Positive-type photosensitive resin composition, resist film, resist underlayer film, and resist permanent film
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- DIC CORP
- Filing Date
- 2024-12-04
- Publication Date
- 2026-06-16
AI Technical Summary
【0011】 本発明によれば、保管安定性に優れ、且つ、i線透過性が高く、感度及び耐熱性に優れるレジスト膜が得られるポジ型感光性樹脂組成物を提供できる。
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Abstract
Claims
1. A positive-type photosensitive resin composition containing the following components (A) to (C). (A) A novolac-type phenolic resin having a carbonate ester protecting group, wherein the molar ratio [(a1):(a2):(a3)] of a structural unit derived from m-cresol (a1), a structural unit derived from at least one of benzaldehyde and acetaldehyde (a2), and a structural unit derived from salicylaldehyde (a3) is 1.0:0.3 to 0.8:0.3 to 0.
8. (B) Photoacid generator (C) Solvent
2. The positive-type photosensitive resin composition according to claim 1, wherein the carbonate ester protecting group is a group represented by the following formula (1). 【Chemistry 1】 (In the formula, R １ These are linear alkyl groups having 1 to 20 carbon atoms, branched alkyl groups having 3 to 20 carbon atoms, cyclic alkyl groups having 3 to 20 carbon atoms, aryl groups having 6 to 20 carbon atoms, or aralkyl groups having 7 to 20 carbon atoms. *This symbol is bonded to the benzene ring that constitutes the main chain of the novolac-type phenolic resin.
3. The positive-type photosensitive resin composition according to claim 1 or 2, wherein the structural unit (a2) is a structural unit derived from benzaldehyde.
4. The positive-type photosensitive resin composition according to claim 1 or 2, wherein the component (A) is obtained by polycondensing m-cresol; at least one of benzaldehyde and acetaldehyde and salicylaldehyde in an organic solvent with an acid catalyst in a molar ratio of m-cresol:benzaldehyde:salicylaldehyde = 1.0:0.3 to 0.8, and reacting the novolac-type phenol resin obtained with a compound that forms a carbonate ester protecting group.
5. The compound according to claim 4, wherein the compound forming the carbonate ester protecting group is ditert-butyl dicarbonate.
6. The positive-type photosensitive resin composition according to claim 1 or 2, wherein the total content of the structural units derived from m-cresol (a1), the structural units derived from at least one of benzaldehyde and acetaldehyde (a2), and the structural units derived from salicylaldehyde (a3) in component (A) is 30% by mass or more.
7. A photosensitive film obtained by drying the positive-type photosensitive resin composition according to claim 1 or 2.
8. A resist film obtained from the positive-type photosensitive resin composition according to claim 1 or 2.
9. A resist underlayer film obtained from the positive-type photosensitive resin composition according to claim 1 or 2.
10. A permanent resist film obtained from the positive-type photosensitive resin composition according to claim 1 or 2.