Edge ring transfer using automatic rotation pre-alignment

Abstract

The system includes a robot configured to transport one of a substrate and an edge ring within a substrate processing system, a substrate aligner configured to adjust a rotational position of the substrate or the edge ring relative to an end effector of the robot, and a carrier plate configured to support the edge ring, wherein the robot is configured to retrieve the carrier plate with the end effector, retrieve the edge ring using the carrier plate supported by the end effector, and transfer the carrier plate and edge ring to the substrate aligner.

Description

[Technical Field]

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS This application claims the benefit of priority to U.S. Provisional Patent Application No. 62 / 964,908, filed January 23, 2020. The entire disclosures of the above-referenced related applications are incorporated herein by reference.

[0002] The present disclosure relates to a system and method for aligning an edge ring in a substrate processing system. [Background technology]

[0003] The background art discussion provided herein is intended to provide an overview of the contents of the present disclosure. Work by the inventors named herein, to the extent described in this background art section, as well as aspects of the description that may not be considered prior art at the time of filing, are not admitted expressly or impliedly as prior art to the present disclosure.

[0004] Substrate processing systems may be used to process substrates, such as semiconductor wafers. Exemplary processes that can be performed on the substrate include, but are not limited to, chemical vapor deposition (CVD), atomic layer deposition (ALD), conductor etching, and / or other etching, deposition, or cleaning processes. The substrate may be placed on a substrate support, such as a pedestal, electrostatic chuck (ESC), or the like, in a processing chamber of the substrate processing system. During etching, a gas mixture including one or more precursors may be introduced into the processing chamber, and a plasma may be used to initiate a chemical reaction.

[0005] The substrate support may include a ceramic layer disposed to support the wafer. For example, the wafer may be clamped to the ceramic layer during processing. The substrate support may include an edge ring disposed around an outer portion of the substrate support (e.g., outside and / or adjacent to the perimeter). The edge ring may be provided to confine plasma to a volume above the substrate and protect the substrate support from erosion by the plasma, etc. Summary of the Invention

[0006] The system includes a robot configured to transport either a substrate or an edge ring within a substrate processing system, a substrate aligner configured to adjust a rotational position of either the substrate or the edge ring relative to an end effector of the robot, and a carrier plate configured to support the edge ring, wherein the robot is configured to retrieve the carrier plate with the end effector, retrieve the edge ring using the carrier plate supported by the end effector, and transport the carrier plate and edge ring to the substrate aligner.

[0007] In other features, the imaging device is configured to detect a feature on the edge ring while the edge ring and carrier plate are disposed on a substrate aligner. The feature is a flat region on an inner diameter of the edge ring. The surface of the edge ring is generally polished, and the feature corresponds to at least one of an unpolished portion and a roughened portion of the edge ring. The surface of the edge ring is generally unpolished, and the feature corresponds to the polished portion of the edge ring. The feature includes a notch disposed on a bottom surface of the edge ring. The feature includes a window disposed in the edge ring. The window provides for transmission of light through the edge ring. The edge ring is coated, and the feature corresponds to the uncoated portion of the edge ring. The edge ring is uncoated, and the feature corresponds to the coated portion of the edge ring. The feature corresponds to at least one mark on the surface of the edge ring.

[0008] In other features, the substrate aligner is configured to rotate the carrier plate and the edge ring based on features of the edge ring detected by the imaging device. The dynamic alignment module is configured to determine a rotational position of the edge ring relative to the end effector based on features of the edge ring detected by the imaging device. The substrate aligner is configured to rotate the carrier plate and the edge ring based on the rotational position of the edge ring determined by the dynamic alignment module. The substrate aligner is configured to further rotate the carrier plate and the edge ring based on a desired rotational position of the edge ring relative to the end effector.

[0009] In other features, the carrier plate includes a plurality of tabs extending from respective corners of a body of the carrier plate, the periphery of the body being smaller than the inner diameter of the edge ring, and the plurality of tabs extending beyond the inner diameter of the edge ring. At least two of the plurality of tabs include elastomeric pads. The bottom surface of the carrier plate includes a contact sheet containing a thermoplastic material. The contact sheet is disposed in a recess in the bottom surface of the carrier plate. The carrier plate includes rounded corners. The rounded corners of the carrier plate define a periphery corresponding to the diameter of the substrate. The diameter is approximately 300 mm.

[0010] The method includes controlling a robot in a substrate processing system to retrieve a carrier plate using an end effector of the robot, retrieve an edge ring using the carrier plate supported by the end effector, and transport the carrier plate and edge ring to a substrate aligner configured to adjust a rotational position of either the substrate or the edge ring, and adjust the rotational position of the edge ring while the carrier plate and edge ring are disposed on the substrate aligner.

[0011] In other features, the method further includes detecting a feature on the edge ring while the edge ring and carrier plate are positioned on the substrate aligner. The feature is a flat area on an inner diameter of the edge ring. The surface of the edge ring is generally polished, and the feature corresponds to at least one of an unpolished portion and a roughened portion of the edge ring. The surface of the edge ring is generally unpolished, and the feature corresponds to a polished portion of the edge ring. The edge ring is coated, and the feature corresponds to an uncoated portion of the edge ring. The edge ring is uncoated, and the feature corresponds to a coated portion of the edge ring. The feature corresponds to at least one mark on the surface of the edge ring.

[0012] In other features, the method further includes rotating the carrier plate and the edge ring based on the detected characteristics of the edge ring. The method further includes determining a rotational position of the edge ring relative to the end effector based on the detected characteristics of the edge ring and rotating the carrier plate and the edge ring based on the determined rotational position of the edge ring. The method further includes further rotating the carrier plate and the edge ring based on a desired rotational position of the edge ring relative to the end effector.

[0013] The carrier plate includes a plurality of tabs extending from respective corners of a body of the carrier plate, the perimeter of the body being smaller than the inner diameter of the edge ring, the plurality of tabs extending beyond the inner diameter of the edge ring, and removing the edge ring includes removing an edge ring whose inner diameter is supported by the plurality of tabs. The carrier plate includes rounded corners. The rounded corners of the carrier plate define a perimeter corresponding to the diameter of the substrate. The diameter is approximately 300 mm.

[0014] The system includes a robot configured to transport either a substrate or an edge ring within a substrate processing system, a substrate aligner configured to adjust a rotational position of either the substrate or the edge ring relative to an end effector of the robot, and a carrier plate configured to support the edge ring, The robot is configured to retrieve the carrier plate with the end effector and adjust the rotational alignment of the carrier plate on the end effector based on detected characteristics of the carrier plate.

