Reaction system and cleaning method

The reaction system addresses the challenge of safely cleaning reactors in a sealed environment by using a shut-off mechanism and integrated cleaning processes to manage toxic gases, ensuring safe and efficient operation.

JP7856498B2Active Publication Date: 2026-05-11THE JAPAN STEEL WORKS LTD
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Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
THE JAPAN STEEL WORKS LTD
Filing Date
2022-06-13
Publication Date
2026-05-11

AI Technical Summary

Technical Problem

Existing manufacturing systems for highly reactive products like electrolytes and active materials for all-solid-state lithium-ion batteries face challenges in maintaining a sealed environment to prevent moisture-induced toxic gas generation, necessitating safe cleaning methods without generating toxic gases.

Method used

A reaction system with a shut-off mechanism, reactor, conveying device, fluid supply and discharge pipes, and a cleaning medium supply and recovery mechanism, allowing for cleaning within an isolated environment to prevent outside air ingress and safely manage toxic gases.

Benefits of technology

Enables safe and efficient cleaning of reactors isolated from outside air, effectively managing toxic gases and maintaining a sealed environment during manufacturing and cleaning processes.

✦ Generated by Eureka AI based on patent content.

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Patent Text Reader

Abstract

To provide a reaction system or the like that can effectively clean a reactor isolated from outside air.SOLUTION: Provided is a reaction system 1, wherein a reactor 210 is provided in a sealed space covered by a shutoff mechanism 111, and has a feed port for a material to be treated and an outlet port for a product. A transport device 221 transports the material to be treated inside a cylinder along an extension direction of the cylinder. A fluid supply pipe 204 is connected to a fluid inlet provided in the reactor and supplies production fluid. A fluid discharge pipe 206 discharges the fluid inside the reactor from a fluid outlet provided in the reactor. During a cleaning process, a cleaning medium supply device 232 is branched and connected to the feed port and / or the fluid supply pipe and can input a cleaning medium into the reactor.SELECTED DRAWING: Figure 1
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Description

Technical Field

[0001] The present invention relates to a reaction system and a cleaning method.

Background Art

[0002] There is a manufacturing system that manufactures a desired product by stirring a predetermined raw material in a predetermined environment.

[0003] For example, Patent Document 1 discloses the following reaction apparatus. The reaction apparatus includes a screw feeder main body that serves as a pressure reaction vessel, a catalyst supply unit that introduces a catalyst into the screw feeder main body, and a lower hydrocarbon supply unit that introduces a lower hydrocarbon into the screw feeder main body. Further, this reaction apparatus includes a screw that transfers the generated nano carbon, a solid discharge unit that discharges the catalyst and the nano carbon transferred by the screw, and a gas discharge unit that discharges the generated hydrogen outside the feeder main body.

Prior Art Documents

Patent Documents

[0004]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0005] Incidentally, when using the above-mentioned system to produce highly reactive products such as electrolytes and active materials for all-solid-state lithium-ion batteries, moisture in the atmosphere reacts with the processed material and products to generate toxic hydrogen sulfide. Therefore, it is sometimes necessary to isolate at least a part of the system from the outside air and produce the products while maintaining a sealed environment. Such systems require care to prevent outside air from flowing into the internal space. On the other hand, equipment placed in a sealed environment may require cleaning the inside without generating toxic gases, for example, when measuring the wear of components constituting the reaction system or when repairing or replacing them. In such cases, there have been challenges in ensuring safety during work, such as covering the entire factory building or reaction system with an exhaust system, or wearing protective equipment such as chemical protective suits and protective masks.

[0006] This disclosure was made to solve these problems and can provide a reaction system, etc., that can suitably clean a reactor having a space isolated from the outside air. [Means for solving the problem]

[0007] The reaction system according to this disclosure is a reaction system capable of performing a manufacturing process to produce a predetermined product from a workpiece. The reaction system comprises a shut-off mechanism, a reactor, a conveying device, a fluid supply pipe, a fluid discharge pipe, a cleaning medium supply device, and a recovery mechanism. The shut-off mechanism is configured to shut off the outside air from the inside air. The reaction system has a closed space containing the inside air isolated by the shut-off mechanism. The reactor is a cylindrical body having a workpiece inlet and a product outlet. The conveying device conveys the workpiece inside the cylindrical body along the direction of extension of the cylindrical body. The fluid supply pipe supplies a manufacturing fluid by connecting to a fluid inlet provided in the reactor. The fluid discharge pipe discharges the fluid inside the reactor from a fluid outlet provided in the reactor. The cleaning medium supply device, as part of the cleaning process, can be branched and connected to at least one of the supply inlet or the fluid supply pipe to introduce the cleaning medium into the reactor. The recovery mechanism, in the cleaning process, is connected to at least one of the fluid discharge pipe or the outlet to recover the waste discharged as a result of the introduction of the cleaning medium.

[0008] The cleaning method according to this disclosure is a cleaning method for a reaction system capable of performing a manufacturing process to produce a predetermined product from a processed material, comprising: a partition wall capable of blocking outside air from inside air; a reaction furnace which is a cylindrical body provided in a sealed space covered by the partition wall and having a material supply port and a product discharge port; a conveying device for conveying the material inside the cylindrical body along the extension direction of the cylindrical body; a fluid supply pipe for supplying a manufacturing fluid connected to a fluid inlet provided in the reaction furnace; and a fluid discharge pipe for discharging the fluid inside the reaction furnace from a fluid outlet provided in the reaction furnace. The cleaning method comprises, as a cleaning step, introducing a cleaning medium into the reaction furnace from at least one of the supply port or the fluid supply pipe, and recovering the discharged material resulting from the introduction of the cleaning medium from at least one of the fluid discharge pipe or the discharge port. [Effects of the Invention]

[0009] According to this disclosure, it is possible to provide a reaction system, etc., that can suitably clean a reactor that is isolated from the outside air. [Brief explanation of the drawing]

[0010] [Figure 1] This is an overall diagram of the reaction system according to Embodiment 1. [Figure 2] This is a block diagram of the reaction system according to Embodiment 1. [Figure 3] This is a flowchart of the manufacturing process performed by the reaction system. [Figure 4] This is a flowchart of the cleaning process performed by the reaction system. [Figure 5] This diagram shows the flow of substances being processed in a reaction system. [Figure 6] This is an overall diagram of the reaction system according to Embodiment 2. [Figure 7] This is an overall diagram of the reaction system according to Embodiment 3. [Modes for carrying out the invention]

[0011] The present invention will be described below through embodiments of the invention, but the invention claimed is not limited to the following embodiments. Furthermore, not all of the configurations described in the embodiments are necessarily essential as means of solving the problem. For clarity of explanation, the following descriptions and drawings have been omitted and simplified as appropriate. In each drawing, the same elements are denoted by the same reference numerals, and redundant explanations have been omitted where necessary.

