Plasma generator using a freely expandable resonant waveguide

Abstract

The plasma generator using a resonant waveguide of the present invention may include a ring-shaped or elliptical central waveguide having a plurality of slots on its inner surface, an electromagnetic wave transmission means for transmitting electromagnetic waves to the central waveguide, an electromagnetic wave supply unit for transmitting electromagnetic waves to the electromagnetic wave transmission means, and a plasma chamber located on the outlet side of the slots so as to seal the inside of the central waveguide, and having an electromagnetic wave incidence window formed therein so as to allow electromagnetic waves flowing in through the slots to be radiated to the outside.

Description

Technical Field

[0001] The present invention relates to a plasma generator using a resonant waveguide, and more particularly to a plasma generator using a resonant waveguide whose length and width can be freely expanded.

Background Art

[0002] Generally, for a large-area base material, especially in the plasma treatment of a flexible OLED thin film process or a functional fabric, it is extremely efficient to use the Roll-to-roll method.

[0003] In such a Roll-to-roll method, since the treatment is performed by scanning from one end to the other end of the base material, a plasma source of a size that can cover the entire base material is required. However, in the case of a microwave plasma source according to the prior art, its length or diameter is limited to around the microwave wavelength size, and there is a limit to treating a base material larger than a certain size.

[0004] In order to solve this problem, a plasma source using an electromagnetic wave formed in an elliptical shape with a long track in one direction is manufactured and used for plasma treatment of a large-area workpiece. However, it is difficult to apply power for uniformly generating plasma in the length direction of the long track shape. As a result, there is a problem that it is difficult to generate a uniform large-area plasma.

[0005] On the other hand, the plasma source using the electromagnetic wave formed in the elliptical shape of the track shape includes a dielectric material electromagnetic wave incident window for incidenting the electromagnetic wave into the plasma chamber and a permanent magnet facing the electromagnetic wave incident window to confine the plasma and form an ECR plasma. The electromagnetic wave is incident into the interior of the plasma chamber through the electromagnetic wave incident window to generate an ECR plasma in the plasma chamber.

[0006] However, the ECR resonance (Electron Cyclotron Resonance) location, i.e., the ECR plasma, is extremely close to the electromagnetic wave incidence window. As a result, high-energy electrons near the ECR resonance region frequently collide with the electromagnetic wave incidence window, which damages the electromagnetic wave incidence window and impairs the durability of the plasma source.

[0007] On the other hand, the plasma source utilizing electromagnetic waves formed in the elliptical shape of the track has a limited track length. This is because, in order to increase the track length, the electromagnetic wave incidence window must also be increased, but it is difficult to manufacture the electromagnetic wave incidence window to a length of, for example, 2m or more, and if it is manufactured to a length of that length, there is a problem of reduced durability. [Overview of the project] [Problems that the invention aims to solve]

[0008] Therefore, the problem that the present invention aims to solve is to provide a plasma generator using a resonant waveguide that not only prevents damage to the electromagnetic wave incidence window but also allows for free expansion in the longitudinal and width directions of the track. [Means for solving the problem]

[0009] A plasma generator using a resonant waveguide according to one embodiment of the present invention is characterized by comprising: a ring-shaped, elliptical, or rectangular central waveguide having a plurality of slots on its inner surface; an electromagnetic wave transmission means for transmitting electromagnetic waves to the central waveguide; an electromagnetic wave supply unit for transmitting electromagnetic waves to the electromagnetic wave transmission means; and a plasma chamber having an electromagnetic wave incidence window located on the outlet side of the slots so as to seal the inside of the central waveguide, and from which electromagnetic waves flowing in through the slots can be radiated to the outside.

[0010] In one embodiment, the electromagnetic wave transmission means may be a tuner provided on one side of the central waveguide that transmits electromagnetic waves from the electromagnetic wave supply unit into the central waveguide.

[0011] In one embodiment, a transfer waveguide is provided between the central waveguide and the tuner, with both ends directly connected to the central waveguide and the tuner, respectively, so that electromagnetic waves from the electromagnetic wave supply unit can be transmitted to the central waveguide via the transfer waveguide.

[0012] In one embodiment, the waveguide of the electromagnetic wave supply unit is arranged to be tangent to one side of the central waveguide, and the electromagnetic wave transmission means may be a rod-shaped conductor that penetrates the central waveguide and the waveguide of the electromagnetic wave supply unit perpendicular to the tangent.

[0013] In one embodiment, the electromagnetic wave transmission means may be a first incident waveguide tangentially connected to the central waveguide so that electromagnetic waves can pass through it.

[0014] In one embodiment, a second incident waveguide may be included that is tangentially connected to the first incident waveguide at a point symmetric to the center of the central waveguide, allowing electromagnetic waves to pass through.

[0015] In one embodiment, the central waveguide, when viewed in a plan view, JPEG2026512728000002.jpg815 A first side-section waveguide that is U-shaped or "C"-shaped, has flanges at both ends, and is connected to the electromagnetic wave transmission means; a first block-shaped waveguide that is linear, has flanges at both ends, and one end is flange-coupled to one end of the first side-section waveguide; a second block-shaped waveguide that is linear, has flanges at both ends, and one end is flange-coupled to the other end of the first side-section waveguide; and JPEG2026512728000003.jpg815 It may include a second side waveguide that is U-shaped or "C"-shaped, has flanges at both ends, and is connected to the second incident waveguide which is connected to the other end of the first block-shaped waveguide and the other end of the second block-shaped waveguide;

[0016] In one embodiment, the first block-type waveguide and the second block-type waveguide may be configured by connecting two or more linear subblock-type waveguides, each having flanges at both ends, in series.

[0017] In one embodiment, the first side waveguide is JPEG2026512728000004.jpg815 It is U-shaped, and the first side waveguide is JPEG2026512728000005.jpg912 The first side portion is U-shaped, has flanges at both ends, and one end is flange-coupled to the first block-shaped waveguide. JPEG2026512728000006.jpg912 U-shaped waveguide; linear, having flanges at both ends, one end being the first side portion JPEG2026512728000007.jpg912 A first side section block-type waveguide flange-coupled to the other end of a U-shaped waveguide; and JPEG2026512728000008.jpg912 The first side section second is L-shaped, having flanges at both ends, one end of which is flange-coupled to the other end of the first side section block-shaped waveguide, and the other end of which is flange-coupled to the second side section second. JPEG2026512728000009.jpg912 It may include a U-shaped waveguide.

