Laser system, method for creating at least one shaped and amplified laser beam using a laser system, and optical system

EP4690391A1Pending Publication Date: 2026-02-11DEUTSCHES ZENTRUM FÜR LUFT UND RAUMFAHRT E V
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Patent Information

Application Number
EP2024718710
Authority / Receiving Office
EP · EP
Patent Type
Applications
Current Assignee / Owner
Priority Date
2023-04-05
Filing Date
2024-03-28
Publication Date
2026-02-11

AI Technical Summary

Technical Problem

Existing laser systems face limitations in generating high-intensity, shaped laser beams for material processing due to thermal load constraints and intensity losses, which restrict their application in precision tasks like drilling and 3D structure creation.

Method used

A laser system comprising a laser radiation source, a beam shaping device, and a laser-active amplification device with a wedge disk, where the shaped laser beam is amplified using a pump beam and diagnosed for feedback-controlled beam shaping, allowing for high-intensity, geometrically precise laser beam arrangements.

Benefits of technology

This approach enables the generation of high-intensity, shaped laser beams with reduced thermal load on the beam shaping device, enabling efficient material processing such as simultaneous hole drilling and precise 3D structure creation with minimized aberrations and intensity losses.

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Abstract

The invention relates to a laser system (100) having a laser radiation source (10), an optical element (20) and a laser-active amplification device (22) with a first side (28) facing a shaped laser beam (16, 18) and an opposite second side (30). A beam shaping device (14) is disposed between the laser radiation source (10) and the one optical element (20) and serves to create a laser beam (16) that is shaped with regard to an intensity distribution and / or a phase of the laser beam (12). The optical element (20) steers the shaped laser beam (16, 18) to the amplification device (22). The amplification device (22) amplifies the shaped laser beam (16, 18) by means of a pump beam (34) and emits said laser beam as amplified shaped laser beam (18, 36). The shaped and / or amplified laser beam (36) is diagnosed in order to control and / or regulate the beam shaping device (14) by means of a feedback loop. The invention also relates to an optical system (200) and a method for creating the above type of laser beam.
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Description

[0001] Description

[0002] Laser system, method for generating at least one shaped and amplified laser beam with a laser system and optical system

[0003] State of the art

[0004] The invention relates to a laser system, in particular a laser amplification system, and a method for generating at least one shaped and amplified laser beam with such a laser system, as well as an optical system.

[0005] Laser systems are classified according to their gain medium into gas lasers, solid-state lasers and dye lasers and emit coherent light in different wavelengths and beam intensities.

[0006] The solid-state laser, in particular a disk laser, comprises a laser source generating a laser beam, an amplification unit comprising a solid body containing a laser-active material, which amplifies the laser beam impinging on a front side of the solid body, and at least one output unit that outputs the amplified beam from the solid-state laser. Typically, the laser beam passes through the laser-active solid body in multiple passes, with the incoming laser beam being reflected in each case by a rear side of the solid body that reflects the laser beam and can exit the front side again. Mirror elements, for example, are provided to re-image the exiting laser beam onto the front side of the laser-active solid body. The laser-active material is typically excited by a pump laser beam generated in a pump laser source.

[0007] Material processing using laser beams is well known. Examples include laser welding for joining different materials such as non-ferrous metals or light metals in component manufacturing, laser cutting of sheet metal, laser hardening of surfaces, as well as laser marking and laser cleaning. These are now established material processing techniques. For special applications, it is necessary to have laser beam intensities of a few tens of watts to several hundred watts available. Furthermore, focused laser beams with a small diameter and relatively high power are of great interest for special applications. Examples include drilling special holes with diameters of a few hundred nm using laser beams or scribing elongated structures in chip manufacturing.

[0008] High-power lasers are preferred for material processing, taking economic considerations into account. Today, CO2 lasers and neodymium-YAG lasers are primarily used, in continuous wave (CW) or pulsed mode, with the operating mode depending on the intended application and the processing method. This also applies to the required laser power, which for CO2 lasers is typically up to 10 6 Watts, usually 10 3 Watts (CW), and 10 9 Watt (pulsed, pulse duration 1 ns, repetition frequency 10 Hz) as well as 200 Watt (CW) and 10 7 Watt (pulsed, pulse duration 10 ns to 100 ns, repetition frequency 10 4Hz) for neodymium-YAG lasers. The use of ultrashort laser pulses (using titanium-sapphire or ytterbium-YAG lasers) is becoming increasingly important, enabling high edge steepness and reproducibility of the generated structures. Laser systems designed as laser amplification systems are known from DE 43 44 227 A1 or DE 198 35 107 A1. These systems are designed as laser amplification systems and comprise a disk-shaped or cuboid-shaped solid containing laser-active material. In this case, a pump beam is directed onto the laser-active material along with the generated laser beam, thus amplifying the laser intensity.

[0009] Disclosure of the invention

[0010] The object of the invention is to provide an improved laser system.

[0011] A further object is to provide a method for generating at least one shaped and amplified laser beam with such a laser system.

[0012] Another task is the use of a laser system for material processing.

[0013] Another task is the creation of an optical system for a laser system, especially for material processing.

[0014] The objects are achieved by the features of the independent claims. Advantageous embodiments and advantages of the invention emerge from the further claims, the description, and the drawings.

[0015] The features listed individually in the patent claims can be combined with one another in a technologically meaningful manner and can be supplemented by explanatory facts from the description and by details from the figures, whereby further embodiments of the invention are shown.A laser system is proposed, in particular a laser amplification system for generating at least one amplified and / or shaped laser beam, comprising at least one laser radiation source for generating a laser beam, at least one optical element, at least one laser-active amplification device with a first side facing a shaped laser beam and a second side opposite thereto, wherein the laser-active amplification device has in particular a laser-active wedge disk, wherein at least one beam shaping device for generating a laser beam shaped with regard to an intensity distribution and / or a phase of the laser beam is arranged between the laser radiation source and the at least one optical element.

[0016] The optical element is designed to direct the shaped laser beam onto the laser-active amplification device, wherein the laser-active amplification device is designed to amplify the shaped laser beam by means of a coupled-in pump beam and to emit it as an amplified shaped laser beam.

[0017] The shaped and / or amplified laser beam is diagnosed by means of a measuring device in order to control and / or regulate the beam shaping device with a feedback loop.

[0018] The at least one shaped laser beam can be a single laser beam or comprise a plurality of separate laser beams, which are arranged, in particular, at an angle to one another. This applies at least to a laser beam incident on the amplification device. The output laser beam can comprise both parallel and mutually inclined laser beams.

