Dishwasher sump and dishwasher apparatus

JP2024147586A5Pending Publication Date: 2026-02-24ECOLAB USA INC
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Patent Information

Application Number
JP2024104147
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Priority Date
2019-06-03
Filing Date
2024-06-27
Publication Date
2026-02-24

AI Technical Summary

Technical Problem

The challenge is to reduce the amount of liquid used during dishwasher operation while minimizing cavitation in the pump that circulates liquid through the dishwasher.

Method used

A sump system is introduced that includes a sump pan and a sump well, configured to receive liquid from the wash chamber and provide consistent flow to the recirculation pump, reducing cavitation by ensuring a consistent liquid supply and eliminating the need for separate components that could cause leaks.

Benefits of technology

The sump system enhances the performance of the dishwasher by reducing cavitation and potential leaks, ensuring efficient liquid circulation and minimizing water usage.

✦ Generated by Eureka AI based on patent content.

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Abstract

To provide a dishwasher sump and a dishwasher apparatus.SOLUTION: A dishwashing apparatus may include a sump. The sump may include a sump pan configured to couple with a wash chamber of the dishwashing apparatus. The sump may include a sump well coupled to the sump pan and configured to collect a liquid from the sump pan. The sump well may include a well inlet in communication with the sump pan. The sump pan may convey the liquid to the well inlet. A recirculation port extends through a first wall of the sump well. A drain port may extend through a second wall of the sump well. The second wall may define a bottom of the sump well. The dishwashing apparatus may include a controller. The controller may monitor electrical characteristics of a pump. The controller may provide a notification if a fluid is not flowing through the pump.SELECTED DRAWING: Figure 1
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Description

[Technical field]

[0001] Claiming priority This patent application claims the benefit of priority to U.S. Provisional Patent Application No. 62 / 856,572 to Mueggenborg et al., entitled "DISHWASHER SUMP AND DISHWASHER APPARATUS," filed June 3, 2019 (Attorney Docket No. 4897.016PRV), which is incorporated by reference in its entirety herein. [Background technology]

[0002] The dishwasher may clean items (e.g., dishes, cookware, etc.). The dishwasher may include a wash chamber, and the items may be placed in the wash chamber. The dishwasher may squirt liquid into the wash chamber to clean the items. The liquid may flow through the wash chamber, and the liquid may be received by a sump.

[0003] The drawings are not necessarily drawn to scale, and like numbers may represent similar components in different views. Like numbers with different letter suffixes may represent different instances of similar components. The drawings generally illustrate, by way of example, but not by way of limitation, various embodiments discussed in the present document. [Brief description of the drawings]

[0004] [Figure 1] 1 illustrates an isometric view of an example of a dishwashing device according to one embodiment of the present subject matter.

[0005] [Diagram 2] 2 illustrates another isometric view of an example of a dishwashing machine according to one embodiment of the present subject matter.

[0006] [Diagram 3] FIG. 1 illustrates a side view of an example of a sump and pump system according to one embodiment of the present subject matter.

[0007] [Figure 4]4 shows a perspective view of an example of the sump of FIG. 3, according to one embodiment of the present subject matter.

[0008] [Diagram 5] 4 illustrates another perspective view of an example of the sump of FIG. 3, according to one embodiment of the present subject matter.

[0009] [Figure 6] 4 illustrates a side view of an example of the sump of FIG. 3, according to one embodiment of the present subject matter.

[0010] [Figure 7] 2 shows another perspective view of an example of the dishwashing device of FIG. 1, according to one embodiment of the present subject matter.

[0011] [Figure 8] 2 shows a schematic diagram of an example of the dishwashing device of FIG. 1, according to one embodiment of the present subject matter.

[0012] [Figure 9] 1 shows a block diagram of an exemplary machine in accordance with one embodiment of the present subject matter.

[0013] [Figure 10] 4 shows a schematic diagram of an example of the sump of FIG. 3, in accordance with one embodiment of the present subject matter. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0014] The inventors have recognized that, among other things, a problem to be solved may include reducing the amount of liquid (e.g., water) used during operation of a dishwasher. Such problems may be solved by reducing cavitation of a pump that circulates liquid through the dishwasher. A sump for a dishwashing appliance may provide a solution to these problems. For example, the sump may help provide a flow of liquid to the pump to help prevent cavitation. The sump may include a sump pan having a pan inlet. The sump pan may be configured to couple with a wash chamber of the dishwashing appliance. The pan inlet may be configured to receive liquid from the wash chamber. A sump well may be coupled to the sump pan, and the sump well may be configured to collect liquid from the sump pan. The sump well may include a well inlet in communication with the sump pan. The sump pan may convey liquid to the well inlet. The samp well may include a recirculation port extending through a first wall of the samp well. The recirculation port may be configured to provide liquid to the recirculation pump. The sump pan and the samp well may be a single piece of material.

[0015] FIG. 1 illustrates an isometric view of an example of a dishwashing appliance 100 in accordance with one embodiment of the present subject matter. In some examples, the dishwashing appliance 100 is sized and shaped for placement under a countertop. In other examples, the dishwashing appliance 100 is sized and shaped for use on a countertop. The dishwashing appliance 100 may include a washing chamber 110 (e.g., a tub, chamber, container, etc.). Items placed within the washing chamber 110 may be cleaned (e.g., washed, scrubbed, disinfected, sanitized, etc.) during operation of the dishwashing appliance 100. For example, dishes (e.g., glasses, cups, silverware, plates, etc.), medical implements, etc. may be cleaned by the dishwashing appliance 100.

[0016] A washing arm 120 may be positioned within the washing chamber 110 and may squirt liquid (e.g., water, a water and soap solution, a water and cleanser solution, etc.) The washing arm 120 may rotate within the washing chamber 110 to clean items placed within the washing chamber 110.

[0017] The washing chamber 110 may be defined, at least in part, by a body 130 (e.g., a frame, support structure, etc.) of the dishwashing appliance 100. A door 140 may be movably coupled to the body 130 and may provide access to the washing chamber 110. The door 140 may help prevent liquid from leaking out of the washing chamber 110 during operation of the dishwashing appliance 100.

[0018] 2 shows another isometric view of an example of a dishwashing appliance 100 according to one embodiment of the present subject matter. Portions of the dishwashing appliance 100 (e.g., door 140) are hidden in FIG. 2 for clarity.

[0019] The dishwashing appliance 100 may include a sump 200. The sump 200 may receive liquid flowing within the wash chamber 110 during operation of the dishwashing appliance 100. For example, the sump 200 may be coupled to the body 130 of the dishwashing appliance 100. The sump 200 may define a bottom of the wash chamber 110, and liquid within the wash chamber 110 may drain into the sump 200.