[0018] In one embodiment, the second side waveguide is JPEG2026512728000010.jpg815 It is letter-shaped, and the second side waveguide is JPEG2026512728000011.jpg912 The second side portion is L-shaped, has flanges at both ends, and one end is flange-coupled to the second block-shaped waveguide. JPEG2026512728000012.jpg912 Word-shaped waveguide; linear, having flanges at both ends, one end being the first of the second side surfaces JPEG2026512728000013.jpg912 A second side surface block-shaped waveguide flange-coupled to the other end of the word-shaped waveguide; and JPEG2026512728000014.jpg912 Word-shaped, having flanges at both ends, one end being flange-coupled to the other end of the first side surface block-shaped waveguide, and the other end being flange-coupled to the first block-shaped waveguide, the second of the second side surfaces JPEG2026512728000015.jpg912 May include a word-shaped waveguide.

[0019] <00并将其替换为中文:字状导波管; 呈线性,两端具有法兰,一端为第二侧面部分的第一部分 JPEG2026512728000013.jpg912 与字状导波管的另一端法兰连接的第二侧面块状导波管; 以及 JPEG2026512728000014.jpg912 呈字状,两端具有法兰,一端与第一侧面块状导波管的另一端法兰连接,另一端与第一块状导波管法兰连接,第二侧面部分的第二部分 JPEG2026512728000015.jpg912 可以包括字状导波管。

[0019] 在一个实施方式中,电磁波传输手段是在中心导波管上与电磁波能够通过的方式切线连接的第一入射导波管,第一入射导波管在第一侧面部分的第一部分 JPEG2026512728000016.jpg912 字状导波管中可以与第一块状导波管平行连接。

[0020] 在一个实施方式中,对于第一入射导波管,在中心导波管的中心点对称位置处,与中心导波管以电磁波能够通过的方式切线连接的第二入射导波管,第二入射导波管在第二侧面部分的第二部分 JPEG2026512728000017.jpg912 字状导波管中可以与第二块状导波管平行连接。

[0021] 在一个实施方式中,电磁波传输手段是设置在中心导波管的一侧,将电磁波供给部产生的电磁波传输到中心导波管内的调谐器,或者电磁波供给部的导波管以切线方式配置在中心导波管的一侧,电磁波传输手段是在与切线垂直的方向上贯通中心导波管和电磁波供给部的导波管的棒状导体,调谐器或者导体可以与第一侧面块状导波管连接。 请注意,原始文本中存在一些格式和表述不太清晰准确的地方,翻译时尽量按照原文的结构和内容进行了翻译,可能在实际理解上还需要结合相关技术背景进一步梳理。

[0022] In one embodiment, the first side-block type waveguide and the second side-block type waveguide may be constructed by connecting two or more linear sub-block type waveguides having flanges at both ends in series.

[0023] In one embodiment, the slots are vertically oriented slots located between the inner surface of the central waveguide and the electromagnetic wave incidence window, and include a magnet unit positioned between the slots, the electromagnetic wave incidence window may be provided to seal the gap formed by the magnet unit.

[0024] In one embodiment, the magnet units may be arranged in pairs vertically parallel to the slot direction, and the pair of magnets may be arranged to form a magnetic field parallel to the slot direction.

[0025] In one embodiment, the magnet units may be arranged in pairs on the left and right sides perpendicular to the slot direction, so that the pair of magnets form a magnetic field perpendicular to the slot direction.

[0026] In one embodiment, the electromagnetic wave incidence window may include a plurality of sub-electromagnetic wave incidence windows configured to seal one of the slots, or to seal one of the slots and an adjacent slot.

[0027] In one embodiment, the flange is not formed on the inside of the central waveguide, but is formed on the upper, lower and outer sides of the waveguide, with a vertical cross-section JPEG2026512728000018.jpg815 It can be letter-shaped.

[0028] In one embodiment, the first incident waveguide has the first side portion JPEG2026512728000019.jpg912 At the apex of the U-shaped waveguide, electromagnetic waves can be connected parallel to the first block-shaped waveguide so as to be able to pass through.

[0029] In one embodiment, the second incident waveguide has a second side portion first JPEG2026512728000020.jpg912 At the apex of the U-shaped waveguide, electromagnetic waves can be connected parallel to the second block-shaped waveguide so as to be able to pass through.

[0030] In one embodiment, the waveguide is a TE mode right-angle waveguide, and the slit may be formed on the inner surface of the straight right-angle waveguide, perpendicular to the direction of propagation and standing upright.

[0031] In one embodiment, the central waveguide may include a tuner on the opposing surface facing the slot.

[0032] Another embodiment of the present invention provides a plasma generator using a resonant waveguide, characterized in that the flange of the subblock-type waveguide is located at the slot position.

[0033] In one embodiment, the flange on the opposing surface of the subblock waveguide facing the slot may be partially extended in the direction of the inner slot of the subblock waveguide. [Effects of the Invention]

[0034] The plasma generation device using a resonant waveguide according to the present invention has the advantage of preventing damage to the electromagnetic wave incidence window by the plasma, and also allows for free expansion in the length and width directions of the track. [Brief explanation of the drawing]

[0035] [Figure 1] This is a diagram illustrating a plasma generator using a resonant waveguide according to one embodiment of the present invention. [Figure 2] This figure illustrates another embodiment of the electromagnetic wave transmission means shown in Figure 1. [Figure 3] This figure illustrates yet another embodiment of the electromagnetic wave transmission means shown in Figure 1. [Figure 4]This figure shows the state of the yoke as shown in Figure 1. [Figure 5] Figure 1 is a cross-sectional view showing the cross-sectional state and the magnetic field formation state. [Figure 6] This figure shows a plasma generator using a resonant waveguide according to one embodiment of the present invention, in a state where it has been expanded in the width direction. [Figure 7] This figure shows the results of a three-dimensional magnetic field simulation regarding the arrangement of magnet units in a plasma generator using a resonant waveguide according to one embodiment of the present invention. [Figure 8] This figure shows the formation state of 875G contour lines at the center of a pair of magnet units spaced apart in the direction of the slits relative to the arrangement of the magnet units, and the formation state of 875G contour lines between the slits. [Figure 9] This figure shows the radial profiles of the magnetic field at the slit position and the positions of the upper and lower pair of magnetic units relative to the arrangement of the magnetic units. [Figure 10] This figure illustrates a plasma generation device using a resonant waveguide according to another embodiment of the present invention. [Figure 11] This figure illustrates a plasma generation device using a resonant waveguide according to yet another embodiment of the present invention. [Figure 12] This is a magnified perspective view of the flange shown in Figure 11. [Figure 13] This figure shows the electric field distribution state within the central waveguide and the electric field strength adjustment state at the slit, as indicated by a flange in the subblock type waveguide that is partially extended in the direction of the slit. [Modes for carrying out the invention]

[0036] The plasma generator using a resonant waveguide according to embodiments of the present invention will be described in detail below with reference to the attached drawings. The present invention can be modified in various ways and may take many forms, with specific embodiments illustrated in the drawings and described in detail in the text. However, this should be understood not as an attempt to limit the present invention to any particular disclosure, but rather as including all modifications, equivalents, or substitutes that fall within the spirit and technical scope of the present invention. In describing each drawing, similar reference numerals are used for similar components. In the attached drawings, the dimensions of structures are shown enlarged for clarity of the present invention.

