Pigment dispersion composition for black matrix, resist composition for black matrix, and black matrix

Abstract

To provide a pigment dispersion composition for a black matrix capable of forming a black matrix without a decrease in surface resistance value even after post-baking at high temperature for a long period of time, and capable of obtaining a resist composition for a black matrix in which break points do not change during a storage time.SOLUTION: A pigment dispersion composition for a black matrices comprises a black colorant, a sulfonated copper phthalocyanine, and an epoxy compound, where the epoxy compound is at least one selected from the group consisting of (Formula 1) to (Formula 7).SELECTED DRAWING: None

Description

[Technical Field]

[0001] The present invention relates to a pigment dispersion composition for black matrices, a resist composition for black matrices, and a black matrix. [Background technology]

[0002] In image display devices using liquid crystals or plasma, a light-shielding film (black matrix) is provided in the gaps between color patterns within the display area of ​​the screen, at the edges of the peripheral parts of the display area, and on the light-exposed side of the TFT in liquid crystal displays using TFTs. Furthermore, in liquid crystal displays, it primarily prevents light leakage from the backlight, and in plasma displays, it primarily prevents blurring caused by the mixing of different colored lights, thereby improving display characteristics (contrast and color purity).

[0003] For example, color filters used to convert the white light of a liquid crystal display backlight into colored light are typically manufactured by sequentially forming pixels of different hues—red, green, and blue—in a striped or mosaic-like pattern on the surface of a transparent substrate such as a glass or plastic sheet with a black matrix.

[0004] Similarly, in touch panels that combine image display devices and position input devices, a color filter with a black matrix formed as a light-shielding film is used. Until now, it has been common practice to form it on the side opposite the sensor substrate, with a cover glass in between. However, as the demand for lighter touch panels increases, development is progressing on a technology that allows for the simultaneous formation of the light-shielding film and the touch sensor on the same side of the cover glass to further reduce weight.

[0005] One method used to form such a black matrix is ​​photolithography (pigment method) using pigments. In such pigment methods, sulfonic acid derivatives of copper phthalocyanine are sometimes used to improve the dispersibility of the pigment.

[0006] For example, Patent Document 1 discloses a pigment dispersion composition for a black matrix characterized in that carbon black having an oil absorption capacity of 10 to 150 ml / 100g and a pH in the range greater than 9, a basic group-containing urethane polymer pigment dispersant having a polyester chain, and a phthalocyanine derivative having a sulfonic acid group as an acid group-containing pigment derivative are dispersed in a solvent.

[0007] In recent years, image display devices have come to be used in a variety of applications, including mobile devices. As the applications of such image display devices expand, there is a growing demand for more robust black matrices.

[0008] One method used to make the black matrix more robust is to perform high-temperature, long-duration post-bake processing. However, Patent Document 1 did not adequately consider the decrease in surface resistance due to high-temperature and long-duration post-baking, leaving room for further improvement.

[0009] On the other hand, pigment-dispersed resist compositions for black matrices require that the breakpoint (the time at which the unexposed portion dissolves and peels off during the development process, causing the developed pattern to appear) does not change with storage time. Therefore, there is a need for a pigment dispersion composition for black matrices that can produce such a pigment dispersion resist composition for black matrices, but Patent Document 1 does not provide sufficient consideration, and there is room for further improvement. [Prior art documents] [Patent Documents]

[0010] [Patent Document 1] International Publication No. 2008 / 066100 [Overview of the Initiative] [Problems that the invention aims to solve]

[0011] Therefore, the present invention aims to provide a pigment dispersion composition for a black matrix that can form a black matrix whose surface resistance does not decrease even after high temperature and long post-baking, and that can provide a black matrix resist composition in which the breakpoint does not change with storage time. [Means for solving the problem]

[0012] The inventors have discovered that a pigment dispersion composition for a black matrix containing a black coloring agent, a copper phthalocyanine sulfonate, and an epoxy compound can form a black matrix in which the surface resistance does not decrease even after high-temperature and long-duration post-baking, and can also provide a black matrix resist composition in which the breakpoint does not change with storage time, thus completing the present invention.

[0013] In other words, the present invention is a pigment dispersion composition for a black matrix comprising a black coloring agent, a copper phthalocyanine sulfonate, and an epoxy compound. The epoxy compound described above preferably has a bisphenol skeleton. Furthermore, the pigment dispersion composition for black matrix of the present invention further comprises an amine compound with a molecular weight of 300 or less, and it is preferable that the amine compound with a molecular weight of 300 or less is an amine compound having secondary or more carbon atoms within 3 atoms from the nitrogen atom of the amino group and / or an amine compound in which the amino group is connected to one or more aromatic rings via a hydrocarbon group having 3 or fewer carbon atoms. The above amine compound with a molecular weight of 300 or less is preferably at least one selected from 3-phenylpropylamine, 1,1,3,3-tetramethylbutylamine, and triisobutylamine. In addition, the sulfonated copper phthalocyanine preferably has 0.5 to 3 sulfonic acid groups in the molecule, and more preferably has 0.5 to 1.5 sulfonic acid groups. In addition, the black colorant preferably contains carbon black. In addition, the carbon black is preferably acidic carbon black. In addition, the present invention is also a resist composition for a black matrix obtained from the pigment dispersion composition for a black matrix. In addition, the present invention is also a black matrix formed from the resist composition for a black matrix.

Effect of the Invention

[0014] According to the present invention, it is possible to form a black matrix whose surface resistance value does not decrease even after post-baking at a high temperature for a long time, and to obtain a resist composition for a black matrix in which the break point does not change depending on the storage time. A pigment dispersion composition for a black matrix can be provided.

Mode for Carrying Out the Invention

[0015] <Pigment Dispersion Composition for Black Matrix> The pigment dispersion composition for a black matrix of the present invention contains a black colorant, a sulfonated copper phthalocyanine, and an epoxy compound, and satisfies the following condition (A) or (B). (A) It does not contain an amine compound having a molecular weight of 300 or less. (B) It further contains an amine compound having a molecular weight of 300 or less, and the amine compound having a molecular weight of 300 or less is an amine compound having a secondary or higher carbon atom within 3 atoms from the nitrogen atom of the amino group and / or an amine compound in which the amino group is connected to 1 or more aromatic rings via a hydrocarbon group having 3 or less carbon atoms. Hereinafter, each component will be described.

