Computer-generated hologram (CGH) and method for designing a CGH

Description

[0001] This application claims priority from German patent application DE 10 2021 213 383.5, filed on November 29, 2021. BACKGROUND OF THE INVENTION Field of the invention

[0002] The invention relates to a computer-generated hologram (CGH) for use in an interferometric measuring arrangement, as well as a method for designing a CGH. State of the art

[0003] Microlithography is used to manufacture microstructured components, such as integrated circuits or LCDs. The microlithography process is carried out in a so-called projection exposure system, which has an illumination device and a projection lens. The image of a mask (= reticle) illuminated by the illumination device is projected by the projection lens onto a substrate (e.g., a silicon wafer) coated with a light-sensitive layer (photoresist) and arranged in the image plane of the projection lens, in order to transfer the mask structure to the light-sensitive coating of the substrate.

[0004] In projection lenses designed for the EUV range, i.e., at wavelengths of, for example, approximately 13 nm or approximately 7 nm, mirrors are used as optical components for the imaging process due to the lack of suitable light-transmitting refractive materials. Typical projection lenses designed for EUV, such as those known from US 2016 / 0085061 A1, can, for example, have an image-side numerical aperture (NA) in the range of NA = 0.55 and image an object field (e.g., a ring-segment-shaped one) into the image plane or wafer plane.

[0005] Increasing the image-side numerical aperture (NA) typically enlarges the required mirror surfaces of the mirrors used in the projection exposure system. This, in turn, makes testing the surface shape of the mirrors a demanding challenge, in addition to manufacturing. Interferometric measurement methods using computer-generated holograms (CGH) are particularly used for high-precision mirror testing. Fig. 6 shows a schematic representation to explain an exemplary possible setup of an interferometric measuring arrangement for testing a mirror.

[0006] According to Fig. 6The illumination radiation generated by a light source (not shown) and emerging from the exit surface of an optical waveguide 601 emerges as an input wave 605 with a spherical wavefront, passes through a beam splitter 610, and then strikes a complexly encoded CGH 620. In the example, the CGH 620 generates a total of four output waves from the input wave 605 in transmission according to its complex coding, one of which output waves, as a test wave, strikes the surface of the test object in the form of a mirror 640 with a wavefront adapted to the desired shape of the surface of this mirror 640. Furthermore, the CGH 620 generates three further output waves from the input wave 605 in transmission, each of which strikes a further reflective optical element 631, 632, or 633. "635" denotes a shutter. The CGH 620 also serves to superimpose the light waves generated by the test object orThe test wave reflected by mirror 640 and the reference waves reflected by elements 631-633, which as convergent beams again strike the beam splitter 610 and are reflected by it in the direction of an interferometer camera 660 designed as a CCD camera, passing through an eyepiece 650. The interferometer camera 660 records an interferogram generated by the interfering waves, from which the actual shape of the optical surface of the test object 640 is determined via an evaluation device (not shown).

[0007] A problem that occurs in practice is that contamination forming on the CGH (e.g., a water or oil film) leads to a change in the measured interferogram. Thus, if a phase deviation is detected in the interferometric measurement setup, it is no longer possible to clearly distinguish whether the respective phase deviation is due to existing contamination on the CGH or to shape deviations of the surface to be measured. This can, in turn, result in manufacturing errors (in the sense of a deviation of the manufactured surface from the target geometry) for the production of an optical element or mirror based on the interferometric measurement, which ultimately impairs the performance of the optical system containing the respective optical element (e.g., the projection exposure system).In practice, this creates the need to detect contamination present on the CGH and to consider its influence on the measurement result obtained with the respective interferometric measurement setup.

