Control device, Kratsky block, control method, and control program

Abstract

The present invention provides a control device, control method, and control program capable of suppressing parasitic scattering and GISAXS scattering originating from Kratsky blocks. [Solution] A control device for a laboratory X-ray analyzer capable of acquiring X-ray scattering images of molecules on the order of 1000 Å, comprising: a configuration condition setting unit for setting configuration conditions including the opening and height of the Kratsky block 120; a configuration control unit for controlling the Kratsky block 120 to satisfy the configuration conditions; a data acquisition unit for acquiring detected X-ray intensity data in each controlled configuration; and a configuration condition determination unit for determining the configuration condition in which the scattering effect by the Kratsky block is minimized based on the acquired X-ray intensity data.

Description

Technical Field

[0001] The present invention relates to a control device for controlling an X-ray analyzer, a clacky block, a control method, and a control program.

Background Art

[0002] The X-ray scattering method is a method of irradiating a sample with X-rays and detecting the scattered X-rays with a detector. In this method, unlike imaging etc., measurement data of the reciprocal lattice can be obtained in the real space measured by the detector. In recent years, it has also become possible to specify and observe the electron density of a biopolymer in a solution from an X-ray scattering profile (see Patent Document 1).

[0003] When measuring a biological sample composed of macromolecules, it is important how to measure the scattering close to the X-ray direct beam in the range where the scattering angle is small (low angle side). If a parallel beam of synchrotron radiation is used for the X-ray direct beam and a large camera length is set, it is possible to measure the scattering on the low angle side (see Non-Patent Document 1). However, for example, it is not realistic to use a synchrotron radiation facility in the process of inspecting a biological sample. In addition, for a biological sample, measurement is required on both the low angle side and the high angle side up to a certain extent, but if the camera length is increased, only the low angle side can be measured.

[0004] A method of preventing beam attenuation and compensating for a small beam intensity by using a tube that can be depressurized in the beam path from the sample to the detector is also conceivable. However, even if such a tube is used as a component, the inside of the tube does not become a perfect vacuum, so the use of a large device is disadvantageous in terms of beam attenuation and sensitivity.

[0005] Therefore, conventionally, in order to measure the low angle side in a laboratory without setting a large camera length, a beam is narrowed down near the center of the direct beam using a clacky block (see Non-Patent Document 2). In that case, a method of adjusting the position of the clacky block in a direction perpendicular to the direct beam and then adjusting the aperture is adopted.

[0006] On the other hand, when the opening of the Kratsky block is narrowed and the two blades move closer to the center of the direct beam, even stronger parasitic scattering occurs in the area closer to the center of the direct beam. Research has been done to suppress parasitic scattering in the Kratsky block (see Patent Documents 2 and 3). [Prior art documents] [Patent Documents]

[0007] [Patent Document 1] Japanese Patent Publication No. 2023-086675 [Patent Document 2] Special Publication No. 2008-542751 [Patent Document 3] Special Publication No. 2017-506347 [Non-patent literature]

[0008] [Non-Patent Document 1] Shoko Fujima, "Practical Aspects of Protein Complex Structural Analysis Using Bio-SAXS," Journal of the Crystallographic Society of Japan, Vol. 61, No. 2 (2019), pp. 79-80. [Non-Patent Document 2] O. Kratky and H. Stabinger, “X-ray small angle camera with block-collimation system an instrument of colloid research”, Colloid & Polymer Sci. (1984), 262: 345-360 [Overview of the project] [Problems that the invention aims to solve]

[0009] As described above, a method is known to efficiently measure molecules larger than 1000 Å by focusing the beam and measuring at low angles. However, with conventional methods, even when the incident X-ray is focused to 2% output, only molecules of about 800 Å can be measured. While it is possible to further focus the beam to increase the size of measurable molecules, this is not practical due to the reduced scattering intensity. Furthermore, focusing the output to 1% requires stability in beam position and slit position, which is difficult to control.

[0010] The more the beam is narrowed, the more parallel the surface of the Kratsky block becomes to the beam. Because the direct beam enters the block surface at a very close angle of incidence, parasitic scattering occurs in close proximity to the narrowed beam. Furthermore, the intensity of parasitic scattering is proportional to the intensity of the incident X-rays. The closer to the center of the beam, the stronger the beam becomes, and the stronger the beam, the stronger the parasitic scattering. When the Kratsky block opening is reduced to narrow the beam, parasitic scattering from the Kratsky block increases. Also, a smaller Kratsky block opening results in a smaller angle of incidence for the X-rays relative to the Kratsky block, causing GISAXS scattering on the surface of the Kratsky block, and strong GISAXS scattering is detected near the center. Therefore, the conventional method of simply increasing the output to narrow the beam has limitations in measurements in the low-angle region.

[0011] This invention has been made in view of these circumstances, and aims to provide a control device, a Kratsky block, a control method, and a control program that suppress parasitic scattering and GISAXS scattering originating from the Kratsky block and enable measurement in the low-angle region. [Means for solving the problem]

[0012] (1) To achieve the above objective, the present invention provides a control device for controlling a laboratory X-ray analyzer and acquiring an X-ray scattering image for morphological analysis of molecules on the order of 1000 Å, comprising: a configuration condition setting unit for setting configuration conditions including the opening and height of a Kratsky block; a configuration control unit for controlling the Kratsky block to satisfy the configuration conditions; a measurement control unit for irradiating a direct beam of X-rays focused by the controlled Kratsky block onto a target for measurement; and a data acquisition unit for acquiring X-ray data scattered by the target for measurement, wherein the configuration condition setting unit is characterized by setting the center position of the aperture of the Kratsky block to a position different from the center position of the direct beam.

[0013] (2) Furthermore, in the control device described in (1) above, the arrangement condition setting unit is characterized in that it sets the center position of the direct beam outside the range of the opening of the Kratsky block.

[0014] (3) In addition, in the control device described in (1) or (2) above, the data acquisition unit is characterized in that it acquires X-ray scattering data of biomolecules in a solution as the object to be measured using the Kratsky block controlled by the arrangement conditions.

[0015] (4) In addition, in the control device described in any of (1) to (3) above, the arrangement condition setting unit is characterized in that, only when the opening of the Kratsky block is less than a predetermined value, the center position of the opening of the Kratsky block is set to a position different from the center position of the direct beam.

[0016] (5) Furthermore, a control device according to any one of (1) to (4) above, characterized in that it controls the Kratsky block with the arrangement conditions set and stored for measurement of the same type of measurement target as the measurement target, and irradiates the measurement target with the direct beam.