[0012] <Embodiment 1> The overall configuration of the reaction system 1 according to this embodiment will be described with reference to Figure 1. Figure 1 is an overall diagram of the reaction system 1. The reaction system 1 shown in Figure 1 produces products by subjecting a workpiece to a predetermined treatment. The products produced by the reaction system 1 are, for example, battery components such as solid electrolytes and positive electrode active materials used in sulfide-based all-solid-state lithium-ion secondary batteries. The predetermined treatment is not particularly limited as long as it is a means used in the process of changing the workpiece into a product, but for example it is a temperature change such as heating or cooling. The predetermined treatment is, for example it is stress transfer such as stirring, mixing, kneading, or grinding. The predetermined treatment is, for example it is a reaction involving the transfer of electrons or radicals. The predetermined treatment is, for example it is contact with a catalyst.

[0013] When manufacturing battery components, reaction system 1 must perform each step at a predetermined temperature and atmosphere. The predetermined atmosphere is, for example, a dew point temperature of approximately minus 70 degrees Celsius. The predetermined temperature is, for example, approximately 20 to 1000 degrees Celsius. Furthermore, when manufacturing battery components, hydrogen sulfide may be generated from the processed materials or products, or hydrogen sulfide may be supplied to the reaction furnace. Therefore, reaction system 1 is required to perform the above manufacturing steps in an environment isolated from the outside air.

[0014] Furthermore, while the reaction system 1 performs the manufacturing process to produce the aforementioned products, it is also configured to perform a cleaning process to clean the inside of the reaction system 1 when the manufacturing process is not being performed. The reaction system 1 performs the manufacturing process while maintaining an environment isolated from the outside air. Therefore, even during the cleaning process, the reaction system 1 maintains an environment isolated from the outside air to prevent outside air from flowing into the internal air area, or to prevent toxic gases generated on the internal air area from leaking into the outside air area.

[0015] The reaction system 1 mainly consists of a material input block 100 and a processing block 200. In the manufacturing process, the reaction system 1 receives a material container 10 from a material receiving port 101 in the material input block 100 and puts the material 10A sealed in the received material container 10 into the processing block 200. In the washing process, the reaction system 1 performs washing by receiving a predetermined medium for washing.

[0016] The material input block 100 has a material receiving space 110 covered by a blocking mechanism 111 that blocks outside air from inside air, and has a material receiving inlet 101 and a material input inlet 102. The blocking mechanism 111 is a structure that blocks outside air from inside air in the reaction system 1, and is one embodiment of the blocking mechanism. The blocking mechanism 111 may be a structure such as a partition wall, or it may utilize a fluid such as an air curtain. The reaction system 1 has a closed space containing inside air isolated by the blocking mechanism 111. The material receiving space 110 is provided with a robot arm or the like for receiving material containers 10 as appropriate and for inputting the material 10A stored in the received material containers 10 into the processing block 200.

[0017] The material receiving port 101 is an opening provided in the material container 10 receiving section, which is a space enclosed by a partition wall for receiving the material container 10. The material receiving port 101 is equipped with a material receiving door 103 that can be opened and closed. When the material receiving door 103 is closed, the inside of the material input block 100 is isolated from the outside air.

[0018] The process material input port 102 is an opening for introducing the process material 10A stored in the process material container 10 received by the process material input block 100 into the process block 200. A process material input door 104 is installed at the process material input port 102 so as to be openable and closable. When the process material input door 104 is in the closed state, the inside of the process material input block 100 and the process block 200 are blocked off from each other.

[0019] In the above-described configuration, when the process material receiving door 103 of the process material input block 100 is in the open state, the process material input door 104 is in the closed state. Similarly, when the process material input door 104 is in the open state, the process material receiving door 103 is in the closed state. Further, the process material input block 100 also has means (not shown) for appropriately sucking the internal air or means (not shown) for filling the internal air with an inert gas or the like. Thereby, when the reaction system 1 receives the process material 10A into the process block 200, it can maintain a state of being blocked off from the outside air.

[0020] In the present disclosure, the blocking of outside air and inside air is to prevent at least one type of substance contained in the outside air from flowing into the inside air side space exceeding a predetermined amount threshold. Alternatively, the blocking of outside air and inside air is to prevent at least one type of substance contained in the inside air from flowing out to the outside air side space exceeding a predetermined amount threshold. At this time, the inside air side space is at least a part of the space inside the reaction system, and when at least one type of substance contained in the outside air or the cleaning medium contacts exceeding a predetermined amount threshold, it is a space where a substance capable of generating a harmful substance exists. That is, as long as the space is where the above substances exist, the location and range are not particularly limited. The inside air side space may be, for example, the processing material input block 100, or may be a part of the reactor 210. Note that the outside air side space may be the space outside the reaction system 1, or may be a space inside the reaction system 1 having a blocking mechanism that does not correspond to the inside air side space. Note that the above-mentioned predetermined "amount" is not particularly limited as long as it is an amount that can be quantified by a measuring instrument such as the concentration, weight, volume, pressure, etc. of the substance. However, when the substance is a gas, it is preferably the concentration, and more preferably the concentration at the temperature of the space targeted in the cleaning process.

[0021] Also, in the present disclosure, a harmful substance may be interpreted as at least any one of a substance that may pose a health risk to the human body, a substance that may pose a physical risk such as ignition or combustion, a substance that may pose a chemical risk such as corrosion to structures such as devices and workplaces, and a substance that may pose a risk to the environment such as the atmosphere, water quality, and soil. That is, a harmful substance may be interpreted as a substance for which a warning or caution is given by any description or symbol mark indicating danger or harmfulness in a safety data sheet. A harmful substance may be a substance designated by Japanese national law, such as a specific chemical substance, poison, or highly toxic substance.

[0022] Furthermore, the material input block 100 may accept a predetermined cleaning medium instead of the material container 10. The cleaning medium accepted by the material input block 100 may be, for example, an abrasive or bead-shaped solid to remove residue present in the processing block 200, or a liquid such as a cleaning solution. The material receiving door 103 and the material input door 104 described above may be, for example, a valve body such as a butterfly valve, a ball valve, or a shutter. The material receiving door 103 and the material input door 104 do not have to be structures such as valve bodies or walls. That is, the material receiving door 103 and the material input door 104 may be sealed off from the inside and outside by means of using airflow, such as an air curtain. However, the form and structure of the material receiving door 103 and the material input door 104 are not limited to the above configuration.

