Exposure equipment

Abstract

To provide an exposure apparatus that allows for easy focus adjustment. [Solution] The exposure apparatus includes a first illumination optical system, a first spatial light modulator illuminated by light from the first illumination optical system, a first projection optical system that illuminates a target with light from the first spatial light modulator, and a stage configured to move in a first direction and having a top surface configured to support the target, wherein the first illumination optical system includes a first lens and a first optical member that directs light that has passed through the first lens to the first spatial light modulator, the first lens being located below the first spatial light modulator, and in a plan view, the first lens and the first spatial light modulator being located at different positions with respect to the first direction.

Claims

1. first illumination optical system; A first spatial light modulator illuminated by light from the first illumination optical system, A first projection optical system that illuminates a target with light from the first spatial light modulator, and A stage including an upper surface configured to support the target, and configured to move in a first direction, The first illumination optical system is, First lens, and, Includes a first optical member that guides the light that has passed through the first lens to the first spatial light modulator, The first lens is located below the first spatial light modulator. In a plan view, the first lens and the first spatial light modulator are positioned at different locations with respect to the first direction. Exposure apparatus.

2. The first lens is configured to guide incident light in a direction intersecting the upper surface. The exposure apparatus according to claim 1.

3. During the period in which the first projection optical system illuminates the target, the stage is configured to move in a first direction relative to the first projection optical system. The exposure apparatus according to claim 1.

4. The first spatial light modulator includes a plurality of first elements, each of which can take on multiple states. The angle of incidence of the light incident on the first spatial light modulator with respect to the plane on which the plurality of first elements are arranged is set such that light from the element in the first state among the plurality of first elements is guided to the target via the first projection optical system. The exposure apparatus according to claim 1.

5. Light from the element in the second state among the plurality of first elements is directed to an area other than the first projection optical system. The exposure apparatus according to claim 4.

6. The first spatial light modulator includes a plurality of first mirrors, each of which can take on multiple states. Each of the aforementioned plurality of mirrors is configured to be inclined with respect to the surface on which the plurality of mirrors are arranged. The exposure apparatus according to claim 1.

7. The first spatial light modulator includes a plurality of first elements, each of which can take on multiple states. When the first pattern is exposed, the inclination angle of the surface on which the plurality of first elements are arranged with respect to a plane perpendicular to the optical axis of the first projection optical system is different from the inclination angle of the surface on which the plurality of first elements are arranged with respect to the plane perpendicular to the optical axis of the first projection optical system when a second pattern different from the first pattern is exposed. The exposure apparatus according to claim 1.

8. The first spatial light modulator includes a plurality of first elements, each of which can take on multiple states. Including a first optical measuring unit or a second optical measuring unit, The first optical measuring unit is configured to observe the defocused image of light from the first projection optical system. The second optical measuring unit is configured to observe an image of the pupil position of the first projection optical system, and the inclination angle of the plane on which the plurality of first elements are arranged with respect to a plane perpendicular to the optical axis of the first projection optical system is set based on the defocused image observed by the first optical measuring unit or the image observed by the second optical measuring unit. The exposure apparatus according to claim 1.

9. In a plan view, the first projection optical system and the first illumination optical system are located at different positions with respect to the first direction. The exposure apparatus according to claim 1.

10. first illumination optical system; A first spatial light modulator illuminated by light from the first illumination optical system, A first projection optical system that illuminates a target with light from the first spatial light modulator, a second illumination optical system; A second spatial light modulator illuminated by light from the second illumination optical system, A second projection optical system that illuminates the target with light from the second spatial light modulator, and A stage including an upper surface configured to support the target, and configured to move in a first direction, The first illumination optical system is, A first lens located below the first spatial light modulator, and Includes a first optical member that guides light that has passed through the first lens to the first spatial light modulator, The second illumination optical system described above is: A second lens located below the second spatial light modulator, and Includes a second optical member that guides the light that has passed through the second lens to the second spatial light modulator, The first illumination optical system and the second illumination optical system are aligned in a second direction intersecting the first direction. The first spatial light modulator and the second spatial light modulator are arranged in the second direction, The first projection optical system and the second projection optical system are aligned in the second direction. In a plan view, the first and second lenses and the first and second spatial light modulators are located at different positions with respect to the first direction. Exposure apparatus.

11. The first spatial light modulator includes a plurality of first elements that can take on a plurality of states, The second spatial light modulator includes a plurality of second elements that can take on multiple states, Light from the element in the first state among the plurality of first elements is incident on the first projection optical system. Light from the element in the first state among the plurality of second elements is incident on the second projection optical system. The tilt angle of the element in the first state of the plurality of first elements is different from the tilt angle of the element in the first state of the plurality of second elements. In order to reduce the influence of the difference between the tilt angle of the elements in the first state of the plurality of first elements and the tilt angle of the elements in the first state of the plurality of second elements, the tilt angle of the plane on which the plurality of first elements are arranged with respect to a plane perpendicular to the optical axis of the first projection optical system is set to be different from the tilt angle of the plane on which the plurality of second elements are arranged with respect to a plane perpendicular to the optical axis of the second projection optical system. The exposure apparatus according to claim 10.

12. The first lens is configured to guide incident light in a direction intersecting the upper surface. The exposure apparatus according to claim 10.

13. During the period in which the first projection optical system illuminates the target, the stage is configured to move in a first direction relative to the first projection optical system. The exposure apparatus according to claim 10.

14. The first spatial light modulator includes a plurality of first mirrors that take on a plurality of states, Each of the aforementioned plurality of mirrors is configured to be inclined with respect to the surface on which the plurality of mirrors are arranged. The exposure apparatus according to claim 10.

15. In a plan view, the first projection optical system and the first illumination optical system are located at different positions with respect to the first direction. The exposure apparatus according to claim 10.

16. A stage configured to support a target, including a top surface, and configured to move in a first direction, Multiple first illumination optical systems arranged in a second direction intersecting the first direction, A plurality of first spatial light modulators, arranged in the second direction and each illuminated by light from the corresponding first illumination optical system, A plurality of first projection optical systems, arranged in the second direction, each illuminating the target with light from a corresponding first spatial light modulator, Multiple second illumination optical systems arranged in the second direction, A plurality of second spatial light modulators, arranged in the second direction and each illuminated by light from the corresponding second illumination optical system, A plurality of second projection optical systems, arranged in the second direction, each illuminating the target with light from the corresponding second spatial light modulator, Each of the aforementioned plurality of first illumination optical systems is A first lens located below the corresponding first spatial light modulator, and Includes a first optical member that guides the light that has passed through the first lens to the corresponding first spatial light modulator, Each of the aforementioned plurality of second illumination optical systems is A second lens located below the corresponding second spatial light modulator, and Includes a second optical member that guides the light that has passed through the second lens to the corresponding second spatial light modulator, In a plan view, the first and second lenses and the first and second spatial light modulators are located at different positions with respect to the first direction. Exposure apparatus.

17. In a plan view, the plurality of first spatial light modulators and the plurality of second spatial light modulators are located between the first lens and the second lens with respect to the first direction. The exposure apparatus according to claim 16.

18. The first lens is configured to guide incident light in a direction intersecting the upper surface. The exposure apparatus according to claim 16.

19. During the period in which the plurality of first projection optical systems illuminate the target, the stage is configured to move in a first direction relative to the plurality of first projection optical systems. The exposure apparatus according to claim 16.

20. The first spatial light modulator includes a plurality of first mirrors that take on a plurality of states, Each of the aforementioned plurality of mirrors is configured to be inclined with respect to the surface on which the plurality of mirrors are arranged. The exposure apparatus according to claim 16.

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