[0015] Further areas of applicability of the present disclosure will become apparent from the detailed description, claims, and drawings. The detailed description and specific examples are for purposes of illustration only and are not intended to limit the scope of the present disclosure. [Brief explanation of the drawings]

[0016] The present disclosure will become more fully understood from the detailed description and the accompanying drawings, wherein:

[0017] [Figure 1A] FIG. 1A is a functional block diagram of an exemplary substrate processing system according to the present disclosure.

[0018] [Figure 1B] FIG. 1B illustrates an exemplary substrate processing tool according to the present disclosure.

[0019] [Figure 2] FIG. 2 is an exemplary edge ring alignment system according to the present disclosure.

[0020] [Figure 3A] FIG. 3A illustrates an exemplary carrier plate according to the present disclosure. [Figure 3B] FIG. 3B illustrates an exemplary carrier plate according to the present disclosure. [Figure 3C] FIG. 3C illustrates an exemplary carrier plate according to the present disclosure.

[0021] [Figure 4A] FIG. 4A illustrates a robot assembly configured to align an edge ring using a carrier plate according to the present disclosure. [Figure 4B] FIG. 4B illustrates a robot assembly configured to align an edge ring using a carrier plate according to the present disclosure. [Figure 4C] FIG. 4C illustrates a robot assembly configured to align an edge ring using a carrier plate according to the present disclosure.

[0022] [Figure 5] FIG. 5 illustrates steps of an exemplary method for aligning an edge ring according to the present disclosure.

[0023] [Figure 6] FIG. 6 is an exemplary edge ring including grooves according to the present disclosure.

[0024] [Figure 7A] FIG. 7A shows a bottom view and inner diameter of another exemplary edge ring including one or more alignment notches according to the present disclosure. [Figure 7B] FIG. 7B shows a bottom view and inner diameter of another exemplary edge ring including one or more alignment notches according to the present disclosure. [Figure 7C] FIG. 7C illustrates a bottom view and inner diameter of another exemplary edge ring including one or more alignment notches according to the present disclosure.

[0025] [Figure 8A] 8A and 8B are cross-sectional and top views, respectively, of another exemplary edge ring according to the present disclosure. [Figure 8B] 8A and 8B are cross-sectional and top views, respectively, of another exemplary edge ring according to the present disclosure.

[0026] In the drawings, reference numbers may be reused to identify similar and / or identical elements. DETAILED DESCRIPTION OF THE INVENTION

[0027] The substrate support in a substrate processing system may include an edge ring. Also, in some systems, a robot / handler (e.g., a vacuum transfer module (VTM) robot) used to transfer substrates to and from the substrate support within a processing chamber may be configured to transfer the edge ring to and from the processing chamber. For example, the edge ring may be a consumable item (i.e., the edge ring may wear over time) and therefore be replaced periodically. The robot may be configured to install and remove the edge ring from the substrate support. The substrate processing system may include one or more other robots configured to transport the edge ring within and between other components (e.g., a loading station, an equipment front-end module (EFEM), a load lock, etc.).

[0028] Accurate placement of the edge ring on the substrate support can be challenging. Some substrate processing systems may implement a dynamic alignment (DA) system for aligning a substrate on a substrate support using a robot. Exemplary DA systems and methods are described in further detail in U.S. Pat. No. 9,269,529, incorporated herein by reference in its entirety. For example, the DA system and method may implement an optical sensor that determines the position of the substrate at an end effector of the robot prior to placement on the substrate support. The DA system may further include a substrate aligner configured to adjust the rotational position of the substrate based on the determined position. Systems and methods according to the present disclosure perform rotational alignment of the edge ring using a robot and a DA system configured to perform rotational alignment of the substrate.

[0029] 1A and 1B, an exemplary substrate processing system 100 is shown that includes a substrate processing tool 102. FIG. 1B is a top view of the substrate processing tool 102. As an example, the substrate processing system 100 may be used to perform etching using RF plasma and / or other suitable substrate processes. The substrate processing system 100 includes one or more processing modules or chambers 104 that enclose other components of the substrate processing system 100 and contain the RF plasma.

[0030] Substrates to be processed enter the substrate processing tool 102 through one or more intermediate chambers. For example, the substrate may enter through a port in a loading station 106 of an atmosphere-to-vacuum (ATV) transfer module, such as an equipment front-end module (EFEM) 108, and then be transferred into one or more processing chambers 104. For example, a transfer robot 110 is positioned to transfer the substrate from the loading station 106 to an airlock, or load lock 112, and a vacuum transfer robot 114 of a vacuum transfer module 116 is positioned to transfer the substrate from the load lock 112 to the various processing chambers 104.

[0031] The processing chamber 104 includes an upper electrode 118 and a substrate support 120, such as an electrostatic chuck (ESC). During operation, a substrate 122 is disposed on the substrate support 120. Although the particular substrate processing system 100 and processing chamber 104 are shown by way of example, the principles of the present disclosure may be applied to other types of substrate processing systems and chambers, such as substrate processing systems that generate plasma in situ, implement remote plasma generation and delivery, etc. (e.g., using plasma tubes, microwave tubes).

[0032] As one example, the upper electrode 118 may include a gas distribution device, such as a showerhead 124, for introducing and distributing process gases. Alternatively, the upper electrode 118 may include a conductive plate, and the process gases may be introduced in another manner. The substrate support 120 includes a conductive base plate 126 that acts as a lower electrode. The base plate 126 supports a ceramic layer 128.

[0033] The RF generation system 130 generates and outputs an RF voltage to one of the upper electrode 118 and the lower electrode (e.g., the base plate 126 of the substrate support 120). The other of the upper electrode 118 and the base plate 126 may be DC grounded, AC grounded, or floating. By way of example, the RF generation system 130 may include an RF voltage generator 132 that generates an RF voltage supplied to the upper electrode 118 or the base plate 126 by a matching and distribution network 134. In other examples, the plasma may be generated inductively or remotely. For illustrative purposes, the RF generation system 130 corresponds to a capacitively coupled plasma (CCP) system, although the principles of the present disclosure may be implemented in other suitable systems, such as, by way of example, a transformer coupled plasma (TCP) system, a CCP cathode system, or a remote microwave plasma generation and delivery system.