[0016] (Black Colorant) The pigment dispersion composition for black matrix of the present invention contains a black coloring agent. The above-mentioned black coloring agent preferably contains carbon black, and more preferably the carbon black is acidic carbon black. The carbon black described above preferably has an average primary particle size of 20 to 60 nm, and among these, neutral carbon black with an average primary particle size of 20 to 60 nm and / or acidic carbon black with an average primary particle size of 20 to 60 nm are more preferred. If the primary particle size of the above-mentioned black coloring agent is smaller than 20 nm or larger than 60 nm, it may not have sufficient light-shielding properties or may have poor storage stability. The above average primary particle diameter is the arithmetic mean diameter value obtained by electron microscope observation.

[0017] From the viewpoint of appropriately imparting surface resistance, the above-mentioned black coloring agent preferably contains only acidic carbon black. On the other hand, when using neutral carbon black and acidic carbon black in combination, it is preferable that the amount of neutral carbon black be 85% by mass or less of the total mass of the neutral carbon black and acidic carbon black, and more preferably that the amount of neutral carbon black be 75% by mass or less. If the neutral carbon black content of the above-mentioned carbon black exceeds 85% by mass, the seal strength may decrease.

[0018] The acidic and neutral carbon blacks mentioned above will now be explained. Carbon black can be broadly classified into acidic carbon black and neutral carbon black based on its surface structure. Acidic carbon black is a carbonaceous substance that has been oxidized naturally or artificially, and exhibits acidity when mixed and boiled with distilled water. On the other hand, neutral carbon black is known to exhibit a neutral or higher pH when mixed and boiled with distilled water.

[0019] The above-mentioned neutral carbon black preferably has a pH in the range of 8.0 to 10.0. Specifically, examples include Printex 25 (average primary particle size 56 nm, pH 9.5), Printex 35 (average primary particle size 31 nm, pH 9.5), and Printex 65 (average primary particle size 21 nm, pH 9.5) from Orion Engineered Carbons, and MA#20 (average primary particle size 40 nm, pH 8.0), MA#40 (average primary particle size 40 nm, pH 8.0), and MA#30 (average primary particle size 30 nm, pH 8.0) from Mitsubishi Chemical Corporation.

[0020] The above-mentioned acidic carbon blacks preferably have a pH in the range of 2.0 to 4.0. Specifically, examples include Raven 1080 (average primary particle size 28 nm, pH 2.4) and Raven 1100 (average primary particle size 32 nm, pH 2.9) from Columbia Chemicals, MA-8 (average primary particle size 24 nm, pH 3.0) and MA-100 (average primary particle size 22 nm, pH 3.5) from Mitsubishi Chemical Corporation, Special Black 250 (average primary particle size 56 nm, pH 3.0), Special Black 350 (average primary particle size 31 nm, pH 3.0), Special Black 550 (average primary particle size 25 nm, pH 4.0) and NEROX 305 (average primary particle size approximately 28 nm, pH approximately 2.8) from Orion Engineered Carbons.

[0021] From the viewpoint of providing suitable pigment dispersibility and surface resistance, the above-mentioned black coloring agent is preferably Special Black 250 or NEROX 305.

[0022] The pH can be measured at 25°C using a glass electrode after preparing an aqueous suspension by adding 1g of carbon black to 20ml of distilled water (pH 7.0) from which carbon dioxide has been removed and mixing with a magnetic stirrer (German industrial standards DIN ISO 787 / 9).

[0023] The content of the above-mentioned black coloring agent is preferably 3 to 70% by mass, and more preferably 10 to 50% by mass, as a mass fraction of the total solid content of the black matrix pigment dispersion composition of the present invention. If the content of the above-mentioned black coloring agent is less than 3% by mass, the light-shielding properties when a black matrix is ​​formed may be low, and if it exceeds 70% by mass, pigment dispersion may become difficult.

[0024] (Copper phthalocyanine sulfonate) The pigment dispersion composition for black matrix of the present invention contains a copper phthalocyanine sulfonate. The above-mentioned copper phthalocyanine sulfonate has the effect of improving the micronization during dispersion and the dispersion stability after dispersion of the black colorant, as the basic skeleton portion is adsorbed onto the pigment surface and the sulfonic acid group increases the affinity with organic solvents and pigment dispersants during the process of micronization and dispersion of the black colorant.

[0025] The copper phthalocyanine in the above-mentioned copper phthalocyanine sulfonate is not particularly limited as long as it has a copper phthalocyanine skeleton. For example, the copper phthalocyanine skeleton may have known substituents such as alkyl groups or halogen atoms, but from the viewpoint of ease of introducing sulfonic acid groups, a structure without substituents is preferred.

[0026] The above copper phthalocyanine sulfonates preferably have 0.5 to 3 sulfonic acid groups in the molecule. Thus, by having 0.5 to 3 sulfonic acid groups in the molecule, a black matrix composition can be obtained that provides a coating film with excellent surface resistance. The above copper phthalocyanine sulfonates more preferably have 0.5 to 1.5 sulfonic acid groups in the molecule, and even more preferably have 0.7 to 1.5 sulfonic acid groups. The number of sulfonic acid groups in the above molecule can be calculated based on the ratio of sulfur atoms to copper atoms determined by elemental analysis.

[0027] As the copper phthalocyanine sulfonates mentioned above, commercially available products may be used, such as Solspers 12000 (both manufactured by Lubrizol Nippon Co., Ltd.) or the desodium product of VALIFAST BLUE 1605.

[0028] The content of the copper phthalocyanine sulfonate is preferably 0.1 to 20 parts by mass, and more preferably 1 to 15 parts by mass, per 100 parts by mass of the black coloring agent.

[0029] (Epoxy compound) The pigment dispersion composition for black matrix of the present invention contains an epoxy compound. It is presumed that by including the above epoxy compound, the polyfunctional epoxy resin and the functional groups present on the surface of the carbon black interact favorably, thereby forming a black matrix in which the surface resistance does not decrease even after high-temperature and long-duration post-baking. However, the present invention does not have to be interpreted as being limited to the above mechanism.

