Indication device

Abstract

A display device including a light-transmitting region having the same or an adjacent level of touch performance as a portion that does not have a light-transmitting structure. [Solution] A display device can be provided that includes a display area capable of displaying an image, wherein the display area includes a substrate comprising a first display area comprising a plurality of transparent areas and a second display area outside the first display area, a touch sensor metal disposed in the first display area and disposed outside the plurality of transparent areas, a first signal wiring disposed in the first display area and overlapping at least a portion of a part of the touch sensor metal, and a second signal wiring disposed in the first display area and overlapping at least a portion of the other part of the touch sensor metal. Thus, the embodiments herein can provide a display device having a light-transmitting structure that allows an optical electronic device disposed below the display panel to receive light normally while maintaining touch performance in the optical area.

Description

【Technical Field】 【0001】 Embodiments of this specification relate to a display device. 【Background Art】 【0002】 As the information society develops, the requirements for display devices for displaying images are increasing in various forms. In recent years, various display devices such as liquid crystal display devices, plasma display devices, and organic light-emitting display devices have been utilized. 【0003】 Among such display devices, there is a touch display device that provides a touch-based input method that enables a user to easily input information and commands intuitively and conveniently. In order for such a touch display device to provide a touch-based input method, it is necessary to detect the presence or absence of a user's touch and accurately detect the touch coordinates. 【0004】 In addition, a display device can provide not only an image display function but also a photographing function and various sensing functions. For this purpose, the display device must include optoelectronic devices (also referred to as light-receiving devices or sensors) such as cameras and sensing sensors. 【Summary of the Invention】 【Problems to be Solved by the Invention】 【0005】 Embodiments of this specification can provide a display device including a light transmission region having a touch performance at the same or close level as a portion having no light transmission structure. 【0006】 Embodiments of this specification can provide a display device having a light transmission structure that allows an optoelectronic device disposed below a display panel to receive light normally while maintaining touch performance in an optical region. 【0007】 Embodiments of this specification can provide a display device in which a luminance difference by region due to the presence or absence of a touch sensor metal does not occur and visibility is improved. 【0008】 Embodiments of this specification can provide a display device with improved touch performance by reducing the resistance and increasing the capacitance of the touch sensor metal. 【0009】 The embodiments of this specification can provide a display device that can improve the transmittance of an optical region while arranging signal wiring necessary for display driving in an optical region where light transmission is required. 【0010】 Embodiments of this specification can provide a display device that can improve the transmittance of an optical region even when signal wiring necessary for display driving and touch sensor metal necessary for touch sensing are arranged in the optical region where light transmission is required. 【0011】 The problems of the embodiments described herein are not limited to those mentioned herein, and other problems not mentioned herein will be clearly understood by those skilled in the art from the following description. [Means for solving the problem] 【0012】 Embodiments of this specification can provide a display device that includes a display area capable of displaying an image, wherein the display area includes a substrate comprising a first display area comprising a plurality of transparent areas and a second display area outside the first display area, a touch sensor metal disposed in the first display area and disposed outside the plurality of transparent areas, a first signal wiring disposed in the first display area and overlapping at least a portion of a portion of the touch sensor metal, and a second signal wiring disposed in the first display area and overlapping at least a portion of the other portion of the touch sensor metal. 【0013】 Embodiments of this specification provide a display device that includes a display area capable of displaying an image, the display area including a substrate that includes a first display area having a plurality of transparent areas and a second display area outside the first display area, a first touch sensor metal disposed in the first display area and having a plurality of openings, and at least one signal wiring disposed in the first display area, the first touch sensor metal including a first portion surrounding a first light-emitting area, a second portion surrounding a second light-emitting area separated from the first light-emitting area in a first direction, and a third portion connecting the first portion and the second portion and arranged in a line form, and at least one signal wiring including a wiring portion arranged parallel to the third portion and overlapping with at least a portion of the third portion. 【0014】 The embodiments herein provide a display device that includes a substrate including a display area capable of displaying an image and a non-display area not capable of displaying an image, wherein the display area includes a first display area including a plurality of transparent areas and a second display area surrounding the first display area, the non-display area includes the first non-display area and the second non-display area, and includes touch electrodes having a plurality of openings arranged in the optical areas within the first and second display areas, and at least one signal wiring and at least one power supply wiring arranged in the first display area. 【0015】 According to embodiments of this specification, a display device can be provided that includes a light-transmitting region which is identical to, or substantially the same as, a portion without a light-transmitting structure and has substantially the same level of touch performance. 【0016】 According to embodiments of this specification, it is possible to provide a display device having a light-transmitting structure that allows an optical electronic device located below the display panel to receive light normally while maintaining touch performance in the optical domain. 【0017】 According to the embodiments of this specification, a display device can be provided that does not experience differences in brightness between areas due to the presence or absence of touch sensor metal, thereby improving visibility. 【0018】 According to embodiments of this specification, a display device with improved touch performance can be provided by reducing the resistance of the touch sensor metal and increasing its capacitance. 【0019】 According to embodiments of this specification, it is possible to provide a display device that enables normal touch operation in an optical area included in the display area of ​​a display panel and on which an optical electronic device is superimposed. 【0020】 According to embodiments of this specification, it is possible to provide a display device that can normally receive light transmitted through an optical region by optoelectronic devices located in an optical region, while arranging signal wiring necessary for display driving in an optical region where light transmission is required, and by improving the transmittance of the optical region. 【0021】 According to embodiments of this specification, even when signal wiring necessary for display driving and touch sensor metal necessary for touch sensing are arranged in an optical region where light transmission is required, a display device can be provided that can improve the transmittance of the optical region by superimposing the vertical positions between the signal wiring and the touch sensor metal. 【0022】 According to embodiments of this specification, by reducing the resistance of the touch sensor metal and increasing its capacitance, it is possible to provide a display device with improved mobility and low power operation. 【0023】 The effects of the embodiments described herein are not limited to those mentioned above, and other effects not mentioned will be clearly understood by those skilled in the art from the following description. [Brief explanation of the drawing] 【0024】 The contents of this specification will be better understood from the detailed description and accompanying drawings provided below. The detailed description and accompanying drawings are provided for illustrative purposes only and do not limit the contents of this specification. 【0025】 [Figure 1] A display device according to an embodiment of this specification is shown. [Figure 2] It is a system configuration diagram of a display device according to an embodiment of this specification. [Figure 3] It shows a display panel according to an embodiment of the present disclosure. [Figure 4] It is an equivalent circuit diagram of pixels that may be included in a display device according to an embodiment of this specification. [Figure 5] In the display panel according to an embodiment of this specification, a first optical region, a second optical region, and a second display region are shown. [Figure 6] It is a cross-sectional view of a first display region in a display panel according to an embodiment of this specification. [Figure 7] It is a cross-sectional view of a second display region in a display panel according to an embodiment of this specification. [Figure 8] In a display device according to an embodiment of this specification, it is a diagram showing the correspondence between a mesh-type touch electrode and a sub-pixel arranged on a display panel. [Figure 9] In a display device according to an embodiment of this specification, it is a plan view of touch sensor metal arranged in an optical region and a second display region. [Figure 10] In a display device according to an embodiment of this specification, it is an enlarged plan view of touch sensor metal arranged in an optical region and a second display region. [Figure 11] In a display device according to an embodiment of this specification, it is a cross-sectional view of a transmission region and a low-transmission region in an optical region. [Figure 12] In a display device according to an embodiment of this specification, it is a cross-sectional view of a transmission region and a low-transmission region in an optical region. [Figure 13] It shows the resistance change of a touch electrode before and after arranging a touch sensor metal in an optical region according to an embodiment of this specification. [Figure 14] It shows the capacitance change of a touch electrode before and after arranging a touch sensor metal in an optical region according to an embodiment of this specification. [Figure 15] It shows a display device according to an embodiment of this specification. [Figure 16]This is an enlarged plan view of the second non-display area in the display device according to the embodiment of this specification. [Figure 17] This is an enlarged plan view of the second non-display area and the first optical area in the display device according to the embodiment of this specification. [Modes for carrying out the invention] 【0026】 Hereinafter, some embodiments of this specification will be described in detail with reference to illustrative drawings. In assigning reference numerals to components in each drawing, the same reference numeral may be used for the same component whenever possible, even if it is shown in other drawings. In describing this disclosure, if it is determined that a specific description of a relevant known configuration or function would obscure the gist of this disclosure, such detailed description will be omitted. Where "includes," "has," "consists of," etc., as used herein, other parts may be added unless "only" is used. When a component is expressed singularly, it may include multiple components unless otherwise explicitly stated. 【0027】 Furthermore, in describing the components of this disclosure, terms such as 1, 2, A, B, (a), (b), etc., may be used. These terms are used solely to distinguish a component from other components, and do not limit the nature, order, sequence, or number of such components. 【0028】 In descriptions of the positional relationships of components, when it is stated that two or more components are “linked,” “joined,” or “connected,” it should be understood that while two or more components can be directly “linked,” “joined,” or “connected,” it is also possible for two or more components to be further “interposed” with other components before being “linked,” “joined,” or “connected.” Here, the other components may be included in one or more of the two or more components that are “linked,” “joined,” or “connected” to each other. 【0029】 In descriptions of temporal relationships concerning constituent elements, operating methods, or manufacturing methods, when temporal order or sequential relationships are described using phrases such as "after," "following," "next," or "before," unless "immediately" or "directly" is used, this can include cases that are not continuous. 【0030】 On the other hand, if numerical values ​​or corresponding information (e.g., levels) relating to components are mentioned, even without further explicit mention, these numerical values ​​or corresponding information may be interpreted as including a range of errors that can occur due to various factors (e.g., process factors, internal or external shocks, noise, etc.). 【0031】 Various embodiments of this disclosure will be described in detail below with reference to the attached drawings. 【0032】 Figure 1 shows a display device 100 according to an embodiment of the present disclosure. 【0033】 Referring to Figure 1, the display device 100 according to the embodiment of the present disclosure may include a display panel 110 for displaying images and an electronic device 10. 【0034】 In the display device 100 according to the embodiments of this specification, the electronic device 10 may be a device that receives light transmitted through the display panel 110 and performs a predetermined operation using the received light. 【0035】 The electronic device 10 may include a first electronic device 11 and a second electronic device 12. 【0036】 The display panel 110 may include a display area DA on which video (images) may be displayed, and a non-display area NDA on which video is not displayed. 【0037】 Multiple subpixels are arranged in the display area DA, and various signal lines SL1 and SL2 for driving these subpixels can be arranged therein. 【0038】 The non-display area (NDA) may be an area outside the display area (DA). Various signal lines SL1 and SL2 can be placed in the non-display area (NDA), and various drive circuits can be connected to it. The non-display area (NDA) may be bent and not visible from the front, or it may be covered by a case (not shown). The non-display area (NDA) is also called a bezel or bezel area. 【0039】 The optical region OA may be included in the first display region DA1 through which light can be transmitted, and the general region NA may correspond to or be included in the second display region DA2 through which light cannot be transmitted. 【0040】 In the following, the general area NA may be referred to as the second display area DA2. 【0041】 The display area DA may include a general area NA and one or more optical areas OA1 and OA2. At least a portion of the first optical area OA1 may overlap with the first electronic device 11, and at least a portion of the second optical area OA2 may overlap with the second electronic device 12. 【0042】 One or more electronic devices 11, 12 are provided and installed separately from the display panel 110 and are electronic components located below the display panel 110 (on the opposite side of the viewing surface). 【0043】 One or more electronic devices 11, 12 are devices that require light reception, but are located on the back (bottom, opposite the viewing surface) of the display panel 110 and receive light that has passed through the display panel 110. One or more electronic devices 11, 12 are not exposed on the front (viewing surface) of the display panel 110. Therefore, when a user looks at the front of the display panel 110, one or more electronic devices 11, 12 are not visible to the user. 【0044】 Light may enter the front (viewing surface) of the display panel 110, pass through the display panel 110, and be transmitted to one or more electronic devices 11, 12 located below the display panel 110 (opposite the viewing surface). For example, the light that passes through the display panel 110 may include visible light or infrared light. 【0045】 One or more optical regions OA1, OA2 must have both an image display structure and a light transmission structure. That is, since one or more optical regions OA1, OA2 are part of the display region DA, one or more optical regions OA1, OA2 must have light-emitting regions for subpixels for image display. Furthermore, one or more optical regions OA1, OA2 must have a light transmission structure for transmitting light to one or more electronic devices 11, 12. 【0046】 For example, the first electronic device 11 may be a sensing sensor and the second electronic device 12 may be a camera. For example, the sensing sensor may be an infrared sensor that detects infrared rays. Conversely, the first electronic device 11 may be a camera and the second electronic device 12 may be a sensing sensor such as a proximity sensor or an illuminance sensor. 【0047】 In the following explanation, for the sake of clarity, we will use the example that the first optical electronic device 11 is an infrared-based sensing sensor and the second optical electronic device 12 is a camera. Here, the camera may be a camera lens or an image sensor. 