Wafer container purge port assembly
The purge port assembly with a transition portion and angled conduit addresses inefficiencies in wafer container gas supply, ensuring minimal pressure drop and reduced interference for effective gas flow.
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- ENTEGRIS INC
- Filing Date
- 2023-03-23
- Publication Date
- 2026-06-08
AI Technical Summary
Existing wafer containers face challenges in efficiently supplying purge gas while maintaining a positive pressure within the container, leading to potential interference with wafers and automation due to the design of conventional purge port assemblies.
A purge port assembly with a transition portion that includes a receiver, an outlet connector, and an intermediate conduit extending at an acute angle, allowing for efficient gas flow and minimizing interference with wafers and automation.
The design ensures minimal pressure drop and reduced interference, enabling effective gas supply to the wafer container while maintaining a positive pressure environment.
Smart Images

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Abstract
Description
Technical Field
[0001] This disclosure relates to purge ports within a wafer container. More specifically, this disclosure relates to a purge port assembly within a front opening unified pod.
Background Art
[0002] Semiconductor devices can be manufactured from a wafer substrate. A wafer substrate, or simply a wafer, undergoes a series of fabrication steps. For example, the fabrication steps can include, but are not limited to, depositing material layers on the substrate, doping, etching, or materials that react chemically or physically. One or more wafers can be stored and transported within a wafer container such as a front opening unified pod ("FOUP") before, during, or after fabrication. In some fabrication steps, the wafers may be processed while still inside the wafer container. The wafer container can include one or more purge ports for supplying a purge gas into the interior of the wafer container. For example, the purge gas can be a gas supplied to maintain a positive pressure (e.g., higher than the pressure of the external environment and higher than atmospheric pressure) inside the FOUP while the FOUP is open.
Summary of the Invention
[0003] In one embodiment, a purge port assembly is for a wafer container. The purge port assembly includes a purge module and a transition portion disposed above an intermediate outlet of the purge module. The purge module is configured to allow an inflow of a purge gas. The transition portion is disposed above the intermediate outlet of the purge module. The transition portion includes a receiver, an outlet connector, and an intermediate conduit. The receiver has an inlet opening configured to receive the purge gas discharged from the purge module. The outlet connector is configured to attach to a diffuser. The intermediate conduit connects the receiver to the outlet connector. The intermediate conduit extends from the receiver at an acute angle with respect to an axis of the inlet opening of the receiver. The intermediate conduit has a length that spaces the outlet connector from the receiver.
[0004] In one embodiment, the wafer container includes a shell and a purge port assembly. The shell includes an internal space. The purge port assembly extends into the internal space through an opening in the shell. The purge port assembly includes a purge module and a transition section. The module is disposed within the opening in the shell and is configured to allow the inflow of purge gas. The transition section includes a receiver, an outlet connector, and an intermediate conduit. The receiver has an inlet opening configured to receive purge gas discharged from the purge module. The outlet connector is configured to attach to a diffuser. The intermediate conduit connects the receiver to the outlet connector. The intermediate conduit extends from the receiver at an acute angle to the axis of the inlet opening of the receiver. The intermediate conduit has a length that separates the outlet connector from the receiver.
[0005] In one embodiment, a purge port assembly for a wafer container includes a purge module configured to allow the inflow of purge gas, and a transition portion disposed above an intermediate outlet of the purge module. The transition portion includes a receiver having an inlet opening configured to receive purge gas discharged from the purge module, an outlet connector configured to attach to a diffuser, and an intermediate conduit connecting the receiver to the outlet connector. The intermediate conduit has a tubular shape extending from the receiver to the outlet connector and a length that separates the outlet connector from the receiver.
[0006] In one embodiment, the minimum internal cross-sectional area of the intermediate conduit is at least 13 mm². 2 That is the case.
[0007] In one embodiment, the pressure drop across the intermediate passage is less than 20 kPa at a purge gas flow rate of 100 SLPM.
[0008] In one embodiment, the intermediate conduit extends from the receiver at an acute angle with respect to the axis of the receiver's inlet opening. In one embodiment, the acute angle is between 15 and 35 degrees.
[0009] In one embodiment, the intermediate conduit includes a curved section. In one embodiment, the curved section is continuous along the length of the intermediate conduit.
[0010] In one embodiment, the intermediate conduit extends such that, when the purge port assembly is viewed in plan, the outlet connector is completely separated from the receiver.
[0011] In one embodiment, a portion of the intermediate conduit protruding from the upper surface of the receiver has a width of less than half the diameter of the receiver body.
[0012] In one embodiment, the ratio of the area of the receiver's inlet opening to the minimum cross-sectional area of the intermediate conduit is 23:1 or greater.
[0013] In one embodiment, a portion of the intermediate conduit, which protrudes above the upper surface of the receiver, is entirely located on one side of the receiver's centerline.
[0014] In one embodiment, the transition portion is formed integrally with the exit connector.
[0015] In one embodiment, the purge module and transition portion are configured to be located within an opening in the shell of the wafer container, the opening extending through the bottom surface of the wafer container shell, and the purge port assembly is configured to block the opening in the shell. In another embodiment, the transition portion is configured to extend from the opening into the internal space of the wafer container.
