A method for calculating the orientation of a measuring device in a reference frame of a dimensional shape model.

Abstract

The present invention relates to a method for calculating the attitude of a measuring device 11, which is installed in a measurement environment 12 having a plurality of boundary surfaces, F-1, F-2, F-3, F-4, and which has a distance measuring unit with a measurement beam and at least one angle measuring unit, in the reference system of a geometric model representing at least the boundary surfaces, F-1, F-2, F-3, F-4, of the measurement environment, by a microcontroller connected for communication with the measuring device 11 and having an algorithm for calculating the attitude.

Description

Technical Field

[0001] The present invention relates to a method for calculating the posture of a measuring device in a reference system of a dimensional shape model as described in the preamble of claim 1.

Background Art

[0002] A total station is a measuring device having an angle and distance measuring unit and performing angle and distance measurement. The angle and distance measurement values are measured in the reference system of the total station, and further need to be linked to an external reference system for absolute determination of position.

[0003] In a known method for calculating the posture of a measuring device in an external reference system, a target object is positioned at a known control point, and the coordinates of the control point are measured in the reference system of the measuring device. Since the coordinates of the control point in the external reference system are known, the position and orientation (posture) of the measuring device can be calculated using the coordinates of the control point in the external reference system and the reference system of the measuring device.

[0004] Calculating the posture of a measuring device using known control points has the drawback that the target object has to be positioned at the control point.

Summary of the Invention

Problems to be Solved by the Invention

[0005] An object of the present invention is to simplify the calculation of the posture of a measuring device in a reference system of a dimensional shape model such that the calculation of the posture is possible without control points.

Means for Solving the Problems

[0006] This object is achieved according to the invention of the method according to the features described in independent claim 1. Effective improved configurations are defined in the dependent claims.

[0007] A method for calculating the orientation of a measuring device, which is installed in a measurement environment having multiple boundary setting surfaces and has a distance measuring unit with a measuring beam and an angle measuring unit, using a microcontroller that has a communication connection with the measuring device and has an algorithm for calculating the orientation, in a reference frame of a dimensional shape model representing at least one boundary setting surface of the measurement environment, is as follows according to the present invention: A step of creating a polyline from a dimensional shape model, wherein the polyline represents a horizontal measurement line of a boundary setting surface perpendicular to the direction of gravity and comprises at least three line sections, A step of performing N measurements, N≧4, using a measuring device in N different orientations of the measuring device, wherein the measuring beam of the distance measuring unit is incident on at least two different boundary setting surfaces in N different orientations, defining N different measurement points, and in each of the N orientations of the measuring device, the horizontal angle and horizontal distance are identified as measured values ​​between each measurement point and the measuring device. A step of executing an algorithm for calculating posture, wherein the algorithm comprises a sequence of at least three steps, the steps being selected from a first step, a second step, a third step, a fourth step, a fifth step, and a sixth step. (1) In the first step, three measurement points out of N measurement points and three line sections of a polyline are selected, and if the assignment between the measurement points and line sections was not performed before the start of the algorithm, the three selected measurement points and the three selected line sections are assigned to each other. (2) In the second step, the number of possible solutions for the orientation of the measuring device is determined using the measurements of the three selected measurement points and the coordinates of the three selected line sections, and if there is one or two solutions, the measurement coordinates of at least two of the three selected measurement points are determined in the reference frame of the dimensional shape model. (3) In the third step, -If a solution is not found in the second step of the sequence, the method continues with the sixth step of the sequence. -If a solution is identified in the second step of the sequence, the intermediate orientation for the measuring device is calculated from the measurement coordinates and measurements, and those measurement points among the N measurement points that meet the specified quality criteria are identified as qualified measurement points, and the method continues by the fifth step of the sequence. -If two solutions are identified in the second step of the sequence, the first and second test positions are calculated from the measurement coordinates and measurements, and for the first and second test positions in each case, those measurement points out of the N measurement points that satisfy the specified quality criteria are identified as the first qualified measurement point or the second qualified measurement point, respectively, and the method continues by the fourth step of the sequence. (4) In the fourth step, the first test position and the second test position are compared in terms of their conformity based on the specified comparison criteria. -If one of the first and second test positions is evaluated as more appropriate, this test position is defined as the intermediate position, and the method continues by the fifth step of the sequence. -If neither the first nor the second test position is deemed more appropriate, the method continues to the sixth step of the sequence. (5) In the fifth step, it is checked whether the posture is stored relative to the measuring device. -If the posture is not stored for the measuring device, the intermediate posture identified in the third or fourth step of the sequence is defined as the posture for the measuring device, or the updated posture is calculated using the eligible measurement points and defined as the posture for the measuring device, and the method continues by the sixth step of the sequence. -If the posture is stored for the measuring device, the intermediate posture identified in the third or fourth step of the sequence is compared to the stored posture based on specified further comparison criteria. If the intermediate posture is deemed more appropriate, the intermediate posture is defined as the posture, or the updated posture is calculated using the eligible measurement points and defined as the posture for the measuring device, and the method continues by the sixth step of the sequence. If the intermediate posture is deemed less appropriate, the method continues with the sixth step of the sequence. (6) In the sixth step, it is determined whether further sequences are executed based on the specified termination criteria. -If further sequences are performed, the method continues by the first step of the sequence. -If no further sequences are performed and the posture is defined for the measuring device, the method terminates. -If no further sequences are performed and the posture is not defined for the measuring device, the method terminates without the posture being calculated for the measuring device, step and Includes.

[0008] The execution of the method according to the present invention for calculating the orientation of a measuring device in a reference frame of a dimensional shape model is controlled by a microcontroller. The microcontroller has a communication connection with the measuring device via a communication link and has an algorithm for calculating the orientation of the measuring device. The measuring device is installed in a measuring environment having a plurality of boundary setting surfaces and has a distance measuring unit with a measuring beam and at least one angle measuring unit.

