Drawing device and drawing method

Abstract

To carry out calibration of a drawing head while inhibiting an increase in tact time.SOLUTION: A substrate holding part 25 for holding a substrate 9 is disposed on a stage 21 of a drawing apparatus 1. A drawing head 41 irradiates the substrate 9 with modulated light. A scale part 52 is disposed adjacent to the substrate holding part 25 in a main scanning direction on the stage 21. A calibration camera 53 photographs a predetermined calibration pattern irradiated on the scale part 52 from the drawing head 41 in a state where the scale part 52 is located at a calibration position under the drawing head 41. The scale part 52 is located at the calibration position in a state where the stage 21 is located at a loading / unloading position to carry out loading / unloading of the substrate 9 with respect to the substrate holding part 25 in the drawing apparatus 1. Thereby it is possible to carry out calibration of the drawing head 41 while inhibiting an increase in tact time.SELECTED DRAWING: Figure 7A

Description

Technical Field

[0001] The present invention relates to a technique for irradiating a substrate with light to draw a pattern.

Background Art

[0002] Conventionally, in the drawing of a pattern on a printed circuit board, a semiconductor substrate, etc. (hereinafter referred to as "substrate"), a drawing apparatus that directly draws a pattern by irradiating a photosensitive material formed on the substrate with modulated light and scanning the irradiation region of the light has been used.

[0003] In such a drawing apparatus, due to the temperature rise of the drawing head and the temperature change around the apparatus with the passage of time from the start of drawing, the irradiation position of the light from the drawing head on the substrate fluctuates, and positional deviation of the pattern drawn on the substrate may occur. Therefore, in Patent Document 1, a calibration method has been proposed in which fluctuation data of the irradiation position due to temperature change is acquired in advance, and the irradiation position is corrected according to the measured temperature. However, in indirect calibration using temperature as an index, the calibration accuracy may be insufficient.

[0004] On the other hand, unlike the case where the fluctuation of the irradiation position is indirectly obtained from the temperature as in Patent Document 1, a calibration method is also known in which the light from the drawing head is observed with a camera to directly obtain the fluctuation of the irradiation position. In this case, calibration is performed by moving the stage on which the substrate is placed and positioning the camera directly below the drawing head. After the calibration is completed, the stage is moved directly below the drawing head to perform drawing on the substrate. Therefore, a relatively long time is required for one calibration. For this reason, from the viewpoint of shortening the tact time (that is, the time required for the drawing operation on one substrate, also called the cycle time), it is difficult to perform calibration every time the drawing on one substrate is completed, and calibration is performed every time a predetermined drawing time elapses, or every time the drawing on a predetermined number of two or more substrates is completed. [Prior art documents] [Patent Documents]

[0005] [Patent Document 1] Japanese Patent Publication No. 2014-197136 [Overview of the Initiative] [Problems that the invention aims to solve]

[0006] Incidentally, in the drawing devices described above, further improvement in drawing position accuracy is desired, requiring an increase in the frequency of calibration, while simultaneously needing to suppress a decrease in productivity. Therefore, there is a need to perform calibration of the drawing head while suppressing an increase in cycle time.

[0007] This invention has been made in view of the above problems, and aims to perform calibration of the drawing head while suppressing an increase in cycle time. [Means for solving the problem]

[0008] One aspect of the present invention is a drawing apparatus for drawing a pattern on a substrate by irradiating it with light, comprising: a stage provided with a substrate holding portion for holding the substrate; a drawing head for irradiating the substrate with modulated light; a main scanning mechanism for moving the stage relative to the drawing head in a main scanning direction parallel to the upper surface of the substrate; a scale portion provided on the stage adjacent to the substrate holding portion in the main scanning direction; a calibration camera for capturing a predetermined calibration pattern irradiated from the drawing head to the scale portion when the scale portion is located at a calibration position below the drawing head; a correction information acquisition unit for obtaining correction information used to correct the irradiation position of light from the drawing head based on an inspection image including the scale portion and the calibration pattern acquired by the calibration camera; and a drawing control unit that controls the drawing head and the main scanning mechanism based on drawing data and the correction information, thereby causing the drawing head to perform drawing on the substrate while moving the substrate relative to the drawing head in the main scanning direction. With the stage positioned at the loading / unloading position where the substrate is loaded into and unloaded from the substrate holding section, the scale section is positioned at the calibration position.

[0009] Aspect 2 of the present invention is a drawing apparatus according to aspect 1, the drawing apparatus further comprising: an alignment camera for imaging alignment marks on the substrate; and an alignment information acquisition unit for obtaining alignment information used to correct the relative position of the substrate with respect to the drawing head based on the image of the alignment marks obtained by the alignment camera. The alignment camera is located on the opposite side of the substrate holding portion of the stage, which is located at the loading / unloading position with respect to the drawing head, with respect to the main scanning direction.

[0010] A third aspect of the present invention is a drawing apparatus according to the second aspect, wherein the drawing apparatus further comprises a support portion that supports the drawing head above the stage. The alignment camera is also supported by the support portion.

[0011] Aspect 4 of the present invention is a drawing apparatus according to aspect 1 (which may be any one of aspects 1 to 3), wherein the scale portion is a translucent scale member disposed on the upper surface of the stage. The calibration camera is mounted on the stage below the translucent scale member and captures the calibration pattern transmitted through the translucent scale member. The upper end of the calibration camera is treated with a low-reflection coating.

[0012] Aspect 5 of the present invention is a drawing apparatus according to aspect 1 (which may be any one of aspects 1 to 4), wherein the position of the calibration pattern on the scale in the main scanning direction can be changed by the drawing head while the stage is stationary.

[0013] Aspect 6 of the present invention is a drawing apparatus according to aspect 1 (which may be any one of aspects 1 to 5), wherein the drawing head comprises a plurality of light sources that emit light of different wavelengths. When drawing on the substrate, two or more of the plurality of light sources are used. When irradiating the scale portion with the calibration pattern, only one of the plurality of light sources is used.

[0014] Aspect 7 of the present invention is a drawing apparatus according to Aspect 1 (which may be any one of Aspects 1 to 6), wherein a plurality of drawing heads, each including the drawing head and each irradiating the substrate with modulated light, are arranged in an array direction parallel to the upper surface of the substrate and inclined with respect to the main scanning direction. The calibration camera sequentially captures a plurality of calibration patterns irradiated onto the scale portion from the plurality of drawing heads, while moving in the array direction, with the scale portion positioned at the calibration position.

[0015] Aspect 8 of the present invention is a drawing apparatus according to any one of aspects 1 to 7, wherein the time required to acquire the inspection image by the calibration camera is shorter than the time required to remove one substrate from the substrate holding unit and load a new substrate into the substrate holding unit.

