Imaging method and imaging device

By using a light source with multiple light-emitting points to superimpose light-emitting pattern switching on spatial modulation, the method addresses the slow mask pattern switching issue in conventional single-pixel imaging, achieving faster image acquisition and reconstruction.

JP7742364B2Active Publication Date: 2025-09-19FUJIFILM CORP
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Patent Information

Application Number
JP2022575583
Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Priority Date
2021-01-12
Filing Date
2022-01-11
Publication Date
2025-09-19
Estimated Expiration
2042-01-11

AI Technical Summary

Technical Problem

Conventional single-pixel imaging technology is limited by the slow mask pattern switching speed of spatial light modulators, making it difficult to achieve high-speed image acquisition, especially for fine-grained images.

Method used

Employ a light source with multiple light-emitting points to superimpose light-emitting pattern switching on spatial modulation, enabling high-speed mask pattern switching by sequentially illuminating one or more light-emitting points for each mask pattern, and calculating the correlation between light intensity and mask images to reconstruct the target object image.

Benefits of technology

This approach significantly increases the input speed of single-pixel imaging by reducing the time required to acquire image information, allowing for faster mask pattern irradiation and image reconstruction.

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Abstract

In the present invention, with respect to a one-time mask pattern generated by a spatial modulating element, pixels of a mask image projected onto a target object are shifted by only a set distance, by turning on one light-emitting point of a light source, or sequentially two ore more thereof. The pixel shift amount of the mask pattern is determined by the position of the light-emitting points of the light sources that are turned on, and are known. A mask image corresponding to a plurality of mask patterns dependent on the position of the light-emitting points of the light sources and the spatial modulating element is projected onto the target object. A computer constructs an image of the target object by calculating the correlation between a light intensity detected by a detector and the mask image projected onto the target object. The foregoing provides an imaging device and an imaging method which can increase the speed of mask pattern projection in single pixel imaging, and can greatly increase the input speed of single pixel imaging.
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Description

[Technical Field]

[0001] The present invention relates to an imaging method and an imaging device that uses single pixel imaging technology, and more particularly to an imaging method and an imaging device that significantly increases the input speed of single pixel imaging. [Background technology]

[0002] A single-pixel imaging technique has been proposed in the past, in which intensity information obtained by superimposing an image of the target object on a known mask pattern is acquired using a large number of mask patterns, and the acquired intensity information is correlated with the group of mask patterns to image the target object (see Non-Patent Document 1). As described in Non-Patent Document 1, in conventional single-pixel imaging technology, light from a light source is collimated, and then an SLM (spatial light modulator) such as a DMD (digital mirror device) modulates the light with a mask image according to the mask pattern of a two-dimensional random mask, as shown in Figure 7(a), and irradiates the target object with the light. The light transmitted through or reflected from the target object is collected, and the intensity of the collected light is detected by a single photodetector. The mask patterns are then changed one after another, and the light intensity at the time each mask pattern is presented is recorded. The time-series data of light intensity thus obtained is represented, for example, by a single-column matrix (column vector) Y of detected values. The mask pattern at each time point is represented, for example, by an encoding matrix W. The image information (pixel data) of the target object is combined with a single-column matrix (column vector) X, which can be expressed as Y = WX. This can be expressed as X = W -1 The principle is that image information X of the target object can be restored by solving (or approximating) X for Y.

[0003] Figure 6 illustrates the principle of the single-pixel imaging technique described above. 6 is an apparatus that acquires image information of a target object 102, which is an object to be measured, by using the single-pixel imaging technique. The imaging apparatus 100 includes a light source 104, a collimator lens 106, a spatial modulation element 108, a condenser lens 110, a single photodetector 112, and a computer 114. Here, the collimator lens 106 collimates the light from the light source 104. The collimated light illuminates the spatial modulation element 108. The spatial modulation element 108 generates and presents multiple mask patterns 108a. The spatial modulation element 108 transmits or reflects collimated light from the collimator lens 106 according to one of the generated mask patterns 108a (only reflected light is shown in FIG. 6 ) to generate a modulated mask image (light) 109. When the mask image (light) 109 from the spatial modulation element 108 is irradiated onto the target object 102, the condenser lens 110 condenses all of the light transmitted through or reflected from the target object 102 onto a detector 112. The detector 112 detects the light intensity of all of the light condensed by one mask pattern 108a. The detector 112 is a non-imaging detector, and is a single-pixel detector having one light-receiving element.

[0004] 6, the plurality of mask patterns 108a generated by the spatial modulation element 108 are represented by, for example, mask patterns 1, 2, 3, ..., M. In this case, mask pattern 1 is a mask pattern of a two-dimensional rectangular matrix in which, for example, N pixels are arranged vertically and horizontally, and the two-dimensional N pixels are converted into a matrix of 1 row and N columns to obtain [W 11 , W 12 , ……, W 1N ]. Similarly, mask pattern 2 can be expressed as a 1-row N-column matrix [W 21 , W 22 , ……, W 2N ], and the mask pattern M is a 1-row N matrix [W M1 , W M2 , ……, W MN, M can be expressed as an encoding matrix W with M rows and N columns, as shown in FIG. 6 in association with the spatial modulation element 108. Note that the elements of the encoding matrix W, i.e., the elements W of 1, 2, 3, ..., M of each mask pattern, 11 , ……, W MN is not particularly limited, but can be, for example, 1 for transmission and 0 for reflection, or vice versa.

[0005]

number

[0006] In addition, when mask patterns 1, 2, 3, . . . , M presented in the spatial modulation element 108 are used, the detected values ​​of light intensity detected by the detector 112 are respectively Y1, Y2, . . . , Y M Then, as shown in FIG. 6 corresponding to the detector 112, it can be expressed as a matrix Y with M rows and 1 column expressed by the following equation (2). Here, image information (image data) of the target object 102 is represented as X1, X2, . . . , X N Then, as shown in FIG. 6 corresponding to the target object 102, it can be expressed as a matrix X with M rows and 1 column expressed by the following formula (3). As a result, the detection value Y can be expressed as Y=WX as equation (4), which can be expressed as the following equation (4) when expressed in a matrix, as shown above the imaging device 100 in Figure 6.

[0007]

number

[0008] The computer 114 can generate a plurality of two-dimensional mask patterns 1, 2, ..., M to be generated in the spatial modulation element 108, and therefore can be said to already have an encoding matrix W with M rows and N columns. In addition, the detection values ​​Y (Y1, Y2, ..., Y3) when the plurality of two-dimensional mask patterns 1, 2, ..., M are used can be expressed as M ) and the mask patterns 1, 2, ..., M, and therefore the encoding matrix W of M rows and N columns, have a correlation. As described above, the detected value Y, the encoding matrix W, and the image information X are expressed as Y = WX in the above equation (4). Therefore, the image information X is expressed as W -1 When the inverse matrix of the encoding matrix W is taken as X=W in equation (5), -1 Y, and this equation (5) can be expressed as the following equation (5) when expressed as a matrix. Therefore, the detected values ​​Y (Y1, Y2, ..., Y M ) and the encoding matrix W, the image information of the object 102, that is, the image data X (X1, X2, . . . , X N ) can be calculated by the following formula (5). The correlation between the encoding matrix W, the detected value Y, and the image information X can be obtained in advance by actual measurement.

