Photosensitive resin composition and method for manufacturing a circuit board using the same
The photosensitive resin composition, incorporating a resin with phenolic hydroxyl groups and a compound with a methylol or alkoxyalkyl group, addresses the challenge of high-resolution pattern formation in circuit boards by enhancing insolubility and sensitivity, resulting in improved heat and chemical resistance.
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- RESONAC CORP
- Filing Date
- 2024-12-20
- Publication Date
- 2026-07-02
AI Technical Summary
Photosensitive resin compositions face challenges in achieving high resolution for forming fine resin patterns in semiconductor devices and printed circuit boards, necessitating improved sensitivity and pattern formation capabilities.
A photosensitive resin composition comprising a resin with a phenolic hydroxyl group, a compound with a methylol or alkoxyalkyl group, and a photoacid generator, where the compound includes a specific group represented by formula (b1), enhancing the insolubility of unexposed areas and improving resolution through a crosslinking reaction.
The composition enables the formation of resin patterns with high resolution and improved heat resistance, chemical resistance, and sensitivity, facilitating the manufacturing of circuit boards with precise conductive patterns.
Smart Images

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