[0008] A known approach to this includes, according to the schematic representation of Fig. 7 The provision of a control area spatially separated from the actual useful structure on the CGH with substructures differing from each other with regard to their respective flank areas in order to enable unambiguous contamination detection from a different reaction of these areas to a contamination forming on the CGH and the correspondingly changed phase effect. Fig. 7The CGH 720 shown has, in addition to a first region 721 comprising the actual useful structure A for generating the test wave during the interferometric measurement, a second region 722 spatially separated therefrom, which serves as a control region for detecting contamination forming on the CGH 720. In order to also be able to capture the waves emanating from the control region 722 in the interferometric measuring arrangement during the interferometric measurement, periods of the grating structures of the control region 722 are designed such that they also generate an interferogram on the interferometer camera. In order to provide contamination-sensitive functionality within the control region 722, at least two substructures B1 and B2 that differ from one another with regard to their respective flank surfaces are present in said control region 722.

[0009] In practice, a further problem may arise that, despite the provision of different flank surfaces described above, sufficient sensitivity to contamination is still not achieved. Furthermore, there is a need in practice to detect and consider contamination forming on a CGH in scenarios where the flank angles present in the CGH structures are not available as a free parameter during CGH manufacturing (e.g., when CGH structures are to be manufactured that are consistently perpendicular to the CGH substrate).

[0010] In view of the high reproduction accuracy that must be ensured over the runtime of the interferometric measurement setup, the appropriate consideration of contaminations forming on the CGH represents a demanding challenge.

[0011] As an example, reference is made to DE 10 2018 209 175 A1 for the state of the art. SUMMARY OF THE INVENTION

[0012] Against the above background, it is an object of the present invention to provide a computer-generated hologram (CGH) for use in an interferometric measuring arrangement and a method for designing a computer-generated hologram, which enable sufficient measurement accuracy in an interferometric measuring arrangement while at least partially avoiding the problems described above.

[0013] This object is achieved by the computer-generated hologram (CGH) according to the features of independent patent claim 1 or the method according to the features of the independent patent claim 9.

[0014] According to one aspect of the invention, a computer-generated hologram (CGH) for use in an interferometric measuring arrangement comprises at least one useful structure and a contamination marker arrangement for detecting contamination present on the CGH, said contamination marker arrangement comprising: a first contamination marker structure with a first substructure and a second substructure, which differ from one another with respect to the wavefront change caused by a given contamination; and at least one second contamination marker structure with a third substructure and a fourth substructure, which differ from one another with respect to the wavefront change caused by a given contamination; wherein each of the substructures, in complex coding, has at least one first subgrating for providing at least one first output wave contributing to interferogram generation and at least one dummy grating for generating an output wave not contributing to interferogram generation;wherein the third substructure and / or the fourth substructure differ from both the first substructure and the second substructure with regard to the dummy grating and / or the relative weight of subgratings and dummy grating and / or the fill factor; and wherein the at least two contamination marker structures of the contamination marker arrangement are each structures determined by means of a model-based search, wherein the dummy structure for a predetermined first subgrating is numerically optimized by the model-based search to provide a first output wave contributing to the interferogram generation.

[0015] The CGH features complex coding to generate different output waves. Regarding the complex coding, reference is made to the publications F. Simon et al.: "Quasi-absolute measurement of aspheres with a combined diffractive optical element as reference," APPLIED OPTICS Vol. 45, No. 34, 2006, pp. 8606-8612; H. Liu et al.: "Redistribution of output weighting coefficients for complex multiplexed phase-diffractive elements," OPTICS EXPRESS Vol. 12, No. 19, 2004, pp. 4347-4352; and E. Carcolé et al.: "Derivation of weighting coefficients for multiplexed phase-diffractive elements," OPTICS LETTERS Vol. 20, No. 23, 1995, pp. 2360-2362.

[0016] According to one embodiment, at least one of the contamination marker structures has a contamination sensitivity that is at least twice, in particular at least five times, more particularly at least ten times, and more particularly at least twenty times the contamination sensitivity of the useful structure. Here and below, the contamination sensitivity of a useful structure or a substructure is defined as the ratio of a wavefront change caused by a given contamination with a defined contamination layer thickness in the interferogram generated by the CGH during operation to said contamination layer thickness. The contamination sensitivity of a contamination marker structure then corresponds to the difference between the wavefront sensitivities of the associated substructures.