[0009]

number

[0010] [Non-Patent Document 1] Research on Single Pixel Imaging 2018 Doctoral Dissertation (Optics) Tokushima University Graduate School of Advanced Technology and Science Education Department of Intelligent Mechanics Systems Engineering Kuki Shibuya Summary of the Invention [Problem to be solved by the invention]

[0011] As mentioned above, single-pixel imaging does not require an image sensor, but can use a single detector, thereby achieving high sensitivity that cannot be achieved with image sensors such as CMOS (complementary metal-oxide semiconductor) or CCD (charge-coupled device). It also has the advantage of being able to perform imaging with a simple and inexpensive system, even in cases where an image sensor does not exist, or where the wavelength range is expensive, such as the infrared or ultraviolet range, or where weak light requires measurement at the photon-counting level. On the other hand, obtaining high-resolution image information requires a mask with the same number of mutually independent mask patterns as the number of pixels in the image to be reproduced. However, in conventional single-pixel imaging technology, mask pattern generation (presentation) was performed by the spatial modulation element alone. As a result, with conventional technology, because the mask pattern was generated by the spatial modulation element alone, the mask switching speed was limited by the response speed of the spatial modulation element, and there was a problem that sufficient speed could not be achieved.

[0012] As described above, the conventional single-pixel imaging method has the drawback of making it difficult to acquire high-speed images because the repetition frequency of the mask pattern is limited by the response speed of the spatial light modulator. In other words, the image acquisition speed of single-pixel imaging depends on the switching speed of the mask pattern of the spatial light modulator. The mask pattern switching speed is, for example, on the order of kilohertz for a liquid crystal spatial light modulator and about 20 kilohertz for a DMD. This requires a number of mask patterns on the order of 1,000 to 20,000 per second. This means that when attempting to capture a fine-grained image, the total number of pixels becomes large, which takes a long time and makes it impossible to acquire a changing image. For this reason, technology has been developed that can compress mask information, i.e., the number of mask patterns, using information-theoretic methods, but this still poses the problem of requiring masks that are approximately 30 to 40% of the number of pixels.

[0013] Non-Patent Document 1 also discloses various single imaging techniques that compensate for this drawback, but they are not sufficient. A sub-pixel shift method is applied to the single pixel imaging technique disclosed in Non-Patent Document 1 to shift pixels and reduce the amount of mask information required, but because it relies on mechanical operations such as moving a single light source or mirror, high-speed mask modulation is impossible, and there is a problem in that it is not possible to achieve sufficient speed.

[0014] The present invention aims to solve the problems and issues of the above-mentioned conventional technology, and to provide an imaging method and imaging device that uses a light source having multiple light-emitting points as a light source, and by superimposing the light-emitting pattern switching of the multiple light-emitting points of the light source on the modulation of a spatial modulation element, enables high-speed switching of the mask pattern at the response speed of the light source's light emission, thereby speeding up mask pattern irradiation in single-pixel imaging and significantly speeding up the input speed of single-pixel imaging. [Means for solving the problem]

[0015] In order to achieve the above object, an imaging method according to a first aspect of the present invention includes irradiating a spatial modulation element that generates a plurality of mask patterns with light from a light source having a plurality of light-emitting points, irradiating a target object with a mask image modulated in accordance with the mask pattern generated by the spatial modulation element, collecting light that has passed through or been reflected from the target object on which the mask image has been irradiated, and detecting the light intensity of the collected light with a detector, and detecting the correlation between a mask image corresponding to the mask pattern in which pixel shift has occurred by sequentially switching on and off one of the plurality of light-emitting points or two or more light-emitting points that are caused to emit light simultaneously for one mask pattern generated by the spatial modulation element and the light intensity detected by the detector when the mask image is irradiated on the target object, using the plurality of masks. This is an imaging method for acquiring an image of a target object by calculating, by a computer, all combinations of a mask pattern and a light emission pattern of sequentially switched light emission points, wherein, for a single mask pattern generated by a spatial modulation element, one or two or more light emission points of the light source are sequentially turned on, so that the pixels of the mask image illuminated on the target object are shifted by a fixed distance, and the pixel shift amount of the mask pattern, which is determined by the position of the light emission points lit by the light source, is known, and the target object is illuminated with mask images corresponding to multiple mask patterns that depend on the positions of the spatial modulation element and the light emission points of the light source, and the computer constructs an image of the target object by calculating the correlation between the light intensity detected by the detector and the mask image illuminated on the target object.

[0016] In order to achieve the above object, an imaging device according to a second aspect of the present invention includes a light source having a plurality of light-emitting points, a spatial modulation element that generates a plurality of mask patterns, a first optical system for irradiating the spatial modulation element with light from the light-emitting points of the light source, a second optical system for irradiating an object with a mask image modulated in accordance with the mask pattern generated by the spatial modulation element, a detector that collects light transmitted through or reflected from the object on which the mask image is irradiated and detects the light intensity of the collected light, and a mask image according to the mask pattern in which pixel shift is generated by sequentially switching on and off one of the plurality of light-emitting points or two or more light-emitting points that are simultaneously made to emit light for one mask pattern generated by the spatial modulation element, and a detector that detects a pixel shift when the mask image is irradiated on the object when the mask image is irradiated on the object. and a computer that calculates the correlation between the light intensity detected by the detector and the mask image illuminated on the target object for all combinations of multiple mask patterns and the light emission patterns of the light emitting points that are switched on sequentially, and by sequentially lighting one or more of the light emitting points of the light source for one mask pattern generated in the spatial modulation element, the pixels of the mask image illuminated on the target object are shifted by a fixed distance, and the pixel shift amount of the mask pattern, which is determined by the position of the light emitting point that is lit by the light source, is known, and mask images corresponding to multiple mask patterns that depend on the positions of the spatial modulation element and the light emitting point of the light source, are illuminated on the target object, and the computer constructs an image of the target object by calculating the correlation between the light intensity detected by the detector and the mask image illuminated on the target object.

[0017] In the first and second aspects, the light source is preferably a vertical cavity surface emitting laser (VCSEL) array. Preferably, the light source is a light emitting diode (LED) array or an edge-emitting semiconductor laser array. Furthermore, the spatial light modulation element is preferably a digital mirror device (DMD) or a liquid crystal spatial light modulation element (SLM). Furthermore, it is preferable that one of the light emitting points of the light source, or two or more that are made to emit light simultaneously, be sequentially moved and turned on between the generation of a mask image of a mask pattern of the spatial modulation element and the generation of a mask image of the next mask pattern. Furthermore, it is preferable that the amount of pixel shift caused by movement of the position of the light emitting point of the light source in the mask pattern irradiated onto the target object is 10% or more of one pixel in either the vertical or horizontal direction.