[0009] At the start of the method according to the present invention, a polyline representing the horizontal survey line of a boundary setting surface perpendicular to the direction of gravity, and comprising at least three line sections, is created from the dimensional shape model.

[0010] In a further step of the method according to the present invention, at least four different measurements are performed using the measuring device in various orientations, and the measuring beam is incident on at least two different boundary setting surfaces of the measurement environment to define the measurement points in each orientation. The horizontal angle and horizontal distance between the measurement point and the measuring device are identified as measured values ​​for each measurement point. The accuracy or quality with which the orientation of the measuring device can be identified can be improved as the number of measurement points used in the measurement increases and as the number of boundary setting surfaces increases.

[0011] In the next step of the method according to the present invention, an algorithm for calculating the orientation of the measuring device is executed. The algorithm comprises a sequence of at least three steps selected from the first, second, third, fourth, fifth, and sixth steps, and the sequence can be executed once or more times.

[0012] In the first step of the sequence, three measurement points and three line sections of a polyline are selected from among N measurement points. If no assignment between measurement points and line sections has been performed before the start of the algorithm, the three selected measurement points and three selected line sections are assigned to each other.

[0013] In the second step of the sequence, the number of possible solutions for the orientation of the measuring device is determined using the measurements of three selected measurement points and the coordinates of three selected line sections. If one or two solutions exist, the measurement coordinates of at least two of the three selected measurement points are determined in the reference frame of the dimensional shape model.

[0014] In the third step of the sequence, depending on the number of solutions identified in the second step of the sequence, one of three cases is determined: no solutions (zero), one solution (1), or two solutions (2). If a solution is not identified in the second step of the sequence, the method according to the present invention continues with the sixth step of the sequence. If a solution is identified in the second step of the sequence, an intermediate orientation for the measuring device is calculated from the measurement coordinates and measurements, and those measurement points among the N measurement points that satisfy the specified quality criteria are identified as qualified measurement points, and the method according to the present invention continues by the fifth step of the sequence. If two solutions are identified in the second step of the sequence, a first test position (first solution) and a second test position (second solution) are calculated from the measurement coordinates and measured values, and for the first and second test positions in each case, those measurement points out of N that satisfy the specified quality criteria are identified as the first qualified measurement point or the second qualified measurement point, respectively, and the method according to the present invention continues by the fourth step of the sequence.

[0015] The fourth step of the sequence is performed only if two solutions were identified in the second step of the sequence. The two solutions designated as the first and second test positions must be compared with each other. In the fourth step of the sequence, the first and second test positions are compared by the microcontroller based on specified comparison criteria for their suitability, and two cases are determined. If one of the first and second test positions is evaluated as more suitable, this test position is defined as an intermediate position, and the method according to the present invention continues by the fifth step of the sequence. If neither the first nor the second test position is evaluated as more suitable, the method according to the present invention continues by the sixth step of the sequence.

[0016] The fifth step of the sequence is used to further process the intermediate posture identified in the third or fourth step of the sequence. In the fifth step of the sequence, two cases are determined: Within the scope of application of the method according to the present invention, if the posture is not stored for the measuring device, an intermediate posture is defined as the posture of the measuring device, or an updated posture is calculated using a qualified measurement point and defined as the posture for the measuring device. In the scope of application of the method according to the invention, when a posture is stored for the measuring device, the intermediate posture is compared with the stored posture based on a specified further comparison criterion. If the intermediate posture is evaluated as more appropriate, the intermediate posture is defined as the posture or an updated posture is calculated using the qualified measurement points and defined as the posture for the measuring device, and the method according to the invention is continued by the sixth step of the sequence. If the intermediate posture is evaluated as not more appropriate, the method according to the invention is continued by the sixth step of the sequence.

[0017] In the sixth step of the sequence, based on the specified end criterion, it is determined whether a further sequence of the first to sixth steps is executed, where three cases are discriminated. If a further sequence is executed, the method according to the invention is continued by the first step of the sequence. If no further sequence is executed and a posture is defined for the measuring device, the method according to the invention ends. If no further sequence is executed and a posture is not defined for the measuring device, the method according to the invention ends without a posture being specified for the measuring device.

[0018] Preferably, at least one of the following criteria is used as a quality criterion in the third step of the sequence: the maximum distance of the measurement points to the polyline, the unique assignment of the measurement points to the line sections of the polyline, and the maximum angle of incidence of the measurement beam to the line sections of the polyline. If the distance to the polyline is less than the maximum distance and / or the measurement points can be uniquely assigned to the line sections of the polyline and / or the angle of incidence of the measurement beam to the assigned line section is less than the maximum angle of incidence, the measurement points are specified as qualified measurement points in the third step, and the angle of incidence is measured with respect to the normal vector of the assigned boundary setting surface.

[0019] Preferably, at least one of the following criteria is used as a comparison criterion in the fourth step of the sequence: the number of qualified measurement points, the distribution of the qualified measurement points along the polyline, the surface area of the surface over which the qualified measurement points spread, and the estimation accuracy of the test posture. The test posture is evaluated as more appropriate in the fourth step when the number of its qualified measurement points is larger, and / or when its qualified measurement points are distributed over more line sections of the polyline, and / or when the surface area of the surface over which the qualified measurement points spread is larger, and / or when its estimation accuracy is higher.

[0020] Preferably, at least one of the following criteria is used as a further comparison criterion in the fifth step of the sequence: the number of qualified measurement points, the distribution of the qualified measurement points along the polyline, the surface area of the surface over which the qualified measurement points spread, and the estimation accuracy of the posture. The intermediate posture is evaluated as more appropriate in the fifth step when the number of its qualified measurement points is larger, and / or when its qualified measurement points are distributed over more line sections of the polyline, and / or when the surface area of the surface over which the qualified measurement points spread is larger, and / or when its estimation accuracy is higher.