[0019] The laser-active amplification device preferably comprises a laser-active solid. The laser-active solid comprises a laser-active material. The laser-active solid can be in the form of a crystal or glass. For example, the crystal is made of yttrium aluminum garnet or sapphire, or a semiconductor.

[0020] The laser-active amplification device can comprise a laser-active solid, wherein the laser-active solid is doped with the laser-active material. The laser-active solid can comprise, as the laser-active material, a chemical element from the group of lanthanides, in particular yttrium, neodymium, and / or erbium, and / or a transition metal, for example, titanium and / or zirconium. The laser-active material can be excited by means of a laser beam referred to as a pump beam. The pump beam typically has a different wavelength than the generated laser beam to be amplified and shaped. For example, a generated laser beam with a laser wavelength of 1030 nm can be used. The pump beam can have a wavelength of 969 nm as a pump diode.

[0021] The pump beam and the shaped laser beam are guided to the amplification device, wherein the amplification device is configured to amplify the shaped laser beam. The shaped laser beam can be guided to the amplification device once or multiple times. A shaped, amplified laser beam can be coupled out of the laser system for further use. For example, a generated laser beam with a laser wavelength of 1030 nm and a pump beam with a wavelength of 969 nm from a pump diode can be used. Laser wavelengths typically between 700 nm and 3000 nm can be used particularly advantageously for material processing. Pulsed laser beams with a pulse duration of approximately 0.1 ps to several tens of ps can typically be used, as can, for example, a short-pulse laser, a pulse duration of 10 ps to 10 ns. In particular, pulsed lasers and continuous wave (CW) lasers can be used.Here, the generated laser beam can first be shaped with a lower intensity, typically in the range of a few watts to a few tens of watts, typically 20 watts, and the shaped laser beam can then be amplified using the amplification device. An intensity of a few hundred watts, typically 200 watts to 400 watts, can be achieved. The shaped, amplified laser beam can then be coupled out of the laser system. This allows a shaped laser beam with an increased beam intensity to be achieved for the application. Furthermore, the beam shaping device can be used to generate multiple individual laser beams, which are then amplified as individual, separate laser beams.

[0022] This allows a laser beam array with mutually inclined laser beams to be created from a laser beam generated in the laser radiation source. This laser beam array can be amplified as a whole while preserving the geometric characteristics of the laser beam array. For example, laser beam arrays can be realized with a matrix of individual, high-intensity laser beams and coupled out of the laser system.

[0023] Such a laser beam arrangement can be used, for example, to simultaneously drill a field of holes into materials. This creates multiple holes in the material at the same time. This saves time and is more cost-effective than sequentially drilling holes with a single laser beam. Linear laser beams of high intensity can be produced, which can be used, for example, to imprint lines into materials such as glass. Structures, in particular 3D structures, can also be incorporated into materials using the laser beam arrangement. Thus, the shaped laser beam can be a laser beam pattern consisting of several individual laser beams, in particular those inclined relative to one another, which is designed as a pattern, for example a line, a circle, a polygon, a dot matrix or with another geometric pattern. The individual laser beams can also be directly adjacent to one another.Thus, a continuous structure can be formed as a pattern generated by the laser beam arrangement.

[0024] By diagnosing the laser beam arrangement, i.e., the amplified and / or shaped laser beam, using the measuring device, in particular a camera unit, to control and / or regulate the beam-shaping device, a particularly favorably shaped and / or amplified laser beam can be generated in a feedback loop. In particular, aberrations that can be generated by the active material of the wedge disk can be corrected, and feedback for the beam shaping can be provided.

[0025] The advantage here is that the generated laser beam, which has a low intensity, does not impose any significant load, especially no significant thermal load, on the beam-shaping device, while still generating an amplified, shaped laser beam of high intensity. Furthermore, shaping the laser beam can prevent intensity losses.

[0026] In previously known laser systems according to the prior art, the amplified laser beam is shaped into a shaped laser beam following amplification. This imposes limitations due to the thermal load capacity of the beam-shaping device, restricting the intensity of the output laser beam or resulting in a very short service life of the beam-shaping device used. The amplified and / or shaped laser beam can be output from the laser system by arranging the amplification device, in particular the wedge disk, at an angle or by using an output unit with a beam splitter. The output unit can have at least one polarization device configured to redirect the laser beam and simultaneously output the amplified, shaped laser beam.The polarization device is arranged in the beam path of the shaped laser beam, in particular after the optical element and before the amplification device.

[0027] Optionally, the laser system may comprise at least one polarization device configured to redirect the laser beam and simultaneously couple out the amplified laser beam.

[0028] In a favorable embodiment of the laser system, the measuring device can be or have a camera unit.

[0029] Beam adjustment can be performed iteratively by comparing an image captured by the camera unit with a "desired" image and calculating an error value. This error value can be minimized using a suitable algorithm.

[0030] The camera unit can be a conventional camera. Furthermore, variants of a conventional camera can be used, for example, wavefront sensors such as Shack-Hartmann sensors (SHS) or Hartmann sensors; or interferometers such as Shearing, Michelson, Mach-Zehnder, Fabry-Perot, Fizeau, or Speckle; or a multiphase measurement, in particular a heterodyne phase measurement; or a hyperspectral camera, or plenoptic camera (light field camera); or polarization camera; or Schlieren imaging; or streak camera, and the like. In principle, "2D" sensors are suitable, which are capable of imaging other parameters in addition to intensity, such as wavelength, polarization, phase, and pulse duration. Furthermore, such sensors can also be used to implement control systems for spatiotemporally shaped laser radiation.

[0031] In a favorable embodiment of the laser system, the beam-shaping device can have at least one spatial light modulator, in particular a so-called SLM element (SLM = spatial light modulator) and / or at least one diffractive optical element (DOE = diffractive optical element). This can be used to shape the phase and / or the intensity of the generated laser beam. By shaping the phase, a spatial modulation can be imposed on the generated laser beam, thus generating a geometrically divided laser beam. Furthermore, the temporal structure of short laser pulses can be shaped. In general, the laser pulse is first passed through a dispersive element, such as a diffraction grating or a prism, to spatially separate the frequency components. With the help of spatial phase modulation, the individual frequency components can then be delayed relative to one another.The division into individual frequency components can be reversed by redirecting the light to a dispersive element. Depending on the phase modulation, completely different pulse shapes can, in principle, be generated.

