured between the second filter tank 440 and the air outlet 402. A pump device 448 is disposed at an appropriate position inside the device 400 near the air outlet 402 to guide the airflow within the device 400 in the direction of the airflow indicated by the blank arrow.

[0127] In the first particulate pretreatment tank 410 stage, the first atomizing nozzles 412 spray a first high-pressure atomized spray liquid upwards toward the airflow flowing downwards through the first particulate pretreatment tank 410. The first high-pressure atomized spray liquid can be a mixture of high-pressure air and water or a mixture of high-pressure air and an alkaline solution with a pH value of 8 to 13. The first atomizing nozzles 412 are configured to spray the first high-pressure atomized spray liquid toward the airflow in a direction opposite to the flow direction of the airflow in the first particulate pretreatment tank 410, and as... Figure 1A As shown, the first atomizing nozzles 412 spray the first high-pressure atomized spray liquid with a spray angle θ1 (i.e., the angle of the spray range) of 20 to 70 degrees and a spray height H1 of 10 to 1000 centimeters, so as to promote the growth of particles in the airflow from a particle size of 0.1-2.5 micrometers to 50-100 micrometers, so that the sulfuric acid aerosols in the particles grow from a particle size of 0.1-2.5 micrometers to 50-100 micrometers. A first storage tank 450 is disposed inside the device 400 below the first particle pretreatment tank 410 and the first filter tank 420 to collect the waste liquid discharged downward during particle growth. Subsequently, the waste liquid is discharged from the first storage tank 450 to the outside in the direction indicated by the bold dashed arrow.

[0128] After being processed by the first particulate pretreatment tank 410, the airflow then flows upward through the first packing unit 422, the third packing unit 424, and the first demisting layer 426 in the first filter tank 420. This invention employs a wet scrubbing technique in the first filter tank 420 to clean the airflow. The first packing unit 422 preferably comprises a structural packing composed of multiple stacked sub-packing units. These sub-packing units can be selected from, but are not limited to, any of the following shapes: cuboids, cubes, cylinders, and cut blocks that can be assembled into cylinders. The structural packing has regular fluid channels inside, facilitating smooth fluid flow within the first packing unit 422. The structural packing may contain chemically synthesized fibers with added antibacterial components. These chemically synthesized fibers include, but are not limited to, any one or a combination of two or more of the following: polyester, nylon, and polyurethane fibers (Spandex); the antibacterial components include, but are not limited to, any one or a combination of two or more of the following: polystyrene, polyacrylonitrile, polyethylene, polypropylene, polyester, polyurethane, and polyamide. The antibacterial component can inhibit the growth of bacteria and microorganisms, preventing blockage of the fluid channels inside the first packing unit 422. The first nozzles 423 are disposed between the first packing unit 422 and the third packing unit 424, such as... Figure 1B As shown, the first nozzles 423 are positioned at a distance H2 of 10 to 40 cm from the first packing unit 422, and the first nozzles 423 spray a first washing liquid downwards toward the first packing unit 422 and upwards through the airflow. The spray angle θ2 (i.e., the angle of the washing liquid spray range) of the first nozzles 423 spraying the first washing liquid is 60 to 150 degrees to clean the airflow after treatment in the first particulate pretreatment tank 410, thereby removing solid, liquid, and aerosol-like contaminants such as sulfuric acid aerosols and gaseous pollutants suspended in the airflow. The first washing liquid may contain water or an alkaline solution with a pH of 8 to 13. Next, the airflow flows upwards through the third packing unit 424. The third packing unit 424 and the third nozzle 425 are similar to the first packing unit 422 and the first nozzle 423. Figure 1BAs shown, the third nozzles 425 are positioned at a distance H2 of 10 to 40 cm from the third packing unit 424. The third nozzles 425 spray a third washing liquid downwards toward the third packing unit 424 and upwards through the airflow. The spray angle θ2 (i.e., the angle of the washing liquid spray range) of the third nozzles 425 is 60 to 150 degrees to clean the airflow after treatment in the first particulate pretreatment tank 410, removing solid, liquid, and aerosol-like contaminants such as sulfuric acid aerosols and gaseous pollutants remaining in the airflow. The third washing liquid may contain water or an alkaline solution with a pH of 8 to 13. Next, the airflow flows upwards through the first demister layer 426, where large droplets are collected to form a liquid film, and then flow downwards by gravity to the first storage tank 450. The first demister layer 426 may contain added Al. x Si y O z The catalyst is a chemically synthesized fiber, comprising, but not limited to, any one or a combination of two or more of the following: polyester, nylon, and polyurethane fibers (Spandex). That is, the first demister layer 426 of the fourth embodiment of this invention can use the same catalyst as the demister layer 126 of the first embodiment, and has the same purpose and effect. The airflow, after being cleaned in the first filter tank 420 stage, flows downwards through the second particulate pretreatment tank 430.

