Photon Mask
CN309052580SActive Publication Date: 2025-01-03TYCO OPTOELECTRONICS TECH (CHANGZHOU) CO LTD
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Patent Information
- Application Number
- CN202430239348.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2024-04-25
- Publication Date
- 2025-01-03
- Estimated Expiration
- 2039-04-25
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Figure 000007_ABST
Abstract
1. The name of this design product: Photon Mask. 2. Purpose of the product with this appearance design: The product with this appearance design is used for human facial skin care. 3. The design key point of this appearance design product lies in the shape of the product. 4. The picture or photo that best illustrates the design points: Stereoscopic diagram 1.
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