Low dielectric constant thin films, a method of producing the same and uses thereof

Abstract

The present invention relates to low dielectric constant films comprising polymerized organopolysiloxane material obtained by polymerization of organo functionalized monomers. The invention also concerns a method of forming such films by applying organopolysiloxane material containing compositions on a substrate in the form of a layer and by curing the layer to form a film. Further, the invention concerns uses of the low dielectric constant films of the invention in semiconductor devices, optical elements and optoelectronic devices.