[0037] Terms such as "first," "second," etc., can be used to describe various components, but the components are not limited by such terms. The terms are used solely for the purpose of distinguishing one component from another. For example, within the scope of the rights of the present invention, the first component may be named as the second component, and similarly, the second component may be named as the first component.

[0038] The terms used in this application are used solely to describe specific embodiments and are not intended to limit the invention. Singular expressions include plural expressions unless the context clearly indicates otherwise. In this application, terms such as “includes” or “having” are intended to specify the existence of features, steps, operations, components, parts, or combinations thereof as described in the specification, and should be understood not to preemptively exclude the existence or possibility of adding one or more other features, steps, operations, components, parts, or combinations thereof.

[0039] Unless otherwise defined, all terms used herein, including technical or scientific terms, have the same meaning as generally understood by a person of ordinary skill in the art to which this invention pertains. Terms as defined in commonly used dictionaries should be interpreted to have the meaning consistent with their meaning in the context of the relevant art, and not to be interpreted in an ideal or overly formal sense unless expressly defined herein.

[0040] Figure 1 is a diagram illustrating a plasma generator using a resonant waveguide according to one embodiment of the present invention; Figure 2 is a diagram illustrating another embodiment of the electromagnetic wave transmission means shown in Figure 1; Figure 3 is a diagram illustrating yet another embodiment of the electromagnetic wave transmission means shown in Figure 1; Figure 4 is a diagram showing the state of the yoke shown in Figure 1; Figure 5 is a cross-sectional view showing the cross-sectional state and magnetic field formation state of Figure 1; and Figure 6 is a diagram showing the plasma generator using a resonant waveguide according to one embodiment of the present invention in an expanded state in the width direction.

[0041] Referring to Figures 1 to 3, a plasma generation device using a resonant waveguide according to one embodiment of the present invention includes a central waveguide 100, an electromagnetic wave transmission means 200, an electromagnetic wave supply unit 300, and a plasma chamber 400.

[0042] The central waveguide 100 is provided in an annular or elliptical shape and is arranged in a track configuration that can transmit electromagnetic waves in a clockwise or counterclockwise direction.

[0043] Electromagnetic waves transmitted in a clockwise or counterclockwise direction in the central waveguide 100 can be radiated. For this purpose, the central waveguide 100 includes a plurality of slits 100a on its inner surface, through which electromagnetic waves can be radiated. The slits 100a are formed upright.

[0044] In one embodiment, the central waveguide 100 may be a right-angle waveguide. That is, the central waveguide 100 is a TE-mode right-angle waveguide, and the slit 100a may be formed on the inner surface of the right-angle waveguide, perpendicular to the direction of propagation of the electromagnetic wave.

[0045] The electromagnetic wave transmission means 200 transmits electromagnetic waves to the central waveguide 100, and the electromagnetic wave supply unit 300 transmits electromagnetic waves to the electromagnetic wave transmission means 200.

[0046] The electromagnetic wave supply unit 300 may be a magnetron (not shown) and a waveguide 310 that transmits electromagnetic waves emitted from the magnetron.

[0047] In one embodiment, the electromagnetic wave transmission means 200 may include a first incident waveguide 241 and a second incident waveguide 242.

[0048] The first incident waveguide 241 is tangentially connected to the central waveguide 100 so that electromagnetic waves can pass through it, allowing electromagnetic waves to be incident into the central waveguide 100. Electromagnetic waves incident through the first incident waveguide 241 can be transmitted in a clockwise direction inside the central waveguide 100.

[0049] The second incident waveguide 242 is tangentially connected to the central waveguide 100 so that electromagnetic waves can pass through it, allowing electromagnetic waves to be incident into the interior of the central waveguide 100. The second incident waveguide 242 may be tangentially connected to the central waveguide 100 so that electromagnetic waves can pass through it, at a point symmetric to the central point of the first incident waveguide 241, and may be positioned diagonally opposite to the first incident waveguide 241.

[0050] Electromagnetic waves incident through the second incident waveguide 242 can be transmitted clockwise inside the central waveguide 100, and the frequency of the electromagnetic waves incident through the second incident waveguide 242 may be the same as the frequency of the electromagnetic waves incident through the first incident waveguide 241. Furthermore, electromagnetic waves incident through the second incident waveguide 242 can merge with and propagate together with electromagnetic waves incident and transmitted from the first incident waveguide 241. Therefore, even if the power of the electromagnetic waves incident and transmitted from the first incident waveguide 241 gradually decreases, the power of the electromagnetic waves throughout the entire section inside the central waveguide 100 can be uniformly maintained by the additional electromagnetic waves incident from the second incident waveguide 242 and transmitted in the same direction.

[0051] Referring to Figure 2, in another embodiment, the waveguide 310 of the electromagnetic wave supply unit 300 is arranged to be tangential to one side of the central waveguide 100, and the electromagnetic wave transmission means 200 may be a rod-shaped conductor 210 that penetrates the central waveguide 100 and the waveguide 310 of the electromagnetic wave supply unit 300 perpendicular to the tangency.

[0052] Referring to Figure 3, in another embodiment, the electromagnetic wave transmission means 200 may be a first tuner 220 provided on one side of the central waveguide 100, which transmits the electromagnetic waves from the electromagnetic wave supply unit 300 into the central waveguide 100. The first tuner 220 adjusts the intensity of the incident and reflected waves of the electromagnetic waves transmitted from the electromagnetic wave supply unit 300 to induce impedance matching, thereby controlling the electric field induced by the electromagnetic waves to be maximized within the plasma chamber 400.

[0053] Referring to Figure 3, in another embodiment, the electromagnetic wave transmission means 200 may further include a transmission waveguide 230 between the first tuner 220 and the central waveguide 100, with both ends directly connected to the central waveguide 100 and the first tuner 220, respectively. Electromagnetic waves from the electromagnetic wave supply unit 300 can be transmitted to the central waveguide 100 via the transmission waveguide 230.

[0054] In such cases, sufficient power can be applied as the length or size of the track-shaped plasma generator increases. That is, compared to the case of the rod-shaped conductor 210, in a structure in which electromagnetic waves are transmitted directly to the central waveguide 100 via the transmission waveguide 230, the high power output required for a track-shaped plasma generator can be easily transmitted.