[0016] Aspect 9 of the present invention is a drawing apparatus according to any one of aspects 1 to 7 (or any one of aspects 1 to 8), wherein the acquisition of the inspection image by the calibration camera is performed each time a substrate is loaded into the substrate holding section.

[0017] Aspect 10 of the present invention is a drawing method for drawing a pattern on a substrate by irradiating it with light, comprising: a) a step of imaging a predetermined calibration pattern irradiated from the drawing head onto the scale portion located at a calibration position below the drawing head, while a stage provided with a substrate holding portion for holding a substrate and a scale portion adjacent to the substrate holding portion in a main scanning direction parallel to the upper surface of the substrate is located at an loading / unloading position where the substrate is loaded and unloaded from the substrate holding portion; b) a step of obtaining correction information used to correct the irradiation position of light from the drawing head based on an inspection image including the scale portion and the calibration pattern acquired in step a); and c) a step of drawing on the substrate by irradiating the substrate, which is moving relative to the drawing head in the main scanning direction, with light modulated from the drawing head based on drawing data and the correction information. [Effects of the Invention]

[0018] In this invention, the drawing head can be calibrated while suppressing an increase in cycle time. [Brief explanation of the drawing]

[0019] [Figure 1] This is a perspective view showing a drawing device according to one embodiment. [Figure 2] This is a plan view showing a magnified view of the area near the calibration section. [Figure 3] This diagram shows the internal configuration of the calibration unit and the drawing head. [Figure 4] This is a diagram showing the configuration of a computer. [Figure 5]It is a block diagram showing the functions of the control unit. [Figure 6] It is a diagram showing the flow of pattern drawing. [Figure 7A] It is a front view schematically showing the main configuration of the drawing device. [Figure 7B] It is a front view schematically showing the main configuration of the drawing device. [Figure 7C] It is a front view schematically showing the main configuration of the drawing device. [Figure 7D] It is a front view schematically showing the main configuration of the drawing device. [Figure 7E] It is a front view schematically showing the main configuration of the drawing device.

Embodiments for Carrying out the Invention

[0020] FIG. 1 is a perspective view showing a drawing device 1 according to an embodiment of the present invention. The drawing device 1 is a direct drawing device that irradiates a photosensitive material on a substrate 9 with spatially modulated substantially beam-shaped light and scans the irradiation region of the light on the substrate 9 to draw a pattern. In FIG. 1, three mutually perpendicular directions are indicated by arrows as the X direction, Y direction, and Z direction. In the example shown in FIG. 1, the X direction and Y direction are horizontal directions perpendicular to each other, and the Z direction is the vertical direction (i.e., the up and down direction). The same applies to other figures.

[0021] The substrate 9 is, for example, a substantially rectangular flat printed circuit board. On the main surface on the (+Z) side of the substrate 9 (hereinafter also referred to as "top surface 91"), a resist film formed of a photosensitive material is provided on a copper layer. In the drawing device 1, a circuit pattern is drawn (i.e., formed) on the resist film of the substrate 9. Note that the type and shape of the substrate 9 may be variously changed.

[0022] As shown in FIG. 1, the drawing device 1 includes a stage 21, a stage moving mechanism 22, an alignment unit 3, a drawing unit 4, a calibration unit 5, and a control unit 10. The control unit 10 controls the stage moving mechanism 22, the alignment unit 3, the drawing unit 4, the calibration unit 5, etc.

[0023] Stage 21 is a substantially rectangular, flat member positioned below (i.e., on the (-Z) side) the alignment unit 3 and the drawing unit 4. Stage 21 includes a substrate holding unit 25 that holds the substrate 9 in a horizontal position from below. The substrate holding unit 25 is, for example, a vacuum chuck that holds the lower surface of the substrate 9 by suction. The substrate holding unit 25 may have a structure other than a vacuum chuck, for example, a mechanical chuck. The upper surface 91 of the substrate 9 placed on the substrate holding unit 25 is substantially perpendicular to the Z direction and substantially parallel to the X and Y directions.

[0024] The stage movement mechanism 22 is a movement mechanism that moves the stage 21 horizontally relative to the alignment unit 3 and the drawing unit 4 (i.e., in a direction substantially parallel to the upper surface 91 of the substrate 9). The stage movement mechanism 22 comprises a first movement mechanism 23 and a second movement mechanism 24. The second movement mechanism 24 moves the stage 21 linearly in the X direction along the guide rail. The first movement mechanism 23 moves the stage 21 linearly in the Y direction along the guide rail together with the second movement mechanism 24. The drive source for the first movement mechanism 23 and the second movement mechanism 24 is, for example, a linear servo motor or a motor attached to a ball screw. The structure of the first movement mechanism 23 and the second movement mechanism 24 can be modified in various ways.

[0025] The drawing device 1 may be provided with a stage rotation mechanism that rotates the stage 21 around a rotation axis extending in the Z direction. The drawing device 1 may also be provided with a stage lifting mechanism that moves the stage 21 in the Z direction. For example, a servo motor can be used as the stage rotation mechanism. For example, a linear servo motor can be used as the stage lifting mechanism. The structures of the stage rotation mechanism and the stage lifting mechanism can be modified in various ways.

[0026] The alignment unit 3 comprises a plurality of alignment cameras 31 (two in the example shown in Figure 1) arranged in the X direction. Each alignment camera 31 is supported above the stage 21 and the stage movement mechanism 22 by a support 40 that spans the stage 21 and the stage movement mechanism 22. The support 40 is a single member located at one position in the Y direction. In the example shown in Figure 1, the support 40 is a gate-shaped member (a so-called gantry) that spans the stage 21 and the stage movement mechanism 22.

[0027] In the example shown in Figure 1, the two alignment cameras 31 are mounted on the (+Y) side of the support unit 40. Of the two alignment cameras 31, for example, one alignment camera 31 is fixed to the support unit 40, while the other alignment camera 31 is movable in the X direction on the support unit 40. This allows the distance in the X direction between the two alignment cameras 31 to be changed. The alignment unit 3 may have one alignment camera 31 or three or more.

[0028] Each alignment camera 31 includes an image sensor and an optical system (not shown). Each alignment camera 31 is, for example, an area camera that acquires a two-dimensional image. In each alignment camera 31, reflected light from an illumination light source (not shown) guided to the upper surface 91 of the substrate 9 is guided to the image sensor via the optical system. The image sensor receives the reflected light from the upper surface 91 of the substrate 9 and acquires an image of a substantially rectangular imaging area. The alignment camera 31 images alignment marks (not shown) that are pre-provided on the upper surface 91 of the substrate 9. Various light sources such as LEDs (Light Emitting Diodes) can be used as the illumination light source. Note that the alignment camera 31 may be other types of cameras, such as line cameras.