[0034] The gas delivery system 140 includes one or more gas sources 142-1, 142-2, ..., and 142-N (collectively referred to as gas sources 142), where N is an integer greater than 0. The gas sources supply one or more precursors and their gas mixtures. The gas sources may also supply purge gases. Vaporized precursors may also be used. The gas sources 142 are connected to a manifold 148 by valves 144-1, 144-2, ..., and 144-N (collectively referred to as valves 144) and mass flow controllers 146-1, 146-2, ..., and 146-N (collectively referred to as mass flow controllers 146). The output of the manifold 148 is supplied to the processing chamber 104. As an example, the output of the manifold 148 is supplied to the showerhead 124. A valve 150 and a pump 152 may be used to evacuate reactants from the processing chamber 104.

[0035] A system controller 160 may be used to control components of the substrate processing system 100. For example, the system controller 160 is configured to control the robots 110 and 114 to transport substrates within and between the loading station 106, the EFEM 108, the load lock 112, the VTM 116, and the processing chambers 104.

[0036] The substrate support 120 includes an edge ring 170. The edge ring 170 according to the principles of the present disclosure may be movable (e.g., vertically movable up and down) relative to the substrate support 120. For example, the edge ring 170 may be controlled via actuators and lift pins (not shown) responsive to the system controller 160. The system controller 160 and the vacuum transfer robot 114 may be further configured to transfer the edge ring 170 between the load locks 112 of the respective processing chambers 104 and the substrate support 120. Conversely, the system controller 160 and the transfer robot 110 may be configured to transfer the edge ring 170 between one of the loading station 106, the EFEM 108, and the load lock 112.

[0037] The substrate processing system 100 may include one or more integrated substrate aligners 180. As shown, the substrate aligner 180 is located within the EFEM 108. In other examples, the substrate aligner 180 may be located within another chamber, such as the vacuum transfer module 116. The substrate processing system 100 according to the present disclosure is configured to perform rotational alignment of the edge ring 170 using the system controller 160, the transfer robot 110, and the substrate aligner 180, as described in more detail below.

[0038] 2, an exemplary edge ring alignment system 200 according to the principles of the present disclosure is shown. The system 200 includes a controller 204 (e.g., corresponding to the controller 160 of FIG. 1A), a robot 208 (e.g., corresponding to the transfer robot 10 of FIGS. 1A and 1B), and an imaging device 212. For example, the imaging device 212 includes a camera, a sensor, etc. configured to detect objects within a field of view. The imaging device 212 may be located on or near a substrate aligner 216 within a chamber such as the EFEM 108.

[0039] The controller 204 may include a robot control module 220 and a dynamic alignment (DA) module 224. The robot control module 220 controls the robot 208. For example, the robot control module 220 controls the robot 208 to transfer substrates and edge rings between various process modules / chambers, vacuum chambers, etc. A robot 208 according to the principles of the present disclosure includes an end effector configured to place and retrieve an edge ring. For example, the robot 208 retrieves the edge ring and transfers it from the loading station 106, through the EFEM 108, and to the load lock 112. During transfer, the edge ring is positioned on a substrate aligner 216 within the field of view of the imaging device 212 to detect the rotational position of the edge ring on the end effector. In some examples, the substrate aligner 216 may be integrated into a robot assembly that includes the robot 208.

[0040] In one example, the imaging device 212 may project one or more beams toward the end effector of the robot 208, sense when the edge ring interrupts a beam, and determine the position of the edge ring on the end effector based on a pattern indicative of which beams are interrupted. For example, the rotational alignment of the edge ring may be determined by comparing the pattern to a predetermined pattern indicative of a desired rotational position on the end effector. In another example, the imaging device 212 may detect the edge ring, the end effector, an adapter or carrier plate, and / or other structural features to determine the rotational position of the edge ring on the end effector.

[0041] The DA module 224 receives position detection data from the imaging device 212. For example, the position detection data may include a beam pattern generated when the edge ring passes through the field of view of the imaging device 212, data indicative of features detected on the edge ring, the end effector, the carrier plate, etc., and / or other data indicative of the rotational position of the edge ring on the end effector. Based on the position detection data, the DA module 224 is configured to calculate position information including the actual rotational position of the edge ring on the end effector and a rotational offset between the actual rotational position on the end effector and a desired rotational position. The DA module 224 may further be configured to control the substrate aligner 216 to rotate the edge ring based on the position information until the edge ring is positioned to match the desired rotational position on the end effector. The robot 208 retrieves the edge ring with the end effector when the edge ring is positioned to match the desired rotational position.

[0042] Typically, the end effector is configured to support a carrier substrate. That is, the end effector may be configured to support a disk-shaped object, such as a substrate, but not an annular object, such as an edge ring. Furthermore, the edge ring for a particular substrate support generally has a larger diameter than a substrate of the same size as the substrate support. Similarly, the substrate aligner 216 may be configured to support a substrate but not an edge ring. Accordingly, the alignment system 200 according to the present disclosure implements an adapter or carrier (hereinafter, "carrier plate") configured to provide a support interface for the edge ring on the end effector and / or substrate aligner.

[0043] 3A, 3B, and 3C, an exemplary carrier plate 300 is shown. In FIG. 3A, the carrier plate 300 is shown supported by an end effector 304 of a robot (e.g., robot 208 of FIG. 2), with an edge ring 308 supported on the carrier plate 300. Views of the top surface 312 and bottom surface 316 of an example carrier plate 300 are shown in FIGS. 3B and 3C. The carrier plate 300 may be constructed of a lightweight material, such as carbon fiber, that provides high stiffness and low deflection while minimizing load deflection of the end effector 304.

[0044] The carrier plate 300 provides support for the edge ring 308 on the end effector 304. For example, the carrier plate 300 is configured to integrate with an inner diameter 320 of the edge ring 308. By way of example, the carrier plate 300 includes a plurality of fingers or tabs 324 extending from each corner of a rectangular body 326 of the carrier plate 300. Each (or at least two) of the tabs 324 may include a gripping surface, such as an elastomeric pad 328, on the top surface 312 of the carrier plate 300. The pads 328 facilitate gripping of the edge ring 308 and prevent slippage.

[0045] Conversely, the bottom surface 316 of the carrier plate 300 may include a contact sheet 332. By way of example, the contact sheet 332 is constructed of a thermoplastic such as polyetheretherketone (PEEK). The contact sheet 332 provides a contact interface between the carrier plate 300, the end effector 304, and the substrate aligner 216. In some examples, the contact sheet 332 may be disposed within a recess on the bottom surface 316.