[0021] Preferably, at least one of the following criteria is used as an end criterion in the sixth step of the sequence: the minimum number M of the sequence, the minimum number of qualified measurement points, the minimum percentage value of the number of qualified measurement points with respect to the number of measurement points, the absolute minimum value for the surface area of the surface over which the qualified measurement points spread, and the minimum percentage value of the surface area of the surface over which the qualified measurement points spread with respect to the surface area of the polygon surrounded by the polygon line.

[0022] The sequence ends when the minimum number M of the sequence is reached, and / or when the number of qualified measurement points is greater than the minimum number, and / or when the ratio between the number of qualified measurement points and the number of measurement points is greater than the minimum percentage value, and / or when the surface area of the surface over which the qualified measurement points spread is greater than the absolute minimum value, and / or when the ratio between the surface area of the surface over which the qualified measurement points spread and the surface area of the polygon is greater than the minimum percentage value.

[0023] Unacceptable measurement regions are preferably defined during the creation of the polyline, and line sections of the polyline that are assigned to unacceptable measurement regions are defined as unacceptable line sections and excluded from the selection of three line sections in the first step of the sequence.

[0024] At least one of the following measurement areas is particularly preferably defined as an unacceptable measurement area: window openings, door openings, glass panes, areas where the dimensional shape model deviates from the measurement environment, and areas that are inaccessible or unsuitable for measurement.

[0025] Assigning an unacceptable line section to a different line section is particularly preferred, and is used as a quality criterion in the third step of the sequence.

[0026] In the first preferred modification, the N measurements are performed manually by an operator using a measuring device, and the measurement points are assigned by the operator to line sections of the polyline. The first modification is designated as a manual modification, in which the measurements and assignments are performed by an operator.

[0027] In a second preferred modification, the N measurements are performed by a microcontroller using a measuring device, and the measurement points are assigned to line sections of the polyline by an operator. The second modification is designated as a semi-manual modification, in which the measurements are performed automatically, and the assignment is performed by an operator.

[0028] In a third preferred modification, the N measurements are performed manually by an operator using a measuring device, and the assignment performed in the first step of the sequence is performed randomly or using selection criteria by a microcontroller. The third modification is designated as a semi-automatic modification, in which the measurements are performed by an operator and the assignment is performed by a microcontroller.

[0029] In the fourth preferred modification, the N measurements are performed by a microcontroller using a measuring device, and the assignment performed in the first step of the sequence is performed by the microcontroller randomly or using selection criteria. The fourth modification is designated as a fully automated modification, in which the measurements and assignments are performed by a microcontroller.

[0030] At least one of the following criteria is particularly preferred to be used as a selection criterion: the sequence of line sections in the rotational direction of the measuring device, the length of the line sections, and the distance of the measurement point to the polyline. The distance is calculated using the measured value and the starting position for the measuring device.

[0031] The measuring device preferably includes a camera unit, and the camera image is created by the camera unit in each of the N orientations of the measuring device, and the camera image is assigned to each orientation of the measuring device.

[0032] Embodiments of the present invention will be described below with reference to the drawings. The drawings are not necessarily intended to show embodiments to their actual size; rather, they are represented schematically and / or slightly modified if useful for illustration. It should be noted here that various modifications and changes relating to the form and details of embodiments can be made without departing from the general concept of the present invention. The general concept of the present invention is not limited to the exact form or details of the preferred embodiments shown and described below, nor is it limited to the gist which is limited in comparison to the technical features of the claims. For a given dimensional range, values ​​within the limits mentioned are also disclosed as limits and may be used and claimed as desired. For simplicity, the same reference numerals will be used below for the same or similar parts, or parts having the same or similar function. [Brief explanation of the drawing]

[0033] [Figure 1]This diagram shows a measuring device installed within the measurement environment and connected to an operating controller via a communication link. [Figure 2A] Figure 1 is a perspective view showing the measuring device. [Figure 2B] Figure 1 is a block diagram showing the schematic structure of the measuring device. [Figure 3A] Figure 1 is a plan view showing the front of the control controller. [Figure 3B] This is a block diagram showing the schematic structure of the control controller shown in Figure 1. [Figure 4] This figure shows how to perform multiple measurements using a measuring device on various boundary surfaces of the measurement environment. [Figure 5] This figure shows a screenshot of the control controller, illustrating how polylines are created from the dimensional shape model of the measurement environment. [Figure 6A] This is a flowchart illustrating the method according to the present invention for calculating the orientation of a measuring device. [Figure 6B] This is a flowchart illustrating the method according to the present invention for calculating the orientation of a measuring device. [Figure 7] This figure shows a screenshot of the control controller illustrating how a polyline with an unacceptable measurement area is created from a dimensional shape model. [Modes for carrying out the invention]

[0034] Figure 1 shows a measuring device 11 whose position and orientation (posture) in the measurement environment 12 are determined using the method according to the present invention, and an operating controller 13. "Measuring device" is a general term for all devices intended to perform a measurement task. In this embodiment, the measuring device 11, designed as a total station, can be connected to the operating controller 13 via a communication link 14.

[0035] The measurement environment 12 is mapped to a dimensional shape model. A construct model of the measurement environment 12 created by CAD support can be used as the dimensional shape model. Alternatively, the measurement environment 12 can be scanned by a laser scanner, and a dimensional shape model of the measurement environment 12 can be created from the scan data. The dimensional shape model can map the measurement environment 12 completely or partially. The surface of the measurement environment 12 used as a reflective or scattering surface for distance measurement is critical to this application.

[0036] The orientation of the measuring device 11 is calculated using the method according to the present invention in the reference frame of the dimensional shape model. The method according to the present invention uses measurements of at least four measurement points identified using the measuring device 11 and horizontal measurement lines of boundary setting surfaces designated as polylines.

[0037] Figures 2A and 2B show the measuring device 11 from Figure 1 as a perspective view (Figure 2A) and a block diagram of its schematic structure (Figure 2B).

