Wafer container and purge system

Abstract

A wafer container is provided that includes a purge diffuser for purging moist air from the area corresponding to the lower slot. In a wafer container (200), diffusers (222) are positioned closer to the wafer container's centerline (CL), improving purge gas distribution within the wafer container. The diffusers can be positioned to correspond to a recessed center panel (212) in the rear wall, and can be positioned so that the angle between the diffusers relative to the center of the wafers contained within the wafer container is 60 degrees or less. The diffusers are joined to the purge ports by offset connectors (220a, 220b) oriented so that the diffusers are closer to the wafer container's centerline than the purge ports (218a, 218b). The distance from each diffuser to the wafer container's centerline is less than one-quarter of the diameter of the wafers contained within the wafer container.

Description

[Technical Field]

[0001] The present disclosure is directed to a wafer container that includes a purge diffuser for purging moist air from the wagering container, particularly for purging moist air from an area corresponding to a lower slot of the wagering container. [Background technology]

[0002] Wafer containers are used during the storage and processing of wafers, such as semiconductor wafers. During some process steps, undesirable gases, such as moist air, may be present within the wafer container. The undesirable gases can be purged by introducing a purge gas into the wafer container. However, the constrained structure of wafer containers and the required standard features of such containers can limit the purge performance in such wafer containers. Summary of the Invention

[0003] The present disclosure is directed to a wafer container that includes a purge diffuser for purging moist air from the wagering container, particularly for purging moist air from an area corresponding to a lower slot of the wagering container.

[0004] In the wafer container according to the embodiment, the diffusers are offset from their respective purge ports toward the centerline of the container. This positions the diffusers closer together along the back wall at a location corresponding to the center panel of the back wall. This also reduces the angle between the diffusers relative to each other about the center of the wafer and relative to the centerline of the wafer container when the wafer is stored in the wafer container. The positioning of the diffusers relative to the container and wafer features results in improved distribution of purge gas, allowing for more effective purging of the lower slots of the wafer container.

[0005] In one embodiment, the wafer container includes a top wall, a bottom wall, a first side wall, a second side wall, and a rear wall. The top wall, bottom wall, first side wall, second side wall, and rear wall define an interior space. The interior space is configured to accommodate one or more wafers. The wafer container further includes a first diffuser positioned within the interior space and a second diffuser positioned within the interior space. When the one or more wafers are accommodated within the interior space, an angle between the first diffuser and the second diffuser relative to a central axis of the one or more wafers is 60 degrees or less, and the central axis extends through the center of each of the one or more wafers perpendicular to a plane of the one or more wafers.

[0006] In one embodiment, the first diffuser is located on a first side of a centerline of the interior space, the centerline being evenly spaced between the first sidewall and the second sidewall, and the second diffuser is located on a second side of the centerline of the interior space, the centerline extending perpendicular to the opening of the wafer container and intersecting the central axis of the one or more wafers.

[0007] In one embodiment, the angle between the centerline and the first diffuser relative to the central axis is 30 degrees or less, and the angle between the centerline and the second diffuser relative to the central axis is 30 degrees or less.

[0008] In one embodiment, the wafer container includes a top wall, a bottom wall, a first side wall, a second side wall, and a rear wall. The top wall, bottom wall, first side wall, second side wall, and rear wall define an interior space. The interior space has a centerline evenly spaced between the first and second side walls, the centerline being perpendicular to the rear wall. The wafer container further includes a first diffuser positioned within the interior space on a first side of the centerline and a second diffuser positioned within the interior space on a second side of the centerline. The wafer container is configured to accommodate one or more wafers having a predetermined diameter. The first diffuser is spaced from the centerline by a distance less than one-quarter of the predetermined diameter, and the second diffuser is spaced from the centerline by a distance less than one-quarter of the predetermined diameter.