[0029] The image containing alignment marks acquired by the alignment camera 31 (hereinafter also referred to as the "alignment image") is sent to the control unit 10 shown in Figure 1. The control unit 10 performs alignment of the substrate 9 based on the alignment image (i.e., correction of the relative position of the substrate 9 with respect to the drawing head 41, which will be described later).

[0030] The drawing unit 4 comprises a plurality of drawing heads 41 (six in the example shown in Figure 1) arranged in the X direction. The plurality of drawing heads 41 have substantially the same structure. Each drawing head 41 is equipped with a spatial light modulator that emits modulated (i.e., spatially modulated) light downwards. Each drawing head 41 is supported above the stage 21 and the stage moving mechanism 22 by the support unit 40 described above. In the example shown in Figure 1, the six drawing heads 41 are attached to the (-Y) side of the support unit 40. In other words, the six drawing heads 41 are positioned on the opposite side of the support unit 40 from the two alignment cameras 31 described above, with respect to the Y direction. In other words, the two alignment cameras 31 are positioned on the opposite side of the six drawing heads 41 from the substrate holding unit 25 of the stage 21, which is located at the loading / unloading position described later, with respect to the Y direction.

[0031] In the example shown in Figure 1, the six drawing heads 41 are arranged in a substantially straight line substantially parallel to the X direction. Also, the distance in the Z direction between the six drawing heads 41 and the upper surface 91 of the substrate 9 on the stage 21 is substantially the same. In other words, the arrangement direction of the six drawing heads 41 is substantially parallel to the upper surface 91 of the substrate 9 and substantially perpendicular to the Y direction. To put it another way, the positions of the six drawing heads 41 in the Y and Z directions are substantially the same.

[0032] Furthermore, the arrangement direction of the drawing heads 41 described above does not necessarily have to be parallel to the X direction, but rather in a direction that is inclined with respect to the Y direction. In the drawing unit 4, the multiple drawing heads 41 do not necessarily have to be arranged in a straight line; for example, they may be arranged in a staggered pattern. Also, in the drawing unit 4, there may be one drawing head 41 or two or more.

[0033] In the drawing device 1, pattern drawing on the substrate 9 is performed using a so-called multi-pass method. Specifically, modulated light from multiple drawing heads 41 of the drawing unit 4 is irradiated onto the upper surface 91 of the substrate 9, while the first moving mechanism 23 of the stage moving mechanism 22 moves the substrate 9 in the Y direction, causing it to pass below the drawing heads 41. As a result, the irradiation area of ​​the light from the multiple drawing heads 41 is scanned on the substrate 9 in the Y direction, and drawing is performed on the substrate 9. Subsequently, the second moving mechanism 24 moves the substrate 9 in steps by a predetermined distance in the X direction. Then, the movement of the substrate 9 in the Y direction by the first moving mechanism 23 and the irradiation of light from the drawing heads 41 to the substrate 9 in parallel with this movement are performed again, and drawing is performed on the substrate 9. In the drawing device 1, the irradiation of light onto the substrate 9 as it moves in the Y direction and the step movement of the substrate 9 in the X direction are performed alternately, thereby drawing a pattern on the substrate 9.

[0034] In the following description, the Y direction will also be referred to as the "main scanning direction," and the X direction will also be referred to as the "sub-scanning direction." The main scanning direction and the sub-scanning direction are directions that are approximately parallel to the upper surface 91 of the substrate 9. In the stage moving mechanism 22, the first moving mechanism 23 is a main scanning mechanism that moves the stage 21 relative to the drawing head 41 in the main scanning direction. The second moving mechanism 24 is a sub-scanning mechanism that moves the stage 21 relative to the drawing head 41 in the sub-scanning direction. In addition, the drawing device 1 may perform drawing on the substrate 9 using a single-pass method (also called a one-pass method) in which the drawing of the pattern on the substrate 9 is completed by moving the substrate 9 relative to the drawing head 41 only once in the Y direction. In this case, sub-scanning of the substrate 9 by the second moving mechanism 24 (i.e., step movement in the X direction) is not performed when drawing the pattern.

[0035] The calibration unit 5 is located on the stage 21 on the (+Y) side of the substrate holding unit 25. The calibration unit 5 is used for calibration of the drawing head 41 (i.e., measurement and correction of the light irradiation position from the drawing head 41).

[0036] Figure 2 is a plan view showing an enlarged view of the vicinity of the calibration unit 5 of the drawing device 1. Figure 3 is a front view showing the configuration of the calibration unit 5 and the drawing head 41. Figure 3 shows the state in which the drawing head 41 is positioned vertically above the calibration unit 5. Figure 3 illustrates the internal configuration of the stage 21 and the internal configuration of one drawing head 41. The structure of the other drawing heads 41 is substantially the same as that of the one drawing head 41.

[0037] As shown in Figure 3, the drawing head 41 comprises a light source unit 42, an illumination optical system 43, a spatial light modulator 44 (hereinafter also simply referred to as "light modulator 44"), and a projection optical system 45. Light emitted from the light source unit 42 is guided by the illumination optical system 43 to the light modulator 44, modulated by the light modulator 44, and then guided downwards (i.e., in the (-Z) direction) of the drawing head 41 by the projection optical system 45.

[0038] The light source unit 42 is equipped with multiple light sources that emit light of different wavelengths. In the example shown in Figure 3, the light source unit 42 is equipped with three light sources 421 to 423. Various light sources such as LDs (Laser Diodes) can be used as light sources 421 to 423. When drawing a pattern on the substrate 9, two or more light sources from light sources 421 to 423 are used, depending on the type of photosensitive material on the substrate 9, for example. The number of light sources provided in the light source unit 42 may be one, two, or four or more. The light sources provided in the light source unit 42 are not limited to LDs, and various types can be used.

[0039] The illumination optical system 43 and the projection optical system 45 each include multiple optical elements such as lenses (not shown). Various optical modulators such as DMD (Digital Micro Mirror Device) and GLV (Grating Light Valve) (registered trademark of Silicon Light Machines (Sunnyvale, California)) can be used as the optical modulator 44. The optical modulator 44 is not limited to the above example, and various types can be used.

[0040] The calibration unit 5 comprises an imaging unit 51 and a scale unit 52. The scale unit 52 is a substantially flat plate-shaped member provided on the stage 21. The scale unit 52 is positioned on the upper surface of the stage 21 and adjacent to (i.e., in close proximity to) the (+Y) side of the substrate holding unit 25. In the example shown in Figure 2, the scale unit 52 is a substantially rectangular strip-shaped member extending substantially parallel to the X direction and is translucent. The main surface of the scale unit 52 on the (+Z) side is provided with numerous scales indicating the position in the X direction on the main surface. In other words, the scale unit 52 is a translucent scale member, for example, a substantially transparent glass scale. The scales of the scale unit 52 are, for example, a cross pattern or other shaped patterns. The scale unit 52 may also be a translucent member.