[0016] In one embodiment, the wafer container comprises a shell including an internal space, a purge port assembly extending into the internal space through an opening in the shell, the purge port assembly comprising a purge module disposed within the opening in the shell, the purge module including a check valve configured to allow purge gas, and a transition portion disposed above the purge module within the opening in the shell. The transition portion comprises a receiver having an inlet opening configured to receive purge gas discharged from the purge module, an outlet connector configured to attach to a diffuser, and an intermediate conduit connecting the receiver to the outlet connector. The intermediate conduit has a tubular shape extending from the receiver to the outlet connector and a length that separates the outlet connector from the receiver.
[0017] In one embodiment, the transition portion extends from an opening in the shell into the internal space of the shell, the receiver of the transition portion is located within the opening in the shell, the exit connector of the transition portion is located within the internal space of the shell, and the intermediate conduit extends from an opening in the shell into the internal space of the shell.
[0018] In one embodiment, the intermediate conduit extends at an acute angle with respect to the axis of the receiver's inlet opening. In one embodiment, the acute angle is in the range of 15 to 35 degrees.
[0019] In one embodiment, the wafer container is a front-opening integrated pod, and the shell includes a front opening and a door configured to be disposed within the front opening.
[0020] In one embodiment, the wafer container further includes a diffuser having a column shape and an end that is mated to an outlet connector. [Brief explanation of the drawing]
[0021] [Figure 1A] This is a front perspective view of one embodiment of a wafer container. [Figure 1B]It is a front perspective view of the wafer container of FIG. 1A at the time of opening in one embodiment. [Figure 2] It is a cross-sectional view of the wafer container of FIG. 1B in one embodiment. [Figure 3] It is an enlarged view of the purge port assembly of the wafer container of FIG. 2. [Figure 4] It is a cross-sectional view of one embodiment of the purge port assembly. [Figure 5] It is a perspective view of a cross-section of the transition portion of the purge port assembly of FIG. 4. [Figure 6] It is a cross-sectional view of a conventional transition portion of the purge port assembly. [Figure 7A] It is a perspective view of the purge port assembly according to one embodiment. [Figure 7B] It is a cross-sectional view of the purge port assembly of FIG. 7A. [Figure 8A] It is a perspective view of the purge port assembly according to one embodiment. [Figure 8B] It is a cross-sectional view of the purge port assembly of FIG. 8A.
MODE FOR CARRYING OUT THE INVENTION
[0022] Like numbers represent like features.
[0023] The present disclosure relates to a wafer container and a purge port assembly within the wafer container.
[0024] As used herein, a portion of a channel is defined as "curved" if the centerline of the channel, which is at the center of the cross-sectional area and perpendicular to the plane of the cross-section in the cross-sectional area, follows an arc having a radius between that portion of the channel. A channel can be defined as a "curved" channel if it includes one or more portions that are curved as defined herein and one or more of the curved portions include at least one quarter of the length of the channel.
[0025] Figure 6 is a cross-sectional view of an example of a conventional transition section 540 of a purge port assembly. The transition section 540 includes a receiver 542 and an outlet connector 562. The receiver 540 and the outlet connector 562 are formed within the transition section 540 so as to be in direct contact with each other. For example, the upper end 542 of the receiver 540 and the lower end 563 of the outlet connector 562 are in direct contact with each other. In particular, the outlet opening in the upper end 542 of the receiver 540 and the inlet opening in the lower end 563 of the outlet connector 562 are the same opening 590. For example, the opening 590 is a window formed at the intersection of the receiver 540 and the outlet connector 562. The receiver 540 and the outlet connector 562 are formed within the conventional transition section 540 so as not to be separated from each other.
[0026] Figures 1A and 1B are front perspective views of one embodiment of a wafer container 1. In the illustrated embodiment, the wafer container 1 is a front-opening integrated pod ("FOUP"). The container 1 includes a shell 4 and a door 6. The shell 4 includes an opening 8 (e.g., a front opening). The door 6 is coupled to the shell 4, covers the front opening 8, and forms an internal space 10. This internal space 10 may also be referred to as the enclosed space of the wafer container 1. For example, the door 6 may be coupled to the shell 4 by mechanically latching or suction fitting into the corresponding opening of the shell 4. For example, in one embodiment, the door 6 may be coupled to the shell 4 (e.g., via a hinge) on the top, bottom, or one of the sides of the opening 8 of the shell 4. The door 6 covers the opening 8, and the container 1 can be accessed by moving the door 6 (e.g., opening, removing). Figure 1A shows the wafer container 1 in the closed position (e.g., with the door 6 covering the opening 8). Figure 1B shows the wafer container 1 in the open state (for example, when the door 6 is removed / uncoupled).
[0027] Figure 2 is a partial cross-sectional view of the wafer container 1 shown in Figure 1B according to one embodiment. The wafer container 1 includes a purge port assembly 20 that forms a purge port within the wafer container 1 for supplying purge gas into the internal space 10. The purge port is formed in the bottom 12 of the shell 4. The purge port assembly 20 extends through the shell 4 into the wafer container 1. The container 1 may include one or more purge ports. For example, the container 1 in Figure 2 includes four purge ports (for example, two purge ports are hidden and not visible in Figure 2). In another embodiment, the container 1 may include a different number of purge ports (for example, one, two, three, five, etc.). As shown in Figure 2, the purge port assembly 20 may be used for a rear purge port of the container 1 that is closer to the rear of the shell 4 than to the front (for example, closer to the rear than to the front opening 8).
