Display device
Patent Information
- Application Number
- DE102012109438
- Authority / Receiving Office
- DE · DE
- Patent Type
- Patents
- Current Assignee / Owner
- Priority Date
- 2011-12-15
- Filing Date
- 2012-10-04
- Publication Date
- 2025-07-10
- Estimated Expiration
- 2032-10-04
Smart Images

Figure 00000000_0000_ABST
Abstract
Description
BACKGROUND OF THE INVENTIONField of the invention
[0001] This document relates to a display device and, more particularly, to a display device which prevents penetration of external moisture and oxygen and which has an improved (e.g., extended) lifetime. Discussion of related technology
[0002] In recent years, several flat panel displays have been developed that are capable of reducing weight and volume, which are disadvantages of a cathode ray tube. Flat panel displays include a liquid crystal display (LCD), a field emission display (FED), a plasma display panel (PDP), and / or an organic light-emitting display (OLED). Further examples of display devices are described in DE 10 2012 203 530 A1, DE 10 2010 030 041 A1, EP 1 677 274 A1, and US 2010 / 0 200 846 A1.
[0003] Among the previous flat panel displays, the organic light-emitting display is a self-emitting display device that electrically excites organic components and emits light. Unlike liquid crystal displays, the organic light-emitting display (e.g., a diode) does not require a backlight unit. Therefore, the organic light-emitting display can be manufactured as a light and thin type using simple processes. In addition, the organic light-emitting display can be manufactured at low temperatures and has characteristics of fast response speed of less than one millisecond, low power consumption, a wide viewing angle, and high contrast.
[0004] The organic light-emitting display has an emission layer between an anode and a cathode. Therefore, holes supplied from the anode combine with electrons supplied from the cathode in the organic emission layer to form electron-hole pairs, i.e., excitons. When the excitons transition from an excited state to a ground state, energy is generated, causing the organic light-emitting diode to emit light.
[0005] Fig. 1 is a cross-sectional view showing a conventional organic light-emitting display, and Fig. 2 is a plan view showing an organic light-emitting display that has been shrunk.
[0006] Referring to Fig.1, the conventional organic light-emitting display includes: a first electrode 12 formed on a substrate 10, a bank layer 13 formed on the first electrode 12, an organic emission layer 14 formed on the first electrode 12 exposed through the bank layer 13, and a second electrode formed on the organic emission layer 14. A passivation film 17 covering the elements disposed beneath it, including the second electrode 15, is formed, and an encapsulation substrate 24 encapsulates the substrate 10 using an encapsulant 22.
[0007] Although the conventional organic light-emitting display described above has the passivation film 17 formed on the second electrode 15 to protect the elements arranged below it, an impurity with a large diameter may be arranged (for example, introduced) in the process of forming the passivation film 17. In this case, external moisture or oxygen penetrates into the organic emission layer 14 via a gap in the passivation film 17 formed due to the impurity 20. As shown in Fig. 2, the organic emission layer 14 has the problem of shrinkage due to penetration of moisture and oxygen, which deteriorates the organic emission layer 14 and causes it to not emit light. BRIEF DESCRIPTION OF THE INVENTION
[0008] One aspect of this document is to provide a display device that prevents the ingress of external moisture and oxygen and has an improved (e.g., extended) lifetime.
[0009] According to the invention, a display device according to the independent patent claims is provided.
[0010] Advantageous further developments are described in the dependent claims. BRIEF DESCRIPTION OF THE DRAWINGS
[0011] The accompanying drawings, which are included to provide a further understanding of the invention, illustrate embodiments of the invention and together with the description serve to explain the principles of the invention.
