Methods for the automated determination of exposure patterns

Abstract

A computer-implemented method for the automated determination of exposure patterns for the layer-by-layer fabrication of at least one component from a CAD model of the component in an additive powder bed process, wherein the method comprises the following steps: a) slicing the CAD model into a finite number of layers (122); b) determining at least one exposure path (124) for each layer (122), wherein the exposure path (124) has beam position data for controlling an exposure beam (126) in the additive powder bed process, wherein determining the exposure path (124) comprises: i) creating and solving a partial differential equation and / or a functional, comprising discretizing the layer (122), wherein at least one boundary condition is assigned to a boundary (128) of the layer (122), and generating at least one solution function (130);ii) Determining the exposure path (124) from the at least one solution function (130), taking into account at least one property of the additive powder bed process; c) Determining at least one exposure pattern from the exposure paths (124) of the layers (122).;

Description

Technical field The invention relates to a computer-implemented method for the automated determination of exposure patterns for the layer-by-layer production of at least one component from a CAD model of the component in an additive powder bed process, a computer program for carrying out the computer-implemented method for the automated determination of exposure patterns, and a method for producing at least one component in an additive powder bed process using at least one automatically determined exposure pattern. Furthermore, the invention relates to a computational device for the automated determination of exposure patterns and a manufacturing device for the layer-by-layer production of at least one component in an additive powder bed process using at least one automatically determined exposure pattern.Methods, computer programs, and devices of the aforementioned type can be used, for example, in the field of additive manufacturing, particularly in powder bed fusion. Thus, the invention can be used especially in development and production, for example, in prototype or one-off production. Alternatively or additionally, the invention can also be used in series production, particularly in small-batch production. Other areas of application are also conceivable in principle. Technical background Numerous methods and devices are known in the art for the automated determination of exposure patterns for the layer-by-layer fabrication of components. These fabrication processes involve the use of exposure beams with a very small effective diameter compared to the overall component. In general, these methods and devices are suitable for generating geometry-independent exposure patterns. Typically, exposure patterns are generated according to a predefined pattern, for example, by using parallel lines at a predetermined discrete angle, such as a checkerboard pattern and / or equidistant points. WO 2013 / 079581 A1 discloses a method for producing a shaped body by layering from material powder. Despite the numerous advantages offered by the described methods and devices, many technical challenges remain. For example, conventional methods and devices can lead to overheating or insufficient melting, depending on the geometry of the components being manufactured. This can result in reduced component quality and an increased risk of component failure, such as during later use. Another technical challenge lies in addressing geometry-specific heat dissipation requirements during manufacturing. These are generally inadequately considered in known methods. Furthermore, conventional methods and devices typically fail to account for interactions between different areas of a component or, if multiple components are manufactured simultaneously, interactions between components.Another technical challenge concerns the reduction or avoidance of time-consuming and costly supports, for example through support structures, of individual component areas during manufacturing. Conventionally generated exposure patterns usually contain section-by-section straight polylines, which, however, have a detrimental effect on process stability and can therefore also negatively affect component quality. Object of the invention It would therefore be desirable to provide methods and devices for the automated determination of exposure patterns that at least largely avoid the disadvantages of the aforementioned methods and devices. In particular, the methods and devices should, on the one hand, enable the automated determination of exposure patterns with optimized properties and, on the other hand, ensure high cost-efficiency, especially time-optimized and economical production. General description of the invention This problem is addressed by a computer-implemented method for the automated determination of exposure patterns for the layer-by-layer production of at least one component from a CAD model of the component in an additive powder bed process, a computer program for carrying out the computer-implemented method for the automated determination of exposure patterns, a method for producing at least one component in an additive powder bed process using at least one automatically determined exposure pattern, a calculation device for the automated determination of exposure patterns, and a manufacturing device for the layer-by-layer production of at least one component in an additive powder bed process using at least one automatically determined exposure pattern, with the features of the independent claims.Advantageous further training opportunities, which can be implemented individually or in any combination, are shown in the dependent requirements. In the following, the terms "have," "exhibit," "comprise," or "include," or any grammatical variations thereof, are used in a non-exclusive manner. Accordingly, these terms can refer both to situations in which, apart from the features introduced by these terms, no other features are present, and to situations in which one or more additional features are present. For example, the expression "A has B," "A exhibits B," "A comprises B," or "A includes B" can refer both to the situation in which, apart from B, no other element is present in A (i.e., a situation in which A consists solely of B) and to the situation in which, in addition to B, one or more other elements are present in A, such as element C, elements C and D, or even further elements. Furthermore, it should be noted that the terms "at least one" and "one or more," as well as grammatical variations of these terms, when used in connection with one or more elements or features and intended to express that the element or feature may be present once or multiple times, are generally used only once, for example, when the feature or element is first introduced. Upon subsequent mention of the feature or element, the corresponding term "at least one" or "one or more" is generally no longer used, without restricting the possibility that the feature or element may be present once or multiple times. Furthermore, the terms "preferably," "in particular," "for example," or similar terms are used in the following text in connection with optional features without limiting alternative embodiments. Features introduced by these terms are optional features, and it is not intended that these features limit the scope of protection of the claims, and in particular the independent claims. As the person skilled in the art will recognize, the invention can also be implemented using other embodiments. Similarly, features introduced by "in one embodiment of the invention" or by "in an exemplary embodiment of the invention" are understood as optional features without limiting alternative embodiments or the scope of protection of the independent claims.Furthermore, these introductory expressions are intended to leave all possibilities of combining the features introduced herein with other features, whether optional or non-optional features, unaffected. In a first aspect of the present invention, a computer-implemented method for the automated determination of exposure patterns for the layer-by-layer fabrication of at least one component from a CAD model of the component using an additive powder bed process is proposed. The method comprises the steps described in more detail below. These steps can be performed in the sequence stated. However, a different sequence is also possible in principle. Furthermore, two or more of the process steps mentioned can be performed overlapping in time or simultaneously. Additionally, one or more of the process steps mentioned can be performed once or repeatedly. The method may also include further process steps beyond those mentioned, which are not specified here. The method comprises the following steps: a) slicing the CAD model into a finite number of layers, for example, substantially parallel to each other; b) determining at least one exposure path for each layer, wherein the exposure path has beam position data for controlling an exposure beam in the additive powder bed process, wherein determining the exposure path comprises: i) creating and solving a partial differential equation and / or a functional, comprising discretizing the layer, assigning at least one boundary condition to a boundary of the layer, and generating at least one solution function; ii) determining the exposure path from the at least one solution function, taking into account at least one property of the additive powder bed process; c) determining at least one exposure pattern from the exposure paths of the layers. The term "computer-implemented," as used here, is a broad term and should be interpreted according to its usual and common meaning as understood by those skilled in the art. The term is not limited to any specific or adapted meaning. Without limitation, the term can refer in particular to a process that is wholly or partly implemented using data processing means, especially using at least one processor. Thus, the computer-implemented method can, in particular, be a method that is wholly or partly executable in a processor. The term "CAD model," as used here, is a broad term and should be understood in its usual and common sense, as understood by those skilled in the art. The term is not limited to any specific or adapted meaning. Without limitation, the term can refer in particular to a technical file containing data and / or information regarding the shape and / or geometry of the component to be manufactured. For example, the CAD model may be in the form of a numerical description of the geometry of the component to be manufactured, preferably in the form of a numerical description of at least one surface of the component, in particular consisting of tessellated and / or discretized triangles. The CAD model may also include further data, for example, regarding at least one possible and / or suitable material for the component.In particular, the CAD model of the component can constitute input and / or input data for the computer-implemented method. The term "input data" as used here is a broad term and should be understood in its usual and common sense, as understood by those skilled in the art, and is not limited to any specific or adapted meaning. In particular, the input data, especially the CAD model, can be information that exists before the method is carried out and / or is available to the computer-implemented method and / or to which the method is applied. The term "additive powder bed fusion" as used here is a term to which its ordinary and common meaning, as understood by those skilled in the art, should be attributed. The term is not limited to a specific or adapted meaning. Without limitation, the term can refer in particular to an additive manufacturing process in which powdered and / or granular material is applied layer by layer to create a three-dimensional component. For example, in the additive powder bed fusion process, the component can be built up in parallel layers from a powdered material as the starting material, for example, on a base and / or build plate. In particular, in the additive powder bed fusion process, the component can be built up by cyclically applying a layer of powder to the base and / or build plate.The additive powder bed process can be particularly suitable for manufacturing components without physical and / or geometry-specific tools. For example, to produce the component, the cyclically applied powder layer can be locally exposed by at least one beam, such as at least one exposure beam, especially a high-energy beam, for example, a laser beam and / or electron beam. In particular, a local interaction can take place between the beam and the powdered material, for example, at a local point of action. For example, the powdered material at the point of action, for example, within an effective diameter of the exposure beam, can undergo a change of state through the interaction with the beam, for example, from powder to solid, in particular a transformation from loose granules to a stable composite suitable for force transmission.For example, the jet can be used to at least partially fuse the powder, particularly locally at a point of contact, with the material in its immediate vicinity, such as the material next to and / or underneath it, for example, with a previous powder layer and / or with a part of the component being formed. The diameter of the jet and / or the melting area created by the jet's impact on the powder, for example, a point of contact, can be much smaller than the dimensions of the component. In particular, the jet can create a point of contact, for example, a melting diameter D, for example, an area where melting occurs, between 0.4 µm and 15 mm, for example, 10 µm ≤ D ≤ 2 mm, and in particular, 20 µm ≤ D ≤ 500 µm. The powdered material as a starting material for production in the additive powder bed process can, for example, have a particle and / or grain size p, wherein 0.02 µm ≤ p ≤ 2.0 mm, in particular 5.0 µm ≤ p ≤ 500 µm, preferably 10 µm ≤ p ≤ 100 µm, particularly preferably 12 µm ≤ p ≤ 63 µm. The thickness d of the material layer, for example the powder layer in which the powdered material is applied in the additive powder bed process, for example the thickness of the powder layers arranged parallel to each other, can be, for example, between 0.4 µm and 12 mm. Thus, the powder layer thickness d can be, in particular, 5 µm ≤ d ≤ 2 mm, preferably 10 µm ≤ d ≤ 200 µm, preferably 10 µm ≤ d ≤ 100 µm. In additive powder bed fusion, a relative movement between the beam and the layer