[0032] The diffractive optical element (DOE) is essentially a glass substrate onto which microstructures are applied, for example, by photolithography. Phase modulation can occur in the microstructures due to different optical path lengths of the partial beams, creating interference patterns. Furthermore, the amplitude can be modulated through constructive and destructive superposition. Thus, with clever design, the intensity patterns in a laser beam can be manipulated. DOE elements can fulfill two tasks: they can shape a single laser beam or split it into several partial beams. The microstructure in the DOE element can shape the laser beam through the refractive index or through height modulation. Good components achieve efficiencies of 80%–99% and transmittances of 95%–99%.Imaging errors and / or aberrations of the amplification device can be avoided or at least reduced by suitable diagnostics of the shaped and / or amplified laser beam by means of feedback to the beam shaping device.

[0033] Laser beam arrangements, for example, a circle of individual laser beams, can be generated from the generated laser beam. The shaped laser beam can comprise, for example, 20 laser beams. The spatial light modulator (SLM) and / or the diffractive optical element (DOE) can be operated in both transmission and reflective modes. The beam-shaping device, for example, the spatial light modulator (SLM), can be cooled, particularly water-cooled.

[0034] In a favorable embodiment of the laser system, the optical element can be a relay optic. In particular, the relay optic can be an optical element capable of realizing so-called 4f imaging. The optical element can be split into two parts and, in particular, have two lenses that direct the shaped laser beam to the amplification device.

[0035] The optical element, in particular the two lenses, can preferably be arranged on the same optical axis as the beam-shaping device. The function of the optical element is preferably to image the shaped laser beam in the amplification device, in particular to image the shaped laser beam in its entirety, completely onto the amplification device. The 4f structure images the beam-shaping element of the beam-shaping device as an object onto the amplification device. In an implementation with two lenses, the beam-shaping element is typically located in the first focal plane of the first lens and the amplification device in the second focal plane of the second lens. Alternatively, an implementation of the 4f structure with one lens is also possible. In this case, a distance of two focal lengths in front of the lens and two focal planes after the lens is used to image the beam-shaping element.

[0036] In a favorable embodiment, an output coupling unit can be provided with a beam splitter, which can be designed, in particular, as a polarizer. In particular, the beam splitter can be designed as a thin-film polarizer. The amplified and / or shaped laser beam can thus be returned in the beam path antiparallel to the laser beam incident on the amplification device and advantageously output by the beam splitter of the output coupling unit for further use, for example, in material processing.

[0037] The beam splitter can be designed as a beam splitter cube or a beam splitter plate. The beam splitter is an optical component used to split incident light, in particular the laser beam, into two separate beams at a specific ratio. The beam splitter is preferably designed as a polarizing beam splitter, which can split light into a reflected s-polarized beam and a transmitted p-polarized beam.

[0038] Furthermore, polarizing beam splitters are preferably used to split unpolarized light in a 50 / 50 ratio or to split the polarization states, e.g., in an optical isolator. The beam splitter can also be designed as a non-polarizing beam splitter. The non-polarizing beam splitter can split light in a specific R / T ratio (reflected portion to transmitted portion) while maintaining the original polarization state. For a 50 / 50 non-polarized beam splitter, the beam can be split into a transmitted and a reflected beam at the appropriate beam splitter ratio, while maintaining the P and S polarization states.

[0039] In a favorable embodiment, the laser-active amplification device, in particular the laser-active wedge disk, can have at least one coating on the first side, in particular a dichroic coating with properties of a long-pass filter. The dichroic coating can advantageously be a multi-layer, dielectric coating system, for example silicon oxide glass, such as SiO2, or tantalum oxide Ta2O5 or the like. The effect is that a long-pass filter behavior can be present at the wavelength of the laser radiation to be amplified and / or the pump laser radiation. In operation, this means that a long-pass filter can be realized at the point of the relevant wavelength and the angle of incidence (angular range), whereby behavior outside the angle of incidence is not relevant. The properties of the wedge disk are described in DE 10 2016 108 474 A1 and the publication: Lorbeer, R. et al., Monolithic thin-disk laser and amplifier concept, Optica, Opt. Soc. Am., Volume 7, No. 10, pages 1409-1414, October 2020. The contents of both publications concerning the properties and functionality of the wedge disk are expressly included in the description.

[0040] The dichroic coating is applied to the surface of the amplification device, in particular the wedge disk. The dichroic coating has the properties of a long-pass filter. Only the wavelength range of the laser beam is of interest here. The dichroic coating allows both the shaped laser beam and the pump beam to penetrate the amplification device, in particular the wedge disk. In a favorable embodiment, the laser-active amplification device, in particular the laser-active wedge disk, can have a reflective, in particular highly reflective, coating on the second side. This allows multiple reflections of the laser beam to occur in the amplification device. This enables multiple passes of the amplified shaped laser beam, and multiple amplification passes of the shaped laser beam can occur.It is advantageous if the wedge disk is cooled when operated in reflective mode. The second side can serve as a heat sink. The heat dissipation of the reflective coating is selective for the angle of incidence and wavelength and can be conveniently adjusted.

[0041] In a favorable embodiment, the laser-active amplification device, in particular the laser-active wedge disk, can be inclined at an angle to the incident laser beam, in particular at an angle to a plane of symmetry of the amplification device. This advantageously eliminates the need for a polarization element in the beam path.

[0042] In a favorable embodiment, a concave mirror can be arranged at a distance from the plane of symmetry of the amplification device and can be designed to reflect the amplified laser beam emitted by the laser-active amplification device back to the laser-active amplification device.

[0043] The concave mirror can be arranged so that the shaped laser beam is imaged back onto the amplification device. The concave mirror can advantageously have a curvature, for example, whereby the sphere's center of curvature can lie behind the first side of the wedge disk and thus within the wedge disk. This allows the laser beam to have the same size as before reflection from the concave mirror, even in the case of very strong aberrations on the wedge disk. In a favorable embodiment, a wave plate can be arranged in front of the concave mirror in the beam path of the incident and emerging laser beam. This wave plate, as a retardation plate for the laser beam, can be designed, for example, as a quarter-wave plate.

[0044] In a favorable embodiment, a planar mirror can be arranged at a distance from the plane of symmetry of the amplification device in the immediate vicinity of the amplification device and can be designed to reflect the amplified shaped laser beam emitted by the amplification device back to the amplification device in a slightly offset manner.

[0045] In a favorable embodiment, the planar mirror can have a dielectric coating, in particular a multilayer dielectric coating with the properties of a long-pass filter. The same coatings as those of the laser-active amplification device, in particular the laser-active wedge disk, can be used. At steep angles of incidence, the shaped laser beam can be reflected; otherwise, transmission can occur. This is advantageous because the shaped laser beam travels a shorter distance, preventing the shaped laser beams from diverging.