【0048】 The general region NA and one or more optical regions OA1 and OA2 are regions where an image can be displayed. However, the general region NA is a region where a light-transmitting structure does not need to be formed, while one or more optical regions OA1 and OA2 are regions where a light-transmitting structure should be formed. 【0049】 In other words, in the display device 100 according to the embodiment of this specification, even though one or more electronic devices 11, 12 are located hidden behind the display panel 110 and overlapping with the display area DA, normal image display must be possible in one or more optical areas OA1, OA2 that overlap with the one or more electronic devices 11, 12 in the display area DA. 【0050】 Therefore, one or more optical regions OA1, OA2 should have a transmittance above a certain level, while the general region NA may have no light transmittance or a low transmittance below a certain level. 【0051】 For example, one or more optical regions OA1, OA2 and the general region NA may differ from each other in terms of resolution, subpixel arrangement structure, number of subpixels per unit area, electrode structure, line structure, electrode arrangement structure, or line arrangement structure. 【0052】 For example, the number of subpixels per unit area in one or more optical regions OA1 and OA2 may be less than the number of subpixels per unit area in the general region NA. That is, the resolution of one or more optical regions OA1 and OA2 may be lower than the resolution of the general region NA. Here, the number of subpixels per unit area may have the same meaning as resolution, pixel density, or pixel integration. For example, the unit of the number of subpixels per unit area can also be expressed as PPI (Pixels Per Inch), which means the number of pixels in one inch. 【0053】 For example, the number of subpixels per unit area in the first optical region OA1 may be less than the number of subpixels per unit area in the general region NA. The number of subpixels per unit area in the second optical region OA2 may be greater than or equal to the number of subpixels per unit area in the first optical region OA1, and may be less than the number of subpixels per unit area in the general region NA. 【0054】 The first optical region OA1 can have various shapes, such as a circle, ellipse, square, hexagon, or octagon. The second optical region OA2 can have various shapes, such as a circle, ellipse, square, hexagon, or octagon. The first optical region OA1 and the second optical region OA2 may have the same shape or different shapes. The sizes of the first optical region OA1 and the second optical region OA2 may be different. For example, the size of the first optical region OA1 where the camera is located may be larger than the size of the second optical region OA2 where the sensor is located. In another example, the size of the first optical region OA1 may be smaller than the size of the second optical region OA2. 【0055】 In the display device 100 according to the embodiments of this specification, if the first electronic device 11, which is hidden at the bottom of the display panel 110 without being exposed to the outside, is an infrared sensing sensor, then the display device 100 according to the embodiments of this specification can be said to be a display to which UDIR (Under Display Infrared) technology is applied. 【0056】 In the display device 100 according to the embodiments of this specification, if the second electronic device 12, which is hidden below the display panel 110 and not exposed to the outside, is a camera, then the display device 100 according to the embodiments of this specification can be said to be a display to which UDC (Under Display Camera) technology is applied. 【0057】 According to this, in the case of the display device 100 according to the embodiments of this specification, a notch or hole for the exposure of a sensor or camera does not need to be formed in the display panel 110, so there is no reduction in the area of ​​the display area DA. As a result, the size of the bezel area can be reduced, eliminating design constraints and increasing the degree of freedom in design. 【0058】 The display device 100 according to the embodiments of this specification can provide both a video display function for displaying images and a touch sensing function for sensing the presence or absence of a touch and / or touch coordinates in response to touch operations by a touch object such as a user's finger or pen. 【0059】 Such functions are also applicable to optical area office automation (OA), and the display device 100 according to the embodiment of this specification can provide a touch sensing function for sensing the presence or absence of a touch and / or touch coordinates while displaying a normal image in the optical area OA. 【0060】 Figure 2 is a system configuration diagram of the display device 100 according to an embodiment of this specification. 【0061】 Referring to Figure 2, the display device 100 is a component for displaying images and may include a display panel 110 and a display driving circuit. 【0062】 The display driving circuit is a circuit for driving the display panel 110 and may include a data driving circuit 220, a gate driving circuit 230, and a display controller 240, etc. 【0063】 The display panel 110 may include a display area DA on which an image is displayed and a non-display area NDA on which no image is displayed. The non-display area NDA may be the outer area of ​​the display area DA, or it may also be called the bezel area. All or part of the non-display area NDA may be an area visible from the front of the display device 100, or an area that is bent and not visible from the front of the display device 100. 【0064】 The display panel 110 may include a substrate SUB and a plurality of subpixels SP arranged on the substrate SUB. Furthermore, the display panel 110 may further include various types of signal wiring SL1, SL2 for driving the plurality of subpixels SP. 【0065】 The display device 100 according to the embodiments of this specification may be a liquid crystal display device or the like, or it may be a self-emissive display device in which the display panel 110 emits light itself. When the display device 100 according to the embodiments of this specification is a self-emissive display device, each of the plurality of subpixels SP may include a light-emitting element. For example, the display device 100 according to the embodiments of this specification may be an organic light-emitting display device in which the light-emitting element is realized by an organic light-emitting diode (OLED). As another example, the display device 100 according to the embodiments of this specification may be an inorganic light-emitting display device in which the light-emitting element is realized by an inorganic-based light-emitting diode. As yet another example, the display device 100 according to the embodiments of this specification may be a quantum dot display device in which the light-emitting element is realized by a quantum dot, which is a semiconductor crystal that emits light itself. 【0066】 The structure of each of the multiple subpixels SP may vary depending on the type of display device 100. For example, if the display device 100 is a self-emissive display device that emits light from the subpixels SP itself, each subpixel SP may include a light-emitting element that emits light itself, one or more transistors, and one or more capacitors. 【0067】 For example, several types of signal wiring SL1, SL2 may include multiple data lines DL that transmit data signals (also known as data voltages or video signals) and multiple gate lines GL that transmit gate signals (also known as scan signals). 【0068】 Multiple data lines DL and multiple gate lines GL can intersect each other. Each of the multiple data lines DL can be arranged extending in a first direction. Each of the multiple gate lines GL can be arranged extending in a second direction, where the first direction is the column direction and the second direction is the row direction. Alternatively, the first direction is the row direction and the second direction is the column direction. 【0069】 The data drive circuit 220 is a circuit for driving multiple data lines DL and can output data signals to multiple data lines DL. The gate drive circuit 230 is a circuit for driving multiple gate lines GL and can output gate signals to multiple gate lines GL. 【0070】 The display controller 240 is a device for controlling the data drive circuit 220 and the gate drive circuit 230, and can control the drive timing for multiple data lines DL and the drive timing for multiple gate lines GL. 【0071】 The display controller 240 can supply a data drive control signal DCS to the data drive circuit 220 to control the data drive circuit 220, and can supply a gate drive control signal GCS to the gate drive circuit 230 to control the gate drive circuit 230. 【0072】 The display controller 240 can receive input video data from the host system 250 and supply digital video data Data to the data drive circuit 220 based on the input video data. 【0073】 The data drive circuit 220 receives digital video data from the display controller 240, converts the received digital video data into an analog data signal, and outputs it to multiple data lines DL. 【0074】 The gate drive circuit 230 is supplied with various gate drive control signals GCS, a first gate voltage corresponding to the turn-on level voltage, and a second gate voltage corresponding to the turn-off level voltage, generates a gate signal, and can supply the generated gate signal to multiple gate lines GL. 【0075】 For example, the data drive circuit 220 may be connected to the display panel 110 by tape automated bonding (TAB), connected to the bonding pad of the display panel 110 by chip-on-glass (COG) or chip-on-panel (COP) technology, or implemented using chip-on-film (COF) technology. 【0076】 The gate drive circuit 230 can be connected to the display panel 110 by tape automated bonding (TAB), by a chip-on-glass (COG) or chip-on-panel (COP) method to the bonding pad of the display panel 110, or by a chip-on-film (COF) method. Alternatively, the gate drive circuit 230 may be a gate-in-panel (GIP) type and formed in the non-display area (NDA) of the display panel 110. The gate drive circuit 230 may be placed on the substrate or connected to the substrate. That is, in the case of the GIP type, the gate drive circuit 230 can be placed in the non-display area (NDA) of the substrate. In the case of the chip-on-glass (COG) type, chip-on-film (COF) type, etc., the gate drive circuit 230 can be connected to the substrate. 【0077】 On the other hand, at least one of the data drive circuit 220 and gate drive circuit 230 may be placed in the display area DA of the display panel 110. For example, at least one of the data drive circuit 220 and gate drive circuit 230 may be placed so as not to overlap with the subpixel SP, or it may be placed so as to partially or entirely overlap with the subpixel SP. 【0078】 The data drive circuit 220 may be connected to one side of the display panel 110 (for example, the top or bottom). Depending on the drive method, panel design method, etc., the data drive circuit 220 may be connected to both sides of the display panel 110 (for example, the top and bottom), or to two or more of the four sides of the display panel 110. 【0079】 The gate drive circuit 230 may be connected to one side of the display panel 110 (for example, the left or right side). Depending on the drive method, panel design method, etc., the gate drive circuit 230 may be connected to both sides of the display panel 110 (for example, the left and right sides), or to two or more of the four sides of the display panel 110. 【0080】 The display controller 240 can be implemented as a separate component from the data drive circuit 220, or it can be implemented as an integrated circuit by integrating it with the data drive circuit 220. 【0081】 The display device 100 according to the embodiments of this specification may include, in addition to video display functionality, a touch sensor TS and a touch sensing circuit TSC that senses the touch sensor to detect whether a touch has occurred by a touch object such as a finger or pen, or to detect the touch position, in order to further provide touch sensing functionality. 【0082】 The touch sensing circuit TSC may include a touch drive circuit 260 that drives and senses a touch sensor and generates and outputs touch sensing data, and a touch controller 270 that can use the touch sensing data to detect a touch or determine the touch position. 【0083】 The touch sensor may include multiple touch electrodes. The touch sensor may further include multiple touch lines for electrically connecting the multiple touch electrodes to the touch drive circuit 260. 【0084】 The touch sensor may be located outside the display panel 110 in the form of a touch panel, or it may be located inside the display panel 110. 【0085】 If the touch sensor is located inside the display panel 110, it may be formed on the substrate SUB during the manufacturing process of the display panel 110, along with the signal wiring SL1, SL2 and electrodes related to display driving. 【0086】 The touch drive circuit 260 can supply a touch drive signal to at least one of the multiple touch electrodes, sense at least one of the multiple touch electrodes, and generate touch sensing data. 【0087】 In the display panel 110, the display area DA may include a first display area DA1 and a second display area DA2. 【0088】 The first display area DA1 may include one or more optical areas OA1 and OA2, and the second display area DA2 may include a general area NA. Both the first display area DA1 and the second display area DA2 are areas capable of displaying images. However, the second display area DA2 is an area where it is not necessary to form a light-transmitting structure and a transmissive area, while the first display area DA1 is an area where a light-transmitting structure and a transmissive area should be formed. 【0089】 Figure 3 shows a display panel 110 according to an embodiment of this specification. 【0090】 Referring to Figure 3, multiple subpixels SP can be arranged in the display area DA of the display panel 110. Multiple subpixels SP may be arranged in the general area NA and the optical area OA included in the display area DA. 【0091】 The display panel 110 may further include a plurality of touchpads TP to which the touch driving circuit 260 is electrically connected, and a plurality of touch routing wires TL for electrically connecting a plurality of sensor electrodes included in the touch sensor layer TSL to the plurality of touchpads TP to which the touch driving circuit 260 is connected. 【0092】 The touch sensing circuit TSC can be implemented by including a touch drive circuit 260 that supplies a drive signal and receives a sensing signal, and a touch controller 270 that calculates the presence or absence of a touch and / or the touch position (touch coordinates). 【0093】 On the other hand, the touch sensing circuit TSC of the display device 100 according to the embodiments of this specification can sense a touch based on the capacitance formed on the touch electrode TE. 【0094】 In this case, the touch sensing circuit TSC can acquire the presence or absence of a touch and / or touch coordinates based on a change in self-capacitance, and the touch sensor can also acquire the presence or absence of a touch and / or touch coordinates based on a change in mutual-capacitance. For the sake of explanation, the following example will describe a touch display device according to the embodiments of this specification that senses a touch based on mutual-capacitance. 【0095】 In a mutual capacitance-based touch sensing method, the touch sensing circuit (TSC) applies a drive signal to one or more drive touch electrode lines, receives a sensing signal from one or more sensing touch electrode lines, and, based on the received sensing signal, detects the presence or absence of a touch and / or touch coordinates based on the change in capacitance (mutual capacitance) between the drive touch electrode line and the sensing touch electrode line, depending on the presence or absence of a pointer such as a finger or pen. 【0096】 The touch sensor layer TSL may be integrated into the display panel 110. 【0097】 For example, the touch sensor layer TSL can be placed on the encapsulation layer ENCAP within the display panel 110. In other words, in a touch display device, the touch sensor can be placed on the encapsulation layer ENCAP. This is called a TOE (Touch Sensor On Encapsulation Layer) structure. 【0098】 The encapsulation layer ENCAP may consist of one layer or multiple layers. For example, if the encapsulation layer ENCAP consists of multiple layers, it may include one or more inorganic encapsulation layers and one or more organic encapsulation layers. Specifically, the encapsulation layer ENCAP may be composed of a first inorganic encapsulation layer, an organic encapsulation layer, and a second inorganic encapsulation layer. Here, the organic encapsulation layer may be located between the first inorganic encapsulation layer and the second inorganic encapsulation layer. 【0099】 The first inorganic encapsulation layer can be formed on a common electrode (e.g., a cathode electrode) so as to be as close as possible to the light-emitting element ED. Such a first inorganic encapsulation layer can be formed from an inorganic insulating material that can be deposited at low temperatures, such as silicon nitride (SiNx), silicon oxide (SiOx), silicon oxynitride (SiON), or aluminum oxide (Al2O3). As a result, since the first inorganic encapsulation layer is deposited in a low-temperature atmosphere, damage to the light-emitting layer (organic light-emitting layer), which is vulnerable to high-temperature atmospheres, can be prevented during the deposition process of the first inorganic encapsulation layer. 【0100】 The organic encapsulation layer can be formed in a smaller area than the first inorganic encapsulation layer and can be formed so as to expose both ends of the first inorganic encapsulation layer. Such an organic encapsulation layer can act as a buffer to alleviate the stress between layers caused by warping of the touch display device and can enhance planarization performance. This organic encapsulation layer can be formed from an organic insulating material such as acrylic resin, epoxy resin, polyimide, polyethylene, or silicon oxycarbon (SiOC). 