can be implemented for each of the cyclically applied powder layers, ensuring that all areas of the component being manufactured are exposed, and in particular melted. This relative movement can be generated, for example, by moving the beam relative to the material layer, by moving the material layer relative to the beam, or by a combination of these movements. A sequence and / or schedule for the relative movement can be defined, in particular, by the exposure path, especially for a single material layer, or by the exposure pattern, especially for all material layers.In particular, one or more components can be provided in the additive powder bed process to carry out this relative movement; for example, in the case of laser-based processes, at least one so-called laser scanner comprising at least two electronically movable mirrors can be used, and / or in the case of electron beam-based processes, a deflection unit comprising at least two capacitor plates can be used. The term "exposure pattern," as used here, is a term to which its ordinary and common meaning, as understood by a person skilled in the art, should be attributed. The term is not limited to any specific or adapted meaning. Without limitation, the term can refer in particular to information about a temporal and / or spatial sequence, for example, a schedule and / or process plan, or a relative movement between the jet and the powder bed, for example, for the production of at least one complete component. Thus, the exposure pattern can, for example, comprise a data set of exposure paths for each layer of the component, for instance, a collection of exposure paths for the layer-by-layer production of at least one complete component in an additive powder bed process.For example, the exposure pattern can comprise a set of exposure paths for the production of at least one complete component, i.e., data for exposing all material layers for the production of at least one complete component. In particular, the exposure pattern can be generated in the form of a technical file, for example, as a computer-readable data set. Thus, the exposure pattern can be, in particular, output and / or result data, such as a result, of the computer-implemented process. The term "output data" as used here is a broad term to which its ordinary and common meaning, as understood by those skilled in the art, should be attributed, and is not limited to a specific or adapted meaning. Thus, the output data, in particular the exposure pattern, can be information that is only available after the process has been fully or partially carried out and / or that results from the computer-implemented process, for example, that is generated by the computer-implemented process. Output data from a data processing process can, in particular, be input data for a subsequent and / or later data processing step and / or, in particular, for a subsequent, for example, later, data-controlled manufacturing process, such as a manufacturing process. The term "cutting" as used here is a term to which its ordinary and common meaning, as understood by those skilled in the art, should be attributed. The term is not limited to any specific or adapted meaning. Without limitation, the term can refer in particular to a process of separating and / or dividing data into individual data packages, which may also involve, for example, a reduction of the data. Thus, cutting the CAD model into a finite number of layers can, in particular, involve dividing the geometry of the component stored in the CAD model into individual data packages, where each data package may contain at least one layer of the component. Specifically, cutting can include a data processing step in which, for example, a boundary and / or a section surface of the CAD model is extracted.For example, a 3D geometry whose exterior consists of surfaces can be converted into 2D elements by slicing. In particular, by slicing the CAD model into a finite number of layers, the three-dimensional CAD model can be divided into a finite number of two-dimensional surfaces, here referred to as layers. The slicing of the CAD model can, for example, involve such a division that each data package, for example, each layer, contains lines, especially lines lying in a plane, preferably closed lines. For example, in step a), the CAD model can first be divided into a finite number of slices of equal thickness, for example, separated into data packages. In particular, each slice can have a thickness s, where 0.5 µm ≤ s ≤ 10 mm, for example, 5 µm ≤ s ≤ 500 µm. The thickness s can be predetermined, for example, by the additive powder bed process.In particular, the thickness s can, for example, correspond to the thickness of a powder layer in the additive powder bed process. Subsequently, in step a), the equally thick slices, in particular data packages containing information about the slices, can be converted into layers, in particular the data packages can be reduced, by storing a contour and / or an outline of the slices, in particular as a two-dimensional cross-sectional area. Thus, the slicing of the CAD model in step a) can involve converting the three-dimensional CAD model into a finite number of two-dimensional layers, each layer being able to contain a contour and / or an outline of a slice of the CAD model. The term "layer" as used here can, without limitation, refer in particular to a two-dimensional surface. In particular, a layer can be a cross-sectional area of ​​a slice of the CAD model.For example, the layer need not be limited to a specific area, but can refer to a geometry encompassing the area, including, for instance, a border and / or boundary of the cross-sectional area and / or a sectioning plane of the CAD model. For example, a first layer can encompass the cross-sectional area of ​​the first disk, while a second layer can encompass the cross-sectional area of ​​the second disk, and so on. For each layer, in particular for each of the layers cut in step a), at least one exposure path is determined in step b), in particular by repeatedly, for example iteratively, performing at least steps i) and ii). In this way, a separate exposure path can be determined for each of the finite number of layers. The term "exposure path" as used here is a term to which its ordinary and common meaning, as understood by those skilled in the art, should be attributed. The term is not limited to any special or adapted meaning. Without limitation, the term can refer in particular to any interaction path and / or scan path, for example, to a track and / or path on which an interaction between the beam and the powdered material can take place, for example, depending on the type of radiation used in the beam.For example, the exposure path, in particular the track and / or path, can also include at least partial interruptions, especially points where the beam can be interrupted or dropped during exposure. Alternatively, the exposure path can also be a continuous, uninterrupted path. For example, the exposure path can comprise a path to be followed and / or traversed by the beam, for example, a laser and / or electron beam, for layer-by-layer manufacturing of the component in an additive powder bed process. In this way, the exposure path includes, in particular, beam position data for controlling an exposure beam in the additive powder bed process, for example, data for controlling the positioning of the exposure beam.For example, the exposure path can comprise a variety of positional data that must be traced by the beam, particularly the exposure beam (e.g., a laser and / or electron beam), in the additive powder bed process. Specifically, the exposure path can include information about the exposure of exactly one layer. A first exposure path, for instance, can include information about the exposure of a first layer, while a second exposure path can include information about the exposure of a second layer, and so on. A set of exposure paths for the production of at least one component can, as explained above, constitute an exposure pattern. The exposure path can be a continuous path. Alternatively, the exposure path can also comprise several individual discrete paths, for example, it can be composed of several individual discrete paths, such as multiple exposure segments. In particular, the exposure path for at least one layer can be the output data from step b) ii) of the computer-implemented method. The exposure path can be described and / or stored, for example, using discrete points, polynomials, splines, NURBS, Bézier curves, etc. The term "construct" as used here, particularly in relation to step b) i), is a term to which its ordinary and common meaning, as understood by a person skilled in the art, should be attributed. The term is not limited to any special or adapted meaning. Without limitation, the term can refer in particular to a process of assignment and / or application. For example, constructing a partial differential equation can include assigning and / or applying a partial differential equation to a computational domain. For example, constructing a functional can include assigning and / or applying a functional to a computational domain.In particular, the creation of the partial differential equation and / or the functional can also involve selection from a predetermined list, for example, based on at least one predefined selection function, such as a similarity between the computational domain (e.g., a current layer of the component) and a basic geometry. Thus, the partial differential equation and / or the functional can be selected from a list based on its similarity to a circle, a rectangle, a triangle, or another basic geometry. Other selection criteria are also possible. For example, a corresponding list of partial differential equations and / or functionals can be available during the execution of the computer-implemented procedure.In particular, a corresponding list can be stored and / or saved, for example, on a processor and / or computer on which the computer-implemented procedure is carried out. For example, the selection of the partial differential equation and / or the functional can be based on the geometry of the CAD model. In particular, artificial intelligence methods, such as neural networks, can also be used for this selection. The term “solving a partial differential equation,” as used here, is a term to which its ordinary and common meaning, as understood by those skilled in the art, should be attributed. The term is not limited to any special or adapted meaning. Without limitation, the term can refer in particular to a process of finding a solution to a partial differential equation, preferably a non-zero solution. In particular, solving the partial differential equation can also include selecting, for example, a standard solution from a predetermined list.Alternatively or additionally, solving the partial differential equation can also involve applying a numerical method, such as determining an approximate solution, particularly using one or more of the finite element method (FEM), finite difference method (FDM), finite volume method (FVM), mesh-free Galerkin methods (GMF), and boundary element method (REM). A step in the numerical solution of the differential equation may include discretizing the computational domain and its boundary. The numerical solution of the partial differential equation may specifically involve constructing and inverting a matrix, matrix multiplications, and / or iterative methods, such as the Newton-Raphson method. The term "solving a functional" as used here is a term to which its ordinary and common meaning, as understood by those skilled in the art, should be attributed. The term is not limited to any special or adapted meaning. Without limitation, the term can refer in particular to a process of determining an optimization, for example, a minimum and / or a maximum and / or a predetermined target value, of a functional. In particular, solving the functional can also include selecting, for example, a standard optimization from a predetermined list. Alternatively or additionally, solving the functional can also include applying a numerical method, for example, determining an optimization of the functional using one or more of the finite element method (FEM), finite difference method (FDM), finite volume method (FVM), and boundary element method (REM). The computational domain, in particular the domain on which the partial differential equation and / or the functional is created and solved, can be limited to a single layer of the at least one component, i.e., it can be bounded, for example, by at least one boundary of the layer of the at least one CAD model of the component. In particular, the computational domain can be exactly one cross-sectional surface of the component, for example, a cross-sectional area. Thus, the boundary condition assigned to the edge of the layer in step b) i) can also be assigned to the edge of the computational domain, in particular applied to it. With such a computational domain, when applying a numerical method, in particular when using FEM, the elements used can be adapted to the edge of the layer, for example, to an outer contour of the component.For example, when using FEM, triangular and / or quadrilateral elements, especially with linear, quadratic, or cubic approaches, can be particularly advantageous. For instance, using FEM for computational domains limited to a single layer of the component can be beneficial because the elements can be adapted to the component's outer contour. Furthermore, adapting the element size to individual sections of the component, particularly the cross-sectional area, is also possible with FEM. For example, delicate sections can be solved with smaller elements than large areas, such as those within the surface. Alternatively, the computational domain, in particular the computational domain on which the partial differential equation and / or the functional is created and solved, can also include a cross-section of a build space and / or powder bed in the additive powder bed process, for example, a rectangular cross-section of a build space and / or powder bed. In particular, the computational domain can include a cross-section of the build space including the cross-sectional area of ​​the at least one component, for example, at least one layer of the CAD model of the component arranged in the build space. Thus, the boundary condition assigned to the edge of the layer in step b) i) can, for example, lie within the computational domain. In particular, step b) i) can further include assigning at least one condition to an interior of the computational domain.For example, in such a computational