[0030] The epoxy compounds mentioned above include Epolite 4000, Epolite 3002 (both manufactured by Kyoeisha Chemical Co., Ltd.), Denacol DLC-101, Denacol DLC-202, Denacol EX-141, Denacol EX-142, Denacol EX-145, Denacol EX-146, Denacol EX-147 (all manufactured by Nagase ChemteX Corporation), GAN, GOT, NC2000-L, NC3000, NC3000-L, NC3000-H, NC3000-FH-75M, NC3100, CER3000-L, XD1000, NC7000L, NC7300L, EPPN-201, EPPN-501H, EPPN-501HY, EPPN502H, and EOC. Examples include N-1020, EOCN-102S, EOCN-103S, EOCN-104S, CER-1020, RE303S-L, RE310S (all manufactured by Nippon Kayaku Co., Ltd.), jER157S70, jER828, jER1002, jER1032H60, jER1750, jER1007, YX8100-BH30, E1256, E4250, E4275 (all manufactured by Mitsubishi Chemical Corporation), Epiclon EXA-9583, Epiclon N695, HP4032, HP5000, HP7200L (all manufactured by DIC Corporation), VG3101 (manufactured by Mitsui Chemicals, Inc.), Pototo YH-434L (manufactured by Toto Kasei Co., Ltd.), VG3101L (manufactured by Air Water Corporation), etc.

[0031] The epoxy compound described above is preferably at least one selected from the group consisting of (Formula 1) to (Formula 7) below. Among the epoxy compounds mentioned above, those having a bisphenol skeleton are more preferable from the viewpoint of forming a black matrix with particularly excellent surface resistance and sealing strength, and even more preferable are those with the structure shown in (Formula 2) below. [ka]

[0032] The content of the epoxy compound is preferably 1% by mass or more, more preferably 2% by mass or more, and even more preferably 3% by mass or more, as a mass fraction of the total solids of the pigment dispersion composition for the black matrix of the present invention. Furthermore, the content of the epoxy resin is preferably 12.0% by mass or less, more preferably 10.0% by mass or less, and even more preferably 9.0% by mass or less, as a mass fraction of the total solids of the pigment dispersion composition for the black matrix of the present invention.

[0033] (Amine compounds with a molecular weight of 300 or less) The pigment dispersion composition for black matrix of the present invention, from the viewpoint of forming a black matrix with high surface resistance and the ability to maintain surface resistance even after high temperature and long post-baking, further contains an amine compound with a molecular weight of 300 or less, and it is preferable that the amine compound with a molecular weight of 300 or less is an amine compound having secondary or more carbon atoms within 3 atoms from the nitrogen atom of the amino group and / or an amine compound in which the amino group is connected to one or more aromatic rings via a hydrocarbon group having 3 or fewer carbon atoms.

[0034] The above-mentioned amine compounds with a molecular weight of 300 or less are amine compounds having secondary or more carbon atoms within three atoms of the nitrogen atom of the amino group, and / or amine compounds in which the amino group is connected to one or more aromatic rings via a hydrocarbon group having three or fewer carbon atoms. The inclusion of such an amine compound results in the electron pair on the nitrogen atom being buried by the bulky substituent, which is thought to milden the ionic properties during neutralization between the amine compound and the copper phthalocyanine sulfonate, thereby suppressing the current conduction caused by the ionic properties. Furthermore, it is thought that the steric hindrance caused by the bulky substituent suppresses the proximity of pigment particles to each other. However, the present invention does not have to be interpreted as being limited to the above mechanism.

[0035] The amine compounds having secondary or higher carbon atoms within three atoms of the nitrogen atom of the above-mentioned amino group are preferably those in which all amino groups present in the amine compound have secondary or higher carbon atoms within three atoms of the nitrogen atom. Specifically, examples include 1,1,3,3-tetramethylbutylamine, diisopropylamine, triisopropylamine, diisobutylamine, triisobutylamine, diisopentylamine, triisopentylamine, tris(2-ethylhexyl)amine, and the like. Furthermore, "within 3 atoms of the nitrogen atom of the amino group" means that an atom adjacent to the nitrogen atom of the amino group is counted as 1, an atom adjacent to the atom adjacent to the above nitrogen atom is counted as 2, and an atom adjacent to the atom adjacent to the above nitrogen atom is counted as 3.

[0036] Examples of amine compounds in which the above-mentioned amino group is connected to one or more aromatic rings via a hydrocarbon group having 3 or fewer carbon atoms include 3-phenylpropylamine, 2-phenylpropylamine, 1-phenylpropylamine, 2-phenylethylamine, 1-phenylethylamine, phenylmethylamine, and triphenylmethylamine.

[0037] From the viewpoint of suitably improving the surface resistance, the above-mentioned amine compound with a molecular weight of 300 or less is preferably at least one selected from 3-phenylpropylamine, 1,1,3,3-tetramethylbutylamine, and triisobutylamine.

[0038] The above amine compound with a molecular weight of 300 or less is preferably added in an amount of 5 to 100 parts by mass, and more preferably in an amount of 20 to 60 parts by mass, per 100 parts by mass of the above copper phthalocyanine sulfonate.

[0039] (Organic solvents) The pigment dispersion composition for black matrix of the present invention preferably contains an organic solvent. As the above-mentioned organic solvent, organic solvents that have been conventionally used in the field of liquid crystal black matrix resists can be suitably used.

[0040] Specifically, the above organic solvent is (at atmospheric pressure (1.013 × 10⁻⁶)). 2 These include ester-based organic solvents, ether-based organic solvents, ether-ester-based organic solvents, ketone-based organic solvents, aromatic hydrocarbon-based organic solvents, nitrogen-containing organic solvents, etc., with boiling points of 100-250°C at kPa. If the above-mentioned organic solvent has a boiling point exceeding 250°C, when a coating film formed by applying the black matrix resist composition obtained from the black matrix pigment dispersion composition of the present invention is pre-baked, the organic solvent may not evaporate sufficiently and may remain in the dried coating film, reducing the heat resistance of the dried coating film. Furthermore, if the coating contains a large amount of organic solvents with a boiling point below 100°C, it becomes difficult to apply the coating evenly and uniformly, and a coating with excellent surface smoothness may not be obtained.

