Vacuum deposition source and vacuum deposition apparatus for vacuum deposition apparatus

Abstract

The evaporation source DS, which includes two horizontal orthogonal directions designated as the X-axis and Y-axis directions, and comprises multiple evaporation boats 1 arranged in parallel along the Y-axis direction, with each evaporation boat being long in the X-axis direction, and electrode units 2 that hold each evaporation boat, improves the ease of replacing each evaporation boat. [Solution] Multiple first electrodes 21 of the electrode unit 2 located on the input side of the current are arranged in parallel at intervals in the Y-axis direction to hold the electrode mounting portion on the rear side in the X-axis direction of each deposition boat. A cover body 7 is further provided to cover the outer surface portion of each first electrode, and a flange portion 73 projecting outward is formed on the cover body. Rows of flange portions arranged at a predetermined pitch in the Y-axis direction are called flange rows, and the unit comprises a first flange row 71 and a second flange row 72 whose distance in the X-axis direction from the second electrode of the electrode unit is longer than that of the first flange row, and the first flange row and the second flange row are provided alternately in the Y-axis direction.

Description

【Technical Field】 【0001】 The present invention relates to an evaporation source for a vacuum evaporation apparatus for evaporating an evaporation material in a vacuum chamber and depositing it on a deposition object, and a vacuum evaporation apparatus including this evaporation source in a vacuum chamber. 【Background Art】 【0002】 This type of vacuum evaporation apparatus is used, for example, for forming a thin film such as an aluminum film or a copper film on the surface of a substrate or a sheet-like base material as a deposition object. As an evaporation source for a vacuum evaporation apparatus, one using an evaporation boat is generally known (see, for example, Patent Document 1). Taking two horizontal orthogonal directions as the X-axis direction and the Y-axis direction, the evaporation boat has a storage part for an evaporation material and electrode attachment parts protruding forward and backward in the X-axis direction from this storage part, and is held by an electrode unit provided in a vacuum chamber via both electrode attachment parts. As the electrode unit, one having a pair of upper and lower electrode plates is known, and the evaporation boat is held by bolt-fastening with both electrode attachment parts sandwiched by the respective electrode plates from the vertical direction (see, for example, Patent Document 2). 【0003】 When depositing on a deposition object in a vacuum chamber in a vacuum atmosphere, the evaporation boat is heated by Joule heat by applying an electric current between both electrode attachment parts. In this state, when a wire-shaped evaporation material is supplied to the storage part of the evaporation boat from above, the evaporation material dissolves and wets and spreads in the storage part, and the wetted and spread material evaporates and is deposited on the deposition object. Here, when the deposition object is a relatively wide sheet-like base material, it is conceivable to arrange a plurality of evaporation boats in parallel in the Y-axis direction in order to form a film with high productivity. At this time, if it is desired to improve the uniformity of the film thickness distribution in the width direction of the sheet-like base material (the X-axis direction of the evaporation boat), the interval in the Y-axis direction between each evaporation boat has to be narrowed. 【0004】 Incidentally, deposition boats are consumables and need to be replaced periodically. When multiple deposition boats are installed side by side in a vacuum chamber, all deposition boats must be replaced simultaneously. In this case, if the deposition boats are held in place by bolts as in the conventional example above, attaching and detaching the deposition boats to the electrode units takes a considerable amount of time, resulting in poor replacement efficiency. Therefore, it is conceivable to make the first electrode of the electrode unit that holds one electrode mounting part of the deposition boat a movable electrode, and the second electrode of the electrode unit that holds the other electrode mounting part a fixed electrode fixed to the vacuum chamber, and to hold the deposition boat between the fixed electrode and the movable electrode with a pressing force acting in one direction toward the fixed electrode. 