Method for manufacturing component for manufacturing of silicon watch

JP2023164549A5Active Publication Date: 2025-04-09PATEK PHILIPPE SA
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Patent Information

Application Number
JP2023146855
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Priority Date
2018-03-20
Filing Date
2023-09-11
Publication Date
2025-04-09
Estimated Expiration
2039-03-19

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Abstract

To propose a method for manufacturing components of a high-quality silicon timepiece.SOLUTION: A method according to the present invention comprises: a) providing a substrate (1) comprising a first silicon layer (2), a second silicon layer (3) and an intermediate silicon oxide layer (4) therebetween; b) etching the first silicon layer (2) to form a timepiece component therein; c) separating a wafer (8) formed by at least all or part of the etched first silicon layer (2) from the substrate (1) to form a timepiece component; d) thermally oxidizing and then deoxidizing the timepiece component; e) forming a silicon oxide layer (10) on the timepiece component by thermal oxidation or deposition; and f) separating the timepiece component from the wafer (8).SELECTED DRAWING: Figure 6
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