Spin isolated electromagnetic beam and method of producing

Abstract

A spin-isolated monochromatic electromagnetic beam is disclosed herein along with a method of producing a spin-isolated monochromatic electromagnetic beam.

Description

SPIN ISOLATED ELECTROMAGNETIC BEAM AND METHOD OF PRODUCINGFIELD

[0001] Embodiments of the present disclosure generally relate to an electromagnetic energy beam comprising spin-isolated particles. More specifically to an electromagnetic energy beam comprising spin-isolated photons and a process of producing the same.BACKGROUND

[0002] Electromagnetic (EM) waves are formed from a plurality of individual particles. In some cases, the EM waves are caused by electrons. These EM waves are detected as photons. EM waves have increasing energy based upon the inverse of the bandwidth by the relationship (c=Av), wherein c is the speed of light, A is the wavelength, and v is the frequency. This well-known relationship results in Planck’s relation, £ = hv wherein £ is the energy, h is Planck’s constant, and v is the frequency.

[0003] EM waves are utilized in a number of processes critical to current technologies wherein EM waves are directed at a substrate to interact with the substrate or a reactant thereon to result in a physical change. Examples include lithography, wherein electromagnetic energy is directed at a photoresist to affect a change in the photoresist, e.g., curing, to impart a pattern on a semiconductor substrate used in further processing to produce a semiconductor. However, due to the random nature of the spin orientation of EM wave particles, to overcome the well-known uncertainty principal when performing specific tasks including relativity high energy and varied exposure or interactions to ensure an EM wave having the precise energy level necessary to affect an intended change strikes a target located at a point in space. The inventor has observed that using EM waves in a precise way, e.g., in computer chip lithography, requires EM sources having relatively high energy levels, e.g., extreme ultraviolet (EUV) light to affect the necessary changes at the spatial resolution required in semiconductors. Furthermore, it has been observed that this excess energy has unintended effects which can be detrimental to the end product. There is a need to improve the spatial resolution and control over the nature of beams of EM waves utilized in various processes.SUMMARY

[0004] Methods and apparatus for spin isolated electromagnetic energy beams are provided herein. In some embodiments, a spin-isolated monochromatic electromagnetic energy beam comprises, consists essentially of, or consists of a plurality of spin-isolated photons, wherein the spin-isolated photons are only observable within a plurality of first discrete ranges along a path of the monochromatic electromagnetic beam, each of the first discrete ranges centered at a corresponding distance from a source of the monochromatic electromagnetic beam, wherein essentially no photons are observable within a plurality of second discrete ranges located in-between each of the first discrete ranges.

[0005] In embodiments, a method of producing a spin isolated monochromatic electromagnetic energy beam according to embodiments disclosed herein comprises directing a monochromatic electromagnetic beam having a wavelength (A) through a spin isolation filter to produce the spin-isolated monochromatic electromagnetic beam consisting essentially of a plurality of spin-isolated photons, only observable within a plurality of first discrete ranges along a path of the monochromatic electromagnetic beam, each of the first discrete ranges centered at a corresponding distance from a source of the monochromatic electromagnetic beam, and wherein essentially no photons are observable within a plurality of second discrete ranges located in-between each of the first discrete ranges.BRIEF DESCRIPTION OF THE DRAWINGS

[0006] Embodiments of the present disclosure, briefly summarized above and discussed in greater detail below, can be understood by reference to the illustrative embodiments of the disclosure depicted in the appended drawings. However, the appended drawings illustrate only typical embodiments of the disclosure and are therefore not to be considered limiting of scope, for the disclosure may admit to other equally effective embodiments.

[0007] FIG. 1 depicts a graph showing the difference between an irradiation of a substrate according to embodiments disclosed herein, and a prior art statistical irradiation of the substrate.

[0008] FIG. 2 is a block diagram depicting a subatomic particle, and its hemispheres defined by an inherent, persistent axis defining anisotropic interactions, according to the HemiChem model according to embodiments disclosed herein.

[0009] FIG. 3 is a block diagram depicting the effect of a monochromatic electromagnetic beam transversing a single slit according to the HemiChem model according to embodiments disclosed herein.

[0010] FIG. 4 depicts a modified double / single slit filter to produce a physics spin isolated electromagnetic energy beam according to embodiments disclosed herein.

[0011] FIG. 5 depicts a modified Stern Gerlach filter to produce a physics spin isolated electromagnetic energy beam according to embodiments disclosed herein.

[0012] FIG. 6 depicts a modified Aharonov Bohm filter to produce a physics spin isolated electromagnetic energy beam according to embodiments disclosed herein.

[0013] FIG. 7 depicts a physics spin isolated electromagnetic energy beam according to embodiments disclosed herein.

[0014] To facilitate understanding, identical reference numerals have been used, where possible, to designate identical elements that are common to the figures. The figures are not drawn to scale and may be simplified for clarity. Elements and features of one embodiment may be beneficially incorporated in other embodiments without further recitation.DETAILED DESCRIPTION

[0015] Embodiments disclosed herein include reference to a hemispherical model which provides physical modelling of the underlying chemistry and subatomic physics using hemispherical coordinates (r,6,cp,z=Xo=±1 / 2), and replacing quantum numbers (n, I, ml, ms). The hemispherical model (referred to herein as the HemiChem Model) further utilizes acceleration allocation (aa) replacing Newton’s 2ndLaw of Motion wherein three coreinteractions are utilized to generate the fundamental forces, including full integration of gravity.