【0005】 During deposition, the evaporated material from each deposition boat adheres and deposits directly or bounces onto the surfaces of the movable and fixed electrodes, including the contact points with the deposition boat. If deposition is repeated over a long period, a large amount of deposition material accumulates on the surfaces of the movable and fixed electrodes. At this point, the movable electrode cannot be moved without removing a certain amount of the deposit, which hinders the efficiency of replacing the deposition boat. [Prior art documents] [Patent Documents] 【0006】 [Patent Document 1] Japanese Patent Publication No. 2011-23376 [Patent Document 2] Japanese Patent Publication No. 2018-176565 [Overview of the Initiative] [Problems that the invention aims to solve] 【0007】 In view of the above, the object of the present invention is to provide a vapor deposition source and a vacuum deposition method for a vacuum processing apparatus that improve the ease of replacing the vapor deposition boat. [Means for solving the problem] 【0008】 To solve the above problems, the first invention provides a deposition source for a vacuum deposition apparatus for evaporating a deposition material in a vacuum chamber and depositing it onto a substrate, comprising: a plurality of deposition boats arranged in parallel in the Y-axis direction, each having a deposition material storage section and electrode mounting sections that extend forward and backward in the X-axis direction from the storage section, respectively, with two horizontal orthogonal directions being the X-axis direction and the Y-axis direction; and electrode units that each hold both electrode mounting sections of each deposition boat, wherein the deposition boats are heated by passing current between the two electrode mounting sections of each deposition boat to evaporate the deposition material in the storage section, and the first electrodes of the electrode units located on the input side of the current are arranged in parallel at intervals in the Y-axis direction to each hold the electrode mounting section on the rear side in the X-axis direction of each deposition boat, and further comprising a cover body that covers the outer surface portion of each first electrode, wherein the cover body has a flange portion that protrudes outward. The second invention provides a vacuum deposition apparatus, wherein the above deposition source is provided in a vacuum chamber. 【0009】 According to the present invention, during deposition, the evaporated deposition material from each deposition boat scatters directly or bounces towards the outer surface of each first electrode. However, since the outer surface of each first electrode is covered by a cover body, the area of ​​the outer surface of each first electrode to which the deposition material directly adheres and accumulates can be reduced. Therefore, the area from which deposits must be removed from the first electrode when replacing the deposition boat is reduced, improving the workability of replacing the deposition boat. Here, the evaporated deposition material may wrap around to the space on the rear side of the first electrode in the X-axis direction. Various components such as the mechanism for moving the first electrode, wiring cables, and cooling pipes may be located in such a space. If the deposition material accumulates on such components, it may cause malfunction. In contrast, in the present invention, since a flange is formed on the cover body, the wrapping of the deposition material into the space on the rear side of the first electrode in the X-axis direction can be suppressed as much as possible. Moreover, deposits are less likely to form on the outer surface of the cover body located on the rear side of the flange in the X-axis direction. Therefore, it is sufficient to cover the upper and side surfaces of the first electrode, which is mainly located on the rear side in the X-axis direction from the flange, with the cover body. Furthermore, it is preferable to provide a positioning pin protruding from either the first electrode or the cover body, and to form a pin hole in the other of the first electrode or the cover body to receive the positioning pin, so that the cover body can be easily attached while it is positioned relative to the first electrode. 【0010】 Incidentally, when flanges are formed on the cover bodies that cover each of the first electrodes, the distance between adjacent flanges in the Y-axis direction becomes very narrow. Therefore, if the flanges are aligned in the Y-axis direction, the deposition material attached to and deposited on each flange will come into contact with each other in a relatively short time. In this case, if the deposition material is a conductive material such as aluminum or copper, adjacent first electrodes may short-circuit, which would cause the current to be divided and prevent efficient heating of the deposition boat. Therefore, in the present invention, it is preferable to have a first flange row and a second flange row whose X-axis distance from the second electrode of the electrode unit is longer than that of the first flange row, with the first and second flange rows being arranged alternately in the Y-axis direction. This makes it possible to avoid the problem of materials attached to and deposited on adjacent flanges in the Y-axis direction coming into contact in a relatively short time. In this case, the height of the flange portion projecting upward from the upper surface of the cover body can be configured such that the height of the second flange row is greater than that of the first flange row. Furthermore, it is preferable that a tapered chamfer is formed on the upper end portion of the flange portion of the first flange row. This reliably prevents materials adhering to and accumulating on adjacent flange portions in the Y-axis direction from coming into contact with each other in a relatively short time. 