[0046] In a favorable embodiment, the laser-active amplification device, in particular the laser-active wedge disk, can have a substrate and / or a coating for heat dissipation on the first side. The substrate and / or the coating can serve as heat dissipation. The coating can also be applied to a separate window arranged in front of the wedge disk. The window can, in particular, be wedge-shaped. This allows for good contact pressure between the wedge disk and the window. This has the advantage of ensuring good heat transfer.

[0047] In a favorable embodiment, the laser-active amplification device can comprise a material with good thermal conductivity, in particular can be made from the material with good thermal conductivity. A material with good thermal conductivity is understood to have a thermal conductivity greater than copper, namely 400 W / mK. In particular, the material with good thermal conductivity can be diamond and / or aluminum oxide, for example sapphire, and / or cubic boron nitride. The material used must have good transmissivity for the wavelength of the laser beam. One advantage of the material with good thermal conductivity, in particular diamond, is the heat transport mechanism: In contrast to metals such as copper, which transports heat via conduction electrons, in diamond the heat is transported away via lattice vibrations. The thermal conductivity of diamond is over 1800 W / mK. Thus, diamond exhibits only very slight thermal expansion when heated.

[0048] In a favorable embodiment, the laser-active amplification device can be arranged on a heat sink. In particular, the wedge disk can be arranged on a heat sink. This allows the incident laser power to be dissipated.

[0049] According to a further aspect of the invention, a method for generating at least one amplified and / or shaped laser beam using a laser system is proposed, wherein a laser beam shaped by a beam-shaping device, in particular a laser beam shaped by a spatial light modulator and / or a diffractive optical element, is amplified. The amplified and / or shaped laser beam is diagnosed by a measuring device in order to control and / or regulate the beam-shaping device with a feedback loop.

[0050] Advantageously, aberrations caused by the active medium of the laser-active amplification device can be compensated and feedback for the beam shaping can be provided.

[0051] In a favorable embodiment, a laser-active amplification device, in particular a laser-active wedge disk, can be used for amplification.

[0052] In a favorable embodiment, the measuring device used to diagnose the amplified and / or shaped laser beam can be a camera unit for controlling and / or regulating the beam-shaping device. In this way, a particularly favorably shaped and / or amplified laser beam can be generated in a feedback loop. The shaped and / or amplified laser beam can thus be advantageously used, for example, for material processing.

[0053] The method for generating a shaped and amplified laser beam can use a spatial light modulator, in particular a so-called SLM element, and / or at least one diffractive optical element (DOE) for shaping the laser beam, with the shaped laser beam subsequently being amplified. The amplification can be carried out using a laser-active amplification device, which in particular has a laser-active wedge disk with at least one dichroic coating on a first side facing the shaped laser beam to be amplified. One advantage of the method is the effective generation of a shaped and amplified laser beam, in particular a pulsed shaped laser beam with reduced overall losses. Furthermore, the thermal load on the beam-shaping device can be reduced.

[0054] According to a further aspect of the invention, a use of the laser system according to the invention for material processing is proposed. The laser system can preferably be used for geometric material processing, such as material removal, joining, and / or incorporating patterns into a workpiece in a single operation. In this case, a pattern is introduced in a single operation using the shaped, amplified laser beam. For example, an arrangement of nxm holes can be drilled on a surface using the shaped laser beam, where n and m each denote the number of laser beams of the shaped laser beam. By using the laser beam with a short pulse length, the lateral projection around the drilled hole can be reduced.

[0055] According to a further aspect of the invention, an optical system is proposed, in particular for generating at least one amplified and / or shaped laser beam. The optical system comprises at least one optical element, at least one laser-active amplification device, in particular a laser-active wedge disk, with a first side intended to face a shaped laser beam and a second side opposite said first side. At least one beam-shaping device for generating a laser beam shaped with respect to an intensity distribution and / or a phase of the laser beam is arranged on the input side in front of the at least one optical element. The optical element is designed to direct the shaped laser beam onto the laser-active amplification device as intended.The laser-active amplification device is designed to amplify the shaped laser beam as intended by means of a coupled pump beam and to emit it as an amplified shaped laser beam.

[0056] A measuring device is provided, in particular a camera unit, with which the amplified and / or shaped laser beam is diagnosed in order to control and / or regulate the beam shaping device with a feedback loop.

[0057] Advantageously, the optical system can be coupled to a laser and a pump beam source in order to shape and amplify the laser beam of the laser.

[0058] The proposed optical system comprises the beam-shaping device, optical element, amplification device, and output coupling unit of the previously described laser system. The laser beam can be generated externally and imaged onto the optical system, in particular onto the beam-shaping device, using optical elements. The laser-active material of the amplification device can be activated by an externally generated pump beam, which is imaged onto the amplification device and excites the laser-active material.

[0059] drawing

[0060] Further advantages will become apparent from the following description of the drawings. The figures illustrate exemplary embodiments of the invention. The figures, the description, and the claims contain numerous features in combination. Those skilled in the art will conveniently consider the features individually and combine them into useful further combinations. The figures show, by way of example:

[0061] Fig. 1 shows an embodiment of a laser system;

[0062] Fig. 2 shows the laser system in Figure 1 with a camera device;

[0063] Fig. 3 is a schematic representation of a wedge disk;

[0064] Fig. 4 is a schematic representation of the wedge disk of Figure 3 in isometric view;

[0065] Fig. 5 is a schematic representation of a beam path in the plane AA of Figure 1;

[0066] Fig. 6 is a schematic representation of a beam path in the

[0067] Level AA of Figure 1 ;

[0068] Fig. 7 is a schematic representation of a beam path in the

[0069] Plane AA of Figure 1 for another embodiment of the laser system;

[0070] Fig. 8 is a schematic representation of a beam path in the plane AA of Figure 1 for a further embodiment of the laser system;

[0071] Fig. 9 is a schematic representation of a material processing.

[0072] Embodiments of the invention

[0073] In the figures, components of the same type or function similarly are designated by the same reference numerals. The figures are merely examples and are not to be construed as limiting.

[0074] Before the invention is described in detail, it should be pointed out that it is not limited to the specific components of the device or the specific method steps, since these components and methods can vary. The terms used herein are intended solely to describe particular embodiments and are not used in a limiting sense. Furthermore, when the singular or indefinite article is used in the description or claims, this also refers to the plural of these elements, unless the overall context clearly indicates otherwise. Directional terminology used below with terms such as "left", "right", "top", "bottom", "before", "behind", "after" and the like is intended solely to improve understanding of the figures and is in no way intended to limit the generality.The components and elements shown, their design and use may vary according to the considerations of a specialist and may be adapted to the respective applications.