[0016] For purposes herein, elementary particles are considered to be elementary- event sets of multiple core particles, arranged in three dimensional (3D) engineering stable structures. The Hemichem model provides 3D engineering and physical, classical physics causation for each of prior art quantum equations. The statistical techniques remain valid for the multiple particles and multiple events where a single event or particle cannot be observed according to methods currently known. Using the HemiChem model, each quantum equation is improved by incorporating an additional frame-of-reference whereby subatomic particles have an axis of symmetry. Various known dilemmas, such as improper infinities, are likewise resolved and quantum techniques become redundant.

[0017] However, the HemiChem method referred to herein does not detract from, and is in overall agreement with the multitude of information readily known to one of skill in the art of quantum mechanics (QM), quantum field theory (QFT), and the like. Instead, the HemiChem method utilized herein presents revisions to known relationships which bridge classical single particle-particle events-sets with the multiple-event, often the hemispheres of subatomic particles each separately as the ‘quantum’ to get the same quantum prediction techniques and experimental evidence, but with the added frame-of- reference.

[0018] A detailed description of the methods and models utilized herein, including the HemiChem model, may be found in the HemiChem IDS series including Vigen, A. (4-17- 2024). Hemispherical Atomic Model ISBN 9798870681290, Vigen, A. (12-23-2023). The Nature and Causation of Light, Photons, and EM l / Vaves Amazon-ASIN B0CQWN1 NT4; Vigen, A. (3-1 -2024). First Principles for Subatomic Physics Amazon-AS N B0CWTYVX7Q; and the like. Additional references include Vigen, A. (1 -28-2023). HemiQuantum Physics: Resolving Each Quantum Dilemma: Improving Each Quantum Technique from Planck’s Equation to Elementary Particles, Amazon-ASIN B0BTC7PGND; Vigen, A. (1 -19-2019). Understanding Pauli’s1 / sas 3D Hemispheres Fully Links Quantum Theory to Classical Physics, Amazon-ASIN B07MYNTPJ7; Vigen, A. (1 - 18-2019). Simple Words to Fully Reconcile Classical Mechanics with Quantum Theory,Amazon-ASIN B07MY9CH4F; Vigen, A. (4-25-2022). Refining the Schrodinger Wave Function Equation in Hemispherical (r,9,(p,z=X0=±1 / 2) Coordinates Amazon-AS\N B09YWSL1 FR; Vigen, A (10-12-2016). Gravity is Just That Electrons are a Little Closer, Amazon-ASIN B01 M9B4V4E; Vigen. A (10-13-2016). Electron Shell Chemistry is Just Scrunched Cube Geometry; Amazon-ASIN B01 M7PRGWZ; Vigen. A (1 -19- 2019). Revising Planck-Einstein Energy Equation to Add Pauli’s1 / 2 Fully Links Quantum Theory to Classical Physics; Amazon-ASIN(B07MYLTJ67); Vigen. A (1 -18-2018). Postulated Nucleostaticmagnetics Force for Subatomic Particles Resolves Dirac’s 1931 Monopoles as Fully Deterministic Duopoles; Amazon-ASIN B07MY7F289; Vigen. A (3- 25-2023). The Mass Equation: My Breakthrough Position-in-Field Approach from Hemispherical (r,6,(p,z=X0=±1 / 2) Amazon-ASIN B0BZN3MGNC; Vigen A. (10-2-2020). Replacement of Bohr’s Angular Momentum with Strong Nuclear Force for Electrons; Amazon-ASIN B08KNMVPB1 ; Vigen, A (6-20-2020). Nucleostaticmagnetics Vector Equations; Amazon-ASIN B08BKW46GG; Vigen, A. (3-2-2020). Math Integrity Understanding Strong and Weak Force Through the Forces / Fields of Electrostatic, Direct and Axial Nucleostaticmagnetics: 4-Vector in 3D Model Generating Four Quantum Equations (Dirac); Amazon-ASIN B085R99M44; Vigen, A. (1 -18-2020). Renaissance Physics: Understanding Post-Quantum Novo-Classical Subatomic Particle Engineering Textbook Chapter 1-4 Amazon ISBN 1659185777; Vigen, A. (3-31 -2019). 3D Visual Chemistry Textbook; Amazon-ASIN B07Q3PY8GV; Vigen, A. (1 -18-2018). Quantum Entanglement, Wave Functions, and Spectrum Given the 3D Arno Vigen Scrunched Cube (AVSC) Atomic Model; Amazon-ASIN B07MY7Y5ZW; Vigen, A. (10-8-2017). Fixing Einstein’s E=mc-squared: Replacing Observed Mass (‘m’) with the ‘M’ Nucleus Magnetic Force Divided by the Volume of the Electron Shell Radius Separation; Amazon-ASIN B0769ZJK9K; Vigen, A. (10-29-2016). Why Does a Nucleus Stay Together When Protons (+) Repel Each Other?: A Nucleus is Just . . . a Magnetic Chain-Ring; Amazon-ASIN B01 M73KXNQ; The full disclosures of which are fully incorporated by reference herein.

[0019] As used herein, radial electrostatic (rES) interaction I force refers to an electrostatic (ES) attribute often referred to as electrostatic charge attraction or repulsion in the prior art, having an appropriate sign of positive (+) or negative (-). The operatingrules associated with radial electrostatic (rES) interaction is that opposites attract and like- kind repel.

[0020] Xtrastatic (XS) axis refers to the axis inherent in every subatomic particle according to the HemiChem model. Axial xtrastatic (aXS) interaction and / or force refers to the attractive force from a particle (P1 ), or more specifically, as separate ‘quanta’ from its two hemispheres / poles, towards the axis of a second particle (P2). Importantly, this is towards-the-axis of the other particle as linear force and / or rotating the particle’s (XSO axis as rotational force towards the interacting particle and its hemispheres. The math segments and sign of the interaction being based upon the XS-attribute known as mass in prior art.

