Ceramic gas nozzle inner hole polishing device
By polishing the inner hole of the ceramic gas nozzle using a pressurizing device and a connecting fixture system, the problem of inconsistent inner hole roughness is solved, achieving uniform polishing of the inner hole, preventing particle shedding, and improving the stability of gas delivery and the performance of semiconductor devices.
Patent Information
- Application Number
- CN202521793460.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-08-22
- Publication Date
- 2026-07-24
- Estimated Expiration
- 2035-08-22
AI Technical Summary
The inconsistent roughness of the inner hole of existing ceramic gas nozzles makes it easy for particles to fall off, affecting the stability of gas delivery and wafer cleanliness, and reducing the yield and reliability of semiconductor devices.
A pressurizing device and a connecting fixture system are used to polish the inner hole of the ceramic gas nozzle by delivering polishing fluid through pipelines. The flow rate gradient of the polishing fluid and the cutting action of the abrasive particles are used to remove the texture of the inner hole and ensure uniform roughness.
It effectively reduces the roughness of the inner hole, prevents particles from falling out, improves the stability of gas delivery and the cleanliness of the wafer, and enhances the yield and reliability of semiconductor devices.