[0046] The carrier plate 300 is sized according to the dimensions of the edge ring 308. For example, the carrier plate 300 is sized according to the inner diameter 320 of the edge ring 308. That is, the perimeter of the rectangular body 326 may be smaller than (i.e., located within) the inner diameter 320, while the tabs 324 extend beyond the inner diameter 320. In an example where the inner diameter is approximately 300 mm (e.g., 295-305 mm for a substrate support configured for a 300 mm substrate), the tabs 324 extend beyond the perimeter corresponding to the 300 mm diameter.

[0047] In the example shown in FIG. 3C , the carrier plate 300 includes chamfered or rounded corners 336. For a substrate aligner configured for 300 mm substrates, the imaging device 212 may be configured with a viewing area positioned above the outer diameter of the substrate. Thus, the carrier plate 300 may be configured with dimensions corresponding to the substrate being aligned on the substrate aligner 216. For example, the rounded corners 336 define a perimeter corresponding to a desired diameter D (e.g., 300 mm). That is, the rounded corners 336 define a perimeter or arc that generally corresponds to the same diameter as the substrate (e.g., 300 mm). Thus, a system configured to detect the perimeter of a 300 mm substrate can also detect the rounded corners 336 to facilitate detection and alignment of the carrier plate 300. Additionally, the carrier plate 300 and / or edge ring 308 may include one or more features (e.g., a flat area 340 on the inner diameter 320 of the edge ring 308) that are detectable by the imaging device 212. In this manner, the carrier plate 300 is configured to facilitate positioning and alignment on the substrate aligner 216 and detection by the imaging device 212, as described in more detail below.

[0048] With continued reference now to FIGS. 4A, 4B, and 4C, as well as FIGS. 3A, 3B, and 3C, an exemplary edge ring transfer and alignment process according to the present disclosure will be described. The robot assembly 400 may include a robot 404, a substrate aligner 408, and an integrated sensor or imaging device 412. While shown as integrated into the substrate aligner 408, in other embodiments, the imaging device 412 or sensor may be provided in a different location (i.e., remotely located and not integrated into the substrate aligner 408). The robot 404 retrieves the carrier plate 300 using the end effector 304. For example, the robot 404 retrieves the carrier plate 300 from a buffer or other storage location within the EFEM 108. The robot 404 retrieves the edge ring 308 using the end effector 304 with the supported carrier plate 300. For example, the robot 404 retrieves the edge ring 308 from one of the loading stations 106.

[0049] With the edge ring 308 supported on the end effector 304 using the carrier plate 300, the robot 404 positions the edge ring 308 above the substrate aligner 408. For example, the robot 404 may transition to a home position or a folded position, as shown in FIGS. 4A and 4C . In the folded position, the edge ring 308 is positioned above the substrate aligner 408. The substrate aligner 408 may include a chuck 416 configured to lift upward to remove the carrier plate 300 and edge ring 308 from the end effector 304. In some examples, the chuck 416 may grip the carrier plate 300 (e.g., using vacuum suction) to secure the carrier plate 300 to the substrate aligner 408.

[0050] With the carrier plate 300 and edge ring 308 in the raised position, the chuck 416 may rotate the edge ring 308 within the field of view of the imaging device 412 to detect the rotational position of the edge ring 308 relative to the end effector 304. For example, the carrier plate 300 and / or the edge ring 308 may include one or more features detectable by the imaging device 412, such as a flat area 340 on the inner diameter 320 of the edge ring 308. In other examples, the imaging device 412 may be configured to detect one or more other features, including, but not limited to, a mark on the edge ring 308, a notch in the edge ring 308, a mark on the carrier plate 300, an annular edge of the edge ring 308, an edge of the carrier plate 300, a tab 324, etc.

[0051] In examples where the imaging device 412 is configured to detect the flat region 340, the carrier plate 300 may be sized such that the edge of the carrier plate 300 adjacent the flat region 340 is not within the viewing field of the imaging device 412. Thus, the imaging device 412 does not inadvertently detect the edge of the carrier plate 300 instead of the flat region 340.

[0052] In some examples, the controller 204, the DA module 224, and / or the imagers 212, 412 may be configured to operate in different modes depending on whether the substrate aligner 408 is aligning a substrate or an edge ring. For example, the substrate may have a first type of detectable feature (e.g., a notch or mark), while the edge ring may have a second type of detectable feature (e.g., a flat region 340 or a different type of mark). Thus, the controller 204, the DA module 224, and / or the imagers 212, 412 may be configured to operate in a substrate mode to detect features on a substrate aligned on the substrate aligner 408, and an edge ring mode to detect features on an edge ring aligned on the substrate aligner 408.

[0053] The substrate aligner 408 rotates the carrier plate 300 until the detected features indicate that the edge ring 308 is in a desired rotational position, and then lowers the carrier plate 300 and edge ring 308 onto the end effector 304. For example, the DA module 224 may control the substrate aligner 408 to rotate the carrier plate 300 based on signals received from the imaging device 412. In some examples, the substrate aligner 408 may also be configured to perform linear adjustments of the position of the edge ring 308 relative to the end effector 304. For example, the substrate aligner 408 may adjust the linear position of the edge ring 308 to facilitate centering of the edge ring 308 on the substrate support 120. The robot 404 then transfers the carrier plate 300 and edge ring 308 to the load lock 112 (e.g., for removal of the edge ring 308 and transfer to the substrate support 120 by the vacuum transfer robot 114).

[0054] After transferring the edge ring 308 to the load lock 112, the robot 404 may optionally transfer the carrier plate 300 for centering and rotational alignment before returning it to the buffer for storage. The carrier plate 300 alone (i.e., without the edge ring 308) may be aligned before retrieving the edge ring 308, after transferring the edge ring 308, etc. For example, as described above, the rounded corners 336 define a perimeter or arc that corresponds to the diameter of the substrate. Thus, detecting the rounded corners 336 can easily detect and align the carrier plate 300 on the end effector 304. In some examples, after aligning the carrier plate 300, the carrier plate 300 may be adjusted to a different alignment (i.e., a rotational alignment offset from the nominal alignment). For example, depending on the system geometry and dimensions, the dimensions of the carrier plate 300 may interfere with transport of the edge ring 308 (e.g., transport of the edge ring 308 through slots in the loading station 106, EFEM 108, load lock 112, VTM 116, processing chamber 104, etc.) Therefore, the rotational alignment of the carrier plate 300 on the end effector 304 may be adjusted to a desired angle to facilitate passage of the carrier plate 300 through the respective slots.