[0021] Radial xtrastatic interaction (rXS) and / or force refers to the repulsive force from a particle (P1 ) from its two differentiate axis / hemispheres away from a second particle (P2). This sign of this interaction is based upon the XS-attribute also referred to a mass in prior art.

[0022] In addition, for the teachings of the present invention, it is understood that like- kind particles do not have xtrastatic interactions. Only the electron-proton and the electron-nucleon have two xtrastatic interactions, linear and rotational.

[0023] For purposes herein, consistent with the HemiChem model, particle-edge and maximum field strength occurs at an electron’s physical dimension radius (re). However, the equilibriums of rXS and rES for electron shells for one-proton, one-electron Hydrogen, which corresponds to the Bohr-Hydrogen radius, abbreviated herein as (ao or as). Accordingly, for purposes herein, a proton is assumed to have a radius scaling and position-in-field maximum at (re) for these calculations.

[0024] For purposes herein, calculation of the behavior of each hemisphere is defined from pole to equator by that inherent XS axis over the body of particle. The body of particle having a center-of-substance defined in hemispherical coordinates (rz,0z,az,Zz=XO=±1 / 2) as center-of-mass ((3 / 8)re,0,0,+1 / 2) for a first hemisphere, and ((3 / 8)r,0,0,-1 / 2) for the other second hemisphere, which is locked-at-180° or TT radians relative to the first at the same distance and complementary (0I+TT) inclination angle relative to the XS axis of the particle’s first hemisphere.

[0025] In embodiments, a spin isolated EM energy beam is formed from an EM wave which is separated into a set of isolated EM waves, each particle present in the spin isolated EM energy beam having essentially the same physics-spin and polarity, which then may be utilized for various commercial applications.

[0026] Suitable applications for spin isolated EM energy beams according to embodiments herein include enhancement for the decay process for nuclear fuel and nuclear waste; improved resolution of chip lithography processes; improvement of, and / or catalysis of chemical reactions, and the like, provided by the ability to direct a spin isolated EM energy beam having a precise energy in three dimensional space to affect a change in a physical and / or chemical, and / or atomic system.

[0027] In embodiments, a spin-isolated monochromatic electromagnetic beam consisting essentially of a plurality of spin-isolated photons, wherein the spin-isolated photons are only observable within a plurality of first discrete ranges along a path of the monochromatic electromagnetic beam, each of the first discrete ranges centered at a corresponding distance from a source of the monochromatic electromagnetic beam, wherein essentially no photons are observable within a plurality of second discrete ranges located in-between each of the first discrete ranges. It is noted that all electromagnetic beam potentially include the components of a spin isolated monochromatic electromagnetic beam. However, only a spin-isolated monochromatic electromagnetic beam may be characterized wherein essentially no photons are observable within a plurality of second discrete ranges located in-between each of the first discrete ranges according to embodiments disclosed herein. Accordingly, the spin-isolated monochromatic electromagnetic beam is said to consisting essentially of a plurality of spin-isolated photons, and may be characterized wherein essentially no photons are observable within a plurality of second discrete ranges located in-between each of the first discrete ranges.

[0028] In embodiments, the monochromatic electromagnetic beam is polarized. In embodiments, the spin-isolated monochromatic electromagnetic beam is configured such that the polarization of the monochromatic electromagnetic beam is relative to an axis of the nucleus of an atom of the source. In embodiments, the spin-isolated monochromaticelectromagnetic beam is configured such that the polarization of the monochromatic electromagnetic beam is relative to an axis of a subatomic particle of a target atom.

[0029] In embodiments, the spin-isolated monochromatic electromagnetic beam is configured such that only photons having a positive spin are present within a particular first discrete range N, and only photons having a negative spin are present within the next first discrete range (N+1 ) along the path of the monochromatic electromagnetic beam.

[0030] In embodiments, the spin-isolated monochromatic electromagnetic beam is configured such that only photons from multiple sources, each having the same spin, are present within a particular first discrete range centered at a particular discrete location along the path of the monochromatic electromagnetic beam.

[0031] In embodiments, each first discrete range is located at a corresponding entanglement observation node distance, determined from formula I:A = A Dnode = Dnode2 - Dnodel = Dnode (1 / (VNI)2 —1 / (VN2)2) (I) ; wherein:A is a wavelength of the spin-isolated monochromatic electromagnetic beam;A Dnode is a linear distance between a center of a particular first discrete range Dnodei ; and another first discrete range Dnode2 immediately following Dnodei along the path of the spin-isolated monochromatic electromagnetic beam;VNX IS an integer subset starting at x=1 determined by formula (II)VNX+I = VNX +1 (II); wherein each V and x are determined independently, as integers greater than or equal to 1 , wherein Dnode is a base node distance determined by formula (III):Dnode = 6re((d / (6 re))2-1 ) (III); wherein: reis the radius of an electron; d is a distance between a center of a nucleus and a center of an electron of the atom of the source of the electromagnetic beam.

[0032] In embodiments, a method of producing a spin isolated monochromatic electromagnetic beam, comprises directing a monochromatic electromagnetic beam having a wavelength (A) through a modified double slit spin isolation filter comprising two coplanar slits disposed through a first wave barrier;each of the slits having a slit width (S) of less than or equal to the wavelength (A), wherein the slits are separated center-on-center by a slit distance (d) of greater than or equal to about eight times the slit width (8*S); directing a portion of the monochromatic electromagnetic beam emanating from one of the two coplanar slits through a second slit disposed through a second light barrier oriented parallel to the first wave barrier, located a barrier distance D from the first barrier along a path of the spin isolated monochromatic electromagnetic beam, wherein D equals ((n / 2) / d)*A; wherein n is an odd integer divided by 2 (n / 2); wherein the spin isolated monochromatic electromagnetic beam emanates from the third slit; and wherein the spin-isolated monochromatic electromagnetic beam consists essentially of a plurality of spin-isolated photons, only observable within a plurality of first discrete ranges along a path of the monochromatic electromagnetic beam, each of the first discrete ranges centered at a corresponding distance from a source of the monochromatic electromagnetic beam, and wherein essentially no photons are observable within a plurality of second discrete ranges located in-between each of the first discrete ranges.