[0038] The measuring device 11 is designed as a total station and includes a measuring head 21, a main housing 22, and a rechargeable battery 23. The measuring head 21 comprises a housing 24 having an ejection window 25 and a distance measuring unit located within the housing 24 that emits a measuring beam 26. The measuring beam 26 is emitted from the housing 24 through the ejection window 25 and can generate measurement points on the boundary setting surface of the measurement environment.

[0039] The main housing 22 is U-shaped and comprises a base housing 27, a first side portion 28, and a second side portion 29. The measuring head 21 is positioned between the first side portion 28 and the second side portion 29 and is pivotable about a pivot shaft 30. The main housing 22 is rotatable relative to the rotating platform 31 about a rotation shaft 32.

[0040] The azimuth motor unit and the first angle measuring unit are located in the base housing 27. The azimuth motor unit allows the main housing 22 to move around the rotation axis 32, and the first angle measuring unit allows the direction of the measuring beam 26 to be determined in the horizontal plane. The lifting motor unit and the second angle measuring unit are located in the first side 28. The lifting motor unit allows the measuring head 21 to move around the pivot axis 30, and the second angle measuring unit allows the direction of the measuring beam 26 to be determined in the vertical plane. To fully automate the measuring device 11, a horizontal adjustment unit can be provided in the base housing 27, which allows the measuring device 11 to be horizontally adjusted so that the rotation axis 32 extends parallel to the direction of gravity 33.

[0041] Figure 2B shows a schematic block diagram of the measuring device 11. The measuring device 11 includes an electronic equipment unit 41, a distance measuring unit 42, a first angle measuring unit 43 for measuring the azimuth angle, an azimuth motor unit 44, a second angle measuring unit 45 for measuring the elevation angle, a lifting motor unit 46, and a camera unit 47.

[0042] The electronic unit 41 comprises a microcontroller 48, a memory circuit 49 that can include random access memory (RAM) and read-only memory (ROM), a communication circuit 50, and an I / O interface 51. The microcontroller 48 can communicate with the memory circuit 49 and the communication circuit 50 and is designed for the control and adjustment of the measuring device 11.

[0043] The communication circuit 50 includes a transmitter 52 and a receiver 53 and is designed for the communication and exchange of data information items, such as distance measurements, azimuth values, and elevation values, with the operating controller 13, which typically uses wireless signals. In one preferred embodiment, the communication link 14 is wireless, but a cable can also be connected between the communication circuit 50 and the operating controller 13. The I / O interface 51 is an interface between the microcontroller 48 and various drivers and sensors.

[0044] The distance measuring unit 42 includes a laser emitter 56 that generates a measurement beam 26, a laser driver 57 that supplies current to the laser emitter 56, an optical sensor 58, and a receiver interface 59. The optical sensor 58 receives at least a portion of the measurement beam 26 reflected at the boundary setting surface, and the current signal output by the optical sensor 58 is guided to the receiver interface 59. After amplification and demodulation, the signal is transmitted from the receiver interface 59 to the microcontroller 48 via the I / O interface 51.

[0045] The first angle measuring unit 43 includes a first angle encoder 61 that identifies the direction (azimuth angle) of the laser emitter 56 in the horizontal plane and converts it into an electrical output signal transmitted to the microcontroller 48 via the I / O interface 51. The azimuth motor unit 44 includes an azimuth motor 62 that moves the main housing 22 of the measuring device 11 around the rotation axis 32, and an azimuth motor driver 63 that converts commands from the microcontroller 48 into the required amperage for the azimuth motor 62.

[0046] The second angle measuring unit 45 includes a second angle encoder 64 that identifies the direction (elevation angle) of the laser emitter 56 in the vertical plane and converts it into an electrical output signal transmitted to the microcontroller 48 via the I / O interface 51. The lifting motor unit 46 includes a lifting motor 65 that moves the measuring head 21 around the pivot axis 30 and a lifting motor driver 66 that converts commands from the microcontroller 48 into the required amperage for the lifting motor 65.

[0047] The camera unit 47 includes an image sensor 67 and a graphics processor (GPU) 68 that is responsible for calculating items of image information.

[0048] Figures 3A and 3B show the front of the operation controller 13 in Figure 1 as a plan view (Figure 3A) and the schematic structure of the operation controller 13 as a block diagram (Figure 3B).

[0049] The operation controller 13 is embodied as a tablet computer and includes a housing 71, a touchscreen 72, a battery 73, multiple buttons 74 such as volume control buttons, an on / off button, and display control buttons, multiple displays 75 for such as operating status, data storage status, and battery status, multiple ports 76 for such as docking, data storage, and USB, and a card slot 77.

[0050] Figure 3B shows a schematic block diagram of the operation controller 13. The operation controller 13 comprises an electronic equipment unit 81, a display unit 82, and a user operation input unit 83.

[0051] The electronic unit 81 comprises a microcontroller 84, a memory circuit 85 which may include random access memory (RAM), read-only memory (ROM), and bulk memory (BULK), a communication circuit 86, and an I / O interface 87. The microcontroller 84 can communicate with the memory circuit 85 and the communication circuit 86 and is designed for the control and adjustment of the operation controller 13. The bulk memory may be an SD memory card insertable into the card slot 77, or an external storage device that can be connected to the operation controller 13 via one of the ports 76, such as a USB port.

[0052] The communication circuit 86 includes a transmitter 88 and a receiver 89 and is designed for communication with a measuring device 11, which typically uses wireless signals. The measuring device 11 transmits distance measurements, azimuth values, and elevation values ​​to the operating controller 13 via the communication link 14.

[0053] The display unit 82 includes a display 91 and a display driver circuit 92 connected to the I / O interface 87, which provides the display 91 with the correct interface and data signals. The user control input unit 83 includes a keyboard 93 and a keyboard driver 94 connected to the I / O interface 87, which supplies the keyboard 93 with the correct interface and data signals.

