X-ray diffraction stress meter
CN310022623SActive Publication Date: 2026-06-09SHENZHEN XPECTVISION TECH CO LTD
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- SHENZHEN XPECTVISION TECH CO LTD
- Filing Date
- 2025-11-06
- Publication Date
- 2026-06-09
Smart Images
Figure 000007_ABST
Abstract
1. The name of the design product: X-ray diffraction stress meter. 2. The use of the design product: The design product is used for emitting X-ray diffraction imaging to determine the stress of materials. 3. The design points of the design product: lie in the shape shown by the product. 4. The picture or photo best indicating the design points: perspective view 1.
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