[0023] Next, the processing block 200 will be described. The processing block 200 is a reaction apparatus that receives the material 10A and produces the product 10B. The processing block 200 produces the product 10B by performing manufacturing processes that apply stimuli such as kneading, stirring, and grinding to the material 10A in an atmosphere at a predetermined temperature. Once the product 10B has been produced, the processing block 200 discharges the produced product 10B from the discharge port 202.

[0024] The processing block 200 mainly consists of a supply port 201, a discharge port 202, a temperature control device 203, a reactor 210, a processing space 211, a drive device 220, and a conveying device 221. The processing block 200 also has a fluid supply pipe 204, a supply pipe control valve 205, a fluid discharge pipe 206, and a discharge pipe control valve 207 to control the atmosphere of the processing space 211.

[0025] The supply port 201 is an inlet for receiving a predetermined material into the processing space 211. The supply port 201 shown in Figure 2 receives the material 10A that is fed in from the material input port 102 of the material input block 100. The material 10A received by the supply port 201 is supplied to the processing space 211. The material input port 102 and the supply port 201 may be connected by a continuous partition wall. Alternatively, the material input port 102 and the supply port 201 may be connected in a manner that can block outside air from inside air. For example, the material input port 102 and the supply port 201 may be fastened together via an O-ring made of nitrile rubber, fluororesin, or silicone resin, or a gasket made of metal or resin, or a cylindrical housing may be interposed between them so that the material input port 102 and the supply port 201 are not directly connected.

[0026] The processing space 211 is a processing space that is isolated from the outside air by a partition wall and a reactor 210. In the processing space 211, the processing block 200 kneads, stirs, mixes, and grinds the material 10A under a predetermined environment to produce product 10B.

[0027] The reactor 210 is a cylindrical member extending horizontally and is the housing of the processing block 200. The cross-sectional shape of the reactor 210 is not particularly limited and may be circular, elliptical, or polygonal. Furthermore, the cross-sectional shape of the reactor 210 may be a combination of multiple geometric shapes.

[0028] The material used to form the reactor 210 is not particularly limited, but it is preferable that it has resistance to hydrogen sulfide gas generated inside and to predetermined temperature changes. For this reason, the components constituting the reactor 210 may be formed from, for example, alloys, ceramics, carbon, and composite materials containing two or more of these. Alloys are metallic components that contain at least one alloying element such as nickel, cobalt, chromium, molybdenum, tungsten, tantalum, titanium, iron, copper, aluminum, silicon, boron, and carbon. Ceramics are ceramic components such as oxides such as alumina and zirconia, carbides such as silicon carbide and titanium carbide, nitrides such as silicon nitride and titanium nitride, and borides such as chromium boride. Carbon is a carbon component such as crystalline graphite or fiber-reinforced graphite. For example, the reactor 210 may be composed of components containing alloys, ceramics, or carbon, at least in its interior material.

[0029] The reactor 210 is provided in a sealed space covered by the shut-off mechanism 111 and is a cylindrical body having, for example, a material supply port 201 at one end and a product outlet 202 at the other end. The reactor 210 forms a processing space 211 inside and houses the conveying device 221 in the processing space 211. The reactor 210 also receives material from the supply port 201 on the upstream side. The reactor 210 also discharges the product 10B to the outside from the outlet 202 on the downstream side. The reactor 210 may have the supply port 201 and the outlet 202 at one end or at a position spaced apart from the end.

[0030] In this disclosure, upstream and downstream are defined as follows: At point A, which is any position in the path from the supply port 201 to the outlet port 202, the position closer to the supply port 201 from point A is defined as the upstream position, and the position closer to the outlet port 202 from point A is defined as the downstream position. Furthermore, the upstream side refers to the direction upstream from point A, and the downstream side refers to the direction downstream from point A.

[0031] The reactor 210 is covered by a temperature control device 203 in its intermediate section, and the inside of the reactor 210 is configured to be heated or cooled. The reactor 210 is also connected to a fluid supply pipe 204 in its intermediate section, and when the supply pipe control valve 205 opens, a predetermined fluid is received from the fluid supply pipe 204. The predetermined fluid is, for example, an inert gas such as nitrogen. The reactor 210 is also connected to a fluid discharge pipe 206 in its intermediate section, and when the discharge pipe control valve 207 opens, the fluid containing hydrogen sulfide gas generated in the processing space 211 is discharged to the fluid discharge pipe 206.

[0032] The temperature control device 203 includes a heating device or a cooling device and controls the temperature inside the reactor 210, i.e., the processing space 211. The temperature control device 203 has a heating device in the middle section of the reactor 210 so as to surround the cylindrical reactor 210. The heating device includes any temperature-controllable heater, such as a sheath heater, coil heater, or ceramic heater. The heating device heats in a range from room temperature to about 1000 degrees Celsius. The temperature control device 203 may set different temperatures for each region in the middle section of the reactor 210 along the long axis of the conveying device 221. The temperature control device 203 may also set different temperatures for each region in the vertical direction (short axis direction) of the reactor 210.

[0033] The drive unit 220 has a motor and a drive force transmission unit fitted to a drive shaft protruding from the motor, and drives the conveying device 221. The conveying device 221 in Figure 1 is, for example, a screw extending from one end to the other of the processing space 211. There may be one screw or two or more. The conveying device 221 rotates inside the cylindrical body of the reactor 210 so as to be able to convey the processed material along the direction of extension of the cylindrical body. The conveying device 221 is rotated by the drive unit 220. The drive unit 220 can, for example, control the driving direction and driving speed of the conveying device 221. The shape and form of the conveying device 221 are not particularly limited. For example, the conveying device 221 is not limited to a screw that conveys processed material by rotation, but may also be a belt conveyor or a rotating drum. The conveying device 221 may also be a combination of a screw and multiple conveying devices such as a blower.

[0034] The fluid supply pipe 204 is connected to a fluid inlet provided in the reactor 210 to supply the fluid for production. The fluid supply pipe 204 has a supply pipe control valve 205. When the supply pipe control valve 205 opens, the fluid supply pipe 204 supplies a predetermined amount of fluid to the processing space 211.

[0035] The fluid supply pipe 204 also includes a first switching section 231. The first switching section 231 includes a mechanism to switch between a supply pipe control valve 205 that supplies manufacturing fluid and a cleaning medium supply device 232 that is branched off from the fluid supply pipe 204. In the manufacturing process, the first switching section 231 is configured to supply manufacturing fluid to the processing space 211 from the supply pipe control valve 205. In the cleaning process, the first switching section 231 is configured to supply cleaning fluid to the processing space 211 from the cleaning medium supply device 232.