[0018] Furthermore, the optical system consisting of the first optical system and the second optical system from the light source to the target object is preferably a telecentric optical system. Preferably, the first optical system has a collimator lens between the light source and the spatial light modulation element, and the spatial light modulation element is disposed on the back focal plane of the collimator lens. Furthermore, it is preferable that the mask pattern generated by the spatial modulation element does not have a periodic structure within the range of pixel shift generated by sequentially switching and lighting the light emitting points. Furthermore, the mask pattern generated by the spatial modulation element is preferably a random pattern or a Hadamard pattern. [Effects of the Invention]

[0019] According to the present invention, by using a light source having a plurality of light-emitting points as the light source, and superimposing the light-emitting pattern switching of the plurality of light-emitting points of the light source on the modulation of the spatial modulation element, it is possible to perform high-speed switching of the mask pattern at the response speed of the light source, thereby speeding up the mask pattern irradiation in single-pixel imaging and providing an imaging method and imaging device that can significantly speed up the input speed of single-pixel imaging. [Brief explanation of the drawings]

[0020] [Figure 1] 1 is a schematic diagram illustrating an example of an imaging apparatus for carrying out an imaging method of the present invention. [Figure 2]2 is a plan view showing an example of a VCSEL (vertical cavity surface emitting laser) array used as a light source in the imaging device shown in FIG. 1. FIG. [Figure 3] 2 is a schematic side view showing a pixel shifting optical system in the imaging device shown in FIG. 1. [Figure 4] FIG. 1(a) is a schematic diagram showing the mask presentation time in a conventional single-pixel imaging method without pixel shifting, and FIG. 1(b) is a schematic diagram showing the mask presentation time in the single-pixel imaging method of the present invention with pixel shifting. [Figure 5] (a) is a diagram showing an original image of 64 × 64 pixels, and (b) and (c) are diagrams showing the relationship between the reconstructed image in a conventional single-pixel imaging method without pixel shifting, and the reconstructed image in the single-pixel imaging method of the present invention with pixel shifting, and the number of generated random masks, respectively. [Figure 6] FIG. 1 is a schematic diagram illustrating the principle of single pixel imaging technology. [Figure 7] (a) is a diagram showing 16 4x4 binary illumination random masks, (b) is a diagram showing 16 4x4 binary illumination Hadamard masks, and (c) is a diagram showing an enlarged view of one of the 16 Hadamard masks shown in (b). DETAILED DESCRIPTION OF THE INVENTION

[0021] DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An imaging method and an imaging apparatus according to the present invention will be described in detail below with reference to preferred embodiments shown in the accompanying drawings. The following description of the components will be given based on a representative embodiment of the present invention, but the present invention is not limited to such an embodiment. FIG. 1 is a schematic diagram showing an example of an imaging apparatus of the present invention for carrying out an imaging method of the present invention.

[0022] The imaging device 10 of the present invention shown in Figure 1 is an imaging device that implements the imaging method of the present invention, and is a device that acquires image information of a target object 12 based on the principle of the single-pixel imaging technology shown in Figure 6. The imaging device 10 shown in FIG. 1 includes a light source 14 having a plurality of light-emitting points, a collimator lens 16, a spatial modulation element 18, a condenser lens 20, a single photodetector 22, and a computer 24. In the imaging device 10 shown in Figure 1, the light source 14 is a light source having a plurality of light-emitting points 15 (15a, 15b, and 15c in the example shown in Figure 1), and the light-emitting points 15 are switched at high speed for one pattern of the spatial modulation element 18, thereby shifting the pixels of the mask pattern irradiated onto the target object 12 to be observed.

[0023] The light source 14 is a light source having a plurality of light-emitting points 15 (15a, 15b, 15c in the example shown in FIG. 1). The light source 14 is a light source that can switch one of the plurality of light-emitting points 15, or two or more light-emitting points 15 that emit light simultaneously, at high speed, that is, can be sequentially switched to light up. Here, sequentially switching to light up the light-emitting points 15 of the light source 14 means that the light-emitting points 15 are switched on and off within a time period corresponding to the light-emitting frequency, for example, if the light-emitting frequency of the light source 14 is 10 MHz, the light-emitting points 15 are switched on and off within a time period corresponding to the light-emitting frequency of the light source 14. -7 This means that the light is emitted for only a period of 10 seconds (sec) and the previous light-emitting point 15 is naturally turned off when the next light-emitting point 15 is switched on. In the present invention, the switching speed of the multiple light-emitting points 15, i.e., the switching speed of light emission, i.e., the switching speed of lighting, needs to be faster than the switching speed of the mask pattern of the spatial modulation element 18, which will be described later. That is, the light source 14 needs to sequentially move and light up one of the plurality of light-emitting points 15, or two or more light-emitting points that are to be simultaneously lighted, between the generation of one mask pattern on the spatial modulation element 18 and the generation of the next mask pattern. Here, the light source 14 needs to be able to light up a plurality of light-emitting points 15 for one mask pattern generated on the spatial modulation element 18, but it is preferable that the light source 14 be able to sequentially light up at least 10 or more light-emitting points 15, and more preferably be able to sequentially light up all of the light-emitting points 15. 1 shows only three light-emitting points 15a, 15b, and 15c as the multiple light-emitting points 15. When light-emitting point 15a emits light, light shown by the dotted line is emitted, when light-emitting point 15b emits light, light shown by the solid line is emitted, and when light-emitting point 15c emits light, light shown by the dashed line is emitted.

[0024] Such light source 14 is not particularly limited as long as it has a plurality of light-emitting points 15, but is preferably an array-type light source capable of high-speed switching of the positions of the light-emitting points 15 of the light source 14. Examples of such light source 14 include a VCSEL (Vertical Cavity Surface Emitting Laser) array, a light-emitting diode (LED) array, an edge-emitting semiconductor laser array, etc., which emit laser light perpendicular to the light plane from a plurality of light-emitting points 15. Among these, a VCSEL array is more preferable as the light source 14 from the viewpoints that it is a point light source, can be easily formed into an array, and has already been put to practical use. 2 shows a VCSEL array having 32 (4 × 8) light-emitting points as an example of a preferred light source 14. This VCSEL array is manufactured by Fuji Xerox Co., Ltd. (see Surface-Emitting Laser Diode (VCSEL) - Application of VCSEL Array to Copiers - (Paper of the Imaging Society of Japan, Vol. 44, No. 3 (2005))).