domain, when applying a numerical method, particularly when using FDM, computational meshes, such as structured Cartesian meshes, can be used. For example, using FDM for computational domains encompassing the design space can be advantageous because it may require fewer calculations, for example, fewer calculations compared to using FEM. For example, the computer-implemented method can also be suitable for the automated determination of exposure patterns for the layer-by-layer fabrication of multiple components from CAD models of the components in an additive powder bed process. For instance, when dealing with multiple components, the computational domain, particularly the domain on which the partial differential equation and / or the functional is created and solved, can encompass a cross-section of the build space, including the intersection surfaces of the multiple components. Thus, the boundary conditions assigned to the layer edges in step b) i) can, for example, lie within the computational domain. In particular, when automatically determining exposure patterns for the layer-by-layer fabrication of multiple components, the computational domain can comprise a common computational domain for all intersection surfaces of the multiple components.It is also possible to consider each component separately, for example by limiting the calculation area to one cross-sectional area of ​​each of the several components. The partial differential equation may be selected, in particular, from the group consisting of: Laplace equation, Poisson equation, Helmholtz equation, heat equation, wave equation, minimum surface equation. For example, the partial differential equation may also be a nonlinear partial differential equation. Thus, the partial differential equation may be a nonlinear partial differential equation in which second partial derivatives are raised to a power with an exponent less than 1. In particular, the following may hold for the partial differential equation: The term "solution function" as used here is a term to which its ordinary and common meaning, as understood by those skilled in the art, should be attributed. The term is not restricted to any special or adapted meaning.The term can, without limitation, refer in particular to a description, for example a mathematical and / or technical description, of a result and / or a determined goal of a mathematical and / or technical problem. In particular, the solution function can, for example, be a description of the solution of the partial differential equation. Alternatively, the solution function can also be a description of the optimization of the functional. In particular, the solution function can include the solution of the partial differential equation and / or the optimization of the functional, whereby the solution function can be in the form of a data set, for example as discrete data.The solution function can be determined, in particular, by numerically solving the partial differential equation and / or by numerically optimizing the functional, and may, for example, have and / or comprise a multitude of numerical values, especially within a dataset. The solution function can, in particular, have a numerical value as the solution for each degree of freedom of the discretization. Alternatively or additionally, the solution function can, for example, also have several piecewise-defined functions. In particular, the solution function can be the input data from step b) i) of the computer-implemented procedure. In step ii), the exposure path can be determined directly from the solution function, in particular from the solution function for the partial differential equation and / or the functional generated in step i). For example, the exposure path can be determined from the solution function by continuing it, for example by concatenating waypoints, according to a predefined scheme, especially starting from a starting point, such as a predetermined or randomly chosen point or location. Thus, for example, the exposure path can be continued from the starting point in the direction of a maximum gradient, such as a gradient with the greatest absolute value, or even in the direction of the smallest negative gradient. Alternatively or additionally, the exposure path can also be continued in the direction of a predefined value, such as a constant value.Other directions are also possible, for example, a direction resulting from at least one gradient and / or an isoline. In particular, determining the exposure path can be carried out wholly or partially during the generation of the solution function; in particular, steps i) and ii) can be performed wholly or partially in parallel. For example, while solving the partial differential equation, for instance, during an incremental transient solution of a Laplace equation, especially under constant boundary conditions, the exposure path can be continued in the direction of the largest gradient (which may be negative) and / or in the direction of a specific value (e.g., a predetermined value), particularly starting from a starting point.Simultaneously, for example at the same time, or sequentially, particularly with temporal and / or spatial separation, a fixed or time-varying function value and / or a source term can be assigned to the already existing part of the exposure path, for example, the previously defined waypoints. For example, when solving the partial differential equation and / or the functional discretely, the exposure path can be determined directly when creating the solution function, for example, by using a value of the solution function, such as by imprinting the function value. In particular, step ii) can comprise at least two sub-steps. For example, a first sub-step ii) 1. can include determining a vector field from the at least one solution function generated in step i). For example, a second sub-step ii) 2. can include determining the exposure path from the vector field, taking into account the at least one property of the additive powder bed process. The term "vector field" as used here is a term to which its ordinary and common meaning, as understood by those skilled in the art, should be attributed. The term is not limited to any special or adapted meaning. Without limitation, the term can refer in particular to a data set that specifies a vector, especially a direction, for example, a slope, of at least one solution, for example, the at least one solution function. In particular, the vector field can specify or comprise a vector for a finite number of points, for example, for discrete locations in the computational domain, and in particular for each element, for example, when applying a numerical method. For example, the vector field can be a discrete vector field, for example, comprising vectors only for discrete locations in the computational domain and / or for each element used in the numerical method.Alternatively or additionally, the vector field can also include vectors lying between the discrete locations on the computational domain, for example, determined by interpolation. Thus, the vector field can, for example, comprise a collection of vectors. In particular, the vector field can be, for example, a direction field, specifically a collection of direction vectors, where each vector can specify a direction in which the graphs of possible solutions of the partial differential equation and / or the optimization of the functional run. In particular, the vector field can be input data from step b) ii) 1. of the computer-implemented method, where the data can be, for example, multidimensional datasets, but preferably two-dimensional datasets.The data and / or information about the vector field, for example the input data, can preferably comprise two-dimensional projections of the vector field, in particular projected onto the respective layer of the CAD model. The vector field can, for example, be selected from the group consisting of: a gradient field; a tangent field; and a direction field, in particular an isoline direction field, for example, a field generated on isolines. The term "property of the additive powder bed process," as used here, is a term to which its ordinary and common meaning, as understood by those skilled in the art, should be attributed. The term is not limited to any special or adapted meaning. Without limitation, the term can refer in particular to a feature and / or predicate of the additive powder bed process, for example, to at least one machine- and / or material-related parameter and / or data set. For example, the property of the additive powder bed process can refer to a characteristic and / or feature intrinsically attributable to the powder bed process. In particular, the at least one property of the additive powder bed process considered can include at least one piece of information about the feature and / or predicate, for example, in any file format, such as a table of values.At least one property of the additive powder bed process can be input and / or input data for the computer-implemented process. In particular, at least one property of the additive powder bed process may be selected from the group consisting of: a hatch spacing, in particular a minimum permissible hatch spacing and / or a maximum permissible hatch spacing; a machine parameter, in particular a scan power, for example a laser power or an electron beam power, a scan area, for example a cross-section of a laser beam or an electron beam, a layer size, for example an area of ​​a layer, in particular a maximum length and / or width of the area of ​​a layer; a layer spacing, for example a vertical extent and / or thickness of the powder layer, a powder bed dimension, in particular at least one dimension of a build space available for production in the additive powder bed process, for example a length and / or width of the powder bed;a material parameter, for example a thermal conductivity, a melting temperature; The term "hatch spacing," as used here, is a term to which its ordinary and common meaning, as understood by those skilled in the art, should be attributed. The term is not limited to any special or adapted meaning. Without limitation, the term can refer in particular to a spatial distance between sections of exposure paths, for example, between parallel sections. In step b) ii), in particular in substep b) ii) 2., at least one exposure path can be determined from the vector field, for example, from the direction field. Specifically, the exposure path can be determined based on the vector field, where the course of the exposure path can be specified and / or defined by one or more vectors of the vector field, such as scan vectors. Thus, the exposure path, for example, with the aim of filling the layer, especially an interior of the layer, can follow one or more of the vectors of the vector field. For example, discrete scan vectors can be determined based on the vector field, for example, based on vectors of the direction field.In particular, determining the scan vectors, for example determining a course of the exposure path, can include adjusting at least one distance between two scan vectors, for example by adjusting at least one maximum distance, in particular perpendicular to at least one of the two scan vectors, so that the surface of the component, in particular the layer of the component, can be completely melted and / or remelted, in particular completely filled. For example, a possible procedure for carrying out step b) ii) could be such that, using Euler's method, at least one possible exposure segment is determined from the solution function, for example, from a numerically determined solution function, in particular, for example, comprising discrete solution points. Thus, for example, starting from the vector field, at least one possible segment of the exposure path can be determined using Euler's method. For example, starting from a first point in the region of the direction field, e.g., based on Euler's method through this point, a first possible exposure segment can be determined. A step size and a total length of the segment, for example, of the calculated path, can be preset by parameters, in particular, specified.In a subsequent step, at least one second possible exposure segment, for example, at least one possible segment of the exposure path, can also be determined from the solution function using Euler's method. Specifically, the second possible exposure segment can be determined numerically, for example, starting from a second point spaced relative to the first segment. Now, particularly following the prior determination of at least two possible exposure segments, the minimum and maximum distances between these at least two possible exposure segments can be determined and / or calculated, especially along the possible exposure segments, for example, along the solution curves or specific length segments.The minimum and maximum distances can then be compared, for example, with a minimum permissible hatch spacing and / or a maximum permissible hatch spacing. If the distances correspond to the permissible hatch spacings, i.e., are greater than the minimum hatch spacing and / or less than the maximum hatch spacing, both possible potential exposure intervals can be selected and used to determine the exposure path. Alternatively, particularly if the distances do not correspond to the permissible hatch spacings, i.e., are too large or too small, at least one of the at least two possible potential exposure intervals can be discarded and / or recalculated. Common calculation methods, such as the rule of three and / or the interval bisection method, can be used to recalculate the at least one possible potential exposure interval.In particular, the second point, especially for determining the second possible, potential exposure interval, can be chosen such that exposure intervals can be determined whose distances satisfy the hatch intervals. For example, to obtain exposure intervals that meet certain requirements for minimum and / or maximum hatch intervals, the distance between point 1 and point 2 can be selected and used accordingly, e.g., by applying the rule of three or the interval bisection method. In particular, it is possible that the vector field determined in step b) ii) 1., for example, the direction field, exhibits a divergence. For example, a divergence of the vector field can lead to the vectors of the vector field, for example, the vectors and / or directions of the direction field, being limited in length and / or a varying distance between the vectors, for example, the directions. An exposure path determined from such a vector field can, for example, exhibit at least one or more curvatures and / or a varying