[0017] (6) Further, in the control device according to any one of (1) to (5) above, it includes an arrangement condition determination unit that determines the arrangement condition in which the influence of scattering by the clamshell block is the smallest, and the data acquisition unit acquires the detected X-ray intensity data in each of the controlled arrangements, and the arrangement condition determination unit determines the arrangement condition based on the acquired X-ray intensity data.

[0018] (7) Further, the control device according to (6) above further includes a beam stop control unit that scans the beam stop, and the data acquisition unit acquires the X-ray intensity for the scan of the beam stop using the clamshell block placed in each of the controlled arrangements, and the arrangement condition determination unit specifies the shortest position to the beam center of the beam stop that achieves the target intensity to substantially specify the maximum form qmin.

[0019] (8) Further, in the control device according to (6) above, the data acquisition unit acquires X-ray scattering data in each of the controlled arrangements, and the arrangement condition determination unit determines the one that gives the maximum value among the form qmin based on the smallest scattering vector where statistically significant data is present on the X-ray scattering profile generated from the acquired X-ray scattering data.

[0020] (9) Further, the control device according to any one of (6) to (8) above further includes an input / output control unit that receives an input of the target intensity, and the arrangement condition determination unit specifies the arrangement condition that achieves the input target intensity.

[0021] (10) Further, the control device according to any one of (6) to (8) above further includes an intensity setting unit that sets the target intensity according to the measurement object, and the arrangement condition determination unit specifies the arrangement condition that achieves the set target intensity.

[0022] (11) Also, it is a collimator block whose arrangement is controlled by the control device according to any one of (1) to (5) above, and is characterized by having a shutter provided on the light receiving surface on the side opposite to the side that forms the X-ray direct beam in the rear stage portion.

[0023] (12) Further, the control method of the present invention is a control method for controlling a laboratory X-ray analyzer to obtain an X-ray scattering image for morphological analysis of molecules on the order of 1000 Å, and includes a step of setting arrangement conditions including the opening degree and height of the collimator block, a step of controlling the collimator block so as to satisfy the arrangement conditions, a step of irradiating a measurement object with the direct beam of X-rays narrowed by the controlled collimator block, and a step of obtaining X-ray data scattered by the measurement object. As the arrangement conditions, it is characterized in that the central position of the opening of the collimator block is set at a position different from the central position of the direct beam.

[0024] (13) Further, the control program of the present invention is a control program for controlling a laboratory X-ray analyzer to obtain an X-ray scattering image for morphological analysis of molecules on the order of 1000 Å, and includes a process of setting arrangement conditions including the opening degree and height of the collimator block, a process of controlling the collimator block so as to satisfy the arrangement conditions, a process of irradiating a measurement object with the direct beam of X-rays narrowed by the controlled collimator block, and a process of obtaining X-ray data scattered by the measurement object. The computer is made to execute these processes, and as the arrangement conditions, it is characterized in that the central position of the opening of the collimator block is set at a position different from the central position of the direct beam.

Brief Description of the Drawings

[0025] [Figure 1] (a) and (b) are schematic views showing the arrangements of the conventional and the collimator blocks of the present invention, respectively. [Figure 2] It is a schematic view showing the control system according to the present invention. [Figure 3] It is a perspective view showing an X-ray analyzer. [Figure 4] This is a block diagram showing the configuration of the control system according to the present invention. [Figure 5] This is a flowchart showing the operation of the control device of the first embodiment. [Figure 6] This is a table showing the setting conditions. [Figure 7] (a) and (b) are graphs showing the detection intensity relative to the beam stop position and tables showing the placement conditions at the target output %, respectively. [Figure 8] (a) and (b) are side views showing the arrangement of the beam stop before and after relocation, respectively. [Figure 9] This is a table showing the experimental results. [Figure 10] This is a flowchart showing the process from sample measurement to analysis. [Figure 11] This is a schematic diagram illustrating the process from acquiring and analyzing scattering images. [Figure 12] This is a flowchart showing the operation of the control device of the second embodiment. [Figure 13] (a) to (c) are the scattering image, β-direction profile, and q-direction profile, respectively. [Figure 14] This is a schematic diagram showing the configuration of the Kratsky block according to the third embodiment. [Figure 15] (a) and (b) are cross-sectional and plan views, respectively, showing the configuration of the Kratsky block used in the experiment. [Figure 16] This is a detection image of a direct beam at 100% opening of the Kratsky block. [Figure 17] These are detection images of the direct beam at various positions in the Kratsky block with a 2% opening. [Figure 18] (a) and (b) are graphs showing the beam intensity with respect to the position of the Kratsky block, and graphs showing the relationship between the residual intensity obtained by a conventional method and the method of the present invention, respectively, which yields the same format qmin. [Figure 19] This graph shows the intensity distribution for each position at different degrees of Kratsky block opening. [Figure 20] This graph shows the shortest beam stop position to the beam center for a given opening of the Kratsky block. [Figure 21] This graph shows the shortest beam stop position to the beam center for a given opening of the Kratsky block. [Figure 22] (a) and (b) are plan views showing the forward (VF) and reverse (VR) vertical arrangements of the Kratsky blocks, respectively. [Figure 23] (a) and (b) are graphs showing the shortest beam stop position to the beam center for each degree of Kratsky block opening. [Modes for carrying out the invention]

[0026] Next, embodiments of the present invention will be described with reference to the drawings. To facilitate understanding of the description, the same reference numerals are used for identical components in each drawing, and redundant descriptions are omitted.

[0027] [principle] Figures 1(a) and 1(b) are schematic diagrams showing the arrangement of conventional and present-day Kratsky blocks, respectively. As mentioned above, beam focusing and beam intensity are important in measurements targeting biomacromolecules. Therefore, as shown in Figure 1(a), conventionally, the height and opening of the Kratsky block are determined based on the premise of focusing the beam to a range with a uniform width centered on the beam center of the direct beam R01. Specifically, the beam center is found by translating the Kratsky block under OPEN conditions, and the beam is focused by adjusting the opening of the Kratsky block. However, focusing to an area close to the beam center results in strong parasitic scattering R02 and R03. The arrows in the figure represent parasitic scattering.