【0101】 The second inorganic encapsulation layer can be formed on the organic encapsulation layer so as to cover the top and side surfaces of both the organic encapsulation layer and the first inorganic encapsulation layer. This allows the second inorganic encapsulation layer to minimize or block the penetration of external moisture or oxygen into the first inorganic encapsulation layer and the organic encapsulation layer. Such a second inorganic encapsulation layer may include, for example, an inorganic insulating material such as silicon nitride (SiNx), silicon oxide (SiOx), silicon oxynitride (SiON), or aluminum oxide (Al2O3). 【0102】 Figure 4 is an equivalent circuit diagram of a pixel that may be included in the display device according to the embodiments of this specification. 【0103】 Referring to Figure 4, the subpixel circuit SPC contained within each subpixel SP may include a drive transistor DT for driving the light-emitting element ED, a scan transistor ST for transmitting the data voltage VDATA to the drive transistor DT, and a storage capacitor Cst for maintaining a constant voltage for one frame. 【0104】 The drive transistor DT may include a first node N1, a second node N2, and a third node N3. 【0105】 The first node N1 may be a node connected to the light-emitting element ED. The second node N2 may be a node connected to the scan transistor ST. The third node N3 may be a node connected to the drive voltage line VDDL. 【0106】 The first node N1 can be electrically connected to the pixel electrode PE of the light-emitting element ED. A data voltage VDATA may be applied to the second node N2 via a scan transistor ST. A drive voltage VDD may be applied to the third node N3. 【0107】 The first node N1 is either a source node or a drain node, the second node N2 is a gate node, and the third node N3 can be either a drain node or a source node. For the sake of explanation, the following example will be given where, in a drive transistor DT, the first node N1 is a source node, the second node N2 is a gate node, and the third node N3 is a drain node. 【0108】 The light-emitting element ED may include a pixel electrode PE, an intermediate layer EL, and a common electrode CE. 【0109】 The pixel electrode PE may be an electrode placed on each subpixel SP. For example, the pixel electrode PE can be electrically connected directly or indirectly (via another transistor) to the first node N1 of the driving transistor DT of each subpixel SP. 【0110】 The common electrode CE may be an electrode that is commonly placed on multiple subpixels SP. For example, the common electrode CE may have a reference voltage VSS, which is a type of common drive voltage, applied to it via a reference voltage line VSSL. 【0111】 For example, the pixel electrode PE may be the anode electrode and the common electrode CE may be the cathode electrode. Conversely, the pixel electrode PE may be the cathode electrode and the common electrode CE may be the anode electrode. In the following explanation, for the sake of clarity, we will assume that the pixel electrode PE is the anode electrode and the common electrode CE is the cathode electrode. 【0112】 The intermediate layer EL may include the light-emitting layer EML and the common intermediate layer EL_COM. 【0113】 The EML (Emission Layer) can be placed in the emission region of each of the multiple subpixels SP. In one example, the EML can be placed in each of the multiple subpixels SP individually. In another example, the EML may be placed in common to multiple subpixels SP. In yet another example, the EML may be placed only in the emission region. In yet another example, the EML may be placed in both the emission and non-emission regions. 【0114】 The common intermediate layer EL_COM can be placed in common across multiple subpixels SP. The common intermediate layer EL_COM can also be placed in common across multiple light-emitting regions EA and non-light-emitting regions. 【0115】 The common intermediate layer EL_COM may include a first common intermediate layer COM1 and a second common intermediate layer COM2. The first common intermediate layer COM1 is located between the pixel electrode PE and the light-emitting layer EML and may include at least one layer (e.g., an organic layer). The second common intermediate layer COM2 is located between the light-emitting layer EML and the common electrode CE and may include at least one layer (e.g., an organic layer). For example, the first common intermediate layer COM1 may include a hole injection layer (HIL), a hole transfer layer (HTL), etc. The second common intermediate layer COM2 may include an electron transfer layer (ETL) and an electron injection layer (EIL), etc. 【0116】 The hole injection layer (HIL) injects holes from the pixel electrode (PE) into the hole transport layer (HTL), the hole transport layer (HTL) transports the holes into the light-emitting layer (EML), the electron injection layer (EIL) injects electrons from the common electrode (CE) into the electron transport layer (ETL), and the electron transport layer (ETL) transports the electrons into the light-emitting layer (EML). Each light-emitting element (ED) can be composed of the overlapping portion of the pixel electrode (PE), the light-emitting layer (EML) in the intermediate layer (EL), and the common electrode (CE). Each light-emitting element (ED) can form a predetermined light-emitting region (EA). For example, the light-emitting region (EA) can be defined as the region where the pixel electrode (PE), the light-emitting layer (EML) in the intermediate layer (EL), and the common electrode (CE) overlap. 【0117】 For example, the light-emitting element ED may be an organic-based organic light-emitting diode (OLED), an inorganic-based inorganic light-emitting diode, or a quantum dot light-emitting element. If the light-emitting element ED is an organic light-emitting diode, the intermediate layer EL in the light-emitting element ED may include an organic layer containing organic material. 【0118】 The scan transistor ST is controlled to turn on and off by a scan signal SC, which is a type of gate signal applied via a scan signal wiring SCL, which is a type of gate line GL, and can be electrically connected between the second node N2 of the drive transistor DT and the data line DL. 【0119】 The storage capacitor Cst can be electrically connected between the first node N1 and the second node N2 of the drive transistor DT. 【0120】 The subpixel circuit SPC may have a 2T (Transistor) 1C (Capacitor) structure, as shown in Figure 4, which includes two transistors, a drive transistor DT (T1) and a scan transistor ST (T2), and one capacitor Cst. In some cases, it may further include one or more transistors or one or more capacitors. 【0121】 The storage capacitor Cst may be an intentionally designed external capacitor located outside the drive transistor DT, rather than a parasitic capacitor (e.g., Cgs, Cgd) that can exist between the first node N1 and the second node N2 of the drive transistor DT. The drive transistor DT and the scan transistor ST may each be either an n-type or p-type transistor. 【0122】 Since the circuit elements within each subpixel SP (especially the light-emitting elements ED, which are realized with organic light-emitting diodes (OLEDs) containing organic materials) are vulnerable to external moisture and oxygen, a sealing layer ENCAP can be placed on the display panel 110 to prevent external moisture and oxygen from penetrating the circuit elements (especially the light-emitting elements ED). The sealing layer ENCAP can be placed in a manner that covers the light-emitting elements ED. 【0123】 Each subpixel SP may include a light-emitting element ED, a first transistor T1 for driving the light-emitting element ED, a second transistor T2 for transmitting a data voltage VDATA to a second node N2 of the first transistor T1, and a storage capacitor Cst for maintaining a constant voltage for one frame. 【0124】 The first transistor T1 may include a first node N1 that can be electrically connected to a light-emitting element ED, a second node N2 to which a data voltage may be applied, and a third node N3 to which a drive voltage VDD from a drive voltage line VDDL is applied. The first node N1 may be a source node or a drain node, the second node N2 may be a gate node, and the third node N3 may be a drain node or a source node. Such a first transistor T1 is also called a drive transistor that drives the light-emitting element ED. 【0125】 The light-emitting element ED may include a pixel electrode (e.g., an anode electrode), a light-emitting layer, and a common electrode (e.g., a cathode electrode). The pixel electrode may have a drive voltage VDD applied to it that corresponds to a different pixel voltage for each subpixel SP, and may be electrically connected to a first node N1 of a first transistor T1. The common electrode may have a reference voltage VSS applied to it that corresponds to a common voltage applied to all subpixels SP. 【0126】 The light-emitting element (ED) may be an organic light-emitting element or an inorganic light-emitting element. In an organic light-emitting element (ED), the light-emitting layer may include an organic light-emitting layer containing organic material, in which case the light-emitting element (ED) is called an organic light-emitting diode (OLED). 【0127】 The second transistor T2 is controlled to turn on and off by a scan signal SC applied via a gate line GL (e.g., a scan signal line SCL), and may be electrically connected between the second node N2 of the first transistor T1 and the data line DL. Such a second transistor T2 is also called a switching transistor. 【0128】 When the second transistor T2 is turned on by the scan signal SC, it transmits the data voltage VDATA supplied from the data line DL to the second node N2 of the first transistor T1. 【0129】 The storage capacitor Cst can be electrically connected between the first node N1 and the second node N2 of the first transistor T1. 【0130】 Each subpixel SP may have a 2T(Transistor)1C(Capacitor) structure, as shown in Figure 3, comprising two transistors T1 and T2 and one capacitor Cst, and may optionally include one or more transistors and one or more capacitors. 【0131】 The storage capacitor Cst may be an external capacitor intentionally designed outside the first transistor T1, rather than a parasitic capacitor (e.g., Cgs, Cgd) which is an internal capacitor that can exist between the first node N1 and the second node N2 of the first transistor T1. 【0132】 The first transistor T1 and the second transistor T2 can each be either an n-type transistor or a p-type transistor. 【0133】 On the other hand, as mentioned above, the display panel 110 is equipped with circuit elements such as a light-emitting element ED, two or more transistors T1 and T2, and one or more capacitors Cst. Since such circuit elements (especially the light-emitting element ED) are vulnerable to external moisture and oxygen, a sealing layer ENCAP can be placed on the display panel 110 to prevent external moisture and oxygen from penetrating the circuit elements (especially the light-emitting element ED). 【0134】 Figure 5 shows the structure of the first display area DA1 and the second display area DA2 in the display panel 110 according to the embodiment of this specification. 【0135】 Referring to Figure 5, the display panel 110 according to the embodiment of this specification may include a display area DA on which an image is displayed and a non-display area NDA on which no image is displayed. The display area DA may include a first display area DA1 and a second display area DA2. The first display area DA1 may include at least one of a first optical area OA1 and a second optical area OA2. For example, the first display area DA1 may include both the first optical area OA1 and the second optical area OA2. 【0136】 In the following example, we will consider the case where the first display area DA1 includes both the first optical area OA1 and the second optical area OA2. 【0137】 Furthermore, the first optical region OA1 and the second optical region OA2 are regions through which light can be transmitted, while the second display region DA2 may be a region with very little light transmission. 【0138】 Here, light transmission means that light entering the front of the display panel 110 passes through the display panel 110 and is emitted from the back of the display panel 110. 【0139】 The second display area DA2 may be the area excluding the first display area DA1. 【0140】 At least a portion of the first optical region OA1 may overlap with the first electronic device 11, and at least a portion of the second optical region OA2 may overlap with the second electronic device 12. 【0141】 The first optical region OA1 and the second optical region OA2 may each have a light-transmitting structure. However, the first optical region OA1 and the second optical region OA2 may have different structural characteristics. For example, the light transmittance of the first optical region OA1 may be lower than that of the second optical region OA2. In one example, the resolution of the first optical region OA1 may be higher than that of the second optical region OA2. In another example, the number of subpixels per unit area of ​​the first optical region OA1 may be greater than the number of subpixels per unit area of ​​the second optical region OA2. In yet another example, the size of the subpixels of the first optical region OA1 may be larger than the size of the subpixels of the second optical region OA2. 【0142】 The first electronic device 11 can perform a predetermined operation using light in a first wavelength band from among the light transmitted through the first optical region OA1. The second electronic device 12 can perform a predetermined operation using light in a second wavelength band different from the first wavelength band from among the light transmitted through the second optical region OA2. 【0143】 The first wavelength band may include one or more of the visible light wavelength band, the infrared wavelength band, the ultraviolet wavelength band, etc. The second wavelength band may include one or more of the visible light wavelength band, the infrared wavelength band, and the ultraviolet wavelength band, etc., but may be different from the first wavelength band. 【0144】 For example, the first electronic device 11 could be a sensing sensor, and the second electronic device 12 could be a camera. 【0145】 The first electronic device 11 can perform sensing operations using light in the infrared wavelength band corresponding to the first wavelength band among the light transmitted through the first optical region OA1. The second electronic device 12 can perform camera operations using light in the visible light wavelength band corresponding to the second wavelength band among the light transmitted through the second optical region OA2. 【0146】 Referring to Figure 5, the first optical region OA1 and the second optical region OA2 may each be circular or octagonal, etc. However, they are not limited to these, and the first optical region OA1 and the second optical region OA2 may each have various shapes such as elliptical, polygonal, or irregular shapes. 【0147】 The first optical region OA1 and the second optical region OA2 may have the same shape. Alternatively, the first optical region OA1 and the second optical region OA2 may have different shapes. 【0148】 Referring to Figure 5, the display area DA can include multiple light-emitting areas EA. Since the first display area DA1 and the second display area DA2 are areas included in the display area DA, the first display area DA1 and the second display area DA2 can include multiple light-emitting areas EA. 【0149】 Multiple light-emitting regions EA arranged in the display region DA may include a first-color light-emitting region EA1 that emits a first color of light, a second-color light-emitting region EA2 that emits a second color of light, and a third-color light-emitting region EA3 that emits a third color of light. 【0150】 At least one of the first-colored light-emitting region EA1, the second-colored light-emitting region EA2, and the third-colored light-emitting region EA3 may have a different area than the rest. The first, second, and third colors can be various colors. For example, the first, second, and third colors may include red, green, and blue. 【0151】 Referring to Figure 5, the first optical region OA1 and the second optical region OA2 within the first display region DA1 can include a plurality of light-emitting regions EA and at least one transmission region TA. The second display region DA2 can include a plurality of light-emitting regions EA. 【0152】 The first display area DA1 may include a plurality of transparent areas TA and a low-transparency area LTA. The low-transparency area LTA may be the area in the first display area DA1 excluding the plurality of transparent areas TA. The low-transparency area LTA may include a plurality of light-emitting areas EA. 【0153】 The first optical region OA1 may include a low-transmittance region LTA which contains a plurality of light-emitting regions EA, and a plurality of first-transmittance regions TA1. The low-transmittance region LTA included in the first optical region OA1 may be a region in which light is transmitted with a lower transmittance than the first-transmittance region TA1. 【0154】 For example, each of the multiple first transparent regions TA1 can have various shapes, such as circular, elliptical, polygonal, or irregular. As an example, multiple first transparent regions TA1 can have the same shape. As another example, some of the multiple first transparent regions TA1 can have a different shape from the rest. Multiple first transparent regions TA1 may be regions that are separated from each other, or they may be regions that are connected to each other. 【0155】 The second optical region OA2 may include a low-transmittance region LTA containing multiple emission regions EA, and multiple second transmission regions TA2. The low-transmittance region LTA included in the second optical region OA2 may be a region through which light is transmitted with a lower transmittance than the second transmission region TA2. 