[0036] The cleaning medium supply device 232 supplies cleaning fluid to the processing space 211 during the cleaning process. The cleaning medium supply device 232 includes, for example, a syringe capable of dropping a predetermined amount of cleaning fluid. Preferably, the cleaning medium supply device 232 is a device capable of supplying a preset amount of cleaning fluid. More preferably, the cleaning medium supply device 232 is a device that can be quantitatively controlled via a control signal or the like. The cleaning medium supply device 232 may be, for example, a dispenser, a syringe, or a supply device with a mass flow meter. The cleaning medium supply device 232 may be any other device as long as it can supply cleaning fluid. The cleaning medium supply device 232 may also be connected by branching to the supply port 201. That is, as part of the cleaning process, the cleaning medium supply device 232 can be connected by branching to at least one of the supply port 201 or the fluid supply pipe 204, and the cleaning medium can be introduced into the reactor. The "amount" of the cleaning fluid mentioned above is not particularly limited as long as it is a quantity that can be quantified using measuring instruments such as concentration, volume, weight, or pressure, but it may also be expressed as a flow rate, such as milliliters per hour.

[0037] The fluid discharge pipe 206 discharges the fluid inside the reactor 210 through a fluid outlet provided in the reactor 210. The fluid discharge pipe 206 has a discharge pipe control valve 207. When the discharge pipe control valve 207 opens, the fluid present in the processing space 211 is discharged to the outside of the processing space 211.

[0038] The fluid discharge pipe 206 includes a second switching section 241. The second switching section 241 is interposed in the fluid discharge pipe 206 for recovering manufacturing fluids, etc., in the manufacturing process, and guides the fluid after cleaning, which is discharged in the cleaning process, to the fluid recovery mechanism 242. In other words, the second switching section 241 includes a mechanism that switches between the flow path of the fluid discharge pipe 206 in the manufacturing process and the flow path of the fluid discharge pipe 206 in the cleaning process.

[0039] The fluid recovery mechanism 242 is connected to the fluid discharge pipe 206 during the washing process and recovers the waste discharged into the fluid discharge pipe 206 when the washing medium is introduced. The fluid recovery mechanism 242 includes a container for storing the recovered fluid. The fluid recovery mechanism 242 may also have a separation device such as a filter, separator, or sedimentation tank for separating the recovered fluid. The fluid recovery mechanism 242 may also have a purification device such as a scrubber, burner, or activated carbon for appropriately purifying the recovered fluid.

[0040] The discharge port 202 is a discharge port that discharges the product 10B, which is the product produced by subjecting the material received from the supply port 201 to a predetermined process. More specifically, the discharge port 202 discharges the product 10B, for example, in the form of powder or slurry, downwards. The discharge port 202 is connected to the next process while maintaining a state of isolation from the outside air.

[0041] The outlet 202 is connected to the third switching unit 251. The third switching unit 251 guides the waste after washing, which is discharged in the washing process, to the waste recovery mechanism 252. In other words, the third switching unit 251 includes a mechanism that switches between a flow path for discharging the product 10B in the manufacturing process and a flow path for guiding the waste after washing in the washing process to the waste recovery mechanism 252.

[0042] The waste recovery mechanism 252 is connected to the outlet 202 during the washing process and recovers the waste discharged to the outlet 202 when the washing medium is introduced. The waste recovery mechanism 252 includes a container for storing the recovered waste. The waste recovery mechanism 252 may also have a separation device such as a filter, separator, or sedimentation tank for separating multiple substances contained in the recovered waste. The waste recovery mechanism 252 may also have a purification device such as a scrubber, burner, or activated carbon for appropriately purifying the recovered fluid.

[0043] A discharge measuring device 240 is installed in the fluid discharge pipe 206. The discharge measuring device 240 measures the components of the discharge during the cleaning process. The components measured by the discharge measuring device 240 can be set according to the application of the reaction system 1. The discharge measuring device 240 may include multiple sensors to measure multiple components.

[0044] The overall configuration of reaction system 1 has been described above. Note that the material input block 100 does not have to be in close proximity to or in contact with the reactor 210. For example, a material transport means may be provided between the material input block 100 and the reactor 210. A material transport means may be, for example, an air transport device or a belt conveyor. In this way, even if the material input block 100 is located away from the reactor 210, reaction system 1 can suitably supply the material 10A to the reactor 210.

[0045] Next, the functional configuration of the reaction system 1 will be described with reference to Figure 2. Figure 2 is a block diagram of the reaction system according to Embodiment 1. The reaction system 1 has a control device 260 that controls each of the components of the reaction system 1 in order to realize the functions of the present disclosure.

[0046] In the manufacturing process, the control device 260 controls the reaction system 1 to produce product 10B from the material 10A. In the washing process, the control device 260 controls at least one of the temperature control device 203, the conveying device 221, and the washing medium supply device 232 based on, for example, the amount or temperature of the waste material. In this disclosure, the "amount" of the substance contained in the waste material is not particularly limited as long as it is an amount that can be quantified by measuring instruments such as concentration, volume, weight, and pressure. For example, if the waste material is a gas, it may be the concentration measured by a gas concentration meter, and may be expressed in units such as ppm (parts per million) or volume percentage.

[0047] The control device 260 includes, for example, a computing device such as a CPU (Central Processing Unit), a GPU (Graphics Processing Unit), or an MCU (Micro Controller Unit). The control device 260 also includes a storage device such as DRAM (Dynamic Random Access Memory) or flash memory, an interface that enables communication between each component, and other peripheral circuits. The control device 260 is connected to the temperature control device 203, the drive device 220, the manufacturing fluid control device 270, the first switching unit 231, the second switching unit 241, the third switching unit 251, the cleaning medium supply device 232, the waste measurement device 240, and the information input / output device 280.

[0048] Of the components connected to the control device 260, the temperature control device 203, the drive device 220, the first switching unit 231, the second switching unit 241, the third switching unit 251, the cleaning medium supply device 232, and the discharge measuring device 240 have already been explained with reference to Figure 1, so their explanation will be omitted here.

[0049] The manufacturing fluid control device 270 shown in Figure 2 controls the amount of manufacturing fluid supplied to the reactor 210 during the manufacturing process. The manufacturing fluid control device 270 can, for example, operate the opening and closing of the supply pipe control valve 205. The manufacturing fluid control device 270 can also control the operation of the pump that pumps the manufacturing fluid supplied to the fluid supply pipe 204. In this disclosure, the "amount" of the manufacturing fluid is not particularly limited as long as it is an amount that can be quantified by measuring instruments such as concentration, volume, weight, and pressure, but if the manufacturing fluid is a gas, for example, it may be a flow rate that can be controlled by a mass flow controller or the like, such as liters per minute.