[0028] In contrast, as shown in Figure 1(b), the present invention increases the aperture to collimate the weaker portion of the beam edge. That is, the center position of the Kratsky block aperture is set to a different position from the center position of the direct beam. The center position of the Kratsky block aperture refers to the center of the aperture range created between the preceding block 121 and the succeeding block 122, while the center position of the direct beam refers to the position with the highest X-ray intensity in the direct beam. Specifically, the cross-sectional range perpendicular to the beam propagation direction between each block can be identified as the aperture range, and its centroid position can be identified as the center position. The center position of the direct beam may be included within the aperture range of the Kratsky block, but it is preferable to set it outside that range. With this arrangement, it is possible to prevent high-intensity X-rays from irradiating the edges of the Kratsky block.

[0029] Furthermore, by increasing the aperture and collimating the weaker portion of the beam at its edge, the input is weakened, but the intensity of parasitic scattering is dramatically reduced. Specifically, under the OPEN condition, the Kratsky block is translated to find the beam center, the aperture is adjusted, and since the front and rear blocks are not symmetrical, the height (position perpendicular to the rotation axis) is optimized by translation. In this way, even when extracting a beam with the same 2% intensity, for example, parasitic scattering can be greatly reduced by increasing the aperture and using the beam edge rather than focusing near the beam center.

[0030] The side closer to the X-ray source is called the front stage, and the side further away is called the rear stage (the same applies hereafter). Also, one side perpendicular to the direction of X-ray propagation is called the upper stage, and the other is called the lower stage. The beam is cut in a straight line by the rear block of the Kratsky block, and a sharp beam shape with high intensity is obtained at the cut edge. This portion is used as an elongated beam.

[0031] As a result, the achievable formal qmin dramatically improves. Formal qmin is a parameter based on the wavenumber of the smallest scattering vector for which statistically meaningful data exists on the intensity profile. Formal qmin is defined as 2π / qa, where qa is the wavenumber formally determined by plotting the graph as the wavenumber of the smallest scattering vector with a statistically meaningful intensity standard deviation σ. The arrangement conditions are optimized by identifying the arrangement conditions of the Kratsky block that give the maximum value among the calculated formal qmin. For example, with a camera length of 400 mm, formal qmin reaches approximately 3000 Å in terms of resolution. This is a level that makes it practically possible to observe biomolecules at 2000 Å.

[0032] [First Embodiment] (Control system) Figure 2 is a schematic diagram showing the control system 10. The control system 10 comprises an X-ray analyzer 100 and a control device 200. The X-ray analyzer 100 irradiates the sample S0 with X-rays and detects small-angle scattered X-rays. The sample S0 to be measured is preferably a polymer in solution, particularly a biopolymer. In particular, when targeting pharmaceutical molecules, molecular complexes, or structures in solution, a resolution of 30 Å or less is required, and this method is effective in such analyses. Biopolymers are basically natural polymers produced by the cells of living organisms, but here they also include viruses.

[0033] The solution to be irradiated with X-rays includes a sample solution and a buffer solution. The sample solution is a solution containing the sample, for example, a biopolymer and a special component for holding that biopolymer. The buffer solution is the solution obtained by removing the sample from the sample solution. For example, the buffer solution in the above example does not contain biopolymers but contains a special component. The buffer solution may be a separate solution with components similar to those of the sample solution, but it is preferable to use a solution obtained by separating the sample from the sample solution.

[0034] The X-ray analyzer 100 comprises an X-ray generation unit 110, a Kratsky block 120, a sample loading mechanism 130, a beam stop 140, a detector 150, and a control unit 170. The X-ray generation unit 110 has an X-ray source 111 and irradiates the sample S0 with X-rays. It is preferable to use Cu as the target of the X-ray source 111, but Co or Ga may also be used. The Kratsky block 120 is formed by integrating two blocks, a front block 121 and a rear block 122. By tilting the Kratsky block 120 around its axis of rotation, a gap is created between the blocks located in the front and rear stages of the beam. The beam is focused by passing the X-rays between these blocks.

[0035] The sample loading mechanism 130 sends the sample solution containing the sample S0 or the buffer solution without the sample, along with the sample holding tube, to the X-ray irradiation position. The beam stop 140 is used to shield the direct beam. The detector 150 detects the X-rays scattered by the direct beam or the sample S0 and transmits the obtained measurement data to the computer 210.

[0036] In the above configuration, one detector 150 is provided for each X-ray beam emitted from the X-ray source 111, but other configurations may also be adopted. For example, the X-ray analyzer 100 may be configured to emit two equivalent beams in the same direction using mirrors or slits, and detect the scattered radiation from them with one detector. Alternatively, the X-ray analyzer 100 may be configured to emit two equivalent beams in opposite directions, and detect the scattered radiation from them with two separate detectors.

[0037] The control device 200 consists of a computer 210, an input device 280, and an output device 290, and controls the operation of the X-ray analyzer 100, as well as acquiring and processing measurement data from the X-ray analyzer 100. Alternatively, the control of the measuring device and the processing of the measurement data may be performed by separate computers.

[0038] Computer 210 is, for example, a PC and consists of a processor that performs processing and memory or a hard disk that stores programs and data. Computer 210 receives user input from input devices 280 such as a keyboard and mouse.

[0039] The computer 210 may be a server device located in the cloud. Alternatively, from the perspective of processing load, the function of controlling the operation of the X-ray analyzer 100 and the function of processing the measurement data may be separated, with control performed on a PC installed on-site and data processing performed on a server device.

[0040] (X-ray analyzer) Figure 3 is a perspective view showing the X-ray analyzer 100. The X-ray analyzer 100 is a laboratory measuring device for obtaining measurement data by irradiating a sample S0 with X-rays and detecting the scattered X-rays, and can acquire X-ray scattering images for molecules on the order of 1000 Å. The order of 1000 Å means, for example, a size of 1000 Å or more. The X-ray analyzer 100 includes an X-ray source 111, an optical system 115, a Kratsky block 120, a sample holding tube 125, a beam stop 140, and a detector 150. The X-ray source 111 is a linear or point source that emits a divergent beam. The optical system 115 is, for example, a KB parallel or series optical system.

[0041] The Kratsky block 120 interacts with the X-rays through its edges, defining one side of the X-ray beam and the other. This removes parasitic scattering from the irradiated X-rays, although the Kratsky block 120 itself causes some scattering. The sample holding tube 125 dispenses and holds 5 μl to 10 μl of solution.

[0042] The beam stop 140 stops the direct beam. The detector 150 detects the direct beam or X-rays scattered by the solution. The X-ray analyzer 100 transmits the detected scattering image to the control device 200. The detected scattering image is transmitted as measurement data at predetermined time intervals t.