[0033] In embodiments, a power of the spin isolated monochromatic electromagnetic beam delivered at each node is essentially equal to the power of the monochromatic electromagnetic beam emanating from the third slit.

[0034] In embodiments, a method to produce a spin-isolated monochromatic electromagnetic energy beam comprises directing a monochromatic electromagnetic beam into an inlet of a magnetic spin isolation filter comprising an opening disposed between a first magnet and a second magnet; the first magnet having a first cross section oriented perpendicular to a path of the beam; the second magnet having a second cross oriented perpendicular to the path of the beam different from the first cross section, such that the opening between the two magnets has a non-uniform magnetic field having a field strength and length in the direction of the path of the beam sufficient to separate the beam into a pair of spin-isolated monochromatic electromagnetic energy beams emanating from an exit of the spin isolation filter.

[0035] In embodiments, the position within a target substrate illuminated and / or irradiated by a spin-isolated monochromatic electromagnetic beam is controlled by positioning and dimensions of the source for EM waves relative to the inlet of the a spin isolation filter. In embodiments the position within a target substrate illuminated and / or irradiated by a spin-isolated monochromatic electromagnetic beam is controlled by selecting a distance between the source for EM waves and the inlet of the spin isolation filter, a distance of the target substrate from an outlet of the spin isolation filter, by selecting a wavelength of the monochromatic electromagnetic beam, and / or the like.

[0036] In embodiments the position within a target substrate illuminated and / or irradiated by a spin-isolated monochromatic electromagnetic beam is controlled by configuring the spin isolation filter.

[0037] Without intending to be bound by theory, the inventor believes that the characteristics of the spin-isolated monochromatic electromagnetic beam, i.e., wherein the spin-isolated monochromatic electromagnetic beam consists essentially of a plurality of spin-isolated photons, only observable within a plurality of first discrete ranges along a path of the monochromatic electromagnetic beam, each of the first discrete ranges centered at a corresponding distance from a source of the monochromatic electromagnetic beam, and wherein essentially no photons are observable within a plurality of second discrete ranges located in-between each of the first discrete ranges, allows for the irradiation of a particular portion of a substrate, and only the particular portion of the substrate present with each of the first discrete ranges of the spin-isolated monochromatic electromagnetic beam Accordingly, utilizing the spin-isolated monochromatic electromagnetic beam allows for selective irradiation and / or activation of a target substrate instead of a random, statistical approach currently required, in which other portions of a substrate are unintentionally irradiated and / or activated.

[0038] In embodiments, the dimensions of the source of the monochromatic electromagnetic beam may be configured, manipulated, and / or controlled to select the portion of a target substrate irradiated thereby. In embodiments, a distance between source and the target may be configured, manipulated, and / or controlled to select the portion of a target substrate irradiated thereby.

[0039] In embodiments, the wavelength of the source of the monochromatic electromagnetic beam may be configured, manipulated, and / or controlled to select the portion of a target substrate irradiated thereby.

[0040] FIG. 1 depicts irradiation of radioactive material as straight link by the combination of spin-isolation and configuration. The timeframe difference of a chain of activation events e.g., irradiation of a particular portion of a substrate, when conducted utilizing prior art statistical process versus fully systematic engineering utilizing a) a spin- isolated monochromatic electromagnetic energy beam according to embodiments herein, compared to a statistical approach utilizing a monochromatic electromagnetic energy beam which is not spin isolated; in coordination with b) changes in the configuration, such as path distances and deflections, so activations are not statistical, but instead systematic in their deliver of photons to the target which is in a knowable range. For a process utilizing a spin isolated monochromatic electromagnetic energy beam according to embodiments disclosed herein, that same process would require fifty (50) cycles, a comparable statistical process would require an essentially infinite time. As FIG. 1 shows, for a process according to embodiments disclosed herein which is essentially 100% complete in 100 cycles, 50% of the same process is completed at 50 cycles. In contrast, a statistical, random process which does not utilize a spin-isolated monochromatic electromagnetic energy beam according to embodiments never completes, and at 500 cycles 1 % of the intended result of the statistical process remains.

[0041] FIG. 2 depicts a subatomic particle 204 having an xtrastatic axis (202) intersecting at two poles, a first pole 203 and a second pole 206. The two hemispheres, a first hemisphere 210 and an opposite second hemisphere 212 are defined by the equator 205 (hashed line) of the particle disposed between the first pole 203 and the second pole 206, According to the HemiChem model, first pole 203 can rotate (arrow 201 ) from the first hemisphere 210 to the opposite second hemisphere 212 such that the first pole 203 is now located at the position previously occupied by the second pole 206, and vice-a-versa. Because these poles are, relative to the nucleus-set, locked-at-180°, the opposite pole (206) would move to the opposite first pole (203) original position.