【0011】 In this invention, each second electrode that holds the electrode mounting portion on the front side in the X-axis direction of each deposition boat can be integrally formed and fixedly positioned within the vacuum chamber. As a result, the second electrode of the electrode unit is usually grounded, preventing short-circuit problems. Therefore, adopting an integral configuration for the second electrode simplifies the configuration when multiple deposition boats are arranged in parallel in the Y-axis direction to form a deposition source, which is advantageous. 【0012】 Furthermore, in the present invention, each of the first electrodes is movable forward and backward in one direction, and a boat receiving portion is provided to receive the deposition boat. With the deposition boat supported by this boat receiving portion, the deposition boat can be held between the fixed electrode and the movable electrode simply by moving the movable electrode forward in one direction. With this configuration, instead of holding the deposition boat with bolts as in the conventional example described above, the deposition boat is held between the fixed electrode and the movable electrode by a pressing force acting in one direction toward the fixed electrode. As a result, the deposition boat can be attached to and removed from the electrode unit in a short time, further improving the workability of replacing the deposition boat. [Brief explanation of the drawing] 【0013】 [Figure 1] A schematic cross-sectional view showing a vacuum deposition apparatus equipped with a deposition source according to an embodiment of the present invention. [Figure 2] A magnified view of the vapor deposition source shown in Figure 1. [Figure 3] A plan view along line III-III in Figure 1. [Figure 4] An enlarged view corresponding to Figure 2, showing the movable electrode in the detached position. [Figure 5] (a) and (b) are side views of the cover body. [Figure 6] A front view illustrating the attachment and detachment of the cover body in the position where the movable electrode is removed. [Modes for carrying out the invention] 【0014】 Hereinafter, with reference to the drawings, embodiments of the vacuum deposition apparatus DS for the present invention and the vacuum deposition apparatus DM equipped with the vapor deposition source DS in a vacuum chamber will be described, using as an example a case in which the material to be deposited is a sheet-shaped substrate Sw, and a wire-shaped deposition material Em is continuously supplied and evaporated in a vacuum chamber under a vacuum atmosphere to deposit a predetermined thin film on one side of the sheet-shaped substrate Sw.In the following, the two horizontal orthogonal directions will be defined as the X-axis direction and the Y-axis direction, and the can roller described later will be housed in the vacuum chamber with its axis direction aligned with the Y-axis direction.Directions such as up and down will be based on Figure 1, which shows the installation position of the vacuum deposition apparatus. 【0015】 Referring to Figure 1, the vacuum deposition apparatus DM of this embodiment comprises a central deposition chamber Vc1 as a vacuum chamber, and first and second transport chambers Vc2 and Vc3, respectively, connected to the front and rear of the deposition chamber Vc1 in the X-axis direction. Although not specifically illustrated and described, exhaust pipes from a vacuum pump unit, such as a cryopump or rotary pump, are connected to the deposition chamber Vc1 and each of the transport chambers Vc2 and Vc3, respectively, to form a vacuum atmosphere. Through holes h1 to h4 are provided in the side walls of the deposition chamber Vc1 and each of the transport chambers Vc2 and Vc3 that face each other in the X-axis direction, respectively, to allow the passage of a sheet-like substrate Sw. A load lock valve Lv is provided in the gap between the side walls of the deposition chamber Vc1 and each of the transport chambers Vc2 and Vc3 so as to cover the portion of the sheet-like substrate Sw that passes through this gap. This allows for consistent transport of the sheet-like substrate Sw in a vacuum atmosphere, and also isolates the deposition chamber Vc1 from the transport chambers Vc2 and Vc3. Since known load lock valves Lv can be used in this type of vacuum deposition apparatus DM, a detailed explanation is omitted here. 