[0041] The above organic solvents specifically include ether-based organic solvents such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monoisopropyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, and diethylene glycol methyl ethyl ether; ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate, and propylene Examples include ether ester organic solvents such as glycol monoethyl ether acetate; ketone organic solvents such as methyl isobutyl ketone, cyclohexanone, 2-heptanone, and δ-butyrolactone; ester organic solvents such as methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate, ethyl 2-hydroxy-2-methylpropionate, methyl-3-methoxybutylpropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl ethoxyethyl acetate, ethyl hydroxyethyl acetate, and n-amyl formate; alcohol solvents such as methanol, ethanol, isopropyl alcohol, and butanol; and nitrogen-containing organic solvents such as N-methylpyrrolidone, N,N-dimethylformamide, and N,N-dimethylacetamide. These can be used individually or in combination of two or more types.

[0042] Among the above organic solvents, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, ethylene glycol monomethyl ether acetate, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, cyclohexanone, 2-heptanone, ethyl 2-hydroxypropionate, 3-methyl-3-methoxybutyl propionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, n-amyl formate, etc. are preferred in terms of solubility, dispersibility, and applicability, and propylene glycol monomethyl ether acetate is more preferred.

[0043] (Pigment dispersant) The pigment dispersion composition for black matrix of the present invention preferably contains a pigment dispersant. The above-mentioned pigment dispersant is a basic group-containing pigment dispersant, and can be an anionic surfactant, a basic group-containing polyester-based pigment dispersant, a basic group-containing acrylic-based pigment dispersant, a basic group-containing urethane-based pigment dispersant, a basic group-containing carbodiimide-based pigment dispersant, an acidic group-containing polymer pigment dispersant, or the like. These basic group-containing pigment dispersants may be used individually or in combination of two or more types. Among them, basic group-containing polymer pigment dispersants are preferred because they provide good pigment dispersibility.

[0044] Specific examples of the above basic group-containing polymer pigment dispersants include: (1) A reaction product of an amino group and / or imino group of a polyamine compound (e.g., polyallylamine, polyvinylamine, polyethylenepolyimine, and other poly(lower alkyleneamines)) and at least one selected from the group consisting of polyesters, polyamides, and polyesteramides having free carboxyl groups (Japanese Patent Publication No. 2001-59906), (2) Reaction products of low molecular weight amino compounds such as poly(lower)alkyleneimines and methyliminobispropylamine with polyesters having free carboxyl groups (Japanese Patent Publication No. 54-37082, Japanese Patent Publication No. 01-311177), (3) A reaction product obtained by sequentially reacting the isocyanate group of a polyisocyanate compound with alcohols such as methoxypolyethylene glycol, polyesters having one hydroxyl group such as caprolactone polyester, a compound having two to three isocyanate-reactive functional groups, and an aliphatic or heterocyclic hydrocarbon compound having an isocyanate-reactive functional group and a tertiary amino group (Japanese Patent Publication No. 02-612). (4) Compounds obtained by reacting a polymer of acrylate having an alcoholic hydroxyl group with a polyisocyanate compound and a hydrocarbon compound having an amino group. (5) Reaction product obtained by adding a polyether chain to a low molecular weight amino compound, (6) A reaction product obtained by reacting a compound having an isocyanate group with a compound having an amino group (Japanese Patent Publication No. 04-210220), (7) A reaction product obtained by reacting a polyepoxy compound with a linear polymer having a free carboxyl group and an organic amine compound having one secondary amino group (Japanese Patent Publication No. 09-87537), (8) Reaction product of a polycarbonate compound having a functional group at one end that can react with an amino group and a polyamine compound (Japanese Patent Publication No. 09-194585), (9) A copolymer of at least one selected from methacrylic acid esters or acrylic acid esters such as methyl methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, stearyl methacrylate, benzyl methacrylate, methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, stearyl acrylate, and benzyl acrylate, at least one basic group-containing polymerization monomer such as acrylamide, methacrylamide, N-methylolamide, vinylimidazole, vinylpyridine, and monomers having an amino group and a polycaprolactone skeleton, and at least one styrene, styrene derivative, or other polymerizable monomer (Japanese Patent Publication No. 01-164429). (10) Basic group-containing carbodiimide pigment dispersant (International Publication WO04 / 000950), (11) Block copolymers consisting of blocks having basic groups such as tertiary amino groups and quaternary ammonium salts and blocks not having functional groups (see description in Japanese Patent Publication No. 2005-55814), (12) A pigment dispersant obtained by Michael addition reaction of a polycarbonate compound to a polyallylamine (Japanese Patent Publication No. 09-194585), (13) A carbodiimide compound having at least one polybutadiene chain and at least one basic nitrogen-containing group (Japanese Patent Publication No. 2006-257243), (14) A carbodiimide compound having at least one side chain having an amide group and at least one basic nitrogen-containing group in the molecule (Japanese Patent Publication No. 2006-176657), (15) A polyurethane compound having a structural unit having an ethylene oxide chain and a propylene oxide chain, and having an amino group that has been quaternized by a quaternizing agent (Japanese Patent Publication No. 2009-175613), (16) A compound obtained by reacting an isocyanate group of an isocyanate compound having an isocyanurate ring in its molecule with an active hydrogen group of a compound having an active hydrogen group in its molecule and having a carbazole ring and / or an azobenzene skeleton, wherein the number of carbazole rings and azobenzene skeletons in the molecule of the compound is 15 to 85% of the total number of isocyanate groups derived from the isocyanate compound having an isocyanurate ring and the urethane bonds and urea bonds formed by the reaction of the isocyanate group and the active hydrogen group (Japanese Patent Application No. 2009-220836). (17) Examples include graft copolymers obtained by introducing polyether or polyester side chains into an acrylate polymer having an amino group.

[0045] Among the basic group-containing polymer pigment dispersants described above, basic group-containing urethane-based polymer pigment dispersants, basic group-containing polyester-based polymer pigment dispersants, and basic group-containing acrylic-based polymer pigment dispersants are more preferred, and amino group-containing urethane-based polymer pigment dispersants, amino group-containing polyester-based polymer pigment dispersants, and amino group-containing acrylic-based polymer pigment dispersants are even more preferred. Among the basic group-containing polymer pigment dispersants described above, a basic group (amino group)-containing polymer pigment dispersant having at least one selected from the group consisting of polyester chains, polyether chains, and polycarbonate chains is particularly preferred.

[0046] The amount of the pigment dispersant is preferably 1 to 200 parts by mass, and more preferably 5 to 100 parts by mass, per 100 parts by mass of the black coloring agent.

[0047] (Binder resin) The pigment dispersion composition for black matrix of the present invention preferably contains a binder resin.