hatch spacing. In particular, in step b) ii), for example in sub-step b) ii) 2., the hatch spacing can be the at least one property of the additive powder bed process to be considered. In particular, a maximum permissible hatch spacing can be specified. For example, a hatch spacing greater than the maximum permissible hatch spacing can lead to parts of the component, especially at least one layer of the component, not being melted and / or remelted during the layer-by-layer production of the at least one component, particularly during a traversal of the exposure path. This can lead, for example, to undesirable defects and / or reduced component quality. In particular, the hatch spacing, for example a maximum distance Amax between two sections of the exposure path, can be, for example, a maximum of 100 µm, in particular Amax ≤ 15 mm, preferably Amax ≤ 1 mm, more preferably Amax ≤ 200 µm, and most preferably 100 µm.For example, the maximum hatch distance can also depend on a size of the beam's point of action, such as the melting diameter D. For instance, Amax ≤ 0.7 D. It is also possible for the maximum hatch distance to depend on a property of the vector field, such as a gradient and / or an absolute value. Alternatively or additionally, a minimum permissible hatch spacing can be specified. In particular, a hatch spacing smaller than the minimum permissible one can lead to the remelting of previously powdered material and / or components that have already been remelted into the component during the layer-by-layer production of the at least one component, especially during a pass along the exposure path. This could, for example, result in reduced component quality and / or be uneconomical. Specifically, the hatch spacing, for example, a minimum distance between two sections of the exposure path, can be at least 0.4 µm, more specifically ≥ 5 µm, preferably ≥ 10 µm, and most preferably ≥ 20 µm. For example, the minimum hatch spacing can also depend on the size of the beam's effective area, such as the melt diameter D.For example, Amin ≥ 0.2 D. It is also possible for the minimum hatch distance to depend on a property of the vector field, such as a gradient and / or an absolute value. For example, step b) ii), for instance substep b) ii) 2., can further include retrieving at least one property, for example one of the properties listed above, such as a hatch spacing, of the additive powder bed process, in particular from a data storage device. For example, the property can be stored and / or saved in a data storage device and be retrievable from it. Thus, step b) ii), in particular substep b) ii) 2., can include determining the exposure path from the vector field, e.g., from the direction field, taking into account at least one property of the additive powder bed process retrieved from a data storage device. The additive powder bed process can in particular be selected from the group consisting of a selective beam melting process, a selective laser sintering (SLS), a selective laser beam melting (SLS), for example a laser powder bed fusion, a selective electron beam melting (SES). The boundary condition of the layer, in particular the boundary condition assigned to the edge of the layer in step b) i., may in particular be selected from the group consisting of: a Dirichlet boundary condition, for example a constant boundary condition, e.g. a requirement that the solution of the differential equation takes on a constant value X, in particular a value of X = 0; a Neumann boundary condition, for example a requirement that the normal derivative of the solution takes on a constant value Y; a skewed boundary condition; a boundary condition with changing values, for example a boundary condition with continuously changing values ​​or a boundary condition with discretely changing values, in particular a boundary condition with a plurality of sine waves, rectangular functions or triangular functions arranged around the circumference. As explained above, particularly in the case of a computational domain that also includes the surroundings of the component, especially up to the physical boundaries of the build space and / or powder bed in the additive powder bed process, step b) i) can further include assigning at least one condition to the interior of the computational domain. This at least one condition can be selected, in particular, from the group consisting of: a source or sink parameter consisting of a constant function f, a spatially variable function f(x,y), for example, corresponding to a surface load and / or a heat source and / or a heat sink. For example, the condition, such as f(x,y), can be chosen based on the heat dissipation of a component already formed beneath the layer. In particular, a previous exposure path, for example for one or more underlying layers, can be considered when assigning the condition. Thus, the heat input from a number of exposure paths already defined beneath the current layer, for example at a specific coordinate on the current layer, can be taken into account when selecting the condition. For example, the number of layers already produced beneath this coordinate and / or a convolution integral, especially a convolution integral with a closed convolution core, over the component volume, particularly over the underlying component volume, can be used as a measure of the heat dissipation. Alternatively or additionally, at least one condition and / or boundary condition in the form of a constant value, such as an absolute value, can be assigned and / or specified within the computational domain. This can be done, for example, at individual points, particularly those that are far apart, or along lines, such as across a large number of immediately adjacent points. The assigned conditions, such as locally specified boundary conditions, can be the same, for example, having the same absolute value, or they can differ. For example, the conditions can also have opposite signs. Steps b) i) and ii) of the computer-implemented procedure can be executed iteratively. In particular, step b) i) can be executed again and / or repeatedly after step b) ii) has been executed, for example, taking into account information obtained in step b) ii). Optionally, an iterative execution of steps b) i) and ii) can also include an iterative execution of steps ii) 1 and ii) 2. For example, step b) i) can be executed again and / or repeatedly after step b) ii) 1 and / or 2 has been executed, for example, taking into account information from step b) ii) 1 and / or b) ii) 2. For example, step b) ii) can include determining specific lines, such as isolines, in particular isolines to predetermined values ​​and / or lines of minimum curvature. Determining isolines to randomly selected values ​​may also be possible. Step b) i), especially in an iterative execution, can, for example, include applying a condition to the specific lines. For example, after numerically solving the partial differential equation and / or the functional, for example, after performing step b) i), it may be possible to determine specific lines, particularly in an execution of step b) ii). These specific lines can, for example, be isolines to predetermined and / or randomly selected values ​​and / or lines with minimal, for example, minimum, curvature. The defined lines can then be assigned at least one boundary condition, for example, in a repeated execution of step b) i), such as a zero boundary condition, for example, f(x,y) = 0. Thus, for example, in an iterative execution of step b) i), the same partial differential equation and / or the same functional as in a previous execution of the step can be solved taking the new boundary conditions into account. Alternatively, in an iterative execution of step b) i), for example, after execution of step b) ii), in particular after execution of substeps b) ii) 1. and / or b) ii) 2., a different partial differential equation and / or a different functional on the computational domain can also be solved taking the new boundary conditions into account. Alternatively or additionally, the dedicated lines can also be used wholly or partially, for example at least a section of them, directly as an exposure section, for example at least as part of the at least one exposure path, for example as a scan path. Step b) ii) may, for example, include determining at least two exposure segments. In particular, step b) ii) may include determining a plurality of exposure segments. Furthermore, step b) ii) may include assembling the exposure path from the at least two exposure segments. For example, the exposure path may be composed of a plurality of exposure segments, in particular at least two exposure segments. For example, determining at least one of the at least two exposure segments may include linear numerical interpolation and / or iterative numerical interpolation. In particular, at least one of the at least two exposure segments of the exposure path can correspond wholly or partially to an edge of the component, for example, an edge of the layer, and thus be an edge path. For example, the edge of the component and / or the layer can be mapped by one or more exposure segments. In particular, a component contour can be mapped and / or traced in this way, at least partially, by exposure segments, for example, exposure segments parallel to the component contour. This at least one exposure segment designed as an edge path can, for example, be determined and / or generated directly from the layer, in particular directly from the sectioned CAD model, without the need for prior creation and solution of a partial differential equation and / or a functional.The boundary path can be generated and / or determined, for example, by mapping and / or tracing the component contour, for example by parallel offsetting the component contour, for example by offsetting with the hatch spacing. The exposure path, composed of at least two exposure sections, can in particular also include at least one edge path, whereby the edge path can be executed before or after another exposure section, or multiple times and / or between other exposure sections. For example, the exposure path can be composed such that an edge path is arranged before or after another exposure section, for example, before or after an exposure section that includes an area fill, or multiple times and / or between other exposure sections, for example, inserted between several exposure sections that include an area fill. The exposure sections can be combined to form the exposure path according to at least one predefined scheme. In particular, the combination of the exposure path from the at least two exposure sections in step b) ii) can, for example, be carried out according to a predefined scheme. The scheme can, for example, be selected from the group consisting of: a calculation sequence; an execution direction, in particular a scan direction; an affiliation with a specific line; a minimum distance, in particular a minimum distance to the next exposure path; a distance to a nozzle, for example a shielding gas nozzle, in particular such that an exposure section that has not yet been executed and is closest to the shielding gas nozzle is always selected. For example, parallel exposure sections can be arranged sequentially, so that, in particular, parallel exposure sections are scanned one after the other. Alternatively or additionally, exposure sections belonging to a specific line, such as the same isoline, can be sorted or combined directly one after the other. Alternatively or additionally, the exposure sections can be assembled according to their distance from a protective gas nozzle, such as a protective gas outlet nozzle. For example, the exposure path can be assembled such that an exposure section closest to the protective gas nozzle is followed by another exposure section at a greater distance from it. In particular, such an assembly of the exposure path from the exposure sections can be suitable for accounting for anisotropic process and / or material behavior in the additive powder bed process. Anisotropic process and / or material behavior can arise, for example, from the use of protective gas flows, such as due to an interaction between the protective gas direction and the beam, especially a laser and / or electron beam.Such protective gas flows can be used in the additive powder bed process, for example, to keep soot and / or splashes away from an area of ​​action of the jet, for example, from an area where melting caused directly by the jet occurs and / or blow them away. Step b) ii) can also include rearranging, for example following assembly, the exposure sections of the exposure path, where the rearranging can be, for example, an optimization procedure. The rearranging can also include reversing the processing direction of at least one exposure path, for example, adjusting an execution direction. For example, properties of the additive powder bed process can also be taken into account during the rearranging. In particular, machine data, such as at least one acceleration, especially a maximum achievable acceleration, of a mirror system of a scanner, for example, the laser beam and / or the electron beam, can be used for the rearranging, for example, to calculate and / or optimize the composition of the exposure path. In particular, the rearranging can be carried out according to and / or taking into account at least one objective.The objective can be selected, for example, from the group consisting of: the shortest possible execution time, in particular the shortest possible time for manufacturing the component; a material- and / or process-friendly heat distribution, in particular a distribution of the heat introduced by the exposure beam, for example, a control of residual stresses within the component, for example to ensure uniform curing or uniform solidification; an avoidance of residual stresses. In particular, the exposure sections can be rearranged to minimize the execution time, especially the time required to manufacture the component. Alternatively or additionally, the exposure sections can be rearranged to optimize heat distribution within the component, for example, to control residual stresses and / or to ensure uniform curing or solidification. For instance, exposure sections can be rearranged along the exposure path so that geometrically adjacent exposure sections are not immediately combined and / or processed consecutively. This can be achieved, for example, by inserting and / or processing other exposure sections, particularly scan paths, in the meantime, especially to conserve material and / or to minimize and / or reduce residual stresses. In particular, for example, to control heat