[0012] The drawings show: Fig. 1 is a cross-sectional view showing a conventional organic light-emitting display; Fig.2 is a plan view showing an organic light-emitting display that has been shrunk; Fig. 3 is a cross-sectional view showing a display device in accordance with a first exemplary embodiment of the present invention; Fig. 4 is a plan view showing the display device according to Fig. 3 shows; Fig. 5 is a cross-sectional view showing the display device in accordance with the first exemplary embodiment of the present invention; Fig. 6 is a plan view showing the display device according to Fig. 5 shows; Fig. 7 is a cross-sectional view showing a display device in accordance with a second exemplary embodiment of the present invention; Fig.8 is a cross-sectional view showing a display device in accordance with a third exemplary embodiment of the present invention; Fig. 9 is a plan view showing the display device according to Fig. 8 shows; Fig. 10 is a view showing the left side of a display device having an organic insulator film, and Fig. 11 is a view showing the top of the display device; Fig. 12 Photographs of SEM and AFM measurements performed on the display devices manufactured in accordance with Comparative Example 2 and Example 2 of the present invention; and Fig. 13 is a graph showing the result of analysis of the oxygen content in the display devices manufactured in accordance with Comparative Example 2 and Example 2 of the present invention. DETAILED DESCRIPTION OF THE EMBODIMENTS
[0013] Reference will now be made in detail to embodiments of the invention, examples of which are shown in the accompanying drawings.
[0014] The Fig. 3 and Fig. 5 are cross-sectional views showing a display device in accordance with a first exemplary embodiment of the present invention. Fig. 4 is a plan view showing the display device according to Fig. 3 shows. Fig. 6 is a plan view showing the display device according to Fig. 5 shows.
[0015] As in Fig.3, the display device 100 according to the first exemplary embodiment includes: a substrate 110, a first electrode 130 disposed on the substrate 110, a second electrode 136, an organic emission layer 134 disposed between the first electrode 130 and the second electrode 136, a second passivation film 140 disposed on the second electrode 136, an organic insulator film 170 disposed on the second passivation film 140 and surrounding an emission region EA in which light is emitted from the organic emission layer 134, and a first passivation film 142 covering the second passivation film 140 and the organic insulator film 170.
[0016] More specifically, a thin-film transistor TFT and a capacitor Cst are disposed on the substrate 110. The thin-film transistor TFT includes a semiconductor layer 112, a gate electrode 118, a source electrode 126, and a drain electrode 124. A gate insulator film 116 is disposed between the semiconductor layer 112 and the gate electrode 118. An interlayer insulator film 122 is disposed between the gate electrode 118, the source electrode 126, and the drain electrode 124. The capacitor Cst includes a lower capacitor electrode 114 and an upper capacitor electrode 120, with the gate insulator film 116 disposed therebetween.
[0017] Although the first exemplary embodiment of the present invention is exemplified by adopting a top-gate type thin film transistor in which the gate electrode 118 is disposed on the semiconductor layer 112, the present invention is not limited thereto, but a bottom-gate type thin film transistor in which the gate electrode 118 is disposed under the semiconductor layer 112 is also applicable.
[0018] A cap layer 124 is disposed on the substrate 110 where the thin-film transistor TFT and the capacitor Cst are formed. The cap layer 124 protects the thin-film transistor TFT and the capacitor Cst and flattens (planarizes) steps formed by the thin-film transistor TFT.
[0019] The first electrode 130 is disposed on the cap layer 124. The first electrode 130 is an anode, which may be formed from a transparent conductive material that has a high work function and allows light to pass through it, such as indium tin oxide (ITO), indium zinc oxide (IZO), indium cerium oxide (ICO), or zinc oxide (ZnO). The first electrode 130 is electrically connected to the drain electrode 124 of the thin-film transistor TFT via a conduction hole 126 (e.g., a via hole or a through hole) that extends through the cap layer 124 and exposes the drain electrode 124 of the thin-film transistor TFT.
[0020] Bank layer 132 is disposed on first electrode 130. Bank layer 132 may be a pixel-defining film that exposes a portion of first electrode 130 and defines a pixel. Organic emission layer 134 is disposed on bank layer 132 and the exposed first electrode 130. Organic emission layer 134 is a layer that emits light by recombination of electrons and holes. A hole injection layer or hole transport layer may be disposed between organic emission layer 134 and first electrode 130, and an electron transport layer or electron injection layer may be disposed on organic emission layer 134.