[0041] The imaging unit 51 is mounted inside the stage 21 below the scale unit 52. The imaging unit 51 includes a calibration camera 53 and a camera movement mechanism 54. The calibration camera 53 is positioned vertically below the scale unit 52 and facing upward. The calibration camera 53 is, for example, a digital camera having a CCD (Charged Coupled Devices) or CMOS (Complementary Metal Oxide Semiconductor) as its image sensor. The type and performance of the calibration camera 53 may be set as appropriate.

[0042] The upper end of the calibration camera 53 (i.e., the part facing the drawing head 41 via the scale portion 52) is treated with an anti-reflection coating. Specifically, for example, an anti-reflective film is attached to the frame of the objective lens of the calibration camera 53 to reduce reflectivity. This prevents reflected light from the calibration camera 53 from being captured unintentionally when the alignment camera 31 is imaging. Note that the above anti-reflection coating may be performed by various structures and methods other than an anti-reflective film.

[0043] The camera movement mechanism 54 is a movement mechanism that moves the calibration camera 53 linearly in the X direction along a guide rail inside the stage 21. The drive source for the camera movement mechanism 54 is, for example, a linear servo motor or a motor attached to a ball screw. The structure of the camera movement mechanism 54 can be modified in various ways.

[0044] In the drawing device 1, with multiple drawing heads 41 positioned vertically above the scale section 52 of the calibration unit 5, the calibration camera 53 is moved by the camera movement mechanism 54 and positioned vertically below one of the drawing heads 41 that is to be calibrated. A predetermined calibration pattern (i.e., a pattern used for calibrating the drawing head 41) is emitted from this one drawing head 41 toward the scale section 52. The calibration pattern is, for example, a cross-shaped pattern. The shape of the calibration pattern can be changed in various ways as long as it is a shape that allows the center of gravity to be calculated.

[0045] The calibration camera 53 images the area illuminated by light from the drawing head 41 on the scale section 52 (i.e., the calibration pattern) from below through the scale section 52, along with the scale pre-formed on the scale section 52. In other words, the calibration camera 53 images the calibration pattern that has passed through the scale section 52, along with the scale. The image acquired by the calibration camera 53 (hereinafter also referred to as the "inspection image") is sent to the control unit 10 shown in Figure 1. The control unit 10 performs calibration of one of the drawing heads 41 based on the inspection image. When calibration of another drawing head 41 is to be performed, the calibration camera 53 is moved in the X direction by the camera movement mechanism 54, and after being positioned vertically below the other drawing head 41, calibration is performed using the same procedure.

[0046] Figure 4 shows the configuration of a computer 100 that functions as a control unit 10. The computer 100 is a typical computer comprising a processor 101, a memory 102, an input / output unit 103, and a bus 104. The bus 104 is a signal circuit connecting the processor 101, the memory 102, and the input / output unit 103. The memory 102 stores programs and various information. The processor 101 performs various processes (e.g., numerical calculations and image processing) using the memory 102, etc., according to the programs etc. stored in the memory 102. The input / output unit 103 includes a keyboard 105 and a mouse 106 that accept input from the operator, and a display 107 that displays the output from the processor 101 etc. Note that the control unit 10 may be a programmable logic controller (PLC) or a circuit board, and may be a combination of these with one or more computers.

[0047] Figure 5 is a block diagram showing the functions of the control unit 10 implemented by the computer 100. Figure 5 also shows the components other than the control unit 10. The control unit 10 comprises a storage unit 111, an imaging control unit 112, a position detection unit 113, a correction information acquisition unit 114, an alignment information acquisition unit 115, and a drawing control unit 116. The storage unit 111 is mainly implemented by memory 102 and stores various information in advance, such as data for patterns to be drawn on the substrate 9 (i.e., drawing data). The imaging control unit 112, position detection unit 113, correction information acquisition unit 114, alignment information acquisition unit 115, and drawing control unit 116 are mainly implemented by the processor 101.

[0048] The imaging control unit 112 controls the drawing head 41 and the imaging unit 51 to illuminate the scale unit 52 (see Figures 2 and 3) from the drawing head 41 with a calibration pattern pre-stored in the storage unit 111, causing the imaging unit 51 to acquire the calibration inspection image. This inspection image is sent from the imaging unit 51 to the control unit 10 and stored in the storage unit 111.

[0049] The position detection unit 113 determines the irradiation position of the light from the drawing head 41 on the scale section 52 (hereinafter also referred to as the "measurement position") based on the inspection image which includes images of the scale section 52 and the calibration pattern. As described above, since the scale section 52 is fixed on the stage 21, the relative position of the scale section 52 with respect to the substrate holding section 25 is also fixed. Therefore, by detecting the irradiation position of the calibration pattern on the numerous scales of the scale section 52, the relative position of the irradiation position of the light emitted from the drawing head 41 with respect to the substrate holding section 25 can be determined.

[0050] The correction information acquisition unit 114 obtains correction information used to correct the irradiation position of the light from the drawing head 41 on the substrate 9, based on the measurement position determined by the position detection unit 113. Specifically, the measurement position is compared with the designed irradiation position on the scale portion 52 of the calibration pattern irradiated from the drawing head 41 (hereinafter also referred to as the "design position"), and the distance in the X and Y directions between the measurement position and the design position (i.e., the amount of deviation from the design position) is determined. Based on this amount of deviation, the correction information acquisition unit 114 obtains correction information to correct the irradiation position of the light from the drawing head 41 to match the design position. This correction information is, for example, information for correcting the drawing data of the pattern drawn on the substrate 9 to match the amount of deviation. Alternatively, this correction information may be information for correcting the movement of the substrate 9 by the stage movement mechanism 22 when drawing a pattern on the substrate 9.

[0051] The alignment information acquisition unit 115 acquires alignment information used for aligning the substrate 9 (i.e., correcting the relative position of the substrate 9 with respect to the drawing head 41) based on the image of the alignment marks (hereinafter also referred to as the "alignment image") acquired by the alignment camera 31 of the alignment unit 3. Specifically, the position of the substrate 9 on the substrate holding unit 25 is determined based on the position of the alignment marks in the alignment image, and the amount of deviation of the substrate 9 from the design position on the substrate holding unit 25 is determined. In other words, the amount of deviation of the relative position of the substrate 9 with respect to the drawing head 41 from the design position is determined. Based on this amount of deviation, the alignment information acquisition unit 115 obtains alignment information to correct the relative position of the substrate 9 with respect to the drawing head 41 so that it matches the design position. This alignment information is, for example, information for correcting the movement of the substrate 9 by the stage moving mechanism 22 when drawing a pattern on the substrate 9. Alternatively, this alignment information may be information for correcting the drawing data of the pattern drawn on the substrate 9 according to the above amount of deviation.