【0156】 For example, each of the multiple TA2s can have various shapes, such as circular, elliptical, polygonal, or irregular. In one example, multiple second transparent regions TA2s may have the same shape. In another example, some of the multiple second transparent regions TA2s may have a different shape from the rest. Multiple second transparent regions TA2s may be regions that are separated from each other, or regions that are connected to each other. 【0157】 In one example, the first transparent region TA1 and the second transparent region TA2 may have the same shape. In another example, the first transparent region TA1 and the second transparent region TA2 may have different shapes. The sizes of the first transparent region TA1 and the second transparent region TA2 may be different. For example, the area of ​​the first transparent region TA1 may be smaller than the area of ​​the second transparent region TA2. 【0158】 Referring to Figure 5, the second display area DA2 may be a low-transparency area LTA. The second display area DA2 may include a low-transparency area LTA that contains multiple light-emitting areas EA. In other words, the entirety of the second display area DA2 may be a low-transparency area LTA, and the second display area DA2 may not include a transmissive area TA. 【0159】 On the other hand, by placing multiple touch electrodes TE not only in the second display area DA2 but also in the first optical area OA1 and the second optical area OA2 within the first display area DA1, it may be possible to enable touch across the entire display area DA. 【0160】 Accordingly, embodiments of this specification can provide a display device 100 in which a plurality of touch electrodes TE are arranged in a specific pattern and stacked structure in the first optical region OA1 and the second optical region OA2, thereby enabling touch in the optical regions while allowing the first electronic device 11 and / or the second electronic device 12 located at the bottom of the display panel to receive light normally. 【0161】 In other words, in the embodiments of this specification, a plurality of touch electrodes TE can be arranged in both the first optical region OA1 and the second optical region OA2 within the first display region DA1. 【0162】 Figure 6 is a cross-sectional view of the first display area DA1 in the display panel 110 according to an embodiment of this specification. 【0163】 The first display area DA1 may include a first optical area OA1 and a second optical area OA2. 【0164】 The first optical region OA1 may include a low-transmittance region LTA which contains a plurality of light-emitting regions EA, and a plurality of first-transmittance regions TA1. The low-transmittance region LTA included in the first optical region OA1 may be a region in which light is transmitted with a lower transmittance than the plurality of first-transmittance regions TA1. 【0165】 The second optical region OA2 may include a low-transmittance region LTA containing multiple light-emitting regions EA, and multiple second-transmittance regions TA2. The low-transmittance region LTA included in the second optical region OA2 may be a region through which light is transmitted with a lower transmittance than the multiple second-transmittance regions TA2. The second-transmittance region TA2 included in the second optical region OA2 may be a region through which light is transmitted with a higher transmittance than the first-transmittance region TA1 included in the first optical region OA1. For example, the configuration of the insulating layer included in the second-transmittance region TA2 may differ from the configuration of the insulating layer included in the first-transmittance region TA1. For example, the configuration of the insulating layer included in the second-transmittance region TA2 may be a region through which some of the multiple insulating layers have been removed, so that light is transmitted with a higher transmittance compared to the configuration of the insulating layer included in the first-transmittance region TA1. 【0166】 The display panel 110 may include a transistor formation section, a light-emitting element formation section, a sealing section, and a touch sensor. 【0167】 The transistor formation section may include a substrate SUB, a first buffer layer BUF1 on the substrate SUB, various transistors TFT1, TFT2, a storage capacitor Cst, and various electrodes or signal wiring formed on the first buffer layer BUF1. 【0168】 The substrate SUB may include a first substrate SUB1 and a second substrate SUB2, and may include a substrate intermediate layer INTL between the first substrate SUB1 and the second substrate SUB2. Here, for example, the substrate intermediate layer INTL may be an inorganic layer that can block moisture penetration. 【0169】 A lower shielding metal BSM can be placed on the substrate SUB. The lower shielding metal BSM can be located beneath the first active layer ACT1 of the first transistor TFT1. 【0170】 The first buffer layer BUF1 may be single-layer or multi-layer. If the first buffer layer BUF1 is multi-layer, it may include a multi-buffer layer MBUF and an active buffer layer ABUF. 【0171】 Various transistors TFT1, TFT2, storage capacitor Cst, and various electrodes or signal wiring can be formed on the first buffer layer BUF1. 【0172】 For example, transistors TFT1 and TFT2 formed on the first buffer layer BUF1 can be made of the same material and located on the same layer. In contrast, as shown in Figure 6, the first transistor TFT1 and the second transistor TFT2 may be made of different materials and located on different layers. 【0173】 The first transistor TFT1 may include a first active layer ACT1, a first gate electrode G1, a first source electrode S1, and a first drain electrode D1. The second transistor TFT2 may include a second active layer ACT2, a second gate electrode G2, a second source electrode S2, and a second drain electrode D2. 【0174】 The second active layer ACT2 of the second transistor TFT2 can be positioned higher than the first active layer ACT1 of the first transistor TFT. 【0175】 The first active layer ACT1 of the first transistor TFT1 and the second active layer ACT2 of the second transistor TFT2 may be made of different semiconductor materials. For example, the first active layer ACT1 of the first transistor TFT1 may be made of a different semiconductor material than the second active layer ACT2 of the second transistor TFT2. For example, the first active layer ACT1 of the first transistor TFT1 may be made of a silicon-based semiconductor material. For example, silicon-based semiconductor materials may include low-temperature polysilicon (LTPS: Low-Temperature Polycrystalline Silicon). For example, the second active layer ACT2 of the second transistor TFT2 may be made of an oxide semiconductor material. For example, oxide semiconductor materials may include IGZO (Indium gallium zinc oxide), IGZTO (Indium gallium zinc tin oxide), ZnO (zinc oxide), CdO (cadmium oxide), InO (indium oxide), ZTO (zinc tin oxide), ZITO (zinc indium tin oxide), etc. 【0176】 A first buffer layer BUF1 may be placed beneath the first active layer ACT1 of the first transistor TFT1, and a second buffer layer BUF2 may be placed beneath the second active layer ACT2 of the second transistor TFT2. 【0177】 In other words, the first active layer ACT1 of the first transistor TFT1 can be located on the first buffer layer BUF1, and the second active layer ACT2 of the second transistor TFT2 can be located on the second buffer layer BUF2. Here, the second buffer layer BUF2 can be located higher than the first buffer layer BUF1. 【0178】 The first active layer ACT1 of the first transistor TFT1 is placed on the first buffer layer BUF1, and the first gate insulating layer GI1 may be placed on the first active layer ACT1 of the first transistor TFT1. The first gate electrode G1 of the first transistor TFT1 can be placed on the first gate insulating layer GI1, and the first interlayer insulating layer ILD1 can be placed on the first gate electrode G1 of the first transistor TFT1. 【0179】 The first active layer ACT1 of the first transistor TFT1 may include a first channel region overlapping with the first gate electrode G1, a first source connection region located on one side of the first channel region, and a first drain connection region located on the other side of the channel region. 【0180】 A second buffer layer BUF2 can be placed on the first interlayer insulating layer ILD1. 【0181】 The second active layer ACT2 of the second transistor TFT2 can be placed on the second buffer layer BUF2, and the second gate insulating layer GI2 can be placed on the second active layer ACT2. The second gate electrode G2 of the second transistor TFT2 can be placed on the second gate insulating layer GI2, and the second interlayer insulating layer ILD2 can be placed on the second gate electrode G2. 【0182】 The second active layer ACT2 of the second transistor TFT2 may include a second channel region overlapping with the second gate electrode G2, a second source connection region located on one side of the second channel region, and a second drain connection region located on the other side of the channel region. 【0183】 The first source electrode S1 and the first drain electrode D1 of the first transistor TFT1 can be placed on the second interlayer insulating layer ILD2. Similarly, the second source electrode S2 and the second drain electrode D2 of the second transistor TFT2 can be placed on the second interlayer insulating layer ILD2. 【0184】 The first source electrode S1 and the first drain electrode D1 of the first transistor TFT1 can be connected to the first source connection region and the first drain connection region of the first active layer ACT1, respectively, through the second interlayer insulating layer ILD2, the second gate insulating layer GI2, the second buffer layer BUF2, the first interlayer insulating layer ILD1, and through holes in the first gate insulating layer GI1. 【0185】 The second source electrode S2 and the second drain electrode D2 of the second transistor TFT2 can be connected to the second source connection region and the second drain connection region of the second active layer ACT2, respectively, through through-holes in the second interlayer insulating layer ILD2 and the second gate insulating layer GI2. 【0186】 The storage capacitor Cst may include a first capacitor electrode PLT1 and a second capacitor electrode PLT2. 【0187】 The first capacitor electrode PLT1 can be electrically connected to the second gate electrode G2 of the second transistor TFT2, and the second capacitor electrode PLT2 can be electrically connected to the second source electrode S2 of the second transistor TFT2. 【0188】 The lower metal BML can be placed beneath the second active layer ACT2 of the second transistor TFT2. The lower metal BML can overlap all or part of the second active layer ACT2. 【0189】 For example, the lower metal BML can be electrically connected to the second gate electrode G2. In another example, the lower metal BML can function as a light shield that blocks light incident from below. In this case, the lower metal BML may be electrically connected to the second source electrode S2. 【0190】 For example, the first transistor TFT1 is a drive transistor for driving the light-emitting element ED, and the second transistor TFT2 may be a scan transistor or a light-emitting control transistor. However, it is not limited to this, and as shown in Figure 6, the first transistor TFT1 may be a scan transistor or a light-emitting control transistor, and the second transistor TFT2 may be a drive transistor for driving the light-emitting element ED. Here, the light-emitting control transistor is a transistor that can control whether or not the light-emitting element emits light by controlling the connection between the drive transistor and the light-emitting element according to the light-emitting control signal. 【0191】 The display panel 110 may include a planarization layer PLN disposed on the first transistor TFT1 and the second transistor TFT2. 【0192】 For example, the planarization layer PLN may include a first planarization layer PLN1. The first planarization layer PLN1 may be placed on the first source electrode S1 and first drain electrode D1 of the first transistor TFT1, and on the second source electrode S2 and second drain electrode D2 of the second transistor TFT2. 【0193】 A relay electrode RE can be placed on the first planarization layer PLN1. The relay electrode RE may be an electrode that relays the electrical connection between the second source electrode S2 of the second transistor TFT2 and the pixel electrode PE of the light-emitting element ED. For example, the relay electrode RE may be electrically connected to the first drain electrode D1 or the first source electrode S1 of the first transistor TFT1 via a hole in the first planarization layer PLN1. As another example, the relay electrode RE may be electrically connected to the second source electrode S2 or the second drain electrode D2 of the second transistor TFT2 via a hole in the first planarization layer PLN1. 【0194】 The planarization layer PLN arranged on the display panel 110 may further include a second planarization layer PLN2 on the first planarization layer PLN1. For example, the second planarization layer PLN2 may be arranged so as to cover the relay electrode RE located on the first planarization layer PLN1. 【0195】 Referring to Figure 6, the light-emitting element forming section can be located on the second planarization layer PLN2 and may include a pixel electrode PE, an intermediate layer EL, and a common electrode CE for forming the light-emitting element ED. 【0196】 The light-emitting element ED can be composed of a region where the pixel electrode PE, the intermediate layer EL, and the common electrode CE overlap. 【0197】 The pixel electrode PE can be placed on the second planarization layer PLN2. The pixel electrode PE can be connected to the relay electrode RE through holes in the second planarization layer PLN2. 【0198】 Bank BK can be placed on the pixel electrode PE. 【0199】 The bank BK can contain bank holes, through which a portion of the pixel electrode PE can be exposed. That is, the bank holes formed in the bank BK can overlap with a portion of the pixel electrode PE. The bank BK can contain a black pigment. For example, the bank BK can contain an organic material containing a black pigment. 【0200】 The intermediate layer EL can be placed on the bank BK. The intermediate layer EL can come into contact with a portion of the pixel electrode PE through the bank hole. 【0201】 At least one additional spacer SPCR may be present between the intermediate layer EL and the bank BK. 【0202】 A common electrode CE can be placed on the intermediate layer EL. The common electrode CE may include a common electrode hole CH. A common electrode hole CH formed on the common electrode CE can be placed in the first display region DA1. One common electrode hole CH can exist between two adjacent light-emitting regions EA. 【0203】 A common electrode CE is placed in the general region NA and the light-emitting region EA included in the first display region DA1, but a common electrode CE does not need to be placed in the transmission region TA within the first display region DA1. That is, the transmission region TA within the first display region DA1 can correspond to the common electrode hole CH, which is the opening of the common electrode CE. 【0204】 If the transmittance of the first optical region OA1 is the same as the transmittance of the second optical region OA2, the laminated structure of the first transmission region TA1 within the first optical region OA1 may be exactly the same as the laminated structure of the second transmission region TA2 within the second optical region OA2. 【0205】 If the transmittance of the first optical region OA1 differs from that of the second optical region OA2, the laminated structure of the first transparent region TA1 within the first optical region OA1 may differ in part from the laminated structure of the second transparent region TA2 within the second optical region OA2. For example, in the first transparent region TA1 of the first optical region OA1, at least one of the sealing layer ENCAP, the touch sensor layer TSL, and the planarization layer PLN, described later, can be removed. For example, in the first transparent region TA1 of the first optical region OA1, the distance from the substrate SUB to the top surface of the first transparent region TA1 may be smaller than the distance from the substrate SUB to the top surface of the second transparent region TA2 in the second transparent region OA2. 【0206】 Referring to Figure 6, the sealing portion can be placed on the common electrode CE. The sealing portion may include a sealing layer ENCAP formed on the common electrode CE. 【0207】 The sealing layer ENCAP may be a layer that prevents moisture and oxygen from penetrating the light-emitting element ED. In particular, the sealing layer ENCAP can prevent moisture or oxygen from penetrating the intermediate layer EL, which may include an organic layer. Here, the sealing layer ENCAP may consist of a single layer or a multilayer structure. 【0208】 The ENCAP sealing layer may include a first sealing layer PAS1, a second sealing layer PCL, and a third sealing layer PAS2. For example, the first sealing layer PAS1 and the third sealing layer PAS2 may be inorganic layers (inorganic sealing layers), and the second sealing layer PCL may be an organic layer (organic sealing layer). By being composed of an organic layer, the second sealing layer PCL can function as a planarization layer. 【0209】 Referring to Figure 6, in the case where the touch sensor TS is built into the display panel 110, the touch sensor layer TSL can be placed on the sealing layer ENCAP. The structure of the touch sensor layer TSL and the touch sensor TS is described in detail below. 【0210】 The touch sensor layer TSL may include a touch sensor metal TSM and a bridge metal BRG, and may further include insulating layers such as a sensor buffer layer S-BUF, an inter-sensor insulating layer S-ILD, and a sensor protection layer S-PAC. Here, the inter-sensor insulating layer S-ILD may include one or more insulating layers. 【0211】 The sensor buffer layer S-BUF can be placed on the sealing layer ENCAP. The bridge metal BRG can be placed on the sensor buffer layer S-BUF, and the inter-sensor insulating layer S-ILD can be placed on the bridge metal BRG. Here, the sensor buffer layer S-BUF may be omitted. 