nasal mask

CN310020195SActive Publication Date: 2026-06-05BEIJING WANSHENG RENHE TECH
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Designs(China)
Current Assignee / Owner
BEIJING WANSHENG RENHE TECH
Filing Date
2025-09-09
Publication Date
2026-06-05

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Abstract

1. The name of the design product: nasal mask. 2. The use of the design product: the design product is used for filtering inhaled air. 3. The design points of the design product: in shape. 4. The picture or photo that best indicates the design points: design 1 combination state diagram. 5. Design 1 is designated as the basic design.
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