Photon skin rejuvenation masker (2518F)

CN309993685SActive Publication Date: 2026-05-22SHENZHEN SIKEN 3D TECH DEV
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Designs(China)
Current Assignee / Owner
SHENZHEN SIKEN 3D TECH DEV
Filing Date
2025-10-14
Publication Date
2026-05-22

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Abstract

1. The name of the design product: Photon skin care mask instrument (2518F). 2. The use of the design product: For facial beauty. 3. The design points of the design product: In shape. 4. The picture or photo that best shows the design points: Perspective view 1.
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