【0212】 The touch sensor TS may include a touch sensor metal TSM and a bridge metal BRG located in different layers. 【0213】 The touch sensor metal TSM can be placed on the sensor interlayer insulating layer S-ILD. 【0214】 Multiple touch sensor metal TSMs can constitute a single touch electrode (or a single touch electrode line), be arranged in a mesh, and be electrically connected. 【0215】 A portion of the touch sensor metal TSM and another portion of the touch sensor metal TSM can be electrically connected via a bridge metal BRG to form a single touch electrode (or a single touch electrode line). 【0216】 For example, the touch sensor metal TSM may include a first touch sensor metal TSM, a second touch sensor metal TSM, and a third touch sensor metal TSM, which are arranged adjacent to each other. If the third touch sensor metal TSM is located between the first touch sensor metal TSM and the second touch sensor metal TSM, and the first touch sensor metal TSM and the second touch sensor metal TSM must be electrically connected to each other, then the first touch sensor metal TSM and the second touch sensor metal TSM can be electrically connected to each other via a bridge metal BRG located in a different layer. The bridge metal BRG can be insulated from the third touch sensor metal TSM by an inter-sensor layer insulating layer S-ILD. 【0217】 When a touch sensor TS is formed on the display panel 110, chemicals used in the process (such as developer and etching solutions) or moisture from the outside may be generated. By placing the touch sensor TS on a sensor buffer layer S-BUF, it is possible to prevent chemicals or moisture from penetrating the light-emitting layer EL, which contains organic matter, during the manufacturing process of the touch sensor TS. As a result, the sensor buffer layer S-BUF can prevent damage to the light-emitting layer EL, which is vulnerable to chemicals or moisture. 【0218】 The sensor buffer layer (S-BUF) can be formed at a low temperature (e.g., below 100°C) to prevent damage to the light-emitting layer (EL) which contains organic materials that are vulnerable to high temperatures, and can be formed from an organic insulating material having a low dielectric constant of 1 to 3. 【0219】 For example, the sensor buffer layer S-BUF can be formed from an acrylic, epoxy, or siloxane-based material. Depending on the warping of the display device 100, the sealing layer ENCAP may be damaged, and the touch sensor metal located on the sensor buffer layer S-BUF may be damaged. Even if the display device 100 warps, the sensor buffer layer S-BUF, which has planarization properties as an organic insulating material, can prevent damage to the sealing layer ENCAP and / or cracking of the metal TSM and BRG constituting the touch sensor TS. However, it is not limited to this. For example, the sensor buffer layer S-BUF can be formed from an inorganic insulating material such as silicon nitride (SiNx) or silicon oxide (SiOx). 【0220】 The sensor protection layer S-PAC may be positioned to cover the touch sensor TS. The sensor protection layer S-PAC may be an organic insulating film. 【0221】 The touch sensor metal TSM and bridge metal BRG can be placed in the low-transparency region LTA within the first display region DA1. The touch sensor metal TSM and bridge metal BRG do not necessarily have to be placed in the transparent region TA within the first display region DA1. The touch sensor metal TSM and bridge metal BRG can be placed so as not to overlap with the light-emitting region EA within the low-transparency region LTA. 【0222】 At least a portion of the touch sensor metal TSM located on the sealing layer ENCAP in the display area DA extends along the outer inclined surface of the sealing layer ENCAP and may be electrically connected to a pad located further out than the outer inclined surface of the sealing layer ENCAP. Here, the pad may be located in the non-display area NDA and may be a metal pattern to which the touch driving circuit 260 is electrically connected. 【0223】 In the transmission region TA, a common electrode hole CH may be formed in the common electrode CE. The common electrode hole CH can overlap with the transmission region TA. 【0224】 Furthermore, holes may be formed in the bank BK within the permeable region TA. That is, there may be holes in the bank BK that overlap with the permeable region TA. 【0225】 At least a portion of the first display area DA1 can be superimposed on the electronic device 10. The electronic device 10 may be the first electronic device 11 and / or the second electronic device 12. 【0226】 The first electronic device 11 and / or the second electronic device 12 can perform predetermined operations upon receiving light transmitted through the optical region OA. 【0227】 A touch sensor metal TSM may be placed in the light-emitting region EA within the first display region DA1, while the touch sensor metal TSM may not be placed in the transmissive region TA within the optical region OA. 【0228】 Since all or part of the optical region OA overlaps with the first electronic device 11 and / or the second electronic device 12, in order for touch recognition in the optical region OA and the normal operation of the first electronic device 11 and / or the second electronic device 12, it is necessary to place the touch sensor metal TSM in the optical region OA without reducing the light transmittance in the optical region OA. 【0229】 Figure 7 is a cross-sectional view of the second display area DA2 in the display panel 110 according to an embodiment of this specification. 【0230】 Referring to Figures 6 and 7, the stacked structure of the second display area DA2 may be identical to the stacked structure of the low-transparency area LTA within the first display area DA1. Therefore, the description of the same layer may be omitted. 【0231】 The first display area DA1 is the area where a light-transmitting structure and a light-transmitting area TA should be formed, while the second display area DA2 is the area where a light-transmitting structure and a light-transmitting area TA do not need to be formed. 【0232】 In other words, the entirety of the second display area DA2 may be a low-transparency area LTA, and the second display area DA2 may not include a transparent area TA. 【0233】 Therefore, the second display area DA2 does not need to overlap with the first electronic device 11 and / or the second electronic device 12, which receive light transmitted through the display panel 110 and perform predetermined operations using the received light. 【0234】 Conversely, the first display area DA1 can be superimposed on a first electronic device 11 and / or a second electronic device 12 that receive light transmitted through the display panel 110 and perform predetermined operations using the received light; therefore, a light-transmitting structure must be formed in this area. 【0235】 In other words, in one or more optical regions OA1, OA2 included in the first display region DA1, both an image display structure and a light transmission structure must be formed. 【0236】 Since all or part of the optical region OA overlaps with the first electronic device 11 and / or the second electronic device 12, in order for touch recognition in the optical region OA and for the normal operation of the first electronic device 11 and / or the second electronic device 12, it is necessary to place the touch sensor metal TSM in the optical region OA without reducing the light transmittance in the optical region OA. 【0237】 Embodiments according to this specification can provide a display device 100 in which a touch sensor metal TSM is placed in the optical region OA within the first display region DA1, thereby improving the touch performance to the same or substantially the same level as the general region NA, which is the second display region DA2, while addressing any potential drawbacks that may arise from this. 【0238】 The following describes in detail the touch electrode TE and touch sensor metal TSM arranged in the display panel 110 according to the embodiments of this specification. 【0239】 Figure 8 is a diagram illustrating the touch electrodes TE arranged on the display panel 110 according to an embodiment of this specification. 【0240】 Referring to Figure 8, a single touch electrode TE may be of the mesh type having multiple aperture regions 800. That is, a single touch electrode TE may be a touch sensor metal TSM patterned in a mesh type so as to have multiple aperture regions 800. 【0241】 Each of the multiple aperture regions 800 present in a single touch electrode TE may correspond to the light-emitting region of one or more subpixels SP. In other words, the multiple aperture regions 800 serve as paths through which light emitted from multiple subpixels SP located below passes. 【0242】 Referring to Figure 8, each of the aperture regions 800 of the touch sensor metal TSM located within the region of the touch electrode TE, which is made of a mesh-type patterned touch sensor metal TSM, can correspond to the light-emitting regions EA of one or more subpixels SP. 【0243】 For example, each of the multiple aperture regions 800 present within the region of a single touch electrode TE may correspond to one or more light-emitting regions EA, such as red subpixels, green subpixels, and blue subpixels. 【0244】 In another example, each of the multiple aperture regions 800 present within the region of a single touch electrode TE may correspond to one or more light-emitting regions EA, such as red subpixels, green subpixels, blue subpixels, and white subpixels. 【0245】 In a planar view, the presence of one or more subpixel light-emitting regions EA within the aperture region 800 of each touch electrode TE enables touch sensing while simultaneously increasing the aperture ratio and luminous efficiency of the display panel 110. 【0246】 As mentioned above, the general outline of the outer casing of a single touch electrode TE may be rhombic or rectangular, and the aperture region 800 of a single touch electrode TE may also be rhombic or rectangular. However, it is not limited to these. 【0247】 The actual touch sensor metal TSM, which is not one of the multiple aperture regions 800 within the touch electrode TE, can be placed on top of the bank BK, overlapping with the bank BK. 【0248】 Such an arrangement may also be performed in the second display area DA2, and in the first optical area OA1 and / or the second optical area OA2 of the first display area DA1, it is not necessary to place the touch sensor metal TSM in order to improve transmittance. 【0249】 This is because, in the first optical region OA1, a light-transmitting structure must be formed to allow light to pass through to the first electronic device 11, and in the second optical region OA2, a light-transmitting structure must be formed to allow light to pass through to the second electronic device 12. 【0250】 However, if the touch sensor metal TSM is not placed in the first optical region OA1 and / or the second optical region OA2, a difference in visibility will occur between the region where the touch sensor metal TSM is placed and the region where it is placed, and a brightness deviation may occur depending on the viewing angle. 【0251】 Furthermore, if there are areas where no touch sensor metal TSM is placed at all, the resistance of the touch sensor metal TSM increases and the capacitance decreases, resulting in a drawback where the touch performance across the entire display area DA deteriorates. 【0252】 Therefore, in order to solve this problem, the present inventors have devised a display device 100 having a light-transmitting structure that allows the first electronic device 11 and / or the second electronic device 12 located at the bottom of the display panel 110 to receive light normally, while maintaining touch performance in the optical area OA, by arranging the touch sensor metal TSM in the first optical area OA1 and / or the second optical area OA2. 【0253】 The arrangement structure of the touch sensor metal TSM according to the embodiments of this specification will be described in detail below with reference to Figures 9 to 12. 【0254】 Figure 9 is a plan view showing the arrangement of the touch sensor metal TSM according to the embodiment described herein. 【0255】 In the following, the first optical region OA1 and / or the second optical region OA2 may be referred to as optical region OA. 【0256】 Hereinafter, the first electronic device 11 and / or the second electronic device 12 may be referred to as electronic device 10. 【0257】 The second display area DA2, which does not include the optical area OA, may not include the transmission area TA and may instead be the low transmission area LTA. 【0258】 On the other hand, the optical region OA can include both the transmission region TA and the low transmission region LTA. 【0259】 The low-transmission region LTA may be the region obtained by subtracting multiple transmission regions TA from the optical region OA. The low-transmission region LTA may include multiple emission regions EA. 【0260】 The display device 100 according to the embodiments herein may have a light-transmitting region TA for a light-transmitting structure in the optical region OA, and may arrange the touch sensor metal TSM in a specific pattern to provide a touch sensing function for sensing the presence or absence of a touch and / or touch coordinates. 【0261】 In this case, a touch sensor metal TSM of a specific pattern can have an aperture that overlaps with the transmission region TA in the optical region OA. 【0262】 In the transmission region TA, a common electrode hole CH may be formed in the common electrode CE. That is, the common electrode hole CH can overlap with the transmission region TA. 【0263】 In this case, the common electrode hole CH can have various shapes, such as circular, elliptical, square, hexagonal, or octagonal. 【0264】 Furthermore, the arrangement of the common electrode holes CH may be regular or irregular. 【0265】 For example, if the arrangement of common electrode holes CH is regular, the distance between adjacent first common electrode holes CH and second common electrode holes CH may be the same as, or substantially the same as, the distance between adjacent second common electrode holes CH and third common electrode holes CH. 【0266】 As another example, if the arrangement of common electrode holes CH is irregular, the distance between adjacent first common electrode holes CH and second common electrode holes CH may differ from the distance between adjacent second common electrode holes CH and third common electrode holes CH. 【0267】 To pattern the common electrode CE, a metal patterning layer MPL can be placed in the common electrode hole CH. 【0268】 In the region overlapping with the transmission region TA, the metal patterning layer MPL can function as the electron injection layer EIL. The metal patterning layer MPL that functions as the electron injection layer EIL in the common electrode hole CH and the layer that functions as the electron injection layer EIL in the region where the common electrode hole CH is not formed (for example, the electron injection layer EIL of the intermediate layer EL) can contain different materials from each other. 【0269】 The metal patterning layer (MPL) may include a common electrode patterning material. 【0270】 For example, if the common electrode CE is a cathode, the common electrode patterning material included in the metal patterning layer MPL may be a cathode patterning material. For example, the metal patterning layer MPL may contain fluorine compounds or organic substances. Looking at the process of forming the common electrode hole CH, first the metal patterning layer MPL is formed. The metal patterning layer MPL can have various shapes, such as circular, elliptical, and octagonal. After the metal patterning layer MPL is formed, the common electrode CE can be formed. The common electrode CE can be deposited on the entire surface of the display device 100. In the process of depositing the common electrode CE on the front surface of the display device 100, the common electrode CE does not have to be deposited in the region that overlaps with the metal patterning layer MPL. Therefore, the common electrode CE may not be formed in the region that overlaps with the metal patterning layer MPL. That is, the region where the metal patterning layer MPL is formed is the common electrode hole CH, and the common electrode CE may contain the common electrode hole CH. 【0271】 When the touch sensor metal TSM is placed on the transparent region TA that overlaps with the common electrode hole CH, the touch sensor metal TSM can prevent light transmission in the transparent region TA. Therefore, in order for the electronic device 10 located below the substrate to receive light normally, it is advantageous to place the opening of the touch sensor metal TSM on the transparent region TA. 【0272】 In contrast, in the second display area DA2 where the transparent area TA does not exist, the touch sensor metal TSM does not need to have an opening that overlaps with the transparent area TA. 【0273】 The following describes in detail the touch sensor metal TSM arranged in a specific pattern within the optical area OA of the first display area DA1. 【0274】 Figure 10 is a plan view of the touch sensor metal TSM (e.g., the first touch sensor metal) located in the optical region OA and the touch sensor metal TSM (e.g., the second touch sensor metal) located in the second display region DA2, enlarged from 900 in Figure 9. 【0275】 By placing touch sensor metal TSMs in both the optical area OA included in the first display area DA1 and the second display area DA2 located outside the first display area DA1, it is possible to enable touch operation across the entire area of ​​the display area DA. 【0276】 In this case, the low-transmittance region LTA within the optical region OA may include a first low-transmittance region LTA1 in which a plurality of first light-emitting regions EAa are arranged, a second low-transmittance region LTA2 separated from the first low-transmittance region LTA1 and in which a plurality of second light-emitting regions EAb are arranged, and a third low-transmittance region LTA3 separated from the second low-transmittance region LTA and in which a plurality of third light-emitting regions EAc are arranged. 