[0028] The container 1 is configured to hold one or more semiconductor substrates (not shown) within its internal space 10. In one embodiment, the container 1 is configured to hold multiple semiconductor substrates. The purge port assembly 20 is for supplying purge gas into the internal space 10 of the container 1. For example, the purge gas supplied through the purge port may include, but is not limited to, an inert gas (e.g., nitrogen) or filtered air (e.g., clean, dry air). Figure 2 includes dashed arrows indicating a typical flow of purge gas through the purge port assembly 20.
[0029] Figure 3 is a magnified view of a portion of the wafer container 1 in Figure 2. In particular, Figure 3 shows a magnified view of the purge port assembly 20 shown in Figure 2. As shown in Figure 3, the purge port assembly 20 extends through the bottom 12 of the shell 4. The shell 4 includes an opening 14 within its bottom 12 that extends through the bottom 12 to the internal space 10. The purge port assembly is disposed within the opening 14 in the shell 4. The purge port assembly 20 is configured to block the opening 14 so that fluid can only pass through the opening 14 and enter the internal space 10 by flowing through the purge port assembly 20.
[0030] The purge port assembly 20 includes a purge module 22, a transition section 40, and a diffuser 80. The purge module 22 is configured to block ambient air and allow purge gas to flow into the purge port assembly 20. For example, a purge nozzle (not shown) is configured to supply purge gas to the purge module 22. The purge module 22 may include a check valve 24 that opens to allow purge gas to flow into the purge port assembly 20 and through the purge module 22, and in some embodiments, a grommet configured to form a contact surface with the purge nozzle. The check valve 24 prevents ambient air from flowing into the purge port assembly 20. In one embodiment, the check valve 24 may be configured to open when actuated by the pressure of the purge gas (e.g., higher than the ambient pressure). In one embodiment, the check valve 24 may be configured to open when a purge nozzle physically contacts and pushes the check valve 24.
[0031] Figure 4 is a cross-sectional view of the purge port assembly 20 excluding the diffuser 80. The purge gas flows through the purge port assembly 20 by entering through the external inlet 26 in the purge module 22 and exits through the diffuser 80. The purge gas flows from the purge module 22 to the transition section 40 and from the transition section 40 to the diffuser 80. The purge port assembly 20 may also include a filter 38 disposed between the purge module 22 and the transition section 40. The filter 38 is configured to remove, for example, solid particulate matter from the purge gas as it flows through the purge port assembly 20.
[0032] The purge module 22 is located within an opening 14 in the shell 4. The purge module 22 includes an external inlet 26 and a first intermediate outlet 28. Purge gas enters the purge module 22 through the external inlet 26, flows through the purge module 22, and then exits the purge module 22 through the (first) intermediate outlet 28. The purge gas discharged from the purge module 22 then flows into the transition section 40. In one embodiment, as shown in Figure 3, the purge gas can pass through a filter 38 as it flows from the purge module 22 to the transition section 40.
[0033] As shown in Figure 3, the transition section 40 is positioned above the exit of the purge module 22 (e.g., an intermediate exit 28). The transition section 40 includes a receiver 42, an exit connector 52, and an intermediate conduit 62. The transition section 40 is positioned within the opening 14 in the shell 4. The transition section 40 is superimposed on the purge module 22 within the opening 14 in the shell 4. For example, the transition section 40 is positioned above the purge module 22 within the opening 14. The intermediate conduit 62 extends from the opening 14 in the shell 4 into the internal space 10. The exit connector 52 is positioned within the shell 4 (e.g., within the internal space 10 of the shell 4).
[0034] As shown in Figure 4, the transition portion 40 is formed as a single, integrated part. For example, in the illustrated embodiment, the transition portion 40 is a single, integrated part formed by polymer injection molding. The receiver 42 includes an inlet opening 44 configured to receive the purge gas discharged from the purge module 22. The inlet opening 44 is positioned above the outlet 28 of the purge module 22 so that the purge gas discharged from the purge module 22 flows into the receiver 42 of the transition portion 40 through the inlet opening 44.
[0035] The outlet connector 52 is configured to attach to the diffuser 80 (shown in Figures 2 and 3). The purge gas flows through the diffuser into the internal space 10 of the wafer container 1. The end of the diffuser 80 can be mated onto the outlet connector 52. In the illustrated embodiment, the outlet connector 52 has a return configured to connect and hold the diffuser 80 onto the outlet connector 52. In another embodiment, the outlet connector 52 may use a different structure and / or configuration to connect the outlet connector 52 to the diffuser 80. The purge port assembly 20 discharges the purge gas from the diffuser 80 into the internal space 10. In the illustrated embodiment, the diffuser 80 has a column shape (for example, as shown in Figure 2). However, it should be understood that in other embodiments, the diffuser 80 may have a different shape (disk shape, cap shape, etc.).
[0036] Figure 5 shows a perspective view of the transition section 40. The intermediate conduit 62 connects the receiver 42 to the outlet connector 52. Purge gas flows from the receiver 42 through the intermediate conduit 62 to the outlet connector. The intermediate conduit 62 has a tubular shape. In the illustrated embodiment, the tubular shape of the intermediate conduit 62 is circular (for example, the cross-section of the tubular shape is circular). It should be understood that the tubular shape of the intermediate conduit 62 can be different. In another embodiment, the tubular shape of the intermediate conduit 62 may be elliptical, rectangular, hexagonal, etc.