[0009] In one embodiment, the wafer container includes a top wall, a bottom wall, a first side wall, a second side wall, and a rear wall. The top wall, bottom wall, first side wall, second side wall, and rear wall define an interior space. The rear wall includes a central panel, which is recessed relative to the exterior of the wafer container. The wafer container further includes a first diffuser positioned within the interior space and a second diffuser positioned within the interior space. The first diffuser is separated from the second diffuser in a direction parallel to the plane of the rear wall by a distance less than the width of the central panel of the rear wall.

[0010] In one embodiment, the wafer container includes a top wall, a bottom wall, a first side wall, a second side wall, and a rear wall. The top wall, bottom wall, first side wall, second side wall, and rear wall define an interior space. The interior space has a centerline evenly spaced between the first and second side walls, the centerline being perpendicular to the rear wall. The wafer container further includes a first purge port formed in the bottom wall and a first diffuser located within the interior space on a first side of the centerline, the first diffuser connected to the first purge port. The wafer container also includes a second purge port formed in the bottom wall and a second diffuser located within the interior space on a second side of the centerline, the second diffuser connected to the second purge port. The first diffuser is spaced from the centerline by a distance less than the distance from the centerline to the first purge port, and the second diffuser is spaced from the centerline by a distance less than the distance from the centerline to the second purge port. [Brief explanation of the drawings]

[0011] [Figure 1A] FIG. 1 is a front view of a wafer container according to one embodiment. [Figure 1B] FIG. 1B is a front view of the wafer container of FIG. 1A when wafers have been added to the wafer container. [Figure 2] FIG. 1 is a cross-sectional view of a wafer container according to one embodiment. DETAILED DESCRIPTION OF THE INVENTION

[0012] The present disclosure is directed to a wafer container that includes a purge diffuser for purging moist air from the wagering container, particularly for purging moist air from an area corresponding to a lower slot of the wagering container.

[0013] FIG. 1A shows a front view of a wafer container according to one embodiment. The wafer container 100 includes a first sidewall 102, a second sidewall 104, a bottom wall 106, and a second side 108. The first sidewall 102, the second sidewall 104, the bottom wall 106, and the top wall 108 define a front opening 110 of the wafer container 100. A rear wall 112 surrounds the rear end and forms an interior space of the wafer container 100. The rear wall includes protruding corner portions 114 where the rear wall 112 meets the first and second sidewalls 102, 104, and a recessed center panel 116 at the center of the rear wall 112 between the protruding corner portions 114. The first and second sidewalls 102, 104 each include a flange 118 that protrudes into the interior space, defining a wafer slot each configured to support a wafer. The wafer container 100 includes diffusers 120, each attached to one of the first or second offset connectors 122a and 122b.

[0014] The wafer container 100 is a container configured to accommodate one or more wafers. The wafer container 100 may be, for example, a front-opening unified pod (FOUP). The size of the wafer container 100 may be based on a predetermined size of wafers to be stored in the wafer container 100. The predetermined size may be any size suitable for the wafers. Non-limiting examples of wafer sizes that the wafer container 100 may be configured to accommodate include 450 mm wafers or 300 mm wafers. In one embodiment, the wafer container 100 is configured to accommodate 300 mm wafers.

[0015] The first sidewall 102, the second sidewall 104, the bottom wall 106, the top wall 108, and the rear wall 112 define the wafer container 100, including an interior space. The front opening 110 can be sized to allow wafers to be inserted into or removed from the wafer container 100. In one embodiment, a door (not shown) can be provided surrounding the front opening 110. In one embodiment, the front opening 110 can allow fluid to exit the wafer container 100, for example, during a purging operation. Wafers placed within the interior space can each be placed within a wafer slot supported by flanges 118 on the first and second sidewalls 102 and 104.

[0016] The rear wall 112 may include a protruding corner portion 114. The protruding corner portion 114 may be positioned on an outer portion of the rear wall 112, where the rear wall 112 intersects with the first side wall 102 or the second side wall 104, respectively. The protruding corner portion 114 may protrude outward relative to the interior space, i.e., away from the viewer in the front view of FIG. 1A. A central panel 116 may be positioned between the protruding corner portions 114. The central panel 116 may intersect the centerline CL of the wafer container 100. The central panel may be recessed relative to the protruding corner portion 114 into the interior space, i.e., away from the viewer in the front view of FIG. 1A. The centerline CL is a line evenly spaced between the first sidewall 102 and the second sidewall 104. The central panel 116 of the rear wall 112 may have a centerline that is collinear with the centerline CL of the wafer container 100.