distribution, the exposure periods can be rearranged so that successive exposure periods have the greatest possible and / or most similar distances between them. Thus, the rearranging, especially the optimization process and / or the optimization method, can be carried out, for example, according to a desired and / or target distance between successive exposure periods. For example, reordering can involve identifying, starting from a starting point and / or a current exposure segment, an exposure segment that is maximally spaced, i.e., as far away as possible, perhaps via a distance search. This can then be selected as the next exposure segment, so that the exposure path is composed of successive exposure segments with the greatest possible distance between them. In particular, the distance between successive exposure segments of the exposure path can decrease as the length of the exposure path increases. Alternatively or additionally, the reordering can involve identifying, starting from a starting point and / or a current exposure segment, for example via a distance search, an exposure segment with a distance as close as possible to a predefined desired distance, i.e., one with the smallest difference. This can then be selected as the next exposure segment, so that the exposure path is composed of successive exposure segments with the most similar distances possible. In particular, the distance between successive exposure segments of the exposure path can be kept as constant as possible, for example, over the progressive length of the exposure path. For example, the predefined distance, such as the desired distance, can be a predetermined value. Thus, the desired distance can be a fixed, predefined value.Alternatively or additionally, the desired distance can be an input parameter, for example a value specified by a user, for instance before the procedure is executed. The reordering can be performed according to a structure. Specifically, the beginning of the exposure path can be composed of exposure segments that form a structure, such as a structure corresponding to an edge of the component and / or a predefined pattern. The layer can be subdivided into sublayers by the structure, for example, into sub-areas of the layer. Subsequently, further exposure segments can be appended in such a way that the sublayers can be exposed and / or scanned uniformly. For example, uniform exposure can involve assembling exposure segments such that the exposure path initially includes one exposure segment from each sub-area before another exposure segment is appended to one of the sub-areas.Such a rearranged exposure path can, for example, enable the uniform exposure of sub-areas of the layer. For instance, implementing such an exposure path in the additive powder bed process can result in, for example, a section of each sub-area being exposed in a first round, then, for example, in a second round, the next section of each sub-area being exposed, and subsequently, for example, in each subsequent round, another section of each sub-area being exposed, in particular until all sub-areas are completely exposed. This alternating assembly of the exposure path on exposure sections of the sub-areas can be used, in particular, when rearranging them according to the largest possible and / or most similar possible distances between each other.This allows for the selection of an alternating exposure section from each sub-area, for example, from each group of exposure sections within the sub-areas. In particular, this approach can enable high cost efficiency, for example, from a data processing perspective. Step b) ii) can include determining at least one starting point, for example, the exposure path. In particular, step b) ii) can, for example, determine an initial and / or starting point for the exposure path. Specifically, determining the starting point can involve selecting it from a list of possible starting points. For example, the starting point can also be determined based on the hatch spacing, for instance, based on a given maximum allowed hatch spacing. Alternatively or additionally, the starting point can also be determined based on a local minimum or maximum of the solution function, for example, based on a smallest or highest value of the solution to the partial differential equation and / or the functional. Random selection of the starting point, for example, from the list of possible starting points, is also possible.Alternatively or additionally, the starting point can also be determined according to a predetermined starting point, for example, corresponding to a predetermined starting point. For example, the exposure pattern and / or the at least one exposure path may further include at least one piece of information about at least one process parameter for the layer-by-layer fabrication of the component using the additive powder bed process. For example, step b) of the computer-implemented method may further include: iii) Determining the at least one process parameter for at least one section of the exposure path. The term "process parameter," as used here, is a term to which its ordinary and common meaning, as understood by those skilled in the art, should be attributed. The term is not limited to any specific or adapted meaning. Without limitation, the term can refer in particular to any setting and / or selection of values ​​during the execution of at least one process, for example, a procedure. Thus, the process parameter can, for example, be a value for at least one machine setting, such as a setting in the additive powder bed process. Alternatively or additionally, the process parameter can also be an upper and / or lower limit, for example, adapted to a machine performing the additive powder bed process, such as a powder bed machine.For example, at least one process parameter can be assigned to the exposure pattern and / or the at least one exposure path, such as a process parameter whose value changes over the length of the pattern and / or path. It is also possible to assign process parameters with a constant value over the length of the pattern and / or path. Furthermore, it is possible to assign different process parameters to the exposure pattern and / or the at least one exposure path over their length. Determining the at least one process parameter can be done discretely, for example, individually for each exposure segment. For instance, process parameters, such as those whose value changes over the length of the pattern and / or path, can also be determined by linear interpolation. In particular, determining the at least one process parameter, for example in step b) iii) of the computer-implemented procedure, can also involve selecting at least one process parameter from a list and / or table, for example from a stored and / or saved list and / or table. Specifically, when selecting the process parameter from a list, at least one machine property and / or at least one technical limitation can be taken into account. For example, a selection can be made based on limit values ​​and / or latencies. The at least one process parameter can, for example, be selected from the group consisting of: a velocity, in particular a velocity of a relative movement between the exposure beam and the powder bed, for example a scan velocity; an acceleration, in particular a change in velocity, for example a change in the velocity of a relative movement between the exposure beam and the powder bed, a lateral and / or tangential acceleration, for example a scan acceleration; a power of the exposure beam, for example a laser power, in particular an amplitude and / or a frequency of the laser power; a beam focusing, in particular a focus position, for example a defocusing; a line energy; wobble parameters, in particular at least one motion parameter of a wobble movement of the exposure beam, for example a vibration and / or wobble movement of a laser beam. For example, when determining acceleration as a process parameter, a predefined maximum acceleration can be taken into account. Thus, for each exposure segment, the exposure path, and / or the exposure pattern, a maximum acceleration can be defined and / or determined, for example, taking into account additional individual upper limits, such as those derived from at least one dynamic of a melt, particularly the dynamics of the melt pool. The velocity of a relative motion between the exposure beam and the powder bed, especially the scan velocity, can therefore be adjusted, for example, for a given curvature of a path segment, such that the resulting angular acceleration is below a permissible maximum. In particular, at least one process parameter can also depend on at least one other process parameter. For example, the selection of at least one process parameter can take into account a possible mutual dependency, such as co-dependency, between at least two process parameters. For example, an acceleration, especially one assigned to a first exposure segment, can be selected depending on its distance to at least one adjacent exposure segment. In this context, acceleration can be understood as either lateral or tangential acceleration, with individual upper limits potentially defined for each direction. In particular, at least one process parameter can be determined, for example, according to the composition of the exposure path, especially according to the order of the exposure segments. Thus, a process parameter, such as a speed and / or acceleration, can be selected and / or determined for an exposure segment depending on how far away an exposure segment located further ahead is in the composition of the exposure section. In particular, process stability can be higher if, in addition to a currently exposed exposure segment, there is already an exposed exposure segment, such as an already melted track. In such a case, it may be possible, for example, to use a higher speed and / or acceleration without generating process errors.In particular, this can prevent process errors such as metal powder turbulence, hooping, unstable melt pools, and keyhole pores. For example, the initial exposure sections of the exposure path, which serve to structure the material, can preferably be performed with reduced process parameters, especially lower laser power and / or a lower scan speed, than later exposure sections of the exposure path, which serve to fill the sub-areas. The exposure path in step b) ii) can, for example, be determined such that it is free of kinks, for instance, using C1 continuity. In particular, the exposure path can be described by one or more splines, radii, NURBS, polynomials, or combinations thereof, for example, instead of using piecewise straight lines. In this way, for example, overshoot, especially overshoot of the mass-bearing mirrors in the laser scanner, and any associated deviation of the laser beam from the target position, can be avoided. For example, overshoot that could negatively affect the additive powder bed process, especially a melting zone, can be avoided. When creating the partial differential equation and / or the functional in step b) i), at least one property of the additive powder bed process can also be taken into account. For example, the selection of the partial differential equation and / or the functional can be made taking into account at least one property of the additive powder bed process. In particular, the at least one property can, for example, include a flow occurring in the additive powder bed process. For instance, a partial differential equation taking this flow into account can have a preferred direction, where the preferred direction can consider the flow as dependent on a distance to a nozzle, in particular a protective gas nozzle. In particular, such a partial differential equation can consider different directions within the surface and distances from the center differently. For example, such a partial differential equation, in particular a differential equation taking the flow into account, can preferably be chosen, and in particular formulated, such that an asymmetric solution results for a symmetric computational domain, for example a geometrically symmetric layer, and symmetric boundary conditions.In particular, a partial differential equation that considers the flow can also take into account anisotropic process and / or material behavior arising from shielding gas flows, especially when determining the exposure paths. For example, the partial differential equation can be chosen to consider the distance to the shielding gas nozzle when determining the exposure paths, for instance, to provide for corresponding adjustments in subsequent path planning. Alternatively or additionally, the boundary conditions in step b) ii), such as the boundary conditions assigned to the edge of the layer, which are dependent on their position on the computational domain, can also be chosen and / or assigned, for example, depending on a distance to a shielding gas nozzle. Alternatively or additionally, at least one property can also consist of and / or encompass an interaction between several components. For example, when several components are manufactured layer by layer from their CAD models using an additive powder bed process, an interaction between the components can occur. Such interactions can include, for example, one or more factors resulting from different heat inputs, processing times (e.g., the time until the next layer is exposed), heat dissipation, and powder deposition. Step a) of the computer-implemented method can further include overhang detection. In particular, an overhang can be detected, for example, if a protrusion between at least two layers, preferably between at least two adjacent layers, exceeds a predetermined maximum value. This maximum value can, in particular, depend on material properties and / or machine properties, for example, a position in the powder bed of the additive powder bed process. In particular, in step b) i), the boundary condition can be assigned depending on the overhang. For example, if an overhang was detected in step a), the at least one boundary condition assigned to the edge of the layer in step b) i) can be dependent on the overhang, for example, chosen taking the overhang into account, such that it influences the direction of the exposure path to be determined in step b) ii). In particular, in step b) ii), the exposure path can have at least a section of an exposure segment adapted to the overhang. Thus, the exposure path, and in particular at least one exposure segment, can be chosen such that the use of support structures in the additive powder bed process can be minimized and / or avoided.For example, in areas of overhangs, assigning boundary