[0043] (Control device) Figure 4 is a block diagram of the control system 10. The control device 200 controls the X-ray analyzer 100 and adjusts the Kratsky block 120 before sample measurement. The control device 200 can also control the X-ray analyzer 100 during sample measurement, acquire X-ray scattering data, profile it, and perform analysis. The functions of the control device 200 are mainly realized by the computer 210.

[0044] The computer 210 includes an input / output control unit 211, an intensity setting unit 213, a placement condition setting unit 214, a placement control unit 215, a beam stop control unit 216, a measurement control unit 217, a data acquisition unit 219, a profile generation unit 223, a placement condition determination unit 232, a placement condition storage unit 234, and an analysis data generation unit 242. Each unit can send and receive information via the control bus L.

[0045] The input / output control unit 211 receives input from the input device 280 and controls the output to the output device 290. For example, the input / output control unit 211 can receive input of the desired intensity (output %) from the user. The desired intensity is largely determined by the type of sample, but precise settings are possible by the user's input. The user can set an appropriate output %, and the arrangement of the Kratsky blocks can be optimized according to that setting.

[0046] The system can also accept input indicating whether or not to use the stored arrangement conditions of the Kratsky block 120 for the type of object being measured. When the system accepts input indicating that the stored arrangement conditions should be used, the measurement is performed using the stored arrangement conditions of the Kratsky block 120. This eliminates the need to adjust the Kratsky block for the same type of object being measured. The input / output control unit 211 can also output various indicators and judgment results.

[0047] The intensity setting unit 213 sets the desired intensity according to the object being measured. It can automatically set an appropriate output percentage according to the object being measured and optimize the placement conditions of the Kratsky block according to that setting. For example, the appropriate intensity can be set depending on whether the target is a protein preparation, an antibody drug, or a gene therapy vector.

[0048] The placement condition setting unit 214 sets placement conditions, including the opening degree and height of the Kratsky block 120. The placement control unit 215 controls the Kratsky block to satisfy the placement conditions. For example, a pre-table of scanning ranges that can achieve the desired intensity at each opening degree can be created, and each placement condition can be set accordingly.

[0049] The beam stop control unit 216 causes the beam stop to scan. For example, it determines a constant step size for the beam stop 140 and moves it accordingly to enable measurements at each position. Control instructions are transmitted to the control unit 170 in the X-ray analyzer 100, which controls the beam stop 140.

[0050] The measurement control unit 217 controls the operation of the X-ray analyzer 100. The controlled operations include sample feeding, X-ray generation, and movement of the sample position and detector. Control instructions are transmitted to the control unit 170 within the X-ray analyzer 100, which controls various parts of the X-ray analyzer 100. The controlled Kratsky block 120 then focuses a direct beam of X-rays onto the object to be measured.

[0051] The data acquisition unit 219 acquires X-ray intensity data detected by the X-ray analyzer 100 for each controlled arrangement of the Kratsky block 120. As a result, the data acquisition unit 219 acquires X-ray scattering data of the target object using the Kratsky block to which the determined arrangement conditions are applied. In this process, the opening of the Kratsky block is increased, and the center of the X-ray direct beam is cut off by the subsequent block, and the beam passing through the edges is irradiated. By increasing the opening of the Kratsky block, the amount of X-rays irradiated to the preceding block can be reduced, and the scattering intensity can be reduced. Furthermore, since the incident angle of the beam on the block surface is increased, GISAXS scattering can be prevented. On the other hand, a sharp beam with sufficient intensity can be obtained at the edge of the cut beam. Moreover, scattered X-rays generated from the subsequent block dissipate outside the measurement area, so they have little effect on the measurement results.

[0052] The data acquisition unit 219 acquires X-ray data detected at each positioned beam position not only during sample measurement but also during pre-measurement adjustments. The acquired measurement data is used for determining the arrangement conditions of the Kratsky blocks 120, converting them to scattering profiles, optimizing measurement conditions, and generating data for analysis. The data acquisition unit 219 acquires X-ray intensity for beam stop scans using Kratsky blocks placed in each controlled arrangement.

[0053] The data acquisition unit 219 acquires X-ray scattering data of biomolecules as a result of measuring biomolecules in solution under the arrangement conditions determined at the time of measurement. In this way, viruses and antibodies larger than 2000 Å can also be measured.

[0054] The profile generation unit 223 generates an intensity profile based on the acquired X-ray scattering data. During profiling, upsampling with a width smaller than the pixel size or downsampling may be used. Specifically, the measurement data is converted into a scattering profile using the following method: the intensity is accumulated along the circumferential direction (β direction) around the center of the scattered image to calculate the scattering profile. The profile generation unit 223 also calculates the standard deviation of the intensity in the β direction for a given wavenumber q.

[0055] The placement condition determination unit 232 determines the placement conditions that minimize the scattering effect of the Kratsky block 120 based on the acquired X-ray intensity data. By optimizing the placement conditions, the Kratsky block can be used at a large opening while avoiding the center of the beam.

[0056] Specifically, the maximum type qmin is determined by identifying the shortest distance to the beam center of the beamstop that achieves the desired intensity. This allows beamstop scanning to be used instead of determining the maximum type qmin.

[0057] In any case, the placement conditions for the Kratsky block 120 are determined to achieve the desired intensity, which is either input or automatically set. The placement condition determination unit 232 may determine the placement conditions for the Kratsky block based on stored placement conditions for the same type of measurement target.

[0058] The arrangement condition storage unit 234 stores the determined arrangement conditions of the Kratsky block 120, corresponding to the type of object to be measured. These determined arrangement conditions can then be stored and used for measurement. For example, the arrangement conditions that yielded the highest achievable resolution on a given day can be stored, allowing for immediate sample measurement the following day using the stored settings. This eliminates the need to adjust the Kratsky block for similar objects to be measured.

[0059] The analysis data generation unit 242 subtracts the profile of the buffer solution, which has been scaled as background, from the profile of the sample solution. The sample solution profile, with the background subtracted, is output as analysis data. Details of the profile will be described later.

[0060] (Control method) Next, we will explain the method using the control device 200 configured as described above. Figure 5 is a flowchart showing the operation of the control device 200. Ideally, in order to search for setting conditions that achieve the optimal format qmin, it is necessary to generate an X-ray scattering profile using a standard sample and determine the format qmin for each setting condition. However, such a method is too time-consuming and laborious. Therefore, in this embodiment, the optimization of format qmin is substituted by scanning the beam stop. The specific procedure is described below.