[0054] Figure 4 is a schematic diagram showing that multiple measurements are performed using the measuring device 11 on various boundary setting surfaces of the measurement environment 12. The measurement environment 12 has four walls that form four boundary setting surfaces F-1, F-2, F-3, and F-4.

[0055] The measuring device 11 is oriented to a first orientation, and the measuring beam 26 generates a first measurement point MP-1 on the first boundary setting surface F-1. Distance and angle values ​​are determined for the first measurement point MP-1 by distance and angle measurements. The method according to the present invention requires distance and angle values ​​in a horizontal plane perpendicular to the gravity direction 33, which will be referred to below as horizontal distance and horizontal angle.

[0056] To obtain the horizontal angle and horizontal distance, the measuring device 11 can be horizontally adjusted by the horizontal adjustment unit 47 before starting the measurement, so that the measured distance and angle values ​​correspond to the horizontal angle and horizontal distance, or the measuring device 11 measures three-dimensional values ​​and derives the horizontal angle and horizontal distance therefrom. The first horizontal angle HPhi-1 and the first horizontal distance HD-1 are identified as the first measured values ​​for the first measurement point MP-1.

[0057] The measuring device 11 is offset from the first orientation to the second orientation, and the measuring beam 26 is oriented to the second measurement point MP-2, and the second horizontal angle HPhi-2 and the second horizontal distance HD-2 are identified as the second measured value. The measuring device 11 is offset from the second orientation to the third orientation, and the measuring beam 26 is oriented to the third measurement point MP-3, and the third horizontal angle HPhi-3 and the third horizontal distance HD-3 are identified as the third measured value. The measuring device 11 is offset from the third orientation to the fourth orientation, and the measuring beam 26 is oriented to the fourth measurement point MP-4, and the fourth horizontal angle HPhi-4 and the fourth horizontal distance HD-4 are identified as the fourth measured value.

[0058] In the method according to the present invention, the measurement points must be located on at least two different boundary setting surfaces. In the embodiment, the first and second measurement points MP-1 and MP-2 are located on the first boundary setting surface F-1, the third measurement point MP-3 is located on the second boundary setting surface F-2, and the fourth measurement point MP-4 is located on the third boundary setting surface F-3. As a result, the four measurement points MP-1, MP-2, MP-3, and MP-4 are located on three different boundary setting surfaces.

[0059] To improve the accuracy of calculating the orientation of the measuring device 11, it is advantageous to orient the measurement points on as many boundary setting surfaces as possible in the measurement environment 12 and to distribute them as uniformly as possible across spatial angles. For this purpose, the measuring device 11 can be offset to a fifth orientation, and the measuring beam 26 can be oriented to a fifth measurement point MP-5 on the fourth boundary setting surface F-4, and the fifth horizontal angle HPhi-5 and the fifth horizontal distance HD-5 are identified as the fifth measurement.

[0060] Figure 5 shows a screenshot of the operation controller 13, illustrating how polylines are created from the dimensional geometry model. The dimensional geometry model, which maps the measurement environment 12, is loaded by the microcontroller 84, and a 2D view is displayed on the display 91.

[0061] The operator identifies a first point LP1, a second point LP2, a third point LP3, and a fourth point LP4, which represent corner points. The microcontroller 84 defines the line between the first point LP1 and the second point LP2 as the first line section L1, the line between the second point LP2 and the third point LP3 as the second line section L2, the line between the third point LP3 and the fourth point LP4 as the third line section L3, and the line between the fourth point LP4 and the first point LP1 as the fourth line section L4. The polyline is formed from the first line section L1, the second line section L2, the third line section L3, and the fourth line section L4.

[0062] The first line section L1 represents the horizontal survey line of the first boundary setting surface F-1, the second line section L2 represents the horizontal survey line of the second boundary setting surface F-2, the third line section L3 represents the horizontal survey line of the third boundary setting surface F-3, and the fourth line section L4 represents the horizontal survey line of the fourth boundary setting surface F-4.

[0063] Figures 6A and 6B show in flowchart form the method according to the present invention for calculating the orientation of the measuring device. The execution of the method according to the present invention for calculating the orientation of the measuring device 11 in the reference frame of the dimensional shape model is controlled by the microcontroller 84 of the operation controller 13.

[0064] The microcontroller 84 has a communication connection with the measuring device 11 via a communication circuit 86 and a communication link 14, and includes an algorithm for calculating the orientation of the measuring device 11. In order for the orientation of the measuring device 11 to be calculated using the algorithm, a polyline must be created from the dimensional shape model of the measurement environment 12 (see Figure 5), and at least four different measurements must be performed using the measuring device 11 (see Figure 4).

[0065] The method according to the present invention has the advantage that it does not require the use of fixed control points, and rather the measuring device 11 can be oriented to all boundary setting surfaces of the measurement environment 12. In order to improve the accuracy of the orientation, it is advantageous to orient the measuring points on as many boundary setting surfaces as possible of the measurement environment 12 and to distribute them as uniformly as possible over the solid angle.

[0066] The operator creates a polyline from a dimensional shape model that represents a horizontal measurement line of a boundary setting surface perpendicular to the gravity direction 33 and has at least three line sections (step S10). In the next step of the method according to the present invention, N different measurements, N≧4, are performed N times using the measuring device 11 (step S20).

[0067] In the modified method of the present invention shown in Figures 6A and 6B, a polyline is created first, and then at least four measurements are performed using the measuring device 11. Alternatively, the measurements can be performed first, followed by the creation of the polyline, or, in the case of automated measurement, the two steps can be performed simultaneously.