[0020] The dishwashing appliance 100 may include a base 210, and the body 130 may be coupled to the base 210. The base 210 may define a service compartment 220 of the dishwashing appliance 100. The service compartment 220 may house one or more components of the dishwashing appliance 100, as described in more detail herein. The sump 200 may be located between the wash chamber 110 and the service compartment 220. For example, the sump 200 may separate the service compartment from the wash chamber 110.

[0021] 3 illustrates a side view of an example of a sump 200 and pump system 300 according to one embodiment of the present subject matter. The sump 200 may extend at least partially into the service compartment 220. The pump system 300 may include a pump 310, which may recirculate liquid within the dishwashing appliance 100. For example, one or more hoses 320 may interconnect the sump 200 with the pump system 300, which may provide liquid to the pump 310. The pump system 300 may help facilitate draining of liquid from the dishwashing appliance 100. The pump system 300 may help facilitate recirculation of liquid within the dishwashing appliance 100. In one example, the pump system 300 may provide liquid to the wash arm 120, for example, to facilitate spraying liquid with the wash arm 120.

[0022] The sump 200 may include a sump pan 330, which may include a pan inlet 340. The pan inlet 340 may receive liquid from the wash chamber 110. For example, liquid may be ejected by the wash arm 120 (e.g., as shown in FIG. 1 ), the liquid may flow within the wash chamber 110 to the pan inlet 340, and the liquid may be received by (e.g., drained into, dripped into, flowed into, etc.) the sump pan 330.

[0023] Sump 200 may include a sump well 350. Sump well 350 may be coupled to sump pan 330, and sump well 350 may receive liquid from sump pan 330. In one embodiment, sump well 350 may collect liquid from sump pan 330 (and wash chamber 11). For example, liquid received by sump pan 330 may flow into sump well 350, and sump well 350 may collect the liquid.

[0024] As described herein, sump 200 may provide liquid to pump 310. For example, a recirculation flange 360 ​​may be coupled to sump 200, such as flange 360 ​​may be coupled to sump well 350. In one embodiment, flange 360 ​​may be coupled to sump well 350 at an angle (e.g., relative to a wall of sump well 350).

[0025] The recirculation flange 360 ​​may facilitate coupling the sump 200 with the hose 320. Liquid collected by the sump well 350 may flow out of the sump well 350, through the recirculation flange 360 ​​and the hose 320, and into the pump 310. The sump 200 may help reduce the occurrence of cavitation within the pump 310. For example, the sump pan 330 and the sump well 250 may cooperate to reduce the occurrence of cavitation within the pump 310, for example, by providing a consistent flow of liquid to the pump 310.

[0026] 4 shows a perspective view of an example of the sump 200 of FIG. 3 , according to one embodiment of the present subject matter. The sump 200 may include a well inlet 400. The well inlet 400 may be in communication with a sump pan 330, which may carry liquid across the well inlet 400 to the well inlet 400. For example, the sump pan 330 may include a sloped wall 410, which may facilitate drainage of liquid into the sump well 350 (e.g., across the well inlet 400). The sloped wall 410 may facilitate collection of liquid in the sump pan 330 and into the sump well 350.

[0027] The sump 200 may include a lip 420 that may facilitate coupling of the sump 200 to other components of the dishwashing apparatus 100, for example, the sump 200 may be coupled to the body 130 (e.g., as shown in FIG. 1) or the wash chamber 110. The sump 200 may be coupled to the body 130 (or the wash chamber 110) using a welding operation, fasteners, or the like.

[0028] The sump 200 may include a liquid containment portion 430, which may correspond to a maximum liquid level 440 within the sump 200. In one embodiment, the sump 200 may be sized and shaped to have a volume greater than the volume of liquid introduced into the dishwashing appliance 100. For example, 1.5 gallons of liquid may be introduced into the dishwashing appliance 100 and the sump may be sized and shaped to contain 2 gallons of liquid. Thus, the liquid level within the sump 200 may not exceed the maximum level 440.

[0029] The maximum liquid level 440 may be located below the lip 420 (e.g., the maximum level 440 may be distant from the lip 420). Because the lip 420 may be coupled to the body 130 (or the wash chamber 110), a seam (e.g., a weld bead, a gasket line, etc.) may be located at the interface between the lip 420 and the body 130 (or the wash chamber 110). Thus, locating the maximum liquid level 440 below the lip 420 may help prevent leakage in the dishwashing appliance 100. For example, corrosion (e.g., corrosion of a weld bead) or damage to a gasket may cause the seam to leak. Locating the maximum liquid level 440 below the lip 420 may help reduce exposure of the seam to liquid, and therefore, the occurrence of leaks.

[0030] 5 shows another perspective view of an example of the sump 200 of FIG. 3 , according to one embodiment of the present subject matter. The sump 200 may include a recirculation port 500. The recirculation port 500 may extend through the sump well 350, e.g., extending through a first wall 510 of the sump well 350. The recirculation port 500 may help supply liquid to the pump system 300, e.g., the pump 310. A recirculation flange 360 ​​(e.g., as shown in FIG. 3 ) may be coupled to the sump well 350, and the recirculation flange 360 ​​may be in communication with the recirculation port 500. Liquid may flow from the recirculation port 500 of the sump well 350 into the recirculation flange 360.

[0031] The sump 200 may include a drain port 520, which may help facilitate drainage of liquid from the sump 200 (and dishwashing appliance 100, for example, as shown in FIG. 1). In one embodiment, the sump well 350 may include a second wall 530 of the sump well 350. The second wall 530 may define a bottom of the sump well 350 (and the sump 200). The drain port 520 may extend through the second wall 530 of the sump well 350.

[0032] The recirculation flange 360 ​​may be coupled to the wall 510, and coupling the recirculation flange 360 ​​to the first wall 510 may help prevent leakage from the sump 200, for example, by reducing exposure of the seam between the flange 360 ​​and the port 500 to liquid. The first wall 510 may extend at an angle from the second wall 530 (e.g., the first wall 510 may be perpendicular to the second wall 530, or the first wall 510 may extend at a 20 degree angle from the second wall 530). Thus, liquid drains from the first wall 510 of the sump well 350 to the second wall 530 (e.g., because the second wall 530 defines the bottom of the sump well 350). Thus, exposure of the seam between the recirculation port 500 and the recirculation flange 360 ​​(shown in FIG. 3) to liquid is reduced (e.g., because water drains away from the seam). Reducing the exposure of the seal to liquid may reduce leakage past the seal, such as dripping from sump well 350 into service compartment 220 (shown in FIG. 2). In some embodiments, the inner diameter of recirculation flange 360 ​​may be greater than or equal to the diameter of recirculation port 500. Thus, the seal between recirculation flange 360 ​​and recirculation port 500 may be enhanced.