[0061] First, the required output % (target intensity) of the incident X-ray and the scanning range of the Kratsky block are set according to the object to be measured (step S101). The scanning range of the Kratsky block refers to the range in which its opening and position are varied. Both may be automatically determined according to the type of object to be measured selected by the user. Next, the placement conditions of the Kratsky block are set (step S102). Specifically, the opening and position of the Kratsky block for each X-ray irradiation are set. Then, the Kratsky block is controlled to be positioned according to one of the set placement conditions (opening, position (height)) (step S103). At this time, no standard sample is placed.

[0062] The beam stop scan is initiated, and the beam stop is moved by the specified width (step S104). After the movement, X-rays are irradiated according to the Kratsky block's placement conditions, and X-ray intensity data detected by the detector is acquired (step S105). Then, it is determined whether or not the desired intensity has been achieved (step S106). If the desired intensity has not been achieved, the process returns to step S104, and the beam stop scan is continued. If the desired intensity has been achieved, the Kratsky block's placement conditions and the beam stop's position at that time are stored in memory (step S107). Details of the beam stop scan will be described later.

[0063] Next, it is determined whether all the placement conditions for the Kratsky blocks have been met (step S108). If not, the process returns to step S103 and controls the Kratsky blocks to the next placement. If all placement conditions have been met, the placement condition where the beam stop is closest to the beam center is determined as the optimal placement condition (step S109).

[0064] Using the Kratsky block placement conditions determined in this way, a standard sample is placed, and the type qmin is measured by varying other setting conditions (step S110). Then, the optimal type qmin, placement conditions, and beam stop position at the target output % are identified (step S111), and the series of processes is completed.

[0065] By determining the optimal optical system settings and beam position in this way, the achievable resolution can be optimized. For example, when the present invention is applied to MAXS (Middle Angle X-ray Scattering), it is possible to obtain a resolution of up to 3000 Å. The scattered image is obtained by the Fourier transform in real space, and since the scattered image is obtained by performing a Fourier transform over an integration range that has a margin of safety over the observable size, the size of molecules that can actually be analyzed is smaller than the achievable resolution. However, even in that case, the state of biomacromolecules such as lentiviruses, coronaviruses, and adenoviruses with a size of about 1000 Å can be identified.

[0066] (Output % setting) Figure 6 is a table showing the setting conditions. In the step of setting the required output % (target intensity) of the incident X-rays according to the object being measured, it is preferable to accept input from the user to select the type of sample to be measured. Depending on this selection, appropriate settings for the output %, format qmin, and other parameters can be selected from a pre-created table. The selected settings are then fine-tuned and used in the measurement and analysis of the measurement results.

[0067] (Setting the placement conditions for Kratsky blocks) Figures 7(a) and 7(b) are graphs showing the detection intensity against the beam stop position and tables showing the placement conditions at the target output %, respectively. The Kratsky block opening is basically expressed as the tilt of the Kratsky block with respect to the X-ray beam propagation direction. Alternatively, it can be expressed as the percentage of the output X-ray intensity relative to the incident X-ray intensity when the Kratsky block is placed at the beam center. As shown in Figure 7(b), a tilt of -0.068° as an opening corresponds to an output of 2%, and -0.073 corresponds to an output of 3%. Therefore, an opening of -0.068° can also be expressed as an opening of 2%.

[0068] According to the above definition of opening degree, an output of 2% can only be achieved in a Kratsky block with a 2% opening degree when the center of the Kratsky block and the beam center coincide, i.e., at one point on the beam center. However, with an opening degree greater than 2%, it is possible to achieve an output of 2% at a position offset from the beam center. For example, if a Kratsky block with a 4% opening degree is moved in a direction perpendicular to its axis of rotation, an output of 2% can be achieved around 0.4 on the graph shown in Figure 7(a). "VF32P" in the figure refers to the movement of a Kratsky block with a 32% opening degree in a vertically arranged sequential configuration. The same applies to other notations.

[0069] Therefore, a table showing the placement conditions at the target output % can be prepared as follows. First, the Kratsky block is controlled to a constant opening, and while maintaining that opening, the position of the Kratsky block is changed and the intensity (output %) of the direct beam passing through the Kratsky block is measured. Then, this measurement is performed for each Kratsky block controlled to each opening. In this way, two positions are generated at each opening where a predetermined output % can be achieved, but one of these can be recorded as usable, and a table showing the placement conditions at the target output % can be generated as shown in Figure 7(b).

[0070] (Scanning the beamstop) The scanning of the beam stop, one of the steps described above, will now be explained. Figures 8(a) and 8(b) are side views showing the arrangement of the beam stop 140 when parasitic scattering is detected and when it is not detected, respectively. In the example shown in Figure 8(a), the aperture of the Kratsky block is small, and the center position of the aperture of the Kratsky block coincides with the center position of the direct beam. In this case, parasitic scattering R22 and R23 occurs not only in the formed direct beam R21 but also at positions far from the beam center. R22 represents parasitic scattering originating from the preceding block 121, and R23 represents parasitic scattering originating from the subsequent block 122. Here, R22 is detected by the detector 150, but R23 can be blocked by the beam stop 140. In Figure 8(a), as the beam stop 140 is moved little by little in the direction of the arrow, the intensity detected by the detector 150 increases sharply at the position where the edge of the beam stop 140 overlaps with the formed parasitic scattering R22.

[0071] In contrast, in the example shown in Figure 8(b), the aperture of the Kratsky block is large, and the center position of the Kratsky block aperture is different from the center position of the direct beam. In this case, direct beam R21 and parasitic scattering R22 and R23 are generated, but only direct beam R21 is detected. This is because the angle of incidence to the block 121 preceding direct beam R21 is large, and parasitic scattering R22 occurs at a position far from direct beam R21. Therefore, if the beam stop 140 is moved little by little in the direction of the arrow, the intensity detected by the detector 150 increases sharply before the edge of the beam stop 140 touches the edge of the formed direct beam R21. The position of the beam stop just before the sharp increase in intensity corresponds to the condition for obtaining formal qmin. Comparing the examples shown in Figures 8(a) and (b), the beam stop can be moved to a position closer to the beam center by Δh in Figure 8(b). In this way, the position where formal qmin is obtained, being closest to the beam center, coincides with the case with the least parasitic scattering, and that condition is the condition for obtaining the maximum formal qmin.