conditions with a large amount in step b) i) can lead, for example, in step b) ii) to an exposure path with a direction adapted to the overhang. For example, overhangs can be initially excluded from the determination in step b) i), and also, for example, in the possible sub-step b) ii) 1., and then added to the exposure path in step b) ii), in particular in the possible sub-step b) ii) 2. Alternatively, the exposure sections containing the overhang can be rearranged according to a preferred direction, for example, from the inside out, in particular from an inner part of the layer towards the edge of the layer, and / or at a predetermined maximum angle. For example, in step c), the exposure pattern can be composed of alternating exposure paths. For instance, the direction of the exposure paths can be changed from one layer to the next, perhaps even reversed. The term "alternating" can be understood, for example, to mean that adjacent scan paths have opposite directions. In particular, for example, different partial differential equations and / or different functionals can be created and solved for at least two consecutive layers in step b) i). Alternatively or additionally, the boundary conditions can also be changed from one layer to the next. For example, a first partial differential equation and / or a first functional can be created and solved for a first layer, whereas for a second layer, a second partial differential equation and / or a second functional, different from the first, can be created and solved. Alternatively or additionally, for example, at least one first assigned boundary condition can be used for a first layer, whereas for a second view, a second assigned boundary condition, different from the first, can be used.In particular, two such sets, especially those consisting of a partial differential equation or a functional with boundary conditions, can be used alternately for all layers. For example, when using two sets, it may be possible to create and solve the same partial differential equation and / or the same functional with the same boundary conditions for every second layer. Alternatively, three or four sets can be used, and these too can be applied alternately across all layers. Alternatively or additionally, the determination of the vector field in step b) ii) 2. can be varied alternately. For example, a different vector field, such as a different direction field, can be used for a first layer than for a second layer, or vice versa. For instance, a gradient field can be used for the first layer and a field generated on isolines for the second layer. It is also possible to use mixed fields, such as direction fields that represent a parametrically weighted average between a gradient field and an isoline direction field, where, for example, the weighting can be varied from one layer to the next, perhaps alternating. Step b) ii) can, for example, also include a correction step. In this correction step, at least a part of the exposure path, for example, at least one exposure segment, can be modified until a predetermined limit for the distribution of the exposure segments is undershot. In particular, the modification of at least a part of the exposure path, for example, at least one exposure segment, can be carried out in at least one respect of its position, its direction of execution, its width, and its number. In particular, such a correction step can, for example, include averaging, whereby a change of less than one width of the maximum permissible hatch spacing can be made. In particular, such a correction step can be carried out once or iteratively, in particular multiple times, over individual or all exposure segments.In particular, the correction step can be performed as often as necessary until a predetermined limit for the distribution of exposure segments is undercut. The computer-implemented process can, for example, be carried out in parallel and / or overlapping with the layer-by-layer production of the at least one component using the additive powder bed process. Thus, at least one of the aforementioned process steps can be carried out overlapping with or simultaneously with a production step. For example, in such a parallel and / or temporally overlapping process, the at least one property of the additive powder bed process considered in step b) ii) can further comprise at least one measured value, for example, a measured value from at least one sensor. In particular, at least one measured value, for example, a measured value from at least one sensor, can be considered when determining the exposure path and / or determining the at least one process parameter. For example, in step b) ii) of the computer-implemented process, a thermographic measurement of the powder bed can be used when determining the exposure path, for example, for adjusting the exposure path. The use of artificial intelligence methods, in particular machine learning, for example, of at least one training dataset, is also possible. In a further aspect of the present invention, a computer program is proposed which, when executed on a computer or computer network, performs the method according to the invention in one of its embodiments. In particular, a computer program for carrying out the computer-implemented method for the automated determination of exposure patterns is proposed, which automatically performs one, more than one, or even all of the method steps a) to c) when the computer program is executed on a computer. The computer and / or the computer network can comprise at least one processor. For example, the method can be carried out wholly or partially on the processor of the at least one computer and / or computer network, particularly without user interaction. Furthermore, the present invention proposes a computer program with program code means to carry out the method according to the invention in one of its embodiments when the program is executed on a computer or computer network. In particular, the program code means can be stored on a computer-readable data carrier and / or a computer-readable storage medium. The terms "computer-readable data carrier" and "computer-readable storage medium," as used here, can refer in particular to non-transitory data storage devices, such as a hardware data storage medium on which computer-executable instructions are stored. The computer-readable data carrier or computer-readable storage medium can, in particular, be or comprise a storage medium such as random-access memory (RAM) and / or read-only memory (ROM). Furthermore, within the scope of the present invention, a data carrier is proposed on which a data structure is stored which, after being loaded into a working and / or main memory of a computer or computer network, for example on a server, can execute the method according to the invention in one of its embodiments. The present invention also proposes a computer program product with program code means stored on a machine-readable medium to carry out the inventive method in one of its embodiments when the program is executed on a computer or computer network. In this context, a computer program product is understood to be the program as a marketable product. It can, in principle, exist in any form, such as on paper or a computer-readable data carrier, and can, in particular, be distributed via a data transmission network. Alternatively or additionally, the term "computer program product" can be understood as the program itself, a tradable product that is stored and / or exists, for example, as a data structure on a computer network, particularly on a server, and is provided by that server. For instance, a computer and / or computer network can access the program stored on the server, for example, as a data structure. The server can be a local server, i.e., assigned to a local network. Alternatively, the server can also be a remote server, such as a server located outside the computer or computer network, from which the program can be accessed. In particular, the server can, for example, comprise at least one server system with a multitude of servers and / or at least one cloud server or cloud computing infrastructure. For example, a user and / or customer, particularly from a computer and / or computer network, may instruct the server to execute the program and thus carry out the computer-implemented process according to one of the described embodiments. For example, the user and / or customer may provide input data, such as the CAD model and at least one property of the additive powder bed process, for carrying out the process, for example, by uploading it. Further information, such as information about a machine used for the additive powder bed process and / or a material to be used, may also be provided by the user and / or customer as input data.Specifications, particularly optimization goals such as low residual stress, high geometric accuracy, or fast manufacturing, can also be provided as input data. The computer-implemented process can then be executed on the server, especially without user interaction. The output data generated by the computer-implemented process, particularly the at least one exposure pattern, can subsequently be made available to the user and / or customer. Finally, within the scope of the present invention, a modulated data signal is proposed which contains instructions executable by a computer system or computer network for carrying out a method according to one of the described embodiments. In a further aspect of the present invention, a method for manufacturing at least one component using an additive powder bed process with at least one automatically determined exposure pattern is proposed. The method comprises the steps described in more detail below. These steps can be carried out in the sequence stated. However, a different sequence is also possible in principle. Furthermore, two or more of the process steps mentioned can be carried out overlapping in time or simultaneously. One or more of the process steps mentioned can also be carried out once or repeatedly. The method can include further process steps beyond those mentioned, which are not specified here. The manufacturing process comprises the following steps: I. automated determination of the at least one exposure pattern using the computer-implemented method for automated determination of exposure patterns according to the present invention, for example according to one or more of the embodiments described above and / or according to one or more of the embodiments described in more detail below; II. control of an exposure beam, in particular a laser beam or an electron beam, by means of beam position data of the exposure pattern. In particular, it is possible for the computer-implemented method for the automated determination of exposure patterns to be carried out in parallel and / or overlapping with the layer-by-layer production of the at least one component using the additive powder bed process. In this way, steps I and II can be carried out in parallel and / or overlapping with each other.In a further aspect of the present invention, a calculation device for the automated determination of exposure patterns for the layer-by-layer fabrication of at least one component from a CAD model of the component in an additive powder bed process is proposed. The term "calculation device" as used here is a broad term to which its ordinary and common meaning, as understood by those skilled in the art, should be attributed. The term is not limited to any specific or adapted meaning. The term can, without limitation, refer in particular to any device that serves to determine exposure patterns for the layer-by-layer fabrication of at least one component from a CAD model of the component in an additive powder bed process.The calculating device is set up to carry out the computer-implemented method for the automated determination of exposure patterns according to the present invention, for example according to one or more of the embodiments described above and / or according to one or more of the embodiments described in more detail below. The computing device comprises: - at least one cutting unit, wherein the cutting unit is configured to perform at least step a) of the computer-implemented method, in particular to cut the CAD model into a finite number of layers; - at least one path determination unit, wherein the path determination unit is configured to perform at least step b) of the computer-implemented method, in particular to determine an exposure path for each layer; - at least one pattern determination unit, wherein the pattern determination unit is configured to perform at least step c) of the computer-implemented method, in particular to determine at least one exposure pattern from the exposure paths determined for each layer. In particular, the computing device can be configured to transfer and / or exchange information and / or data between the cutting unit and the path determination unit. For example, at least one piece of information about at least one of the layers cut in the cutting unit, for instance as a result of step a) of the computer-implemented procedure, can be transferred from the cutting unit to the path determination unit. Furthermore, the computing device can be configured to transfer and / or exchange information and / or data between the path determination unit and the pattern determination unit. For example, at least one piece of information about at least one of the exposure paths determined in the path determination unit, for instance as a result of step d) of the computer-implemented procedure, can be transferred from the path determination unit to the pattern determination unit. In a further aspect of the present invention, a manufacturing device for the layer-by-layer production of at least one component in an additive powder bed process is proposed using at least one automatically determined exposure pattern. The term "manufacturing device" as used here is a broad term to which its ordinary and common meaning, as understood by those skilled in the art, should be attributed. The term is not limited to any specific or adapted meaning. The term can, without limitation, refer in particular to any device that serves the layer-by-layer production of at least one component in an additive powder bed process. For example, the manufacturing device can comprise at least one powder bed and one powder reservoir.Furthermore, the manufacturing device can include at least one metering device, for example a doctor blade, for producing and / or applying a powder layer in the powder bed, for example in at least one build chamber, wherein the powdered material from the powder reservoir can be used for