【0016】 The first transport chamber Vc2, located on the front side in the X-axis direction (left side in Figure 1), is equipped with a feed roller Wr around which the sheet-like substrate Sw before film deposition is wound, and is rotationally driven by a motor M1 located outside the first transport chamber Vc2. The second transport chamber Vc3, located on the rear side in the X-axis direction (right side in Figure 1), is equipped with a winding roller Ur for winding the sheet-like substrate Sw after film deposition, and is rotationally driven by a motor M2 located outside the second transport chamber Vc3. The first and second transport chambers Vc2 and Vc3 are appropriately equipped with guide rollers Gr to guide the sheet-like substrate Sw fed from the feed roller Wr to the film deposition chamber Vc1, and to guide the sheet-like substrate Sw transported from the film deposition chamber Vc1 to the winding roller Ur. The film deposition chamber Vc1 is equipped with a can roller Cr, which is rotationally driven by a motor M3 located outside the film deposition chamber Vc1. The can roller Cr cools the sheet-like substrate Sw as it is wrapped around it and rotates; this is a well-known concept, so no further explanation is needed. The deposition chamber Vc1 is also appropriately provided with guide rollers Gr to guide the sheet-like substrate Sw. In order to deposit a film on the portion of the substrate Sw wrapped around the can roller Cr, the deposition source DS of this embodiment is provided in the deposition chamber Vc1, positioned directly below the can roller Cr. 【0017】 Referring also to Figures 2 to 4, the deposition source DS comprises a deposition boat 1 having a containment section 11 for the deposition material Em and electrode mounting sections 12a and 12b that protrude from the containment section 11 in the front and rear directions along the X-axis, respectively, with multiple deposition boats 1 arranged side by side at equal intervals along the Y-axis. In this embodiment, the deposition boat 1 has a containment section 11 with a flat inner bottom surface recessed in the central region of a plate-like member of a predetermined thickness, and the front and rear portions of the containment section 11 along the X-axis are the electrode mounting sections 12a and 12b. As the deposition boat 1, for example, a material sintered from a raw material mainly composed of boron nitride (BN) and titanium boride (TiB2) which imparts conductivity, containing these in a predetermined weight ratio, can be used. A tray 13 for the deposition material Em is placed in the space below each deposition boat 1. Each deposition boat 1 is held by an electrode unit 2 via both electrode mounting sections 12a and 12b. 【0018】 The electrode unit 2 has a first electrode and a second electrode arranged at intervals in the X-axis direction, and is provided on a support base 3 arranged on the inner bottom surface of the film formation chamber Vc1. In the present embodiment, the first electrode that holds the electrode attachment portion 12a on the rear side in the X-axis direction (the right side in FIG. 2) of the evaporation boat 1 is a movable electrode 21 that is movable back and forth in the X-axis direction, and the second electrode that holds the other electrode attachment portion 12b is a fixed electrode 22 fixed to the film formation chamber Vc1. Then, each evaporation boat 1 is held between the fixed electrode 22 and the movable electrode 21 by a pressing force acting in the X-axis direction toward the fixed electrode 22. The fixed electrode 22 is integrally formed and is composed of a rectangular columnar member that is longitudinally long in the Y-axis direction and made of a conductive member such as copper. The grounded fixed electrode 22 is supported at a predetermined height position from the inner bottom surface of the film formation chamber Vc1 via a support column 31 erected on the support base 3. A boat receiving portion 221 that protrudes rearward in the X-axis direction is formed on the inner side surface of the fixed electrode 22, and when the evaporation boat 1 is installed from above, it receives the lower surface of the electrode attachment portion 12b and supports the evaporation boat 1. 【0019】 A plurality of movable electrodes 21 are arranged in parallel in the Y-axis direction so as to independently hold one electrode attachment portion 12a of each evaporation boat 1. Each movable electrode 21 is also made of a conductive member such as copper like the fixed electrode 22, and is composed of a holding plate portion 21a that is longitudinally long in the X-axis direction and a drive plate portion 21b that is vertically provided on the holding plate portion 21a. On the inner side surface of the holding plate portion 21a, another boat receiving portion 211 is formed so as to face the boat receiving portion 221 of the fixed electrode 22 in the X-axis direction, and like the above, it receives and supports the lower surface of the electrode attachment portion 12a. A terminal plate portion 21c is provided at the lower end portion of the drive plate portion 21b that extends downward through the support base 3, and an electrode cable Pk from a known DC power supply (not shown) is connected thereto. The movable electrode 21 becomes the input side of the energizing current and is energized via the evaporation boat 1 between the grounded fixed electrode 22. 