Facial mask (lifting double mask method)

CN309532259SActive Publication Date: 2025-10-03GUANGZHOU SIYU NONWOVEN PROD CO LTD +1
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Patent Information

Application Number
CN202530039046.3
Authority / Receiving Office
CN · China
Patent Type
Designs(China)
Current Assignee / Owner
Filing Date
2025-01-21
Publication Date
2025-10-03
Estimated Expiration
2040-01-21

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Abstract

1. The name of the product of this design: Facial mask (lifting double-film method). 2. Purpose of this design product: to be applied to the human face to provide care for the facial skin. 3. The key point of the design of this product lies in its shape. 4. The picture or photo that best illustrates the key points of the design: Design 1 3D drawing. 5. This appearance design product is a thin product, so the left and right views and the pitch view of Design 1 are omitted; this appearance design product is a thin product, so the left and right views and the pitch view of Design 2 are omitted. 6. Designate Design 1 as the base design.
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