[0075] The laser beam in the following embodiments can be a single laser beam or comprise a plurality of separate laser beams, which in particular are inclined relative to one another. This applies at least to a shaped laser beam incident on the amplification device. The output laser beam can comprise both parallel and mutually inclined laser beams.

[0076] Figure 1 shows a schematic representation of a laser system 100, in particular a laser amplification system 100. Figure 2 shows the laser system 100 with an exemplary measuring device 90.

[0077] The laser system 100 includes a laser radiation source 10. The laser radiation source 10 generates a laser beam 12. The laser radiation source 10 can generate a pulsed laser beam 12. The pulsed laser beam 12 typically has a wavelength between 700 nm and 3000 nm. The pulsed laser 10 typically has a pulse length of between 0.1 ps and several tens of ps. These are typical laser beams used for material processing. The laser beam 12 has a Gaussian intensity profile.

[0078] The laser system 100 has a beam-shaping device 14 arranged downstream of the laser radiation source 10. The beam-shaping device 14 is an optical element configured to form a shaped laser beam 16 from the generated laser beam 12. The beam-shaping device 14 is, for example, a spatial light modulator. The beam-shaping device 14 can also be a diffractive optical element (DOE). The beam-shaping device 14 can modulate the phase and / or intensity of the generated laser beam 12. The laser beam 16 shaped by the modulation then has a modified intensity profile.

[0079] The shaped laser beam 16 is, for example, a laser beam arrangement 17 split into several separate laser beams 16a, 16b, ... by the beam shaping device 14. The laser beam arrangement 17 has nxm individual laser beams 16a, 16b, ... in a matrix-like arrangement, where n and m are integers greater than zero. For example, the laser beam arrangement 17 can have twenty individual laser beams 16a, 16b, .... This is shown in the figure in an inset as an enlargement. The totality of the individual laser beams 16a, 16b, ... forms the laser beam arrangement 17. By means of the laser beam arrangement 17 with twenty individual laser beams, for example, twenty holes can be drilled simultaneously in a workpiece (not shown).

[0080] The shaped laser beam 16 may also have any pattern of individual laser beams and is then referred to as laser beam arrangement 17.

[0081] The individual laser beams 16a, 16b, ... in the shaped laser beam 16 can be spaced apart from one another in the laser beam arrangement 17 and / or the shaped laser beam 16. The individual laser beams 16a, 16b, ... in the shaped laser beam 16 can also be spaced apart in the laser beam arrangement 17 and / or the shaped laser beam 16. For example, by spaced-apart laser beams 16a, 16b, ... in the shaped laser beam 16, a continuous line can be imprinted on a workpiece using the shaped laser beam.

[0082] Downstream of the beam-shaping device 14 is an optical element 20, which directs, in particular images, the shaped laser beam 16 onto an amplification device 22. The optical element 20 typically has two lenses 20a, 20b and is preferably designed as a relay optic.

[0083] The laser radiation source 10, the beam-shaping device 12, and the optical element 20 are arranged on an optical axis 5. The laser beam 12 and the shaped laser beam 16 thus propagate along the optical axis 5.

[0084] The shaped laser beam 16 is guided to the amplification device 22. A beam splitter 24 can be provided in the beam path of the laser beam 16. The beam splitter 24 can be designed as a polarizer. This can be, for example, a thin-film polarizer. The shaped laser beam 16 is deflected in the polarizer, passes through a wave plate 26, in particular a quarter-wave plate or quarter-wave plate 26, and impinges on the amplification device 22 along an optical axis 5a.

[0085] Laser radiation source 10, beam shaping device 14, optical unit 20 with the two lenses 20a, 20b, and beam splitter 24 are arranged along the first optical axis 5. Beam splitter 24, waveplate 26, and amplification device 22 are arranged along the second optical axis 5a, in which the amplified and shaped laser beam 36 is also coupled out. Amplification device 22 is also referred to as laser-active amplification device 22. Amplification device 22 comprises a laser-active material, preferably in the form of a laser-active solid. The laser-active solid can be in the form of a crystal or glass. For example, the crystal is made of yttrium aluminum garnet or sapphire or a semiconductor. The laser-active amplification device 22 can comprise a laser-active solid, wherein the laser-active solid is doped with the laser-active material.The laser-active solid can comprise, as laser-active material, a chemical element from the group of lanthanides, in particular yttrium, neodymium and / or erbium and / or a transition metal, for example titanium and / or zirconium.

[0086] The laser-active material can be excited by means of a laser beam referred to as pump beam 34.

[0087] The amplification device 22 in the embodiment shown in Figure 1 has at least one wedge disk 22a. The wedge disk 22a has a laser-active material 23. The wedge disk 22a has, on a first side 28, a first boundary surface with a coating 28a, which faces the incident laser beam 16. The wedge disk 22a can, for example, have thicknesses of a few 0.1 mm up to 2 mm and a diameter of 4 mm up to 30 mm. Furthermore, the wedge disk 22a has, on a second side 30, a second boundary surface with a second reflective coating 30a, which faces away from the laser beam 16. The reflective coating 30a is preferably a highly reflective coating 30a. The first coating 28a and the second coating 30a are arranged substantially opposite one another.The first and second sides 28, 30 of the wedge disk 22a are not arranged parallel to one another, but rather enclose a wedge angle 39 (Figure 3). The laser-active material 23 is arranged between the first side 28 and the second side 30. The wedge disk 22a is typically arranged on a carrier element 32. Typically, the carrier element 32 represents a heat sink. The carrier element 32 comprises, for example, diamond. A dichroic coating 28a is applied to the first side 28. The dichroic coating 28a is, in particular, a dielectric layer. The dichroic coating 28a has high-refractive index and low-refractive index layers, in particular metal oxide layers. The dichroic coating 28a can advantageously be a multilayer dielectric layer system, for example silicon oxide glass, such as SiO2, or tantalum oxide Ta2O5 or the like.The dichroic coating 28a has the properties of a long-pass filter near the pump and laser wavelength.

[0088] By means of the reflective layer 30a, the laser beam 16 is reflected at the second side 30 and leaves the wedge disk 22a through the first side 28. This makes it possible to realize several amplification passes for the shaped laser beam 16.