[0055] The plasma chamber 400 is positioned along the inner periphery of the central waveguide 100 and is located inside the central waveguide 100, allowing electromagnetic waves to be incident into it from the central waveguide 100. For example, the plasma chamber 400 may be provided in an annular or elliptical shape.

[0056] For the incidence of electromagnetic waves into the plasma chamber 400, the plasma chamber 400 may have an electromagnetic wave incidence window 410. The electromagnetic wave incidence window 410 is positioned opposite a plurality of slits 100a of the central waveguide 100. That is, the electromagnetic wave incidence window 410 is positioned on the exit side of the plurality of slits 100a so as to be sealed to the inside of the central waveguide 100, and may be configured so that electromagnetic waves flowing in through the plurality of slits 100a are radiated to the outside of the plurality of slits 100a, i.e., into the plasma chamber 400.

[0057] On the other hand, a plasma generator using a resonant waveguide according to one embodiment of the present invention may further include a magnet unit 500.

[0058] The magnet unit 500 represents a permanent magnet and can form a magnetic field in the direction inward of the plasma chamber 400. The magnet unit 500 is located between the inner surface of the central waveguide 100 and the electromagnetic wave incidence window 410, and is positioned between the slits 100a. In other words, the magnet unit 500 is arranged between the plasma chamber 400 and the inner surface of the central waveguide 100, along the direction of electromagnetic wave circulation of the central waveguide 100. At this time, the electromagnetic wave incidence window 410 is provided to seal the gap formed by the magnet unit 500. That is, it is provided to seal the gap between the magnet units 500 facing the slits 100a. Such magnet unit 500 plays a role in electron confinement, preventing electrons from escaping within the plasma chamber 400.

[0059] As shown in Figure 5, the magnet unit 500 is arranged vertically parallel to the direction of the slit 100a so as to form a toroidal magnetic field in the central waveguide 100, and the magnetization direction of the pair of magnet units can be parallel to the direction of the slit 100a. This magnetization direction structure of the pair of magnet units 500 allows the magnetic field direction inside the plasma chamber 400 to be formed parallel to the direction of the slit 100a.

[0060] The magnet unit 500 can be fixed by a yoke 600. The yoke 600 can be fixed between the central waveguide 100 and the electromagnetic wave incidence window 410 such that the magnetization direction of the pair of magnet units 500 is parallel to the direction of the slit 100a. Referring to Figure 4, the yoke 600 may be formed to have a pair of magnet placement grooves 601 arranged at a certain distance apart above and below its body, and may be configured to house each of the pair of magnet placement grooves 601, each of the pair of magnet units 500. Such a yoke 600 may be made of iron and can act as a magnetic field yoke, restricting the magnetic field lines from the pair of magnet units 500 to the inside of the yoke 600 and playing a role in forming a larger magnetic field inside the plasma chamber 400.

[0061] In one embodiment, the horizontal width of the first surface 602 of the yoke 600 may correspond to the width between the slits 100a, the width of the second surface 603, which is the opposite surface of the first surface 602, may be formed to be narrower than the width of the first surface 602, and at least one of the left and right sides 604 of the yoke 600 connecting the first surface 602 and the second surface 603 may be tapered. For example, a yoke 600 positioned between the slits 100a may have tapered left and right sides 604, and a yoke 600 positioned in the direction of the slits 100a at both ends of the arrangement of slits 100a may have one of the left and right sides 604 tapered. In such a yoke 600 structure, the pair of magnet placement grooves 601 may be recessed from the first surface 602, the first surface 602 may be in close contact with the inner surface of the central waveguide 100, and the second surface 603 may be in close contact with the electromagnetic wave incident window 410. With this shape and arrangement of the yokes 600, the spacing between the yokes 600s faces the slits 100a, forming a path that guides the electromagnetic waves radiated from the slits 100a toward the electromagnetic wave incidence window 410.

[0062] The aforementioned path forms a path through which electromagnetic waves transmitted from the slit 100a are transmitted between two adjacent magnet units 500 with the slit 100a in between. The path is formed such that the tapered sides 604 of each yoke 600 face each other, and the horizontal cross-section of the path is formed in a trapezoidal shape with a narrow entrance and an expanded exit shape. As a result, the path allows electromagnetic waves from the slit 100a to expand as they pass through the path and be incident on the inside of the central waveguide 100.

[0063] Although not shown in the diagram, the yoke 600 can be fixed between the central waveguide 100 and the electromagnetic wave incidence window 410 via an upper fixing plate (not shown) covering its upper part and a lower fixing plate (not shown) covering its lower part. For example, the upper fixing plate and the lower fixing plate can be fixed to the upper and lower parts of the yoke 600 by screw connections.

[0064] On the other hand, a plasma generator using a resonant waveguide according to one embodiment of the present invention may be configured to allow extension in the longitudinal direction of the central waveguide 100 by utilizing a number of block-shaped waveguides.

[0065] In one embodiment, for longitudinal extension of the central waveguide 100, the central waveguide 100 may include a first side waveguide 110, a first block-shaped waveguide 120, a second block-shaped waveguide 130, and a second side waveguide 140.

[0066] The first side waveguide 110 is JPEG2026512728000021.jpg815 It is letter-shaped or "C"-shaped and has flanges at both ends.

[0067] As an example, the first side waveguide 110 is JPEG2026512728000022.jpg815 It may be letter-shaped, and the first side part JPEG2026512728000023.jpg912 L-shaped waveguide 111, first side section block-shaped waveguide 112, first side section second JPEG2026512728000024.jpg912 It may include a U-shaped waveguide 113.

[0068] 1st side part 1 JPEG2026512728000025.jpg912 The U-shaped waveguide 111 is a right-angle waveguide, and JPEG2026512728000026.jpg912 It is U-shaped and has first flanges 111a at both ends, one end of which can be flange-coupled to the first block-shaped waveguide 120. Here, flange coupling means coupling of flanges.

[0069] The first side section block-shaped waveguide 112 is a right-angle waveguide and linear, having second flanges 112a at both ends, one end of which is the first side section JPEG2026512728000027.jpg912 The other end of the U-shaped waveguide 111, that is, the end that is not flange-coupled to the first block-shaped waveguide 120, can be flange-coupled.

[0070] 1st side part 2nd JPEG2026512728000028.jpg912 The U-shaped waveguide 113 is a right-angle waveguide, and JPEG2026512728000029.jpg912 It is U-shaped and has third flanges 113a at both ends, one end of which can be flange-coupled to the other end of the first side section block-shaped waveguide 112, and the other end of which can be flange-coupled to the second block-shaped waveguide 130.