[0021] The second electrode 136 is disposed on the substrate 110 where the organic emission layer 134 is formed. The second electrode 136 is a cathode, which may comprise magnesium (Mg), calcium (Ca), aluminum (Al), silver (Ag), or an alloy thereof having a low work function.
[0022] The display device according to the exemplary embodiment of the present invention may be of a bottom-emitter type in which light is emitted from the organic emission layer 134 toward the substrate 110, or of a top-emitter type in which light is emitted from the organic emission layer 134 toward the second electrode 136. The bottom-emitter type display device is configured such that the first electrode 130 transmits light, and the second electrode 136 has a thickness large enough to reflect light. On the other hand, the top-emitter type is configured such that the first electrode 130 has a reflective layer formed of aluminum (Al), silver (Ag), or nickel (Ni), and the second electrode 136 has a thickness small enough to allow light to pass through it; preferably, a thickness of 0.1 to 5 nm.
[0023] The second passivation film 140, which covers the top surface of the second electrode 136, is disposed on the substrate 110 where the second electrode 136 is formed. Covering the top surface of the second electrode 136 refers to forming the second passivation film 140 along the coverage of the step of the second electrode 136. The second passivation film 140 functions to protect the elements disposed thereunder and prevent moisture from penetrating the organic emission layer 134, and includes or consists of a silicon nitride film, a silicon oxide film, and / or aluminum oxide, and has a single-layer or multi-layer structure thereof.
[0024] The organic insulator layer 170 is disposed on the second passivation film 140. As shown in Fig.4, the organic insulator film 170 is formed in an outer region of the emission region EA in a shape so as to surround the emission region EA. The emission region EA is a region where light from the organic emission layer 134 is emitted by RGB sub-pixels to display an image. The organic insulator film 170 is disposed in an outer region other than the emission region EA and prevents deterioration of the transmittance of light emitted from the emission region EA. The organic insulator film 170 may include, but is not limited to, an epoxy-type monomer having an excellent effect as a barrier against moisture or oxygen, and may include, for example, epoxy-type and / or siloxane-type and / or acrylic-type and / or urethane-type monomers and / or combinations thereof.
[0025] The width w of the organic insulating film 170 surrounding the emission region EA of the display device 100 is in a range of 1 to 30 mm. When the width w of the organic insulating film 170 is equal to or greater than 1 mm, moisture and oxygen can be prevented from penetrating the display device 100 from the outside. When the width w of the organic insulating film 170 is equal to or less than 30 mm, a bezel of the display device can be prevented from widening due to the organic insulating film 170.
[0026] The thickness of the organic insulating film 170 ranges from 0.5 to 200 μm. When the thickness of the organic insulating film 170 is equal to or greater than 0.5 μm, the organic insulating film 170 fills a gap in the second passivation film 140 caused by an impurity, and therefore, the second passivation film 140, which is formed later, is formed uniformly, thereby preventing the penetration of moisture or oxygen. When the thickness of the organic insulating film 170 is equal to or less than 200 μm, this prevents an increase in the process time (e.g., the manufacturing time) of the organic insulating film 170 and an increase in material costs.
[0027] As previously mentioned in Fig.As shown in Figure 1, when a gap is created due to an impurity in an inorganic film, such as the second passivation film 140 or the second electrode 136, under the organic insulator film 170, the organic insulator film 170 in liquid form fills the gap, thereby making the second passivation film 140 uniform, preventing the intrusion of moisture or oxygen. Furthermore, the organic insulator film 170 is formed in a shape to surround the emission region EA of the display device 100 and therefore acts as a dam to prevent the intrusion of moisture and oxygen from outside the display device 100.
[0028] The first passivation film 142, which covers the organic insulator film 170 and the second passivation film 140, is disposed on the organic insulator film 170 and the second passivation film 140. The first passivation film 142 is formed of the same material as the preceding second passivation film 140 and is capable of protecting the elements disposed thereunder and preventing the penetration of oxygen and moisture from the outside.