[0055] In some examples, the robot 404 and substrate aligner 408 may be configured to perform additional steps to align the edge ring 308. For example, if the rotation range of the substrate aligner 408 is limited and / or other structural limitations of the end effector 304, robot assembly 400, etc., prevent additional rotation, the robot 404 and substrate aligner 408 may perform additional alignment cycles. For example, the robot 404 may remove the edge ring 308 from the substrate aligner 408 after a first rotation and then place the edge ring 308 on the substrate aligner 408 for an additional rotation.

[0056] In another example, the robot 404 may adjust the approach angle of the end effector 304 to retrieve the edge ring 308 from the substrate aligner 408. In yet another example, the robot 404 may retrieve the edge ring 308 from the substrate aligner 408 after rotation, place the edge ring 308 in a storage location such as a buffer or shelf, retrieve the edge ring 308 from the storage location using the adjusted approach angle, and return the edge ring 308 to the substrate aligner 408 for additional rotation.

[0057] 5, an exemplary method 500 for aligning an edge ring according to the present disclosure begins at 504. At 508, the method 500 retrieves the carrier plate 300 (e.g., using an end effector of a robot, such as the robot 404) from a buffer or other storage location. At 510, the method 500 optionally aligns the carrier plate 300 on the end effector as described above. At 512, the method 500 (e.g., the robot 404) retrieves the edge ring from the loading station using the end effector with the supported carrier plate. At 516, the method 500 (e.g., the robot 404) transfers the edge ring to a substrate aligner. For example, the robot 404 positions the edge ring above the substrate aligner and raises the chuck of the substrate aligner upward to remove the carrier plate and edge ring from the end effector.

[0058] At 520, the method 500 (e.g., an imaging device) detects the rotational position of the edge ring relative to the end effector. For example, the imaging device detects one or more features (e.g., flat areas) of the edge ring and determines the rotational position based on the detected features. At 524, the method 500 rotates the carrier plate until the detected features (e.g., using the substrate aligner, the imaging device, and / or the DA module 224) indicate that the edge ring is in the desired rotational position. At 528, the method 500 (e.g., the robot 404) removes the carrier plate and edge ring from the substrate aligner. For example, the substrate aligner lowers the carrier plate and edge ring onto the end effector.

[0059] At 532, the method 500 (e.g., the DA module 224) optionally determines whether to perform additional steps to align the edge ring. For example, the method 500 may determine whether an additional rotation of the edge ring is required. If true, the method 500 continues at 536. If false, the method 500 continues at 540. At 536, the method 500 performs one or more additional steps to align the edge ring. For example, the robot 404 may retrieve the edge ring from the substrate aligner after a first rotation, then place the edge ring on the substrate aligner for an additional rotation, adjust the approach angle of the end effector to retrieve the edge ring from the substrate aligner, retrieve the edge ring from the substrate aligner after the rotation, place the edge ring in a storage location such as a buffer or shelf, retrieve the edge ring from the storage location using the adjusted approach angle, return the edge ring to the substrate aligner for an additional rotation, etc.

[0060] In some examples, after retrieving the edge ring from the substrate aligner, the robot 404 may return the edge ring to a storage location, return the carrier plate to the substrate aligner, realign the carrier plate on the end effector, and then retrieve the edge ring again. That is, to change the rotational alignment of the carrier plate relative to the edge ring, the rotational alignment of the carrier plate on the end effector may be adjusted before retrieving the edge ring. Changing the alignment of the carrier plate relative to the edge ring may facilitate movement of the carrier plate through a slot, such as around the system geometry, as described above.

[0061] At 540, the method 500 (eg, the robot 404) transfers the edge ring to a load lock for removal by a vacuum transfer robot and transfer to a substrate support. The method 500 ends at 544.

[0062] In other examples, systems and methods according to the present disclosure may be configured to perform other alignment steps. In one example, rotational and / or linear alignment may be performed based on features detected on the top and / or bottom surfaces of the edge ring. Some edge rings may include detectable features, while other edge rings may be composed of an optically “transparent” material (i.e., a material or surface that is not detectable using certain types of sensors). Thus, the surface of the edge ring may be intentionally roughened to facilitate detection. In examples where the surface of the edge ring is intentionally roughened, these surfaces may be polished over time due to exposure to the processing environment in the chamber. For example, if the edge ring is movable (i.e., configured to raise and lower for process adjustments), raising the edge ring may expose the bottom surface of the edge ring to the process environment. This polished surface of the edge ring may prevent accurate detection of the edge ring's position.

[0063] As shown in FIG. 6 , an exemplary edge ring 600 (shown in cross section) may include a groove 604 formed in a lower surface 608. A dynamic alignment system and method according to the principles of the present disclosure may be configured to detect the position of the edge ring 600 by detecting the groove 604. The groove 604 is located between an inner diameter 612 and an outer diameter 616 of the edge ring 600. The lower surface 608 may be polished to increase the difference between the lower surface 608 and the groove 604. Accordingly, a DA module (e.g., DA module 224) may be configured to detect the groove 604 based on signals received from corresponding sensors. For example, raw sensor data of the lower surface 608 may be provided to the DA module 224 for processing. The DA module 224 may implement an algorithm and / or filter configured to identify the groove 604 in the raw sensor data, determine the respective positions of the inner diameter 612 and the outer diameter 616, and determine the position of the edge ring 600 and a linear offset of the position of the edge ring 600 relative to a desired (e.g., central) position.

[0064] As an example, the DA module 224 may be configured to separate captured raw sensor data into four vectors. For example, the DA module 224 may receive captured data from two sensors (e.g., a right sensor and a left sensor). The captured data may be separated into data corresponding to a leading edge detected by the right sensor (e.g., an outer diameter of the groove 604), a trailing edge detected by the right sensor (e.g., an inner diameter of the groove 604), a leading edge detected by the left sensor, and a trailing edge detected by the left sensor.