[0025] The collimator lens 16 is used to collimate the light from the light source 14 and irradiate the spatial modulation element 18. As the collimator lens 16, a telecentric lens manufactured by ThorLABS, such as AC508-100-A, can be used. Here, the configuration from light source 14 through collimator lens 16 to spatial modulation element 18 constitutes a first optical system for irradiating light from light emitting point 15 of light source 14 onto spatial modulation element 18. Therefore, it can be said that the first optical system has collimator lens 16 between light source 14 and spatial modulation element 18.

[0026] The light beams indicated by the dotted lines, solid lines, and dashed lines emitted from the three light-emitting points 15a, 15b, and 15c of the light source 14 shown in FIG. 1 are shown to be collimated (parallel light) by the collimator lens 16. The light indicated by the solid line emitted from the light-emitting point 15b at the center of the light source 14 is symmetrical with respect to the optical axis of the first optical system, and is converted by the collimator lens 16 into collimated light parallel to the optical axis of the first optical system. In contrast, the light indicated by the dotted line emitted from light-emitting point 15a on the upper side of light source 14 becomes light angled slightly downward with respect to the optical axis of the first optical system, and is converted by collimator lens 16 into collimated light angled slightly downward with respect to the optical axis of the first optical system. Furthermore, the light indicated by the dashed-dotted line emitted from light-emitting point 15c on the lower side of light source 14 becomes light angled slightly upward with respect to the optical axis of the first optical system, and is converted by collimator lens 16 into collimated light angled slightly upward with respect to the optical axis of the first optical system.

[0027] The spatial modulation element 18 is a two-dimensional spatial modulation element that generates a plurality of mask patterns. The spatial modulation element 18 transmits or reflects collimated light from the collimator lens 16 in accordance with one of the generated mask patterns to generate a modulated mask image (light) 19, and irradiates the generated mask image (light) 19 onto the target object 12. The spatial light modulation element 18 used in the present invention is not particularly limited as long as it can generate multiple mask patterns, but it is preferably a digital mirror device (DMD) or a liquid crystal spatial light modulator (LCSLM). Here, the configuration from the spatial modulation element 18 to the target object 12 constitutes a second optical system that irradiates the target object 12 with a mask image 19 modulated according to the mask pattern 18a generated by the spatial modulation element 18.

[0028] 1, for the sake of simplicity, the spatial modulation element 18 is depicted as generating a rectangular mask pattern 18a having 16 elements (4×4), with only two colored elements transmitting or reflecting light, and the remaining elements reflecting or transmitting light. However, the number of elements in the spatial modulation element 18 is not particularly limited, but it is preferable that it be large. Here, it is more preferable that the product of the number of elements in the spatial modulation element 18 and the number of switchings of the light-emitting points 15 of the light source 14 that are sequentially switched in one mask pattern 18a presented by the spatial modulation element 18 is the total number of pixels of the target object 12. The size of each element of the mask pattern generated by the spatial modulation element 18 is not particularly limited as long as image information of all pixels of the target object 12 can be acquired, but it is preferable that the size be the same as the number of pixels required for the image information of the target object 12. Furthermore, in the present invention, pixel shifting is performed for one mask pattern by switching the light emission pattern, which sequentially changes the light emitting points 15 of the light source 14, so the size may be larger than the number of pixels required for the image information of the target object 12, but in that case, it is preferable that the amount of pixel shifting is the same as the number of pixels required for the image information.

[0029] As shown in FIG. 1, mask images 19a, 19b, and 19c modulated according to a mask pattern 18a generated by a spatial modulation element 18 are projected onto a target object 12. Here, mask image 19b indicated by the solid line is a mask image (light) obtained by modulating straight, unshifted collimated light parallel to the optical axis, which is emitted from light-emitting point 15b at the center of light source 14 and radiated symmetrically about the optical axis, collimated by collimator lens 16, with mask pattern 18a of spatial modulation element 18. Therefore, mask image (light) 19b irradiates target object 12 from the front without any shift, and matches mask pattern 18a with no pixel shift.

[0030] In contrast, mask image 19a indicated by the dotted line is a mask image (light) obtained by emitting light from light-emitting point 15a on the upper side of light source 14 and radiating it slightly downward, and then collimating the collimated light slightly downward with respect to the optical axis by collimator lens 16, and modulating the collimated light by mask pattern 18a of spatial modulation element 18. Therefore, mask image (light) 19a irradiates target object 12 with a pixel shift to the lower left, and is pixel-shifted slightly downward and left relative to mask image (light) 19b that matches mask pattern 18a. Furthermore, mask image 19c indicated by the dotted line is a mask image (light) obtained by emitting light from light-emitting point 15c on the lower side of light source 14 and radiating it slightly upward, and then collimating the collimated light slightly upward by collimator lens 16, and modulating the collimated light by mask pattern 18a of spatial modulation element 18. Therefore, mask image (light) 19c irradiates target object 12 with a slight pixel shift to the upper right, and is slightly pixel-shifted upward and to the right with respect to mask image (light) 19b that matches mask pattern 18a.

[0031] In this invention, for one mask pattern 18a of the spatial modulation element 18, multiple (P) times, in the illustrated example three (3) light-emitting points 15 (15a, 15b, 15c) of the light source 14 are used to perform light-emitting pattern switching for one mask pattern 18a, thereby generating P (pieces), in the illustrated example three (pieces), mask images 19a, 19b, 19c. On the other hand, when a light source 104 that does not have multiple light-emitting points is used, as in the conventional technology shown in Figure 6 above, only one mask image 109 can be generated for one mask pattern of the spatial modulation element 108.

[0032] Here, when the number of pixels of the target object 12 is N, it is generally necessary to generate N mask images 19 (images). Therefore, in the prior art, the number of mask patterns that need to be generated in the spatial modulation element 108 is also N, and the repetition frequency of the N mask patterns is limited by the response speed of the spatial modulation element 108. If the mask pattern switching time is t, then the time required to obtain image information for all pixels of the target object 12 is Nt. In contrast to this, in the present invention, P mask images 19 can be generated by performing P light emission pattern switching for one mask pattern 18a of the spatial modulation element 18, so the number of mask patterns that need to be generated in the spatial modulation element 18 can be set to N / P. As a result, the light emission time of the light emitting point 15 can be set to t e Then, the time required to obtain image information of all pixels of the target object 12 is (t+Pt e )N / P{=N(t / P+t e )} where the light emission time is t e is orders of magnitude shorter than the mask pattern switching time t, the time required to obtain image information of the target object 12 can be approximately Nt / P, thereby enabling faster mask pattern irradiation in single pixel imaging.