[0050] The waste product measuring device 240 measures the composition of waste products during the washing process and supplies the measurement data to the control device 260. The waste product measuring device 240 may also measure the composition and temperature of fluids during the manufacturing process.

[0051] The information input / output device 280 includes, for example, a display device for notifying the user of various information regarding the response system 1, and an information input device for receiving predetermined operations from the user.

[0052] Next, an overview of the manufacturing process performed by reaction system 1 will be described with reference to Figure 3. Figure 3 is a flowchart of the manufacturing process performed by reaction system 1. The flowchart shown in Figure 3 can also be said to represent the processes performed by the control device 260. The flowchart shown in Figure 3 can also be said to represent the operating procedure performed by the user operating reaction system 1.

[0053] First, the reaction system 1 controls the temperature control device 203 to adjust the reactor 210 to a predetermined temperature (step S1).

[0054] Next, the reaction system 1 controls the manufacturing fluid control device 270 to supply the manufacturing fluid to the processing space 211 (step S2).

[0055] Next, the reaction system 1 receives the material container 10 into the material input block 100 (step S3). By receiving the material container 10 into the material input block 100, the reaction system 1 supplies the material 10A stored in the material container 10 to the supply port 201.

[0056] Next, the reaction system 1 controls the drive unit 220 to drive the transport unit 221, thereby transporting the material 10A received from the supply port 201 from the upstream side to the downstream side (step S4). After the material 10A is introduced into the reactor 210 from the supply port 201, a predetermined reaction takes place in the processing space 211 to generate product 10B.

[0057] Next, the reaction system 1 discharges the product 10B at the outlet 202 (step S5). Once the reaction system 1 has discharged the product 10B, it completes the series of processes.

[0058] The manufacturing process performed by reaction system 1 has been described above. Reaction system 1 can perform the above processes continuously. Therefore, reaction system 1 can continuously produce product 10B. Also, in the flowchart above, step S1 may be performed after step S2. Steps S1 and S2 may be performed simultaneously.

[0059] Reaction system 1 can continuously perform the above-described manufacturing process in an environment isolated from the outside air. As reaction system 1 performs such processing, residues and other substances adhere to the reaction furnace 210. Therefore, reaction system 1 temporarily stops the manufacturing process and performs a cleaning process.

[0060] The cleaning process will be explained with reference to Figure 4. Figure 4 is a flowchart of the cleaning process performed by the reaction system. The flowchart shown in Figure 4 can also be said to represent the processes performed by the control device 260. The flowchart shown in Figure 4 can also be said to represent the operating procedure performed by the user operating the reaction system 1.

[0061] First, the reaction system 1 controls the temperature control device 203 to adjust the temperature of the reactor 210 (step S11).

[0062] Next, the reaction system 1 controls the drive unit 220 to drive the conveying device 221 (step S12). The purpose of driving the conveying device 221 in the cleaning process may be, but is not limited to, the purpose of conveying the cleaning medium. The purpose of driving the conveying device 221 in the cleaning process may be to agitate the cleaning medium or the atmosphere containing the cleaning medium, or to promote cleaning by the cleaning medium. Alternatively, step S12 may be skipped without driving the conveying device, and the process may proceed to step S13.

[0063] Next, reaction system 1 controls the cleaning medium supply device 232 to supply the cleaning medium to the reaction furnace 210 (step S13). Alternatively, if reaction system 1 has received cleaning medium from the material input block 100, it supplies the received cleaning medium to the supply port 201.

[0064] Next, the reaction system 1 recovers the waste discharged into the fluid discharge pipe 206 by introducing a cleaning medium (step S14).

[0065] Next, the reaction system 1 measures the composition, temperature, and quantity of substances contained in the discharge by acquiring measurement data from the discharge measuring device 240 in the fluid discharge pipe 206 (step S15).

[0066] Next, the reaction system 1 determines whether or not to terminate the cleaning process based on the measurement data obtained from the waste measurement device 240 (step S16). Here, the control device 260 obtains data on the amount of cleaning medium supplied by the cleaning medium supply device 232 and the components of the waste measured by the waste measurement device 240, and determines whether or not to continue the cleaning process based on the obtained data. More specifically, the reaction system 1 may determine whether or not to terminate the cleaning process by monitoring, for example, the amount of harmful substances contained in the waste generated in the reactor 210 by the cleaning process. At this time, the reaction system 1 may also monitor the elapsed time of the cleaning process and make the above determination according to the relationship between the elapsed time and the amount of harmful substances. Alternatively, it may monitor only the elapsed time of the cleaning process and determine to terminate the cleaning process when a sufficient amount of time has elapsed. In this disclosure, the "amount" of harmful substances contained in the waste is not particularly limited as long as it is an amount that can be quantified by measuring instruments such as concentration, volume, weight, and pressure, but for example, if the waste is a gas, it may be the concentration measured by a gas concentration meter, and may be expressed in units such as ppm or volume percentage.

[0067] If it is determined that the cleaning process should be terminated (step S16: YES), the reaction system 1 terminates the cleaning process. On the other hand, if it is not determined that the cleaning process should be terminated (step S16: NO), the reaction system 1 proceeds to step S17.

[0068] In step S17, the reaction system 1 determines whether or not to perform parameter adjustment (step S17). Parameter adjustment refers to at least one of the components functioning in the washing process, such as the temperature of the reactor 210, the driving direction or driving speed of the conveying device 221, or the amount of washing medium introduced. In determining whether or not to perform parameter adjustment, the reaction system 1 may, as appropriate, acquire and refer to feedback data regarding the temperature of the reactor 210 and the driving torque or driving speed of the conveying device 221.

[0069] If it is determined that parameter adjustments should be made (step S17: NO), reaction system 1 returns to step S15. On the other hand, if it is determined that parameter adjustments should be made (step S17: YES), reaction system 1 proceeds to step S18.

[0070] In step S18, reaction system 1 adjusts its parameters based on the result of the determination in step S17 (step S18). After adjusting the parameters, reaction system 1 returns to step S15.

[0071] The cleaning process performed by reaction system 1 has been described above. Now, a specific example of the cleaning process performed by reaction system 1 will be described. For example, reaction system 1 uses water as a cleaning medium to clean sulfides and other substances remaining in the reactor 210. In this case, reaction system 1 sets the temperature of the reactor 210 to, for example, about 200 degrees Celsius and drives the conveying device 221 at high speed. Then, reaction system 1 drops water as a cleaning medium from the cleaning medium supply device 232. As a result, the water in the reactor 210 changes state to steam and becomes steam, which is then stirred by the driving of the conveying device, allowing it to efficiently come into contact with the remaining sulfides and other substances. The stirred steam comes into contact with the sulfides and other substances remaining in the reactor 210 and reacts to produce hydrogen sulfide. The fluid recovery mechanism 242 recovers the hydrogen sulfide, which is a harmful substance discharged into the fluid discharge pipe 206, and the unreacted steam that is discharged.