[0065] The DA module 224 calculates edge points (e.g., points on the outer diameter 616) of the edge ring 600 based on the leading and trailing edge data captured for the groove 604, and also based on calibrated position data from sensors, robots, etc. In some examples, any calculated edge points are removed from the data if the corresponding radial value is outside a predetermined range (e.g., less than a predetermined minimum value or greater than a predetermined maximum value). The DA module 224 then calculates the diameter and corresponding offset (i.e., from the desired center position) of the edge ring 600 location.

[0066] As shown in another example in FIGS. 7A, 7B, and 7C, the edge ring 700 (as shown from the bottom view in FIG. 7A) may include one or more alignment features, such as a notch 704. For example, the notch 704 is shown on the bottom surface 708 of the edge ring 700 and extends upward toward the top surface 712 of the edge ring 700. The notch 704 may be configured to facilitate alignment of the edge ring 700 with respect to other structural features of the substrate support. For example, the notch 704 is positioned to receive an alignment pin, lift pin, or the like, extending upward from the substrate support. The notch 704 may have a sloped or triangular inner surface (as shown in the view of the inner diameter 716 of the edge ring 700 in FIG. 7B), a rounded inner surface (as shown in the view of the inner diameter 716 in FIG. 7C), or the like. The inner surface of the notch 704 facilitates alignment of the edge ring 700.

[0067] The dynamic alignment systems and methods according to the principles of the present disclosure described above may be further configured to detect the position of the edge ring 700 by detecting the notches 704. For example, a sensor such as the imager 412 may be configured to detect one or more of the notches 704, and the DA module 224 may be configured to determine the alignment of the edge ring 700 based on the detected notches 704.

[0068] A cross-sectional view of another exemplary edge ring 800 is shown in FIG. 8A . A top view of a portion of the edge ring 800 is shown in FIG. 8B . In this example, the edge ring 800 is constructed of a transparent or semi-transparent material (e.g., quartz). That is, light can be transmitted through the edge ring 800. For example, light may be transmitted from one side of the edge ring 800 (e.g., transmitted from below the edge ring 800 using a suitable transmitter, LED, etc.) and received on the opposite side of the edge ring 800 (e.g., using the imager 412 or another suitable sensor).

[0069] The edge ring 800 may include an optical notch or window 804. For example, the window 804 may be located in a stepped portion 808 of the edge ring 800 that defines a substrate pocket at an inner diameter 812 of the edge ring 800. The window 804 is configured to have a transparency (or opacity) that is different from that of other portions of the edge ring 800. Thus, one or more characteristics (e.g., gain) of the beam of light that passes through the window 804 and is received by a sensor will be different from the characteristics of the beam of light that passes through other portions of the edge ring 800. As such, the dynamic alignment systems and methods according to the principles of the present disclosure described above may be further configured to detect the position of the edge ring 800 by detecting the window 804. For example, the DA module 224 may be configured to determine the alignment of the edge ring 800 based on the detected window 804.

[0070] For example, the window 804 may correspond to a portion of the edge ring 800 that is polished or roughened relative to the rest of the edge ring 800. In one embodiment, the top surface 816 of the edge ring 800 is polished. Conversely, the top surface 820 of the stepped portion 808 is unpolished (or roughened), while the surface of the window 804 is polished (e.g., laser polished). That is, the window 804 has greater transparency than the rest of the stepped portion 808 to facilitate detection of the window 804.

[0071] As shown in the top view of stepped portion 808 in FIG. 8B , an upper portion 824 of window 804, which is ground on an upper surface 820 of stepped portion 808, may have a different size and / or shape than a lower portion 828 of window 804, which is ground on a lower surface 832 of stepped portion 808. For example, upper portion 824 may have a generally triangular shape (as shown), a rounded shape, etc. Conversely, lower portion 828 may be generally rectangular. Lower portion 828 may have a larger perimeter than upper portion 824 to allow a greater amount of light to be transmitted upward through window 804 and easily detected.

[0072] The foregoing description is merely exemplary in nature and is in no way intended to limit the disclosure, its application, or uses. The broad teachings of the present disclosure can be embodied in a variety of forms. Accordingly, while the present disclosure includes specific examples, the true scope of the present disclosure should not be limited to such examples, as other variations will become apparent upon review of the drawings, the specification, and the following claims. It should be understood that one or more steps within a method may be performed in a different order (or simultaneously) without altering the principles of the present disclosure. Furthermore, although each of the embodiments is described above as having particular features, any one or more of these features described with respect to any embodiment of the present disclosure can be implemented in other embodiments and / or combined with any features of other embodiments, even if such combination is not explicitly described. That is, the described embodiments are not mutually exclusive, and substituting one or more embodiments for one another remains within the scope of the present disclosure.

[0073] Spatial and functional relationships between elements (e.g., between modules, circuit elements, semiconductor layers, etc.) are described using various terms, including "connected," "engaged," "coupled," "adjacent," "next to," "on," "above," "below," and "disposed." In the above disclosure, when a relationship between a first element and a second element is described, unless explicitly described as "direct," the relationship may be a direct relationship where no other intervening elements exist between the first element and the second element, or an indirect relationship where one or more intervening elements (spatial or functional) exist between the first element and the second element. As used herein, the phrase "at least one of A, B, and C" should be interpreted to mean the logic (A or B or C) using a non-exclusive logical OR, and not to mean "at least one of A, at least one of B, and at least one of C."

[0074] In some implementations, the controller is part of a system, and may be part of the examples described above. Such systems may include semiconductor processing equipment, including one or more processing tools, one or more chambers, one or more processing platforms, and / or specific processing components (such as a wafer pedestal, gas flow system, etc.). These systems may be integrated with electronics for controlling system operation before, during, and after processing of a semiconductor wafer or substrate. The electronics, sometimes referred to as a "controller," may control various components or subparts of one or more systems. The controller may be programmed to control any of the processes disclosed herein, depending on the processing requirements and / or type of system. Such processes may include supplying process gases, temperature settings (e.g., heating and / or cooling), pressure settings, vacuum settings, power settings, radio frequency (RF) generator settings, RF matching circuit settings, frequency settings, flow rate settings, fluid supply settings, position and motion settings, wafer loading and unloading into the tool, and wafer loading and unloading into other transport tools and / or load locks connected or interfaced with the particular system.