[0033] As described herein, the recirculation port 500 may extend through the first wall 510. The recirculation port 500 may be located near the second wall 530. In one embodiment, locating the recirculation port 500 near the second wall 530 enhances pumping of liquid from the sampwell 350. For example, liquid within the sampwell 350 may drain up to the second wall 530, and locating the recirculation port 500 near the second wall 530 enhances pumping of liquid from the sampwell 350.

[0034] The recirculation port 500 may be located away from the drain port 520. For example, the recirculation port 500 may extend through the first wall 510 and the drain port 520 may extend through the second wall 530. Locating the recirculation port 500 away from the drain port 520 may improve the performance of the dishwashing apparatus 100, for example, by impeding the flow of liquid from the drain port 520 into the sampwell 350. In some approaches, the recirculation port 500 may be proximate to the drain port 520. Liquid may be pumped from the sampwell 350 (e.g., using the pump system 300 to recirculate within the apparatus 100). For example, the drain port 520 and the recirculation port 500 are in fluid communication when located proximate to one another, so that pumping liquid from the sampwell 350 may draw liquid from the drain port 520 into the sampwell 350. For example, a pressure differential created at the recirculation port 500 (e.g., using pump 310, shown in FIG. 3) creates a corresponding pressure differential at the drain port 520. Locating the recirculation port 500 away from the drain port 520 reduces fluid communication between the ports 500, 520. Thus, performance of the dishwashing appliance 100 is enhanced because the pump system 300 may not draw liquid from the drain port 520 (or a drain connected to the drain port 520).

[0035] Sump 200 may be a single piece of material. For example, sump pan 330 and sump well 350 may be a single piece of material. Sump 200 may be manufactured in a drawing operation (e.g., a deep drawing operation, etc.), for example, by drawing a metal sheet (e.g., by applying a force to the metal sheet with a die) to define sump pan 330 and sump well 350. One of ordinary skill in the art may be aware of drawing operations to define sump pan 330. For example, the grain structure of the metal of sump pan 330 may indicate that sump pan 330 has been exposed to one or more drawing operations.

[0036] Providing the sump pan 330 and sump well 350 as a single piece of material may help prevent leakage of the sump 200 and improve the performance of the dishwashing apparatus 100. In various embodiments, the deep drawn sump well 350 design is sufficient that no manifold is required, thereby avoiding potential corrosion and additional locations for future leaks, including but not limited to potential gasket leak points (e.g., seams). In some approaches, the sump 200 includes more than one component. For example, a manifold may be coupled to the sump 200 (e.g., sump pan 330). For example, the manifold may be coupled to the sump 200 with gaskets and fasteners. The manifold may include ports that allow fluid to flow from the manifold. The seams between the sump 200 and the manifold may leak due to exposure to liquid, and liquid may leak through the seams. Thus, providing the sump 200 with the sump pan 330 and sump well 350 as a single piece of material eliminates seams and may help reduce leakage from the sump 200 because, for example, the recirculation port or drain port 520 are not contained within a component separate from other portions of the sump 200.

[0037] The sump 200 may include at least one component through-hole 540. The component through-hole 540 may be configured to receive a heating element or a thermostat. The heating element may heat the liquid in the sump 200 (or dishwashing apparatus 100). The thermostat may provide a signal indicative of the temperature of the liquid in the sump 200 (or dishwashing apparatus 100). The component through-hole 640 may extend through the first wall 510 of the sump well 350, although the subject matter is not so limited.

[0038] FIG. 6 illustrates a side view of an example of the sump 200 of FIG. 3 , according to one embodiment of the present subject matter. The recirculation port 500 may include a central axis 600. The central axis 600 may be located at the center of the recirculation port 500 (e.g., the central axis 600 may be an axis aligned with the center of the recirculation port 500). The central axis 600 may be spaced from the lip 420 by a first distance 610. The first distance 610 may be 5.5 inches or more (e.g., 6.5 inches to 7 inches, 7 inches to 7.25 inches, 7.25 inches to 7.35 inches, etc.), although the present subject matter is not limited to such. The second wall 530 may be spaced from the lip 420 by a second distance 620. The second distance 620 may be 5.5 inches or more (e.g., 6 inches, 6.5 inches to 7.5 inches, 8 inches to 8.25 inches, etc.), although the present subject matter is not limited to such.

[0039] As described herein, the sump 200 may be a single piece of material, and the sump 200 may be manufactured using a drawing operation. The drawing operation may help facilitate manufacturing the sump 200 as a single piece of material with the first distance 610 being greater than 6 inches. The drawing operation may help facilitate manufacturing the sump 200 as a single piece of material with the first distance 610 being greater than 5.5 inches. The drawing operation may help facilitate manufacturing the sump 200 as a single piece of material with the second distance 620 being greater than 5.5 inches.

[0040] FIG. 7 illustrates another perspective view of an example of the dishwashing appliance 100 of FIG. 1 according to one embodiment of the present subject matter. As described herein, the body 130 may be coupled to the base 210, and the washing chamber 110 may be defined by the body 130. The base 210 may define a service compartment 220. The service compartment 220 may house one or more components 700 of the dishwashing appliance 100, such as the pump system 300 (shown in FIG. 3). The components 700 may include a pump, a reservoir 705 (e.g., a cleaning product reservoir), a hose, a heater, a transformer, and the like. The components 700 may be movably coupled to the dishwashing appliance 100, such as the base 210. A hinge 710 may facilitate movement of the components 700 and improve access to other components 700 in the service compartment 220, thereby simplifying service of the dishwashing appliance 100 (e.g., repair by a technician, etc.). The dishwashing appliance 100 may include one or more rails 715 (shown in dashed lines in FIG. 7) on which the component 700 may slide to move the component, for example to move the component to provide access to the pump system 300 (e.g., as shown in FIG. 3).

[0041] 8 shows a schematic diagram of an example of the dishwashing appliance 100 of FIG. 1 according to one embodiment of the present subject matter. The dishwashing appliance 100 may include a controller 800, which may include processing circuitry, such as a processor. The controller 800 may control one or more functions of the dishwashing appliance 100.

[0042] For example, the controller 800 may be in communication with a pump 810, e.g., a diaphragm pump. The pump 810 may deliver a cleaning product (e.g., detergent, solvent, bleach, soap, etc.) to the cleaning chamber 110 (e.g., as shown in FIG. 1 ) when the pump 810 is actuated. For example, the pump 810 may draw the cleaning product from a reservoir 820 (e.g., a container, jug, chamber, vessel, etc.). The pump 810 may deliver the cleaning product, for example, at an outlet port 815. The cleaning product may include a liquid, a gas, or a combination thereof.