[0072] Because steam is relatively reactive, it is suitable for cleaning using a reaction. Also, because steam has a larger volume than water, it can relatively easily come into contact with powdery residues with a large surface area, such as sulfides, that remain in the reactor 210. For this reason, even in cleaning processes that conventionally required a large amount of water, the reaction system 1 can reduce the amount of water used by converting water into steam. In this way, the reaction system 1 can perform efficient cleaning by appropriately changing the state of the cleaning medium in the reactor 210.

[0073] In this case, the reaction system 1 measures, for example, the concentration of hydrogen sulfide in the exhaust measurement device 240. As time passes and the reaction between residual sulfides and water vapor progresses, the concentration of hydrogen sulfide measured in the exhaust measurement device 240 increases, and conversely, the amount of residual sulfides in the reactor 210 may decrease. The measurement results of the exhaust concentration etc. measured by the exhaust measurement device 240 can be calculated, stored, machine-learned, and output by the control device 260 in a way that allows tracking or prediction of changes in the exhaust concentration etc. over time. Furthermore, based on the calculation results, the control device 260 transmits a control signal to at least one of the temperature control device 203, the conveying device 221, and the washing medium supply device 232.

[0074] More specifically, for example, if the concentration of the waste at 0:00 in the past was 1 volume percent, and the concentration of the waste at the current time of 0:10 is also 1 volume percent, the control device 260 calculates that the change in the concentration of the waste over time is 0. The control device 260 may, for example, display the calculation result on an operation panel.

[0075] The control device 260 may perform a process to control the concentration of waste at a predetermined future time based on the calculations described above. The control device 260 performs calculations to optimize the control parameters of the temperature control device 203, the conveying device 221, and the washing medium supply device 232 in order to set the concentration of waste at 0:20 in the future time to, for example, 2 volume percent. As a result, the control device 260 may, for example, send a control signal to the washing medium supply device 232 to double the amount of washing fluid supplied. When the concentration of waste falls below a predetermined threshold, the reaction system 1 terminates the washing process.

[0076] In the example of the cleaning process described above, the reaction system 1 may receive, for example, ceramic beads as a cleaning medium from the supply port 201, or it may receive a suspension containing ceramic beads from the cleaning medium supply device 232. The ceramic beads are used to collide with the inner wall of the reactor 210 to remove residue. In this case, the introduced ceramic beads are sent out to the outlet 202 along with the residue. The reaction system 1's waste recovery mechanism 252 recovers the ceramic beads and residue sent out to the outlet 202.

[0077] The above describes a specific example of the cleaning process performed by reaction system 1. With the above configuration, reaction system 1 cleans the inside of reaction system 1 while maintaining a state of isolation from the outside air. In the above configuration, the control device 260 may have a function that involves machine learning in the cleaning process. For example, the control device 260 includes a learning model that determines the cleaning conditions. More specifically, the control device 260 learns the relationship between at least one cleaning condition, such as the temperature of the reactor 210, the operating state of the conveying device 221, and the amount of cleaning medium supplied by the cleaning medium supply device 232, and the amount of harmful substances contained in the discharge. The machine learning referred to here may be a learning model that performs deep learning using, for example, the maximum peak amount of harmful substances contained in the discharge as a reward.

[0078] Next, with reference to Figure 5, the flow of substances processed by reaction system 1 will be explained. Figure 5 is a diagram showing the flow of substances processed in the reaction system. In Figure 5, the manufacturing process is shown in the upper section, and the cleaning process is shown in the lower section.

[0079] In the manufacturing process described above, reaction system 1 receives the manufacturing fluid and the material to be processed, and reacts them in a reactor. As a result, reaction system 1 discharges the predetermined product and the reaction fluid. The reaction fluid may contain the same components as the manufacturing fluid.

[0080] In the cleaning process shown in the lower section, reaction system 1 receives a cleaning medium. The cleaning medium may be a liquid such as water as shown in the specific example above, or a gas such as water vapor. Alternatively, the cleaning medium may be a solid such as ceramic beads as shown in the specific example above, or a liquid in which solid particles are suspended. Upon receiving the cleaning medium, reaction system 1 reacts it with the residue remaining in the reactor. As a result, harmless substances, harmful substances, and the cleaning medium are discharged from the reactor. Harmless substances are substances that do not fall under the category of harmful substances.

[0081] The cleaning medium discharged from the reactor can be recovered and reused as a cleaning medium. Alternatively, harmless substances, hazardous substances, and cleaning medium discharged from the reactor may be recovered by a recovery mechanism. The harmless substances, hazardous substances, and cleaning medium recovered by the recovery mechanism are then separated and purified as appropriate by separation and purification devices.

[0082] After the recovery mechanism has processed the recovered non-toxic substances, hazardous substances, and cleaning media through a separation and purification device, the cleaning media may be extracted. In this case, the extracted cleaning media is reused in the cleaning process. After the recovered non-toxic and hazardous substances have processed through a separation and purification device, the treated material may be extracted. In this case, the extracted treated material (reprocessed material) is reused in the manufacturing process. Similarly, after the recovered non-toxic and hazardous substances have processed through a separation and purification device, the manufacturing fluid may be extracted. In this case, the extracted manufacturing fluid is reused in the manufacturing process. Finally, after the recovered non-toxic and hazardous substances have processed through a separation and purification device, waste may be extracted. The waste is disposed of as appropriate.

[0083] Regarding the cleaning process described above, various cleaning processes can be performed as follows by utilizing the various components of reaction system 1.

[0084] For example, reaction system 1 accepts water as a cleaning medium. Reaction system 1 decomposes the residue remaining in the reactor 210 with water. In this case, reaction system 1 can adjust the amount of water added by monitoring the internal pressure of the reactor 210. In this case, the progress of cleaning can be monitored by measuring the temperature change associated with the heat of dissolution of the residue using an exhaust measuring device 240 or a temperature sensor attached to the reactor 210 (not shown). Furthermore, the gas generated by the decomposition is recovered by a fluid recovery mechanism 242. The fluid recovery mechanism 242 may have a burner for burning the recovered gas. By burning the gas with the burner, reaction system 1 can render the recovered gas harmless.