[0048] Examples of the binder resins mentioned above include thermosetting resins, thermoplastic resins, photopolymerizable compounds, and alkali-soluble resins. These can be used individually or in combination of two or more types.

[0049] Examples of the thermosetting resins and thermoplastic resins mentioned above include butyral resin, styrene-maleic acid copolymer, chlorinated polyethylene, chlorinated polypropylene, polyvinyl chloride, vinyl chloride-vinyl acetate copolymer, polyvinyl acetate, polyurethane resin, phenolic resin, polyester resin, acrylic resin, alkyd resin, styrene resin, polyamide resin, rubber resin, cycloadhesive rubber, epoxy resin, cellulose, polybutadiene, polyimide resin, benzoguanamine resin, melamine resin, urea resin, and the like.

[0050] Examples of the above-mentioned photopolymerizable compounds include monomers having one or more photopolymerizable unsaturated bonds within the molecule, and oligomers having photopolymerizable unsaturated bonds.

[0051] Examples of monomers having one photopolymerizable unsaturated bond in the molecule include alkyl methacrylates or acrylates such as methyl methacrylate, butyl methacrylate, 2-ethylhexyl methacrylate, methyl acrylate, butyl acrylate, and 2-ethylhexyl acrylate; aralkyl methacrylates or acrylates such as benzyl methacrylate and benzyl acrylate; alkoxyalkyl methacrylates or acrylates such as butoxyethyl methacrylate and butoxyethyl acrylate; and amino acids such as N,N-dimethylaminoethyl methacrylate and N,N-dimethylaminoethyl acrylate. You can use alkyl methacrylate or acrylate, methacrylate or acrylic acid ester of polyalkylene glycol monoalkyl ethers such as diethylene glycol monoethyl ether, triethylene glycol monobutyl ether, and dipropylene glycol monomethyl ether, methacrylate or acrylic acid ester of polyalkylene glycol monoaryl ethers such as hexaethylene glycol monophenyl ether, isovonyl methacrylate or acrylate, glycerol methacrylate or acrylate, 2-hydroxyethyl methacrylate or acrylate, etc.

[0052] Examples of monomers having two or more of the above-mentioned photopolymerizable unsaturated bonds in the molecule include bisphenol A dimethacrylate, 1,4-butanediol dimethacrylate, 1,3-butylene glycol dimethacrylate, diethylene glycol dimethacrylate, glycerol dimethacrylate, neopentyl glycol dimethacrylate, polyethylene glycol dimethacrylate, polypropylene glycol dimethacrylate, tetraethylene glycol dimethacrylate, trimethylolpropane trimethacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, dipentaerythritol tetramethacrylate, dipentaerythritol hexamethacrylate, and dipentaerythritol penta Methacrylate, epoxy methacrylate, bisphenol A diacrylate, 1,4-butanediol diacrylate, 1,3-butylene glycol diacrylate, diethylene glycol diacrylate, glycerol diacrylate, neopentyl glycol diacrylate, polyethylene glycol diacrylate, polypropylene glycol diacrylate, tetraethylene glycol diacrylate, trimethylolpropane triacrylate, pentaarithritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, dipentaerythritol pentaacrylate, epoxy acrylate, etc. can be used.

[0053] As the oligomer having the above-mentioned photopolymerizable unsaturated bond, one obtained by appropriately polymerizing the above-mentioned monomer can be used. The above-mentioned binder resins can be used alone or in combination of two or more types.

[0054] As the binder resin mentioned above, epoxy acrylate resin is preferable from the viewpoint of heat resistance and developability.

[0055] The alkali-soluble resins mentioned above will be discussed later.

[0056] The content of the above-mentioned binder resin is preferably 3 to 50% by mass as a mass fraction of the total solid content of the pigment dispersion composition for the black matrix of the present invention.

[0057] (Method for producing a pigment dispersion composition for black matrix) The pigment dispersion composition for black matrix of the present invention can be obtained by adding the above-mentioned components, mixing them, and kneading them. The method for preparing the meat is not particularly limited, and for example, the meat may be prepared using a known method with a bead mill, ready mill, ultrasonic homogenizer, high-pressure homogenizer, paint shaker, ball mill, roll mill, sand mill, sand grinder, Dino mill, Dispermat, SC mill, nanomizer, etc.

[0058] <Black Matrix Resist Composition> The present invention also includes a black matrix resist composition obtained from the black matrix pigment dispersion composition of the present invention.

[0059] (Pigment dispersion composition for black matrix) The black matrix resist composition of the present invention contains the black matrix pigment dispersion composition of the present invention described above. The content of the above-mentioned pigment dispersion composition for the black matrix is ​​preferably 30 to 80% by mass, and more preferably 40 to 75% by mass, based on the total mass of the black matrix resist composition of the present invention.

[0060] (Photopolymerization initiator) The black matrix resist composition of the present invention preferably contains a photopolymerization initiator. The above photopolymerization initiator is not particularly limited as long as it can generate radicals or cations when irradiated with active energy rays such as ultraviolet light or electron beams, for example, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazole-3-yl]-1-(O-acetyloxime)ethanone, benzophenone, N,N'-tetraethyl-4,4'-diaminobenzophenone, 4-methoxy-4'-dimethylaminobenzophenone, 2,2-diethoxyacetophenone, benzoin, benzoin methyl ether, benzoin isobutyl ether, benzyldimethyl ketal, α-hydroxy Examples of photopolymerization initiators include benzophenone-based, thioxanthone-based, anthraquinone-based, and triazine-based agents such as butylphenone, thioxanthone, 2-chlorothioxanthone, 1-hydroxycyclohexylphenyl ketone, t-butylanthraquinone, 1-chloroanthraquinone, 2,3-dichloroanthraquinone, 3-chlor-2-methylanthraquinone, 2-ethylanthraquinone, 1,4-naphthoquinone, 1,2-benzoanthraquinone, 1,4-dimethylanthraquinone, 2-phenylanthraquinone, and 2-methyl-1[4-(methylthio)phenyl]-2-morpholinopropan-1-one. The above photopolymerization initiators can be used alone or in combination of two or more types.

[0061] The content of the above-mentioned photopolymerization initiator is preferably 1 to 20% by mass as a mass fraction of the total solid content of the black matrix resist composition of the present invention.