【0277】 Furthermore, the optical region OA is positioned between the first low-transmission region LTA1 and the second low-transmission region LTA2, and between the second low-transmission region LTA2 and the third low-transmission region LTA3, and may include an intermediate region MA that contains at least one of the multiple transmission regions TA. 【0278】 The low-transmittance region (LTA) may include the light-emitting region (EA). 【0279】 Multiple light-emitting regions EA may include a first-color light-emitting region EA1 that emits a first color of light, a second-color light-emitting region EA2 that emits a second color of light, and a third-color light-emitting region EA3 that emits a third color of light. 【0280】 At least one of the light-emitting regions EA1 of the first color, the light-emitting regions EA2 of the second color, and the light-emitting regions EA3 of the third color can have an area different from that of the others. The first color, the second color, and the third color can be various colors as different colors. For example, the first color, the second color, and the third color can include red, green, and blue. 【0281】 When the touch sensor metal TSM is disposed on the light-emitting region EA, there may be a visibility problem while the touch sensor metal TSM covers the light emission in the light-emitting region. Therefore, it is advantageous that the touch sensor metal TSM is not disposed on the light-emitting region. 【0282】 Therefore, the touch sensor metal TSM according to the embodiment of the present specification can have openings overlapping the light-emitting regions EA1 of the first color, the light-emitting regions EA2 of the second color, and the light-emitting regions EA3 of the third color. 【0283】 That is, in a plan view, by having light-emitting regions of one or more sub-pixels in each of the opening regions 800 of the touch sensor metal TSM, it is possible to enhance the light emission efficiency of the display panel 110 while enabling touch sensing. 【0284】 Also, when the touch sensor metal TSM is disposed on the transmission region TA, the touch sensor metal TSM can prevent light transmission in the transmission region TA. Therefore, in order for the electronic device 10 located below the substrate SUB to receive light normally, it is advantageous that the touch sensor metal TSM is not disposed on the transmission region TA. 【0285】 Therefore, the touch sensor metal TSM according to the embodiment of the present specification can have a first opening overlapping the light-emitting region EA1 of the first color, a second opening overlapping the light-emitting region EA2 of the second color, and a third opening overlapping the light-emitting region EA3 of the third color or the transmission region TA. At least one of the first opening, the second opening, and the third opening may be different in size from the sizes of the other openings. For example, the size of the first opening may be different from the size of the second opening. 【0286】 At this time, a part of the touch sensor metal TSM and another part of the touch sensor metal TSM may be connected to each other. 【0287】 Also, the widths of the touch sensor metal TSM surrounding each opening may be different from each other. 【0288】 As an example, in the touch sensor metal TSM, the width of the portion disposed at the boundary between the first opening and the third opening may be different from the width of the portion disposed at the boundary between the third openings. 【0289】 In another example, the width of the portion disposed at the boundary between the second opening and the third opening of the touch sensor metal TSM may be different from the width of the portion disposed at the boundary between the third openings. As yet another example, the width of the touch sensor metal TSM adjacent to the transmission region TA within the optical region OA may be relatively narrower than the width of the touch sensor metal TSM that is relatively far from the transmission region TA. 【0290】 The width of the touch sensor metal TSM disposed in the second display region DA2 and the width of the touch sensor metal TSM disposed in the optical region OA may be different. For example, the width of the touch sensor metal TSM disposed in the second display region DA2 may be smaller than the width of the touch sensor metal TSM disposed in the optical region OA. Since the density of the touch sensor metal TSM disposed in the optical region OA is smaller than the density of the touch sensor metal TSM disposed in the second display region DA2, for performance improvement of the touch sensor TS and the like, the width of the touch sensor metal TSM disposed in the optical region OA may be larger than the width of the touch sensor metal TSM disposed in the second display region DA2. 【0291】 Also, a part of the touch sensor metal TSM and another part of the touch sensor metal TSM may be separated by the third opening. 【0292】 The touch sensor metal TSM according to the embodiments of this specification includes a first portion located in a first low-transparency region LTA1 and having a plurality of openings overlapping with a plurality of first light-emitting regions EAa, a second portion located in a second low-transparency region LTA2 and having a plurality of openings overlapping with a plurality of second light-emitting regions EAb, and a third portion located in an intermediate region MA, connecting the first portion and the second portion and having a plurality of openings overlapping with the transparent region TA, and the first portion, the second portion and the third portion can be connected in a mesh-like manner. 【0293】 In other words, in the field of optical office automation, the touch sensor metal TSM can be patterned in a mesh type and its various parts can be connected. 【0294】 In this case, the first and second portions of the touch sensor metal TSM may be connected by a line-shaped touch sensor metal TSM. Also, at least one signal wiring SL1, SL2 may include a wiring portion arranged parallel to the line shape of the touch sensor metal TSM and overlap at least a portion of the line-shaped touch sensor metal TSM. For example, at least one signal wiring SL1, SL2 may include a wiring portion arranged parallel to the third portion and overlapping at least partially with the third portion. 【0295】 Since the second display area DA2 does not have a transparent area TA, the touch sensor metal TSM according to the embodiment of this specification may have an opening in the second display area DA2 that overlaps with the light-emitting area EA, but may not have an opening that overlaps with the transparent area TA. 【0296】 In other words, the aperture of the touch sensor metal TSM (e.g., the second touch sensor metal) located in the second display area DA2 may have at least one aperture having a different size from the aperture of the touch sensor metal TSM (e.g., the first touch sensor metal) located in the optical area OA. 【0297】 When the touch sensor metal TSM is arranged in the manner described above, it is possible to enable normal touch operation in the optical region OA, which is also included in the display region DA of the display panel 110, and where the optical electronic device is superimposed. 【0298】 Furthermore, by placing touch sensor metal TSMs in the optical OA area, differences in brightness between areas due to the presence or absence of touch sensor metal TSMs are eliminated, thereby improving visibility. 【0299】 The following describes the vertical arrangement of the touch sensor metal TSM according to the embodiments of this specification. 【0300】 Figures 11 and 12 are cross-sectional views of the display panel 110 corresponding to the optical region OA, cut along the line A-A' in Figure 10. 【0301】 The explanation of the laminated structures in Figures 11 and 12, which are the same as the laminated structure in Figure 6, can be omitted. 【0302】 The optical region OA may include a transmission region TA and a low transmission region LTA. 【0303】 The low-transmittance region (LTA) can transmit light at a lower transmittance than the transmittance region (TA), but it is not a region where light cannot be transmitted at all. 【0304】 Various insulating layers can be placed on the substrate SUB. These insulating layers may form transistors and capacitors included in the subpixel SP, and may also be insulating layers for forming various signal lines SL1 and SL2. 【0305】 For example, the various insulating layers may include a first buffer layer BUF1, a first gate insulating layer GI1, a first interlayer insulating layer ILD1, a second buffer layer BUF2, a second gate insulating layer GI2, a second interlayer insulating layer ILD2, a first planarization layer PLN1, a second planarization layer PLN2, and a bank BK. 【0306】 For example, the signal wirings SL1 and SL2 may be data lines DL, gate lines GL, and / or power supply lines. 【0307】 Various metal layers can be disposed between various insulating layers disposed on the substrate SUB, and various signal wirings SL1 and SL2 can be formed through these metal layers. At this time, the plurality of signal wirings SL1 and SL2 can include a first signal wiring SL1 and a second signal wiring SL2. 【0308】 The signal wirings SL1 and SL2 can be disposed on the first planarization layer PLN1. 【0309】 The signal wirings SL1 and SL2 can include the same material as the relay electrode RE that electrically connects the source electrode or the drain electrode and the pixel electrode PE. 【0310】 The common electrode CE can be disposed in the low transmittance region LTA. 【0311】 However, in the transmission region TA, the common electrode CE may not be disposed, and a common electrode hole CH may be formed. 【0312】 Similarly, in order to increase the light transmittance in the transmission region TA, the signal wirings SL1 and SL2, the pixel electrode PE, the transistor TFT, and the touch sensor metal TSM can be disposed not in the transmission region TA but in the low transmittance region LTA. 【0313】 However, even in the low transmittance region LTA, light transmission may occur, and such light transmission may be blocked by metals such as the touch sensor metal TSM and the signal wirings SL1 and SL2. 【0314】 For example, when light transmission occurs in the low transmittance region LTA, a light diffraction phenomenon may occur due to the separation space between metals in the insulating layer. The light diffraction phenomenon is a phenomenon in which waves spread when light waves or the like pass through an obstacle or a narrow gap. 【0315】 For example, if touch sensor metal TSMs within the optical region OA are positioned at a distance from each other on the optical path through which light emitted from a light-emitting element ED within the optical region OA (light for displaying images) is emitted to the front of the display panel 110, a light diffraction phenomenon may occur where the light emitted to the front of the display panel 110 via the optical region OA is diffracted by the separation space between the touch sensor metal TSMs. 【0316】 However, according to the embodiments of this specification, by arranging the touch sensor metal TSM within the optical region OA so as to surround the light-emitting element ED without overlapping with it, it is possible to form a touch sensor structure within the optical region OA while reducing the optical diffraction phenomenon. 【0317】 As another example, if light incident on the upper surface of the display panel 110 (for example, light to be input to an infrared sensor or camera) passes through the optical region OA of the display panel 110 and exits to the back of the display panel 110, and metal signal wirings SL1, SL2, etc. are placed at a distance from each other along the optical path, a light diffraction phenomenon may occur where the light passing through the optical region OA is diffracted by the space between the metals. 【0318】 However, according to the embodiments of this specification, by arranging the touch sensor metal TSM in the low-transmittance region LTA so as to overlap with the separation space between signal wirings SL1 and SL2, the optical diffraction phenomenon that may occur between signal wirings SL1 and SL2 can be reduced. 【0319】 Specifically, referring to Figures 11 and 12, by arranging the touch sensor metal TSM in superimposed on the signal wiring SL1 and SL2, interference by the metal during light transmission in the low-transparency region LTA can be minimized. 【0320】 Referring to Figure 11, the display device 100 according to the embodiment of this specification can prevent light diffraction due to the space between multiple signal lines SL1 and SL2 in the low-transparency region LTA. In this case, the display device 100 according to the embodiment of this specification may include a touch sensor metal TSM that overlaps simultaneously with a portion of the first signal line SL1 and a portion of the second signal line SL2 in the low-transparency region LTA. 【0321】 Light transmission in the low-transparency region LTA can be obstructed by metals such as the touch sensor metal TSM and signal wiring SL1, SL2. However, as shown in Figure 12, in the display device 100 according to this embodiment, the obstruction of light transmission by metals can be minimized by arranging the touch sensor metal TSM and signal wiring SL1, SL2 to overlap. The width of each of the multiple signal wirings SL1, SL2 may be smaller than the width of the touch sensor metal TSM. 【0322】 Referring to Figure 12, the touch sensor metal TSM can be positioned so that the center of the signal wiring SL1 and SL2 overlaps with the center of the touch sensor metal TSM. However, it is not limited to this. 【0323】 In this case, at least one signal line SL may include a data line DL. 【0324】 Furthermore, the bank BK can be placed on the pixel electrode PE, and signal wirings SL1 and SL2, such as the first signal wiring SL1 and the second signal wiring SL2, can be superimposed on the bank BK. 【0325】 The display device 100 according to the embodiments of this specification may include an electronic device 10 located below the substrate SUB, overlapping with the optical region OA, and performing predetermined operations using light. 【0326】 For example, the display device 100 according to the embodiments of this specification may include a first electronic device 11 located below the substrate SUB, overlapping with the optical region OA, and performing a predetermined operation using light in a different wavelength band than the light emitted from the light-emitting region EA within the display region DA. 【0327】 As another example, the display device 100 according to the embodiments herein may further include a second electronic device 12 located below the substrate SUB, overlapping with the optical region OA, and performing predetermined operations using light in a wavelength range including light emitted from the light-emitting region EA within the display region DA. 【0328】 In this case, the first electronic device 11 may be an infrared sensor, and the second electronic device 12 may be a camera. 【0329】 The optical region OA may include a first optical region and a second optical region. In this case, the size of the first optical region may differ from the size of the second optical region. For example, if an infrared sensor overlaps with the first optical region and a camera overlaps with the second optical region, the size of the first optical region may be smaller than the size of the second optical region. 【0330】 Figure 13 shows the resistance change of the touch electrode TE before and after placing the touch sensor metal TSM according to the embodiment of this specification in the optical region OA. 【0331】 Since resistance is proportional to the wire length and inversely proportional to the cross-sectional area, placing more touch sensor metal TSMs in the optical region OA can increase the cross-sectional area and thus reduce resistance. 【0332】 Referring to Figure 13, the experimental results showed that when the touch sensor metal TSM according to the embodiment of this specification was placed in the optical region OA, a significant resistance reduction effect was observed compared to before placement. 【0333】 Figure 14 shows the change in capacitance of the touch electrode TE before and after placing the touch sensor metal TSM according to the embodiment of this specification in the optical region OA. 【0334】 Since capacitance is inversely proportional to the thickness of the dielectric and proportional to the area of ​​the dielectric, placing more touch sensor metal TSMs in the optical region OA can increase the area and thus increase capacitance. 【0335】 Referring to Figure 14, the experimental results showed that when the touch sensor metal TSM according to the embodiment of this specification was placed in the optical region OA, a capacitance increase effect was observed compared to before placement. 【0336】 Therefore, referring to Figures 13 and 14, embodiments of this specification can provide a display device with improved touch performance by reducing the resistance and increasing the capacitance of the touch sensor metal. 【0337】 Furthermore, by reducing the resistance of the touch sensor metal and increasing its capacitance, mobility can be improved, potentially enabling low-power operation of the display device. 【0338】 The arrangement of the touch sensor metal described above can be applied to both the first optical region OA1 and the second optical region OA2, which are capable of displaying images. In other words, the embodiments of this specification provide a display device that allows an optical electronic device located superimposed on an optical region to normally receive light transmitted through the optical region, by improving the transmittance in the first optical region OA1 and / or the second optical region OA2, while arranging the signal wiring necessary for display driving in the optical region where light transmission is required. 【0339】 Below, as another example, we will describe in detail the arrangement of touch sensor metal applicable to a display device having a structure in which a hole is formed in the area where the optical electronic device is located. 【0340】 Figure 15 is a plan view of the display device 100 according to an embodiment of this specification. 