[0017] The contamination sensitivity of the contamination marker structure can be achieved, in particular, by appropriately selecting a dummy grating to maximize the dependence of the generated interferogram phase on contamination. The invention incorporates the principle of appropriately adjusting or optimizing the contamination sensitivity based on predetermined basic functionalities (provided by the grating structure of the at least one first sub-grating) by using a further "dummy structure" provided by the dummy grating (which itself is not interferometrically effective, but rather couples out light from the useful beam path).

[0018] According to one embodiment, each of the substructures of this contamination marker structure generates an interference contrast of at least 10%, in particular at least 30%, further in particular at least 50%, further in particular at least 70%, in an interferometric measurement carried out in the measuring arrangement.

[0019] In embodiments of the invention, the at least two contamination marker structures are designed for different manufacturing deviations. The "design of a contamination marker structure for a manufacturing deviation" can in particular mean that a merit function is used or optimized that describes a continuous compromise between contamination sensitivity, brightness, contrast, duty cycle, and possibly other parameters.

[0020] The "design of a contamination marker structure for a manufacturing deviation" preferably means, in particular, that the following requirements are met: First, the contamination marker structure has a sufficiently high contamination sensitivity for the respective manufacturing deviation (i.e., the presence of certain values for one or more predefined structural parameters, for example, different manufacturing-related values for the edge offset and the etch depth of the contamination marker structures). Second, the contamination marker structure also generates sufficient contrast and brightness for the respective manufacturing deviation in the interferogram generated by the CGH during operation and captured by the interferometer camera in the interferometric measuring arrangement.

[0021] In particular, the expected manufacturing deviations with the greatest influence on the contamination sensitivity can first be determined, whereby the design of the first and at least second contamination marker structure can then be carried out for these manufacturing deviations.

[0022] The invention is based, among other things, on the consideration that the contamination sensitivity provided by a grating structure of a CGH can be optimized by a suitable or optimized choice of the "free parameters", namely fill factor and relative weight, but that this optimization alone may nevertheless prove to be insufficient: This applies, on the one hand, because the value of the contamination sensitivity is strongly dependent on the orientation of the grating structures, with the consequence that, for a certain unfavorable orientation, the contamination sensitivity may still have an absolute value that is too low despite the "optimal" choice of fill factor and relative weight. On the other hand, this also applies because additional criteria, such asContrast or brightness are required (since even a high value of contamination sensitivity is no longer useful if the contrast or brightness is too low).

[0023] Furthermore, the invention is also based on the consideration that the contamination sensitivity of the CGH depends strongly on the shape of the selected dummy grating (not only its flank area), on the relative weights of the sub-grids and on the fill factor, with the consequence that even parameter changes due to manufacturing errors can destroy the achievement of a sufficiently high contamination sensitivity.

[0024] As a consequence of the above considerations, on the one hand, a model-based optimization of free grid parameters (to achieve a suitable compromise between contamination sensitivity, brightness, contrast, duty cycle and possibly other parameters) can be carried out according to the invention, and on the other hand, contamination marker structures are also provided for different manufacturing deviations in order to ensure that for a manufacturing deviation actually present in practice - despite the aforementioned strong dependence of the contamination sensitivity, for example on the orientation of the grid structures - a contamination sensitivity that is not only optimized with regard to the free parameters (fill factor and relative weight), but also sufficient in absolute terms.In other words, this ensures that, regardless of the actual manufacturing deviation in a specific application scenario, a sufficiently high contamination sensitivity with sufficient contrast and sufficient brightness is always present, since a corresponding contamination marker structure is available for each application scenario under consideration.

[0025] A "contamination marker structure" within the meaning of the present application is a unit that can be designed for a specified manufacturing deviation and exhibits a contamination-dependent wavefront signature in the interferogram generated during operation that differs from adjustment-related wavefront profiles. This can be achieved, for example, by continuously varying the grating structure across the contamination marker structure in question. This variation of the grating structure can be configured, for example, in the form of an astigmatism or as a random variation. The structural parameters for a maximum positive and a maximum negative contamination sensitivity can be calculated and interpolated in the form of the desired signature. Furthermore, two related sub-regions or sub-patches can also jointly form a contamination marker structure.