the powder layer. The manufacturing device is set up to produce at least one component in an additive powder bed process using at least one automatically determined exposure pattern, wherein the exposure pattern is determined using the computer-implemented method for automatically determining exposure patterns according to the present invention, for example according to one or more of the embodiments described above and / or according to one or more of the embodiments described in more detail below. The manufacturing device comprises at least one exposure unit for generating at least one exposure beam. The term "exposure unit," as used here, is a broad term and should be interpreted in its usual and common sense, as understood by those skilled in the art. The term is not limited to any specific or adapted meaning. Without limitation, the term can refer in particular to any unit, for example, a unit consisting of several components, which serves to generate and / or align at least one beam, for example, an exposure beam, in particular a high-energy beam, such as a laser beam and / or electron beam. In particular, the exposure unit can, for example, comprise one or more laser scanners and / or laser sources. Furthermore, the manufacturing device comprises at least one control unit for controlling the exposure beam according to the beam position data of the exposure pattern. The term "control unit" as used here is a broad term to which its ordinary and common meaning, as understood by those skilled in the art, shall be attributed. The term is not limited to any specific or adapted meaning. Without limitation, the term can refer in particular to any unit that serves to control and / or steer at least one relative movement between the at least one powder bed, for example, at least one powder layer present in a build chamber, and the at least one beam generated by the exposure unit. In particular, the control unit can be configured to send signals, for example, control signals, to and / or receive signals from the exposure unit.In particular, the control unit can be, for example, a plant control system. Thus, the control unit can be configured, for instance, to regulate and / or control one or more laser scanners and / or laser sources, in particular to drive them. For example, the control unit and / or the exposure unit can be configured to trace and / or follow the exposure beam along at least one exposure path. In particular, the control unit and / or the exposure unit can be configured to trace and / or follow an exposure path that is free of kinks, for example, one that has a C1 continuity. The control unit and / or the exposure unit can also be configured to trace and / or follow an exposure path that is described by one or more splines, radii, NURBS, polynomials, or combinations thereof. The manufacturing device can further comprise at least one path determination unit and one pattern determination unit. For example, the manufacturing device can be configured to perform at least steps b) and c) of the computer-implemented method according to the invention for the automated determination of exposure patterns, for example, according to one or more of the embodiments described above and / or according to one or more of the embodiments described in more detail below. In particular, the path determination unit, as described above in connection with the computational device, can be configured to perform at least step b) of the computer-implemented method, in particular to determine an exposure path for each layer.In particular, the pattern determination unit, as described above in connection with the calculation device, can be set up to perform at least step c) of the computer-implemented method, in particular to determine at least one exposure pattern from the exposure paths determined for each layer. In particular, the manufacturing device may, for example, further comprise at least one sensor. For example, a sensor reading may be taken into account in a parallel and / or temporally overlapping execution of the computer-implemented method for determining the exposure pattern. The path determination unit may thus be configured to take into account, particularly in step b) ii), the at least one measurement as a property of the additive powder bed process, for example, the measurement taken by the at least one sensor. For example, determining the exposure pattern and / or the at least one exposure path, in particular a local adjustment of scan paths, may also include determining at least one process parameter and taking into account at least one sensor reading, for example, at least one current measurement. The manufacturing device can be configured in particular to carry out the manufacturing process according to the present invention, for example according to one or more of the embodiments described above and / or according to one or more of the embodiments of the manufacturing process described in more detail below. The proposed computer-implemented method, the proposed computer program, the proposed manufacturing process, the proposed calculation device, and the proposed manufacturing device offer numerous advantages over known methods and devices of the aforementioned type. In particular, the proposed methods and devices may be suitable, compared to known methods and devices, for increasing process stability and improving component quality. In particular, it may be possible that the mechanical-technological properties of the at least one component can be improved by the proposed methods and devices, for example by adapting the exposure paths and exposure patterns to a component geometry, compared to conventional devices and methods. In particular, the proposed methods and devices may be suitable, compared to known devices and methods, for selectively influencing residual stresses in components, especially manufacturing-related residual stresses, for example, by targeted spatial and / or temporal heat input during component manufacturing. Thus, compared to known devices and methods, the proposed methods and devices may allow for controlling the sequence of heat input, for example, deliberately selecting a sequence, such as distributing the heat input from the inside out, from the outside in, or generating it uniformly. In particular, it may be possible to reduce residual stresses in components, especially manufacturing-related residual stresses, using the proposed methods and devices.This can be achieved in particular through improved energy distribution, for example, by distributing the applied laser energy over a larger area and / or by extending the exposure time. Specifically, the proposed methods and devices can reduce residual stresses by defining a large number of exposure segments, for example, short exposure segments relative to the layer diameter (e.g., individual smaller scan paths), instead of defining fewer exposure segments (e.g., long exposure segments relative to the layer diameter), in contrast to known devices and methods. Alternatively, the proposed methods and devices can also be suitable for selectively generating residual stresses, for example, compressive residual stresses.The proposed methods and devices may be particularly suitable for increasing compressive residual stresses in an exterior area of ​​the component, for example compressive residual stresses on a surface of the component, for example in order to influence at least one property of the component, for example to increase and / or enhance the fatigue strength of the component. The proposed methods and devices can, for example, improve the cost-effectiveness of manufacturing at least one component using an additive powder bed process compared to known devices and methods. For instance, the proposed methods and devices can enable higher exposure speeds, particularly higher speeds when traversing exposure paths and / or exposure patterns. Specifically, it may be possible for the proposed devices and methods to achieve higher speeds without the process defects known from conventional devices and methods, such as metal powder resuspension, hooping, unstable melt pools, keyhole pores, or similar issues. Furthermore, the proposed methods and devices can, for example, increase process stability and / or process reliability compared to known methods and devices. For instance, determining exposure patterns directly through the manufacturing device itself can improve process stability and / or process reliability. In particular, the proposed methods and devices can be suitable for reducing and / or avoiding beam overshoot during manufacturing, such as during exposure, and / or large data volumes. For example, the proposed methods and devices can enable finer discretization compared to known methods and devices. Brief description of the characters Further details and features will become apparent from the following description of exemplary embodiments, particularly in conjunction with the dependent claims. The respective features can be implemented individually or in combination with one another. The invention is not limited to the exemplary embodiments. The exemplary embodiments are shown schematically in the figures. Identical reference numerals in the individual figures denote identical or functionally equivalent elements, or elements that correspond to one another with respect to their functions. Specifically, Figs. 1a and 1b show flowcharts of exemplary embodiments of a computer-implemented method for the automated determination of exposure patterns; Figs. 2a to 2c illustrate an exemplary embodiment of a layer of a CAD model of a component after carrying out various steps of the computer-implemented method for the automated determination of exposure patterns in a top view; Figs. 3a to 3c illustrate the execution of step b) of an exemplary embodiment of a computer-implemented method for the automated determination of exposure patterns; and Figs. 4a to 6b illustrate various exemplary embodiments of step b) ii) of a computer-implemented method for the automated determination of exposure patterns; Fig. 7 illustrates an exemplary embodiment of step b) ii) of a computer-implemented method for the automated determination of exposure patterns with hatch spacing; Fig.Figure 8 shows a schematic representation of an embodiment of a calculation device for the automated determination of exposure patterns; Figure 9 shows a further flowchart of an embodiment of a computer-implemented method for the automated determination of exposure patterns; Figure 10 shows a flowchart of an embodiment of a method for manufacturing at least one component in an additive powder bed process using at least one automatically determined exposure pattern; and Figure 11 shows a schematic representation of an embodiment of a manufacturing device for the layer-by-layer production of at least one component in an additive powder bed process using at least one automatically determined exposure pattern. Description of the exemplary implementations The figures are described together. Fig. 1a shows a flowchart of an embodiment of a computer-implemented method for the automated determination of exposure patterns for the layer-by-layer fabrication of at least one component from a CAD model of the component in an additive powder bed process. The method comprises the following steps: a) (designated by reference numeral 110) Cutting the CAD model into a finite number of layers 122; b) (designated by reference numeral 112) Determining at least one exposure path 124 for each layer 122, wherein the exposure path 124 has beam position data for controlling an exposure beam 126 in the additive powder bed process, wherein determining the exposure path 124 comprises: i) (designated by reference numeral 114) Creating and solving a partial differential equation and / or a functional, comprising discretizing the layer 122, wherein at least one boundary condition is assigned to a boundary 128 of the layer 122, and generating at least one solution function 130; ii) (designated by reference numeral 116) Determining the exposure path 124 from the at least one solution function 130, wherein at least one property of the additive powder bed fusion is taken into account;c) (identified by reference numeral 120) Determining at least one exposure pattern from the exposure paths 124 of the layers 122.; Fig. 1b shows a further flowchart of an embodiment of a computer-implemented method for the automated determination of exposure patterns for the layer-by-layer production of at least one component from a CAD model of the component in an additive powder bed process, wherein step ii) (116) can comprise at least two sub-steps: ii) 1. (identified by reference numeral 117) Determining a vector field (132) from the at least one solution function (130); and ii) 2. (identified by reference numeral 118) Determining the exposure path (124) from the vector field (132) taking into account the at least one property of the additive powder bed process. The exposure pattern can be a sequence plan for the layer-by-layer production of at least one complete component. In particular, the exposure pattern can be a result of production and / or exposure planning. For example, based on the exposure pattern, the at least one component can be completely manufactured using the additive powder bed process. The exposure pattern can, for example, be a data set of exposure paths 124 for a finite number of layers 122 of the component, where each layer 122 of the component can have a predefined thickness s. Fig. 2a shows a top view of such a layer 122 of the CAD model of a component, as it may be present, for example, after performing step a) of the method. In particular, a layer 122 with a boundary 128 is shown, wherein the layer 122 may, for example, be arranged in a build space 134. The creation and solving of the partial differential equation and / or the functional in step b) i) can be carried out on a computational domain that includes the layer 122, in particular a cross-sectional surface of the at least one component, as well as a cross-section of the build space 134, wherein the layer 122 is preferably arranged in the build space 134. A discretization of such a computational domain, in particular of the layer 122, is shown by way of example in Fig. 2b, where the use of the finite difference method is shown.Alternatively, the creation and solving of the partial differential equation and / or the functional in step b) i) can be performed on a computational domain limited to layer 122, i.e., one that does not include any areas of the build space and / or powder bed surrounding the component. A discretization of such a computational domain, particularly one limited to layer 122, is