residual gas analyzer
CN309954907SActive Publication Date: 2026-05-01SHANGHAI CHEYITIAN TECH CO LTD
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Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- SHANGHAI CHEYITIAN TECH CO LTD
- Filing Date
- 2025-10-22
- Publication Date
- 2026-05-01
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Figure 000007_ABST
Abstract
1. Name of the product in this design: Residual Gas Analyzer. 2. Purpose of this design: To perform qualitative and quantitative analysis of the composition of gases in closed vacuum systems of etching and thin film processing equipment. 3. The key design features of this product are the combination of shape and pattern. 4. The image or photograph that best illustrates the design's key points: a 3D model.
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