【0020】 On the support base 3, a plurality of L-shaped supports 4 are arranged side by side in the Y-axis direction when viewed from the front, and each movable electrode 21 is respectively attached to each support 4 so as to be movable back and forth in the X-axis direction. On the drive plate portion 21b of each movable electrode 21, a drive shaft 212 protruding rearward in the X-axis direction and guide pins 213 as guide members are respectively provided above and below the drive shaft 212. In a portion of the support 4 facing the drive plate portion 21b, a first insertion hole 41 for receiving the drive shaft 212 and a second insertion hole 42 for receiving each guide pin 213 are formed, and the movable electrode 21 is supported by the support 4 via the guide pin 213 slidably inserted into the second insertion hole 42. A coil spring 43 as a biasing means is also provided in the first insertion hole 41 to bias the drive shaft 212 toward the front side in the X-axis direction. A nut member 214 having a larger diameter than the drive shaft 212 is externally inserted into a portion of the drive shaft 212 protruding in the X-axis direction from the first insertion hole 41. 【0021】 A support frame 51 is erected on the support base 3, and an operation lever 5 as an operation member for operating the forward and backward movement of the movable electrode in one direction is provided at the upper end of the support frame 51 so as to be swingable. When the operation lever 5 is swung clockwise, a hook-shaped portion 52 provided on the operation lever 5 engages with the nut member 214. Normally, each movable electrode 21 is moved forward in the X-axis direction by the biasing force of the coil spring 43. When the hook-shaped portion 52 engages with the nut member 214 by the operation of the operation lever 5 and the operation lever 5 is further swung clockwise from this engagement position, the movable electrode 21 moves backward in the X-axis direction against the biasing force of the coil spring 43. Thereby, the movable electrode 21 has a pressing force (biasing force of the coil spring 43) acting in one direction toward the fixed electrode 22 to hold the vapor deposition boat 1 between the fixed electrode 22 and the movable electrode 21 at an attachment position (see FIGS. 2 and 3), and a removal position (see FIG. 4) where the pressing force is released by the backward movement in the X-axis direction and the vapor deposition boat 1 can be exchanged, and moves horizontally between them. 【0022】 A restricting member 6 is provided to restrict the amount of movement of the movable electrode 21 so that the state in which both electrode mounting portions 12a and 12b of the deposition boat 1 are supported by the respective boat receiving portions 211 and 221 is maintained while the movable electrode 21 moves back and forth in the X-axis direction between the mounting position and the removal position. The restricting member 6 has a restricting plate 61 whose front end is pinned to the drive plate portion 21b. An elongated hole 62 is formed on the rear end side of the restricting plate 61 in the X-axis direction, and the tip of a pin member 63 is fixed to the support 4 through the elongated hole 62. Note that the restricting member 6 is not limited to this as long as it can restrict the amount of movement of the movable electrode 21. A cover body 7 that covers the outer surface portion of the holding plate portion 21a of each movable electrode 21 is detachably attached. 【0023】 Referring also to Figure 5, the cover body 7 has a substrate portion 71 that covers the upper surface portion of the retaining plate portion 21a, and side plate portions 72 that extend downward from both ends of the substrate portion 71 in the Y-axis direction and cover the sides of the retaining plate portion 21a, respectively. The cover body 7 is also provided with a frame-shaped flange portion 73 that protrudes outward. In this embodiment, the rows of flange portions 73 arranged at a predetermined pitch in the Y-axis direction are called flange rows, and the cover body comprises a first flange row 71 and a second flange row 72 whose distance in the X-axis direction from the fixed electrode 22 is longer than that of the first flange row 71, with the first flange row 71 and the second flange row 72 being arranged alternately in two rows in the Y-axis direction (see Figure 3). The flange portion 73 of the first flange portion row 71 is designated as the first flange portion 73a, and the flange portion 73 of the second flange portion row 72 is designated as the second flange portion 73b. The height h2 of the second flange portion 73b that protrudes upward from the upper surface of the cover body 7 is higher than the height h1 of the first flange portion 73a that protrudes upward from the upper surface of the cover body 7 (i.e., the second flange portion row 72 is higher than the first flange portion row 71). 