shown by way of example in Fig. 2c, where the finite element method is used. Other computational domains, for example, domains with multiple components (not shown here), are also possible. The exposure paths 124 for each layer 122 are determined in step b) of the method, wherein a solution function 130 is generated in step i), from which the exposure path 124 is then determined in step ii). An illustration of an exemplary partial implementation of step b) is shown in Figures 3a to 3c. In particular, Figure 3a shows a perspective view of an embodiment of a solution function 130, i.e., a result and / or input data of step b) i). Specifically, an exemplary solution function 130 for a layer 122 is shown, wherein a boundary condition of a = 0 has been specified for the edge 128 of the layer 122. Figure 3b shows a side view of the solution function 130, in which the isolines, i.e., lines of the same "height," for example, lines that have the same value for a, are drawn. In particular, exemplary isolines are shown, which are derived from the solution function 130, as for example in Fig.Figure 3a illustrates the results. Figure 3c shows a top view of the isolines shown in Figure 3b. Illustrations of various embodiments of step b) ii), in particular substeps b) ii) 1 and 2, are shown in Figures 4a to 6b. Figures 4a, 5a, and 6a show exemplary embodiments of vector fields 132 of a layer 122 with a boundary 128, i.e., results and / or output data of step ii) 1., wherein exposure paths 124 determined therefrom are shown in Figures 4b, 5b, and 6b, i.e., results and / or output data of step ii) 2. In particular, the exposure paths 124 can each be composed of a plurality of exposure sections 135, wherein at least one of the exposure sections 135 can be a boundary path 137, for example, a boundary path 137 corresponding to the boundary 128 of the layer 122. The exposure sections 135 can be assembled into the exposure path 124 according to at least one predefined scheme. In particular, the assembly of the exposure path 124 from the exposure sections 135 in step b) ii) can be carried out according to a predefined scheme, for example, a calculation sequence and / or an execution direction. Other predefined schemes are also possible. Fig. 7 shows an illustration of an embodiment of step b) ii) of a computer-implemented method for the automated determination of exposure patterns, where the sequence for assembling exposure sections 135 into the exposure path 124 is illustrated by numbering the exposure sections 135 from 1 to 6. As explained above, the exposure path 124 is determined taking into account at least one property of the additive powder bed process. One such property could be, for example, a hatch spacing. An exemplary illustration of hatch spacings is also shown in Fig. 7. In particular, when determining the exposure path 124 from the solution function 130, for example, from the vector field 132 determined from the solution function 130, a maximum permissible hatch spacing Amax136 can be considered. Alternatively, or permissiblely, when determining the exposure path 124 from the solution function 130, for example, from the vector field 132 determined from the solution function 130, a minimum permissible hatch spacing Amin138 can also be considered. In particular, the exposure paths 124 and / or the exposure pattern can further include at least one piece of information about at least one process parameter for the layer-by-layer fabrication of the component using the additive powder bed process. Determining the at least one process parameter for at least one section of the exposure path can therefore, for example, be a further process step b) iii) (identified by reference numeral 140) of the computer-implemented method. Such a computer-implemented method is illustrated by way of example in Fig. 9. The method can also include further process steps not shown. The computer-implemented method can be implemented wholly or partially using data processing equipment, in particular involving at least one computer and / or a computer network. The computer and / or computer network can include at least one processor, the processor being configured to perform at least one step of the method. Preferably, each step of the method is performed by the computer and / or the computer network. The method can be performed fully automatically and, in particular, without user interaction. Fig. 8 shows a schematic representation of an embodiment of a calculation device 142 for the automated determination of exposure patterns for the layer-by-layer production of at least one component from a CAD model of the component in an additive powder process. The calculation device 142 is specifically configured to perform the computer-implemented method for the automated determination of exposure patterns. The calculation device 142 comprises at least one cutting unit 144. The cutting unit 144 is configured to perform at least step a) 110 of the computer-implemented method. In particular, the cutting unit 144 can be configured to slice the CAD model into a finite number of layers 122, for example, to separate it into a finite number of data packets.The computing device 142 further comprises at least one path determination unit 146, wherein the transfer of information and / or data of the layers 122 cut in the cutting unit 144 from the cutting unit 144 to the path determination unit 146 is illustrated by an arrow. The path determination unit 146 is configured to perform at least step b) of the computer-implemented method. In particular, the path determination unit 146 can be configured to determine an exposure path 124 for each layer 122. The computing device 142 further comprises at least one pattern determination unit 148, wherein the transfer of information and / or data of at least one exposure path 124 determined in the path determination unit 146 to the pattern determination unit 148 is illustrated by a further arrow.The pattern determination unit 148 is configured to perform at least step c) of the computer-implemented procedure. In particular, the pattern determination unit 148 can be configured to determine at least one exposure pattern from the exposure paths 124 determined for each layer. Fig. 10 shows a flowchart of an embodiment of a method for manufacturing at least one component in an additive powder bed process using at least one automatically determined exposure pattern. The manufacturing process comprises the following steps: I. (described by reference numeral 150) automated determination of the at least one exposure pattern using the computer-implemented method for automated exposure pattern determination according to the present invention; II. (described by reference numeral 152) control of an exposure beam 126, in particular a laser beam or an electron beam, by means of beam position data of the exposure pattern. In particular, the manufacturing process can include the parallel and / or temporally overlapping execution of the computer-implemented method for the automated determination of exposure patterns and the layer-by-layer production of the at least one component using the additive powder bed process. Specifically, steps I and II can be carried out in parallel and / or temporally overlapping. Figure 11 shows a schematic representation of a manufacturing device 154 for the layer-by-layer production of at least one component in an additive powder bed process using at least one automatically determined exposure pattern. The manufacturing device 154 is configured to produce at least one component in an additive powder bed process using at least one automatically determined exposure pattern, wherein the exposure pattern is determined using the computer-implemented method for the automated determination of exposure patterns according to the present invention. The manufacturing device 154 comprises at least one exposure unit 156 for generating the at least one exposure beam 126. Furthermore, the manufacturing device 154 comprises at least one control unit 158 ​​for controlling the exposure beam 126 according to the beam position data of the exposure pattern.In particular, the control unit 158 ​​can be configured to send signals, for example control signals, to and / or receive signals from the exposure unit 156, such data exchange being illustrated by two arrows in Fig. 11. The manufacturing device 154 can further comprise at least one powder bed 160 and a powder reservoir 162. Furthermore, the manufacturing device 154 can comprise at least one metering device, for example a doctor blade 164, for generating and / or applying a layer of powder in the powder bed 160. In particular, the manufacturing device 154 can be configured to produce at least one component, for example the arc-shaped component 168 shown in Fig. 11, by applying a powdered material 166 layer by layer.For this purpose, the powdered material 166 can be transferred layer by layer from the powder reservoir 162 into the powder bed 160, for example using the squeegee 164, with each layer being exposed according to the exposure path 124, in particular being supplied with the exposure beam 126, in order to produce the at least one component, for example the arc-shaped component 168 shown, in the additive powder bed process. Reference symbol list 110 Step a) 112 Step b) 114 Step b) i) 116 Step b) ii) 117 Substep b) ii) 1. 118 Substep b) ii) 2. 120 Step c) 122 Layer 124 Exposure path 126 Exposure beam 128 Edge 130 Solution function 132 Vector field 134 Build space 135 Exposure section 136 Maximum permissible hatch spacing Amax 137 Edge path 138 Minimum permissible hatch spacing Amin 140 Step b) iii) 142 Calculation device 144 Cutting unit 146 Path determination unit 148 Pattern determination unit 150 Step I. 152 Step II. 154 Manufacturing device 156 Exposure unit 158 ​​Control unit 160 Powder bed 162 Powder reservoir 164 Doctor blade 166 powdered material 168 arc-shaped component

Claims

A computer-implemented method for the automated determination of exposure patterns for the layer-by-layer fabrication of at least one component from a CAD model of the component in an additive powder bed process, wherein the method comprises the following steps: a) slicing the CAD model into a finite number of layers (122); b) determining at least one exposure path (124) for each layer (122), wherein the exposure path (124) has beam position data for controlling an exposure beam (126) in the additive powder bed process, wherein determining the exposure path (124) comprises: i) creating and solving a partial differential equation and / or a functional, comprising discretizing the layer (122), wherein at least one boundary condition is assigned to a boundary (128) of the layer (122), and generating at least one solution function (130);ii) Determining the exposure path (124) from the at least one solution function (130), taking into account at least one property of the additive powder bed process; c) Determining at least one exposure pattern from the exposure paths (124) of the layers (122).; Method according to the preceding claim, wherein step ii) comprises at least two sub-steps: ii) 1. Determining a vector field (132) from the at least one solution function (130) ii) 2. Determining the exposure path (124) from the vector field (132) taking into account the at least one property of the additive powder bed process. Method according to one of the preceding claims, wherein step b) ii) further comprises determining at least two exposure sections (135), in particular a plurality of exposure sections (135), and assembling the exposure path (124) from the at least two exposure sections (135). Method according to one of the preceding claims, wherein the exposure pattern further comprises at least one piece of information about at least one process parameter for the layer-by-layer fabrication of the component in the additive powder bed process, wherein step b) further comprises:iii) determining the at least one process parameter for at least one section of the exposure path (124). Method according to one of the preceding claims, wherein step a) further comprises detecting overhangs, wherein an overhang is detected when a protrusion between at least two layers (122), preferably at least two adjacent layers (122), exceeds a predetermined maximum value. Method according to one of the preceding claims, wherein step b) ii) further comprises a correction step, wherein in the correction step at least a part of the exposure path (124), for example at least one exposure section (135), is changed in at least one of its position, direction of execution, width and number until a limit value for a distribution is undercut. Computer program for carrying out the computer-implemented method for automatically determining exposure patterns according to one of the preceding claims directed to a computer-implemented method, when the computer program is executed on a computer. Method for manufacturing at least one component in an additive powder bed process using at least one automatically determined exposure pattern, the manufacturing process comprising: I. automated determination of the at least one exposure pattern using the computer-implemented method for automatically determining exposure patterns according to one of the preceding claims directed to a computer-implemented method; II. control of an exposure beam (126), in particular a laser beam or an electron beam, by means of beam position data of the exposure pattern. Calculation device (142) for the automated determination of exposure patterns for the layer-by-layer production of at least one component from a CAD model of the component in an additive powder bed process, wherein the calculation device is configured to carry out the computer-implemented method for the automated determination of exposure patterns according to one of the preceding claims directed to a computer-implemented method, wherein the calculation device comprises: - at least one cutting unit (144), wherein the cutting unit (144) is configured to carry out at least step a) of the computer-implemented method, in particular to cut the CAD model into a finite number of layers (122);- at least one path determination unit (146), wherein the path determination unit (146) is configured to perform at least step b) of the computer-implemented method, in particular to determine an exposure path (124) for each layer (122); - at least one pattern determination unit (148), wherein the pattern determination unit (148) is configured to perform at least step c) of the computer-implemented method, in particular to determine at least one exposure pattern from the exposure paths (124) determined for each layer (122).

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