[0037] Intermediate conduit 62 is 13mm 2 The intermediate conduit 62 has a minimum internal cross-sectional area A2 of 15 mm². The purge gas passes through the minimum internal cross-sectional area A2 of the intermediate conduit 62 (for example, the cross-sectional area is the cross-sectional area of the open inner section of the intermediate conduit 62). In one embodiment, the minimum internal cross-sectional area A2 of the intermediate conduit 62 is 15 mm². 2 That concludes the explanation. In one embodiment, the minimum internal cross-sectional area A2 of the intermediate conduit 62 is 18 mm². 2That concludes the explanation. As shown in Figure 5, the minimum internal cross-sectional area A3 of the outlet connector 52 is at least equal to the minimum cross-sectional area A2 of the intermediate conduit 62. For example, "internal cross-sectional area" refers to the cross-sectional area of the open portion through which the purge gas flows (for example, the cross-sectional area along a plane perpendicular to the flow direction of the purge gas).
[0038] As shown in Figure 4, the intermediate conduit 62 extends from the receiver 42 at an acute angle α with respect to the axis 46 of the inlet opening 44 of the receiver 42. The axis 42 of the receiver 42 is offset from the axis 54 of the outlet connector 52. At least a portion of the outlet connector 52 does not overlap perpendicularly with the receiver 42 (for example, the right outer wall 53 of the outlet connector 52 does not overlap perpendicularly with the receiver 42). For example, perpendicular may be a direction perpendicular to the bottom of the purge module 22 (for example, perpendicular to the bottom 12 of the shell 4). In one embodiment, the acute angle α into which the intermediate conduit 62 extends from the receiver 42 is 15 to 35 degrees with respect to the axis 46 of the inlet opening 44 of the receiver 42. In one embodiment, the acute angle α into which the intermediate conduit 62 extends from the receiver 42 is 20 to 30 degrees. For example, the axis of the opening is the axis extending through the opening (for example, the vertical axis in the direction of flow of purge gas into the opening).
[0039] The intermediate conduit 62 has a length L that separates the outlet connector 52 from the receiver 42. The intermediate conduit 62 has a length L greater than the inner width W of the conduit 62. The inner width W is the width measured between the inner sides of the conduit (for example, the minimum inner diameter of a circular tubular inner conduit). For example, the inner width W extends in a direction perpendicular to the length L of the intermediate conduit. In one embodiment, the inner width W is the minimum inner width of the intermediate conduit 62. In one embodiment, the inner width W is the maximum inner width of the intermediate conduit 62.
[0040] The pressure drop across the intermediate conduit is less than 20 kPa at a purge gas flow rate of 100 standard liters / minute (SLPM). For example, the pressure drop can be measured as the drop from the purge gas pressure in receiver 42 to the purge gas pressure in outlet connector 52. The purge gas used to measure the pressure drop may be air.
[0041] Figure 5 is a perspective view of a cross-section of the transition section 40 of Figure 4. The receiver 42 of the transition section 40 includes a first intermediate inlet 48, a second intermediate outlet 49, side walls 50, and an end wall 54. The first intermediate inlet 48 forms the inlet opening 44 of the receiver 42. Purge gas enters the receiver 42 through the (first) intermediate inlet 48 and exits the receiver 42 through the (second) intermediate outlet 49. The inlet opening 44 and the (first) intermediate inlet 48 are formed by one or more side walls 50. For example, the left and right side walls 50 of the receiver may be formed by continuous walls having a tubular shape (e.g., circular walls). The end wall 51 and the inlet opening 44 are located at opposing ends of the receiver 42 (e.g., the top and bottom of the receiver 42). One of the side walls 50 (e.g., the left side wall 50 in Figure 5) extends from the end wall 51. The end wall 51 may connect one or more of the side walls 50 to the intermediate conduit 62 (for example, the left side wall 50 in Figure 5). The second intermediate outlet 49 is formed by one end of the side wall 50 (for example, the right side wall 50 in Figure 5) and the end of the end wall 51. The second intermediate outlet 49 faces at an angle (for example, not facing vertically downward, not facing parallel to axis 54, and not facing parallel to axis 46). The second intermediate outlet 49 may extend between the end of one of the side walls 50 (for example, the right side wall in Figure 4) and the end of the end wall 51 at an angle with respect to the side wall 50 and at an angle with respect to the end wall 51 (for example, not parallel to the end wall 51 and not parallel to the right side wall in Figure 4).
[0042] The outlet connector 52 includes a second intermediate inlet 56. Purge gas flows from the intermediate conduit 62 through the (second) intermediate inlet 56 into the outlet connector 52. The intermediate conduit 62 extends from the (second) intermediate outlet 49 of the receiver 42 to the (second) intermediate inlet 56 of the outlet connector 52. The intermediate conduit 62 fluidly connects the outlet 49 of the receiver 42 to the inlet 56 of the outlet connector 52. The (second) intermediate outlet 49 of the receiver 42 is spaced a distance L of the length of the outlet connector 52 from the (second) intermediate inlet 56 of the outlet connector 52. The intermediate inlet 56 of the outlet connector 52 extends at a certain angle (for example, not facing vertically downward, not facing parallel to axis 54, and not facing parallel to axis 46). For example, the discharge section that enters the outlet connector 52 from the intermediate conduit 62 through the intermediate inlet 56 overlaps at least partially with the side wall 53 of the outlet connector 52.