[0029] The encapsulation substrate 160 is attached to the substrate 110 with the first passivation film 142 by means of a fill sealant 165. The fill sealant 165 serves to bond the substrate 110 and the encapsulation substrate 160 to protect the elements disposed therein. The fill sealant 165 may be a material that has excellent adhesion characteristics and excellent light transmittance. For example, the fill sealant 165 may comprise a thermosetting or ultraviolet-curing material and / or may comprise or consist of an epoxy-like, acrylic-like, imide-like, or silane-like material.
[0030] As explained above, the display device of the present invention has the advantage of preventing the intrusion of moisture and oxygen from the outside into the display device by forming an organic insulator film surrounding the emission region and preventing the intrusion of moisture or oxygen by filling a gap caused by an impurity with the organic insulator film, thereby uniformly forming the second passivation film.
[0031] As in the Fig. 5 and Fig. 6, the display device according to the first exemplary embodiment of the present invention is configured such that the organic insulator film 170 covers a part of the emission region EA. As shown in Fig.As shown in Figure 6, the organic insulator film 170 has a large width w to cover the inside of the emission region EA. The larger the width w of the organic insulator film 170, the greater the effect of preventing the penetration of moisture and oxygen from the outside. However, as the width of the organic insulator film 170 increases, the bezel of the display device becomes larger. Therefore, in this exemplary embodiment, the organic insulator film 170 is formed to cover a part of the emission region EA. Preferably, the organic insulator film 170 is formed to cover as small a part of the emission region EA as possible so as not to deteriorate the transmittance of light emitted from the organic emission layer 134.
[0032] Fig.7 is a cross-sectional view showing a display device according to a second exemplary embodiment of the present invention. Hereinafter, the same components as those in the first exemplary embodiment are denoted by the same reference numerals, and their descriptions are omitted.
[0033] As in Fig.7, the display device according to the second exemplary embodiment includes: a substrate 110, a first electrode 130 disposed on the substrate 110, a second electrode 136, an organic emission layer 134 disposed between the first electrode 130 and the second electrode 136, an organic insulator film 170 disposed on the second electrode 136 and surrounding an emission region EA in which light is emitted from the organic emission layer 134, and a first passivation film 142 covering the organic insulator film 170.
[0034] Specifically, in the second exemplary embodiment of the present invention, the organic insulator film 170, which contacts (e.g., touches) the second electrode 136, is formed on the second electrode 136, and the first passivation film 142 is formed covering the organic insulator film 170. In the second exemplary embodiment of the present invention, the second passivation film of the preceding first exemplary embodiment is omitted. Omitting the second passivation film has the advantage of improving the transmittance of light emitted from the organic emission layer 134 and helping to maintain the effect of protecting against moisture and oxygen.Further, the display device according to the second exemplary embodiment of the present invention may be formed such that the organic insulator film 170 covers a part of the emission region EA or not.
[0035] In the display device according to the second exemplary embodiment of the present invention, when contamination is generated after the manufacturing process of the second electrode 136, the organic insulator film 170 fills a gap caused by the contamination, and thereby the first passivation film 142 formed later is uniformly formed. Accordingly, the first passivation film 142 can be improved in its effect of preventing the penetration of moisture and oxygen.
[0036] Fig.8 is a cross-sectional view showing a display device in accordance with a third exemplary embodiment of the present invention. Fig. 9 is a plan view showing the display device according to Fig. 8. Hereinafter, the same components as those of the first exemplary embodiment are denoted by the same reference numerals, and their description is omitted.
[0037] As in Fig. 8, the display device according to the third exemplary embodiment includes: a substrate 110, a first electrode 130 disposed on the substrate 110, a second electrode 136, an organic emission layer 134 disposed between the first electrode 130 and the second electrode 136, and a second passivation film 140 covering the second electrode 136.