[0042] The rotation of the hemispheres either occurs to produce an electromagnetic wave or requires absorption of energy of a particular wavelength. A causation-source multiple-particle structure is defined by a polarity angle (207), specified as latitude (cp) relative to the radial, direct line of travel (r) defining the wavelength from the square of distance between the electron. Further, energy of this event become the (s=hv) in the Planck relation. Polarity angle 207 (<p) is related to the conditions required for causation of the flipping of the two poles since an orientation of the polarity angle 207 resultant from a source electron-proton interaction providing energy for the event to occur must reasonably match the target’s axis orientation for such a transfer of energy to occur.

[0043] The EM wave I photon generated by a causation-source electron to effect a rotation of the first pole 203 from the first hemisphere 210 to the opposite second hemisphere 212 such that the first pole 203 is now located at the position previously occupied by the second pole 206, maintains that orientation (polarity) and rotational direction (physics-spin).

[0044] In embodiments utilizing a modified double slit spin isolation filter, a double slit arrangement is utilized, which is modified to include an additional single slit located in a dark band of the light emanating from one of the double slits. An actuation position, e.g., a position on or in a substrate to be irradiated, is adjusted to put the particular position within an entanglement node location of the spin isolated monochromatic electromagnetic beam.

[0045] As depicted in FIG. 3, when an EM wave, e.g., a light beam, passes through a single slit, the beam will be split horizontally via interaction of the photons with the closer mass of a slit edge causing the EM wave to spread out e.g., into an ellipsoid pattern, instead of proceeding in a straight line. The EM waves do not experience the spreading and maintain the relatively, effectively straight line behavior vertically except for the portion of the beam interacting with the bottom of the beam. The end result of an EM wave directed through a slit is spreading horizontally, but no spreading vertically to produce an interference pattern. However, because of those distances, the pattern is not just horizontal spreading, which has a smooth gradient from center to the widths. Instead, the inventors have observed that because the distances traveled by the beam aredifferent, the spreading of the photons results from different physics-spin orientations. However, the different physics spins are not observed because they are either ‘up’ or ‘down’ and do not produce bright line banding.

[0046] As FIG. 3 shows, an EM wave source 301 produces an electromagnetic energy beam 302 comprising a stream of photons, separated a first distance 320 from a barrier 303. The photons are directed towards barrier 303 having a vertical slit 310 disposed therethrough. The portion of the electromagnetic energy beam 302 which proceeds through the vertical slit 310 spreads out indicated by beams 305, 306, 312, 313 and 314, which then arrive at a receiver 307 separated from barrier 303 by a second distance 304. As indicated by the up and down arrows, the beams 305, 306, 312, 313 and 314, arrive at receiver 307 having different physics spin based upon the overall distance the particular beam travels, wherein beams arrive having alternative physics-spin amplitudes wherein beam 305 has an up physics spin indicated by arrow 308, beam 306 has a down physics spin indicated by arrow 309, beam 312 has an up physics spin indicated by arrow 311 , beam 313 has a down physics spin indicated by arrow 316, and beam 314 has an up physics spin indicated by arrow 315.

[0047] By varying the first distance 320, a wavelength of the electromagnetic energy beam 302 of photons, and / or the second distance 304, the physics spin of a particular beam may be manipulated based upon the overall distance the particular beam must travel. In addition, the wavelength of the light may also be manipulated.

[0048] FIG. 4 depicts a modified twin-single slit filter 400 according to embodiments disclosed herein. In embodiments, monochromatic electromagnetic beams 402A and 402B having a wavelength (A) is produced from a source 428 and directed through two coplanar slits 404 and 406 disposed through a first barrier 408. A third slit 410 is disposed through a second barrier 412. A spin isolated monochromatic electromagnetic beam 420A produced from the monochromatic electromagnetic beam 402A emanates from third slit 410. Likewise, a spin isolated monochromatic electromagnetic beam 420B produced from the monochromatic electromagnetic beam 402B also emanates from third slit 410 along a different path.

[0049] As the monochromatic electromagnetic beams 402A and 402B arrive at the first barrier 408 and pass through the corresponding coplanar slits 404 and 406, an interference patter is produced on the second barrier 412 separated from the first barrier 408 by a second distance 414, as is known in the art. However, it is believed that the alternating light band-dark band interference pattern produced on the second barrier 412 is the result of overlapping of the physics spins shown in FIG. 3 and not some wave property of the photons.

[0050] In embodiments, the position of third slit 410 is located within a dark band of the pattern of light and dark bands produced on the second barrier 412. Ostensibly, no photons are present in this region. However, the inventors have discovered that indeed photons are present in this region, they are simply not observable in this region due to interference between different beams, each having a particular spin isolation.

[0051] A first target substrate 418 is located at a target distance 416 from the second barrier 412. The spin isolated monochromatic electromagnetic beam 420A has a physicsspin arbitrarily labeled ‘down’ (arrow 422) in this example. The spin isolated monochromatic electromagnetic beam 420B has a physics-spin arbitrarily labeled ‘up’ (arrow 424) in this example.

[0052] In embodiments, a plurality of second target substrates 430 (only one of which is shown for simplicity) may be arranged to intersect another spin isolated monochromatic electromagnetic beam 420B at a second target distance 416’, which in embodiments may be located at the first target distance 416.

[0053] The spin isolated monochromatic electromagnetic beams 420A and 420B each independently consist essentially of a plurality of spin-isolated photons. These spin- isolated photons are only observable within a plurality of first discrete ranges along a path of the monochromatic electromagnetic beam, each of the first discrete ranges is centered at a corresponding distance from a source of the monochromatic electromagnetic beam. The spin isolated monochromatic electromagnetic beams are further characterized as having a plurality of second discrete ranges located in-between each of the first discrete ranges wherein essentially no photons are observable. Accordingly, only the portion of the target substrate 418 located at the target distance 416 is irradiated with the photonspresent in the spin isolated monochromatic electromagnetic beam at the corresponding first discrete range. Any portion of the first target substrate 418 which is not present within this first discrete range is not irradiated with the photons present in the spin isolated monochromatic electromagnetic beam. Accordingly, in embodiments, the target distance 416 may be controlled and / or modified to provide spatial resolution of irradiation or other types of activation on or of the target substrate by the spin isolated monochromatic electromagnetic beam.