[0043] One or more electrical characteristics may change corresponding to whether the pump 810 is pumping fluid (or fluid is being pumped). For example, when the pump 810 is pumping liquid, the current drawn by the pump 810 may increase. When the pump 810 is not pumping liquid, the current drawn by the pump 810 may decrease. For example, when the pump 810 is pumping gas, the current drawn by the pump 810 may decrease (compared to the current drawn by the pump 810 when the pump 810 is pumping liquid). The current drawn by the pump 810 may increase when the pump 810 is not pumping fluid (e.g., when the fluid path between the reservoir 820 and the pump 810 is occluded). Thus, the controller 800 may monitor the electrical characteristics of the pump 810 to determine, for example, whether the pump 810 is pumping fluid (or fluid is being pumped).

[0044] The controller 800 may monitor one or more electrical characteristics of the pump 810. For example, the controller 800 may be in communication with an electrical characteristic sensor 830, which facilitates monitoring of one or more electrical characteristics of the pump 810. In one example, a power source 840 provides power to the pump 810. The sensor 830 may measure one or more of a current drawn by the pump 810 or a voltage provided to the pump 810. The controller 800 may be in communication with the sensor 830, which may monitor (e.g., record, analyze, interpret, etc.) measurements provided by the sensor 830.

[0045] In one example, the electrical property sensor 830 includes a resistor (e.g., a shunt resistor, etc.). The resistor 800 may be in electrical communication with the pump (e.g., in line with the power source 840). The controller 800 may monitor the potential across the resistor. The controller 800 may determine the voltage draw by the pump 810 based on, for example, the monitored potential across the resistor. The controller 800 (or the sensor 830) may include amplifiers, signal processing circuitry, etc. to facilitate monitoring of the electrical property of the pump 810 using the controller 800.

[0046] The controller 800 may determine whether fluid is flowing through the pump 810 during operation of the pump 810. In one embodiment, the controller 800 determines a flow metric for the pump 810. The flow metric may be indicative of a flow rate through the pump 810. The controller 800 may determine the flow metric based on a monitored electrical characteristic of the pump 810. The controller 800 may update the flow metric based on a comparison of the electrical characteristic of the pump 810 to a characteristic threshold. For example, the flow metric may have a first value when the pump 810 is pumping gas. The flow metric may have a second value when the pump 810 is pumping liquid. The flow metric may have a third value when the pump 810 is not pumping fluid.

[0047] In one example, controller 800 may compare an electrical characteristic of pump 810 to a characteristic threshold (e.g., a maximum, a minimum, a limit, a rate of change, etc.). Determining whether pump 810 is pumping fluid may facilitate determining whether reservoir 820 is depleted (e.g., low, drained, empty, used up, etc.). Determining whether pump 810 is pumping fluid may facilitate determining whether pump 810 is blocked (or whether there is a blockage in the fluid line of pump 810).

[0048] In one example, the controller 800 compares the current drawn by the pump 810 to a current threshold. The controller 800 may determine that the pump 810 is pumping gas when the current drawn by the pump 810 exceeds the current threshold. For example, the pump 810 may operate at a first amperage (e.g., for a first time period) when the pump 810 is pumping liquid. The pump 810 may operate at a second amperage (e.g., for a second time period) when the pump 810 is pumping gas. The controller 800 may monitor an electrical characteristic of the pump 810 to determine, for example, that the pump 810 is pumping liquid (e.g., cleaning product from the reservoir 820). The controller 800 monitors the electrical characteristic for changes and compares the electrical characteristic (e.g., current, voltage, etc.) to a characteristic threshold (e.g., current threshold, voltage threshold, etc.). Thus, the controller 108 may determine when the pump 810 is pumping liquid, when it is pumping gas, or if the pump 810 is blocked (e.g., if the line between the pump 810 and the reservoir 820 is clogged). The controller 800 may monitor the cycle of the pump 810, for example, as the pump 810 is adjusted and liquid is pumped by the pump 810. As described in more detail herein, the controller 800 may provide a notification, for example, when the controller 108 determines that the reservoir is depleted based on the cycle of the pump 810.

[0049] The controller 800 may provide notification (e.g., by activating an indicator such as a light, noise, etc.) that fluid is not flowing through the pump 810. For example, the pump 810 may draw cleaning product from the reservoir 820. The cleaning product may be depleted from the reservoir 820 when the pump 810 is activated. As described herein, when the reservoir 820 is depleted, one or more electrical characteristics of the pump 810 may change. The controller 800 may monitor the pump 810 for changes in the electrical characteristics, and the controller 800 may generate an electrical signal that indicates whether the reservoir 820 is depleted. The controller 800 may generate an electrical signal that indicates whether the pump 810 is blocked. The controller 800 may generate an electrical signal that indicates whether gas has flowed through the pump 810 (e.g., when a measured electrical characteristic exceeds a characteristic threshold). As a result, the user may be notified that the reservoir 820 is depleted or that flow through the pump 810 is blocked, and the user may add additional cleaning product to the reservoir 820 (or perform other maintenance tasks, such as purging the unit). Thus, the controller 800 may improve the performance of the dishwashing appliance 100, for example, because the controller 800 may ensure that the appliance 100 is operating with a sufficient amount of cleaning product to clean the items in the wash chamber 110 (e.g., as shown in FIG. 1).

[0050] In some examples, the controller 800 may monitor the cycle of the pump 810, for example, as the pump 810 is adjusted and liquid is pumped by the pump 810. The controller 800 may provide a notification, for example, when the controller 108 determines that the reservoir 820 is depleted based on the cycle of the pump 810. The controller 800 may provide a notification that the reservoir 820 is depleted based on monitoring the cycle of the pump 810. In one example, the controller 800 adjusts the pump 810 to pump a specified amount of cleaning product per cycle (e.g., per dishwashing cycle). The controller 800 monitors the pump 810 and the cycle of the pump 810. The controller 800 may determine a product level in the reservoir 820, for example, based on monitoring the cycle of the pump 810. In some examples, controller 800 provides notification (e.g., commands, electrical signals, etc.) that the reservoir is depleted, for example, when reservoir 820 reaches 20 percent of its full capacity (although the subject matter is not so limited). In some examples, controller 800 may send a notification when controller 800 determines that pump 810 is blocked, for example, to notify a technician that device 100 may need to be serviced.