[0129] In the second particulate pretreatment tank 430 stage, the second atomizing nozzles 432 spray a second high-pressure atomized spray liquid upwards toward the airflow flowing downwards through the second particulate pretreatment tank 430. The second high-pressure atomized spray liquid can be a mixture of high-pressure air and water or a mixture of high-pressure air and an alkaline solution with a pH value of 8 to 13. The second atomizing nozzles 432 are configured to spray the second high-pressure atomized spray liquid toward the airflow in a direction opposite to the flow direction of the airflow in the second particulate pretreatment tank 430, and as... Figure 1AAs shown, the second atomizing nozzles 432 spray the second high-pressure atomized spray liquid with a spray angle θ1 (i.e., the angle of the spray range) of 20 to 70 degrees and a spray height H1 of 10 cm to 1000 cm, so as to promote the growth of particles in the airflow from a particle size of 0.1-2.5 micrometers to 50-100 micrometers, so that the sulfuric acid aerosol in the particles grows from a particle size of 0.1-2.5 micrometers to 50-100 micrometers. The arrangement of the second particle pretreatment tank 430 can facilitate more complete particle growth in the airflow. A second liquid storage tank 460 is arranged inside the device 400 below the second particle pretreatment tank 430 and the second filter tank 440 to collect the waste liquid discharged downward during particle growth. Subsequently, the waste liquid is discharged to the outside from the second liquid storage tank 460 in the direction indicated by the bold dashed arrow. After being processed by the second particulate pretreatment tank 430, the airflow then flows upward through the second packing unit 442, the fourth packing unit 444, and the second demisting layer 446 in the second filter tank 440. This invention employs a wet scrubbing technique in the second filter tank 440 to clean the airflow. The second packing unit 442 preferably comprises a structural packing composed of a stack of multiple sub-packing units. These sub-packing units can be selected from, but are not limited to, any of the following shapes: cuboids, cubes, cylinders, and cut blocks that can be assembled into cylinders. The structural packing has regular fluid channels inside, facilitating smooth fluid flow within the second packing unit 442. The structural packing may contain chemically synthesized fibers with added antibacterial components. These chemically synthesized fibers include, but are not limited to, any one or a combination of two or more of the following: polyester, nylon, and polyurethane fibers (Spandex); the antibacterial components include, but are not limited to, any one or a combination of two or more of the following: polystyrene, polyacrylonitrile, polyethylene, polypropylene, polyester, polyurethane, and polyamide. The antibacterial component can inhibit the growth of bacteria and microorganisms, preventing blockage of the fluid channels inside the second packing unit 442. The second nozzles 443 are disposed between the second packing unit 442 and the fourth packing unit 444, such as... Figure 1BAs shown, the second nozzles 443 are positioned at a distance H2 of 10 to 40 cm from the second packing unit 442, and the second nozzles 443 spray a second washing liquid downwards toward the second packing unit 442 and upwards through the airflow. The spray angle θ2 (i.e., the angle of the washing liquid spray range) of the second nozzles 443 spraying the second washing liquid is 60 to 150 degrees to clean the airflow after treatment in the second particulate pretreatment tank 430, thereby removing solid, liquid, and aerosol-like contaminants, such as sulfuric acid aerosols and gaseous pollutants, that may still remain in the airflow. The second washing liquid may contain water or an alkaline solution with a pH of 8 to 13. The airflow then flows upwards through the fourth packing unit 444. The fourth packing unit 444 and the fourth nozzle 445 are similar to the second packing unit 442 and the second nozzle 443. Figure 1B As shown, the fourth nozzles 445 are positioned at a distance H2 of 10 to 40 cm from the fourth packing unit 444. The fourth nozzles 445 spray a fourth washing liquid downwards toward the fourth packing unit 444 and upwards through the airflow passing the fourth packing unit 444. The spray angle θ2 (i.e., the angle of the washing liquid spray range) of the fourth nozzles 445 spraying the fourth washing liquid is 60 to 150 degrees to clean the airflow after treatment in the second particulate pretreatment tank 430, removing solid, liquid, and aerosol-like contaminants such as sulfuric acid aerosols and gaseous pollutants remaining in the airflow. The fourth washing liquid may contain water or an alkaline solution with a pH of 8 to 13. Next, the airflow flows upwards through the second demister layer 446, where large droplets are collected to form a liquid film, and then flow downwards into the second storage tank 460 by gravity. The second demister layer 446 may contain added Al. x Si y O z The catalyst is a chemically synthesized fiber, comprising, but not limited to, any one or a combination of two or more of the following: polyester, nylon, and polyurethane fibers (Spandex). That is, the second demister layer 446 of the fourth embodiment of this invention can use the same catalyst as the demister layer 126 of the first embodiment, and has the same purpose and effect. After secondary cleaning in the second filter tank 440 stage, the airflow flows through a suitable conduit to the outlet 402 and is discharged. A bypass 414 is provided inside the device 400 near the top of the first particulate pretreatment tank 410 to facilitate uninterrupted airflow during disassembly and maintenance of the device 400.