【0341】 Referring to Figure 15, the display panel 110 of the display device 100 may include a display area DA on which video (images) may be displayed, and a non-display area NDA on which video is not displayed. 【0342】 One or more electronic devices 11, 12 may be provided and installed separately from the display panel 110 and may be electronic components located below the display panel 110 (on the opposite side of the viewing surface). 【0343】 Light may enter the front (viewing surface) of the display panel 110, pass through the display panel 110, and be transmitted to one or more electronic devices 11, 12 located below the display panel 110 (opposite the viewing surface). For example, the light that passes through the display panel 110 may include visible light or infrared light. 【0344】 The display area DA is an area on which an image can be displayed and may include a first optical area OA1 and a general area NA. The general area NA may be called a second display area DA2, and a light-transmitting structure may be formed in the first optical area OA1. 【0345】 A non-display area NDA is an area where the video is not displayed, and may include a first non-display area NDA1 (e.g., a bezel area) and a second non-display area NDA2. 【0346】 The second non-display area NDA2 may be positioned surrounded by the display area DA. 【0347】 The second non-display area NDA2 may include a portion where the display panel 110 is omitted. In other words, a portion of the second non-display area NDA2 may penetrate in the thickness direction to form a sensor hole. In this case, the display device 100 according to the embodiments herein can be said to be a display device 100 to which HiAA (Hole in Active Area) technology is applied. That is, HiAA can be implemented as a region including a sensor hole. 【0348】 At least a portion of the first optical region OA1 may overlap with the first electronic device 11, and at least a portion of the second non-display region NDA2 may overlap with the second electronic device 12. 【0349】 For example, the first electronic device 11 may be a sensing sensor and the second electronic device 12 may be a camera. For example, the sensing sensor may be an infrared sensor that detects infrared rays. Conversely, the first electronic device 11 may be a camera and the second electronic device 12 may be a sensing sensor such as a proximity sensor or an illuminance sensor. In other words, the electronic device placed in the region where the sensor hole is formed may be an infrared sensor or a camera. 【0350】 The first optical region OA1 and the sensor hole can be positioned at the top of the display area as shown in Figure 15, but are not limited to this, and may be positioned in various locations. 【0351】 The first optical region OA1 can have various shapes, such as circular, elliptical, square, hexagonal, or octagonal. The sensor hole can also have various shapes, such as circular, elliptical, square, hexagonal, or octagonal. The first optical region OA1 and the sensor hole may have the same shape or different shapes. 【0352】 Figure 16 is a plan view of the second non-display area NDA2, which is an enlarged view of the Q1 area in Figure 15. 【0353】 The second non-display area NDA2 may be surrounded by the display area DA. For example, the second non-display area NDA2 may be surrounded by the general area NA of the display area DA. 【0354】 The second non-display area NDA2 may include an outer isolation area OSP between the sensor hole SH and the general area NA, a first dam area DMP1 between the outer isolation area OSP and the general area NA, an inner isolation area ISP between the first dam area DMP1 and the general area NA, and a second dam area DMP2 between the outer isolation area OSP and the sensor hole SH. The second non-display area NDA2 may completely enclose the sensor hole SH. 【0355】 However, the edge of the organic layer extending from the display area DA to the second non-display area NDA2 may be exposed in the sensor hole SH formed in the thickness direction. In this case, the organic layer is part of the intermediate layer EL of the light-emitting element ED extending from the display area DA to the second non-display area NDA2, and may include one of the electron injection layer EIL, electron transport layer ETL, hole transport layer HTL, and hole injection layer HIL. Here, the organic layer may also be part of the light-emitting element that extends from the display area DA to the second non-display area NDA2 and is located in the outer isolation area OSP, the first dam area DMP1, the inner isolation area ISP, and the second dam area DMP2. 【0356】 Therefore, the path from the edge of the organic layer exposed through the sensor hole SH of the second non-display area NDA2 through the light-emitting layer EL of the display area DA to the light-emitting element ED forms a permeable path, and through this path, moisture, oxygen, foreign matter, etc. may penetrate into the interior of the light-emitting element ED and damage the display device 100. 【0357】 To delay and block the inflow of moisture, oxygen, or foreign matter from the outside, the second non-display area NDA2 has at least one protruding structure located in at least one of the outer isolation area OSP and the inner isolation area ISP, and the organic layer is located on at least one protruding structure, and the organic layer can be cut from both ends of the protruding structure to form a discontinuous pattern. 【0358】 For example, multiple protruding structures can be arranged at intervals from one another. 【0359】 The protruding structure may have a predetermined thickness so as to effectively interrupt the organic layer of the second non-display region NDA2. 【0360】 Furthermore, in the second non-display area NDA2, an organic layer can be placed on the first dam area DMP1 and the second dam area DMP2, which have protruding shapes, to increase the length of the transmission path and more effectively prevent transmission. 【0361】 At least one protruding structure may include at least one of a planarization tip (PT) and a metal tip (MT). The planarization tip may include an organic material, and the metal tip may include, but is not limited to, a metallic material such as a wire, wiring, or metal layer. 【0362】 Specifically, the planar protrusion structure may be part of a planar layer PLN (e.g., second planar layer PLN2) that extends from the display area DA to the second non-display area NDA2. That is, the planar protrusion structure of the second non-display area NDA2 and the planar layer PLN of the display area DA can be formed in the same layer with the same material (e.g., planar material), and the planar material layer formed in at least one of the outer isolation area OSP and inner isolation area ISP of the second non-display area NDA2 can be patterned as a discontinuous structure to form the planar protrusion structure. 【0363】 Furthermore, the metal protrusion structure may be the portion of the relay electrode RE of the display area DA that extends to the second non-display area NDA2. That is, the metal protrusion structure of the second non-display area NDA2 and the relay electrode RE of the display area DA can be formed in the same layer with the same material (for example, a metallic material), and the metallic material layer formed in at least one of the outer isolation area OSP and inner isolation area ISP of the second non-display area NDA2 can be patterned as a discontinuous structure to form the metal protrusion structure. 【0364】 The sides of the protruding structure may be vertical, or they may be tapered or reverse-tapered. The top surface of the metal protruding structure may be curved. 【0365】 By placing the organic layer on a flattened protrusion structure or a metal protrusion structure, and cutting the organic layer at both ends of the flattened protrusion structure or metal protrusion structure using a patterning method to form a discontinuous organic pattern, permeation can be prevented, and permeation can be delayed depending on the height of the flattened protrusion structure or metal protrusion structure. 【0366】 In another embodiment, at least one protruding structure may include both a planar protruding structure and a metallic protruding structure. For example, in a second non-display area NDA2, the planar protruding structure may be formed on a metallic protruding structure, and the organic layer may be formed on the planar protruding structure. In such an arrangement, the organic layer can be effectively separated through the entire thickness of the planar protruding structure and the metallic protruding structure. 【0367】 The second electronic device 12, positioned in the area overlapping with the sensor hole SH, may be an infrared sensor or a camera. 【0368】 The display panel 110 can be omitted from the sensor hole SH. In other words, the display panel 110 can be made to penetrate through the sensor hole SH in the thickness direction. 【0369】 When the display panel 110 includes a hole, the touch sensor metal TSM according to the embodiment of this specification cannot be placed in the area overlapping with the sensor hole SH, but can be placed in the area excluding the sensor hole SH. 【0370】 In other words, the arrangement of the touch sensor metal TSM in the optical region OA as shown in Figures 10 to 12 can be applied to the first optical region OA1 in the display device 100 having a HiAA (Hole in Active Area) structure, but may not be applied to the second non-display region NDA2 which includes the sensor hole SH. Figures 10 to 12 will be referred to together below. 【0371】 According to the embodiments of this specification, by arranging the touch sensor metal TSM within the first optical region OA1 so as to surround the light-emitting element ED and the transmission region TA without overlapping them, a touch sensor structure can be formed within the first optical region OA1 while reducing the optical diffraction phenomenon. 【0372】 From a vertical viewpoint, by positioning the touch sensor metal TSM so that it overlaps with the separation space between signal wirings SL1 and SL2 in the low-transmission region LTA of the first optical region OA1, the optical diffraction phenomenon that may occur between signal wirings SL1 and SL2 can be reduced. In other words, by positioning the touch sensor metal TSM so that it overlaps with signal wirings SL1 and SL2, interference by the metal during light transmission in the low-transmission region LTA can be minimized. 【0373】 Figure 17 is an enlarged plan view of the second non-display area NDA2 and the first optical area OA1 in the display device 100 according to the embodiment of this specification. 【0374】 Similarly, when light passes through the second non-display area NDA2, the opening of the sensor hole SH must maintain its light transmittance. Therefore, as shown in Figure 17, in order to avoid interference by metal, signal wiring SL or power supply wiring (not shown) that bypasses, passes through, or is located in the first optical area OA1 may be extended to the second non-display area NDA2 by bypassing the sensor hole SH located in the second non-display area NDA2. 【0375】 In this case, the display device 100 according to the embodiment of this specification may include a touch sensor metal TSM that overlaps simultaneously with a portion of the first signal wiring SL1 and a portion of the second signal wiring SL2 in the low-transmittance region LTA of the first optical region OA1. 【0376】 Furthermore, since the general area NA, which can be considered a second display area, does not have a transparent area TA, the touch sensor metal TSM according to the embodiment of this specification may have an opening in the general area NA that overlaps with the light-emitting area EA, but may not have an opening that overlaps with the transparent area TA. 【0377】 The embodiments of this specification described above can provide a display device having a light-transmitting structure that allows an optical electronic device located below the display panel to receive light normally while maintaining touch performance in the optical domain. 【0378】 The display device according to the embodiments of this specification can be described as follows. 【0379】 Embodiments of this specification can provide a display device that includes a display area capable of displaying an image, the display area comprising a substrate including a first display area comprising a plurality of transparent areas and a second display area outside the first display area, a touch sensor metal disposed in the first display area and disposed outside the plurality of transparent areas, a first signal wiring disposed in the first display area and overlapping at least a portion of a portion of the touch sensor metal, and a second signal wiring disposed in the first display area and overlapping at least a portion of the other portion of the touch sensor metal. 【0380】 In this case, at least one of the first signal wiring and the second signal wiring may be a data line to which a video signal is applied. 【0381】 Furthermore, the first and second signal lines may contain the same material as the relay electrodes and may be superimposed on the bank. 【0382】 Parts of the touch sensor metal that differ from those in the embodiments of this specification may be connected or separated by openings. 【0383】 Furthermore, the first display area may include a first low-transparency area in which a plurality of first light-emitting areas are arranged, a second low-transparency area separated from the first low-transparency area and in which a plurality of second light-emitting areas are arranged, and an intermediate area positioned between the first low-transparency area and the second low-transparency area and containing at least one transparent area from among the plurality of transparent areas. 【0384】 Embodiments of this specification can provide a display device including a touch sensor metal that connects the first, second, and third parts in a mesh-like manner, comprising: a first part located in a first low-transparency region and having a plurality of openings overlapping with a plurality of first light-emitting regions; a second part located in a second low-transparency region and having a plurality of openings overlapping with a plurality of second light-emitting regions; and a third part located in an intermediate region, connecting the first and second parts and having a plurality of openings overlapping with a plurality of transparent regions. 【0385】 Embodiments of this specification can provide a display device in which the touch sensor metal does not overlap with the common electrode hole. In this case, the common electrode hole may include a metal patterning layer. 【0386】 Embodiments of this specification can provide a display device in which a metal patterning layer can function as an electron injection layer. In this case, the metal patterning layer that acts as an electron injection layer in the common electrode hole and the layer that functions as an electron injection layer in the region where the common electrode hole is not formed may be made of different materials. 【0387】 Embodiments of this specification can provide a display device in which a touch sensor metal has a first opening, a second opening, and a third opening. At least one of the first opening, the second opening, and the third opening may have a different size from the others. 【0388】 Embodiments of this specification may include a first-color light-emitting region positioned in a display area and emitting a first color of light, a second-color light-emitting region positioned in a display area and emitting a second color of light, and a third-color light-emitting region positioned in a display area and emitting a third color of light, wherein a first opening of the touch sensor metal is superimposed on the first-color light-emitting region, a second opening of the touch sensor metal is superimposed on the second-color light-emitting region, and a third opening is superimposed not only on the third-color light-emitting region but also on the transmissive region. 【0389】 Embodiments of this specification can provide a display device in which the width of the portion located at the boundary between the first opening and the third opening is different from the width of the portion located at the boundary between the three openings. 【0390】 Embodiments of this specification can provide a display device that includes an infrared sensor and a camera located below the substrate and overlapping with a first display area. 【0391】 Embodiments of this specification provide a display device in which, when the first display area includes a first optical area and a second optical area, and an infrared sensor overlaps the first optical area and a camera overlaps the second optical area, the size of the first optical area is smaller than the size of the second optical area. 【0392】 Embodiments of this specification include a display area capable of displaying an image, the display area including a substrate comprising a first display area comprising a plurality of transparent areas and a second display area outside the first display area, a first touch sensor metal disposed in the first display area and having a plurality of openings, and at least one signal wiring disposed in the first display area, the first touch sensor metal comprising a first portion surrounding a first light-emitting area, a second portion surrounding a second light-emitting area separated from the first light-emitting area in a first direction, and a third portion connecting the first portion and the second portion and arranged in a line form, the at least one signal wiring comprising a wiring portion arranged parallel to the third portion and overlapping with at least a part of the third portion, can provide a display device. In this case, the at least one signal wiring may be a data line to which an image signal is applied. 