[0071] The first block-shaped waveguide 120 is linear and has flanges at both ends, one end of which can be flange-coupled to one end of the first side-section waveguide 110.

[0072] For example, the first block-type waveguide 120 may be constructed by connecting two or more first sub-block-type waveguides 121 in series, each of which is a right-angle waveguide, linear, and has fourth flanges 121a at both ends. For example, a slit 100a may be formed upright in the center of the inner surface of each first sub-block-type waveguide 121.

[0073] The second block-type waveguide 130 is linear and has flanges at both ends, with one end being flange-coupled to the other end of the first side-section waveguide 110.

[0074] For example, the second block-type waveguide 130 may be constructed by connecting two or more second sub-block-type waveguides 131 in series, each of which is a right-angle waveguide, linear, and has fifth flanges 131a at both ends. For example, a slit 100a may be formed upright in the center of the inner surface of each second sub-block-type waveguide 131.

[0075] The second side waveguide 140 is positioned on the opposite side of the first side waveguide 110, with reference to the first block-shaped waveguide 120 and the second block-shaped waveguide 130. JPEG2026512728000030.jpg815 It is U-shaped or "C"-shaped, has flanges at both ends, and is connected to the other end of the first block-shaped waveguide 120 and the other end of the second block-shaped waveguide 130.

[0076] The second side waveguide 140 is JPEG2026512728000031.jpg815 It may be letter-shaped, and the second side part first JPEG2026512728000032.jpg912 U-shaped waveguide 141, second side section block-shaped waveguide 142, second side section JPEG2026512728000033.jpg912 It may include a U-shaped waveguide 143.

[0077] 2nd side part 1st JPEG2026512728000034.jpg912 The U-shaped waveguide 141 is a right-angle waveguide, and JPEG2026512728000035.jpg912 It is U-shaped and has a sixth flange 141a at both ends, one end of which can be flange-coupled to the second block-shaped waveguide 130.

[0078] The second side section block-shaped waveguide 142 is a right-angle waveguide and linear, having seventh flanges 142a at both ends, one end of which is the second side section first JPEG2026512728000036.jpg912 The other end of the U-shaped waveguide 141 can be flange-coupled.

[0079] 2nd side part 2nd JPEG2026512728000037.jpg912 The U-shaped waveguide 143 is a right-angle waveguide, and JPEG2026512728000038.jpg912 It is U-shaped and has eighth flanges 143a at both ends, one end of which can be flange-coupled to the other end of the first side section block-shaped waveguide 112, and the other end of which can be flange-coupled to the first block-shaped waveguide 120.

[0080] In such a central waveguide 100 structure, each flange 111a, 112a, 113a, 121a, 131a, 141a, 143a, 142a is not formed inside the central waveguide 100, but can be formed above, below, and outside each of the waveguides 110, 120, 130, 140. For example, the flanges 111a, 112a, 113a, 121a, 131a, 141a, 143a, 142a have a vertical cross-section JPEG2026512728000039.jpg815 It can be letter-shaped.

[0081] Furthermore, in such a central waveguide structure 100, to extend the central waveguide 100 in the longitudinal direction, the first sub-block waveguide 121 of the first block waveguide 120 and the second sub-block waveguide 131 of the second block waveguide 130 are increased to two or more and flange-coupled, thereby achieving extension of the central waveguide 100 in the longitudinal direction.

[0082] On the other hand, in a plasma generator using a resonant waveguide according to one embodiment of the present invention, the electromagnetic wave incidence window 410 is composed of a plurality of sub-electromagnetic wave incidence windows 411, corresponding to the extension of the central waveguide 100 in the longitudinal direction, and the plurality of sub-electromagnetic wave incidence windows 411 can be connected in series along the longitudinal direction of the first block-shaped waveguide 120 and the second block-shaped waveguide 130. In this case, each sub-electromagnetic wave incidence window 411 can be arranged to seal one slit 100a or to seal one slit 100a and its adjacent slits 100a.

[0083] Due to the structure of the electromagnetic wave incidence window 410, even when the central waveguide 100 is extended in the longitudinal direction, it is easy to manufacture the electromagnetic wave incidence window 410 to a length that is easy to process, and then connect them in series to position them at the extended length of the central waveguide 100. This ensures greater durability compared to when the window is manufactured to a length corresponding to the extended length of the central waveguide 100.

[0084] On the other hand, a plasma generator using a resonant waveguide according to one embodiment of the present invention may be configured to allow for expansion in the width direction of the central waveguide 100.

[0085] In one embodiment, for the widthwise extension of the central waveguide 100, the first side section block-type waveguide 112 may be constructed by connecting two or more third sub-block-type waveguides 1121 in series, each being a right-angle waveguide and linear, with second flanges 112a at both ends, and the second side section block-type waveguide 142 may be constructed by connecting two or more fourth sub-block-type waveguides 1421 in series, each being a right-angle waveguide and linear, with seventh flanges 142a at both ends.

[0086] In this structure of the central waveguide 100, the central waveguide 100 can be expanded in the width direction by increasing the number of third subblock type waveguides 1121 and fourth subblock type waveguides 1421 to two or more and connecting them with flanges.

[0087] On the other hand, the first side waveguide 110 of the central waveguide 100 is connected to the electromagnetic wave transmission means 200.

[0088] In one embodiment, when the electromagnetic wave transmission means 200 is the first tuner 220 or the rod-shaped conductor 210, the first side-section waveguide 110 may be connected to the first tuner 220 or the rod-shaped conductor 210, in which case the first tuner 220 or the rod-shaped conductor 210 may be connected to the first side-section block-shaped waveguide 112.

[0089] In another embodiment, when the electromagnetic wave transmission means 200 consists of the first incident waveguide 241 and the second incident waveguide 242, the first incident waveguide 241 may be tangentially connected to the first side waveguide 110 of the central waveguide 100 so that electromagnetic waves can pass through. In addition, the first incident waveguide 241 is connected to the first side waveguide 1 JPEG2026512728000040.jpg912 The U-shaped waveguide 111 can be connected in parallel to the first block-shaped waveguide 120. In this case, the first incident waveguide 241 is the first side portion JPEG2026512728000041.jpg912 The vertex of the U-shaped waveguide 111 can be connected to the first block-shaped waveguide 120 in a manner that allows electromagnetic waves to pass through parallel to it.

[0090] The second injector waveguide 242 has a second side section JPEG2026512728000042.jpg912 The U-shaped waveguide 143 can be connected in parallel to the second block-shaped waveguide 130. In this case, the second incident waveguide 242 has a second side section first JPEG2026512728000043.jpg912 The vertex of the U-shaped waveguide 141 can be connected to the second block-shaped waveguide 130 in a manner that allows electromagnetic waves to pass through parallel to it.