[0033] 2 is used as light source 14, and all 32 light-emitting points are sequentially turned on for one mask pattern 18a of spatial modulation element 18 to perform 32 light-emitting pattern switching, the number of mask patterns 18a generated by spatial modulation element 18 can be reduced to 1 / 32. Therefore, the time required to obtain image information for all pixels of target object 12 can be reduced to approximately 1 / 32, and the acquisition of image information can be sped up. In this way, by using an array light source 14 having multiple light-emitting points such as a VCSEL array as the light source used for single pixel imaging, the modulation of the spatial modulation element 18 is superimposed on the light emission pattern switching of the multiple light-emitting points 15 of the light source 14, making it possible to switch the mask pattern at high speed at the response speed of the light emission of the light-emitting points 15 of the light source 14, and thereby significantly increasing the input speed of single pixel imaging.

[0034] The pixel shift amount due to the movement of the position of the light emitting point 15 of the light source 14 in the mask image 19 corresponding to the mask pattern 18a generated by the spatial modulation element 18 and irradiated onto the target object 12 is preferably 10% or more of one pixel of the target object 12 in either the vertical or horizontal direction. The reason for this is that if it is less than 10%, it may fall within the error range of the detection value of the detector 22 itself. In addition, the area where all pixel shift patterns overlap must include the entire area of ​​the target object, and the pixel shift amount that satisfies this requirement is the upper limit of the pixel shift amount. On the other hand, it is preferable that the mask pattern 18a generated by the spatial modulation element 18 does not have a periodic structure within the range of pixel shift generated by sequentially switching on and lighting the light emitting points 15 of the light source 14. The reason for this is that if the mask pattern 18a has a periodic structure within the range of pixel shift, the same mask pattern will be obtained when pixel shift corresponding to the periodic structure is performed.

[0035] Furthermore, the mask pattern 18a generated by the spatial modulation element 18 is preferably a random pattern or a Hadamard pattern. A random pattern does not have a periodic structure, so even if pixels are shifted, the same mask pattern will not be obtained. An example of a random mask having such a random pattern is the 16 4x4 binary illumination mask shown in Figure 7(a) described in Non-Patent Document 1.

[0036] A Hadamard pattern is a mask pattern corresponding to a Hadamard matrix, which is a square matrix whose elements are either 1 or -1 and whose rows are orthogonal to each other. An example of a Hadamard mask having such a Hadamard pattern is the 16 4x4 binary illumination mask shown in Figure 7(b) described in Non-Patent Document 1. Here, n Hadamard masks used to illuminate an object can be created from a Hadamard matrix. There are two methods for generating a Hadamard mask: one is to extract each row or column of a Hadamard matrix, convert each into a two-dimensional array, and use it as a mask; and the other is to use an orthonormal basis as a mask. For example, in a Hadamard matrix, any two rows represent vectors that are perpendicular to each other. When used as a mask pattern, -1 is replaced with 0, and a binary mask of 1 and 0 is used. That is, the Hadamard mask shown in Figure 7(c), which shows an enlarged view of one of the 16 Hadamard masks shown in Figure 7(b), is a binary mask in which a white background represents +1 and a black background represents 0. This is called a Hadamard mask. It is known that using such a Hadamard mask enables the formation of images with less noise than a random mask, making it effective for high-precision imaging.

[0037] In Figure 1, the path that light emitted from each light-emitting point 15 of the light source 14 takes to reach the target object 12 is not shown, but in Figure 3, the path that light emitted from each light-emitting point 15 of the light source 14 takes to reach the target object 12 is shown as a light ray. The results shown in Figure 3 are the results of a simulation performed using ZMAX, a ray tracing lens design software, assuming that the light source 14 is a VCSEL array with three light-emitting points arranged at 5 mm intervals, the collimator lens 16 is a ThorLABS AC508-100-A telecentric lens, and the spatial modulation element 18 is a DMD.

[0038] As shown in Figure 3, the light ray indicated by the solid line emitted from the upper light-emitting point 15d of the light source 14, the light ray indicated by the dashed line emitted from the central light-emitting point 15e, and the light ray indicated by the broken line emitted from the lower light-emitting point 15f spread out as they travel, and are each narrowed down by an aperture 26 with a diameter of 40 mmφ provided on the light source 14 side of the collimator lens 16 before entering the collimator lens 16. In the collimator lens 16, the collimated light beams indicated by the solid lines, dashed lines, and broken lines each change angle slightly, forming a telecentric optical system, and are incident on the spatial modulation element 18. The collimated light beams indicated by the solid lines, dashed lines, and broken lines that have entered the spatial modulation element 18 are reflected from the spatial modulation element 18 to become a mask image (light) indicated by the solid lines, dashed lines, and broken lines that has the same predetermined mask pattern but with slight pixel shifts, and is irradiated onto the target object 12.

[0039] In this way, it is preferable that the optical system from the light source 14 to the target object 12, i.e., the optical system consisting of a first optical system for irradiating the spatial modulation element 18 with light from the light emitting point 15 of the light source 14, and a second optical system for irradiating the target object 12 with a mask image 19 modulated according to the mask pattern 18a generated by the spatial modulation element 18, is a telecentric optical system. That is, because the optical system from the light source 14 to the target object 12 is a telecentric optical system, the collimated light shown by the solid line, the dotted line, and the dashed line collimated by the collimator lens 16 is incident on the spatial modulation element 18 as is, reflected, and irradiated onto the target object 12, even though the angles are slightly different from each other. In this way, in the present invention, the relationship between the light source 14 using an array light source or the like and the collimator lens 16 is a telecentric optical system, so pixel shifting is possible.

[0040] 3, since there is a 5 mm offset between light-emitting points 15d and 15e, and between light-emitting points 15e and 15f, the light rays indicated by the solid lines, dashed lines, and dashed lines have offset optical axes and different angles. However, at the back focal plane of collimator lens 16, the light rays indicated by the solid lines, dashed lines, and dashed lines coincide and strike the back focal plane at the same location but at different angles. Therefore, if a spatial light modulator 18 is located at this back focal plane, the light rays indicated by the solid lines, dashed lines, and dashed lines can be irradiated onto target object 12 without wasting any of the pixels of spatial light modulator 18. Therefore, the spatial modulation element 18 is preferably disposed on the back focal plane of the collimator lens 16 .

[0041] Next, the condenser lens 20 has a function similar to that of the condenser lens 110 shown in Figure 6, and a mask image (light) 19 modulated according to a predetermined mask pattern 18a from the spatial modulation element 18 is irradiated onto the target object 12, and all light transmitted through or reflected by the target object 12 is condensed onto the detector 22. Detector 22 has the same function as detector 112 shown in Figure 6 and is a single pixel detector with one photodetector that detects the light intensity of all the light collected by collecting lens 20 in one mask image (light) 19.