[0130] Based on the above disclosure, those skilled in the art should understand that the first washing system 1000, the second washing system 2000, the third washing system 3000, and the fourth washing system 4000 are all applicable to the device 400 of this utility model.

[0131] Based on the above disclosure, those skilled in the art should understand that the antibacterial component content used in the first embodiment can also be applied to the second to fourth embodiments, and the catalyst content and specific examples of the catalyst used in the first embodiment can also be applied to the second to fourth embodiments.

[0132] The above embodiments of this utility model are merely illustrative examples and are not intended to limit the scope of protection of this utility model. Various changes or modifications made without departing from the spirit of this utility model to achieve equivalent effects should be included within the scope of protection of the claims of this utility model.

Claims

1. An apparatus for treating sulfuric acid aerosols and suspended molecular pollutants, characterized in that, The device includes at least one air inlet, one air outlet, at least one particulate pretreatment tank, and at least one filter tank. The particulate pretreatment tank is provided with a plurality of atomizing nozzles, and the filter tank includes at least one packing unit provided with a plurality of nozzles and a demisting layer. At least one airflow passes sequentially through the at least one air inlet, through the particulate pretreatment tank, the packing unit of the filter tank, and the demisting layer, and exits the device from the air outlet. The at least one airflow contains particulates containing sulfuric acid aerosol and suspended molecular pollutants. The atomizing nozzles of the particulate pretreatment tank are configured to spray high-pressure atomized spray liquid towards the at least one airflow. The spray angle of the atomizing nozzles is set to 20 degrees to 70 degrees, and the spray liquid height of the atomizing nozzles is set to 10 cm to 1000 cm, so that the particulates in the at least one airflow grow from a particle size of 0.1 micrometer to 2.5 micrometers to 50 micrometers to 100 micrometers. The nozzles are disposed between the packing unit and the demister layer, and the distance between the nozzles and the packing unit is 10 cm to 40 cm. The nozzles are configured to spray washing liquid towards the packing unit and the at least one airflow that has been treated by the particulate pretreatment tank through the packing unit at a spray angle of 60 degrees to 150 degrees, so as to clean the at least one airflow.

2. The apparatus for treating sulfuric acid aerosols and suspended molecular pollutants according to claim 1, characterized in that, The filter tank includes another packing unit disposed between the packing unit and the demister layer. The other packing unit is provided with several other nozzles disposed between the other packing unit and the demister layer, and the distance between the other nozzles and the other packing unit is 10 cm to 40 cm. The other nozzles are configured to spray another washing liquid at a spray angle of 60 degrees to 150 degrees toward the other packing unit and the at least one airflow passing through the other packing unit.

3. The apparatus for treating sulfuric acid aerosols and suspended molecular pollutants according to claim 1, characterized in that, The high-pressure atomized spray solution contains water or an alkaline solution with a pH of 8 to 13.

4. The apparatus for treating sulfuric acid aerosols and suspended molecular pollutants according to claim 1, characterized in that, The washing solution contains water or an alkaline solution with a pH of 8 to 13.

5. The apparatus for treating sulfuric acid aerosols and suspended molecular pollutants according to claim 2, characterized in that, The washing solution and the other washing solution contain water or an alkaline solution with a pH of 8 to 13.

6. The apparatus for treating sulfuric acid aerosols and suspended molecular pollutants according to claim 1, characterized in that, The flow direction of the at least one airflow through the particle pretreatment tank is opposite to the spray direction of the high-pressure atomized spray liquid, and the flow direction of the at least one airflow through the filter tank is opposite to the spray direction of the washing liquid.