[0062] (Photopolymerizable compound) The black matrix resist composition of the present invention preferably contains a photopolymerizable compound. As the above-mentioned photopolymerizable compound, those described in the above-mentioned pigment dispersion composition for black matrix can be appropriately selected and used.

[0063] The content of the above-mentioned photopolymerizable compound is preferably 0.1 to 50% by mass as a mass fraction of the total solid content of the black matrix resist composition of the present invention.

[0064] (Alkali-soluble resin) The black matrix resist composition of the present invention preferably contains an alkali-soluble resin. Preferably, the alkali-soluble resin described above acts as a binder for the black coloring agent and is soluble in the developing solution, particularly the alkaline developing solution, used in the development process when producing the black matrix.

[0065] The alkali-soluble resin mentioned above may be a block copolymer. By using a block copolymer, the pigment dispersibility is improved compared to other copolymers, and solubility in PGMEA and alkaline developers can be imparted. Among these block copolymers, a block copolymer having a block made of an ethylenically unsaturated monomer having one or more carboxyl groups and a block made of other copolymerizable ethylenically unsaturated monomers is preferred.

[0066] The above block copolymer is not particularly limited, and conventionally used materials can be used. Specifically, examples include copolymers of an ethylenically unsaturated monomer having a carboxyl group, such as acrylic acid or methacrylic acid, and at least one ethylenically unsaturated monomer selected from the group of monomers and oligomers such as styrene, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, allyl acrylate, allyl methacrylate, benzyl acrylate, benzyl methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate, glycerol monoacrylate, glycerol methacrylate, N-phenylmaleimide, polystyrene macromonomer, polymethyl methacrylate macromonomer, and carboepoxy diacrylate. However, it is preferable to avoid using N-vinylpyrrolidone and sulfur-containing monomers. As the block copolymer mentioned above, block resins synthesized by living radical polymerization or anionic polymerization can be used. Some of the block portions of the above-mentioned block copolymer may be composed of random copolymers.

[0067] Alkali-soluble cardo resin can also be used as the alkali-soluble resin mentioned above. Examples of the alkali-soluble cardo resins mentioned above include epoxy(meth)acrylate adducts having a fluorene skeleton, which are addition products of fluorene epoxy(meth)acrylic acid derivatives with dicarboxylic acid anhydrides and / or tetracarboxylic dianhydrides. Furthermore, this alkali-soluble resin may also have photopolymerizable functional groups.

[0068] The acid value of the alkali-soluble resin described above is preferably 5 to 300 mg KOH / g, more preferably 5 to 250 mg KOH / g, even more preferably 10 to 200 mg KOH / g, and particularly preferably 60 to 150 mg KOH / g, from the viewpoint of development characteristics. In this specification, the above acid value is a theoretical acid value, which is an arithmetic value determined based on the ethylenically unsaturated monomer having a carboxyl group and its content.

[0069] The weight-average molecular weight of the alkali-soluble resin described above is preferably 1,000 to 100,000, more preferably 3,000 to 50,000, and even more preferably 5,000 to 30,000, from the viewpoint of developing characteristics and solubility in organic solvents. In this invention, the weight-average molecular weight is the weight-average molecular weight on a polystyrene basis obtained based on GPC. In this specification, the Water2690 (manufactured by Waters Corporation) is used as the instrument for measuring the weight-average molecular weight, and the PLgel 5μm MIXED-D (manufactured by Agilent Technologies Corporation) is used as the column.

[0070] The content of the alkali-soluble resin is preferably 1 to 200 parts by mass, and more preferably 10 to 150 parts by mass, per 100 parts by mass of the black coloring agent. In this case, if the content of the alkali-soluble resin is less than 1 part by mass, the development characteristics may deteriorate, and if the content of the alkali-soluble resin exceeds 200 parts by mass, the concentration of the black coloring agent will decrease relatively, making it difficult to achieve the desired color density as a thin film.

[0071] The alkali-soluble resin described above preferably does not contain any primary, secondary, or tertiary amino groups, and further preferably does not contain any quaternary ammonium groups. More preferably, it does not have any basic groups. Furthermore, alkali-soluble resins having structures other than block copolymers may be incorporated, provided that they do not impair the effects of the present invention.

[0072] (Organic solvents) As the above-mentioned organic solvent, any of the organic solvents described in the above-mentioned pigment dispersion composition for black matrix can be appropriately selected and used.

[0073] The content of the above-mentioned organic solvent is preferably 1 to 40% by mass, and more preferably 5 to 35% by mass, based on the total mass of the black matrix resist composition of the present invention.

[0074] (Other additives) The black matrix resist composition of the present invention may optionally contain various additives such as thermal polymerization inhibitors, ultraviolet absorbers, and antioxidants.

[0075] (Breakpoint) The pigment-dispersed resist composition for black matrix of the present invention preferably has a breakpoint change of within ±3 seconds immediately after preparation and after storage at 60°C for one week, more preferably within ±2 seconds, even more preferably within ±1.5 seconds, particularly preferably within ±1.0 seconds, and most preferably within ±0.5 seconds. If the breakpoint change is within ±3 seconds, it can be concluded that the breakpoint has sufficient properties to remain unchanged by the storage time. The above breakpoint changes can be measured by the following method. A pigment-dispersed resist composition for the black matrix is ​​coated onto a glass substrate (EAGLE XG) using a spin coater to a thickness of 1 μm, and then pre-baked at 100°C for 2 minutes. Subsequently, using a photomask with line patterns of 5 μm, 8 μm, 10 μm, 15 μm, 20 μm, and 30 μm, UV integrated light intensity of 50 mJ / cm² was measured under a high-pressure mercury lamp. 2 The material is exposed to light to create a resist film that includes the exposed (cured) areas. Next, a 0.05% potassium hydroxide aqueous solution (developer) was used at 23°C and 1.0 kgf / cm². 2 Under the specified shower pressure conditions, measure the time breakpoint at which the development pattern begins to appear. Using the method described above, the breakpoint immediately after preparation (BP1) and the breakpoint after storage at 60°C for one week (BP2) can be measured, and ΔBP (breakpoint change) can be calculated using the following formula. ΔBP = BP2 - BP1

[0076] (Method for manufacturing a black matrix resist composition) One method for producing the black matrix resist composition of the present invention is to first prepare the black matrix pigment dispersion composition of the present invention, and then add the remaining materials and stir and mix them using a stirring device or the like. The above-mentioned stirring and mixing method is not particularly limited, and known methods such as ultrasonic dispersers, high-pressure emulsifiers, bead mills, three-roll mills, sand mills, and kneaders can be used. Alternatively, the mixture may be filtered after stirring and mixing. Furthermore, when preparing the black matrix resist composition of the present invention, the black coloring agent, epoxy resin, oxazine compound, etc. described in the black matrix pigment dispersion composition of the present invention may be added as needed.

