Method for manufacturing a display device

Abstract

To provide a method for manufacturing a high-definition display device. To provide a display device that combines high display quality and high resolution. [Solution] A method for manufacturing a display device, comprising: forming a first EL film and a first sacrificial film on a first pixel electrode and a second pixel electrode; etching the first sacrificial film to form a first sacrificial layer; etching the first EL film to form a first EL layer, while exposing a second pixel electrode; forming a second EL film and a second sacrificial film; etching the second sacrificial film to form a second sacrificial layer; etching the second EL film to form a second EL layer; forming an insulating film covering the first sacrificial layer, the first EL layer, the second sacrificial layer, and the second EL layer; and etching the insulating film to form an insulating layer having a region in contact with the side surface of the first EL layer and a region in contact with the side surface of the second EL layer.

Claims

[Claim 1] A first step of forming a first pixel electrode and a second pixel electrode, A second step of forming a first EL film on the first pixel electrode and the second pixel electrode, A third step of forming a first sacrificial film that covers the first EL film, A fourth step involves etching the first sacrificial film to form a first sacrificial layer having a region that overlaps with the first pixel electrode, A fifth step involves etching the first EL film to form a first EL layer having a region that overlaps with the first sacrificial layer, and exposing the second pixel electrode. A sixth step involves forming a second EL film on the first sacrificial layer and the second pixel electrode, A seventh step of forming a second sacrificial film that covers the second EL film, An eighth step of etching the second sacrificial film to form a second sacrificial layer having a region that overlaps with the second pixel electrode, A ninth step involves etching the second EL film to form a second EL layer having a region that overlaps with the second sacrificial layer, A tenth step of forming an insulating film that covers the upper and side surfaces of the first sacrificial layer, the side surfaces of the first EL layer, the upper and side surfaces of the second sacrificial layer, and the side surfaces of the second EL layer, An eleventh step of etching the insulating film to form a first insulating layer having a region in contact with the side surface of the first EL layer and a region in contact with the side surface of the second EL layer, and exposing the first sacrificial layer and the second sacrificial layer, A method for manufacturing a display device, comprising a twelfth step of removing the first sacrificial layer and the second sacrificial layer.

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