[0075] Broadly, a controller may be defined as an electronic device having various integrated circuits, logic, memory, and / or software that receive instructions, issue instructions, control operations, enable cleaning operations, enable endpoint measurements, etc. Integrated circuits may include chips in the form of firmware that store program instructions, digital signal processors (DSPs), chips defined as application-specific integrated circuits (ASICs), and / or one or more microprocessors or microcontrollers that execute program instructions (e.g., software). Program instructions may be instructions communicated to the controller in the form of various individual settings (or program files) that define operational parameters for performing a particular process on or for a semiconductor wafer or for a system. The operational parameters, in some embodiments, may be part of a recipe defined by a process engineer to accomplish one or more processing steps during the fabrication of one or more layers, materials, metals, oxides, silicon, silicon dioxide, surfaces, circuits, and / or dies of a wafer.

[0076] In some embodiments, the controller may be part of or coupled to a computer that is integrated with, coupled to, or otherwise networked to the system, or a combination thereof. For example, the controller may be in the “cloud” or all or part of a fab host computer system. This allows for remote access of wafer processing. The computer may provide remote access to the system to monitor the current progress of a manufacturing operation, examine the history of past manufacturing operations, examine trends or performance criteria from multiple manufacturing operations, modify parameters of a current process, configure processing steps following a current process, or initiate a new process. In some examples, a remote computer (e.g., a server) can provide process recipes to the system over a network. Such a network may include a local network or the Internet. The remote computer may include a user interface that allows entry or programming of parameters and / or settings, which are then communicated from the remote computer to the system. In some examples, the controller receives instructions in the form of data. Such data identifies parameters for each of the processing steps performed during one or more operations. It should be understood that the parameters may be specific to the type of process being performed and the type of tool the controller is configured to interface with or control. Thus, as described above, the controller may be distributed, such as by including one or more individual controllers networked together and cooperating toward a common purpose, such as the processes and controls described herein. An example of a distributed controller for such purposes would include one or more integrated circuits on the chamber that are located remotely (e.g., at the platform level or as part of a remote computer) and communicate with one or more integrated circuits that are coupled to control the processes on the chamber.

[0077] Exemplary systems may include, but are not limited to, a plasma etch chamber or module, a deposition chamber or module, a spin rinse chamber or module, a metal plating chamber or module, a cleaning chamber or module, a bevel edge etch chamber or module, a physical vapor deposition (PVD) chamber or module, a chemical vapor deposition (CVD) chamber or module, an atomic layer deposition (ALD) chamber or module, an atomic layer etch (ALE) chamber or module, an ion implantation chamber or module, a tracking chamber or module, and any other semiconductor processing system that may be associated with or used in the fabrication and / or manufacturing of semiconductor wafers.

[0078] As described above, depending on the process step or steps being performed by the tool, the controller may communicate with one or more of the other tool circuits or modules, other tool components, cluster tools, other tool interfaces, adjacent tools, nearby tools, tools located throughout the factory, a main computer, another controller, or tools used in material transport to and from tool locations and / or load ports of wafers within a semiconductor manufacturing factory.

Claims

1. 1. A system comprising: a carrier plate configured to support the edge ring; a robot configured to transport the edge ring within a substrate processing system; an imaging device configured to detect the edge ring feature; a substrate aligner configured to adjust a rotational position of the edge ring relative to an end effector of the robot by rotating the carrier plate based on the detected features; Equipped with the robot is configured to retrieve the carrier plate with the end effector, retrieve the edge ring using the carrier plate supported by the end effector, and transport the carrier plate and the edge ring to the substrate aligner; The system, wherein the substrate aligner is configured to adjust the rotational position of the edge ring to align the features of the edge ring with features of a substrate support.

2. 10. The system of claim 1, The system, wherein the imaging device is configured to detect the features of the edge ring while the edge ring and the carrier plate are positioned on the substrate aligner.

3. 10. The system of claim 1, the feature is a flat area on an inner diameter of the edge ring.

4. A system comprising: a carrier plate configured to support the edge ring; a robot configured to transport the edge ring within a substrate processing system; an imaging device configured to detect the edge ring feature; a substrate aligner configured to adjust a rotational position of the edge ring relative to an end effector of the robot by rotating the carrier plate based on the detected features; Equipped with the robot is configured to retrieve the carrier plate with the end effector, retrieve the edge ring using the carrier plate supported by the end effector, and transport the carrier plate and the edge ring to the substrate aligner; The system wherein the surface of the edge ring is entirely polished, and the features correspond to at least one of an unpolished portion and a roughened portion of the edge ring.

5. A system comprising: a carrier plate configured to support the edge ring; a robot configured to transport the edge ring within a substrate processing system; an imaging device configured to detect the edge ring feature; a substrate aligner configured to adjust a rotational position of the edge ring relative to an end effector of the robot by rotating the carrier plate based on the detected features; Equipped with the robot is configured to retrieve the carrier plate with the end effector, retrieve the edge ring using the carrier plate supported by the end effector, and transport the carrier plate and the edge ring to the substrate aligner; The system wherein the surface of the edge ring is not entirely polished and the features correspond to polished portions of the edge ring.

6. A system comprising: a carrier plate configured to support the edge ring; a robot configured to transport the edge ring within a substrate processing system; an imaging device configured to detect the edge ring feature; a substrate aligner configured to adjust a rotational position of the edge ring relative to an end effector of the robot by rotating the carrier plate based on the detected features; Equipped with the robot is configured to retrieve the carrier plate with the end effector, retrieve the edge ring using the carrier plate supported by the end effector, and transport the carrier plate and the edge ring to the substrate aligner; the features include at least one of (i) a notch disposed on a bottom surface of the edge ring, or (ii) a window in the edge ring, the window providing for the transmission of light through the edge ring.

7. A system comprising: a carrier plate configured to support the edge ring; a robot configured to transport the edge ring within a substrate processing system; an imaging device configured to detect the edge ring feature; a substrate aligner configured to adjust a rotational position of the edge ring relative to an end effector of the robot by rotating the carrier plate based on the detected features; Equipped with the robot is configured to retrieve the carrier plate with the end effector, retrieve the edge ring using the carrier plate supported by the end effector, and transport the carrier plate and the edge ring to the substrate aligner; (i) the edge ring is coated and the features correspond to uncoated portions of the edge ring, or (ii) the edge ring is uncoated and the features correspond to coated portions of the edge ring.

8. 10. The system of claim 1, The system further comprises a dynamic alignment module configured to determine the rotational position of the edge ring relative to the end effector based on the features of the edge ring detected by the imaging device, wherein the substrate aligner is configured to rotate the carrier plate and the edge ring based on the rotational position of the edge ring determined by the dynamic alignment module.