[0072] (Record of measurement results) Figure 9 is a table showing the experimental results. Figure 9 shows the placement conditions (opening and height) of the Kratsky block that produce the same intensity, and the beam stop position (BS position) at those times. In Figure 9, the lowest BS position is achieved under the conditions of opening -0.185° and height -1.45mm. The achievable resolution (= format qmin) and other setting parameters at the lowest BS position are stored. The optimal placement conditions for the Kratsky block 120 are identified using the above control method. Before measuring the sample, the Kratsky block 120 should be adjusted to these placement conditions.

[0073] (Sample measurement and analysis methods) After optimizing the arrangement conditions and other parameters as described above, sample measurement and analysis can be performed using the control system 10. Figure 10 is a flowchart showing the process from sample measurement to analysis. First, the X-ray analyzer 100 sets the measurement conditions based on the information input by the user (step S201).

[0074] Upon receiving a user input to start measurement, the X-ray analyzer 100 begins measurement (step S202). The X-ray analyzer 100 sends the buffer solution to a predetermined position, irradiates it with X-rays, and acquires scattering data with the detector (step S203). Next, scattering data of the sample solution is acquired in the same manner (step S204). The X-ray analyzer transmits the acquired scattering image data as measurement data to the computer 210.

[0075] The computer 210 stores the received measurement data and converts it into a scattering profile (step S205). Then, it takes the difference between the obtained profiles to generate data for analysis (step S206), and performs analysis using that data (step S207).

[0076] (Acquisition and analysis of scattered images) Figure 11 is a schematic diagram showing the process from acquiring the scattering image to analyzing it. The buffer solution and the sample solution are alternately irradiated with X-rays, and the detected scattering image is acquired at predetermined time intervals t. By switching the sample holding tube 125 using the sample loading mechanism, alternating irradiation of each solution becomes possible.

[0077] The scattering image is converted into a profile. The data for analysis is obtained by subtracting the intensity profile obtained by integrating the measurement data of the buffer solution from the intensity profile obtained by integrating the measurement data of the sample solution over the entire measurement time.

[0078] In this case, in order to properly process the high-angle data used for analyzing structures smaller than 30 Å, it is necessary to adjust the relative scale of the sample solution profile and the buffer solution profile, i.e., to scale them, and then subtract them.

[0079] The obtained analytical data can be used for structural analysis as an experimentally measured X-ray scattering profile. By representing the volume of a real-space cube containing particles as voxels of a discretized cube in an N×N×N grid, an electron density map can be calculated by searching for structure factors based on the experimentally measured X-ray scattering profile.

[0080] Specifically, multiple structural models are generated from the measured X-ray scattering profile, and a computational X-ray scattering profile is calculated from each of these structural models. An index representing the degree of agreement between the calculated computational X-ray scattering profile and the measured X-ray scattering profile is calculated, and a representative structural model is selected from the multiple structural models based on the calculated index. Multiple structural models may also be used as an ensemble to evaluate the shape and mobility of the molecule. In this way, the electron density of polymers in solution with structures exhibiting dynamic fluctuations can be reproduced, and various information can be obtained.

[0081] [Second Embodiment] In the above embodiment, beam stop scanning is performed instead of optimizing the formal qmin, but optimization of the formal qmin may be performed as per the principle. That is, in the first embodiment, the optical system that maximizes the formal qmin is searched for by scanning the beam stop, but in the second embodiment, the optical system that maximizes the formal qmin is searched for using scattered radiation from the sample without using the beam stop. Figure 12 is a flowchart showing the operation of the control device 200.

[0082] First, the required output % (target intensity) of the incident X-ray and the scanning range of the Kratsky block are set according to the object to be measured (step S301). Then, the placement conditions for the Kratsky block are set (step S302), and the Kratsky block is controlled to be positioned according to one of the set placement conditions (opening degree, position (height)) (step S303). A standard substance is placed in place of the sample. For example, AgBh can be used as the standard substance.

[0083] Next, other parameters are controlled (step S304). These other parameters include, for example, the position of the direct beam relative to the detector 150. The X-rays are irradiated onto a standard sample, and the detected X-ray scattering data is acquired (step S305). The acquired X-ray scattering data is converted and profiled (step S306). Details of the data conversion will be described later.

[0084] The formal value qmin is calculated using the X-ray scattering profile of the standard sample obtained through data conversion (step S307). The formal value qmin is a numerical value defined by the wavenumber of the smallest measurable scattering vector. Here, "measurable" means that statistically meaningful intensity information can be obtained. For example, the wavenumber at which the standard deviation σ of the intensity is 5% or less of the intensity may be defined as the wavenumber of the smallest measurable scattering vector. Furthermore, the threshold for the standard deviation σ is not limited to 5% but may be any other predetermined value. The formal value qmin and the arrangement conditions of the Kratsky block obtained from the above calculation are stored (step S308).

[0085] Step S309 determines whether data acquisition has been completed for all setting conditions. If data acquisition has not been completed for all setting conditions, the process returns to step S303 to perform a new Kratsky block configuration. If data acquisition has been completed for all setting conditions, the optimal format qmin and configuration conditions for the target output % are determined (step S310), and the series of processes is terminated. In this way, the configuration conditions for the Kratsky block that provide the highest resolution for the target can be determined. The improved resolution makes it possible to observe molecules on the order of 1000 Å.

[0086] (Data conversion) Figures 13(a) to (c) show the scattering image, β-direction profile, and q-direction profile, respectively. When a solution is irradiated with X-rays, a scattering image like the one shown in Figure 13(a) is obtained. In this scattering image, plotting the intensity I in the circumferential direction (β-direction) around the center with a predetermined scattering vector q yields a graph like the one shown in Figure 13(b). Furthermore, integrating the intensity I in the β-direction of the scattering image and representing the integrated intensity I for each scattering vector q yields an X-ray scattering profile like the one shown in Figure 13(c).

[0087] [Third Embodiment] In the above embodiment, a conventional Kratsky block is used as the Kratsky block itself, but a Kratsky block with a partition may also be used. Figure 14 is a schematic diagram showing the configuration of the Kratsky block 320.

[0088] The Kratsky block 320 comprises a front block 321 and a rear block 322. The rear block 322 has a screen 323 on its rear end, on the surface opposite to the beam shaping side. The screen 323 is formed in the shape of a rectangular plate and prevents parasitic scattering generated at the edge of the front block 321 from reaching the detector 150. The screen 323 only needs to be able to remove scattered radiation, and its shape is not limited to a rectangular plate. In this way, scattering by the light-receiving surface of the Kratsky block 320 can be prevented from affecting the measurement.