[0026] In this case, one of these sub-ranges may have the maximum positive contamination sensitivity and the other the maximum negative contamination sensitivity.

[0027] According to one embodiment, the contamination marker arrangement comprises a plurality of contamination marker structures arranged in an array, each having a first substructure and a second substructure. In this way, an array can be formed, in particular as described above, from a plurality of contamination marker structures designed for different, predetermined manufacturing deviations.

[0028] According to one embodiment, sub-regions with positive contamination sensitivity and sub-regions with negative contamination sensitivity can be arranged alternately in order to obtain a signal that is as detectable as possible.

[0029] According to one embodiment, each of the substructures has, in addition to the first subgrating, a second subgrating for providing a second output wave as a reference wave that contributes to interferogram generation. The second subgrating can, in particular, be configured as a Littrow structure, so that the second output wave or reference wave is generated directly at the CGH as a Littrow wave in reflection. In a further embodiment, the second output wave can also be generated by the CGH in transmission and directed onto a reference mirror.

[0030] However, the invention is not limited to the provision by the CGH of a second output wave as a reference wave that contributes to the interferogram generation, wherein in particular a reference wave can also be generated in a so-called Fizeau arrangement via an additional Fizeau element (in this case, the CGH according to the invention or the said substructures do not have to generate a second output wave as a reference wave).

[0031] According to one embodiment, the CGH has a first region having the at least one useful structure and a second region spatially separated from this first region, wherein the contamination marker arrangement is arranged in the second region.

[0032] According to one embodiment, the CGH is designed to test an optical element of a microlithographic projection exposure system.

[0033] The invention further relates to a method for designing a computer-generated hologram (CGH) with a contamination marker arrangement, wherein the contamination marker arrangement comprises a first contamination marker structure with a first substructure and a second substructure, which differ from one another with regard to the wavefront change caused by a given contamination, and at least one second contamination marker structure with a third substructure and a fourth substructure, which differ from one another with regard to the wavefront change caused by a given contamination, wherein each of the substructures has, in complex coding, at least one first sub-grating for providing a first output wave contributing to the interferogram generation and at least one dummy grating for generating an output wave not contributing to the interferogram generation,wherein the at least two contamination marker structures of the contamination marker arrangement are each determined by means of a model-based search, wherein in this model-based search a numerical optimization of the dummy structure for a predetermined first sub-grating is carried out to provide a first output wave contributing to the interferogram generation.

[0034] According to one embodiment, a numerical optimization of the dummy structure can also be carried out for other given grid structures in the model-based search.

[0035] According to one embodiment, this numerical optimization is performed such that the contamination sensitivity of the interferogram phase generated by the at least one output wave provided by the CGH and the reference wave is maximized under specified boundary conditions. It is essential that a number of boundary conditions regarding the properties of the resulting interferogram are met. For example, the brightness should remain within a certain range and the interference contrast should not fall below a minimum value. Therefore, in embodiments, instead of the dummy grating resulting in maximum sensitivity, a dummy grating can be selected that maximizes the merit function (wherein the sensitivity again represents an essential factor in this merit function).

[0036] The disclosure is not limited to the model-based search described above for generating the contamination marker arrangement, although such other embodiments do not fall within the scope of the claims. In further embodiments, the contamination sensitivity can also be determined for a "random structure" (i.e., a contamination marker structure that is not specifically designed) by measuring under controlled contamination conditions. Since this contamination marker structure is then not specifically "designed" by means of a model-based search, a correspondingly larger total contamination marker area is required to cover or provide a sufficient number of values for the weights and duty cycles, as well as a sufficient number of dummy grids, in order to statistically achieve sufficient performance in terms of adequate contamination sensitivity under the given boundary conditions.