[0054] In embodiments, the target distance 416 is selected, modified, controlled and / or configured such that photons of the spin isolated monochromatic electromagnetic beam 420A irradiate, activate, and / or interact with the portion of the first target substrate to be irradiated, allowing the intended result of that irradiation e.g., photocatalytic curing of a mask, only in the region irradiated.

[0055] In embodiments, a source distance 426 determined between the source 428 and the first barrier 408, the seco may be configured, the second distance 414, and the target distance 416 may be configured such that a portion of the first target substrate 418 is irradiated. In addition, the wavelength of the monochromatic electromagnetic beam may be configured, modified and / or controlled such that a portion of the first target substrate 418 is irradiated.

[0056] In embodiments, a slit width of each slit is greater than or equal to about one wavelength of the monochromatic electromagnetic beam. In embodiments, the slit width is less than or equal to about 1 mm.

[0057] In embodiments, a distance between the first and second slits 432 is greater than or equal to about eight times (8X) the wavelength of the monochromatic electromagnetic beam, or greater than or equal to about 10X, or greater than or equal to about 100X the wavelength of the monochromatic electromagnetic beam.

[0058] FIG. 5 depicts a modified Stern Gerlach magnetic spin isolation filter 500 suitable to produce the physics spin isolated electromagnetic energy beam, comprising a non- uniform magnetic field 502 disposed between an inlet 526 and an outlet 528 of the magnetic spin isolation filter 500. In embodiments, magnetic spin isolation filter 500 includes a first magnet 504 and a second magnet 506, the first magnet 504 having a firstcross section 508 oriented perpendicular to a path of the monochromatic electromagnetic beam 512; the second magnet 506 having a second cross section 510 oriented perpendicular to the path of the monochromatic electromagnetic beam 512 produced by a source 534, which is different from the first cross section 508, such that the opening 514 between the two magnets 504 and 506 has a non-uniform magnetic field having a magnetic field strength 532 and length 516 in the direction of the path of the monochromatic electromagnetic beam 512 sufficient to separate the monochromatic electromagnetic beam 512 into a pair of spin-isolated electromagnetic energy beams 518 and 520. As shown in FIG. 5, at least one of the spin-isolated electromagnetic energy beams 518 and 520 emanating from the outlet 528 interact with a target substrate 522 and 524 to affect actuation or a change of a portion of the target substrate, as described above.

[0059] In embodiments, the first magnet 504, the second magnet 506, or both are, or include one or more electromagnetic elements 530 configurable to adjust the magnetic field strength 532 one or more points along the path of the monochromatic electromagnetic beam 512.

[0060] FIG. 6 depicts a modified Aharonov Bohm filter 600 suitable to produce the physics spin isolated electromagnetic energy beam, comprising two slits 602 and 604, through which two monochromatic electromagnetic beams 606 and 608 produced by a source 610, pass through striking a substrate 612, wherein the interference pattern produced by the two monochromatic electromagnetic beams 606 and 608 is a physics spin isolated electromagnetic energy beam, produced by interaction with a circular magnetic field 614. The direction of the circular magnetic field 614 is outward from the figure; the inward returning flux is not shown, but is outside the electron paths. The arrow representing the circular magnetic field 614 shows the direction of the field which interacts with the two monochromatic electromagnetic beams 606 and 608.

[0061] FIG. 7 depicts a spin-isolated monochromatic electromagnetic beam 700 according to embodiments disclosed herein, consisting essentially of a plurality of spin- isolated photons depicted as dashes, wherein the spin-isolated photons are only observable within a plurality of first discrete ranges 702 along a path of the spin-isolatedmonochromatic electromagnetic beam 700, each of the first discrete ranges 702 is centered at a corresponding distance from a source 704 of the monochromatic electromagnetic beam, wherein essentially no photons are observable within a plurality of second discrete ranges 706 located in-between each of the first discrete ranges 702.

[0062] In embodiments, the first discrete ranges 702 wherein the spin-isolated photons are observable, have a length 708 of greater than or equal to about 0.1 nm. In embodiments, the first discrete ranges wherein the spin-isolated photons are observable have a length of less than or equal to about 10 nm. In embodiments, an average of the length 708 of the first discrete ranges is essentially equal to an average of the length of the second discrete ranges 710 in which essentially no photons are observable.

[0063] In embodiments, the first discrete ranges 702 wherein the spin-isolated photons are observable, have a length 708 of greater than or equal to about 0.1 nm, or greater than or equal to about 1 nm, or greater than or equal to about 10 nm, or less than or equal to about 100 nm. In embodiments, the first discrete ranges have a length of less than or equal to about 10 nm. In embodiments, the first discrete ranges have a length of less than or equal to about 1 nm.

[0064] It is noted that the prior art use of the terms ‘up’ and ‘down’ to describe spin is misleading. An ‘up’ spin of a spin isolated monochromatic electromagnetic beam is more completely described as having an inner-clockwise / outer-counterclockwise spin, and a ‘down’ spin of a spin isolated monochromatic electromagnetic beam is more completely described as inner-counterclockwise / outer-clockwise with the center as the same node. Accordingly, consistent with current understanding, photons and EM waves possess dual wave characteristics (See Vigen, A. (12-24-2023). The Nature and Causation of Light Amazon-ASIN B0CQXD14QN).