[0043] The acute angle α may be the angle of the inner side surface 64 of the intermediate conduit 62 extending from the end wall 51 of the receiver. In one embodiment, the angle β between the end wall 51 of the receiver 42 and the inner side surface 64 of the intermediate conduit 62 is 105 to 125 degrees or about 105 to 125 degrees. In one embodiment, the angle β between the end wall 51 of the receiver 42 and the inner side surface 64 of the intermediate conduit 62 is 110 to 120 degrees or about 110 to 120 degrees. In one embodiment, the angle of the inner side surface 64 of the intermediate conduit 62 with respect to the bottom of the purge module 22 is 105 to 125 degrees or about 105 to 125 degrees. In one embodiment, the angle of the inner side surface 64 of the intermediate conduit 62 with respect to the bottom of the purge module 22 is 110 to 120 degrees or about 110 to 120 degrees.
[0044] In one embodiment, the ratio of the area A1 of the inlet opening 44 of the receiver 42 to the minimum internal cross-sectional area A2 of the intermediate conduit 62 (area A1:minimum internal cross-sectional area A2) is 23:1 or greater. In another embodiment, the ratio of the area A1 of the inlet opening 44 of the receiver 42 to the minimum internal cross-sectional area A2 of the intermediate conduit 62 (area A1:minimum internal cross-sectional area A2) is 19.5:1 or greater.
[0045] In one embodiment, the ratio of the minimum internal cross-sectional area A3 of the inlet connector 52 to the minimum cross-sectional area A2 of the intermediate conduit 62 (minimum internal cross-sectional area A3:minimum cross-sectional area A2) is 2.5:1 or less. In one embodiment, the ratio of the minimum internal cross-sectional area A3 of the inlet connector 52 to the minimum cross-sectional area A2 of the intermediate conduit 62 (minimum internal cross-sectional area A3:minimum cross-sectional area A2) is 2.5:1 or less. In one embodiment, the ratio of the minimum internal cross-sectional area A3 of the inlet connector 52 to the minimum cross-sectional area A2 of the intermediate conduit 62 (minimum internal cross-sectional area A3:minimum cross-sectional area A2) is 1.5:1 or less. For example, in the illustrated embodiment, the ratio of the minimum internal cross-sectional area A3 of the inlet connector 52 to the minimum cross-sectional area A2 of the intermediate conduit 62 is 1.5:1.
[0046] Figure 7A is a perspective view of a purge port assembly according to one embodiment. The purge port assembly 68 includes a transition bracket 70. The transition bracket 70 includes a receiver 72, an intermediate conduit 74, and an exit connector 76. The receiver 72 and the intermediate conduit 74 are configured to reduce the profile of the portion of the intermediate conduit 74 that extends above the upper surface 78 of the receiver 72. The intermediate conduit 74 may be configured such that the portion of the intermediate conduit 74 that protrudes from the upper surface 78 has a width of less than half the diameter of the body of the receiver 72 outside the contact surface with the exit connector 76. The intermediate conduit 74 may be positioned such that the entire portion of the intermediate conduit 74 that protrudes above the upper surface 78 is located on one side of the centerline C of the receiver 72. The reduced profile of the intermediate conduit 74 can reduce or eliminate interference between the transition bracket 70 and wafers or other substrates housed in a container including the purge port assembly 68, and / or interference with automation used to handle such wafers or other substrates. The intermediate conduit 74 may be configured to extend such that the outlet connector 76 is completely offset from the receiver 72. In one such embodiment, when the transition bracket 70 is viewed in plan, the outlet connector 76 is completely spaced away from the receiver 72 and does not overlap with it. The outlet connector 76 may be a separate component, such as a cap, attached to the intermediate conduit 74 by any preferred connection. A non-limiting example of such a preferred connection is welding. In one embodiment, a standard cap for the transition bracket may be combined with the receiver 72 and intermediate conduit 74 of one embodiment. In one embodiment, the intermediate conduit 74 may include a portion configured to receive the outlet connector 76. For example, as shown in Figure 7A, a portion of the intermediate conduit 74 may be flared out to a size suitable for contact with the outlet connector 76. In another embodiment, the outlet connector 76 may be formed integrally with the receiver 72 and the intermediate conduit 74. The outlet connector 76 may include a mechanism to allow any preferred mounting of a diffuser (not shown) to the outlet connector 76, for example, a return 77 to allow mechanical mounting of the diffuser to the outlet connector 76.