[0077] <Black Matrix> The black matrix of the present invention is formed from the black matrix resist composition of the present invention.

[0078] The method for forming the black matrix of the present invention is not particularly limited. For example, the black matrix resist composition of the present invention may be applied to a transparent substrate, dried to form a coating film, a photomask may be placed on the coating film, and the black matrix may be formed by image exposure, development, and, if necessary, photocuring via the photomask.

[0079] Methods for coating, drying, exposing, and developing the black matrix resist composition of the present invention can be appropriately selected from known methods. Furthermore, as the transparent substrate, known transparent substrates such as glass substrates and plastic substrates can be appropriately selected and used.

[0080] The thickness of the above coating film is preferably 0.2 to 10 μm, more preferably 0.5 to 6 μm, and even more preferably 1 to 4 μm after drying. By setting the thickness within the above range, a predetermined pattern can be suitably developed, and a predetermined optical density can be suitably imparted.

[0081] The black matrix of the present invention is coated onto a glass substrate (EAGLE XG) to a thickness of 1 μm using a spin coater, pre-baked at 100°C for 2 minutes, and then exposed to high-pressure mercury lamp light (UV integrated light intensity 50 mJ / cm²). 2 Furthermore, post-baking was performed at 230°C for 3 hours to create a black resist pattern formed only in solid areas, and the surface resistance value was 1.0 × 10⁻⁶. 14 A value of Ω / □ or greater is preferred, and 3.0 × 1014 Ω / square or more is more preferable, 5.0×10 14 Ω / square or more is further preferable, 9.0×10 14 Ω / square or more is particularly preferable, 1.0×10 15 Ω / square or more is most preferable. If the surface resistance value is 1.0×10 14 Ω / square or more, short circuits and current leakage can be preferably prevented. In addition, the surface resistance value can be measured with a main body: microammeter R8340, option: shield box R12702A (both manufactured by Advance Co., Ltd.).

[0082] The black matrix of the present invention was applied onto a glass substrate (EAGLE XG) with a spin coater to a film thickness of 1 μm, pre-baked at 100 °C for 2 minutes, then exposed with a high-pressure mercury lamp (UV integrated light quantity 50 mJ / cm 2 ), and further post-baked at 230 °C for 3 hours and then at 250 °C for 1 hour. When a black resist pattern formed only on the solid part was produced, the surface resistance value was 1.0×10 14 Ω / square or more is preferable, 2.0×10 14 Ω / square or more is more preferable, 5.0×10 14 Ω / square or more is further preferable, 9.0×10 14 Ω / square or more is particularly preferable, 1.0×10 15 Ω / square or more is most preferable. If the surface resistance value is 2.0×10 14 Ω / square or more, it can be said to have an excellent surface resistance value even after post-baking at a high temperature for a long time.

[0083] The pigment dispersion composition for a black matrix, the resist composition for a black matrix, and the black matrix of the present invention have the above-described characteristics, and thus can be preferably used as a black matrix for an image display device, a touch panel, or the like.

Example

[0084] The present invention will be specifically described below using examples, but the present invention is not limited to these examples without departing from its spirit and scope. Unless otherwise specified, in these examples, "parts" and "%" represent "parts by mass" and "% by mass," respectively.

[0085] The materials used in the following examples and comparative examples are as follows: <Black coloring agent> Carbon black (product name "NEROX305", average primary particle size approximately 28nm, pH approximately 2.8, manufactured by Orion Engineered Carbons) <Pigment dispersant> LPN22102 (block-type pigment dispersant containing amino groups, solids content 40% by mass, manufactured by Bic Chemie) <Epoxy compounds> VG3101L (an epoxy compound with the structure shown in (Formula 2) above, trade name "TECHMORE VG3101L", manufactured by Printec Co., Ltd.) <Amine compounds> 3-Phenylpropylamine (manufactured by Tokyo Chemical Industry Co., Ltd.) 1,1,3,3-Tetramethylbutylamine (manufactured by Tokyo Chemical Industry Co., Ltd.) Triisobutylamine (manufactured by Tokyo Chemical Industry Co., Ltd.) <Binder resin> ZCR-1569H (epoxy acrylate resin, solids content 70% by mass, manufactured by Nippon Kayaku Co., Ltd.) <Organic solvents> PM (Propylene Glycol Monomethyl Ether) PGMEA (Propylene Glycol Monomethyl Ether Acetate) <Photopolymerization initiator> OXE02 (Product name "Irgacure OXE02", 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-1-(O-acetyloxime)ethanone, manufactured by BASF) <Photopolymerizable compound> DPHA (Dipentaerythritol Hexaacrylate) <Alkali-soluble resin> WR-301 (Product name "WR-301", Cardo resin, Acid value 100 mg KOH / g, Solids content 45%, Manufactured by ADEKA Corporation)

[0086] <Preparation of dispersion composition> (Dispersion composition 1) Dispersion composition 1 was obtained by mixing Solspers 12000 (a copper phthalocyanine sulfonate (containing approximately 0.9 sulfonic acid groups per molecule), manufactured by Lubrizol Nippon Co., Ltd.) and 3-phenylpropylamine in a mass ratio of 25:8. (Dispersion composition 2) Dispersion composition 2 was obtained by mixing Solspers 12000 (a copper phthalocyanine sulfonate (containing approximately 0.9 sulfonic acid groups per molecule), manufactured by Lubrizol Nippon Co., Ltd.) and 1,1,3,3-tetramethylbutylamine in a mass ratio of 10:3. (Dispersion composition 3) Dispersion composition 3 was obtained by mixing Solspers 12000 (a copper phthalocyanine sulfonate (containing approximately 0.9 sulfonic acid groups per molecule), manufactured by Lubrizol Nippon Co., Ltd.) and triisobutylamine in a mass ratio of 25:11.