【0024】 A chamfered portion 731 that tapers upward is formed at the upper end of the first flange portion 73a. The heights h1 and h2 are set appropriately considering the leakage of the evaporation material into the space behind the movable electrode 21 in the X-axis direction. As described above, by providing flange portions 73a and 73b on the cover body 7, it is difficult for deposits of the vapor deposition material Em to form on the outer surface portion of the cover body 7 located behind the flange portions 73a and 73b in the X-axis direction. Therefore, it is sufficient to cover a predetermined range of the upper surface of the holding plate portion 21a from near the front end face in the X-axis direction toward the rear in the X-axis direction with the substrate portion 71, and the X-axis length of the side plate portion 72 can be shorter than that of the substrate portion 71. Here, the vapor deposition material Em that adheres to and deposits on the flange portions 73a and 73b tends to grow in a canopy-like manner from the upper end portion of the flange portions 73a and 73b. Therefore, by lowering the height h1 of the first flange portion 73a of the first flange portion row 71, which is closer to the deposition boat 1 than the flange portion 73b of the second flange portion row 72, and by providing a chamfered portion 731 in addition, it is possible to suppress contact between the flange portions 73a and 73b in a relatively short time, which is advantageous. The attachment and detachment of the movable electrode 21 of the cover body 7 is performed with the deposition boat 1 removed at the position where the movable electrode 21 is to be removed, as shown in Figure 6. That is, the cover body 7 is attached to the movable electrode 21 by extrapolating it from the front in the X-axis direction relative to the movable electrode 21. At this time, a positioning pin 74 is provided on the cover body 7, projecting downwards and positioned on the front side in the X-axis direction of the flange portion 73. In addition, an engagement hole (not shown) is formed at a predetermined position on the upper surface of the movable electrode 21, into which the positioning pin 74 engages, and when the positioning pin 74 engages with the engagement hole, the cover body 7 is positioned in the front and rear directions in the X-axis direction. 【0025】 The deposition chamber Vc1 is provided with a material supply means 8 for continuously supplying wire-shaped deposition material Em to the housing section 11 of each deposition boat 1. The material supply means 8 includes a motor-driven feed roller 81 installed on the side of the protective plate Sp located inside the deposition chamber Vc1 that is away from the deposition source DS, and a pair of upper and lower guide rollers 82. A guide tube 83 of a predetermined length with a downwardly curved tip is attached to the inner surface of the protective plate Sp located on the deposition source DS side, and guides the wire-shaped deposition material Em toward the housing section 11. The deposition material Em is selected according to the thin film to be deposited, and for example, aluminum or copper of a predetermined purity formed to an outer diameter of Φ1 mm to 5 mm is used. The wire-shaped deposition material Em is pre-wound onto the feed roller 81, and the tip of the wire-shaped deposition material Em is pulled out and inserted through the gap between the upper and lower guide rollers 82 and the opening (not shown) of the protective plate Sp, and then through the guide tube 83. A wire-shaped deposition material Em is prepared by bringing the tip of the deposition material Em protruding from the guide tube 83 into contact with the inner bottom surface of the housing 11 from above. 【0026】 When depositing a predetermined thin film onto one side of a sheet-like substrate Sw in a vacuum deposition chamber Vc1, a DC power supply (not shown) installed outside the deposition chamber Vc1 energizes the movable electrode 21 and the fixed electrode 22 via the electrode mounting parts 12a and 12b. This heats the deposition boat 1 by Joule heating. The power supplied at this time is set according to the deposition rate. When the deposition boat 1 reaches a predetermined temperature, the feed roller 81 feeds out a wire-shaped deposition material Em. Simultaneously, the sheet-like substrate Sw is fed out from the feed roller Wr and wound up by the winding roller Ur. As a result, the deposition material Em melts in the recess 11, and this melted deposition material Em evaporates, depositing a predetermined thin film on the portion of the sheet-like substrate Sw wound around the can roller Cr. The supply speed of the wire-shaped deposition material Em is set according to the deposition rate. 