9. 10. The system of claim 1, The substrate aligner is configured to rotate the carrier plate and the edge ring based on a desired rotational position of the edge ring relative to the end effector.

10. A system comprising: a carrier plate configured to support the edge ring; a robot configured to transport the edge ring within a substrate processing system; an imaging device configured to detect the edge ring feature; a substrate aligner configured to adjust a rotational position of the edge ring relative to an end effector of the robot by rotating the carrier plate based on the detected features; Equipped with the robot is configured to retrieve the carrier plate with the end effector, retrieve the edge ring using the carrier plate supported by the end effector, and transport the carrier plate and the edge ring to the substrate aligner; the carrier plate includes a plurality of tabs extending from respective corners of a body of the carrier plate, the periphery of the body being smaller than an inner diameter of the edge ring, and the plurality of tabs extending beyond the inner diameter of the edge ring.

11. 11. The system of claim 10, At least two of the plurality of tabs include elastomeric pads.

12. 11. The system of claim 10, The system wherein the bottom surface of the carrier plate includes a contact sheet containing a thermoplastic material.

13. 13. The system of claim 12, The contact sheet is disposed in a recess in the bottom surface of the carrier plate.

14. A system comprising: a carrier plate configured to support the edge ring; a robot configured to transport the edge ring within a substrate processing system; an imaging device configured to detect the edge ring feature; a substrate aligner configured to adjust a rotational position of the edge ring relative to an end effector of the robot by rotating the carrier plate based on the detected features; Equipped with the robot is configured to retrieve the carrier plate with the end effector, retrieve the edge ring using the carrier plate supported by the end effector, and transport the carrier plate and the edge ring to the substrate aligner; The system, wherein the carrier plate includes rounded corners.

15. 15. The system of claim 14, The rounded corners of the carrier plate define a perimeter corresponding to a diameter of a substrate.

16. 16. The system of claim 15, The system wherein the diameter is 300 mm.

17. 1. A method comprising: The robot in the substrate processing system removing a carrier plate using an end effector of the robot; removing an edge ring using the carrier plate supported by the end effector; controlling for transporting the carrier plate and the edge ring to a substrate aligner configured to adjust a respective rotational position of the edge ring; detecting features of the edge ring while the edge ring and the carrier plate are disposed on the substrate aligner; adjusting the rotational position of the edge ring by rotating the carrier plate to align the features of the edge ring with features of a substrate support while the carrier plate and the edge ring are disposed on the substrate aligner; A method comprising:

18. 18. The method of claim 17, the feature is a flat area on the inner diameter of the edge ring; the surface of the edge ring is entirely polished and the features correspond to unpolished and / or roughened portions of the edge ring; or The method of claim 1, wherein the surface of the edge ring is not entirely polished, and the features include at least one of the features corresponding to a polished portion of the edge ring.

19. 20. The method of claim 18, The method further comprises determining a rotational position of the edge ring relative to the end effector based on the detected edge ring characteristics, and rotating the carrier plate and the edge ring based on the determined rotational position of the edge ring.

20. 1. A system comprising: a carrier plate configured to support the edge ring; a robot configured to transport the edge ring within a substrate processing system; an imaging device configured to detect the edge ring feature; a substrate aligner configured to adjust a rotational position of the edge ring relative to an end effector of the robot by rotating the carrier plate based on the detected features; Equipped with the robot is configured to retrieve the carrier plate with the end effector, retrieve the edge ring using the carrier plate supported by the end effector, and transport the carrier plate and the edge ring to the substrate aligner; The system, wherein the substrate aligner is further configured to adjust the rotational position of the carrier plate before returning the carrier plate to a buffer.

21. A system comprising: a carrier plate configured to support the edge ring; a robot configured to transport the edge ring within a substrate processing system; an imaging device configured to detect the edge ring feature; a substrate aligner configured to adjust a rotational position of the edge ring relative to an end effector of the robot by rotating the carrier plate based on the detected features; Equipped with the robot is configured to retrieve the carrier plate with the end effector, retrieve the edge ring using the carrier plate supported by the end effector, and transport the carrier plate and the edge ring to the substrate aligner; the features include a plurality of notches, and the substrate aligner is configured to adjust the rotational position of the edge ring to align the notches to receive lift pins through a substrate support.

22. A system comprising: a carrier plate configured to support the edge ring; a robot configured to transport the edge ring within a substrate processing system; an imaging device configured to detect the edge ring feature; a substrate aligner configured to adjust a rotational position of the edge ring relative to an end effector of the robot by rotating the carrier plate based on the detected features; Equipped with the robot is configured to retrieve the carrier plate with the end effector, retrieve the edge ring using the carrier plate supported by the end effector, and transport the carrier plate and the edge ring to the substrate aligner; The system, wherein the substrate aligner is configured to adjust a linear position of the edge ring to facilitate centering of the edge ring on a substrate support.

23. A system comprising: a carrier plate configured to support the edge ring; a robot configured to transport the edge ring within a substrate processing system; an imaging device configured to detect the edge ring feature; a substrate aligner configured to adjust a rotational position of the edge ring relative to an end effector of the robot by rotating the carrier plate based on the detected features; Equipped with the robot is configured to retrieve the carrier plate with the end effector, retrieve the edge ring using the carrier plate supported by the end effector, and transport the carrier plate and the edge ring to the substrate aligner; The robot is configured to adjust an approach angle of the end effector to remove the edge ring from the substrate aligner.

24. 10. The system of claim 1, The substrate aligner is configured to detect a second feature on the substrate and align the substrate based on the detected second feature.

25. 21. The system of claim 20, The robot is configured to remove the edge ring with the carrier plate rotationally aligned.

26. The system of claim 1, The imaging device is projecting one or more beams toward an end effector of the robot; sensing an interruption of the beam by the edge ring; configured to determine a position of the edge ring on the end effector based on a pattern indicative of an interrupted beam; The system further receives position data including the pattern from the imaging device; determining the rotational position of the edge ring relative to the end effector based on the position data; configured to determine a rotational offset between the rotational position of the edge ring and the desired rotational position of the edge ring by comparing the pattern included in the position data to a predetermined pattern indicative of a desired rotational position of the edge ring on the end effector; The substrate aligner is configured to adjust the rotational position of the edge ring relative to the end effector by rotating the carrier plate based on the rotational offset.

Images