[0037] The invention further relates to an interferometric measuring arrangement for testing an optical element, in particular an optical element of a microlithographic projection exposure system, wherein the measuring arrangement has a computer-generated hologram (CGH) and wherein a test of at least a partial surface of the optical element can be carried out by interferometric superposition of a test wave directed by this computer-generated hologram onto the optical element and a reference wave, wherein the computer-generated hologram (CGH) is designed according to the features described above.

[0038] Further embodiments of the invention can be found in the description and the dependent claims.

[0039] The invention is explained in more detail below with reference to embodiments shown in the attached figures. BRIEF DESCRIPTION OF THE DRAWINGS

[0040] They show: Figure 1 shows a flowchart to explain an embodiment of the present invention; Figures 2-5 show schematic representations to explain exemplary embodiments of the present invention; Figure 6 shows a schematic representation of a possible structure of an interferometric measuring arrangement; Figure 7 shows a schematic representation to explain an exemplary conventional approach for detecting contamination present on a CGH; and Figure 8 shows a schematic representation of a projection exposure system designed for operation in the EUV. DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS

[0041] Fig. 8 shows a schematic representation of an exemplary projection exposure system designed for operation in the EUV, which is equipped with an interferometric measuring arrangement (e.g. with the Fig. 6 (already described structure) has testable mirrors.

[0042] According to Fig. 8 An illumination device in a projection exposure system 10 designed for EUV comprises a field facet mirror 3 and a pupil facet mirror 4. The light from a light source unit, which comprises a plasma light source 1 and a collector mirror 2, is directed onto the field facet mirror 3. A first telescopic mirror 5 and a second telescopic mirror 6 are arranged in the light path downstream of the pupil facet mirror 4. A deflecting mirror 7 is arranged downstream in the light path, which deflects the radiation incident on it onto an object field in the object plane of a projection objective comprising six mirrors 21-26. At the location of the object field, a reflective, structure-bearing mask 31 is arranged on a mask table 30. This mask is imaged with the aid of the projection objective into an image plane in which a substrate 41 coated with a light-sensitive layer (photoresist) is located on a wafer table 40.

[0043] The optical element tested in an interferometric measuring arrangement and using a CGH according to the invention can be, for example, any mirror of the projection exposure system 10.

[0044] In the following, embodiments of the invention are described with reference to the schematic illustrations in Fig. 1-5 described.

[0045] The embodiments described below have in common that a CGH intended for use in an interferometric measuring arrangement has a contamination marker arrangement for the purpose of detecting or taking into account contamination that forms on the CGH during operation, the functional principle of which is basically - in this respect analogous to that described above with reference to Fig. 7 described conventional approach - is based on the change in the wavefront or phase effect of the CGH associated with the formation of a contamination layer on the CGH.

[0046] In contrast to the conventional approach according to Fig. 7 However, the invention is not based on the use of different flank area proportions, but rather on the use of a model-based optimization of contamination marker structures. This model-based optimization specifically includes the model-based search for specific (dummy) grating structures, which, upon the occurrence of contamination, lead to a modulation of at least one output wave provided by the CGH and thus to a modulation of the interferogram phase generated from the superposition between this at least one output wave and the reference wave.

[0047] In other words, the model-based optimization according to the invention is carried out for fundamentally free grating parameters (namely fill factor and relative weights) with the aim of achieving the highest possible contamination sensitivity (in the sense of a wavefront or phase change caused by the respective contamination) while at the same time achieving sufficient values for contrast and intensity for the given complex coding of the CGH and different manufacturing deviations of the CGH (which may include, for example, certain values for the edge offset, the etching depth and / or the duty cycle).

[0048] The model-based optimization according to the invention includes detailed simulations of the Maxwell equations to determine the diffraction effect of the (typically complex-coded) grating structures in the contamination marker array. Specifically, Fig. 1One or more optimal "additional gratings" were sought that, when complexly coded, together with the respective grating structures of the basic interferogram functionality (i.e., the respective interferometrically effective grating structures), would result in maximum contamination sensitivity of the wavefront or phase effect. The underlying physical mechanism is that the coupling of electromagnetic modes in complexly coded grating structures creates resonances, which in turn generate a high wavefront effect. The coupling induced by the respective grating structure can, in turn, be modulated by contamination. By using numerical optimization of the complexly coded contamination marker structures, contamination marker structures with high contamination sensitivity can be realized.