[0068] Measurements can be performed manually by the user or by the microcontroller 84. Each of the N measurements is performed in a different orientation of the measuring device 11. The measuring beam 26 of the distance measuring unit 42 defines a measurement point on one of the boundary setting surfaces of the measurement environment 12. For each measurement point, the measuring device 11 identifies the horizontal angle and horizontal distance between the measurement point and the measuring device 11 as measured values. The N different measurement points must be arranged so that the measurements are performed on at least two different boundary setting surfaces of the measurement environment 12. Figure 4 shows five measurement points MP-1, MP-2, MP-3, MP-4, and MP-5, which are located on four boundary setting surfaces F-1, F-2, F-3, and F-4.

[0069] The method according to the present invention is continued by executing an algorithm for calculating posture, the algorithm comprising a sequence of at least three steps, the steps being selected from a first step, a second step, a third step, a fourth step, a fifth step, and a sixth step.

[0070] In the first step of the sequence, three measurement points and three line sections of a polyline are selected from among N measurement points. If no assignment between measurement points and line sections has been performed before the start of the algorithm, the three selected measurement points and three selected line sections are assigned to each other (step S30).

[0071] In a second step of the sequence, using the measurements of three selected measurement points and the coordinates of three selected line sections, the number of possible solutions for the orientation of the measuring device 11 is determined (step S40). If one or two solutions exist, the measurement coordinates of at least two of the three selected measurement points are determined in the reference frame of the dimensional shape model. The measurement coordinates are required in a further process of the method for calculating the intermediate orientation.

[0072] The third step of the sequence determines one of three cases: no solution, one solution, or two solutions. If no solution is identified in the second step of the sequence (zero in S40), the method according to the present invention continues by the sixth step of the sequence. If one solution is identified in the second step of the sequence (one in S40), an intermediate position for the measuring device is calculated from the measurement coordinates and measured values, and those measurement points out of N measurement points that satisfy the specified quality criteria are identified as qualified measurement points (step S50), and the method according to the present invention continues by the fifth step of the sequence. If two solutions are identified in the second step of the sequence (two in S40), a first test position and a second test position are calculated from the measurement coordinates and measured values, and for the first test position and the second test position in each case, those measurement points out of N measurement points that satisfy the specified quality criteria are identified as the first qualified measurement point or the second qualified measurement point, respectively (step S60), and the method according to the present invention continues by the fourth step of the sequence.

[0073] The intermediate posture identified in step S50 represents the posture (position and orientation) of the measuring device 11 to be evaluated in a further step of the method according to the present invention. The first and second test postures identified in step S60 represent the postures (position and orientation) of the measuring device 11 to be compared with each other in a further step of the method according to the present invention. The use of the terms “intermediate posture,” “first test posture,” and “second test posture” allows for linguistic distinction between mathematical solutions.

[0074] As a quality criterion that allows for the identification of qualified measurement points in step S50 or step S60, at least one of the following criteria may be used: the maximum distance of the measurement point to the polyline, the unique assignment of the measurement point to the line section of the polyline, and the maximum incidence angle of the measurement beam to the line section of the polyline. If the polyline contains at least one unacceptable line section, the assignment may also be to a different line section than the unacceptable line section.

[0075] The microcontroller 84 applies a specified quality criterion to each of the N measurement points. A measurement point is designated as a qualified measurement point if the distance to the polyline is less than the maximum distance, and / or the measurement point can be uniquely assigned to a line section of the polyline, and / or the angle of incidence of the measurement beam to the assigned line section is less than the maximum angle of incidence. The angle of incidence is measured relative to the normal vector of the boundary setting surface.

[0076] The fourth step of the sequence is performed only if two solutions have been identified in the second step of the sequence, and is used to compare these two solutions, which are designated as the first and second test positions, with respect to each other. In the fourth step of the sequence, the first and second test positions are compared by the microcontroller 84 based on a specified comparison criterion for their suitability (step S70), where two cases are determined. If one of the first and second test positions is evaluated as more suitable (I of S70), this test position is defined as an intermediate position (step S80), and the method according to the present invention continues by the fifth step of the sequence. If neither the first nor the second test position is evaluated as more suitable (II of S70), the method according to the present invention continues by the sixth step of the sequence.

[0077] In step S70, the ability to compare the first test posture with the second test posture is used as a comparison criterion, and at least one of the following criteria is used: the number of qualified measurement points, the distribution of qualified measurement points along the polyline, the surface area of ​​the surface over which the qualified measurement points are located, and the accuracy of posture estimation.

[0078] The microcontroller 84 compares the first test orientation (first solution in S50) and the second test orientation (second solution in S50) with each other based on comparison criteria. A test orientation is evaluated as more appropriate if it has a larger number of qualified measurement points, and / or if its qualified measurement points are distributed across more line sections of the polyline, and / or if the surface area of ​​the region where its qualified measurement points are spread is larger, and / or if its estimation accuracy is higher.

[0079] In the fifth step of the sequence, it is checked whether the posture is stored for the measuring device (step S90), and two cases are determined. If the posture is not stored for the measuring device (no in S90), then either the intermediate posture identified in the third step (S50) or fourth step (S80) of the sequence is defined as the posture for the measuring device, or the updated posture is calculated using qualified measurement points and defined as the posture for the measuring device (step S100). Calculating the updated posture using qualified measurement points has the advantage that all qualified measurement points are considered, thereby improving the accuracy of the posture.

[0080] If the posture is stored for the measuring device (Yes, S90), the intermediate posture identified in the third step (S50) or fourth step (S80) of the sequence is compared by the microcontroller 84 to the stored posture based on specific further comparison criteria (step S110), where two cases are determined. If the intermediate posture is evaluated as more appropriate (I, S110), the intermediate posture is defined as the posture, or the updated posture is calculated using qualified measurement points and defined as the posture for the measuring device 11 (step S120), and the method according to the present invention continues by the sixth step of the sequence. If the intermediate posture is evaluated as less appropriate (II, S110), the method according to the present invention continues by the sixth step of the sequence. The calculation of the updated posture using qualified measurement points in step S120 has the advantage that all qualified measurement points are considered, thereby improving the accuracy of the posture.