[0089] Furthermore, a pump beam unit 35 is provided that generates a pump beam 34. The pump beam 34 is typically a CW laser beam 34. The pump beam 34 is directed onto the first side 28 of the wedge disk 22a and is configured to excite the laser-active material 23 of the wedge disk 22a and supply it with energy to drive the amplification process. Furthermore, an optical device (not shown) can be provided that directs the pump beam 34 onto the amplification device 22.

[0090] The amplified, shaped laser beam is designated by reference numeral 36. The amplified, shaped laser beam 36 passes through the quarter-wave plate 26 and the polarizer 24 and can be coupled out for use. The amplified, shaped laser beam 36 can advantageously also comprise the laser beam arrangement 17. The beam-shaping device 14 is also configured, in addition to beam shaping, to compensate for the aberrations typically generated by the wedge disk 22a through suitable prior beam shaping. The laser beam 36 thus has good beam quality. The focusability of lasers according to ISO standard 11146-1 - 2021 -11 is determined by the diffraction index M 2 This indicates the divergence angle of a laser beam relative to the divergence of an ideal Gaussian beam with the same diameter at the beam waist. Good beam quality indicates a small M 2, advantageously less than 2. This means that the laser beam 36, in particular any individual laser beams of the laser beam 36, are not expanded and / or broadened.

[0091] The polarizer 24, the waveplate 26, and the wedge disk 22a are arranged on the optical axis 5a. The laser beam 36 is coupled out along the optical axis 5a.

[0092] The beam splitter 24, in particular a polarizer, represents an output unit 25 configured to output the amplified, shaped laser beam 36. The output unit 25 may also comprise other optical elements not shown.

[0093] The beam shaping device 14, the optical element 20, the amplifying device 22 and the decoupling unit 25 form an optical system 200 into which the laser beam 12 and the pump beam 34 can be guided.

[0094] Figure 3 shows the wedge disk 22a in a schematic sectional drawing. The wedge disk 22a has a substantially flat wedge disk body. The wedge disk body can be viewed in a coordinate system shown in the figure. The wedge disk body has a substantially uniform thickness 40 in a longitudinal direction along the z-axis, wherein the thickness 40 varies in a transverse direction along the y-axis. Typical thicknesses 40 for the wedge disk 22a are a few tens of microns to a few hundred microns. Reference numeral 37 designates a normal to the first side 28 of the wedge disk 22a, which lies in the x-axis of the coordinate system. A wedge angle 39 designates the angle at which the first side 28 and the second side 30 are inclined relative to one another. The wedge angle 39 can be, for example, 1 degree.

[0095] A portion of the shaped and amplified laser beam 36 is guided into the measuring device 90 shown in Figure 2 via a beam splitter 94 and diagnosed by the measuring device 90. The measuring device 90 can be, for example, a camera unit. An evaluation unit 92 is connected to the measuring device 90, which feeds back to the beam-shaping device 14. The evaluation unit 92 allows the beam-shaping device 14 to be controlled and / or regulated using a feedback loop. This allows both aberration errors, which arise in particular from the active material of the wedge disk 22a, to be corrected and feedback for the beam shaping to be provided.

[0096] Figure 3 shows the wedge disk 22a and its arrangement relative to the laser beam 16 and the pump laser beam 34. An angle of incidence Qp of the pump laser beam 34 to the normal 37 of the wedge disk 22a is typically greater than an angle of incidence QL of the shaped laser beam 16 to be amplified. The pump beam 34 is indicated by large dots, and the shaped and / or amplified laser beams 16, 18, 36 are indicated by small dots.

[0097] The first side 28 has the dichroic coating 28a, which allows the pump laser beam 34 and the shaped laser beam 16 to penetrate the surface of the wedge disk 22a. The dichroic coating 28a is advantageously constructed as a multilayer coating and has several layers. This creates a dielectric layer system with the properties of a long-pass filter on the first side 28.

[0098] The figure shows reflections on the second side 30 of the wedge disk 22a. The wedge angle 39 reduces the new angle of incidence on the dichroic coating 28a during reflection. This allows the reflection and transmission behavior of multilayer dielectric coating systems to shift toward longer wavelengths. This effect can be taken into account when designing the wedge disk 22a for the laser wavelength used.

[0099] If the dichroic coating 28a is designed with long-pass behavior near the laser wavelength, this means that beams 16 and 34 are essentially completely reflected. Thus, the laser beam 16 and the pump beam 34 are trapped in the wedge disk 22a for multiple reflections, enabling multiple amplification passes.

[0100] The respective angles of incidence QL and Qp decrease further and further with increasing amplification passes. This continues until the angles of incidence QL and Qp are almost perpendicular to the first side 28 and / or the second side 30 of the wedge disk 22a. During the subsequent amplification pass of the laser beam 16, the angles of incidence QL, QP increase again until the laser beam 16 and the pump beam 34 pass through the dichroic coating 28a and exit from the first side 28 of the wedge disk 22a. Figure 4 shows the wedge disk 22a in an isometric representation in an oblique plan view of the first side 28 of the wedge disk 22a. The view is from the perspective of and along the pump beam 34. A plane of symmetry 42 is arranged perpendicular to the first side 28 of the wedge disk 22a and thus perpendicular to a wedge surface 44.The symmetry plane 42 runs along the y-axis along the greatest change in the thickness 40 of the wedge disk 22a. The z-axis extends along the direction of constant thickness 40. The symmetry plane 42 divides the wedge disk 22a into an upper half and a lower half.

[0101] Figure 4 shows a side of greatest thickness 40a and a side of smallest thickness 40b, which lie in the plane of symmetry 42. Typically, a greatest thickness 40a can have a value of up to 2 mm and a smallest thickness 40b can have a value of a few 0.1 mm.

[0102] The circular area represents the laser-active part of the wedge disk 22a.

[0103] The following describes how a laser beam 16 strikes the first side 28 of the laser-active wedge disk 22a and is reflected. If the unamplified but shaped laser beam 16 is irradiated at an angle ß relative to the plane of symmetry 42 at the angle of incidence QL, it penetrates the first side 28, is reflected on the second side 30 by the reflective layer 30a and leaves the wedge disk 22a, in particular after multiple reflections in the wedge disk 22a, again through the first side 28 as a reflected beam 18 offset by the angle ß and mirrored at the plane of symmetry 42. The entirety of the laser beams 18 leaving the wedge disk 22a, when coupled out of the laser system 100, are referred to as laser beams 36. The laser beams 36 are shaped and amplified laser beams; see also the description of Figure 1. Thus, the reference number 18 denotes a simply amplified and shaped laser beam 18.Thus, the reference number 18a designates a singly amplified and shaped laser beam 18a after reflection, in particular multiple reflection, at the rear side 30.