[0038] In the third exemplary embodiment of the present invention, an organic insulator film 170 is disposed on the second passivation film 140. Unlike the first and second exemplary embodiments, the organic insulator film 170 is formed to cover an emission region EA that emits light. The organic insulator film 170 acts as an adhesive layer between the first passivation film 142 and the second passivation film 140, thereby ensuring device reliability under high temperature and high humidity conditions.
[0039] A first passivation film 142 covering the organic insulator film 170 and the second passivation film 140 is disposed on the organic insulator film 170. The first passivation film 142 is formed of the same material as the aforementioned second passivation film 140 and is capable of protecting the elements disposed thereunder and preventing penetration of oxygen and moisture from the outside.
[0040] The display device according to the third exemplary embodiment of the present invention further includes a metal oxide film 150 formed between the first passivation film 142 and the second passivation film 140. More specifically, the metal oxide film 150 is formed on an interface where the first passivation film 142 and the second passivation film 140 face each other. That is, the metal oxide film 150 contacting the second passivation film 140 is formed on the second passivation film 140, and the first passivation film 142 contacting the metal oxide film 150 is formed on the metal oxide film 150.
[0041] The metal oxide film 150 serves to buffer the unstable interface between the first passivation film 142 and the second passivation film 140. The first passivation film 142 and the second passivation film 140 are formed by chemical vapor deposition using a plasma, such as PECVD. In the present invention, the second passivation film 140 is first formed by PECVD, then the organic insulator film 170 is formed in another chamber, and the first passivation film 142 is then formed by PECVD. Therefore, the interfacial characteristics between the first passivation film 142 and the second passivation film 140 are not good due to a discontinuous plasma process.
[0042] In the present invention, the metal oxide film 150, which is to be in contact with the first passivation film 142, is formed on the second passivation film 140 after the second passivation film 140 and the organic insulator film 170 are formed. The metal oxide film 150 is formed of a metal oxide, such as aluminum oxide, magnesium oxide, or indium tin oxide, and is formed by a low-temperature film-forming process such as sputtering, chemical vapor deposition, atomic layer deposition, facing target sputtering, etc. The metal oxide film 150 is formed to a thickness of 500 to 2000 µm and buffers the interface between the first passivation film 142 and the second passivation film 140.
[0043] As in Fig.As shown in Figure 9, the metal oxide film 150 is formed to surround the emission region EA in which light is emitted from the organic emission layer 134, and is also formed in a region other than the emission region EA so as not to block the light emitted from the organic emission layer 134. An encapsulation substrate 160 is attached to the substrate 110 having the first passivation film 142 by means of a filling sealant 165.
[0044] As can be seen from the foregoing, the display device according to the third exemplary embodiment of the present invention can prevent defects such as bubbles that may be generated between the first passivation film and the second passivation film by forming a metal oxide film between the first passivation film and the second passivation film. Accordingly, there is an advantage of preventing the intrusion of moisture and oxygen from outside the display device by means of the interface (interlayer) between the first passivation film and the second passivation film.
[0045] Exemplary experimental examples are disclosed below to help understand the present invention. However, these exemplary examples are merely illustrative of the present invention and do not limit the scope of the present invention. <Beispielhaftes experimentelles Beispiel 1> Comparison example 1
[0046] A display device having the structure described above according to Fig. 1 was fabricated. A passivation film was formed from a single-layer silicon nitride film with a thickness of 0.5 µm. Example 1
[0047] A display device having the structure described above according to Fig. 5 was fabricated. A first passivation film was formed from a silicon nitride film with a thickness of 0.5 µm, and a second passivation film was formed from a silicon nitride film with a thickness of 1.5 µm. As shown in the Fig. 10 and Fig.11, the thus formed display device of the example was formed such that an organic insulator film (indicated by the dotted line) covers a part of an emission region in which a plurality of pixels were formed.