7. The apparatus for treating sulfuric acid aerosols and suspended molecular pollutants according to claim 2, characterized in that, The flow direction of the at least one airflow through the particle pretreatment tank is opposite to the spray direction of the high-pressure atomized spray liquid, and the flow direction of the at least one airflow through the filter tank is opposite to the spray direction of the washing liquid and the other washing liquid.

8. The apparatus for treating sulfuric acid aerosols and suspended molecular pollutants according to claim 1, characterized in that, The filler unit contains chemically synthesized fibers with added antibacterial components, the chemically synthesized fibers being selected from any one or any combination of two or more of the following: polyester, nylon, and polyurethane fibers; the antibacterial components being selected from any one or any combination of two or more of the following: polystyrene, polyacrylonitrile, polyethylene, polypropylene, polyester, polyurethane, and polyamide.

9. The apparatus for treating sulfuric acid aerosols and suspended molecular pollutants according to claim 8, characterized in that, The content of the antibacterial component in the packing unit is 1 wt.% to 10 wt.%.

10. The apparatus for treating sulfuric acid aerosols and suspended molecular pollutants according to claim 1, characterized in that, This defogging layer contains added Al x Si y O z The catalyst is a chemically synthesized fiber selected from any one or a combination of two or more of the following: polyester, nylon, and polyurethane fibers.

11. The apparatus for treating sulfuric acid aerosols and suspended molecular pollutants according to claim 10, characterized in that, When x = 1, then y = 1, 2, 3 or 4 and z = 3, 6, 8 or 10; when x = 2, then y = 1 or 2 and z = 5, 6, 7 or 9.

12. The apparatus for treating sulfuric acid aerosols and suspended molecular pollutants according to claim 2, characterized in that, The high-pressure atomizing spray liquid contains fresh water, the washing liquid contains recycled water, and the other washing liquid contains fresh water; wherein the recycled water refers to water that flows continuously and is reused inside the device.

13. An apparatus for treating sulfuric acid aerosols and suspended molecular pollutants, characterized in that, It includes at least one air inlet, one air outlet, a first particulate pretreatment tank, a first filter tank, a second particulate pretreatment tank, and a second filter tank. The first particulate pretreatment tank is provided with a plurality of first atomizing nozzles. The first filter tank includes at least one first packing unit provided with a plurality of first nozzles and a first demisting layer. The second particulate pretreatment tank is provided with a plurality of second atomizing nozzles. The second filter tank includes at least one second packing unit provided with a plurality of second nozzles and a second demisting layer. At least one airflow passes sequentially through the first particulate pretreatment tank, the first packing unit and the first demister of the first filter tank, the second particulate pretreatment tank, the second packing unit and the second demister of the second filter tank, and exits the device from the outlet. The at least one airflow contains particulates containing sulfuric acid aerosol and suspended molecular pollutants. The first atomizing nozzles of the first particle pretreatment tank are configured to spray a first high-pressure atomized spray liquid towards the at least one airflow. The spray angle of the first atomizing nozzles is set to 20 degrees to 70 degrees, and the spray liquid height is set to 10 centimeters to 1000 centimeters, so that the particles in the at least one airflow grow from a particle size of 0.1 micrometers to 2.5 micrometers to 50 micrometers to 100 micrometers. The first nozzles are disposed between the first packing unit and the first demisting layer, with a distance of 10 centimeters to 40 centimeters between the first nozzles and the first packing unit. The first nozzles are configured to spray a first washing liquid towards the first packing unit and the at least one airflow that has been treated by the first particle pretreatment tank after passing through the first packing unit, at a spray angle of 60 degrees to 150 degrees, to clean the at least one airflow. The second atomizing nozzles of the treatment tank are configured to spray a second high-pressure atomizing spray liquid toward the at least one airflow flowing into the second particulate pretreatment tank. The spray angle of the second atomizing nozzles is set to 20 degrees to 70 degrees and the height of the second high-pressure atomizing spray liquid is set to 10 cm to 1000 cm, so that the particles in the at least one airflow grow from a particle size of 0.1 micrometer to 2.5 micrometers to 50 micrometers to 100 micrometers. The second nozzles are disposed between the second packing unit and the second demisting layer, and the distance between the second nozzles and the second packing unit is 10 cm to 40 cm. The second nozzles are configured to spray a second washing liquid toward the second packing unit and the at least one airflow that has been treated by the second particulate pretreatment tank through the second packing unit at a spray angle of 60 degrees to 150 degrees, so as to further clean the at least one airflow.