[0085] For example, the reaction system 1 accepts water as a cleaning medium and vibrates the conveying device 221 by rapidly switching the driving direction, thereby removing the residue. In this case, for example, after the waste recovery mechanism 252 recovers the water and residue, the reaction system 1 can suitably separate the water and residue by centrifuging the recovered waste. In such a cleaning process, the reaction system 1 may, for example, monitor the volume and weight of the residue in the recovered waste. With this configuration, the reaction system 1 can monitor the progress of the cleaning.

[0086] The reaction system 1 can accept ceramic beads as a cleaning medium. In this case, the ceramic beads detach residues adhering to the reaction furnace 210. The reaction system 1's waste recovery mechanism 252 recovers the ceramic beads and the detached residues. The reaction system 1 can monitor the progress of cleaning by monitoring the amount of residues in the waste recovery mechanism 252, for example, by measuring volume or weight. The recovered waste can also be separated into cleaning medium and residues by, for example, centrifugal separation.

[0087] Reaction system 1 can accept a catalyst capable of decomposing residues as a cleaning medium. In this case, reaction system 1 can monitor the progress of cleaning by monitoring the emitted gas and solids, and can also separate and purify the gas, separate and reuse the solids, etc., using the aforementioned technology.

[0088] The reaction system 1 can accept oxygen as a cleaning medium. In this case, the reaction system 1 can burn or oxidize residues inside the reactor 210 by raising the temperature of the reactor 210 using the temperature control device 203. In this case, the temperature of the reactor 210 is monitored using a thermometer installed in the waste measurement device 240. With this configuration, the reaction system 1 can monitor the temperature inside the reactor 210 with high responsiveness. Therefore, the reaction system 1 can safely perform the cleaning process. The gas produced by combustion or oxidation can be suitably recovered, for example, by a scrubber.

[0089] The reaction system 1 can accept an inert gas as a cleaning medium. In this case, the reaction system 1 can heat the reaction furnace 210 filled with the inert gas, thereby cauterizing any residue remaining in the reaction furnace 210. If gases such as carbon monoxide are generated in the reaction furnace 210 during the cleaning process, the reaction system 1 can recover them using the fluid recovery mechanism 242 and detoxify them by burning them with a burner.

[0090] Reaction system 1 can accept relatively low-temperature substances, such as liquid water, as a cleaning medium after preheating the reactor 210 to a high temperature. Reaction system 1 generates thermal shock in the reactor 210 to detach residue from the reactor 210. In this case, to suppress the deterioration of reaction system 1 itself, reaction system 1 performs the cleaning process while monitoring temperature changes.

[0091] The reaction system 1 can accept a predetermined organic solvent as a cleaning medium. In this case, the reaction system 1 removes the residue by reacting the organic solvent with the residue. The organic solvent is recovered by the fluid recovery mechanism 242 and the waste recovery mechanism 252. In this case, the reaction system 1 can also distill the recovered organic solvent for reuse.

[0092] The reaction system 1 can accept a predetermined fibrous material as a cleaning medium. The fibrous cleaning medium is subjected to a process that, for example, drives a conveying device 221 to remove any residue, which is then entangled and conveyed. The reaction system 1 renders the residue and the fibrous cleaning medium harmless, for example, by combustion, before disposal. The fibrous cleaning medium may be reused after combustion, or any residue adhering to the fibrous cleaning medium may be washed off with water and reused.

[0093] The above describes an example of the cleaning process. It should be noted that the cleaning process performed by the reaction system 1 described above is illustrative and not limited to the above.

[0094] Embodiment 1 has been described above. According to Embodiment 1, it is possible to provide a reaction system, etc., that can suitably clean a reaction furnace that is isolated from the outside air.

[0095] <Embodiment 2> Embodiment 2 will be described with reference to Figure 6. Figure 6 is an overall diagram of the reaction system according to Embodiment 2. Note that some components have been omitted in Figure 6 for ease of understanding. In the reaction system 2 according to this embodiment, the fluid recovery mechanism 242 further includes a reprocessing device which includes a transport path 243 connected to allow the recovered waste to be reintroduced into the reactor from a supply port or fluid inlet.

[0096] The reaction system 2 according to Embodiment 2 has a configuration that allows the fluid recovered by the fluid recovery mechanism 242 to be reused. The reaction system 2 has a manufacturing fluid storage section 208 that stores the manufacturing fluid and supplies it to the fluid supply pipe 204.

[0097] In reaction system 2, the fluid recovery mechanism 242 recovers the fluid after cleaning via the second switching unit 241. The fluid recovery mechanism 242 has a separation device that separates the recovered fluid into a manufacturing fluid and a cleaning medium. The fluid recovery mechanism 242 includes a reprocessing device that separates the recovered fluid into a cleaning medium and a manufacturing fluid.

[0098] The fluid recovery mechanism 242 supplies the cleaning fluid from the separated fluid to the cleaning medium supply device 232. When the cleaning medium supply device 232 receives the cleaning medium from the fluid recovery mechanism 242, it reuses the received cleaning fluid in the cleaning process.

[0099] The fluid recovery mechanism 242 supplies the manufacturing fluid from the separated fluid to the manufacturing fluid storage unit 208. The manufacturing fluid storage unit 208 reuses the manufacturing fluid received from the fluid recovery mechanism 242 in the manufacturing process.

[0100] As described above, in the reaction system 2 according to Embodiment 2, during the cleaning process, the cleaning medium reacts with the residue in the reactor 210 to generate a manufacturing fluid. Therefore, the reaction system 2 recovers the cleaning medium and the manufacturing fluid together, and then separates and reuses them. At this time, the control device 260 may control the parameters of the cleaning process by monitoring the amount of manufacturing fluid contained in the discharged material. More specifically, the control device 260 controls at least the temperature of the reactor 210 and the cleaning medium supply device 232 so that components that can be reused as manufacturing fluid can be extracted from the discharged material. Thus, according to Embodiment 2, it is possible to provide a reaction system that can suitably and efficiently clean a reactor that is isolated from the outside air.

[0101] <Embodiment 3> Next, Embodiment 3 will be described with reference to Figure 7. Figure 7 is an overall configuration diagram of the reaction system 3 according to Embodiment 3. The reaction system 3 shown in Figure 3 has a first reactor 210A and a second reactor 210B as reactors.

[0102] In the manufacturing process, the first reactor 210A receives the material from the material input block 100, performs predetermined processing, and discharges the intermediate product from the outlet 202A to the supply port 201B. In the manufacturing process, the second reactor 210B receives the intermediate product from the first reactor 210A, performs predetermined processing on the received intermediate product, and discharges the product from the outlet 202B.

[0103] The reaction system 3 includes a reprocessing device in the fluid recovery mechanism 242A of the first reactor 210A. The fluid recovery mechanism 242A has a transport path 243 that connects to the cleaning medium supply device 232B of the second reactor 210B.