【0393】 Embodiments of this specification include a substrate including a display area capable of displaying an image and a non-display area not capable of displaying an image, wherein the display area includes a first display area including a plurality of transparent areas and a second display area disposed on the outer edge of the first display area, and the non-display area includes the first non-display area and the second non-display area, and includes touch electrodes having a plurality of openings disposed in the optical area within the first non-display area and the second non-display area, at least one signal wiring disposed in the first display area and at least one power supply wiring, wherein the touch electrodes include a mesh-patterned touch sensor metal, and the width of the touch sensor metal disposed in the second display area is different from the width of the touch sensor metal disposed in the optical area, and the width of the touch sensor metal disposed in the second display area is smaller than the width of the touch sensor metal disposed in the optical area, thereby providing a display device. 【0394】 Embodiments of this specification can provide a display device in which a second non-display area is surrounded by a display area, at least a portion of the second non-display area penetrates in the thickness direction to form a sensor hole, and at least one signal wire and / or at least one power supply wire extends to the second non-display area by bypassing, passing through, or being located in the optical area and bypassing the sensor hole. In this case, the second non-display area may include an outer separation area between the sensor hole and the display area, a first dam area between the outer separation area and the display area, an inner separation area between the first dam area and the display area, and a second dam area between the outer separation area and the sensor hole. 【0395】 Embodiments of this specification can provide a display device in which at least one protruding structure is disposed in at least one of an outer isolation region and an inner isolation region in a second non-display region, and an organic layer is disposed on at least one protruding structure. In this case, the at least one protruding structure is configured to be spaced apart from each other, and the organic layer is cut at both ends of the protruding structure, and the organic layer may be part of a light-emitting element that is disposed in the display region and extends to the second non-display region. In this case, the organic layer may include one of an electron injection layer, an electron transport layer, a hole transport layer, and a hole injection layer. 【0396】 Embodiments of this specification can provide a display device in which at least one protruding structure includes at least one of a planar protruding structure and a metal protruding structure. The planar protruding structure may include an organic material, and the metal protruding structure may include a metallic material. In this case, the planar protruding structure of the second non-display area and the planar layer of the display area may be formed in the same layer and may include the same material. The metal protruding structure of the second non-display area and the relay electrode of the display area may be formed in the same layer and may include the same material. 【0397】 Embodiments of this specification can provide a display device in which at least one protruding structure includes a flattened protruding structure and a metal protruding structure, the flattened protruding structure is disposed on the metal protruding structure, an organic layer is disposed on the flattened protruding structure, the flattened protruding structure includes an organic material, and the metal protruding structure includes a metal material. 【0398】 Embodiments of this specification further include a second touch sensor metal disposed in a second display area and having a plurality of openings, wherein the plurality of openings of the second touch sensor metal have at least one opening having a different size from the plurality of openings of the first touch sensor metal. 【0399】 Embodiments of this specification can provide a display device that includes a light-transmitting region having the same or substantially the same level of touch performance as a portion without a light-transmitting structure. 【0400】 Embodiments of this specification can provide a display device having a light-transmitting structure that allows an optical electronic device located below the display panel to receive light normally while maintaining touch performance in the optical domain. 【0401】 The embodiments described herein can provide a display device with improved visibility by eliminating differences in brightness between areas due to the presence or absence of touch sensor metal. 【0402】 Embodiments of this specification can provide a display device with improved touch performance by reducing the resistance and increasing the capacitance of the touch sensor metal. 【0403】 Embodiments of this specification can provide a display device that enables normal touch operation in an optical area that is included in the display area of ​​a display panel and overlaps with an optical electronic device. 【0404】 Embodiments of this specification provide a display device that allows an optical electronic device located in an optical region to normally receive light transmitted through the optical region, by improving the transmittance of the optical region while arranging the signal wiring necessary for display driving in the optical region where light transmission is required. 【0405】 Embodiments of this specification provide a display device that can improve the transmittance of an optical region by overlapping the vertical positions between the signal wiring and the touch sensor metal, even though the signal wiring necessary for display driving and the touch sensor metal necessary for touch sensing are arranged in the optical region where light transmission is required. 【0406】 Embodiments of this specification can provide a display device that has improved mobility and can be driven with low power by reducing the resistance and increasing the capacitance of the touch sensor metal. 【0407】 The above description is merely illustrative of the technical concept of this specification, and any person with ordinary skill in the art to which this specification belongs will be able to make various modifications and alterations without departing from the essential characteristics of this specification. Furthermore, the embodiments shown herein are for illustrative purposes only and not to limit the technical concept of this specification, and therefore the scope of the technical concept of this specification is not limited by these embodiments. [Explanation of Symbols] 【0408】 100 display device 110 Display Panel 10 Electronic equipment 11. First electronic device 12. Second Electronic Device 220 Data-driven circuit 230 Gate drive circuit 240 Display Controllers 250 host systems 260 Touch Drive Circuit 270 Touch Controllers 800 aperture area

Claims

[Claim 1] A substrate including a display area capable of displaying an image, wherein the display area includes a first display area containing a plurality of transparent areas and a second display area outside the first display area, A touch sensor metal, which is placed in the first display area and positioned outside the plurality of transparent areas, A first signal wiring, arranged in the first display area and at least partially overlapping with a portion of the touch sensor metal, and A display device comprising a second signal wiring positioned in the first display area and at least partially overlapping with the other portion of the touch sensor metal. [Claim 2] The display device according to claim 1, wherein at least one of the first signal wiring and the second signal wiring includes a data line to which a video signal is applied. [Claim 3] The first display area is, A first low-transmittance region in which multiple first light-emitting regions are arranged, A second low-transmittance region separated from the first low-transmittance region, in which a plurality of second light-emitting regions are arranged, and The display device according to claim 1, comprising an intermediate region disposed between the first low-transparency region and the second low-transparency region, and including at least one transparent region among the plurality of transparent regions. [Claim 4] The aforementioned touch sensor metal is A first portion having a plurality of openings that are arranged in the first low-transparency region and overlap with the plurality of first light-emitting regions, A second portion having a plurality of openings located in the second low-transparency region and overlapping with the plurality of second light-emitting regions, and A third portion is located in the intermediate region, connects the first portion and the second portion, and includes a plurality of openings that overlap with the plurality of transparent regions, The display device according to claim 3, wherein the first part, the second part, and the third part are connected in a mesh-like manner. [Claim 5] A pixel electrode, disposed on the substrate and located in the first display area, A light-emitting layer disposed on the pixel electrode, and The present invention further includes a common electrode having a plurality of holes disposed on the light-emitting layer and positioned in the first display area, The aforementioned touch sensor metal is The display device according to claim 1, which is arranged on the common electrode and does not overlap with the plurality of holes of the common electrode. [Claim 6] The display device according to claim 5, further comprising a metal patterning layer disposed in the plurality of holes of the common electrode. [Claim 7] The display device according to claim 6, wherein the metal patterning layer serves as an electron injection layer. [Claim 8] The display device according to claim 6, wherein the metal patterning layer that functions as an electron injection layer in the plurality of holes of the common electrode and the layer that functions as an electron injection layer in the region of the common electrode where the plurality of holes are not formed contain different materials. [Claim 9] A transistor including a source electrode or drain electrode electrically connected to the aforementioned pixel electrode, and The system further includes a relay electrode that electrically connects the source electrode or the drain electrode to the pixel electrode, The display device according to claim 5, wherein the first signal wiring and the second signal wiring contain the same material as the relay electrode. [Claim 10] The display device according to claim 1, further comprising a bank that overlaps with the touch sensor metal. [Claim 11] The display device according to claim 10, wherein the first signal wiring and the second signal wiring are superimposed on the bank. [Claim 12] The touch sensor metal has a first opening, a second opening, and a third opening. The display device according to claim 1, wherein at least one of the first opening, the second opening, and the third opening has a different size from the rest. [Claim 13] A first-color light-emitting region is arranged in the display area and emits light of the first color, and The display area further includes a second-color light-emitting area that emits a second color of light, The first opening of the touch sensor metal overlaps with the light-emitting region of the first color, and the second opening of the touch sensor metal overlaps with the light-emitting region of the second color. The display device according to claim 12, wherein the first opening and the second opening have different sizes from each other. [Claim 14] The display area further includes a third-color light-emitting area that emits a third color of light, The display device according to claim 13, wherein the third opening of the touch sensor metal overlaps not only with the light-emitting region of the third color but also with the transparent region. [Claim 15] The display device according to claim 14, wherein the width of the portion of the touch sensor metal located at the boundary between the first opening and the third opening is different from the width of the portion located at the boundary between the three openings. [Claim 16] The display device according to claim 1, wherein the portion of the touch sensor metal and the other portion of the touch sensor metal are connected to each other. [Claim 17] The display device according to claim 1, wherein the part of the touch sensor metal and the other part of the touch sensor metal are separated. [Claim 18] The display device according to claim 1, further comprising an infrared sensor and a camera located below the substrate and overlapping the first display area. [Claim 19] The first display area includes a first optical area and a second optical area. The infrared sensor overlaps with the first optical region, The camera overlaps with the second optical region, The display device according to claim 18, wherein the size of the first optical region is smaller than the size of the second optical region. [Claim 20] A substrate including a display area capable of displaying an image, wherein the display area includes a first display area containing a plurality of transparent areas and a second display area outside the first display area, A first touch sensor metal having a plurality of openings is arranged in the first display area, and The first display area includes at least one signal wiring, The first touch-receiving metal is The first portion surrounding the first light-emitting region, A second portion surrounding the first light-emitting region and a second light-emitting region separated in a first direction, and It includes a third part that connects the first part and the second part and is arranged linearly, The display device includes a wiring portion that is arranged parallel to the third portion and at least partially overlaps the third portion. [Claim 21] The second touch sensor metal, which is positioned in the second display area and has a plurality of openings, further comprises: The display device according to claim 20, wherein the plurality of openings of the second touch sensor metal have at least one opening having a different size from the plurality of openings of the first touch sensor metal. [Claim 22] The display device according to claim 20, wherein the at least one signal line includes a data line to which a video signal is applied. [Claim 23] A substrate including a display area capable of displaying an image and a non-display area not capable of displaying an image, wherein the display area includes a first display area including a plurality of transparent areas and a second display area outside the first display area, and the non-display area is a substrate including the first non-display area and the second non-display area. A touch electrode having a plurality of openings is arranged in the optical region within the first display area and the second display area. At least one signal wiring arranged in the first display area, and A display device including at least one power supply cable. [Claim 24] The display device according to claim 23, wherein the touch electrode includes a touch sensor metal patterned in a mesh shape. [Claim 25] The display device according to claim 23, wherein the width of the touch sensor metal arranged in the second display area is different from the width of the touch sensor metal arranged in the optical area. [Claim 26] The display device according to claim 25, wherein the width of the touch sensor metal arranged in the second display area is smaller than the width of the touch sensor metal arranged in the optical area. [Claim 27] The second non-display area is surrounded by the display area, The display device according to claim 23, wherein at least a portion of the second non-display area is penetrated in the thickness direction to form a sensor hole. [Claim 28] The display device according to claim 27, wherein the at least one signal wiring and / or the at least one power supply wiring bypasses, passes through, or is located in the optical region and extends to the second non-display region, bypassing the sensor hole. [Claim 29] The second hidden area described above is, The outer separation area between the sensor hole and the display area, The first dam area between the outer separation area and the display area, The inner separation area between the first dam area and the display area, and The display device according to claim 27, further comprising a second dam region between the outer separation region and the sensor hole. [Claim 30] In the second non-display region, at least one protruding structure is arranged in at least one of the outer separation region and the inner separation region. The display device according to claim 29, wherein an organic layer is disposed on at least one of the protruding structures. [Claim 31] The display device according to claim 30, wherein the at least one protruding structure is spaced apart from each other. [Claim 32] The display device according to claim 30, wherein the organic layer is disconnected from both ends of the at least one protruding structure. [Claim 33] The display device according to claim 30, wherein the organic layer is part of a light-emitting element arranged in the display area and extends to the second non-display area. [Claim 34] The display device according to claim 33, wherein the organic layer includes one of an electron injection layer, an electron transport layer, a hole transport layer, and a hole injection layer. [Claim 35] The at least one protruding structure includes at least one of a flattened protruding structure and a metal protruding structure. The display device according to claim 30, wherein the planar protrusion structure is made of an organic material, and the metal protrusion structure is made of a metal material. [Claim 36] The at least one protruding structure includes a flattened protruding structure and a metal protruding structure. The flattened protrusion structure is formed on the metal protrusion structure, The display device according to claim 35, wherein the organic layer is formed on the planar protruding structure. [Claim 37] The planar protruding structure arranged in the second non-display area and the planar layer arranged in the display area are formed in the same layer and made of the same material. The display device according to claim 35, wherein the metal protrusion structure disposed in the second non-display area and the relay electrode disposed in the display area are formed in the same layer and made of the same material.

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