14. The apparatus for treating sulfuric acid aerosols and suspended molecular pollutants according to claim 13, characterized in that, The first filter tank includes a third packing unit disposed between the first packing unit and the first demister layer. The third packing unit is provided with a plurality of third nozzles disposed between the third packing unit and the first demister layer, and the distance between the third nozzles and the third packing unit is 10 cm to 40 cm. The third nozzles are configured to spray a third washing liquid at a spray angle of 60 degrees to 150 degrees toward the third packing unit and the at least one airflow passing through the third packing unit. The second filter tank also includes a fourth packing unit disposed between the second packing unit and the second demister layer. The fourth packing unit is provided with a plurality of fourth nozzles disposed between the fourth packing unit and the second demister layer, and the distance between the fourth nozzles and the fourth packing unit is 10 cm to 40 cm. The fourth nozzles are configured to spray a fourth washing liquid at a spray angle of 60 degrees to 150 degrees toward the fourth packing unit and the at least one airflow passing through the fourth packing unit.

15. The apparatus for treating sulfuric acid aerosols and suspended molecular pollutants according to claim 13, characterized in that, The first high-pressure atomizing spray liquid and the second high-pressure atomizing spray liquid contain water or an alkaline solution with a pH value of 8 to 13.

16. The apparatus for treating sulfuric acid aerosols and suspended molecular pollutants according to claim 13, characterized in that, The first and second washing solutions contain water or an alkaline solution with a pH of 8 to 13.

17. The apparatus for treating sulfuric acid aerosols and suspended molecular pollutants according to claim 14, characterized in that, The first, second, third, and fourth washing solutions contain water or an alkaline solution with a pH of 8 to 13.

18. The apparatus for treating sulfuric acid aerosols and suspended molecular pollutants according to claim 13, characterized in that, The flow direction of at least one airflow through the first particle pretreatment tank, the first filter tank, the second particle pretreatment tank, and the second filter tank is opposite to the spraying direction of the first high-pressure atomized spray liquid, the first washing liquid, the second high-pressure atomized spray liquid, and the second washing liquid.

19. The apparatus for treating sulfuric acid aerosols and suspended molecular pollutants according to claim 14, characterized in that, The flow direction of at least one airflow through the first particle pretreatment tank, the first filter tank, the second particle pretreatment tank, and the second filter tank is opposite to the spraying direction of the first high-pressure atomized spray liquid, the first washing liquid, the second washing liquid, the second high-pressure atomized spray liquid, the third washing liquid, and the fourth washing liquid.

20. The apparatus for treating sulfuric acid aerosols and suspended molecular pollutants according to claim 13, characterized in that, The first filler unit and the second filler unit contain chemically synthesized fibers with added antibacterial components, the chemically synthesized fibers being selected from any one or any combination of two or more of the following: polyester, nylon and polyurethane fibers; the antibacterial components being selected from any one or any combination of two or more of the following: polystyrene, polyacrylonitrile, polyethylene, polypropylene, polyester, polyurethane and polyamide.

21. The apparatus for treating sulfuric acid aerosols and suspended molecular pollutants according to claim 14, characterized in that, The first packing unit, the second packing unit, the third packing unit, and the fourth packing unit comprise chemically synthesized fibers with added antibacterial components, wherein the chemically synthesized fibers are selected from any one or any combination of two or more of the following: polyester, nylon, and polyurethane fibers; and the antibacterial components are selected from any one or any combination of two or more of the following: polystyrene, polyacrylonitrile, polyethylene, polypropylene, polyester, polyurethane, and polyamide.

22. The apparatus for treating sulfuric acid aerosols and suspended molecular pollutants according to claim 21, characterized in that, The content of the antibacterial component in the first packing unit, the second packing unit, the third packing unit and the fourth packing unit is 1 wt.% to 10 wt.%.

23. The apparatus for treating sulfuric acid aerosols and suspended molecular pollutants according to claim 13, characterized in that, The first and second demisting layers contain added Al. x Si y O z The catalyst is a chemically synthesized fiber selected from any one or a combination of two or more of the following: polyester, nylon, and polyurethane fibers.

24. The apparatus for treating sulfuric acid aerosols and suspended molecular pollutants according to claim 23, characterized in that, When x = 1, then y = 1, 2, 3 or 4 and z = 3, 6, 8 or 10; when x = 2, then y = 1 or 2 and z = 5, 6, 7 or 9.

25. The apparatus for treating sulfuric acid aerosols and suspended molecular pollutants according to claim 14, characterized in that, The first high-pressure atomizing spray liquid contains fresh water, the first washing liquid contains circulating water, and the third washing liquid contains fresh water; wherein the circulating water refers to water that flows continuously and is reused inside the device.

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