[0042] In the imaging device 100 shown in Figure 6, multiple mask patterns 108a generated by the spatial modulation element 108 are given as mask patterns 1, 2, 3, ..., M, which directly become mask images (light) 109, and are therefore expressed as mask images (light) 1, 2, 3, ..., M, and mask images (light) 1, 2, 3, ..., M are irradiated onto the target object 102. In contrast, in the present invention, one or more of the plurality of light-emitting points of the light source 14 are sequentially and single-shot-emitted (turned on and off) for one mask pattern 18a generated in the spatial modulation element 18, and this is repeated P times, so that P mask images (light) 19 can be irradiated onto the target object 12. Therefore, if the number of mask patterns 18a generated in the spatial modulation element 18 is Q, the number of mask images (light) 19 irradiated onto the target object 12 is P×Q. If the number P×Q of mask images (light) 19 is set equal to the above-mentioned M (M=P×Q), then in the present invention as well, these can be expressed as mask images (light) 1, 2, 3, ..., M, and mask images (light) 1, 2, 3, ..., M are irradiated onto the target object 12.

[0043] In the present invention, instead of the multiple mask patterns 1, 2, 3, ..., M generated by the spatial modulation element 108 of the prior art shown in Figure 6, the multiple mask patterns 18a are not generated by the spatial modulation element 18, but rather the total number of mask images (light) 19 irradiated onto the target object 12 is set to M, thereby making it possible to obtain mask images 1, 2, 3, ..., M. At this time, the mask image 1 is a mask image of a two-dimensional rectangular matrix in which, for example, N pixels are arranged vertically and horizontally. The two-dimensional N pixels are converted into a matrix of 1 row and N columns, and [W 11 , W 12 , ……, W 1N ]. Similarly, the mask image 2 can be expressed as a 1-row N matrix [W 21 , W 22 , ……, W 2N ], and the mask image M is a 1-by-N matrix [W M1 , W M2 , ……, W MN ]. In this way, the mask images 1, 2, 3, ..., M are encoded using the M-row, N-column encoding matrix W(W ij ;i=1, 2, ..., M, j=1, 2, ..., N). Note that the encoding matrix W(W ij ) elements, i.e., elements 1, 2, 3, ..., M of each mask image W 11 , ……, WMN is not particularly limited, but can be, for example, 1 for transmission and 0 for reflection, or vice versa. As described above in detail, the pattern light irradiation in which the light emitting point 15 of the light source 14 is physically shifted is performed by using the encoding matrix W(W ij ), or the detected value Y. That is, for one mask pattern 18a generated by the spatial modulation element 18, the light emitting point 15 of the light source 14 is physically shifted to irradiate the target object 12 with pattern light, that is, the mask image (light) is changed and irradiated, thereby generating the encoding matrix W (W ij ) and obtain the detected value Y that reflects that change.

[0044] In the present invention, when mask images 1, 2, 3, ..., M are used to irradiate the target object 12, the detected values ​​of the light intensity detected by the detector 22 are defined as Y1, Y2, ..., Y M Then, as in the case of the above-mentioned conventional technique, it can be expressed as a matrix Y with M rows and 1 column expressed by the above-mentioned equation (2). Here, image information (image data) of the target object 12 is represented as X1, X2, . . . , X N Then, as in the case of the above-mentioned conventional technique, it can be expressed as a matrix X with M rows and 1 column expressed by the above-mentioned equation (3). As a result, the detected value Y can be expressed as Y=WX as in the above-mentioned conventional technique, as in the case of equation (4), and when expressed as a matrix, it can be expressed as equation (4) above.

[0045] The computer 24 performs pixel shifting of the mask pattern 18a to be irradiated onto the object 12 to be observed multiple (P) times by switching one or more of the multiple light emitting points 15 of the light source 14 at high speed for one two-dimensional mask pattern 18a generated in the spatial modulation element 18, thereby obtaining P mask images 19. In this way, the computer 24 performs the process of obtaining P mask images 19 based on the same mask pattern 18a for multiple (Q) two-dimensional mask patterns 18a, and can generate mask images 1, 2, ..., M, and therefore can be said to already have an encoding matrix W with M rows and N columns.

[0046] In addition, the computer 24 calculates the detected value Y (Y1, Y2, ..., Y) when a plurality of two-dimensional mask images 1, 2, ..., M are used. M ) and the mask images 1, 2, ..., M, and therefore the encoding matrix W of M rows and N columns. As described above, the detection value Y, the encoding matrix W, and the image information X are expressed as Y = WX in the above equation (4), so the image information X is expressed as W -1 When the inverse matrix of the encoding matrix W is taken as X=W in equation (5), -1 Y, and this equation (5) can be expressed as the above equation (5) when expressed as a matrix. Therefore, the detected values ​​Y (Y1, Y2, ..., Y M ) and the encoding matrix W are calculated by the computer 24, the image information of the object 12, that is, the image data X (X1, X2, ..., X N ) and X=W -1 Y, that is, the above formula (5). The correlation between the encoding matrix W, the detected value Y, and the image information X can be obtained in advance by actual measurement and stored in the computer 24. The imaging apparatus for carrying out the imaging method of the present invention has the above-described configuration.

[0047] The imaging method of the present invention will now be described with reference to the imaging device 10 shown in FIG. First, using the imaging device 10 configured as shown in FIG. 1, an initial two-dimensional mask pattern 18a is generated in the spatial modulation element 18, and this is designated as mask pattern 1. In a light source 14 having a plurality of light-emitting points 15, one light-emitting point 15 is turned on first, or two or more light-emitting points 15 are turned on simultaneously, and the light from the turned-on light-emitting points 15 is irradiated onto a spatial modulation element 18 generating a mask pattern 1. As a result, by superimposing the mask pattern 1 generated by the spatial modulation element 18 and the light from the lit light-emitting point 15, a mask image (light) 19 modulated according to the mask pattern 1 is generated, and is irradiated onto the target object 12 as the mask image (light) 1. Next, light transmitted through or reflected from the target object 12 illuminated with the mask image 1 is collected by a collecting lens 20, and the light intensity of the collected light is detected as a detection value Y by a detector 22. In this way, a detected value Y(Y1) of the light intensity due to the mask image 1 obtained by superimposing the first mask pattern 1 and the light emitting point 15 of the light source 14 that is turned on first can be obtained.

[0048] Next, while leaving the initial mask pattern 1 as it is, one or more light emitting points 15 of the light source 14 are switched in sequence, and the mask images 19 (mask images 2, ..., P) that are sequentially generated with pixel shifts are also switched, and the light intensity is detected by the detector 22 in the same manner. This is repeated P times in total until the switching of the light emitting points 15 of the light source 14 is completed, and the detected values ​​Y (Y2, ..., Y3) of the light intensity by the mask images 2, ..., P are detected. P ) can be obtained. Next, the spatial modulation element 18 sequentially generates a two-dimensional mask pattern 18a (mask pattern 2) different from the previous one, and similarly, while sequentially switching the light emitting point 15 of the light source 14, P mask images 19 are switched to obtain P light intensity detection values, and this is repeated while switching the mask pattern 18a from mask pattern 2, 3, ..., Q. Here, it is assumed that P × Q = M. In this way, M (=P×Q) detection values ​​Y (Y1, Y2, ..., Y) for M (=P×Q) types of mask images 1, 2, ..., M are obtained. M ) can be obtained.