【0027】 When replacing each deposition boat 1, the deposition chamber Vc1 and each transport chamber Vc2, Vc3 are returned to an atmospheric environment. First, the deposits made of deposition material Em attached to and accumulated on the movable electrode 21 are removed to make the movable electrode 21 movable. At this time, the outer surface portion of the movable electrode 21 is covered by the cover body 7, and only the area near the front end surface in the X-axis direction of the holding plate portion 21a is exposed, so the area from which deposits need to be removed from the movable electrode 21 when replacing the deposition boat 1 is small. Then, the operating lever 5 is swung clockwise, and when the operating lever 5 is swung further clockwise from the state in which the hook-shaped portion 52 is engaged with the nut member 214, the movable electrode 21 moves backward in the X-axis direction against the biasing force of the coil spring 43 and reaches the removal position. In this state, the electrode mounting portions 12a and 12b are supported by the boat receiving portion 211 of the movable electrode 21 and the boat receiving portion 221 of the fixed electrode 22. At this time, a known locking mechanism may be provided on the operating lever 5 to hold the movable electrode 21 in the removed position. This releases the pressing force when the electrode moves backward in the X-axis direction, allowing the deposition boat 1 to be replaced (i.e., removed upward from the electrode unit 2). Subsequently, with the movable electrode 21 in the removed position, the cover body 7 is pulled out from the movable electrode 21 backward in the X-axis direction. This operation is performed for each deposition boat 1. 【0028】 After the entire deposition boat 1 is removed, the surfaces of the movable electrodes 21 and fixed electrodes 22 are cleaned, and the cover body 7 is repositioned and attached to each movable electrode 21 by extrapolating it from the front in the X-axis direction. Then, the deposition boat 1 is installed from above so that the electrode mounting portions 12a and 12b are supported by the boat receiving portion 211 of the movable electrode and the boat receiving portion 221 of the fixed electrode 22. At this time, the electrode mounting portion 12b is in contact with the side surface of the fixed electrode 22. Meanwhile, a conductive sheet Cs is interposed between the rear end surface of the electrode mounting portion 12a of the deposition boat 1 and the front end surface of the movable electrode 21. For example, an indium conductive sheet Cs can be used. A conductive sheet may also be interposed between the front end surface of the electrode mounting portion 12b and the rear end surface of the fixed electrode 22. 【0029】 After the deposition boat 1 and conductive sheet Cs are installed, swinging the operating lever 5 counterclockwise releases the engagement between the hook-shaped portion 52 and the nut member 214. As a result, the movable electrode 21 moves forward in the X-axis direction due to the biasing force of the coil spring 43 and reaches the mounting position. The movable electrode 21 then holds the deposition boat 1 between the fixed electrode 22 and the movable electrode 21 with a pressing force (biasing force of the coil spring 43) acting in one direction toward the fixed electrode 22. During this deposition boat 1 replacement operation, other operations are also performed, such as replacing the feed roller 81 around which the wire-shaped deposition material Em is wound, replacing the feed roller Wr around which the sheet-like substrate Sw is wound before deposition, and recovering the winding roller Ur from which the sheet-like substrate Sw has been wound. 【0030】 As described above, the area from which deposits must be removed from the movable electrode 21 as the first electrode when replacing the deposition boat 1 is reduced, thereby improving the workability of replacing the deposition boat 1. Furthermore, because flanges 73a and 73b are formed on the cover body 7, the leakage of the deposition material Em into the space on the rear side of the movable electrode 21 in the X-axis direction can be suppressed as much as possible. Moreover, because the first flange row 71 and the second flange row 72 are provided in two alternating rows in the Y-axis direction, it is possible to avoid problems such as deposits adhering to and accumulating on adjacent flanges 73a and 73b in the Y-axis direction coming into contact in a relatively short time. Furthermore, by adopting a configuration in which the fixed electrode 22 is integrated, the configuration can be simplified when constructing a deposition source DS by arranging multiple deposition boats 1 in parallel in the Y-axis direction. Furthermore, since the deposition boat 1 is held between the fixed electrode 22 and the movable electrode 21 by a pressing force acting in one direction toward the fixed electrode 22, the deposition boat 1 can be attached to and removed from the electrode unit 2 in a short time, thereby further improving the workability of replacing the deposition boat 1. 【0031】 Although embodiments of the present invention have been described above, various modifications are possible as long as they do not deviate from the technical concept of the present invention. In the above embodiments, an example was given in which the fixed electrode 22 is integrally formed, but the invention is not limited to this, and although not specifically illustrated and described, multiple individual fixed electrodes may be arranged in parallel in the Y-axis direction, similar to the movable electrode 21, and each electrode mounting portion 12b on the X-axis front side of each deposition boat 1 may be individually held. Also, although an example was given in which the boat receiving portions 211 and 221 are integrally formed with the movable electrode 21 and the fixed electrode 22, respectively, the form is not limited as long as it can be held in place so as not to fall off while the operating lever 5 is operated and the movable electrode 21 is moved between the mounting position and the removal position. 