[0017] The diffuser 120 is configured to distribute purge gas within the interior space of the wafer container 100. The diffuser 120 can be any suitable diffuser for distributing purge gas. In one embodiment, the diffuser 120 is a tube made of a porous material. In one embodiment, the diffuser 120 is a diffuser tower. Each diffuser 120 is connected to one of a first offset connector 122a or a second offset connector 122b. The offset connectors 122a, b provide a connection between the diffuser 120 and a rear purge port (not shown, but can be seen in FIG. 2 and described below) configured to receive a supply of purge gas. The offset connectors 122a, b provide an offset between the center of the purge port and the center of the diffuser 120 connected to that purge port. In one embodiment, the offset provided by the offset connectors 122a, b is such that the diffuser 120 is closer to the centerline CL of the wafer container 100 than the purge port.

[0018] In one embodiment, the location of the diffusers 120 can be understood with reference to the central panel 116 of the rear wall 112. In one embodiment, the diffusers 120 are positioned such that the diffusers 120 are within the perimeter of the central panel 116 when viewed in a front view, such as the front view of FIG. 1A. The distance D between the diffusers 120 can be less than the width W of the central panel 116.

[0019] FIG. 1B shows a front view of the wafer container of FIG. 1A when wafers are added to the wafer container. Wafers 150 are loaded into the wafer container 100 through the front opening 110, whereby each wafer rests on the flange 118 that defines a wafer slot. In one embodiment, when the wafers 150 are positioned in the wafer slots, a central axis extending vertically through the center of each wafer can be defined. The central axis can be in a plane with the centerline CL of the wafer container 100. In one embodiment, the positions of the diffusers 120 can be defined by respective angles formed about the central axis, as shown in FIG. 2 and described below. In one embodiment, the positions of the diffusers 120 can be such that the diffusers 120 are spaced apart a distance based on the diameter of the wafers 150 that the wafer container 100 is configured to accommodate. The distance between the diffusers 120 can be, for example, ¼ or less of the diameter of the wafers 150 that the wafer container 100 is configured to accommodate. The wafers 150 can be, for example, 300 mm wafers. In one embodiment, the diffusers may be evenly distributed on either side of the centerline CL such that each diffuser 120 is the same distance from the centerline CL and the diffusers 120 are on opposite sides of the centerline CL.

[0020] FIG. 2 shows a cross-sectional view of a wafer container according to one embodiment. In the cross-sectional view of FIG. 2, a viewer is looking at the wafer container 200 from a top view. The wafer container 200 includes a first sidewall 202, a second sidewall 204, and a bottom wall 206. The wafer container 200 also includes a rear wall 208 including protruding corner sections 210 and a recessed center panel 212. The wafer container 200 further includes an upper top wall (not shown), the section of which is taken in the view of FIG. 2. The wafer container 200 includes flanges 214 extending from the first sidewall 202 and the second sidewall 204 to provide a slot configured to support a wafer 216. The wafer container 200 includes first and second rear purge ports 218a and 218b, first and second offset connectors 220a and 220b, and a diffuser 222.

[0021] The wafer container 200 is a container sized to accommodate wafers. The wafer container 200 may be, for example, a front-opening unified pod (FOUP). The size of the wafer container 200 may be based on a predetermined size of the wafers 216 to be stored in the wafer container 200. The predetermined size may be any size suitable for the wafers. Non-limiting examples of wafer sizes that the wafer container 200 may be configured to accommodate include 450 mm wafers or 300 mm wafers. In one embodiment, the wafer container 200 is configured to accommodate 300 mm wafers.

