EUV light generation apparatus and method for manufacturing electronic devices

By employing a beam monitor and beam splitter to adjust the incidence angle and position of MPL light, the EUV light generation system stabilizes EUV energy output, addressing fluctuations and debris issues, thus enhancing efficiency and stability.

JP2026079558APending Publication Date: 2026-05-15GIGAPHOTON INC
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Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
GIGAPHOTON INC
Filing Date
2024-10-30
Publication Date
2026-05-15

AI Technical Summary

Technical Problem

Existing EUV light generation systems face challenges in maintaining consistent EUV energy output due to fluctuations in the irradiation position of pulsed laser beams, which affect the spot intensity distribution and conversion efficiency, leading to potential debris contamination and reduced stability of EUV energy.

Method used

Incorporating a beam monitor to measure the incidence angle of MPL light and using a beam splitter to adjust its position, allowing precise control of the irradiation position based on measured parameters, thereby stabilizing the EUV energy output.

Benefits of technology

The solution enhances the stability and consistency of EUV energy by minimizing fluctuations in spot intensity distribution and maintaining optimal irradiation conditions, reducing debris formation and improving the overall efficiency of EUV light generation.

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Abstract

It is desirable to achieve irradiation position control that can suppress changes in spot intensity distribution. [Solution] The EUV light generation apparatus of the present disclosure is an EUV light generation apparatus that generates EUV light by irradiating a target output in a chamber with laser light, and comprises a focusing unit for focusing laser light onto the target, an angle adjustment mirror for adjusting the incident angle of the laser light to the focusing unit, a position adjustment mirror for adjusting the incident position of the laser light to the focusing unit, a beam monitor for measuring parameters related to the variation in incident position, and a processor that controls the adjustment by the position adjustment mirror based on the measured parameter values ​​when making adjustments with the angle adjustment mirror.
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