[0051] As described herein, the controller 800 may determine whether the pump 810 is pumping liquid or gas (or, for example, the pump 810 is blocked and not pumping liquid or gas). The controller 800 may, for example, use the determination of whether the pump 810 is pumping liquid or gas to adjust the pump 810 to prime the pump 810. In one embodiment, the product reservoir 820 (or reservoir 705 shown in FIG. 5) may be depleted (e.g., when the pump 810 has drawn all of the cleaning product from the reservoir 820). Depletion of the reservoir 820 may draw gas (e.g., air, etc.) into the pump 810, and thus the pump 810 may lose its prime. The first (e.g., depleted, used, current, existing, etc.) reservoir 820 may be replaced with a second reservoir 820 (e.g., new, etc.). The reservoir 820 may be manually refilled. The pump 810 may need to be primed, for example, because the pump 810 lost its prime when the reservoir 820 was depleted. Thus, the controller 800 may regulate the pump 810 to purge gas from the pump 810 and draw liquid from a second (e.g., new) reservoir 820. Thus, the controller 800 may prime the pump 810, for example, when the controller 800 determines that the pump 810 is (or has pumped) gas (instead of liquid).

[0052] FIG. 9 illustrates a block diagram of an example machine 900 on which any one or more of the techniques (e.g., methods) discussed herein may be performed, according to one embodiment of the present subject matter. The machine 900 may include the controller 800 (shown in FIG. 8). As described herein, the embodiments may include or operate on logic or some components or mechanisms within the machine 900. Circuitry (e.g., processing circuitry) is a collection of circuits implemented in the tangible entity of the machine 900, including hardware (e.g., simple circuits, gates, logic, etc.). Circuitry membership may be flexible over time. Circuitry includes members that, when operational, may perform specified operations, either alone or in combination. In one embodiment, the hardware of the circuitry may be invariably designed (e.g., hard-wired) to perform specific operations. In one embodiment, the hardware of the circuitry may include variably connected physical components (e.g., execution units, transistors, simple circuits, etc.) that include machine-readable media that have been physically altered (e.g., magnetically, electrically, with movable arrangements of invariable bulk particles, etc.) to encode instructions for a particular operation. In connecting the physical components, the basic electrical properties of the hardware components are altered, for example, from an insulator to a conductor, or vice versa. The instructions enable the embedded hardware (e.g., execution units, load mechanisms, etc.) to create members of the circuitry in the hardware through the variable connections to perform portions of a particular operation when in operation. Thus, in one embodiment, the machine-readable media elements are part of the circuitry or are communicatively coupled to other components of the circuitry when the device is in operation. In one embodiment, any of the physical components may be used in more than one member of more than one circuitry. For example, during operation, an execution unit may be used by a first circuit in a first circuitry at one time and reused at a different time by a second circuit in the first circuitry or by a third circuit in the second circuitry. Additional examples of these components with respect to machine 900 are provided below.

[0053] In alternative embodiments, machine 900 may operate as a standalone device or may be connected (e.g., networked) to other machines. In a networked deployment, machine 900 may operate in a server-client network environment in the capacity of a server machine, a client machine, or both. In one example, machine 900 may function as a peer machine in a peer-to-peer (P2P) (or other distributed) network environment. Machine 900 may be a personal computer (PC), tablet PC, set-top box (STB), personal digital assistant (PDA), mobile phone, web appliance, network router, switch or bridge, or any machine capable of executing instructions (sequential or otherwise) that specify actions to be taken by that machine. Furthermore, although only a single machine is shown, the term "machine" shall also be construed to include any collection of machines that individually or collectively execute a set (or sets) of instructions to perform any one or more of the methods discussed herein, such as cloud computing, software as a service (SaaS), other computer cluster configurations, etc.

[0054] The machine (e.g., computer system) 900 may include a hardware processor 902 (e.g., a central processing unit (CPU), a graphics processing unit (GPU), a hardware processor core, or any combination thereof), a main memory 904, a static memory (e.g., firmware, microcode, basic input / output (BIOS), unified extensible firmware interface (UEFI), etc.) 906, and a mass storage device 908 (e.g., a hard drive, a tape drive, flash storage, or other block devices), some or all of which may communicate with each other via an interlink (e.g., a bus) 930. The machine 900 may further include a display unit 910, an alphanumeric input device 912 (e.g., a keyboard), and a user interface (UI) navigation device 914 (e.g., a mouse). In one embodiment, the display unit 910, the input device 912, and the UI navigation device 914 may be touch screen displays. The machine 900 may additionally include a storage device (e.g., a drive unit) 908, a signal generating device 918 (e.g., a speaker), a network interface device 920, and one or more sensors 916, such as a global positioning system (GPS) sensor, a compass, an accelerometer, or other sensor. The machine 900 may include an output controller 928, such as a serial (e.g., Universal Serial Bus (USB), parallel, or other wired or wireless (e.g., infrared (IR), near field communication (NFC), etc.) connection, to communicate with or control one or more peripheral devices (e.g., a printer, a card reader, etc.).

[0055] The registers of the processor 902, the main memory 904, the static memory 906, or the mass storage device 908 may be or include a machine-readable medium 922 on which is stored one or more sets of data structures or instructions 924 (e.g., software) that embody or are utilized by any one or more of the techniques or functions described herein. The instructions 924 may also reside, completely or at least partially, within any of the registers of the processor 902, the main memory 904, the static memory 906, or the mass storage device 908 during its execution by the machine 900. In one embodiment, one or any combination of the hardware processor 902, the main memory 904, the static memory 906, or the mass storage device 908 may constitute the machine-readable medium 922. Although the machine-readable medium 922 is illustrated as a single medium, the term "machine-readable medium" may include a single medium or multiple media (e.g., a centralized or distributed database, and / or associated caches and servers) configured to store one or more instructions 924.

[0056] The term "machine-readable medium" may include any medium capable of storing, encoding, or transmitting instructions for execution by the machine 900, causing the machine 900 to perform any one or more of the techniques of this disclosure, or capable of storing, encoding, or transmitting data structures used by or associated with such instructions. Non-limiting examples of machine-readable media may include solid-state memory, optical media, magnetic media, and signals (e.g., radio frequency signals, other photon-based signals, audio signals, etc.). In one embodiment, a non-transient machine-readable medium includes a machine-readable medium having a plurality of particles having a fixed (e.g., stationary) mass, and thus is a composition of matter. Thus, a non-transient machine-readable medium is a machine-readable medium that does not include a transitory propagating signal. Examples of non-transitory machine-readable media may include non-volatile memory such as semiconductor memory devices (e.g., electrically programmable read-only memory (EPROM), electrically erasable programmable read-only memory (EEPROM)) and flash memory devices, magnetic disks such as internal hard disks and removable disks, magneto-optical disks, and CD-ROM and DVD-ROM disks.