[0022] The first sidewall 202, second sidewall 204, bottom wall 206, rear wall 208, and top wall are connected to one another to define an interior space of the wafer container 200 having an open front side. The centerline CL of the wafer container 200 is a line evenly spaced between the first sidewall 202 and the second sidewall 204. The centerline CL can coincide throughout the height of the wafer container 200 and provides a plane perpendicular to the bottom wall 206. The first sidewall 202 and second sidewall 204 each include a flange 214 extending inwardly into the interior space. The flange 214 forms a slot that supports a wager placed within the wafer container 200.

[0023] The rear wall 208 forms the back surface of the wafer container 200. The rear wall 208 includes a protruding corner section 210 that bulges outward from where the rear wall 208 meets the first and second side walls 202, 204. A central panel 212 of the rear wall 208 is relatively recessed compared to the protruding corner section 210 of the rear wall 208. The central panel 212 can extend across a centerline CL of the wafer container.

[0024] The first and second rear purge ports 218a, b are ports through the bottom wall 206 of the wafer container 200. The first and second rear purge ports 218a, b are configured to allow the introduction of purge gas into the interior space of the wafer container 200. The first rear purge port 218a may be located on a first side of the centerline CL. The second rear purge port 218b may be located on a second side of the centerline CL, opposite the first side on which the first rear purge port 218a is located. In one embodiment, the distance between the first rear purge port 218a and the centerline CL and the distance between the centerline CL and the second rear purge port 218b are equal. In one embodiment, the first rear purge port 218a and the second rear purge port 218b are each located such that the center of the respective purge port 218a, b is farther from the centerline CL than the end of the central panel 212 on each side of the centerline CL.

[0025] The first and second offset connectors 220a,b are connectors configured to direct purge gas from the respective first and second rear purge ports 218a,b. The first and second offset connectors 220a,b each include an offset such that the center of the connected diffuser is not collinear with the center of the corresponding purge port 218a,b. In one embodiment, the offset provided by the first and second offset connectors 220a,b is such that each of the diffusers 222 is located closer to the centerline than the respective purge port 218a,b. In one embodiment, the central axis of each of the diffusers 222 is closer to the centerline than the central axis of the respective purge port 218a,b. In one embodiment, the outermost edge of each of the diffusers 222 relative to the centerline is closer to the centerline than the corresponding outermost edge of the respective purge port 218a,b. Each of the diffusers 222 is configured to receive purge gas from one of the offset connectors 220 a, b and provide the purge gas to the interior space of the wafer container 200. The diffusers 222 can be any suitable structure for providing purge gas to the interior space. In one embodiment, the diffusers 222 are tubes made of a porous material. The diffusers 222 can be diffuser towers.

[0026] In one embodiment, the positions of the diffusers 222 can be defined relative to an angle with respect to the central axis of the wafers 216. The central axis of the wafers 216 can be a line extending through the center WC of each of the wafers 216. The central axis extends vertically through the wafer container 200 from the bottom wall 206 to the top wall. In one embodiment, the angle φ formed by the positions of the two diffusers relative to the central axis of the wafers is 60 degrees or less. In one embodiment, φ may be 52 degrees or less. In one embodiment, φ may be 44 degrees or less. In one embodiment, φ may be between 30 degrees and 60 degrees. In one embodiment, φ may be between 38 degrees and 52 degrees. In one embodiment, the angle θ1 between the diffuser 222 connected to the first offset connector 220a and the center line CL is 30 degrees or less. In one embodiment, the angle θ2 between the center line CL and the diffuser 222 connected to the second offset connector 220b is 30 degrees or less. In one embodiment, θ1 is equal to θ2. In one embodiment, one or both of θ1 and θ2 may each be 26 degrees or less. In one embodiment, one or both of θ1 and θ2 may each be 26 degrees or less. In one embodiment, one or both of θ1 and θ2 may each be 15 degrees to 30 degrees. In one embodiment, one or both of θ1 and θ2 may each be 19 degrees to 26 degrees.