[0047] Figure 7B is a cross-sectional view of the purge port assembly shown in Figure 7A. The intermediate conduit 74 is shaped to define the channel 80 and the outlet connector transition 82. The channel 80 may extend straight through the intermediate conduit 74. The channel 80 may be at an acute angle α with respect to the central axis A of the receiver 72. In one embodiment, the acute angle α is in the range of 15 to 35 degrees. In one embodiment, the channel 80 may be tubular in shape. In one embodiment, the channel 80 may have a circular cross-sectional shape. In one embodiment, the channel 80 may have a non-circular cross-sectional shape, such as an elliptical shape. In one embodiment, the channel 80 may have a consistent inner diameter D. The channel 80 may be configured to allow the purge from the receiver 72 to pass through the intermediate conduit 74 to the outlet connector 76 with an acceptable pressure difference, even if the width of the outer part of the intermediate conduit 74 narrows and the profile decreases. The channel 80 can also supply the outlet connector transition 82, which is also formed within the intermediate conduit 74. The outlet connector transition section 82 may be a space configured to receive flow from the channel 80 and transition to a size that allows the outlet connector 76 to form a contact surface with the intermediate conduit 74. In one embodiment, the intermediate conduit 74 has a cross-sectional area in the outlet connector 76 that corresponds to the cross-section of the connector portion of the return cap.
[0048] Figure 8A is a perspective view of a purge port assembly according to one embodiment. The purge port assembly 84 includes a transition bracket 86. The transition bracket 86 includes a receiver 88, an intermediate conduit 90, and an exit connector 92. The receiver 88 and the intermediate conduit 90 are configured to reduce the profile of the portion of the intermediate conduit 90 that extends above the upper surface 94 of the receiver 88. The intermediate conduit 90 may be configured such that the portion of the intermediate conduit 90 that protrudes from the upper surface 94 has a width of less than half the diameter of the body of the receiver 88. The reduced profile of the intermediate conduit 90 can reduce or eliminate interference between the transition bracket 86 and wafers or other substrates housed in a container including the purge port assembly 84, and / or interference with automation used to handle such wafers or other substrates. The intermediate conduit 90 may be configured to extend such that the exit connector 92 is fully offset from the receiver 88. In one such embodiment, when the transition bracket 86 is viewed in plan, the outlet connector 92 is completely spaced away from the receiver 88 and does not overlap with the receiver 88. The outlet connector 92 may be a separate component, such as a cap, attached to the intermediate conduit 90 by any preferred connection. A non-limiting example of such a preferred connection is welding. In the embodiment shown in Figure 8A, the outlet connector may be a cap configured to accommodate the size of the intermediate conduit 90, for example, by having the same width. In one embodiment, the outlet connector 92 may be formed integrally with the intermediate conduit 90. The outlet connector 92 may include a mechanism that allows for any preferred attachment of a diffuser (not shown) to the outlet connector 92, for example, a return 93 for allowing mechanical attachment of the diffuser to the outlet connector 92.
[0049] Figure 8B is a cross-sectional view of the purge port assembly shown in Figure 8A. The intermediate conduit 90 is shaped to define a channel 96. The channel 96 may extend over the entire distance from the receiver 88 to the outlet connector 92. The channel 96 may curve as it extends from the receiver 88 to the outlet connector 92. In one embodiment, the channel 96 may be tubular in shape. In one embodiment, the channel 96 may have a circular cross-sectional shape. In one embodiment, the channel 96 may have a non-circular cross-sectional shape, such as an elliptical shape. In one embodiment, the channel 96 may have a consistent inner diameter D. In one embodiment, the diameter D of the channel 96 may increase as it moves from the receiver 88 towards the outlet connector 92. In one embodiment, the intermediate conduit 90 is joined to the outlet connector 92 at a weld 98. In another embodiment, the intermediate conduit 90 and the outlet connector 92 are integrally formed with respect to each other, and there is no weld 98. In embodiments including a welded joint 98, the end of the intermediate conduit 90 to which the outlet connector 92 is joined may be shaped to facilitate welding at the welded joint 98.
[0050] Pattern: Any of embodiments 1 to 14 may be combined with any of embodiments 15 to 20, 21 to 34, or 35 to 40. Any of embodiments 15 to 20 may be combined with any of embodiments 21 to 34, or 35 to 40. Any of embodiments 21 to 34 may be combined with any of embodiments 35 to 40.
[0051] Embodiment 1. A purge port assembly for a wafer container, comprising: a purge module configured to allow the inflow of purge gas; a transition portion disposed above an intermediate outlet of the purge module, wherein the transition portion includes a receiver having an inlet opening configured to receive purge gas discharged from the purge module; an outlet connector configured to attach to a diffuser; and an intermediate conduit connecting the receiver to the outlet connector, wherein the intermediate conduit extends from the receiver at an acute angle with respect to the axis of the inlet opening of the receiver, and the intermediate conduit has a length that separates the outlet connector from the receiver.
[0052] Embodiment 2. The minimum internal cross-sectional area of the intermediate conduit is at least 13 mm². 2 The purge port assembly according to embodiment 1.
[0053] Embodiment 3. The purge port assembly according to Embodiment 1 or 2, wherein the pressure drop across the intermediate passage is less than 20 kPa at a purge gas flow rate of 100 SLPM.
[0054] Embodiment 4. A purge port assembly according to any one of Embodiments 1 to 3, wherein the acute angle is between 15 and 35 degrees.
[0055] Embodiment 5. A purge port assembly according to any one of Embodiments 1 to 4, wherein the purge module includes a first intermediate outlet, the receiver includes a first intermediate inlet and a second intermediate outlet, the first intermediate outlet of the purge module is fluidly connected to the first intermediate inlet of the receiver, the first intermediate inlet forms an inlet opening of the receiver, the outlet connector includes a second intermediate inlet, and the intermediate conduit extends from the second intermediate outlet of the receiver to the second intermediate inlet of the outlet conduit.