[0081] As further comparison criteria that allow for comparison between the intermediate attitude and the stored attitude in step S90, at least one of the following criteria is used: the number of qualified measurement points, the distribution of qualified measurement points along the polyline, the surface area of ​​the surface over which the qualified measurement points are located, and the accuracy of attitude estimation.

[0082] The microcontroller 84 compares the intermediate attitude and the stowed attitude to each other based on further comparison criteria. The intermediate attitude is evaluated as more appropriate if it has a larger number of qualified measurement points, and / or if its qualified measurement points are distributed across more line sections of the polyline, and / or if the surface area of ​​the surface over which its qualified measurement points are located is larger, and / or if its accuracy is higher.

[0083] In the sixth step of the sequence, it is determined whether to perform a further sequence based on a specified termination criterion (step S130), where three cases are determined. If a further sequence is to be performed (I of S130), the method according to the present invention continues by the first step of the sequence (S30). If a further sequence is not to be performed and the posture is defined for the measuring device (II of S130), the posture is displayed by the microcontroller 84 (step S140), and the method according to the present invention terminates. If a further sequence is not to be performed and the posture is not defined for the measuring device (III of S130), the information that the posture was not specified for the measuring device is displayed by the microcontroller 84 (step S150), and the method according to the present invention terminates.

[0084] At least one of the following criteria will be used as the termination criterion: the minimum number of sequences M, the minimum number of eligible measurement points, the minimum percentage of the number of eligible measurement points to the total number of measurement points, the absolute minimum surface area of ​​the surface over which the eligible measurement points extend, and the minimum percentage of the surface area of ​​the surface over which the eligible measurement points extend to the surface area of ​​the polygon enclosed by the polygon lines.

[0085] The microcontroller 84 applies termination criteria and terminates the execution of the sequence if the minimum number M of sequences is reached, and / or the number of eligible measurement points is greater than the minimum, and / or the ratio of the number of eligible measurement points to the number of measurement points is greater than the minimum percentage, and / or the surface area of ​​the surface over which the eligible measurement points are located is greater than the minimum absolute value, and / or the ratio of the surface area of ​​the surface over which the eligible measurement points are located to the surface area of ​​the polygon is greater than the minimum percentage.

[0086] Figure 7 shows a further screenshot of the operation controller 13, illustrating an alternative polyline. The polyline in Figure 7 is derived from the same dimensional shape model of the measurement environment as the polyline in Figure 5, but differs from the polyline in Figure 5 in that it defines an unacceptable measurement area.

[0087] An unacceptable measurement area refers to an area where the dimensional shape model deviates from the actual measurement environment, and / or an area that is inaccessible or unsuitable for measurement using the measuring device 11. Examples of unacceptable measurement areas may include door openings, window openings, glass panels, and inaccessible areas.

[0088] The operator identifies a first point LP1, a second point LP2, a third point LP3, and a fourth point LP4, and in addition, the operator identifies a fifth point LP5 that lies on the line between the third point LP3 and the fourth point LP4. The microcontroller 84 defines the line between the first point LP1 and the second point LP2 as the first line section L1, the line between the second point LP2 and the third point LP3 as the second line section L2, the line between the third point LP3 and the fifth point LP5 as the fourth line section L4, and the line between the fourth point LP4 and the fifth point LP5 as an unacceptable measurement area. The polyline is formed from the first line section L1, the second line section L2, the third line section L3, and the fourth line section L4.