[0104] Figure 5 shows a schematic representation of the laser system 100 in a top view from the direction of the laser radiation source 10, seen along plane AA of Figure 1. The illustration shows a double passage of the laser beam 16 through the wedge disk 22a, thus providing double amplification. In the figure, the wedge disk 22a is tilted upward at an angle to the plane of symmetry 42 of the amplification device 22 (Figure 4). The tilt of the disk can advantageously lead to at least partial rotation about the y-axis (Figure 3).

[0105] It can be seen that the wedge disk 22a is arranged on a substrate 21 or carrier element 32. The substrate 21 is preferably a heat sink. The substrate 21 can also be actively cooled.

[0106] The shaped laser beam 16 strikes the polarizer 24, for example, at an angle of 45° or the Brewster angle, and is directed onto the wedge disk 22a. After amplification, which can be in the range of approximately 20, the laser beam 18a passes through a wave plate 50, in particular a quarter-wave plate, and is reflected by a concave mirror 52 and imaged onto the wedge disk 22a. The shaped and twice-amplified laser beam 36 is output. The concave mirror 52 has a curvature, with the sphere center of the curvature located behind the first side 28 of the wedge disk 22a and thus within the wedge disk 22a. As a result, the laser beam 18, 18a can have the same size as before reflection at the concave mirror 52, even in the case of very strong aberrations on the wedge disk 22a. Furthermore, aberrations that are negated in point reflections, such as tilt or coma, can also be suppressed.Figure 6 shows a schematic representation of the laser system 100 for a shaped laser beam 16 with quadruple amplification passage from the viewpoint of the laser source 10 (plane AA in Figure 1). In addition to the components shown in Figures 1 and 5, the laser system 100 has a plane mirror 54 which is arranged in the immediate vicinity of the wedge disk 22a. The wedge disk 22a is inclined downward in the figure. The wedge disk 22a is inclined in particular at an angle to the incident shaped laser beam 16. The wedge disk 22a is arranged at an angle to the plane of symmetry 42 of the amplification device 22 (Figure 4). The plane mirror 54 enables the laser beam 18a incident on the wedge disk 22a to be reflected with a slight offset. The offset can be a fraction of the laser beam diameter.The laser beam 18b exits at an unspecified angle and can be projected back onto the wedge disk 22a by the concave mirror 52. This allows additional amplification passes to be realized without significant offset.

[0107] Figure 7 shows the laser system 100 in a schematic representation from the viewpoint of the laser source 10 (plane AA in Figure 1). In addition to the components shown in Figures 1 and 5, a mirror 56 with a dichroic coating 58 is arranged in close proximity to the wedge disk 22a. The dichroic coating 58 exhibits the behavior of a long pass. The dichroic coating 58 is applied to the side of the mirror 56 which faces the wedge disk 22a. The reflection of the laser beam 18a by the dichroic coating 58 makes it possible to minimize the offset of the laser beam 18, 18a. This has the advantage that the laser beam 18, 18a can be transmitted by the mirror 56 at a large angle of incidence. Furthermore, the laser beam 18, 18a can be reflected back onto the wedge disc 22a in a slightly tilted manner at an almost vertical angle of incidence.This allows a beam geometry similar to that achieved with a quadruple pass, with the mirror 56 being positioned even closer to the wedge disk 22a than in the embodiment shown in Figure 6. This results in the beam offset being even further reduced. The pump beam 34 can be transmitted by the dichroic-coated mirror 56 at a given angle of incidence.

[0108] Figure 8 shows the laser system 100 in a schematic representation from the viewpoint of the laser source 10 (plane AA of Figure 1). In addition to the components of the laser system 100 shown in Figures 1 and 5, a wedge-shaped substrate 60 is shown. The wedge-shaped substrate 60 is made of a material with good thermal conductivity. The material with good thermal conductivity has a thermal conductivity in the range of 1800 W / mK, in particular greater than 1800 W / mK. The wedge-shaped substrate 60 is preferably made at least partially of diamond and / or an aluminum oxide, preferably sapphire. The wedge-shaped substrate 60 has a side facing the laser beam 16 with a dichroic coating 62. The dichroic coating 62 is a dielectric coating and exhibits the behavior of a long-pass filter at the laser wavelength and / or at the pump wavelength.

[0109] The angle of inclination of the wedge-shaped substrate 60 is designed such that the wedge-shaped substrate 60 can be pressed directly against the first side 28 of the wedge disk 22a. The direct contact between the wedge-shaped substrate 60 and the first side 28 of the wedge disk 22a creates a heat sink.

[0110] In addition, an increased angle of inclination can also be used to combine the function of the mirror 56 with dichroic coating 58 (Figure 7) with the heat-conducting function of the wedge-shaped substrate 60.

[0111] Figure 9 shows a schematic representation of the use of the laser system 100 with a laser beam arrangement 17 (Figure 1) with decoupled laser beams 36 for machining a workpiece 72. From the laser beam arrangement 17, a laser beam 36 with corresponding individual laser beams is directed onto a surface 74 of a workpiece 72 to be machined. The surface 74 can be machined in a single operation. Machining is to be understood here as: drilling holes, in particular an arrangement of holes, drawing lines, cutting 3D structures into the surface 74. Other machining processes not described in detail here are also encompassed by the use, as long as they use a laser beam 36 that is composed of several partial laser beams.The simultaneous processing of a workpiece 72 with the laser beam arrangement 17 is time-efficient and enables, for example, greater processing accuracy since the work steps do not have to be carried out one after the other.