[0052] The drawing control unit 116 controls the drawing head 41 and the stage moving mechanism 22 based on the drawing data stored in the memory unit 111, the correction information obtained by the correction information acquisition unit 114, and the alignment information obtained by the alignment information acquisition unit 115, thereby moving the substrate 9 relative to the drawing head 41 and causing the drawing head 41 to perform drawing on the substrate 9.

[0053] Next, the pattern drawing process using the drawing device 1 will be explained with reference to Figures 6 and 7A to 7E. Figure 6 is a diagram showing an example of the pattern drawing process on the substrate 9. Figures 7A to 7E are schematic front views showing the main components of the drawing device 1 in order to explain its operation. In Figures 7A to 7E, the internal configuration of the stage 21 is also shown with solid lines.

[0054] When drawing on the substrate 9, first, the stage 21 is positioned as shown in Figure 7A. In the following description, the position of the stage 21 in the Y direction as shown in Figure 7A will also be referred to as the "loading / unloading position". In the drawing apparatus 1, with the stage 21 in the loading / unloading position, the substrate 9 that has already been drawn on in the drawing apparatus 1 is loaded from the stage 21 to the outside of the drawing apparatus 1 as shown by the dashed line. Also, a new substrate 9 (i.e., the substrate 9 that is scheduled to be drawn on by the drawing apparatus 1) is loaded into the drawing apparatus 1 and held on the stage 21 of the substrate holding section 25 (step S11). That is, in step S11, with the stage 21 in the loading / unloading position, the substrate 9 is loaded into and out of the substrate holding section 25. The loading and unloading of the substrate 9 may be performed, for example, by a loading / unloading device (not shown), or by manual operation by an operator. When the stage 21 is in the loading / unloading position, the substrate holding section 25 is located on the (-Y) side of the multiple drawing heads 41 and multiple alignment cameras 31 of the drawing section 4 attached to the support section 40 (see Figure 1).

[0055] In the state shown in Figure 7A, the scale section 52 of the calibration unit 5 is located vertically below the drawing head 41. In the following description, the position of the scale section 52 in the Y direction as shown in Figure 7A will also be referred to as the "calibration position". In the drawing apparatus 1, with the stage 21 in the loading / unloading position and the scale section 52 in the calibration position, the calibration of the multiple drawing heads 41 is performed in parallel with the loading / unloading of the substrate 9 in step S11.

[0056] Specifically, the calibration camera 53 is moved by the camera movement mechanism 54 (see Figures 2 and 3) and positioned vertically below one drawing head 41 that is to be calibrated. Then, the light source unit 42 and the light modulator 44 (see Figure 3) of the drawing head 41 are controlled by the control unit 10 so that the calibration pattern described above is irradiated from the drawing head 41 onto the scale unit 52. When irradiating the calibration pattern, only one predetermined light source from the light sources 421 to 423 (see Figure 3) is used by the light source unit 42. As a result, the calibration pattern on the scale unit 52 is formed by light of a single wavelength.

[0057] The calibration camera 53 captures the calibration pattern irradiated onto the scale section 52 located at the calibration position, along with the scale of the scale section 52, to acquire an inspection image. The acquired inspection image is sent to the control unit 10 and stored in the storage unit 111 (see Figure 5).

[0058] When acquiring inspection images, the calibration pattern may be significantly shifted in the Y direction and may be outside the field of view of the calibration camera 53. In this case, the position of the calibration pattern in the Y direction on the scale section 52 is corrected so that the calibration pattern is within the field of view of the calibration camera 53, and then the inspection image is acquired. The correction of the position of the calibration pattern in the Y direction is performed by the drawing head 41 while the stage 21 is stationary (i.e., without moving the stage 21 in the Y direction).

[0059] Specifically, for example, if data for multiple calibration patterns with different positions in the Y direction are pre-stored in the storage unit 111, and the position of the calibration pattern on the scale unit 52 is shifted to the (+Y) side, the current data is replaced with data where the calibration pattern is located on the (-Y) side. Then, the drawing head 41 is controlled based on the replaced data, causing the position of the calibration pattern on the scale unit 52 to move to the (-Y) side.

[0060] This allows for optimal imaging of the calibration pattern without moving the stage 21 (i.e., without moving the scale section 52), thus reducing the time required for calibration of the drawing head 41. Furthermore, as described above, since the calibration of the drawing head 41 is performed in parallel with the loading and unloading of the substrate 9, the movement of the stage 21 does not adversely affect the loading and unloading of the substrate 9 (for example, interruption of loading and unloading operations while the stage 21 is moving). Note that the position change of the calibration pattern by the drawing head 41 is not limited to the method described above and may be performed by other methods.

[0061] Next, the calibration camera 53 is moved in the X direction by the camera movement mechanism 54 and positioned vertically below the next drawing head 41 adjacent in the X direction to the drawing head 41 from which an inspection image has already been acquired. Then, similarly to the above, the calibration pattern irradiated onto the scale section 52 from the next drawing head 41 is captured, and the inspection image of the next drawing head 41 is acquired. In the drawing device 1, inspection images are sequentially acquired by the calibration camera 53 for all drawing heads 41 of the drawing unit 4 (step S12). In other words, the single calibration camera 53 sequentially captures multiple calibration patterns irradiated onto the scale section 52 from multiple drawing heads 41, while moving in the X direction (i.e., the direction in which the multiple drawing heads 41 are arranged).

[0062] In the drawing apparatus 1, it is preferable that the time required in step S12 (i.e., the time required to acquire inspection images from all of the multiple drawing heads 41) is shorter than the time required in step S11 to remove one substrate 9 from the substrate holding unit 25 and load a new substrate 9 into the substrate holding unit 25. Also, in the drawing apparatus 1, when acquiring an inspection image with one drawing head 41, the irradiation of calibration patterns from the other drawing heads 41 may be stopped, or calibration patterns may be irradiated onto the scale unit 52 from the other drawing heads 41.

[0063] In the drawing device 1, once an inspection image of one drawing head 41 is acquired, the position detection unit 113 (see Figure 5) determines the irradiation position of the light from the drawing head 41 on the scale section 52 (i.e., the measurement position of the calibration pattern) based on the inspection image. Then, based on the measurement position of the calibration pattern, the correction information acquisition unit 114 (see Figure 5) obtains correction information regarding the irradiation position of the light from the one drawing head 41 (step S13). Thus, in the drawing device 1, it is preferable that the acquisition of inspection images of multiple drawing heads 41 and the acquisition of correction information based on the inspection images are performed in parallel.

