Tombstone (Memorial)
CN309326050SActive Publication Date: 2025-06-06SHANGHAI RUISHEN LANDSCAPE ENG CO LTD
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Patent Information
- Application Number
- CN202430670842.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2024-10-24
- Publication Date
- 2025-06-06
- Estimated Expiration
- 2039-10-24
Smart Images
Figure 000001_ABST
Abstract
1. The name of this design product: Tombstone (Memorial). 2. The purpose of this design product: used for funeral and interment, as a tombstone. 3. The design key point of this appearance design product lies in the shape. 4. The picture or photo that best illustrates the design points: Stereoscopic diagram 1. 5. The bottom surface of this design product is a part that is not easily visible or cannot be seen when in use, so the top view is omitted.
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