[0057] The instructions 924 may further be transmitted or received over a communications network 926 using a transmission medium via a network interface device 920 utilizing any one of a number of transport protocols (e.g., Frame Relay, Internet Protocol (IP), Transmission Control Protocol (TCP), User Datagram Protocol (UDP), Hypertext Transfer Protocol (HTTP), etc.). Exemplary communications networks may include local area networks (LANs), wide area networks (WANs), packet data networks (e.g., the Internet), mobile telephone networks (e.g., cellular networks), plain old telephone (POTS) networks, and wireless data networks (e.g., the Institute of Electrical and Electronics Engineers (IEEE) 802.11 family of standards known as Wi-Fi®, the IEEE 802.16 family of standards known as WiMAX®), the IEEE 802.15.4 family of standards, peer-to-peer (P2P) networks, among others. In one embodiment, the network interface device 920 may include one or more physical jacks (e.g., Ethernet, coaxial, or telephone jacks) or one or more antennas for connecting to the communications network 926. In one embodiment, the network interface device 920 may include multiple antennas for wireless communication using at least one of single-input multiple-output (SIMO), multiple-input multiple-output (MIMO), or multiple-input single-output (MISO) techniques. The term "transmission medium" shall be taken to include any intangible medium capable of storing, encoding, or conveying instructions for execution by the machine 900, including digital or analog communication signals, or other intangible medium for facilitating the communication of such software. A transmission medium is a machine-readable medium.

[0058] FIG. 10 shows a schematic diagram of one example of the sump 200 of FIG. 3 , according to one embodiment of the present subject matter. As described herein, the seal 1000 (e.g., weld bead, connection, joint, seam, etc.) between the recirculation port 500 and the recirculation flange 360 ​​(shown in FIG. 3 ) may be exposed to liquid. The exposure of the seal 1000 to liquid may be reduced, for example, by locating the recirculation port 500 in the first wall 510 of the sump well 350 (instead of the second wall 530 that contains the drain port 520). Reducing the exposure of the seal to liquid may reduce leakage past the seal, for example, dripping from the sump well 350 into the service compartment 220 (shown in FIG. 2 ).

[0059] In some embodiments, the inner diameter 1010 of the recirculation flange 360 ​​may be greater than or equal to the diameter 1020 of the recirculation port 500. For example, the seal 1000 may be coupled with the first wall 510 and the recirculation flange 360. The seal 1000 may extend around the exterior of the recirculation flange 360, and the recirculation port 500 may be located on the interior of the recirculation flange 360. Thus, the seal 1000 between the recirculation flange 360 ​​and the recirculation port 500 may be enhanced (e.g., because the seal 1000 is exposed to less liquid).

[0060] Working Example Example 1 is a sump for a dishwashing apparatus having a wash chamber, the sump connected to a recirculation pump; a sump pan including a pan inlet, the sump pan coupled to the wash chamber, the pan inlet positioned to receive liquid from the wash chamber; and a sump well coupled to the sump pan and configured to collect liquid from the sump pan, the well inlet in communication with the sump pan to receive liquid from the sump pan, a recirculation port extending through a first wall of the sump well, the recirculation port configured to provide liquid from the samp well to the recirculation pump, a drain port extending through a second wall of the samp well, the second wall defining a bottom of the samp well, wherein the sump pan and the samp well are formed from a single piece of material to avoid seams and joints between the sump pan and the samp well.

[0061] In Example 2, the subject matter of Example 1 optionally includes the sump pan including a lip configured to mate with a wash chamber of a dishwashing apparatus and a liquid containment portion corresponding to a maximum liquid level in the sump and below the lip.

[0062] In Example 3, the subject matter of Example 2 optionally includes inches away from the lip.

[0063] In Example 4, the subject matter of any one or more of Examples 1-3 optionally includes a recirculation flange coupled to the first wall of the sump well, the recirculation flange in communication with the recirculation port, the recirculation flange configured to couple to a hose.

[0064] In Example 5, the subject matter of any one or more of Examples 1-4 optionally includes, the recirculation flange extending at an angle from the first wall.

[0065] In Example 6, the subject matter of any one or more of Examples 1-5 optionally includes, wherein the recirculation port is located proximate to the second wall.

[0066] In Example 7, the subject matter of any one or more of Examples 1-6 optionally includes, wherein the recirculation port is located away from the drain port.

[0067] In Example 8, the subject matter of any one or more of Examples 1-7 optionally includes at least one heating element through hole extending through the first wall, the heating element through hole configured to receive a portion of a heating element, and at least one thermostat through hole extending through the first wall, the thermostat through hole configured to receive a portion of a thermostat.

[0068] In example 9, the subject matter of any one or more of examples 1-8 optionally includes being inches away from the lip of the sump pan.

[0069] Example 10 is a dishwashing apparatus comprising: a wash chamber; a sump; a sump pan including a pan inlet, the sump pan configured to couple to the wash chamber, the pan inlet configured to receive liquid from the wash chamber; and a sump well coupled to the sump pan and configured to collect liquid from the sump pan, the well inlet in communication with the sump pan, the sump pan configured to convey liquid to the well inlet; a recirculation port extending through a first wall of the sump well, the recirculation port configured to supply liquid to a recirculation pump; a drain port extending through a second wall of the sump well, the second wall defining a bottom of the sump well; and a sump well including the drain port, the drain port extending through a second wall of the sump well, the second wall defining a bottom of the sump well, wherein the sump pan and the sump well are formed from a single piece of material.

[0070] In Example 11, the subject matter of Example 10 optionally includes a sump included at the bottom of the wash chamber.

[0071] In Example 12, the subject matter of any one or more of Examples 10 and 11 optionally includes a base including a service compartment, the washing chamber coupled to the base and the sump located at least partially within the service compartment, and a component hinged to the base, the component movable to enhance access to the service compartment.

[0072] In Example 13, the subject matter of any one or more of Examples 10-12 optionally includes, wherein a maximum liquid level in the sump is below an interface where the wash chamber is coupled to the sump.

[0073] In Example 14, the subject matter of Example 13 optionally includes the wash chamber being coupled to a lip of the sump, the lip being located between the maximum liquid level and the wash chamber.

[0074] In Example 15, the subject matter of any one or more of Examples 10-14 optionally includes a diaphragm pump in communication with a cleaning chamber and configured to supply a cleaning product to the cleaning chamber during operation of the diaphragm pump; and a controller including a processor configured to monitor one or more electrical characteristics of the diaphragm pump, determine a flow metric indicative of whether fluid is flowing through the diaphragm pump during operation of the diaphragm pump based on the monitored electrical characteristics of the diaphragm pump, and provide a notification if fluid is not flowing through the diaphragm pump during operation of the diaphragm pump based on the flow metric.