[0049] For example only, the aforementioned interferometrically effective grating structures on the CGH may be grating structures, one of which provides a test wave as the output wave, while the other is designed as a Littrow structure. The non-interferometrically effective grating structure may be a dummy structure that essentially serves to couple light out of the useful light beam path. Its contamination-sensitivity-determining property is based on the fact that it influences the coupling of the modes generated by the CGH and their contamination dependence.

[0050] According to a further aspect, the contamination marker arrangement according to the invention is designed such that suitable contamination marker structures are designed for different predetermined manufacturing deviations, with the aim of ensuring that a sufficiently contamination-sensitive contamination marker structure is always available for a manufacturing deviation that actually exists in practice. The "design" of a contamination marker structure for a manufacturing deviation means that a merit function is used or optimized that describes a continuous compromise between sensitivity, brightness, contrast, duty cycle, and possibly other parameters. The contamination marker structure hasThe material preferably exhibits the highest possible contamination sensitivity (e.g., the presence of certain values for one or more predefined structural parameters), taking into account the aforementioned additional parameters. In particular, the expected manufacturing deviations with the greatest influence on contamination sensitivity can be determined first.

[0051] The said contamination marker structures may further be present in particular in spatially separate sub-areas (= "sub-patches") on the CGH, for which Fig. 3 only schematically shows an exemplary possible design. Fig. 3 does not show a spatial arrangement on the CGH, but a distribution of the manufacturing deviation sizes for the individual sub-patches from Fig. 2. "M" denotes manufacturing deviation operating points of corresponding sub-ranges with negative contamination sensitivity, and "P" denotes manufacturing deviation operating points or corresponding sub-ranges with positive contamination sensitivity.

[0052] In this case, the structural parameters or manufacturing defects varied over the said sub-areas can be, without the invention being limited thereto, the edge offset (EPE = " E dge P lacement E rror") and the etching depth, as shown in the schematic representation of Fig. 4 illustrated. For example, the etch depth value for the sub-regions can be varied between 500 nm and 600 nm, whereas the edge offset can only be varied between -40 nm and +40 nm.

[0053] Furthermore, according to the schematic representation of Fig. 2Sub-regions of positive and negative contamination sensitivity (i.e., positive or negative contamination-induced wavefront changes depending on the contamination layer thickness) are arranged alternately in an array. Such a configuration is advantageous in that maximum contamination sensitivity of the differential signal of adjacent sub-regions is achieved. Furthermore, such an arrangement generates a signature that is easily distinguishable from other signal waveforms of the interferogram generated in the measurement setup, which in turn can prevent incorrect causal attribution.

[0054] The invention is not limited to a regularly alternating arrangement of the aforementioned sub-regions. In particular, instead of positive or negative contamination sensitivities, continuous sensitivity curves can be generated by appropriately selecting the respective structural parameters. Examples include wavefront curves in the form of astigmatism or random wavefront variations across the contamination marker structure, which can be distinguished from alignment-related wavefront curves.

[0055] Fig. 5a-5d Show representations of exemplary contamination marker structures optimized according to the invention with complex coding. The white areas show ridges or elevations, and the black areas show grooves or holes. Typical groove widths range from approximately 0.2 µm to approximately 10 µm.

[0056] Although the invention has been described with reference to specific embodiments, numerous variations and alternative embodiments will become apparent to those skilled in the art, e.g., by combining and / or interchanging features of individual embodiments. Accordingly, it will be understood by those skilled in the art that such variations and alternative embodiments are encompassed by the present invention, and that the scope of the invention is limited only by the appended claims.