[0064] Once the loading and unloading of the substrate 9 (step S11) and the acquisition of inspection images for all drawing heads 41 (step S12) are completed, the stage 21 is moved in the (+Y) direction by the first moving mechanism 23 of the stage moving mechanism 22. The movement of the stage 21 in the (+Y) direction is started, for example, before the above correction information is acquired for all drawing heads 41 (i.e., before step S13 is completed). In this case, step S13 continues even while the substrate 9 is being moved. Note that the movement of the stage 21 may be started after the completion of step S13.

[0065] As the stage 21 moves in the (+Y) direction, it passes below the alignment camera 31 as shown in Figure 7B, and moves to the standby position shown in Figure 7C where it stops. As shown in Figure 7B, when the stage 21 passes below the alignment camera 31, alignment marks (not shown) that have been pre-provided on the substrate 9 on the substrate holding section 25 are imaged by the alignment camera 31. When the alignment marks are imaged, pulsed illumination light (i.e., flash) is emitted from the illumination light source of the alignment section 3 onto the imaging area of ​​the alignment camera 31. This allows the alignment marks on the moving substrate 9 to be imaged with high accuracy. As described above, in the calibration section 5 that passes below the alignment camera 31, the upper end of the calibration camera 53 is treated with a low-reflection coating, so that the reflected light from the calibration camera 53 of the illumination light does not enter the alignment camera 31.

[0066] The image containing alignment marks acquired by the alignment camera 31 (i.e., the alignment image) is sent to the control unit 10 and stored in the storage unit 111 (see Figure 5). The alignment information acquisition unit 115 obtains alignment information based on the alignment image. Based on this alignment information, the drawing control unit 116 performs alignment processing on the substrate 9 (step S14). In the alignment processing, in order to match the position of the substrate 9 to a predetermined design position, for example, the stage 21 is shifted in the X and Y directions (i.e., moved by a small distance) or rotated, or the drawing data of the pattern drawn on the substrate 9 is corrected.

[0067] Once the alignment process described above is complete, the stage 21, which is in the standby position, begins to move in the (-Y) direction. In the calibration unit 5, before the stage 21 begins to move in the (-Y) direction, the calibration camera 53 is moved in the X direction and retracts to a retracted position located vertically below the scale unit 52 on the (+X) or (-X) side. That is, the retracted position is located on the (+X) or (-X) side of the position where the scale unit 52 is provided on the stage 21. This suppresses or prevents the relatively high-intensity light used for drawing the pattern from entering the calibration camera 53.

[0068] In the drawing apparatus 1, as shown in Figure 7D, the substrate 9 held by the substrate holding section 25 passes below the drawing head 41. Then, the drawing control unit 116 (see Figure 5) controls the drawing head 41 and the stage moving mechanism 22 based on the drawing data and correction information described above, so that modulated light from the drawing head 41 is irradiated onto the substrate 9 on the stage 21 which is moving in the Y direction below the drawing head 41, and a pattern is drawn (step S15).

[0069] In this embodiment, as described above, pattern drawing on the substrate 9 is performed using a multi-pass method. Modulated light from the drawing head 41 is irradiated onto the substrate 9, which moves back and forth in the Y direction below the drawing head 41, to draw the pattern. Furthermore, when drawing a pattern on the substrate 9, it is preferable that two or more light sources from the three light sources 421 to 423 (see Figure 3) of the light source unit 42 are used in each drawing head 41. This makes it possible to draw a suitable pattern according to the type of photosensitive material on the substrate 9.

[0070] Once the pattern drawing on the substrate 9 is complete, the stage 21 is moved to the loading / unloading position shown in Figure 7E (step S16). At this time, the calibration camera 53 moves from its retracted position in the X direction and returns to the vertically downward position of the scale section 52. This completes the pattern drawing on one substrate 9.

[0071] In the actual drawing device 1, the process returns from step S16 to step S11, and steps S11 to S16 are repeated to sequentially draw patterns on multiple substrates 9. In the drawing device 1, the acquisition of inspection images by the calibration camera 53 (step S12) is performed each time a substrate 9 is loaded into the substrate holding unit 25 (step S11). This allows for maintaining a high level of accuracy in pattern drawing on the substrates 9, even when drawing patterns on multiple substrates 9 continuously.

[0072] In the drawing device 1, the acquisition of correction information for all drawing heads 41 (step S13) and the alignment process of the substrate 9 (step S14) only need to be completed before the start of pattern drawing on the substrate 9. Furthermore, the completion of step S13 may be before or after the completion of step S14, or may be approximately simultaneous.

[0073] As described above, the drawing apparatus 1, which draws a pattern by irradiating light onto a substrate 9, comprises a stage 21, a drawing head 41, a main scanning mechanism (i.e., a first moving mechanism 23), a scale unit 52, a calibration camera 53, a correction information acquisition unit 114, and a drawing control unit 116. The stage 21 is provided with a substrate holding unit 25 for holding the substrate 9. The drawing head 41 irradiates the substrate 9 with modulated light. The first moving mechanism 23 moves the stage 21 relative to the drawing head 41 in the main scanning direction (Y direction in the above example) parallel to the upper surface 91 of the substrate 9. The scale unit 52 is provided on the stage 21 adjacent to the substrate holding unit 25 in the main scanning direction. The calibration camera 53 captures a predetermined calibration pattern irradiated from the drawing head 41 onto the scale unit 52 when the scale unit 52 is positioned at a calibration position below the drawing head 41. The correction information acquisition unit 114 obtains correction information used to correct the irradiation position of light from the drawing head 41 based on the inspection image including the scale section 52 and calibration pattern acquired by the calibration camera 53. The drawing control unit 116 controls the drawing head 41 and the first moving mechanism 23 based on the drawing data and correction information, causing the drawing head 41 to perform drawing on the substrate 9 while moving the substrate 9 relative to the drawing head 41 in the main scanning direction. In the drawing apparatus 1, the scale section 52 is positioned at the calibration position when the stage 21 is located at the loading / unloading position where the substrate 9 is loaded and unloaded from the substrate holding unit 25. This makes it possible to perform calibration of the drawing head 41 in parallel with the loading and unloading of the substrate 9 to and from the drawing apparatus 1. Therefore, calibration of the drawing head 41 can be performed while suppressing an increase in cycle time.

[0074] As described above, it is preferable that the drawing apparatus 1 further comprises an alignment camera 31 and an alignment information acquisition unit 115. The alignment camera 31 captures alignment marks on the substrate 9. The alignment information acquisition unit 115 obtains alignment information used to correct the relative position of the substrate 9 with respect to the drawing head 41, based on the image of the alignment marks (i.e., the alignment image) acquired by the alignment camera 31. It is preferable that the alignment camera 31 is located on the opposite side of the substrate holding portion 25 of the stage 21, which is located at the loading / unloading position, with respect to the main scanning direction, with respect to the drawing head 41 in between. This makes the stage 21 smaller with respect to the main scanning direction compared to the case where the alignment camera 31 is located between the drawing head 41 and the substrate holding portion 25 of the stage 21, which is located at the loading / unloading position. As a result, the drawing apparatus 1 can be made smaller with respect to the main scanning direction.