[0056] Embodiment 6. A purge port assembly according to any one of Embodiments 1 to 5, wherein the receiver includes one or more side walls and an end wall, the end wall and the inlet opening being located at opposing ends of the receiver, and an intermediate conduit extending from one or more side walls of the receiver and one of the top walls of the receiver.
[0057] Embodiment 7. The purge port assembly according to Embodiment 6, wherein the angle between the end wall of the receiver and the inner side of the intermediate conduit is 105 to 125 degrees or about 105 to 125 degrees.
[0058] Embodiment 8. The purge port assembly according to any one of Embodiments 1 to 7, wherein the ratio of the area of the inlet opening of the receiver to the minimum cross-sectional area of the intermediate conduit is 23:1 or greater.
[0059] Embodiment 9. The purge port assembly according to any one of Embodiments 1 to 8, wherein the intermediate conduit has a tubular shape extending from the receiver to the outlet connector.
[0060] Embodiment 10. The purge port assembly according to any one of Embodiments 1 to 9, further comprising a filter disposed between the purge module and the receiver.
[0061] Embodiment 11. The purge port assembly according to any one of embodiments 1 to 10, further comprising a diffuser, the diffuser having a column shape with an end mated to an exit connector of a transition portion.
[0062] Embodiment 12. The purge port assembly according to any one of Embodiments 1 to 11, wherein the transition portion is formed as a single, integrated part.
[0063] Embodiment 13. A purge port assembly according to any one of embodiments 1 to 12, wherein the purge module and transition portion are configured to be disposed within an opening in the shell of a wafer container, the opening extends through the bottom surface of the shell of the wafer container, and the purge port assembly is configured to block the opening in the shell.
[0064] Embodiment 14. The purge port assembly according to Embodiment 13, wherein the transition portion is configured to extend from the opening into the internal space of the wafer container.
[0065] Embodiment 15. A wafer container comprising a shell including an internal space, a purge port assembly extending into the internal space through an opening in the shell, wherein the purge port assembly includes a purge module disposed within the opening in the shell, the purge module including a check valve configured to allow purge gas, and a transition portion disposed above the purge module within the opening in the shell, the transition portion including a receiver having an inlet opening configured to receive purge gas discharged from the purge module, an outlet connector configured to attach to a diffuser, and an intermediate conduit connecting the receiver to the outlet connector, wherein the intermediate conduit extends at an acute angle with respect to the axis of the inlet opening of the receiver, and the intermediate conduit has a length that separates the outlet connector from the receiver.
[0066] Embodiment 16. The wafer container according to Embodiment 15, wherein the transition portion extends from an opening in the shell to the internal space of the shell.
[0067] Embodiment 17. The wafer container according to Embodiment 16, wherein the receiver of the transition portion is disposed within an opening in the shell, the exit connector of the transition portion is disposed within the internal space of the shell, and the intermediate conduit extends from the opening in the shell to the internal space of the shell.
[0068] Embodiment 18. The wafer container according to any one of Embodiments 15 to 17, wherein the intermediate conduit is configured to extend at an angle of 15 to 35 degrees with respect to the axis of the opening in the shell.
[0069] Embodiment 19. The wafer container according to any one of Embodiments 15 to 18, wherein the wafer container is a front-opening integrated pod, and the shell includes a front opening and a door configured to be disposed within the front opening.
[0070] Embodiment 20. The wafer container according to any one of embodiments 15 to 19, further comprising a diffuser, the diffuser having a column shape and including an end that is mated to an outlet connector.
[0071] Embodiment 21. A purge module configured to allow the inflow of purge gas, A transition section located above the intermediate exit of the purge module, The transition section is equipped with A receiver having an inlet opening configured to receive purge gas discharged from a purge module, An outlet connector configured to attach to the diffuser, An intermediate conduit that connects the receiver to the outlet connector, Includes, A purge port assembly for a wafer container, wherein the intermediate conduit has a tubular shape extending from the receiver to the outlet connector, and the intermediate conduit is of a length that separates the outlet connector from the receiver.
[0072] Embodiment 22. The minimum internal cross-sectional area of the intermediate conduit is at least 13 mm². 2 The purge port assembly according to embodiment 21.
[0073] Embodiment 23. The purge port assembly according to Embodiment 21 or 22, wherein the pressure drop across the intermediate passage is less than 20 kPa at a purge gas flow rate of 100 SLPM.
[0074] Embodiment 24. The purge port assembly according to any one of Embodiments 21 to 23, wherein the intermediate conduit extends from the receiver at an acute angle with respect to the axis of the receiver's inlet opening.
[0075] Embodiment 25. The purge port assembly according to Embodiment 24, wherein the acute angle is 15 to 35 degrees.
[0076] Embodiment 26. A purge port assembly according to any one of Embodiments 21 to 23, wherein the intermediate conduit includes a curved portion.
[0077] Embodiment 27. The purge port assembly according to Embodiment 26, wherein the curved portion is continuous along the length of the intermediate conduit.