[0027] In one embodiment, the position of the diffusers 222 can be defined relative to a distance from the centerline CL. In one embodiment, the distance between each of the diffusers 222 and the centerline CL can be based on a predetermined size of the wafers 216 that the wafer container 200 is configured to accommodate. The distance between each of the diffusers 222 and the centerline CL can be, for example, less than one-quarter of the diameter of the wafers that the wafer container 200 is configured to accommodate. For example, if the wafer container 200 is configured to accommodate 300 mm wafers, the maximum distance between any of the diffusers and the centerline CL can be 75 mm or less.

[0028] In one embodiment, the location of the diffusers 222 may correspond to the central panel 212 of the rear wall 208. The diffusers 222 may be spaced apart a distance less than the width W of the central panel 212. In one embodiment, the diffusers 222 may be positioned such that the distance from each of the diffusers 222 to the centerline CL is less than the distance from the centerline CL to the end of the central panel 212 where the central panel 212 meets one of the protruding corner portions 210 on the same side of the centerline CL.

[0029] Aspects:

[0030] It is understood that any of embodiments 1 to 3 can be combined with any of embodiments 4, 5, and / or 6. It is understood that embodiment 4 can be combined with any of embodiments 5 and / or 6. It is understood that embodiment 5 can be combined with embodiment 6.

[0031] Aspect 1. A wafer container, comprising: The upper wall and The bottom wall and a first sidewall; a second sidewall; and a back wall, wherein the top wall, the bottom wall, the first side wall, the second side wall, and the back wall define an interior space, the interior space configured to accommodate one or more wafers; a first diffuser located within the interior space; a second diffuser located within the interior space; and Equipped with an angle between the first diffuser and the second diffuser with respect to a central axis of the one or more wafers when the one or more wafers are accommodated within the interior space is 60 degrees or less, and the central axis extends through a center of each of the one or more wafers and perpendicular to a plane of the one or more wafers; Wafer container.

[0032] Aspect 2. The wafer container of Aspect 1, wherein the first diffuser is located on a first side of a centerline of the interior space, the centerline being evenly spaced between the first sidewall and the second sidewall, and the second diffuser is located on a second side of the centerline of the interior space, the centerline extending perpendicular to an opening of the wafer container and intersecting the central axis of the one or more wafers.

[0033] Aspect 3. A wafer container as described in Aspect 2, wherein the angle between the center line and the first diffuser relative to the central axis is 30 degrees or less, and the angle between the center line and the second diffuser relative to the central axis is 30 degrees or less.

[0034] Embodiment 4. A wafer container, comprising: The upper wall and The bottom wall and a first sidewall; a second sidewall; and a rear wall, wherein the top wall, the bottom wall, the first side wall, the second side wall, and the rear wall define an interior space, the interior space having a centerline evenly spaced between the first side wall and the second side wall, the centerline being perpendicular to the rear wall; a first diffuser located within the interior space on a first side of the centerline; a second diffuser positioned within the interior space on a second side of the centerline; and Equipped with the wafer container is configured to accommodate one or more wafers having a predetermined diameter; the first diffuser is spaced from the centerline by a distance less than one-quarter of the predetermined diameter; the second diffuser is spaced from the centerline by a distance less than one-quarter of the predetermined diameter; Wafer container.

[0035] Embodiment 5. A wafer container, comprising: The upper wall and The bottom wall and a first sidewall; a second sidewall; and a rear wall, wherein the top wall, the bottom wall, the first side wall, the second side wall, and the rear wall define an interior space, the rear wall including a central panel, the central panel being recessed relative to an exterior of the wafer container; a first diffuser located within the interior space; a second diffuser located within the interior space; and Equipped with the first diffuser is spaced from the second diffuser in a direction parallel to the plane of the rear wall by a distance less than a width of the central panel of the rear wall; Wafer container.