[0075] As described above, it is preferable that the drawing device 1 further includes a support portion 40 that supports the drawing head 41 above the stage 21. It is also preferable that the alignment camera 31 is supported by the support portion 40. This simplifies the structure of the drawing device 1 and allows for miniaturization of the drawing device 1 in the main scanning direction compared to the case where the support portion for the drawing head 41 and the support portion for the alignment camera 31 are provided separately. Furthermore, when the support portion for the drawing head 41 and the support portion for the alignment camera 31 are provided separately, differences in thermal deformation of the two support portions may lead to a large misalignment of the relative positions of the drawing head 41 and the alignment camera 31. However, as described above, by using a single support portion 40 to support both the drawing head 41 and the alignment camera 31, the misalignment of the relative positions of the drawing head 41 and the alignment camera 31 can be suppressed.

[0076] As described above, the scale section 52 is preferably a translucent scale member positioned on the upper surface of the stage 21. The calibration camera 53 is mounted on the stage 21 below the translucent scale member and captures the calibration pattern transmitted through the translucent scale member. Preferably, the upper end of the calibration camera 53 is treated with a low-reflection coating. This suppresses the incidence of reflected light from the calibration camera 53 (for example, reflected light from the frame of the objective lens) into the alignment camera 31 when imaging is performed by the alignment camera 31. Therefore, since it is not necessary to retract the calibration camera 53 from below the scale section 52 when imaging is performed by the alignment camera 31, the cycle time can be shortened.

[0077] As described above, preferably, the position of the calibration pattern on the scale section 52 in the main scanning direction can be changed by the drawing head 41 while the stage 21 is stationary. This makes it possible to image the calibration pattern without moving the stage 21, even if the calibration pattern is deviated relatively large from a predetermined position on the scale section 52 in the main scanning direction. Therefore, it is possible to prevent an increase in cycle time due to the movement of the stage 21 during calibration.

[0078] As described above, it is preferable that the drawing head 41 is equipped with multiple light sources (light sources 421 to 423 in the above example) that emit light of different wavelengths. Furthermore, it is preferable that two or more of the multiple light sources are used when drawing on the substrate 9, and that only one of the multiple light sources is used when irradiating the calibration pattern onto the scale section 52. This makes it possible to select the light sources and light intensity ratio, etc., according to the type of photosensitive material on the substrate 9 when drawing a pattern on the substrate 9, and to perform suitable pattern drawing. In addition, by setting the calibration camera 53 to match the wavelength of light from one of the light sources, the calibration pattern can be captured with high accuracy.

[0079] As described above, in the drawing device 1, it is preferable that a plurality of drawing heads 41 are arranged in an array direction parallel to the upper surface 91 of the substrate 9 and inclined with respect to the main scanning direction. The plurality of drawing heads 41 include the drawing heads 41 described above, and each of them irradiates the substrate 9 with modulated light. Furthermore, it is preferable that the calibration camera 53 sequentially captures a plurality of calibration patterns irradiated onto the scale portion 52 from the plurality of drawing heads 41, while moving in the array direction described above, with the scale portion 52 positioned at the calibration position. This simplifies the structure of the drawing device 1 compared to the case where a plurality of calibration cameras are provided in the calibration unit 5, and reduces the manufacturing cost of the drawing device 1.

[0080] As described above, it is preferable that the time required to acquire the inspection image using the calibration camera 53 (step S12) is shorter than the time required to remove one substrate 9 from the substrate holding unit 25 and load a new substrate 9 into the substrate holding unit 25. This allows the stage 21 to start moving immediately after the loading and unloading of the substrates 9 is completed. Therefore, an increase in cycle time due to calibration can be prevented.

[0081] As described above, it is preferable that the inspection image acquired by the calibration camera 53 is performed each time the substrate 9 is loaded into the substrate holding section 25. This makes it possible to achieve high-precision drawing while suppressing an increase in cycle time.

[0082] The drawing method described above includes the steps of: (step S12) capturing a predetermined calibration pattern irradiated from the drawing head 41 onto the scale portion 52 located at a calibration position below the drawing head 41, while the stage 21, which is provided with a substrate holding portion 25 for holding the substrate 9 and a scale portion 52 adjacent to the substrate holding portion 25 in the main scanning direction parallel to the upper surface 91 of the substrate 9, is positioned at the loading / unloading position where the substrate 9 is loaded and unloaded from the substrate holding portion 25; (step S13) obtaining correction information used to correct the irradiation position of the light from the drawing head 41 based on the inspection image including the scale portion 52 and the calibration pattern acquired in step S12; and (step S15) irradiating the substrate 9, which is moving relative to the drawing head 41 in the main scanning direction, with light modulated from the drawing head 41 based on the drawing data and correction information to perform drawing on the substrate 9. This makes it possible to calibrate the drawing head 41 while suppressing an increase in cycle time, similar to the above.

[0083] Various modifications are possible to the drawing device 1 and drawing method described above.

[0084] For example, the light source unit 42 of the drawing head 41 may emit light from two or more light sources when capturing an inspection image. Also, the light source unit 42 does not necessarily need to have multiple light sources; it may have only one light source.

[0085] In the drawing device 1, the position of the calibration pattern in the Y direction on the scale section 52 does not necessarily have to be changed by the drawing head 41, but may be changed by the stage 21 moving in the Y direction.

[0086] In the drawing device 1, the time required to acquire an inspection image using the calibration camera 53 (step S12) may be longer than, or approximately the same as, the time required to unload one substrate 9 from the substrate holding unit 25 and load a new substrate 9 into the substrate holding unit 25. In either case, the cycle time can be shortened by performing the loading and unloading of the substrate 9 and the calibration of the drawing head 41 in parallel.

[0087] In the drawing device 1, in the imaging unit 51 of the calibration unit 5, multiple calibration cameras 53 (i.e., the same number as the drawing heads 41) corresponding to each of the multiple drawing heads 41 are arranged in the X direction vertically below the scale unit 52, and inspection images of the multiple drawing heads 41 may be acquired substantially simultaneously.

[0088] In the drawing device 1, it is not necessarily required to apply a low-reflection coating to the upper end of the calibration camera 53. In this case, when acquiring an alignment image with the alignment camera 31, the calibration camera 53 may be retracted to a retracted position on the (+X) or (-X) side from vertically below the scale section 52, as needed.