[0078] Embodiment 28. A purge port assembly according to any one of Embodiments 21 to 27, wherein the intermediate conduit extends such that the outlet connector is completely separated from the receiver when the purge port assembly is viewed in a plan view.
[0079] Embodiment 29. A purge port assembly according to any one of Embodiments 21 to 28, wherein a portion of the intermediate conduit protruding from the upper surface of the receiver has a width of less than half the diameter of the receiver body.
[0080] Embodiment 30. A purge port assembly according to any one of Embodiments 21 to 29, wherein the ratio of the area of the inlet opening of the receiver to the minimum cross-sectional area of the intermediate conduit is 23:1 or greater.
[0081] Embodiment 31: A purge port assembly according to any one of embodiments 21 to 30, wherein a portion of an intermediate conduit protruding above the upper surface of the receiver is entirely located on one side of the centerline of the receiver.
[0082] Embodiment 32. A purge port assembly according to any one of Embodiments 21 to 31, wherein the transition portion is integrally formed with the exit connector.
[0083] Embodiment 33. A purge port assembly according to any one of embodiments 21 to 32, wherein the purge module and transition portion are configured to be disposed within an opening in the shell of a wafer container, the opening extends through the bottom surface of the shell of the wafer container, and the purge port assembly is configured to block the opening in the shell.
[0084] Embodiment 34. The purge port assembly according to Embodiment 33, wherein the transition portion is configured to extend from the opening into the internal space of the wafer container.
[0085] Embodiment 35. Shell including internal space, A purge port assembly extending into the interior space through an opening in the shell. The purge port assembly is equipped with, A purge module disposed within an opening in a shell, the purge module including a check valve configured to allow purge gas, A transition section positioned above the purge module within the opening in the shell, The transition section includes, A receiver having an inlet opening configured to receive purge gas discharged from a purge module, An outlet connector configured to attach to the diffuser, An intermediate conduit that connects the receiver to the outlet connector, A wafer container comprising an intermediate conduit having a tubular shape extending from the receiver to the outlet connector, and the intermediate conduit having a length that separates the outlet connector from the receiver.
[0086] Embodiment 36. The transition portion extends from an opening in the shell to the internal space of the shell, The transition receiver is located within an opening in the shell. The exit connector for the transition section is located within the internal space of the shell. A wafer container according to embodiment 35, wherein the intermediate conduit extends from an opening in the shell into the internal space of the shell.
[0087] Embodiment 37. The wafer container according to Embodiment 35 or 36, wherein the intermediate conduit extends at an acute angle with respect to the axis of the inlet opening of the receiver.
[0088] Embodiment 38. The wafer container according to Embodiments 35 to 36, wherein the intermediate conduit includes a curved portion.
[0089] Embodiment 39. A wafer container according to any one of embodiments 35 to 38, wherein the wafer container is a front-opening integrated pod, and the shell includes a front opening and a door configured to be disposed within the front opening.
[0090] Embodiment 40. A wafer container according to any one of embodiments 35 to 39, further comprising a diffuser, the diffuser having a column shape and including an end that is mated to an outlet connector.
[0091] The examples disclosed in this application should be considered in all respects as illustrative and not limiting. In one embodiment, “connect” and “connecting” as used above may mean “directly connect.” The scope of the present invention is indicated by the appended claims rather than the foregoing description, and all modifications that fall within the meaning and scope of equivalence to the claims are intended to be encompassed within the claims.
Claims
1. A purge port assembly for a wafer container, A purge module configured to allow the inflow of purge gas, A transition section is provided above the intermediate exit of the purge module, The transition portion is provided, A receiver having an inlet opening configured to receive the purge gas discharged from the purge module, An outlet connector configured to attach to the diffuser, An intermediate conduit for connecting the receiver to the outlet connector, Includes, The intermediate conduit has a tubular shape extending from the receiver to the outlet connector, has a length that separates the outlet connector from the receiver, and extends from the receiver at an acute angle with respect to the axis of the inlet opening of the receiver. Purge port assembly.
2. The purge port assembly according to claim 1, wherein the purge module and the transition portion are configured to be disposed within an opening in the shell of the wafer container, the opening extends through the bottom surface of the shell of the wafer container, and the purge port assembly is configured to block the opening in the shell.
3. A shell including its internal space, A purge port assembly extending through an opening in the shell into the internal space, A wafer container comprising, the purge port assembly, A purge module disposed within the opening in the shell, the purge module including a check valve configured to allow purge gas, A transition portion disposed above the purge module in the opening within the shell, The transition portion includes, A receiver having an inlet opening configured to receive the purge gas discharged from the purge module, An outlet connector configured to attach to the diffuser, An intermediate conduit for connecting the receiver to the outlet connector, Includes, The intermediate conduit has a tubular shape extending from the receiver to the outlet connector, has a length that separates the outlet connector from the receiver, and extends from the receiver at an acute angle with respect to the axis of the inlet opening of the receiver. Wafer container.
4. The transition portion extends from the opening in the shell to the internal space of the shell, The receiver of the transition portion is disposed within the opening in the shell. The exit connector of the transition portion is located within the internal space of the shell. The wafer container according to claim 3, wherein the intermediate conduit extends from the opening in the shell to the internal space of the shell.
5. The wafer container according to claim 3, further comprising a diffuser, the diffuser having a column shape and including an end that is mated and connected to the outlet connector.