[0065] Each spin isolated monochromatic electromagnetic beam arriving at a barrier will show a pattern of alternating light bands where photons are observable and dark bands in which intermediate positions are interfering where photons are not observable and thus no activation of a substrate brought about by irradiation with photons will occur.

[0066] It is theorized that spin isolated monochromatic electromagnetic beams are produced via spin aggregation of the photons, in which both hemispheres of thesubatomic particle, in this case the photon, move in the same direction and thus there is no change in the energy-level associated with the photons present in the spin isolated monochromatic electromagnetic beam.

[0067] In embodiments, the portion of the substrate to be activated or irradiated by the photons of the spin isolated monochromatic electromagnetic beam is located in an activation position, which is coincident with an entanglement node of the spin isolated monochromatic electromagnetic beam, where the spin of each photon present is inside one direction and outside the other, resulting in a change in the energy-level for a particular photon, or other subatomic particle i.e., protons and electrons. The rotation energy being the transposition rate of those poles defined by the subatomic particle’s axis, with the resulting change in the B-field for perpendicular magnetism linear acceleration according to relationships known in the art.

[0068] The use of affecting a change via interaction with a spin isolated monochromatic electromagnetic beam is in contrast to the prior art, which utilizes an excess of photons, in which only a portion of present having the same-physics-spin such that a statistical or probalistic model must be employed to predict the likelihood of a photon interacting within a particular positional range.

[0069] The prior art probability methods of computational chemistry reduce the energy efficiency of any process because only a certain percentage of photons will produce the desired effect. Accordingly, a statistical model must be used since the 2nd, 3rd, and Nth photon interactions will be present based on a statistical probability. The result is the exponential ‘decay’ observed for prior art, based on a quantitized statistical chain, ex. However, the prior art is observed to cause additional waves which cause other, unwanted actuations and events before and beyond the intended target region.

[0070] Accordingly, in contrast to the prior art, embodiments disclosed herein provide for delivery of an actuating photon in a designated pattern to a range incrementally for same-physics-spin photons wherein actuations will occur at particular positions and not randomly.

[0071] In embodiments, methods disclosed herein have increased energy efficiency because the wavelength and distances may be controlled to optimize the percentage of a particular actuation during a particle irradiation event e.g., during each irradiation pass.Thus embodiments disclosed herein become more mechanical in nature, instead of purely statistical, since 2nd, 3rd, Nth processing passes may be adjusted in positions such that a particular portion of a substrate is systematically irradiated with each pass. This is in contrast to a blanket statistical deluge wherein all portions are simultaneously irradiated with unwanted side effects.

[0072] In embodiments, the monochromatic electromagnetic beam is polarized. In embodiments, the monochromatic electromagnetic beam is polarized to be parallel to an axis of a nucleus of an atom present in the source of the monochromatic electromagnetic beam.

[0073] In embodiments, the location of each first discrete range wherein the spin- isolated photons are observable is located at a corresponding entanglement observation node distance, determined from formula I:A=A Dnode=Dnode2 - Dnodel=Dnode (1 / (VN1 )2— 1 / (VN2)2) (l)i wherein:A is a warelength of the spin-isolated monochromatic electromagnetic beam;A Dnode is a linear distance between a center of a particular first discrete range Dnodei ; and another first discrete range Dnode2 immediately following Dnodei along the path of the spin-isolated monochromatic electromagnetic beam;VNX is an integer subset starting at x=1 determined by formula (II)VNX+I = VNX +1 (II); wherein each V and x are determined independently, as integers greater than or equal to 1 ; and wherein Dnode is a base node distance determined by formula (III):Dnode = 6re((d / (6 re))2-1 ) (III); wherein: reis the radius of an electron; d is a distance between a center of a nucleus and a center of an electron of the atom of the source of the electromagnetic beam.

[0074] In embodiments, the monochromatic electromagnetic beam is produced using an essentially monochromatic laser. In embodiments, the monochromaticelectromagnetic beam is polarized. In embodiments, the wavelength of the monochromatic electromagnetic beam is greater than or equal to about 1 nm, or greater than or equal to about 10 nm, or greater than or equal to about 50 nm, or greater than or equal to about 100 nm, or greater than or equal to about 500 nm.

[0075] In embodiments, the spin-isolated monochromatic electromagnetic beam has a wavelength from about 1 nm to about 120 nm. In embodiments, the spin-isolated monochromatic electromagnetic beam has a wavelength from about 120 nm to about 350 nm. In embodiments, the spin-isolated monochromatic electromagnetic beam has a wavelength from about 355 nm to about 800 nm.

[0076] In embodiments, a variable and / or tunable wavelength source is used to produce the monochromatic electromagnetic beam.

[0077] While the foregoing is directed to embodiments of the present disclosure, other and further embodiments of the disclosure may be devised without departing from the basic scope thereof.

Claims

Claims1. A spin-isolated monochromatic electromagnetic beam hating a watelength, and consisting essentially of a plurality of spin-isolated photons, wherein the spin-isolated photons are only obser able within a plurality of first discrete ranges along a path of the monochromatic electromagnetic beam, each of the first discrete ranges centered at a corresponding distance from a source of the monochromatic electromagnetic beam, wherein essentially no photons are obser able within a plurality of second discrete ranges located in-between each of the first discrete ranges.

2. The spin-isolated monochromatic electromagnetic beam of claim 1 , wherein the monochromatic electromagnetic beam is polarized.

3. The spin-isolated monochromatic electromagnetic beam of claim 2, configured such that the polarization of the monochromatic electromagnetic beam is relative to an axis of the nucleus of an atom of the source.