【0032】 In the above embodiment, an example was described using a device with an operating lever 5, but the form is not limited as long as the movable electrode 21 can move forward and backward in the X-axis direction. Also, in the example, an example was described in which the movable electrode 21 is supported by the support 4 via guide pins 213, 213, which serve both to provide movable support for the movable electrode and to guide the movable electrode 21 when it moves forward and backward in one direction, but the present invention is not limited to this, and the form is not limited, for example, a separate guide member can be provided. Furthermore, although the example was described using a sheet-like substrate Sw as the material to be deposited, the present invention can also be applied to deposition on a glass substrate or silicon wafer of a predetermined area. [Explanation of Symbols] 【0033】 DS... Evaporation source for vacuum deposition apparatus, DM... Vacuum deposition apparatus, Vc1~Vc3... Vacuum chamber, Sw... Sheet-shaped substrate (object to be deposited), Em... Evaporation material (wire-shaped copper), 1... Evaporation boat, 11... Housing section, 12a, 12b... Electrode mounting section, 2... Electrode unit, 21... First electrode of electrode unit (movable electrode), 22... Second electrode of electrode unit (fixed electrode), 7... Cover body, 73... Flange section, 71... First flange row, 72... Second flange row, h1, h2... Height of flange section from the top surface of cover body, 731... Chamfered section.

Claims

[Claim 1] A deposition source for a vacuum deposition apparatus that evaporates a deposition material in a vacuum chamber and deposits it onto an object to be deposited, The device comprises multiple deposition boats arranged in parallel along the Y-axis direction, with the horizontal orthogonal directions being the X-axis and Y-axis directions, each having a deposition material receiving section and electrode mounting sections extending forward and backward from the receiving section in the X-axis direction, respectively, and electrode units that each hold both electrode mounting sections of each deposition boat, and in which the deposition boats are heated by passing current between the two electrode mounting sections of each deposition boat to evaporate the deposition material in the receiving section, Multiple first electrodes of the electrode unit located on the input side of the current are arranged in parallel at intervals in the Y-axis direction, each holding the electrode mounting portion on the rear side in the X-axis direction of each deposition boat. A vapor deposition source for a vacuum deposition apparatus, further comprising a cover body that covers the outer surface portion of each first electrode, wherein a flange portion protruding outward is formed on the cover body. [Claim 2] The deposition source for a vacuum deposition apparatus according to claim 1, characterized in that the rows of flanges arranged at a predetermined pitch in the Y-axis direction are called flange rows, and the deposition source comprises a first flange row and a second flange row whose distance in the X-axis direction from the second electrode of the electrode unit is longer than that of the first flange row, and the first flange row and the second flange row are alternately provided in the Y-axis direction. [Claim 3] The deposition source for a vacuum deposition apparatus according to claim 2, characterized in that the height of the flange portion projecting upward from the upper surface of the cover body is greater in the second flange row than in the first flange row. [Claim 4] The deposition source for a vacuum deposition apparatus according to claim 3, characterized in that a tapered chamfer is formed on the upper end portion of the flange portion of the first row of flange portions, tapering upwards. [Claim 5] The deposition source for a vacuum deposition apparatus according to claim 1 or 2, characterized in that the second electrode, which holds the electrode mounting portion on the front side in the X-axis direction of each deposition boat, is integrally formed and fixedly arranged in the vacuum chamber. [Claim 6] The deposition source for a vacuum deposition apparatus according to claim 5, characterized in that each of the first electrodes is movable forward and backward in one direction, and a boat receiving portion is provided for receiving a deposition boat, and the deposition boat is held between the fixed electrode and the movable electrode by moving the movable electrode forward in one direction while the deposition boat is receiving the deposition boat in the boat receiving portion. [Claim 7] A vacuum deposition apparatus comprising a deposition source for a vacuum deposition apparatus according to claim 1 or claim 2, located within a vacuum chamber.

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