[0087] <Dispersion material> Solspers 12000 (copper phthalocyanine sulfonate (containing approximately 0.9 sulfonic acid groups per molecule), manufactured by Lubrizol Japan Co., Ltd.) Solspers 5000 (Quaternary ammonium salt of copper phthalocyanine sulfonate, (containing approximately 0.9 sulfonic acid groups per molecule), manufactured by Lubrizol Japan Co., Ltd.) VALIFAST BLUE 1605 (VB1605, sodium-neutralized copper phthalocyanine sulfonate, manufactured by Orient Chemical Industries Co., Ltd.)

[0088] <Preparation of Pigment Dispersion Compositions for Black Matrix> Each material was mixed to the composition shown in Table 1, and then kneaded in a bead mill overnight to prepare a pigment dispersion composition for the black matrix.

[0089] [Table 1]

[0090] <Preparation of black matrix resist compositions> Using a high-speed stirrer, the above-mentioned black matrix pigment dispersion composition and other materials (photopolymerizable compound, alkali-soluble resin, photopolymerization initiator, and organic solvent) were uniformly mixed to the composition shown in Table 2. The mixture was then filtered through a 3 μm pore size filter to obtain the black matrix resist compositions of the examples and comparative examples.

[0091] <Evaluation Test> (Surface resistance value 1) Each of the black matrix pigment-dispersed resist compositions in the examples and comparative examples was coated onto a glass substrate (EAGLE XG) to a thickness of 1 μm using a spin coater, pre-baked at 100°C for 2 minutes, and then exposed to high-pressure mercury lamp light (UV integrated light intensity 50 mJ / cm²). 2 Furthermore, a post-bake was performed at 230°C for 3 hours to create a black resist pattern (black matrix) formed only from solid areas. The surface resistance of each fabricated black resist pattern was measured using the main unit: micro-ammeter R8340 and optional: shield box R12702A (both manufactured by Advance Co., Ltd.). The results are shown in Table 2.

[0092] (Surface resistance value 2) Each of the black matrix pigment-dispersed resist compositions in the examples and comparative examples was coated onto a glass substrate (EAGLE XG) to a thickness of 1 μm using a spin coater, pre-baked at 100°C for 2 minutes, and then exposed to high-pressure mercury lamp light (UV integrated light intensity 50 mJ / cm²). 2 Then, post-bake was performed at 230°C for 3 hours, followed by 250°C for 1 hour, to create a black resist pattern (black matrix) formed only from solid areas. The surface resistance of each fabricated black resist pattern was measured using the main unit: micro-ammeter R8340 and optional: shield box R12702A (both manufactured by Advance Co., Ltd.). The results are shown in Table 2.

[0093] (Breakpoint change) The breakpoints of each black matrix pigment-dispersed resist composition in the examples and comparative examples were measured immediately after preparation and after storage at 60°C for one week using the following method. Each black matrix pigment-dispersed resist composition was coated onto a glass substrate (EAGLE XG) using a spin coater to a thickness of 1 μm, and then pre-baked at 100°C for 2 minutes. Subsequently, using a photomask with line patterns of 5 μm, 8 μm, 10 μm, 15 μm, 20 μm, and 30 μm, UV integrated light intensity of 50 mJ / cm² was measured under a high-pressure mercury lamp. 2 The material was exposed to light, and a resist film including the exposed (cured) area was fabricated. Next, a 0.05% potassium hydroxide aqueous solution (developer) was used at 23°C and 1.0 kgf / cm². 2 Under the specified shower pressure conditions, the time breakpoint at which the development pattern begins to appear was measured. The breakpoint immediately after preparation (BP1) and the breakpoint after storage at 60°C for one week (BP2) were defined, and ΔBP (breakpoint change) was calculated using the following formula. The results are shown in Table 2. ΔBP = BP2 - BP1

[0094] [Table 2]

[0095] In an example using a pigment dispersion composition for a black matrix containing a black coloring agent, a copper phthalocyanine sulfonate, and an epoxy compound, it was confirmed that a black matrix could be formed in which the surface resistance value did not decrease even after high-temperature and long-duration post-baking, and that a black matrix resist composition could be obtained in which the breakpoint did not change with storage time. Furthermore, it was confirmed that by satisfying the above condition (B), a black matrix with high surface resistance can be formed, and that the surface resistance does not decrease even after high-temperature and long-duration post-baking. [Industrial applicability]

[0096] According to the present invention, it is possible to provide a pigment dispersion composition for a black matrix that can form a black matrix in which the surface resistance value does not decrease even after high temperature and long post-baking, and can obtain a black matrix resist composition in which the breakpoint does not change with storage time.

Claims

1. It contains a black coloring agent, a copper phthalocyanine sulfonate, and an epoxy compound. The epoxy compound is represented by the following formula (2). Pigment dispersion composition for black matrix. 【Chemistry 1】

2. The black matrix pigment dispersion composition according to claim 1, wherein the content of the epoxy compound is 1% by mass or more and 12.0% by mass or less as a mass fraction of the total solid content of the black matrix pigment dispersion composition.

3. A pigment dispersion composition for a black matrix according to claim 1 or 2, further comprising an amine compound with a molecular weight of 300 or less, wherein the amine compound with a molecular weight of 300 or less is an amine compound having secondary or more carbon atoms within three atoms from the nitrogen atom of the amino group and / or an amine compound in which the amino group is connected to one or more aromatic rings via a hydrocarbon group having three or fewer carbon atoms.

4. The pigment dispersion composition for a black matrix according to claim 3, wherein the amine compound with a molecular weight of 300 or less is at least one selected from 3-phenylpropylamine, 1,1,3,3-tetramethylbutylamine, and triisobutylamine.

5. The black matrix pigment dispersion composition according to any one of claims 1 to 4, wherein the copper phthalocyanine sulfonate has 0.5 to 3 sulfonic acid groups in the molecule.

6. The pigment dispersion composition for a black matrix according to claim 5, wherein the copper phthalocyanine sulfonate has 0.5 to 1.5 sulfonic acid groups in its molecule.

7. The black coloring agent comprises carbon black, as described in any one of claims 1 to 6, for the pigment dispersion composition for a black matrix.

8. The pigment dispersion composition for a black matrix according to claim 7, wherein the carbon black is acidic carbon black.

9. A black matrix resist composition obtained from the black matrix pigment dispersion composition according to any one of claims 1 to 8.

10. A black matrix formed from the black matrix resist composition described in claim 9.

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