[0089] In the drawing device 1, the retracted position of the calibration camera 53 does not necessarily have to be on the (+X) or (-X) side of the scale section 52. For example, the retracted position may be set to be between two adjacent drawing heads 41 in the X direction. In this case, the amount of movement of the calibration camera 53 in the X direction when retracted can be reduced compared to when the retracted position is set on the (+X) or (-X) side of the scale section 52, thus further shortening the cycle time.

[0090] In the drawing device 1, the drawing head 41 and the alignment camera 31 do not necessarily have to be supported by a single support portion 40, but may be supported by two separate support portions, which are separate members positioned spaced apart in the Y direction.

[0091] In the drawing apparatus 1, the alignment camera 31 may be provided between the drawing head 41 and the substrate holding portion 25 of the stage 21 located at the loading / unloading position.

[0092] In the drawing device 1, the scale section 52 does not necessarily need to be translucent, and the calibration camera 53 does not necessarily need to be attached to the stage 21. For example, the scale section 52 may be a reflector that reflects light emitted from the drawing head 41 in a predetermined direction. The calibration camera 53 may be fixed to the frame of the drawing device 1 at a position spaced apart from the stage 21, and by receiving reflected light from the scale section 52, it may capture an inspection image including the calibration pattern illuminated on the scale section 52 and the scale on the scale section 52.

[0093] The stage 21 can be moved relative to the drawing head 41 in the main scanning direction by the first moving mechanism 23. Therefore, for example, the stage 21 may be fixed, and the drawing head 41 may be moved in the main scanning direction by the first moving mechanism 23 above the stage 21. Similarly, the drawing head 41 may be moved in the sub-scanning direction by the second moving mechanism 24.

[0094] In the drawing device 1, calibration is not necessarily required every time a substrate 9 is brought in. For example, the drawing head 41 may be calibrated each time a predetermined number of patterns have been drawn on two or more substrates 9.

[0095] The substrate 9 described above is not necessarily limited to a printed circuit board. The drawing device 1 may, for example, draw patterns on semiconductor substrates, substrates for semiconductor packages, glass substrates for flat panel display devices such as liquid crystal displays and plasma displays, glass substrates for photomasks, substrates for solar panels, etc.

[0096] The configurations in the above embodiments and each modified example may be combined as appropriate, as long as they do not contradict each other. [Explanation of symbols]

[0097] 1 Drawing device 9 circuit boards 21 stages 23 1st movement mechanism 25 Board holding part 31 Alignment Camera 40 Support part 41 drawing head 51 Imaging Unit 52 Scale section 53 Calibration Camera 91 Top surface (of the circuit board) 114 Correction Information Acquisition Unit 115 Alignment Information Acquisition Unit 116 Drawing Control Unit 421~423 Light source S11~S16 Step

Claims

1. A drawing device that draws patterns on a substrate by irradiating it with light, A stage equipped with a substrate holding section for holding the substrate, A drawing head that irradiates the substrate with modulated light, A main scanning mechanism that moves the stage relative to the drawing head in a main scanning direction parallel to the upper surface of the substrate, On the aforementioned stage, the substrate holding portion and the scale portion are provided adjacent to each other in the main scanning direction, A calibration camera captures a predetermined calibration pattern irradiated from the drawing head onto the scale portion while the scale portion is positioned at a calibration position below the drawing head. A correction information acquisition unit obtains correction information used to correct the irradiation position of light from the drawing head based on an inspection image including the scale portion and the calibration pattern acquired by the calibration camera, A drawing control unit controls the drawing head and the main scanning mechanism based on drawing data and the correction information, thereby causing the drawing head to perform drawing on the substrate while moving the substrate relative to the drawing head in the main scanning direction, Equipped with, A drawing apparatus characterized in that the scale portion is located at the calibration position while the stage is located at the loading / unloading position where the substrate is loaded into and unloaded from the substrate holding portion.

2. A drawing apparatus according to claim 1, An alignment camera for imaging alignment marks on the substrate, An alignment information acquisition unit obtains alignment information used to correct the relative position of the substrate with respect to the drawing head, based on the image of the alignment marks acquired by the alignment camera, Furthermore, The drawing apparatus is characterized in that the alignment camera is located on the opposite side of the substrate holding portion of the stage, which is located at the loading / unloading position, with respect to the main scanning direction, with the drawing head in between.

3. A drawing apparatus according to claim 2, The stage further comprises a support portion for supporting the drawing head, The drawing apparatus is characterized in that the alignment camera is also supported by the support part.

4. A drawing apparatus according to claim 1, The scale portion is a translucent scale member positioned on the upper surface of the stage, The calibration camera is mounted on the stage below the translucent scale member and captures the calibration pattern transmitted through the translucent scale member. A drawing apparatus characterized in that the upper end of the calibration camera is treated with an anti-reflective coating.

5. A drawing apparatus according to claim 1, A drawing apparatus characterized in that the position of the calibration pattern on the scale portion in the main scanning direction can be changed by the drawing head while the stage is stationary.

6. A drawing apparatus according to claim 1, The drawing head comprises a plurality of light sources that emit light of different wavelengths from each other. When drawing on the substrate, two or more of the multiple light sources are used. A drawing apparatus characterized in that, when the calibration pattern is irradiated onto the scale portion, only one of the plurality of light sources is used.

7. A drawing apparatus according to claim 1, A plurality of drawing heads, each including the aforementioned drawing head and each irradiating the substrate with modulated light, are arranged in an arrangement direction parallel to the upper surface of the substrate and inclined with respect to the main scanning direction. The calibration camera is a drawing device characterized by sequentially capturing multiple calibration patterns, each irradiated onto the scale portion from the multiple drawing heads, while moving in the direction of the arrangement, with the scale portion positioned at the calibration position.

8. A drawing apparatus according to any one of claims 1 to 7, The drawing apparatus is characterized in that the time required to acquire the inspection image using the calibration camera is shorter than the time required to remove one substrate from the substrate holding section and load a new substrate into the substrate holding section.

9. A drawing apparatus according to any one of claims 1 to 7, The drawing apparatus is characterized in that the acquisition of the inspection image by the calibration camera is performed each time a substrate is loaded into the substrate holding section.

10. A drawing method that involves irradiating a substrate with light to draw a pattern, a) A stage provided with a substrate holding section for holding a substrate and a scale section adjacent to the substrate holding section in the main scanning direction parallel to the upper surface of the substrate, is positioned at an loading / unloading position where the substrate is loaded and unloaded from the substrate holding section. The step of imaging a predetermined calibration pattern irradiated from the drawing head onto the scale section located at a calibration position below the drawing head. b) A step of obtaining correction information used to correct the irradiation position of light from the drawing head based on the inspection image including the scale portion and the calibration pattern obtained in step a), c) A step of drawing on the substrate by irradiating the substrate, which is moving relative to the drawing head in the main scanning direction, with light modulated from the drawing head based on drawing data and correction information, A drawing method characterized by comprising the following:

Images