[0048] A reliability test was conducted on the display devices manufactured in accordance with Comparative Example 1 and Example 1, and the results are shown in Table 1 below. In the following reliability test, 30 panels each were prepared for Comparative Example 1 and Example 1 and were left for 100, 200, 300, 400, and 500 hours in an atmosphere with a temperature of 85°C and a humidity of 85%. [Table 1] Hours Number of functioning panels (percentage of non-defective products) Comparison example Example 500 0 17 (56%) 400 0 19 300 0 19 200 0 20 100 2 (6%) 24
[0049] As shown in Table 1, in the display device according to Comparative Example 1, there was not a single panel that functioned normally when the reliability test was conducted for 200, 300, 400, and 500 hours, and two panels functioned normally when the reliability test was conducted for 100 hours. In contrast, in the display device according to Example 1 of the present invention, it was confirmed that a minimum of 17 panels functioned normally for each time range. <Beispielhaftes experimentelles Beispiel 2> Example 2
[0050] A display device having the structure described above according to Fig.8 was fabricated. A first passivation film was formed from a silicon nitride film with a thickness of 0.5 µm, an organic insulator film was formed from epoxy resin with a thickness of 10 µm, and a second passivation film was formed from a silicon nitride film with a thickness of 1.5 µm. And a metal oxide film was formed from an aluminum oxide film with a thickness of 500 µm. Comparison example 2
[0051] A display device was fabricated without forming a metal oxide film under the same conditions as the previous Example 2.
[0052] Photographs of SEM and AFM measurements of the display devices manufactured in accordance with the preceding Comparative Example 2 and in accordance with the preceding Example 2 are shown in Fig. 12 and in Fig.13 shows the result of an analysis of the oxygen content using a ToF-SIMS (Time-of-Flight Secondary Ion Mass Spectroscopy) depth profile in the display devices fabricated according to Comparative Example 2 and Example 2.
[0053] As in the Fig. 12 and Fig.As shown in Figure 13, it was confirmed that the first passivation film and the second passivation film without a metal oxide film according to Comparative Example 2 exhibited low surface roughness, and a high oxygen content was observed at the interface where the first passivation film and the second passivation film contact each other (e.g., touch). In contrast, it was confirmed that the first passivation film and the second passivation film with a metal oxide film formed therebetween according to Example 2 exhibited good surface roughness, and the oxygen content was significantly reduced in a region where the first passivation film and the second passivation film face each other.
[0054] As can be seen from the foregoing, the display device according to the exemplary embodiments of the present invention can prevent moisture and oxygen from entering from outside the display device by forming an organic insulator film surrounding an emission region and can prevent the entry of moisture or oxygen because the organic insulator (film) fills a gap caused by an impurity and thereby makes the passivation film uniform.
[0055] Furthermore, the display device according to the exemplary embodiments of the present invention can prevent defects such as bubbles that may be generated between the first passivation film and the second passivation film by forming a metal oxide film between the first passivation film and the second passivation film. Accordingly, there is an advantage of preventing the intrusion of moisture and oxygen from outside the display device via the interface between the first passivation film and the second passivation film.
Claims
[1] Display device (100), comprising: a substrate (110); a first electrode (130) disposed on the substrate (110); a second electrode (136); an organic emission layer (134) disposed between the first electrode (130) and the second electrode (136); a second passivation film (140) disposed on the second electrode (136); an organic insulator film (170) disposed on the second passivation film (140) and surrounding an emission region (EA) that emits light from the organic emission layer (134), the organic insulator film (170) covering at most a part of the emission region (EA); and a first passivation film (142) covering the second passivation film (140) and the organic insulator film (170); wherein the width (w) of the organic insulating film (170) is in a range of 1 to 30 mm. [2] The display device (100) according to claim 1, wherein the thickness of the organic insulator film (170) is in a range of 0.5 to 200 µm. [3] The display device (100) according to claim 1 or 2, wherein the organic insulator film (170) comprises epoxy-type monomers or a combination of at least two of the following: epoxy-like monomers, siloxane-like monomers, acrylic monomers, urethane-like monomers. [4] The display device (100) according to any one of claims 1 to 3, wherein the organic insulator film (170) does not