[0112] Reference symbol

[0113] 5 optical axis

[0114] 5a optical axis

[0115] 10 Laser radiation source

[0116] 12 laser beam

[0117] 14 Beam shaping device

[0118] 16 shaped laser beam

[0119] 16a, 16b shaped laser beam

[0120] 17 Laser beam arrangement

[0121] 18 shaped laser beam

[0122] 18a amplified laser beam

[0123] 20 optical element

[0124] 20a, 20b lenses

[0125] 21 Substrat

[0126] 22 amplification device

[0127] 22a wedge disc

[0128] 23 laser-active material

[0129] 24 beam splitters

[0130] 25 decoupling unit

[0131] 26 Wave plate

[0132] 28 first page

[0133] 28a dichroic coating

[0134] 30 second page

[0135] 30a reflective coating

[0136] 32 support element

[0137] 34 pump jet

[0138] 35 Pump beam unit

[0139] 36 shaped and amplified laser beam,

[0140] 36a, 36b Partial beams of the shaped and amplified laser beam

[0141] 37 Normal

[0142] 39 wedge angle

[0143] 40 Thickness of the wedge disc

[0144] 40a smallest thickness 40b largest thickness

[0145] 42 plane of symmetry

[0146] 44 Wedge surface

[0147] 46 circular area

[0148] 50 wave plate

[0149] 52 concave mirror

[0150] 54 planar mirrors

[0151] 56 planar mirrors

[0152] 58 dichroic coating

[0153] 60 wedge-shaped substrate

[0154] 62 dichroic coating

[0155] 64 heat sink

[0156] 72 Workpiece

[0157] 74 Surface

[0158] 90 measuring device

[0159] 92 Evaluation unit

[0160] 94 beam splitters

[0161] 100 laser system

[0162] 200 optical system ß angle to the symmetry plane of the amplifying device

[0163] QL Angle of incidence of the laser beam

[0164] Qp angle of incidence of the pump beam x,y,z axes of a coordinate system

Claims

Claims 1 . Laser system (100), in particular laser amplification system for generating at least one amplified and / or shaped laser beam (16, 18, 36), comprising: - at least one laser radiation source (10) for generating a laser beam (12), - at least one optical element (20), - at least one laser-active amplification device (22), in particular a laser-active wedge disk (22a), with a first side (28) facing a shaped laser beam (16, 18) and a second side (30) opposite said first side, wherein at least one beam-shaping device (14) for generating a laser beam (16) shaped with respect to an intensity distribution and / or a phase of the laser beam (12) is arranged between the laser radiation source (10) and the at least one optical element (20), wherein the optical element (20) is designed to direct the shaped laser beam (16, 18) onto the laser-active amplification device (22), wherein the laser-active amplification device (22) is designed to amplify the shaped laser beam (16, 18) by means of a coupled-in pump beam (34) and to emit it as an amplified shaped laser beam (18, 36),wherein the shaped and / or amplified laser beam (36) is diagnosed by means of a measuring device (38) in order to control and / or regulate the beam shaping device (14) with a feedback loop.

2. Laser system according to claim 1, characterized in that the measuring device (14) has a camera unit.

3. Laser system according to claim 1 or 2, characterized in that the beam shaping device (14) has at least one spatial modulator for light and / or at least one diffractive optical element.

4. Laser system according to one of the preceding claims, characterized in that the optical element (20) is a relay optic, in particular a relay optic with 4f imaging realizing optical element (20) by means of two lenses.

5. Laser system according to one of the preceding claims, characterized in that there is an output coupling unit (25) with a beam splitter (24), which is designed in particular as a polarizer (24), in particular as a thin-film polarizer.

6. Laser system according to one of the preceding claims, characterized in that the laser-active amplification device (22) has on the first side (28) at least one coating (28a), in particular a dichroic coating (28a) with properties of a long-pass filter.

7. Laser system according to one of the preceding claims, characterized in that the laser-active amplification device (22) has a reflective coating (30a), in particular a highly reflective coating (30a), on the second side (30).

8. Laser system according to one of the preceding claims, characterized in that the laser-active amplification device (22) is inclined at an angle to the incident laser beam (16, 18), in particular has an angle (ß) to a plane of symmetry (42) of the amplification device (22).

9. Laser system according to one of the preceding claims, characterized in that a concave mirror (52) is arranged at a distance from a plane of symmetry (42) of the amplification device (22) and is designed to reflect the amplified, shaped laser beam (18a) emitted by the amplification device (22) back to the amplification device (22), wherein the concave mirror (52) is arranged such that the laser beam (18a) is again imaged onto the amplification device (22).

10. Laser system according to claim 9, characterized in that a wave plate (50) is arranged in the beam path of the incident laser beam (18) and emerging laser beam (18a) in front of the concave mirror (52).

11. Laser system according to claim 9 or 10, characterized in that a planar mirror (54, 56) is arranged at a distance from the plane of symmetry (42) of the amplification device (22) in the immediate vicinity of the amplification device (22) and is designed to reflect the amplified laser beam (18a) emitted by the amplification device (22) back to the amplification device (22) in a slightly offset manner, in particular that the planar mirror (54, 56) has a dielectric coating (58), in particular a multi-layer dielectric coating (58) with properties of a long-pass filter.

12. Laser system according to one of the preceding claims, characterized in that the laser-active amplification device (22) has a substrate (60) and / or a coating (62) for heat dissipation on the first side (28).

13. Laser system according to one of the preceding claims, characterized in that the laser-active amplification device (22) comprises a material with good thermal conductivity, in particular is made from the material with good thermal conductivity, wherein the material with good thermal conductivity is at least one from the group of diamond, aluminum oxide, in particular sapphire, cubic boron nitride.

14. Laser system according to one of the preceding claims, characterized in that the laser-active amplification device (22) is arranged on a heat sink (64).

15. A method for generating at least one amplified and / or shaped laser beam (16, 18, 36) with a laser system (100) according to one of the preceding claims, wherein a laser beam (16) shaped by means of a beam-shaping device (14), in particular a laser beam (16) shaped by means of a spatial modulator for light and / or a diffractive optical element, is amplified, and wherein the amplified and / or shaped laser beam (36) is diagnosed by means of a measuring device (38), in particular a camera unit, in order to control and / or regulate the beam-shaping device (14) with a feedback loop.

16. The method according to claim 15, wherein a laser-active amplification device (22), in particular a laser-active wedge disk (22a), is used for amplification.

17. The method according to claim 15 or 16, wherein the measuring device comprises a camera unit.

18. Use of a laser system (100) according to one of claims 1 to 14, for material processing of workpieces (72).

19. Optical system (200), in particular for generating at least one amplified and / or shaped laser beam (16, 18, 36), comprising: - at least one optical element (20), - at least one laser-active amplification device (22), in particular a laser-active wedge disk (22a), with a first side (28) intended to face a shaped laser beam (16, 18) and a second side (30) opposite said first side, wherein at least one beam-shaping device (14) for generating a laser beam (16) shaped with respect to an intensity distribution and / or a phase of the laser beam (40) is arranged on the input side in front of the at least one optical element (20), wherein the optical element (20) is designed to direct the shaped laser beam (16) onto the laser-active amplification device (22) as intended, wherein the laser-active amplification device (22) is designed to amplify the shaped laser beam (16, 18) as intended by means of a coupled-in pump beam (34) and to emit it as an amplified shaped laser beam (18, 36), wherein a measuring device (38) is provided,with which the amplified and / or shaped laser beam (36) is diagnosed in order to control and / or regulate the beam shaping device (14) with a feedback loop.