Claims

1. Computer-generated hologram (CGH) for use in an interferometric measurement arrangement, having at least one used structure and a contamination marker arrangement for detecting contamination present on the CGH, wherein said contamination marker arrangement has: • a first contamination marker structure having a first substructure and a second substructure which differ from one another in terms of the wavefront change respectively caused by predefined contamination; and • at least one second contamination marker structure having a third substructure and a fourth substructure which differ from one another in terms of the wavefront change respectively caused by predefined contamination; • wherein each of the substructures has, in complex coding, at least one first partial grating for providing a first output wave contributing to interferogram generation and at least one dummy grating for generating an output wave not contributing to interferogram generation; • wherein the third substructure and / or the fourth substructure differ(s) both from the first substructure and from the second substructure in terms of the dummy grating and / or the relative weight of partial gratings and the dummy grating and / or the fill factor; • wherein the at least two contamination marker structures of the contamination marker arrangement are structures determined in each case by way of a model-based search, wherein the dummy structure is numerically optimized by the model-based search for a predefined first partial grating for providing a first output wave contributing to interferogram generation.

2. Computer-generated hologram (CGH) according to Claim 1, characterized in that at least one of the contamination marker structures has a contamination sensitivity which is at least twice, in particular at least five times, more particularly at least ten times, and more particularly at least twenty times, the contamination sensitivity of the used structure.

3. Computer-generated hologram (CGH) according to Claim 1 or 2, characterized in that each of the substructures of this contamination marker structure generates an interference contrast of at least 10%, in particular at least 30%, more particularly at least 50%, more particularly at least 70%, in an interferometric measurement carried out in the measurement arrangement.

4. Computer-generated hologram (CGH) according to one of Claims 1 to 3, characterized in that the contamination marker arrangement has a plurality of contamination marker structures which are arranged in an array and each have a first substructure and a second substructure.

5. Computer-generated hologram (CGH) according to one of the preceding Claims 1 to 4, characterized in that each of the substructures furthermore has a second partial grating for providing a second output wave contributing to interferogram generation as a reference wave.

6. Computer-generated hologram (CGH) according to Claim 5, characterized in that the second partial grating is a Littrow structure.

7. Computer-generated hologram (CGH) according to one of the preceding claims, characterized in that said hologram has a first region having the at least one used structure and a second region spatially separated from said first region, wherein the contamination marker arrangement is arranged in the second region.

8. Computer-generated hologram (CGH) according to one of the preceding claims, characterized in that said hologram is designed to test an optical element of a microlithographic projection exposure apparatus.

9. Method for designing a computer-generated hologram (CGH) with a contamination marker arrangement, wherein the contamination marker arrangement has a first contamination marker structure having a first substructure and a second substructure which differ from one another in terms of the wavefront change respectively caused by predefined contamination, and at least one second contamination marker structure having a third substructure and a fourth substructure which differ from one another in terms of the wavefront change respectively caused by predefined contamination, wherein each of the substructures has, in complex coding, at least one first partial grating for providing a first output wave contributing to interferogram generation and at least one dummy grating for generating an output wave not contributing to interferogram generation, wherein the at least two contamination marker structures of the contamination marker arrangement are determined in each case by way of a model-based search, wherein the dummy structure is numerically optimized in this model-based search for a predefined first partial grating for providing a first output wave contributing to interferogram generation.

10. Method according to Claim 9, characterized in that this numerical optimization is carried out in such a way that the contamination sensitivity of an interferogram phase generated by superimposing a reference wave on the at least one first output wave provided by the CGH in an interferometric measurement arrangement is maximized under predefined boundary conditions.

11. Method according to Claim 9 or 10, characterized in that the CGH is a CGH according to one of Claims 1 to 8.

12. Interferometric measurement arrangement for testing an optical element, in particular an optical element of a microlithographic projection exposure apparatus, wherein the measurement arrangement has a computer-generated hologram (CGH), and wherein at least one partial area of the optical element can be tested by interferometrically superimposing a test wave guided by this computer-generated hologram onto the optical element and a reference wave, wherein the computer-generated hologram (CGH) is designed according to one of Claims 1 to 8.