[0075] Example 16 is a dishwashing apparatus comprising: a cleaning product reservoir configured to store a cleaning product; a diaphragm pump in communication with the cleaning product reservoir and configured to supply a cleaning product to a wash chamber of the dishwashing apparatus during operation of the diaphragm pump; and a controller including a processor configured to monitor one or more electrical characteristics of the diaphragm pump and determine a flow metric indicative of whether fluid is flowing through the diaphragm pump during operation of the diaphragm pump based on the monitored electrical characteristics of the diaphragm pump.

[0076] In Example 17, the subject matter of Example 16 optionally includes where the controller including the processor is further configured to provide a notification if fluid is not flowing through the diaphragm pump during operation of the diaphragm pump based on the flow metric.

[0077] In Example 18, the subject matter of any one or more of Examples 16-17 optionally includes where the controller including the processor is further configured to compare the monitored electrical characteristic of the diaphragm pump to a characteristic threshold value and provide a notification when the monitored electrical characteristic exceeds the characteristic threshold value.

[0078] In Example 19, the subject matter of any one or more of Examples 16-18 optionally includes where the controller including the processor is further configured to monitor a current draw by the diaphragm pump, compare the current draw by the diaphragm pump to a current threshold, and provide an occlusion notification indicating whether the diaphragm pump is occluded when the current draw by the diaphragm pump exceeds the current threshold.

[0079] In Example 20, the subject matter of any one or more of Examples 16-19 optionally includes that the controller including the processor is further configured to monitor a voltage difference across the diaphragm pump, compare the voltage difference across the diaphragm pump to a voltage threshold, and provide a depletion notification indicating whether the cleaning product reservoir is depleted when the voltage difference across the diaphragm pump exceeds the voltage threshold.

[0080] In Example 21, the subject matter of any one or more of Examples 16-20 optionally includes an electrical property sensor configured to measure one or more electrical properties of the diaphragm pump, the electrical properties including one or more of a current draw by the diaphragm pump, or a voltage difference across the diaphragm pump.

[0081] In Example 22, the subject matter of any one or more of Examples 16-21 optionally includes, where the controller including the processor is further configured to adjust the diaphragm pump to prime the diaphragm pump when the controller determines that the diaphragm pump has pumped gas.

[0082] Example 23 is a sump for a dishwashing apparatus having a wash chamber, the sump connected to a recirculation pump, the sump pan including a pan inlet, the sump pan coupled to the wash chamber, the pan inlet configured to receive liquid from the wash chamber; and a sump well coupled to the sump pan and configured to collect liquid from the sump pan, the well inlet in communication with the sump pan to receive liquid from the sump pan, a recirculation port extending through a first wall of the samp well, the recirculation port configured to provide liquid from the samp well to the recirculation pump, a drain port extending through a second wall of the samp well, the second wall defining a bottom of the samp well, wherein the sump pan and the samp well are formed from a single piece of material to avoid seams and joints between the sump pan and the samp well.

[0083] In Example 24, the subject matter of Example 23 optionally includes the sump pan including a lip configured to be coupled with a wash chamber of a dishwashing apparatus and a liquid containment portion corresponding to a maximum liquid level in the sump and below the lip.

[0084] In Example 25, the subject matter of any one or more of Examples 23 and 24 optionally includes a recirculation flange coupled to the first wall of the sump well, the recirculation flange in communication with the recirculation port, and the recirculation flange configured to couple to a hose.

[0085] In Example 26, the subject matter of any one or more of Examples 23-25 ​​optionally includes, wherein the recirculation port is located away from the drain port.

[0086] Example 27 is a dishwashing apparatus comprising: a wash chamber; a sump; a sump pan including a pan inlet, the sump pan configured to couple to the wash chamber, the pan inlet configured to receive liquid from the wash chamber; and a sump well coupled to the sump pan and configured to collect liquid from the sump pan, the well inlet in communication with the sump pan, the sump pan configured to convey liquid to the well inlet; a recirculation port extending through a first wall of the sump well, the recirculation port configured to supply liquid to a recirculation pump; a drain port extending through a second wall of the sump well, the second wall defining a bottom of the sump well; and a sump well including the drain port, the sump pan and the sump well formed from a single piece of material.

[0087] In Example 28, the subject matter of Example 27 optionally includes a base including a service compartment, the washing chamber coupled to the base and the sump located at least partially within the service compartment, and a component hinged to the base, the component being movable to enhance access to the service compartment.

[0088] In Example 29, the subject matter of any one or more of Examples 27 and 28 optionally includes, wherein a maximum liquid level in the sump is below an interface where the wash chamber is coupled to the sump.

[0089] In Example 30, the subject matter of Example 29 optionally includes, the wash chamber being coupled to a lip of the sump, the lip being located between the maximum liquid level and the wash chamber.

[0090] In Example 31, the subject matter of any one or more of Examples 27-30 optionally includes a diaphragm pump in communication with a cleaning chamber and configured to supply a cleaning product to the cleaning chamber during operation of the diaphragm pump; and a controller including a processor configured to monitor one or more electrical characteristics of the diaphragm pump, determine a flow metric indicative of whether fluid is flowing through the diaphragm pump during operation of the diaphragm pump based on the monitored electrical characteristics of the diaphragm pump, and provide a notification if fluid is not flowing through the diaphragm pump during operation of the diaphragm pump based on the flow metric.

[0091] Example 32 is a dishwashing apparatus comprising: a cleaning product reservoir configured to store a cleaning product; a diaphragm pump in communication with the cleaning product reservoir and configured to supply a cleaning product to a wash chamber of the dishwashing apparatus during operation of the diaphragm pump; and a controller including a processor configured to monitor one or more electrical characteristics of the diaphragm pump and determine a flow metric indicative of whether fluid is flowing through the diaphragm pump during operation of the diaphragm pump based on the monitored electrical characteristics of the diaphragm pump.

[0092] In Example 33, the subject matter of Example 32 optionally includes, where the controller including the processor is further configured to provide a notification if fluid is not flowing through the diaphragm pump during operation of the diaphragm pump based on the flow metric.

[0093] In Example 34, the subject matter of any one or more of Examples 32 and 33 optionally includes, where the controller including the processor is further configured to compare the monitored electrical characteristic of the diaphragm pump to a characteristic threshold value and provide a notification when the monitored electrical characteristic exceeds the characteristic threshold value.

[0094] In Example 35, the subject matter of any one or more of Examples 32-34 optionally includes that the controller including the processor is further configured to monitor a current draw by the diaphragm pump, compare the current draw by the diaphragm pump to a current threshold, and provide an occlusion notification indicating whether the diaphragm pump is occluded when the current draw by the diaphragm pump exceeds the current threshold.