[0089] The Kratsky block 320 is positioned according to the control device 200, and the formed direct beam is incident on the sample S0, with scattered X-rays detected by the detector 150. The transmitted direct beam is shielded by the beam stop 140.

[0090] [Examples] (Acquisition of detected image) Experiments were conducted to confirm the present invention. Figures 15(a) and 15(b) are a cross-sectional view and a plan view, respectively, showing the configuration of the Kratsky block 520 used in the experiment. The Kratsky block 520 comprises a front upper block 521 and a rear lower block 522 as an integrated block. The Kratsky block 120 may also have a detachable blade.

[0091] The front upper block 521 and rear lower block 522 may be arranged horizontally or vertically depending on the direction of the edge of the block that cuts the beam. Furthermore, in each arrangement, there are two types: a forward arrangement where the front block blocks the center of the beam, and a reverse arrangement where the rear block blocks the center of the beam.

[0092] The Kratsky block 520 was positioned at 100% opening to detect the direct beam. Figure 16 shows the detected image of the direct beam at 100% Kratsky block opening. The wedge-shaped marks in the figure indicate the position of the beam center. The projected image of the direct beam is circular, but the beam center is slightly off-center. This is due to the incident mirror and means that the cross-sectional shape of the incident X-ray beam itself is shaped like a tail extending from the center to one side.

[0093] Next, the direct beam formed by changing the position of the Kratsky block 520 at a 29% aperture was detected. Figure 17 shows the detection images of the direct beam at each position of the Kratsky block at a 29% aperture. The wedge-shaped marks indicate the beam center of the direct beam incident on the Kratsky block by their tips (position of the dashed lines). In the Kratsky block configuration at 29% intensity, the beam center of the direct beam coincides with the aperture center of the Kratsky block. In this case, scattering by the Kratsky block occurs on both sides in the direction perpendicular to the edge of the Kratsky block.

[0094] When the block after the Kratsky block is moved in a direction that cuts the center of the direct beam, and a beam with an intensity of 2% is obtained, the sharpest beam with the least scattering is obtained. On the other hand, when the block before the Kratsky block is moved in a direction that cuts the center of the direct beam, large scattering occurs and a sharp beam shape is not obtained. In other words, in this embodiment, it is preferable to position the center of the Kratsky block's opening on the side of the block before it that is closer to the center of the direct beam.

[0095] (Creating a table of placement conditions) Figure 18(a) shows the remaining strength relative to the position of the Kratsky block 520. In the figure, "VF32P" indicates that the Kratsky block 520 was moved with a vertical orientation and an opening of 32%. The same applies to the other indications.

[0096] Figure 18(b) is a graph showing the relationship between the residual strength obtained by a conventional method and the method of the present invention, both of which yield the same format qmin. The horizontal axis represents the residual strength obtained when the center of the Kratsky block is positioned at the beam center using the conventional method, and the vertical axis represents the residual strength obtained by implementing the present invention. For example, even when only 2% residual strength is obtained using the conventional method, it can be seen that nearly 10% residual strength can be obtained by using the present invention.

[0097] As shown in Figure 18(a), when the opening of the Kratsky block is reduced below a predetermined threshold, the peak position shifts upward. This shift occurs because parasitic scattering from the preceding block is detected at a higher angle than the original direct beam position, causing the apparent beam position to move to the higher angle. This occurs in the case of an inverted horizontal configuration, and the shift is in the opposite direction in the case of a standard configuration. Note that the position of the Kratsky block shown in Figure 18(a) does not represent an absolute position.

[0098] In this example, a shift in the peak position begins when the Kratsky block is positioned at an opening that results in a maximum intensity of 16%. Therefore, it can be seen that when the Kratsky block is positioned at an opening lower than this, it is affected by parasitic scattering. Based on the Kratsky block opening at which the shift in the peak position begins, an improvement in qmin can be expected by using the method of the present invention.

[0099] When high angular resolution is required for the measurement data, it is necessary to reduce the opening of the Kratsky block and decrease the measurement intensity. As shown in Figure 18(b), by using the present invention when the residual intensity is less than 16%, the same format qmin can be achieved with a higher residual intensity than with the conventional method.

[0100] From this, it can be seen that when the required measurement intensity is high, it is preferable to align the center position of the Kratsky block aperture with the center position of the beam, but when the required measurement intensity is low, it is preferable to have the center position of the Kratsky block aperture and the center position of the beam be different. In other words, when the required residual intensity is greater than a predetermined value, it is preferable to align the center position of the Kratsky block aperture with the center position of the beam, and when the required residual intensity is less than a predetermined value, it is preferable to set the center position of the Kratsky block aperture and the center position of the beam to different positions. Note that in the above example, the required residual intensity is used as the basis, but the residual intensity may also be set based on the required type qmin.

[0101] Thus, it is preferable to have a function that switches the arrangement of the Kratsky blocks according to the required angular resolution and measurement intensity. In the above example, the predetermined value is 16%, but the predetermined value is not necessarily limited to 16% as it varies depending on the optical system and beam shape used. Furthermore, as shown in Figure 18(b), for example, even if only 5% residual intensity could be obtained with the conventional method, it can be seen that measurement is possible with a residual intensity of 11% using this method.

[0102] (Scanning the beamstop) Next, for a direct beam obtained under arrangement conditions where the Kratsky block 520 reaches an output of 2% at each opening, the intensity was detected when the beam stop position was moved from top to bottom. Figure 19 is a graph showing the relationship between the beam stopper position and beam intensity measured at various openings of the Kratsky block 520.

[0103] The numerical position indicates the distance to the beam center. In the figure, "L" and "T" represent the direction of movement of the Kratsky block relative to the direct beam. "L" represents the reverse configuration, and "T" represents the forward configuration. "24P" refers to the lower position when moved at a 24% opening. The same criteria apply to the other symbols. As mentioned above, "02P" can only be obtained at one location, so the symbols "L" and "T" are not used. When the beam stop position is changed from 7.5 mm to 5 mm, there is a position where the intensity increases sharply. Parasitic scattering or the direct beam is detected at that position, and the position immediately before it is the lowest angle at which measurement is possible under each opening condition. In other words, when the beam stop height is at its lowest, measurement is possible from the lowest angle, and the maximum formal qmin is obtained. The obtained results are summarized in Figures 20 and 21.

[0104] Figures 20 and 21 show the relationship between beam stop height and opening when the beam intensity is 3000 or 4000. Figure 20 was measured under the condition that the target remaining intensity is 2%, and Figure 21 was measured under the condition that the target remaining intensity is 5%. From Figure 20, it can be seen that the optimal opening is 9% to achieve a target remaining intensity of 2%. From Figure 21, it can be seen that the optimal opening is 10.7% to achieve a target remaining intensity of 5%.