[0091] On the other hand, in a plasma generation device using a resonant waveguide according to one embodiment of the present invention, the first subblock type waveguide 121 and the second subblock type waveguide 131 may include a second tuner 151 that is inserted in the direction of the slit 100a and faces the slit 100a on the opposing surface facing the slit 100a formed on the inner surface of each.

[0092] As an example, the second tuner 151 may be a stub tuner and may be installed penetrating from the outside to the inside of the outer surfaces of the first subblock waveguide 121 and the second subblock waveguide 131. In this case, the second tuner 151 may have a fixed insertion length, or it may be configured such that the distance between the slits 100a can be adjusted by adjusting the inserted length. If the insertion length of the second tuner 151 is fixed, it may be installed so that the insertion lengths of the second tuner 151 differ in the direction of propagation of electromagnetic waves within the central waveguide 100, and the distance between each slit 100a and the second tuner 151 may differ along the direction of propagation of electromagnetic waves. For example, the second tuner 151 may be installed with a structure that allows the inserted length to be varied.

[0093] The following describes the electromagnetic wave incidence process and plasma formation process of a plasma generator using a resonant waveguide according to one embodiment of the present invention.

[0094] In order to form a plasma in the plasma chamber 400, electromagnetic waves are injected into the central waveguide 100 via the electromagnetic wave supply unit 300 and the electromagnetic wave transmission means 200.

[0095] Electromagnetic waves moving within the central waveguide 100, that is, within the track-shaped travel path, flow into a plurality of slits 100a arranged in the first linear right-angle waveguide 111 and the second linear right-angle waveguide 112, and are then radiated into the interior of the plasma chamber 400 through the electromagnetic wave incidence window 410 of the plasma chamber 400.

[0096] In this configuration, in the first side waveguide 110 and the second side waveguide 140, high-temperature electrons generated near the slit 100a rotate in the bending direction while drifting along the shape of the plasma chamber 400 due to the magnetic field, generating plasma while continuously rotating along the shape of the plasma chamber 400. As a result, the generated high-temperature electrons have a closed-circuit movement path and contribute to ionization throughout the plasma chamber 400. This structure confines the plasma in the magnetic field and creates a closed circuit, offering significant advantages not only in plasma density but also in plasma uniformity.

[0097] Figure 7 shows the results of a three-dimensional magnetic field simulation regarding the arrangement of magnet units in a plasma generator using a resonant waveguide according to one embodiment of the present invention, and Figure 8 shows the 875G contour line formation state at the center of a pair of magnet units spaced apart in the slit direction relative to the magnet unit arrangement, and the 875G contour line formation state between the slits.

[0098] Referring to Figure 7, as seen in the 875G contour state, which is the ECR resonance (Electron Cyclotron Resonance) region in (a), the contour lines show an uneven state due to the magnetic field gradient in the area where the magnet unit 500 is located and the slit 100a area, but it can be confirmed that the strength of the magnetic field formed inside the plasma chamber 400 is sufficient. In the contour state in (b), it can also be confirmed that the magnetic field strength and gradient that allows high-temperature electrons to rotate in the circumferential direction are effectively formed.

[0099] Furthermore, referring to Figure 8, in the embodiment, as shown in state (a), it can be confirmed that the contour lines formed between the pair of magnet units 500 penetrate deeply into the interior of the plasma chamber 400, and that the gradient of the magnetic field contour lines within the plasma chamber 400 is formed in a "D" shape (positive curvature). The formation of such contour lines allows high-temperature electrons to exhibit excellent properties in ensuring plasma uniformity through magnetic field curvature drift induction and diffusion.

[0100] Furthermore, as shown in state (b), the contour lines formed in the cross-section between slit 100a and slit 100a reflect the discontinuous arrangement of the magnet unit 500 due to the structure of slit 100a. In contrast, if the distance between a pair of magnet units 500 is increased and the magnet units are arranged continuously, the problem of discontinuous sections in the magnetic field contour lines occurring between slit 100a and slit 100a can be solved. However, because the distance between a pair of magnet units 500 is large, the magnetic field contour lines are formed adjacent to or in contact with the electromagnetic wave incidence window 410, which is expected to cause problems with the durability of the electromagnetic wave incidence window 410, such as etching and heat loss due to high-density plasma.

[0101] Figure 9 shows the radial profiles of the magnetic field at the slit position and the position of the upper and lower pair of magnetic units relative to the arrangement of the magnetic units.

[0102] Referring to Figure 9, as shown in (a), an ECR region was formed at a point 16.9 mm away from the electromagnetic wave incidence window 410 between two opposing magnet units 500, and as shown in (b), an ECR region was formed at a point 9.8 mm away from the electromagnetic wave incidence window 410 between two opposing slits 100a. At this time, the mirror ratio between the magnet units 500 was Bmax / Becr of 1.86, and the Bmax / Becr between the slits 100a was 1.22, confirming that a sufficient magnetic force for electron confinement was formed.

[0103] Therefore, the plasma generator using a resonant waveguide according to one embodiment of the present invention can maintain a large distance between the ECR plasma formed in the plasma chamber 400 and the electromagnetic wave incidence window 410 by the arrangement of the magnet unit 500, thereby effectively improving the prevention of damage to the electromagnetic wave incidence window 410 by the ECR plasma. This has the advantage of preventing damage to the electromagnetic wave incidence window 410 and further increasing the durability of the plasma generator.

[0104] On the other hand, in the plasma generator using a resonant waveguide according to one embodiment of the present invention, the power of the electromagnetic waves applied to the plasma chamber 130 via the second tuner 151 can be adjusted during the electromagnetic wave transmission process and the plasma generation process.

[0105] In other words, the second tuner 151 facing each slit 100a is positioned or varied so that the length of its insertion is at a spacing between the slits 100a that makes the power of the electromagnetic waves flowing into each slit 100a more uniform, thereby making the density of the plasma generated in the plasma chamber 130 more uniform or enabling the generation of a high-density plasma.

[0106] On the other hand, the plasma generation device using a resonant waveguide according to one embodiment of the present invention can be expanded in the longitudinal direction of the central waveguide 100 and in the width direction of the central waveguide 100.

[0107] In other words, by increasing the number of first subblock-type waveguides 121 and second subblock-type waveguides 131 and connecting them in series with each other, the lengths of the first block-type waveguides 120 and second block-type waveguides 130 are extended, thereby achieving an extension of the central waveguide 100 in the length direction. Similarly, by increasing the number of third subblock-type waveguides 1121 and fourth subblock-type waveguides 1421 and connecting them in series with each other, the lengths of the first side-section block-type waveguides 112 and second side-section block-type waveguides 142 are extended, thereby achieving an extension of the central waveguide 100 in the width direction.