4. The spin-isolated monochromatic electromagnetic beam of claim 2, configured such that the polarization of the monochromatic electromagnetic beam is relati ce to an axis of a subatomic particle of a target atom.

5. The spin-isolated monochromatic electromagnetic beam of claim 1 , configured such that only photons hadng a positive spin are present within a particular first discrete range N, and only photons hadng a negative spin are present within the next first discrete range (N+1 ) along the path of the monochromatic electromagnetic beam.

6. The spin-isolated monochromatic electromagnetic beam of claim 1 , configured such that photons from multiple sources, each hadng the same spin, are present within a particular first discrete range centered at a particular discrete location along the path of the monochromatic electromagnetic beam.

7. The spin-isolated monochromatic electromagnetic beam of claim 1 , wherein the location of each first discrete range is located at a corresponding entanglement obser ation node distance, determined from formula I:wherein:A is a wavelength of the spin-isolated monochromatic electromagnetic beam;A Dnode is a linear distance between a center of a particular first discrete range Dnodei ; and another first discrete range Dnode2 immediately following Dnodei along the path of the spin-isolated monochromatic electromagnetic beam;VNX is an integer subset starting at x=1 determined by formula (II)VNX+I = VNX +1 (II); wherein each V and x are determined independently, as integers greater than or equal to 1 ; and wherein Dnode is a base node distance determined by formula (III):Dnode = 6re ((d / (6 re))2-1 ) (III); wherein: reis the radius of an electron; d is a distance between a center of a nucleus and a center of an electron of the atom of the source of the electromagnetic beam.

8. The spin-isolated monochromatic electromagnetic beam of claim 1 , wherein the wavelength is from about 1 nm to about 120 nm.

9. The spin-isolated monochromatic electromagnetic beam of claim 1 , wherein the wavelength is from about 120 nm to about 350 nm.

10. The spin-isolated monochromatic electromagnetic beam of claim 1 , wherein the wavelength is from about 355 nm to about 800 nm.

11. The spin-isolated monochromatic electromagnetic beam of claim 1 , wherein the first discrete ranges have a length of less than or equal to about 10 nm.

12. The spin-isolated monochromatic electromagnetic beam of claim 1 , wherein the first discrete ranges have a length of less than or equal to about 1 nm.

13. The spin-isolated monochromatic electromagnetic beam of claim 1 , wherein the second discrete ranges are essentially equal in length to the first discrete ranges.

14. A method of producing a spin isolated monochromatic electromagnetic beam, comprising: directing a monochromatic electromagnetic beam hadng a wavelength (A) through one or more spin isolation filters to produce the spin isolated monochromatic electromagnetic beam consisting essentially of a plurality of spin-isolated photons, only obser able within a plurality of first discrete ranges along a path of the monochromatic electromagnetic beam, each of the first discrete ranges centered at a corresponding distance from a source of the monochromatic electromagnetic beam, and wherein essentially no photons are obser able within a plurality of second discrete ranges located in-between each of the first discrete ranges.

15. The method of claim 14, wherein the spin isolation filter is a modified double slitsingle slit spin isolation filter comprising two coplanar slits disposed through a first wave barrier; each of the slits hadng a slit width (S); wherein the slits are separated center-on-center by a slit distance (d) of greater than or equal to about eight times the slit width (8*S); directing a portion of the monochromatic electromagnetic beam emanating from one of the two coplanar slits through a third slit disposed through a second light barrier oriented parallel to the first wave barrier, located a barrier distance D from the first barrier along a path of the spin isolated monochromatic electromagnetic beam, wherein D equals ((n / 2) / d)*A; wherein n is an odd integer didded by 2 (n / 2);wherein the spin isolated monochromatic electromagnetic beam emanates from the third slit; and wherein the spin isolated monochromatic electromagnetic beam consists essentially of a plurality of spin-isolated photons, only obser able within a plurality of first discrete ranges along a path of the monochromatic electromagnetic beam, each of the first discrete ranges centered at a corresponding distance from a source of the monochromatic electromagnetic beam, and wherein essentially no photons are obser able within a plurality of second discrete ranges located in-between each of the first discrete ranges.

16. The method of claim 15, wherein the spin isolated monochromatic electromagnetic beam is polarized.

17. The method of claim 15, wherein a power of the spin isolated monochromatic electromagnetic beam delivered at each node is essentially equal to the power of the monochromatic electromagnetic beam emanating from the third slit.

18. The method of claim 14, wherein the spin isolation filter is a modified Steam Gerlach spin isolation filter, comprising: directing a monochromatic electromagnetic beam from an through a magnetic spin isolation filter, comprising a non-uniform magnetic field disposed between a first magnet and a second magnet, the first magnet hating a first cross section oriented perpendicular to a path of the monochromatic electromagnetic beam which is different from a second cross section oriented perpendicular to the path of the beam of the second magnet, such that the path of the monochromatic electromagnetic beam between an inlet and an outlet of the magnetic spin isolation filter has a non-uniform magnetic field; the magnetic spin isolation filter hating a field strength and length along the path of the monochromatic electromagnetic beam sufficient to separate the monochromatic electromagnetic beam into a pair of spin-isolated electromagnetic energy beams emanating from the outlet, wherein each of the spin isolated monochromatic electromagnetic beams consists essentially of a plurality of spin-isolated photons, only obser able within a plurality of firstdiscrete ranges along a path of the monochromatic electromagnetic beam, each of the first discrete ranges centered at a corresponding distance from a source of the monochromatic electromagnetic beam, and wherein essentially no photons are obser able within a plurality of second discrete ranges located in-between each of the first discrete ranges.

19. The method of claim 18, wherein the spin isolated monochromatic electromagnetic beam is polarized.

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