[0105] Furthermore, beamstop scans were performed for the Kratsky block 520 in vertical forward (VF) and reverse (VR) configurations, and horizontal reverse (HR) configurations. Figures 22(a) and (b) are plan views showing the vertical forward (VF) and reverse (VR) configurations of the Kratsky block 520, respectively. To make it clear that these are plan views viewed from vertically above, pictograms representing human heads (h1) have been added to Figures 22(a) and (b). The horizontal reverse (HR) configuration is, for example, the Kratsky block configuration shown in Figure 1(a). Figures 23(a) and (b) are graphs showing the relationship between the opening degree of the Kratsky block 520 and the position of the beamstop, measured under the condition that the output is 2%. The reason why two beamstop positions are listed for the same opening degree is due to the difference between forward and reverse configurations; the lower the beamstop position, the more likely it is for the reverse configuration. As shown in Figure 23(b), the lowest beam stop position is achieved when the horizontal inverted configuration has an opening of 8%, indicating that the horizontal inverted configuration is optimal for determining the optimal form qmin. [Explanation of symbols]

[0106] 10 Control Systems 100 X-ray analyzer 110 X-ray generation section 111 X-ray source 115 Optical system 120 Kratsky Blocks 121 The block in the previous section 122 The later block 125 Sample holding tube 130 Sample Loading Mechanism 140 Beam Stop 150 detectors 170 Control Unit 200 Control device 210 Computers 211 Input / Output Control Unit 213 Strength setting section 214 Placement Condition Setting Unit 215 Arrangement Control Unit 216 Beam Stop Control Unit 217 Measurement Control Unit 219 Data Acquisition Unit 223 Profile generation unit 232 Arrangement Condition Determination Unit 234 Placement condition storage section 242 Data generation unit for analysis L control bus 280 Input devices 290 Output device 320 Kratsky Blocks 321 The block in the previous section 322 The later block 520 Kratsky Blocks 521 Front upper block 522 Rear lower block R01 Direct Beam R02, R03 parasitic scattering R21 Direct Beam R22 parasitic scattering S0 sample

Claims

1. A control device for controlling a laboratory X-ray analyzer and acquiring X-ray scattering images for morphological analysis of molecules on the order of 1000 Å, A placement condition setting unit that sets placement conditions including the opening degree and height of the Kratsky block, A placement control unit that controls the Kratsky block to satisfy the aforementioned placement conditions, A measurement control unit that irradiates a direct beam of X-rays focused by the controlled Kratsky block onto the object to be measured, The system includes a data acquisition unit that acquires X-ray data scattered by the object to be measured, The control device is characterized in that the arrangement condition setting unit sets the center position of the opening of the Kratsky block to a position different from the center position of the direct beam.

2. The control device according to claim 1, characterized in that the arrangement condition setting unit sets the center position of the direct beam outside the range of the opening of the Kratsky block.

3. The control device according to claim 1 or 2, characterized in that the data acquisition unit acquires X-ray scattering data of biomolecules in a solution as the measurement target using the Kratsky block controlled by the arrangement conditions.

4. The control device according to claim 1 or 2, characterized in that the arrangement condition setting unit sets the center position of the opening of the Kratsky block to a position different from the center position of the direct beam only when the opening degree of the Kratsky block is smaller than a predetermined value.

5. The control device according to claim 1 or 2, characterized in that it controls the Kratsky block with the arrangement conditions set and stored in a measurement of the same type of measurement target as the aforementioned measurement target, and irradiates the measurement target with the direct beam.

6. The system includes a configuration condition determination unit that determines the configuration conditions that minimize the influence of scattering by the Kratsky block, The data acquisition unit acquires the detected X-ray intensity data in each of the controlled arrangements. The control device according to claim 1 or 2, characterized in that the arrangement condition determination unit determines the arrangement conditions based on the acquired X-ray intensity data.

7. It further includes a beam stop control unit that scans the beam stop, The data acquisition unit acquires X-ray intensity for scanning the beam stop using the Kratsky blocks placed in each of the controlled arrangements. The control device according to claim 6, characterized in that the arrangement condition determination unit determines the substantially maximum type qmin by identifying the shortest position to the beam center of the beam stop that achieves the desired intensity.

8. The data acquisition unit acquires X-ray scattering data in each of the controlled arrangements. The control device according to claim 6, characterized in that the arrangement condition determination unit determines the maximum value among the forms qmin, which are based on the smallest scattering vector for which statistically significant data exists on the X-ray scattering profile generated from the acquired X-ray scattering data.

9. It further includes an input / output control unit that accepts input of the desired intensity, The control device according to claim 6, characterized in that the arrangement condition determination unit identifies the arrangement conditions that achieve the input target intensity.

10. It further includes an intensity setting unit for setting the desired intensity according to the object being measured. The control device according to claim 6, characterized in that the arrangement condition determination unit identifies the arrangement conditions that achieve the set target intensity.

11. A Kratsky block whose arrangement is controlled by the control device according to claim 1 or claim 2, characterized in that it has a plate-shaped partition provided on the light-receiving surface on the side opposite to the side that shapes the X-ray direct beam in the downstream section.

12. A control method for controlling a laboratory X-ray analyzer to acquire X-ray scattering images for morphological analysis of molecules on the order of 1000 Å, A step of setting placement conditions including the opening and height of the Kratsky block, A step of controlling the Kratsky block to satisfy the aforementioned placement conditions, The steps include irradiating the object to be measured with a direct beam of X-rays focused by the controlled Kratsky block, The step includes acquiring X-ray data scattered by the object to be measured, A control method characterized in that, as the arrangement condition, the center position of the opening of the Kratsky block is set to a position different from the center position of the direct beam.

13. A control program for controlling a laboratory X-ray analyzer and acquiring X-ray scattering images for morphological analysis of molecules on the order of 1000 Å, The process of setting placement conditions including the opening and height of the Kratsky block, A process for controlling the Kratsky block to satisfy the aforementioned placement conditions, The process involves irradiating the object to be measured with a direct beam of X-rays focused by the controlled Kratsky block, The computer is instructed to perform the process of acquiring X-ray data scattered by the object being measured. A control program characterized in that, as the arrangement condition, the center position of the opening of the Kratsky block is set to a position different from the center position of the direct beam.

Images