[0108] Furthermore, when the number of first subblock-type waveguides 121 and second subblock-type waveguides 131 is increased and they are connected in series with each other, the number of sub-electromagnetic wave incidence windows 411 can also be increased in proportion to the number of waveguides and connected in series with each other.

[0109] Therefore, the plasma generator using a resonant waveguide according to one embodiment of the present invention can be freely expanded in both the length and width directions while freely increasing the number of block-shaped waveguides, making it extremely easy to generate a large-area plasma, and thus extremely easy to use as a large-area plasma source. In addition, the electromagnetic wave incidence window 410 can accommodate the expansion of the central waveguide 100 in the length direction by connecting a large number of sub-electromagnetic wave incidence windows 411 in series, so even if the central waveguide 100 is expanded in the length direction, the length of the electromagnetic wave incidence window 410 can be expanded while ensuring the durability of the electromagnetic wave incidence window 410.

[0110] Figure 10 is a diagram illustrating a plasma generation device using a resonant waveguide according to another embodiment of the present invention.

[0111] On the other hand, in a plasma generator using a resonant waveguide according to another embodiment of the present invention, as shown in Figure 10, the magnet units 500 may be arranged left and right perpendicular to the direction of the slit 100a. That is, the magnet units 500 may be arranged left and right within the yoke 600. In this case, the yoke 600 may be arranged such that adjacent magnet units 500 on either side of the slit 100a are positioned as opposing poles.

[0112] In this case, the magnetization direction of the pair of magnet units 500 is perpendicular to the direction of the slit 100a, and the magnetic field formed by the pair of magnet units 500 can be formed to cross the slit 100a.

[0113] A plasma generator using a resonant waveguide according to another embodiment of the present invention can also achieve similar effects and behaviors, such as the ECR plasma moving away from the electromagnetic wave incidence window 410.

[0114] Figure 11 is a diagram illustrating a plasma generator using a resonant waveguide according to another embodiment of the present invention, and Figure 12 is a perspective view showing an enlarged view of the flange shown in Figure 11.

[0115] Referring to Figures 11 and 12, in a plasma generator using a resonant waveguide according to another embodiment of the present invention, each of the two or more first sub-block waveguides 121 constituting the first block waveguide 120 of the central waveguide 100 and the two or more second sub-block waveguides 131 constituting the second block waveguide 130 of the central waveguide 100 may have flanges 121a, 131a at the position of the slit 100a.

[0116] Furthermore, the flange on the opposing surface facing the slit 100a can be partially extended in the direction of the slit 100a.

[0117] In other words, the first subblock-type waveguide 121 may have slits 100a formed at both ends of its inner surface, and a fourth flange 121a may be formed at both ends, with the fourth flange 121a positioned opposite the slits 100a. In this case, a portion of the fourth flange 121a located on the opposing surface opposite the slits 100a may be partially extended in the direction of the slits 100a and protrude into the inside of the first subblock-type waveguide 121.

[0118] The second subblock waveguide 131 may have slits 100a formed at both ends of its inner surface, and a fifth flange 131a formed at both ends, with the fifth flange 131a positioned opposite the slits 100a. In this case, a portion of the fifth flange 131a located on the opposing surface opposite the slits 100a may be partially extended in the direction of the slits 100a and protrude into the inside of the second subblock waveguide 131.

[0119] Here, the lengths to which the third flange 113a and the fourth flange 121a of the first subblock type waveguide 121 and the second subblock type waveguide 131 extend in the direction of the slit 100a may be the same or different for all of the multiple first subblock type waveguides 121 and the multiple second subblock type waveguides 131.

[0120] A plasma generation apparatus using a resonant waveguide according to another embodiment of the present invention can adjust the electric field distribution within the central waveguide 100 and can also adjust the intensity of the electric field incident on the slit 100a. Figure 13 shows the electric field distribution state within the central waveguide and the electric field strength adjustment state at the slit, as the flange of the subblock-type waveguide is partially extended in the direction of the slit.

[0121] Referring to Figure 13, the fourth flange 121a or the fifth flange 131a is extended by a certain length in the direction of the slit 100a, showing a state in which the electric field distribution within the central waveguide 100 is adjusted and the electric field strength of the slit 100a is adjusted. As shown in region A of Figure 13, it can be confirmed that the electric field distribution within the central waveguide 100 is adjusted to be different from that in region B, and as shown in region C, it can be confirmed that the electric field strength incident on the slit 100a facing the flanges 121a and 131a is increased compared to the other slits 100a.

[0122] Thus, the plasma generation device using a resonant waveguide according to another embodiment of the present invention has the advantage that, without the need for a separate tuner, the electric field distribution within the central waveguide 100 and the electric field strength of the slit 100a can be adjusted by adjusting the length of the extension of a portion of the flanges 121a and 131a facing the slit 100a in the direction of the slit 100a.

[0123] The description of the embodiments presented is provided so that a person with ordinary skill in the art to which the invention pertains can utilize or practice the invention. Various modifications of these embodiments are obvious to a person with ordinary skill in the art to which the invention pertains, and the general principles defined herein can be applied to other embodiments without departing from the scope of the invention. Accordingly, the invention is not limited to the embodiments shown herein and should be interpreted in the broadest sense consistent with the principles and novel features shown herein.

Claims

1. Ring-shaped, elliptical, and rectangular central waveguides containing multiple slots on their inner surface, An electromagnetic wave transmission means for transmitting electromagnetic waves to the central waveguide, The electromagnetic wave supply unit transmits electromagnetic waves to the electromagnetic wave transmission means, A plasma generator using a resonant waveguide, comprising: a plasma chamber having an electromagnetic wave incidence window formed therein, which is located on the outlet side of the slot so as to seal the inside of the central waveguide, and which allows electromagnetic waves flowing in through the slot to be radiated to the outside.

2. The plasma generation apparatus using a resonant waveguide according to claim 1, wherein the electromagnetic wave transmission means is a tuner provided on one side of the central waveguide and transmits the electromagnetic waves from the electromagnetic wave supply unit into the central waveguide.

3. Plasma generating apparatus using a resonant waveguide according to claim 2, wherein a transfer waveguide is provided between the central waveguide and the tuner, with both ends directly connected to the central waveguide and the tuner, respectively, and electromagnetic waves from the electromagnetic wave supply unit are transmitted to the central waveguide via the transfer waveguide.

4. The waveguide of the electromagnetic wave supply unit is arranged so as to be tangential to one side of the central waveguide. The plasma generation apparatus using a resonant waveguide according to claim 1, wherein the electromagnetic wave transmission means is a rod-shaped conductor that penetrates the central waveguide and the waveguide of the electromagnetic wave supply unit perpendicular to the tangent.