[0049] Here, the computer 24 can calculate in advance that M (=P×Q) types of mask images 1, 2, ..., M, which are obtained by combining the above-mentioned Q number of switchings of mask pattern 18a and P number of switchings of the light emission pattern in one mask pattern 18a that depend on the position of the light emitting point 15 of the light source 14, can be represented by the encoding matrix W. Therefore, M (= P × Q) detected values ​​Y (Y1, Y2, ..., Y M ), the computer 24 can obtain the mask images 1, 2, ..., M of the target object 12 and the light intensity detection values ​​Y (Y1, Y2, ..., Y M ) to calculate the correlation with the image information (image data X(X1, X2, ..., X N That is, the computer 24 can construct the correlation between the encoding matrix W and the detection value Y, specifically, the above formula (5) X=W -1 By calculating Y, the image information of the target object 12, that is, the image data X (X1, X2, ..., X N ) can be obtained.

[0050] Here, the computer 24 calculates the correlation between the mask image 19 corresponding to the mask pattern 18a, which has pixel shifts generated by sequentially switching on one of the multiple light-emitting points 15 of the light source 14, or two or more light-emitting points 15 that are simultaneously illuminated, for a single mask pattern 18a generated by the spatial modulation element 18, and the light intensity detected by the detector 22 when the mask image 19 is irradiated onto the target object 12, for all combinations of multiple mask patterns and emission patterns that depend on the positions of the sequentially switched light-emitting points 15 of the light source 14, thereby obtaining all image information of the target object 12.

[0051] In the present invention, the target object 12 is illuminated with a mask image 19 corresponding to a plurality of mask patterns 18a that depend on the positions of the spatial modulation element 18 and the light emitting points 15 of the light source 14. At this time, by sequentially lighting one or more of the plurality of light emitting points 15 of the light source 14 for one mask pattern 18a generated by the spatial modulation element 18, the pixels of the mask image 19 illuminated on the target object 12 are shifted by a fixed distance. Furthermore, the pixel shift amount of the mask pattern 18a, which is determined by the position of the light emitting point 15 that lights up the light source 14, can be measured in advance and is therefore known.

[0052] The present invention introduces pixel shifting to a two-dimensional spatial modulation element 18 using an array-type light source 14 having light-emitting points at multiple positions, such as a VCSEL array, which is capable of switching the positions of the light-emitting points 15 of the light source 14 at high speed. That is, in the present invention, an array light source having light-emitting points arranged at multiple positions, such as a VCSEL array, is used as the light source 14 for projecting a mask pattern using a spatial modulation element 18, such as a DMD or a liquid crystal SLM. Therefore, by sequentially switching the light-emitting points 15 of the light source 14, which is capable of faster spatial modulation, for one mask pattern 18a of the spatial modulation element 18, it is possible to quickly shift the position of the mask pattern projected onto the target object 12, which is the object to be measured. As a result, it is possible to irradiate the target object 12 with multiple mask images (light) 19, each pixel-shifted, for one mask pattern 18a. This makes it possible to project many mask images 19 based on the mask pattern onto the target object 12 in a short period of time.

[0053] In the present invention, by shifting the pixels of the mask pattern 18a generated by the spatial modulation element 18 using a light source 14 having light-emitting points 15 at multiple positions, such as a VCSEL array that allows for faster switching, it is possible to improve the speed by a factor of up to the number of light-emitting points 15 or the number of arrays. By superimposing the light emission pattern switching of a light source 14 having light emitting points 15 at multiple positions, such as a VCSEL array, on the modulation of the spatial modulation element, it becomes possible to quickly switch the mask image 19 based on the mask pattern 18a at the response speed of the light source 14, such as a VCSEL array. Therefore, the present invention can achieve a significant increase in speed compared to conventional methods. Also, the present invention is highly practical because it can use an array light source such as a readily available VCSEL array, LED array, or edge-emitting semiconductor laser array as the light source 14. Furthermore, the present invention can also improve the resolution of the mask by adjusting the amount of pixel shift. The imaging method and imaging apparatus of the present invention are basically configured as described above.

[0054] Next, we compared the mask presentation time with and without pixel shifting. Here, it is assumed that a DMD with a mask pattern switching frequency of 10 kHz for the mask pattern 18a is used as the spatial modulation element 18, regardless of whether pixel shifting is performed or not. Also, it is assumed that a VCSEL array with a switching frequency of 10 MHz for the light source 14 is used to shift the pixels of the mask pattern 18a of the spatial modulation element 18, as in the imaging device 10 of the present invention shown in FIG. In the case of the imaging device 100 of the present invention shown in FIG. 6, when pixel shifting is not performed, a normal continuous light source is used as the light source 104.

[0055] As shown in FIG. 4(a), in the case of the conventional technology without pixel shifting, it takes 10 -4 It takes 1 second (sec). In the case of no pixel shift, the mask image irradiated onto the object to be measured is generated for each mask (mask pattern) generated by the DMD. Therefore, it is necessary to generate 10,000 masks (mask patterns) and generate 10,000 mask images, which means that 1 second (sec) is required.

[0056] In contrast, as shown in FIG. 4(b), in the case of the pixel shift of the present invention, pixel shifting was performed 10 times by the 10 MHz VCSEL array for one mask (mask pattern) generated by the 10 kHz DMD, so the time required for one mask (mask pattern) was (10 -4 +10×10 -7 ) seconds (sec). In this case, pixel shifting is performed 10 times for one mask (mask pattern), so 10 mask images are generated. In this case, too, the number of mask images projected onto the target object to be measured is 10,000, as in the case shown in Figure 4(a), but since 10 mask images are generated for one mask (mask pattern), the number of masks (mask patterns) required is 1,000 (=10,000 / 10).

[0057] From the above, when pixel shifting of the present invention is used, 1000 masks (mask patterns) are required, so (10 -4 +10×10 -7 )×1000=(0.1+10 -3 ) seconds (sec) are required. In other words, when obtaining image information of the same resolution (number of pixels), with the pixel shifting of the present invention, the number of masks (mask patterns) is reduced to 1 / 10 compared to the prior art without pixel shifting, which simplifies the process and also reduces the required time to approximately 1 / 10, making it approximately 10 times faster.