[0104] Thus, the reprocessing device connects a fluid recovery mechanism 242A connected to the first reactor 210A to a supply port or fluid inlet connected to the second reactor 210B. As a result, the reaction system 3 is configured such that, in the washing process, the waste discharged by the first reactor 210A is received by the second reactor 210B and subjected to predetermined reprocessing.

[0105] In the reaction system 3, the second reaction furnace 210B reprocesses the waste discharged when the first reaction furnace 210A is cleaned, as described above. Thus, according to Embodiment 3, it is possible to provide a reaction system that can suitably and efficiently clean a reaction furnace that is isolated from the outside air.

[0106] Although the present invention has been described above with reference to embodiments, the present invention is not limited thereto. Various modifications to the structure and details of the present invention can be made that are understandable to those skilled in the art within the scope of the invention. [Explanation of symbols]

[0107] 1. Reaction System 2. Reaction System 3. Reaction System 4. Reaction System 10. Container for processed materials 10A Processed material 10B Product 100 Processing material input block 101 Processing Inlet 102 Processing input port 103 Door for receiving processed materials 104 Door for loading processed material 110 Processing space 111 Shut-off mechanism 200 processing blocks 201 Supply port 202 Outlet 203 Temperature control device 204 Fluid supply pipe 205 Supply pipe control valve 206 Fluid discharge pipe 207 Exhaust pipe control valve 208 Manufacturing fluid storage section 210 Reactor 211 Processing space 220 Drive unit 221 Conveying device 231 First switching section 232 Cleaning medium supply device 240 Emission measuring device 241 Second switching section 242 Fluid recovery mechanism 243 Conveyor Route 251 Third switching section 252 Waste Recovery Mechanism 260 Control device 270 Fluid control devices for manufacturing 280 Information Input / Output Device

Claims

1. A reaction system capable of carrying out a manufacturing process to produce a predetermined product from a processed material, A barrier mechanism capable of separating outside air from inside air, A reactor is a cylindrical body having a material supply port and a product discharge port, A conveying device for transporting the processed material inside the cylindrical body, A fluid supply pipe connected to a fluid inlet provided in the reactor for supplying manufacturing fluid, A fluid discharge pipe is provided in the reactor to discharge the fluid inside the reactor from a fluid outlet, As a cleaning process, a cleaning medium supply device is provided, which is branched and connected to at least one of the supply port or the fluid supply pipe, and which can supply cleaning medium to the reaction furnace. The reactors include a first reactor and a second reactor different from the first reactor. The cleaning process includes a recovery mechanism connected to at least one of the fluid discharge pipe or outlet of the first reactor, for recovering waste discharged as a result of the introduction of the cleaning medium, The recovery mechanism further includes a reprocessing device that includes a transport path connected to the second reactor so that the recovered waste can be fed into the second reactor from the supply port or the fluid inlet connected to the second reactor. The reprocessing device is configured such that the second reactor receives the waste discharged by the first reactor and performs predetermined reprocessing. Reaction system.

2. A reaction system capable of carrying out a manufacturing process to produce a predetermined product from a processed material, A barrier mechanism capable of separating outside air from inside air, A reactor is a cylindrical body having a material supply port and a product discharge port, A conveying device for transporting the processed material inside the cylindrical body, A fluid supply pipe connected to a fluid inlet provided in the reactor for supplying manufacturing fluid, A fluid discharge pipe is provided in the reactor to discharge the fluid inside the reactor from a fluid outlet, As a cleaning process, a cleaning medium supply device is provided, which is branched and connected to at least one of the supply port or the fluid supply pipe, and which can supply cleaning medium to the reaction furnace. In the cleaning process, a recovery mechanism is connected to at least one of the fluid discharge pipe or the outlet to recover waste discharged as a result of the introduction of the cleaning medium, A temperature control device for controlling the temperature of the reactor, A waste measuring device for measuring the amount of waste in the washing process, The system includes a control device that controls the cleaning process by controlling at least one of the temperature control device, the conveying device, and the cleaning medium supply device based on the measured amount of waste, The control device controls the washing process based on the amount of reusable material in the manufacturing process contained in the waste. Reaction system.

3. The control device controls at least the temperature of the reactor and the washing medium supply device so that a substance reusable as a manufacturing fluid can be extracted from the waste. The reaction system according to claim 2.

4. A partition wall capable of separating the outside air from the inside air, A reactor is a cylindrical body provided in a sealed space covered by the aforementioned partition wall, having a material supply port and a product discharge port, A conveying device for transporting the processed material inside the cylindrical body, A fluid supply pipe connected to a fluid inlet provided in the reactor for supplying manufacturing fluid, A fluid discharge pipe is provided in the reactor to discharge the fluid inside the reactor from a fluid outlet, The reactor comprises a first reactor and a second reactor different from the first reactor. A cleaning method for a reaction system capable of carrying out a manufacturing process to produce a predetermined product from the aforementioned processed material, As a cleaning step, a cleaning medium is introduced into the first reactor from at least one of the supply port or the fluid supply pipe of the first reactor. The waste generated by the introduction of the cleaning medium is discharged from at least one of the fluid discharge pipe or outlet of the first reactor. At least a portion of the waste discharged from the first reactor is introduced into the second reactor through the supply port or fluid inlet connected to the second reactor for predetermined reprocessing. Cleaning method.

5. A partition wall capable of separating outside air from inside air, A reactor is a cylindrical body provided in a sealed space covered by the aforementioned partition wall, having a material supply port and a product discharge port, A conveying device for transporting the processed material inside the cylindrical body, A fluid supply pipe connected to a fluid inlet provided in the reactor for supplying manufacturing fluid, The reactor is equipped with a fluid discharge pipe that discharges the fluid inside the reactor from a fluid outlet provided in the reactor, A cleaning method for a reaction system capable of carrying out a manufacturing process to produce a predetermined product from the aforementioned processed material, Control the temperature of the reactor, As a cleaning step, a cleaning medium is introduced into the reactor from at least one of the supply port or the fluid supply pipe. The waste generated when the cleaning medium is introduced is discharged from at least one of the fluid discharge pipe or the outlet. The waste material discharged as a result of the introduction of the cleaning medium is collected from at least one of the fluid discharge pipe or the outlet, The amount of waste in the washing process is measured, Based on the amount of waste, the cleaning process is executed by controlling at least one of the following: the temperature of the reactor, the drive of the conveying device, and the amount of cleaning medium to be introduced. The washing process is controlled based on the amount of reusable material in the waste product that can be used in the manufacturing process. Cleaning method.