5. The plasma generation apparatus using a resonant waveguide according to claim 1, characterized in that the electromagnetic wave transmission means is a first incident waveguide tangentially connected to the central waveguide so that electromagnetic waves can pass through it.

6. Plasma generation apparatus using a resonant waveguide according to claim 5, further comprising a second incident waveguide tangentially connected to the central waveguide at a point symmetric to the central waveguide with respect to the first incident waveguide, allowing electromagnetic waves to pass through.

7. When viewed in a plan view, the aforementioned central waveguide is A first side waveguide that is U-shaped or C-shaped, has flanges at both ends, and is connected to the electromagnetic wave transmission means, A first block-type waveguide that is linear, has flanges at both ends, and one end is flange-coupled to one end of the first side waveguide, A second block-type waveguide that is linear, has flanges at both ends, and one end is flange-coupled to the other end of the first side waveguide, A plasma generating apparatus using a resonant waveguide according to any one of claims 1 to 6, comprising a second side waveguide which is U-shaped or C-shaped, has flanges at both ends, and is connected to the other end of the first block-shaped waveguide and to the second incident waveguide which is connected to the other end of the second block-shaped waveguide.

8. Plasma generating apparatus using a resonant waveguide according to claim 7, characterized in that the first block-type waveguide and the second block-type waveguide are composed of two or more linear sub-block-type waveguides having flanges at both ends connected in series.

9. The first side waveguide is It is letter-shaped, The first side waveguide is, The first side portion is U-shaped, has flanges at both ends, and one end is flange-coupled to the first block-shaped waveguide. A U-shaped waveguide and, It is linear, has flanges at both ends, and one end is the first side portion A first side section block-shaped waveguide is flange-coupled to the other end of the U-shaped waveguide, The first side section second is L-shaped, has flanges at both ends, one end is flange-coupled to the other end of the first side section block-shaped waveguide, and the other end is flange-coupled to the second side section second. A plasma generating apparatus using a resonant waveguide according to claim 7, comprising a U-shaped waveguide.

10. The second side waveguide is It is letter-shaped, The second side waveguide is, The second side portion is L-shaped, has flanges at both ends, and one end is flange-coupled to the second block-shaped waveguide. A U-shaped waveguide and, It is linear, has flanges at both ends, and one end is the second side portion first A second side section block-shaped waveguide is flange-coupled to the other end of the U-shaped waveguide, The second side section is U-shaped, has flanges at both ends, one end of which is flange-coupled to the other end of the first side section block-shaped waveguide, and the other end of which is flange-coupled to the first side section block-shaped waveguide. A plasma generating apparatus using a resonant waveguide according to claim 9, comprising a U-shaped waveguide.

11. The electromagnetic wave transmission means is a first incident waveguide tangentially connected to the central waveguide so that electromagnetic waves can pass through it. The first incident waveguide has a first side portion A plasma generation device using a resonant waveguide according to claim 9, characterized in that it is connected in parallel to the first block-shaped waveguide in a U-shaped waveguide.

12. The first incident waveguide includes a second incident waveguide that is tangentially connected to the central waveguide at a point symmetric to the central waveguide, allowing electromagnetic waves to pass through. The second incident waveguide has a second side portion. A plasma generation device using a resonant waveguide according to claim 10, characterized in that the U-shaped waveguide is connected in parallel to the second block-shaped waveguide.

13. The electromagnetic wave transmission means is a tuner provided on one side of the central waveguide that transmits the electromagnetic waves from the electromagnetic wave supply unit into the central waveguide, or The waveguide of the electromagnetic wave supply unit is arranged so as to be tangent to one side of the central waveguide, and the electromagnetic wave transmission means is a rod-shaped conductor that penetrates the central waveguide and the waveguide of the electromagnetic wave supply unit perpendicular to the tangent. The plasma generating apparatus using a resonant waveguide according to claim 9, characterized in that the tuner or conductor is connected to the first side section block-shaped waveguide.

14. Plasma generating apparatus using a resonant waveguide according to claim 9, characterized in that the first side section block-type waveguide and the second side section block-type waveguide are linear and are composed of two or more sub-block-type waveguides having flanges at both ends connected in series.

15. The aforementioned slot is a slot in an upright orientation, It includes a magnet unit located between the inner surface of the central waveguide and the electromagnetic wave incidence window, and positioned between the slots, The plasma generation apparatus using a resonant waveguide according to claim 7, wherein the electromagnetic wave incidence window is provided to seal the gap formed by the magnet unit.

16. The plasma generator using a resonant waveguide according to claim 15, characterized in that a pair of magnet units are arranged vertically parallel to the slot direction, and the pair of magnets are arranged to form a magnetic field parallel to the slot direction.

17. The plasma generator using a resonant waveguide according to claim 15, characterized in that a pair of magnet units are arranged left and right perpendicular to the slot direction, and the pair of magnets are arranged to form a magnetic field perpendicular to the slot direction.

18. Plasma generator using a resonant waveguide according to claim 7, wherein the electromagnetic wave incidence window includes a plurality of sub-electromagnetic wave incidence windows configured to seal one of the slots, or to seal one of the slots and its adjacent slots.

19. The flange is not formed on the inside of the central waveguide, but is formed on the upper, lower, and outer sides of the waveguide, with a vertical cross-section A plasma generator using a resonant waveguide according to claim 7, characterized in that it is U-shaped.

20. The first incident waveguide has a first side portion Plasma generating apparatus using a resonant waveguide according to claim 11, characterized in that electromagnetic waves are connected parallel to the first block-shaped waveguide at the apex side of the U-shaped waveguide so as to be able to pass through.

21. The second incident waveguide has the second side portion first Plasma generating apparatus using a resonant waveguide according to claim 12, characterized in that electromagnetic waves are connected parallel to the second block-shaped waveguide at the apex side of the U-shaped waveguide.

22. The waveguide is a TE-mode right-angle waveguide, Plasma generating apparatus using a resonant waveguide according to claim 7, wherein the slit is formed on the inner surface of the linear right-angle waveguide, perpendicular to the direction of propagation.

23. Plasma generating apparatus using a resonant waveguide according to claim 8, characterized in that the flange of the subblock-type waveguide is located at the slot position.

24. Plasma generator using a resonant waveguide according to claim 23, characterized in that the flange of the opposing surface of the subblock-type waveguide facing the slot is partially extended in the direction of the inner slot of the subblock-type waveguide.

25. The plasma generation apparatus using a resonant waveguide according to claim 7, characterized in that the central waveguide includes a tuner on the opposing surface facing the slot.

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