[0036] Embodiment 6. A wafer container, comprising: The upper wall and The bottom wall and a first sidewall; a second sidewall; and a rear wall, wherein the top wall, the bottom wall, the first side wall, the second side wall, and the rear wall define an interior space, the interior space having a centerline evenly spaced between the first side wall and the second side wall, the centerline being perpendicular to the rear wall; a first purge port formed in the bottom wall; a first diffuser located within the interior space on a first side of the centerline, the first diffuser connected to the first purge port; a second purge port formed in the bottom wall; a second diffuser located within the interior space on a second side of the centerline, the second diffuser connected to the second purge port; Equipped with the first diffuser is spaced from the centerline by a distance less than a distance from the centerline to the first purge port; the second diffuser is spaced from the centerline by a distance less than the distance from the centerline to the second purge port; Wafer container.

[0037] The examples disclosed in this application are to be considered in all respects as illustrative and not restrictive. The scope of the present invention is indicated by the appended claims, rather than the foregoing description, and all changes that come within the meaning and range of equivalency of the claims are intended to be embraced therein.

Claims

1. 1. A wafer container comprising: The upper wall and The bottom wall and a first sidewall; and a second sidewall; and a back wall, wherein the top wall, the bottom wall, the first side wall, the second side wall, and the back wall define an interior space, the interior space configured to accommodate one or more wafers; a first diffuser located within the interior space; a second diffuser located within the interior space; and Equipped with an angle between the first diffuser and the second diffuser with respect to a central axis of the one or more wafers when the one or more wafers are accommodated within the interior space is 60 degrees or less, and the central axis extends through a center of each of the one or more wafers and perpendicular to a plane of the one or more wafers; Wafer container.

2. 10. The wafer container of claim 1, wherein the first diffuser is located on a first side of a centerline of the interior space, the centerline being evenly spaced between the first sidewall and the second sidewall, and the second diffuser is located on a second side of the centerline of the interior space, the centerline extending perpendicular to an opening of the wafer container and intersecting the central axis of the one or more wafers.

3. 3. The wafer container of claim 2, wherein an angle between the centerline and the first diffuser relative to the central axis is 30 degrees or less, and an angle between the centerline and the second diffuser relative to the central axis is 30 degrees or less.

4. 10. The wafer container of claim 1, further comprising a first offset between the first diffuser and a first purge port and a second offset between the second diffuser and a second purge port.

5. The wafer container of claim 1 , wherein the first diffuser comprises a diffuser tower.

6. the first diffuser is spaced from the centerline by a distance less than a distance from the centerline to the first purge port; the second diffuser is spaced from the centerline by a distance less than a distance from the centerline to the second purge port; The wafer container of claim 1 .

7. 1. A wafer container comprising: The upper wall and The bottom wall and a first sidewall; and a second sidewall; and a rear wall, wherein the top wall, the bottom wall, the first side wall, the second side wall, and the rear wall define an interior space, the interior space having a centerline evenly spaced between the first side wall and the second side wall, the centerline being perpendicular to the rear wall; a first diffuser located within the interior space on a first side of the centerline; a second diffuser positioned within the interior space on a second side of the centerline; and Equipped with the wafer container is configured to accommodate one or more wafers having a predetermined diameter; the first diffuser is spaced from the centerline by a distance less than one-quarter of the predetermined diameter; the second diffuser is spaced from the centerline by a distance less than one-quarter of the predetermined diameter; Wafer container.

8. The wafer container of claim 7 , wherein the first diffuser and the second diffuser are symmetrical about the centerline.

9. 8. The wafer container of claim 7, wherein the angle between the centerline and a line between the first diffuser and the center of a wafer storage location is approximately 30 degrees.

10. 1. A wafer container comprising: The upper wall and The bottom wall and a first sidewall; and a second sidewall; and a rear wall, wherein the top wall, the bottom wall, the first side wall, the second side wall, and the rear wall define an interior space, the rear wall including a central panel, the central panel being recessed relative to an exterior of the wafer container; a first diffuser located within the interior space; a second diffuser located within the interior space; and Equipped with the first diffuser is spaced from the second diffuser in a direction parallel to the plane of the rear wall by a distance less than a width of the central panel of the rear wall; Wafer container.

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