Substrate processing method and substrate processing apparatus

By dynamically adjusting video data capture and processing conditions based on substrate processing stages, the system addresses high computational loads, ensuring efficient monitoring and abnormality detection in substrate processing systems.

JP7727686B2Active Publication Date: 2025-08-21TOKYO ELECTRON LTD
View PDF 7 Cites 0 Cited by

Patent Information

Application Number
JP2023110512
Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Priority Date
2019-11-15
Filing Date
2023-07-05
Publication Date
2025-08-21
Estimated Expiration
2040-11-04

AI Technical Summary

Technical Problem

Existing substrate processing systems face high processing loads on computers due to the capture and analysis of high-resolution video data during monitoring, which can lead to inefficiencies and resource constraints.

Method used

A monitoring device and method that adjust the resolution and frame rate of video data capture and processing based on the specific stages of substrate processing, reducing the computational load by generating monitoring video data with varying conditions for different processing phases.

Benefits of technology

This approach reduces the computational burden on computers by optimizing video data processing, allowing for efficient monitoring of substrate processing without compromising the detection of abnormalities.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure 0007727686000001
    Figure 0007727686000001
  • Figure 0007727686000002
    Figure 0007727686000002
  • Figure 0007727686000003
    Figure 0007727686000003
Patent Text Reader

Abstract

To reduce a processing load of a computer when monitoring substrate processing on the basis of captured moving-images.SOLUTION: A monitoring device according to one aspect of the present disclosure is designed to monitor a substrate processing device, comprising a holding unit that holds a substrate, and a process liquid supply unit that discharges process liquid from a nozzle and thereby supplies the process liquid to a surface of the substrate that is held by the holding unit. This monitoring device comprises: an imaging unit that is capable of capturing images of the nozzle and the surface of the substrate being held by the holding unit; a monitoring data generation unit that generates moving-image data for monitoring on the basis of the captured moving-image data by the imaging unit, while substrate processing by the substrate processing device, including a first and a second process, is underway; and a monitoring condition change unit that changes a condition for generation of moving-image data for monitoring while execution of substrate processing is underway, so that at least a resolution or a frame number of the moving-image data for monitoring during execution of the second process is different, as compared with the moving-image data for monitoring during execution of the first process.SELECTED DRAWING: Figure 6
Need to check novelty before this filing date? Find Prior Art

Citation Information

Patent Citations

  • Liquid treatment apparatus and method, and storage medium

    JP2008135679A

  • Liquid processing method, substrate processing apparatus and computer-readable recording medium

    JP2015153903A

  • Substrate processing apparatus and substrate processing method

    JP2015173204A

  • Wafer processing apparatus and adjustment method for wafer processing apparatus

    JP2017183493A

  • Substrate processing apparatus and substrate processing method

    JP2019062007A