electrostatic chuck

JP2026090623APending Publication Date: 2026-06-02TOTO LTD

Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
TOTO LTD
Filing Date
2026-03-06
Publication Date
2026-06-02

AI Technical Summary

Technical Problem

Existing electrostatic chucks face issues with material compatibility and durability due to the interaction between the bonding layer and sealing portion, limiting the freedom in selecting optimal materials for both components.

Method used

The electrostatic chuck design incorporates a gap between the bonding layer and sealing portion, allowing for independent material selection based on their respective required properties, thereby preventing material interaction and enhancing durability.

Benefits of technology

This configuration enables the selection of optimal materials for both the bonding layer and sealing portion with high freedom, ensuring effective adhesion, heat transfer, and plasma resistance, while minimizing material alteration and stress.

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  • Figure 2026090623000001_ABST
    Figure 2026090623000001_ABST
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Abstract

The present invention provides an electrostatic chuck that allows for the selection of the optimal material for both the bonding layer and the sealing portion with a high degree of freedom. [Solution] The electrostatic chuck 10 comprises a dielectric substrate 100, a base plate 200 that supports the dielectric substrate 100, a bonding layer 300 that joins the dielectric substrate 100 and the base plate 200, and a sealing portion 350 that covers the bonding layer 300 from the outer periphery. In this electrostatic chuck 10, there is a gap between the bonding layer 300 and the sealing portion 350.
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