Claims

1. A method for calculating the orientation of a measuring device (11), which is installed in a measuring environment (12) having multiple boundary setting surfaces (F-1, F-2, F-3, F-4) and includes a distance measuring unit (42) having a measuring beam (26) and at least one angle measuring unit (43, 45), by a microcontroller (84) having a communication connection to the measuring device (11) and including an algorithm for calculating the orientation, in a reference system of a dimensional shape model that maps at least the boundary setting surfaces (F-1, F-2, F-3, F-4) of the measuring environment (12), wherein the microcontroller (84) has a communication connection to the measuring device (11) and includes an algorithm for calculating the orientation, Step (S10) is a step of creating a polyline from the dimensional shape model, wherein the polyline represents horizontal lines of the boundary setting surfaces (F-1, F-2, F-3, F-4) perpendicular to the direction of gravity (33), and comprises at least three line sections (LP1, LP2, LP3, LP4). Step (S20) is a step in which the measuring device (11) is used to perform N measurements, N≧4 times, in N different orientations of the measuring device (11), wherein the measuring beam (26) of the distance measuring unit (42) is incident on at least two different boundary setting surfaces (F-1, F-2, F-3, F-4) in the N different orientations, defining N different measurement points (MP-1, MP-2, MP-3, MP-4, MP-5), and in each of the N orientations of the measuring device (11), the horizontal angle (HPhi-1, HPhi-2, HPhi-3, HPhi-4, HPhi-5) and the horizontal distance (HD-1, HD-2, HD-3, HD-4, HD-5) are identified as measured values ​​between each measurement point and the measuring device (11), A step of executing the algorithm for calculating the attitude, wherein the algorithm comprises a sequence of a first step, a second step, a third step, a fourth step, a fifth step, and a sixth step, (1) In the first step, three measurement points from the N measurement points (MP-1, MP-2, MP-3, MP-4, MP-5) and three line sections of the polyline are selected, and if the assignment between the measurement points (MP-1, MP-2, MP-3, MP-4, MP-5) and the line sections (LP1, LP2, LP3, LP4) was not performed before the start of the algorithm, the three selected measurement points and the three selected line sections are assigned to each other (S30), (2) In the second step, the number of possible solutions for the orientation of the measuring device (11) is determined using the measured values ​​of the three selected measuring points and the coordinates of the three selected line sections (S40), and if there is one or two solutions, the measurement coordinates of at least two of the three selected measuring points are determined in the reference system of the dimensional shape model. (3) In the third step above, - If no solution is identified in the second step of the sequence (zero in S40), the method continues by the sixth step of the sequence. - If a solution is identified in the second step of the sequence (one in S40), an intermediate orientation for the measuring device is calculated from the measurement coordinates and measurement values, and those measurement points among the N measurement points that satisfy the specified quality criteria are identified as qualified measurement points (S50), and the method continues by the fifth step of the sequence. - If two solutions are identified in the second step of the sequence (two in S40), a first test position and a second test position are calculated from the measurement coordinates and measurement values, and for the first and second test positions in each case, those measurement points among the N measurement points that satisfy the specified quality criteria are identified as the first qualified measurement point or the second qualified measurement point, respectively (S60), and the method continues by the fourth step of the sequence. (4) In the fourth step, the first test position and the second test position are compared in terms of their conformity based on the specified comparison criteria (S70), - If one of the first and second test positions is evaluated as more appropriate (I in S70), this test position is defined as the intermediate position (S80), and the method continues by the fifth step of the sequence. - If neither the first test position nor the second test position is evaluated as more appropriate (II in S70), the method continues by the sixth step of the sequence, (5) In the fifth step, it is checked whether the posture is stored relative to the measuring device (S90), - If the posture is not stored for the measuring device (no in S90), the intermediate posture identified in the third step (S50) or fourth step (S80) of the sequence is defined as the posture for the measuring device, or the updated posture is calculated using the eligible measurement point and defined as the posture for the measuring device (S100), and the method continues by the sixth step of the sequence. - If the posture is stored for the measuring device (yes in S90), the intermediate posture identified in the third step (S50) or fourth step (S60) of the sequence is compared with the stored posture based on specified further comparison criteria (S110), and if the intermediate posture is evaluated as more appropriate (I in S110), the intermediate posture is defined as the posture, or the updated posture is calculated using the eligible measurement points and defined as the posture for the measuring device (S120), and the method continues by the sixth step of the sequence, and if the intermediate posture is evaluated as less appropriate (II in S110), the method continues by the sixth step of the sequence, (6) In the sixth step, it is determined whether to execute a further sequence based on the specified termination criteria (S130), - If a further sequence is performed (I in S130), the method continues by the first step of the sequence, - If no further sequence is performed and the posture is defined for the measuring device (II in S130), the method terminates. - If no further sequence is performed and the posture is not defined for the measuring device (III in S130), the method terminates without the posture being calculated for the measuring device, step and A method of having.

2. The method according to claim 1, characterized in that at least one of the following criteria—the maximum distance of the measurement point to the polyline, the unique assignment of the measurement point to the line section of the polyline, and the maximum angle of incidence of the measurement beam to the line section of the polyline—is used as the quality criterion in the third step of the sequence.

3. The method according to claim 1, characterized in that at least one of the following criteria, the number of qualified measurement points, the distribution of the qualified measurement points along the polyline, the surface area of ​​the surface over which the qualified measurement points are located, and the estimation accuracy of the test posture is used as the comparison criterion in the fourth step of the sequence.

4. The method according to claim 1, characterized in that at least one of the following criteria, the number of qualified measurement points, the distribution of the qualified measurement points along the polyline, the surface area of ​​the surface over which the qualified measurement points are located, and the accuracy of the attitude estimation is used as the further comparison criterion in the fifth step of the sequence.

5. The method according to claim 1, characterized in that at least one of the following criteria—a minimum number M of sequences, a minimum number of eligible measurement points, a minimum percentage of the number of eligible measurement points to the total number of measurement points, a minimum absolute surface area of ​​the surface over which the eligible measurement points are located, and a minimum percentage of the surface area of ​​the surface over which the eligible measurement points are located relative to the surface area of ​​the polygons enclosed by the polygon lines—is used as the termination criterion in the sixth step of the sequence.

6. The method according to claim 1, characterized in that, during the creation of the polyline, an unacceptable measurement region is defined, and the line sections of the polyline that are assigned to the unacceptable measurement region are defined as unacceptable line sections and are excluded from the selection of the three line sections in the first step of the sequence.

7. The method according to 6, characterized in that at least one of the following is defined as an unacceptable measurement area: a measurement area, a window opening, a door opening, a glass plate, an area where the dimensional shape model deviates from the measurement environment (12), and an area that is inaccessible or unsuitable for the measurement.

8. The method according to 6 or 7, characterized in that the assignment to a line section different from an unacceptable line section is used as a quality criterion in the third step of the sequence.

9. The method according to claim 1, characterized in that the N measurements are performed manually by an operator using the measuring device (11), and the measurement points (MP-1, MP-2, MP-3, MP-4, MP-5) are assigned to the line sections of the polyline by the operator.

10. The method according to claim 1, characterized in that the N measurements are performed by the microcontroller (84) using the measuring device (11), and the measurement points (MP-1, MP-2, MP-3, MP-4, MP-5) are assigned to the line sections of the polyline by an operator.

11. The method according to claim 1, characterized in that the N measurements are performed manually by an operator using the measuring device (11), and the assignment performed in the first step of the sequence is performed randomly or using selection criteria by the microcontroller (84).

12. The method according to claim 1, characterized in that the N measurements are performed by the microcontroller (84) using the measuring device (11), and the assignment performed in the first step of the sequence is performed by the microcontroller (84) randomly or using selection criteria.

13. The method according to 11 or 12, wherein at least one of the following criteria—the sequence of the line sections in the rotational direction of the measuring device (11), the length of the line sections, and the distance of the measuring point to the polyline—is used as the selection criterion, and the distance is calculated using the measured value and the starting position for the measuring device.

14. The method according to any one of claims 1 to 13, wherein the measuring device (11) includes a camera unit (47), and a camera image is created by the camera unit (47) in each of the N orientations of the measuring device (11), and the camera image is assigned to each of the orientations of the measuring device (11).

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