cover the emission region (EA). [5] The display device (100) according to any one of claims 1 to 3, wherein the organic insulator film (170) is formed to cover a part of the emission region (EA). [6] The display device (100) according to any one of claims 1 to 5, further comprising an encapsulating substrate (160) fixed to the substrate (110), wherein a filler (165) is formed between the substrate (110) and the encapsulating substrate (160) to fix the substrate (110) and the encapsulating substrate (160) to each other. [7] The display device (100) according to any one of claims 1 to 6, wherein the first passivation film (142) comprises a silicon nitride film and / or a silicon oxide film and / or aluminum oxide. [8] Display device (100), comprising: a substrate (110); a first electrode (130) disposed on the substrate (110); a second electrode (136); an organic emission layer (134) disposed between the first electrode (130) and the second electrode (136); a second passivation film (140) disposed on the second electrode (136); an organic insulator film (170) disposed on the second electrode (136) and surrounding an emission region (EA) that emits light from the organic emission layer (134); a first passivation film (142) covering the second passivation film (140) and the organic insulator film (170); and a metal oxide film (150) disposed between the first passivation film (142) and the second passivation film (140), wherein the metal oxide film (150) contacting the second passivation film (140) is disposed on the second passivation film (140), and the first passivation film (142) contacting the metal oxide film (150) is disposed on the metal oxide film (150). [9] The display device (100) according to claim 8, wherein the organic insulator film (170) is formed in a region other than the emission region (EA). [10] The display device (100) according to claim 8, wherein the organic insulator film (170) is formed to cover a part of the emission region (EA). [11] The display device (100) according to any one of claims 8 to 10, wherein the width of the organic insulator film (170) is in a range of 1 to 30 mm. [12] The display device (100) according to any one of claims 8 to 11, wherein the thickness of the organic insulating film (170) is in a range of 0.5 to 200 µm. [13] The display device (100) according to any one of claims 8 to 12, wherein the organic insulator film (170) comprises epoxy-like and / or siloxane-like and / or acrylic-like and / or urethane-like monomers and / or combinations thereof. [14] The display device (100) according to any one of claims 8 to 13, further comprising an encapsulation substrate (160) fixed to the substrate (110), wherein a filler (165) is formed between the substrate (110) and the encapsulation substrate (160) to fix the substrate (110) and the encapsulation substrate (160) to each other. [15] The display device (100) according to any one of claims 8 to 14, wherein the first passivation film (142) and the second passivation film (140) comprise a silicon nitride film and / or a silicon oxide film and / or aluminum oxide. [16] The display device (100) according to any one of claims 8 to 15, wherein a region between the first passivation film (142) and the second passivation film (140) corresponds to a region surrounding the emission region (EA). [17] Display device (100), comprising: a substrate (110); a first electrode (130) disposed on the substrate (110); a second electrode (136); an organic emission layer (134) disposed between the first electrode (130) and the second electrode (136); a second passivation film (140) covering the second electrode (136); an organic insulator film (170) disposed on the second passivation film (140) and formed to cover the emission region (EA); a first passivation film (142) covering the second passivation film (140) and the organic insulator film (170); and a metal oxide film (150) disposed between the first passivation film (142) and the second passivation film (140), wherein the metal oxide film (150) surrounds and does not cover the emission region (EA). [18] Display device (100), comprising: a substrate (110); a first electrode (130) disposed on the substrate (110); a second electrode (136); an organic emission layer (134) disposed between the first electrode (130) and the second electrode (136); an organic insulator film (170) disposed on the second electrode (136) and surrounding an emission region (EA) that emits light from the organic emission layer (134), the organic insulator film (170) covering at most a part of the emission region (EA); and a passivation film (142) covering the organic insulator film (170) and covering the second electrode (136) in the emission region (EA); wherein the width (w) of the organic insulating film (170) is in a range of 1 to 30 mm.
Citation Information
Patent Citations
Electronic device, organic light-emitting device and multi-layered protective structure
DE102010030041A1
Display device with reinforced voltage lines and manufacturing process for such a device
DE102012203530A1
display
EP1677274A1
Organic light emitting diode display
US20100200846A1