Atomic layer deposition equipment
CN309990691SActive Publication Date: 2026-05-19HUZHOU QUAIL FIRE PHOTOELECTRIC CO LTD
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Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- HUZHOU QUAIL FIRE PHOTOELECTRIC CO LTD
- Filing Date
- 2025-10-21
- Publication Date
- 2026-05-19
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Figure 000007_ABST
Abstract
1. Name of the product in this design: Atomic Layer Deposition Equipment. 2. Application of this design: This design is used in atomic layer deposition equipment for coating the electron transport layer (ETL), hole transport layer (HTL), buffer layer, and encapsulation layer of perovskite solar cells. 3. The key design feature of this product is its shape. 4. The image or photograph that best illustrates the design's key points: a 3D model.
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