[0095] In Example 36, the subject matter of any one or more of Examples 32-35 optionally includes that the controller including the processor is further configured to monitor a voltage difference across the diaphragm pump, compare the voltage difference across the diaphragm pump to a voltage threshold, and provide a depletion notification indicating whether the cleaning product reservoir is depleted when the voltage difference across the diaphragm pump exceeds the voltage threshold.

[0096] In Example 37, the subject matter of any one or more of Examples 32-36 optionally includes where the controller including the processor is further configured to adjust the diaphragm pump to prime the diaphragm pump when the controller determines that the diaphragm pump has pumped gas.

[0097] Example 38 may include or use any part or combination of any part of any one or more of Examples 1-37, or may include or use a machine-readable medium including means for performing any one or more of the functions of Examples 1-37, optionally in combination with any one or more of Examples 1-37, or instructions that, when executed by a machine, cause the machine to perform any one or more of the functions of Examples 1-37.

[0098] This detailed description includes references to the accompanying drawings, which form a part of the detailed description. The drawings show, by way of illustration, specific embodiments in which the invention may be practiced. These embodiments are also referred to herein as "examples." Such examples may include elements in addition to those shown or described. However, the inventors also contemplate examples in which only those elements shown or described are provided.

[0099] In this document, the terms "a" or "an" are used, as is common in the patent literature, to include one or more, regardless of other instances or uses of "at least one" or "one or more." In the claims that follow, the terms "first," "second," and "third," etc. are used merely as labels and are not intended to impose numerical requirements on their objects.

[0100] The above description is intended to be illustrative, and not limiting. For example, the above examples (or one or more examples thereof) may be used in combination with each other. Upon reviewing the above description, other embodiments may be used by those of ordinary skill in the art, and the like.

Claims

1. 1. A dishwashing apparatus having a wash chamber, comprising: a cleaning product reservoir configured to store a cleaning product; a pump in communication with the cleaning product reservoir and configured to supply the cleaning product to the cleaning chamber during operation of the pump; A controller including a processor, monitoring one or more electrical characteristics of the pump; a controller configured to determine a flow metric indicative of whether fluid is flowing through the pump during operation of the pump based on the monitored electrical characteristic of the pump.

2. The dishwashing appliance of claim 1 , wherein the controller is further configured to provide a notification if fluid is not flowing through the pump during operation of the pump based on the flow metric.

3. The controller further comprises: comparing the monitored electrical characteristic of the pump to a characteristic threshold; The dishwashing appliance of claim 2 , configured to provide a notification when the monitored electrical characteristic exceeds the characteristic threshold.

4. The controller further comprises: monitoring the current drawn by the pump; comparing the current drawn by the pump to a current threshold; The dishwashing appliance of claim 3 , configured to provide a blockage notification indicating whether the pump is blocked when the current drawn by the pump exceeds the current threshold.

5. The controller further comprises: monitoring a voltage difference across the pump; comparing the voltage difference across the pump to a voltage threshold; 4. The dishwashing appliance of claim 3, configured to provide a depletion notification indicating whether the cleaning product reservoir is depleted when the voltage differential across the pump exceeds the voltage threshold.

6. 6. A dishwashing appliance according to claim 4 or 5, wherein the controller is further configured to regulate the pump to prime the pump when the controller determines that the pump has pumped gas.

7. 6. A dishwashing appliance as claimed in claim 4 or 5, further comprising an electrical property sensor configured to measure the one or more electrical properties of the pump, and wherein the controller is configured to monitor the one or more electrical properties of the pump measured by the electrical property sensor.

8. A dishwashing appliance according to any preceding claim, wherein the pump comprises a diaphragm pump.

9. the dishwashing apparatus further comprises a sump; The sump is a sump pan including a pan inlet, the sump pan configured to couple with the wash chamber, the pan inlet configured to receive liquid from the wash chamber; a sump well coupled to the sump pan and configured to collect liquid from the sump pan; a well inlet in communication with the sump pan, the sump pan configured to deliver liquid to the well inlet; a recirculation port extending through a first wall of the sump well and configured to supply liquid to a recirculation pump; and a sampwell including a drain port extending through a second wall defining a bottom of the sampwell; A dishwashing appliance according to any preceding claim, wherein the sump pan and the sump well are formed from a single piece of material.

10. a base including a service compartment, the wash chamber coupled to the base and the sump located at least partially within the service compartment; 10. The dishwashing appliance of claim 9, further comprising a component hinged to the base, the component being movable to provide enhanced access to the service compartment.

11. 11. A dishwashing appliance according to claim 10, wherein the maximum liquid level in the sump is below the interface where the wash chamber is joined to the sump.

12. 12. A dishwashing appliance according to claim 11, wherein the wash chamber is coupled to a lip of the sump, the lip being located between the maximum liquid level and the wash chamber.

13. a cleaning chamber; a sump coupled to the wash chamber and formed from a single piece of material; a cleaning product reservoir configured to store a cleaning product; a cleaning product pump in communication with the cleaning product reservoir and configured to supply cleaning product to the cleaning chamber during operation of the cleaning product pump; A controller including a processor, monitoring one or more electrical characteristics of the cleaning product pump; determining a flow metric indicative of whether fluid is flowing through the cleaning product pump during operation of the cleaning product pump based on the monitored one or more electrical characteristics of the cleaning product pump; a controller configured to provide a notification if fluid is not flowing through the cleaning product pump during operation of the cleaning product pump based on the flow metric.

14. the dishwashing appliance comprising a recirculation pump configured to recirculate liquid within the dishwashing appliance; The sump is a sump pan including a pan inlet, the sump pan configured to couple with the wash chamber, the pan inlet configured to receive liquid from the wash chamber; a sump well coupled to the sump pan and configured to collect liquid from the sump pan; a well inlet in communication with the sump pan, the sump pan configured to deliver liquid to the well inlet; a recirculation port extending through a first wall of the sump well and configured to supply liquid to the recirculation pump; and a sampwell including a drain port extending through a second wall of the sampwell; 14. The dishwashing appliance of claim 13, wherein the second wall defines the bottom of the sump well.

15. A dishwashing appliance according to claim 13 or 14, wherein the cleaning product pump comprises a diaphragm pump.

16. The processor further comprises: comparing the one or more monitored electrical characteristics of the cleaning product pump to a characteristic threshold; 16. The dishwashing appliance of claim 15, configured to provide a notification when the monitored electrical characteristic exceeds the characteristic threshold.

17. 17. A dishwashing appliance according to claim 16, wherein the one or more monitored electrical characteristics of the cleaning product pump include a current draw of the cleaning product pump or a voltage difference across the cleaning product pump.

18. 18. The dishwashing appliance of claim 17, wherein the processor is further configured to regulate the cleaning product pump to prime the cleaning product pump when the controller determines that the cleaning product pump has pumped gas.