Polishing material slurry and polishing method for the same

Abstract

To provide a polishing material slurry that has excellent dispersibility and a high polishing rate.SOLUTION: A polishing material slurry includes manganese oxide polishing particles containing manganese oxide particles, permanganate ions, and phosphates. The content of manganese oxide polishing particles is 0.5 mass% or more and 20 mass% or less. The permanganate ion content is 0.5 mass% or more and 3.2 mass% or less. The phosphate content is 0.01 mass% or more and 0.1 mass% or less.SELECTED DRAWING: None