[0058] Next, a simulation was carried out to confirm the effect of pixel shifting according to the present invention. FIG. 5(a) shows an original image of 64×64 (=4096) pixels. Figure 5(b) shows the reproduced image for the number of random masks (random mask patterns) generated when pixel shifting is not used as in the conventional technology. Note that one random mask is generated per DMD modulation, so the number of random masks generated corresponds to the number of DMD modulations. In the case of the conventional technology shown in Figure 5(b) without pixel shifting, when the number of random masks (random mask patterns) generated is 256, the number of mask images projected onto the original image is also 256. With this number of images, the original image shown in Figure 5(a) is not reproduced at all, and sufficient reproduction is not observed even with 1024 and 2048 images. However, it can be seen that a reproduced image with the same resolution as the original image is obtained with 4096 images, the same number of pixels as the original image.

[0059] On the other hand, FIG. 5(c) shows the reconstructed image that is reconstructed with respect to the number of random masks that are generated when pixel shifting according to the present invention is performed. In this case, the number of masks required by the DMD when pixel shifting is performed assuming the light source is a 4x4 array light source. Because the light source has 16 light-emitting points, the simulation was performed assuming that pixel shifting is performed 16 times for one random mask (random mask pattern) generated by one modulation of the DMD. This simulation confirmed that with pixel shifting, compared to when there is no pixel shifting, an image is reproduced by generating a number of mask patterns divided by the number of pixel shifting points K (16 in this case).

[0060] That is, if pixel shifting can be performed 16 times on one random mask (random mask pattern), 16 mask images to be projected onto the original image can be generated. Therefore, since the number of mask images that can produce a reproduced image with the same resolution as the original image in the case of no pixel shifting in Fig. 5(b) is 4096, it can be seen that in the case of the pixel shifting of the present invention, in order to generate 4096 mask images, 256 (=4096 / 16) random masks (random mask patterns) should be generated by the DMD. FIG. 5(c) shows that a reconstructed image with the same resolution as the original image is obtained using 256 random masks (random mask patterns). From the above, the effects of the present invention are clear.

[0061] The imaging method and imaging device of the present invention have been described in detail above using various embodiments and examples, but the present invention is not limited to these embodiments and examples, and various improvements and modifications may be made without departing from the spirit and scope of the present invention. [Explanation of symbols]

[0062] 10, 100 Imaging equipment 12, 102 Target object 14,104 light sources 15, 15a, 15b, 15c, 15d, 15e, 15f Light emitting points 16, 106 collimator lens 18, 108 spatial modulation element 18a, 108a mask patterns 19, 19a, 19b, 19c, 109 Mask image (light) 20, 110 condenser lens 22, 112 Photodetector 24, 114 computers 26 Aperture

Claims

1. A method for detecting the intensity of the collected light by a detector, comprising: irradiating a spatial modulation element that generates a plurality of mask patterns with light from a light source having a plurality of light-emitting points; irradiating a target object with a mask image modulated in accordance with the mask patterns generated by the spatial modulation element; collecting light that has passed through the target object or that has been reflected from the target object on which the mask image has been irradiated; and detecting the intensity of the collected light by a detector, comprising: an imaging method for acquiring an image of a target object by calculating, by a computer, a correlation between a mask image corresponding to a mask pattern in which pixel shift has been generated by sequentially switching on and lighting one of the plurality of light-emitting points, or two or more of the light-emitting points that are caused to emit light simultaneously, for one mask pattern generated by the spatial modulation element, and the light intensity detected by the detector when the mask image is irradiated onto the target object, for all combinations of the plurality of mask patterns and the sequentially switched light-emitting patterns of the light-emitting points, one or more light emitting points of the light source are sequentially turned on for one mask pattern generated by the spatial modulation element, so that pixels of the mask image irradiated onto the target object are shifted by a predetermined distance; the pixel shift amount of the mask pattern determined by the position of the light emitting point of the light source is known; An imaging method characterized by illuminating the target object with a mask image corresponding to the plurality of mask patterns that depend on the positions of the spatial modulation element and the light emitting point of the light source, and constructing the image of the target object by calculating the correlation between the light intensity detected by the detector and the mask image illuminated on the target object.

2. The imaging method of claim 1 , wherein the light source is a vertical cavity surface emitting laser (VCSEL) array.

3. 2. The imaging method of claim 1, wherein the light source is a light emitting diode (LED) array or an edge-emitting semiconductor laser array.

4. 4. The imaging method according to claim 1, wherein the spatial modulation element is a digital mirror device (DMD) or a liquid crystal spatial modulation element.

5. The imaging method according to any one of claims 1 to 4, wherein one of the light emitting points of the light source, or two or more of the light emitting points that are caused to emit light simultaneously, is sequentially switched on and turned on between the generation of the mask image of the mask pattern of the spatial modulation element and the generation of the mask image of the next mask pattern.

6. 6. The imaging method according to claim 1, wherein the pixel shift amount due to movement of the position of the light emitting point of the light source in the mask pattern irradiated onto the target object is 10% or more of one pixel in either the vertical or horizontal direction.

7. 7. The imaging method according to claim 1, wherein an optical system from the light source to the target object is a telecentric optical system.

8. 8. The imaging method according to claim 1, further comprising a collimator lens between the light source and the spatial modulation element, the spatial modulation element being disposed on a back focal plane of the collimator lens.

9. The imaging method according to any one of claims 1 to 8, wherein the mask pattern generated by the spatial modulation element does not have a periodic structure within the range of pixel shift generated by sequentially switching and lighting the light-emitting points.

10. 10. The imaging method according to claim 1, wherein the mask pattern generated by the spatial modulation element is a random pattern or a Hadamard pattern.

11. a light source having a plurality of light emitting points; a spatial modulation element that generates a plurality of mask patterns; a first optical system for irradiating the spatial modulation element with light from the light emitting point of the light source; a second optical system that projects a mask image onto a target object, the mask image being modulated according to the mask pattern generated by the spatial modulation element that is irradiated with light from the light emitting point of the light source; a detector that collects light that is transmitted through or reflected from the target object illuminated with the mask image and detects the light intensity of the collected light; and a computer that calculates a correlation between the mask image corresponding to the mask pattern in which pixel shift has been generated by sequentially switching on and off one of the plurality of light-emitting points, or two or more of the light-emitting points that are caused to emit light simultaneously, for one mask pattern generated by the spatial modulation element, and the light intensity detected by the detector when the mask image is irradiated onto the object, for all combinations of the plurality of mask patterns and the sequentially switched light-emitting patterns of the light-emitting points, thereby acquiring an image of the object, one or more light emitting points of the light source are sequentially turned on for one mask pattern generated by the spatial modulation element, so that pixels of the mask image irradiated onto the target object are shifted by a predetermined distance; the pixel shift amount of the mask pattern determined by the position of the light emitting point of the light source is known; An imaging device characterized in that the target object is illuminated with a mask image corresponding to the plurality of mask patterns that depend on the positions of the spatial modulation element and the light emitting point of the light source, and the computer constructs the image of the target object by calculating the correlation between the light intensity detected by the detector and the mask image illuminated on the target object.

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