Composition for pattern formation
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- NISSAN CHEM CORP
- Filing Date
- 2022-04-21
- Publication Date
- 2026-06-09
AI Technical Summary
【0009】 本発明の組成物は、マスキングして露光·硬化させた後、これをアルカリ現像した後、焼成することで、高屈折率で透明性に優れた微細パターンを与える。 本発明の組成物から作製されたパターンは、トリアジン環含有重合体による、高耐熱性、高屈折率、低体積収縮という特性を発揮し得るため、液晶ディスプレイ、有機エレクトロルミネッセンス(EL)ディスプレイ、タッチパネル、光半導体素子、固体撮像素子、有機薄膜太陽電池、色素増感太陽電池、有機薄膜トランジスタ、レンズ、プリズム、カメラ、双眼鏡、顕微鏡、半導体露光装置等を作製する際の一部材など、電子デバイスや光学材料の分野に好適に利用できる。
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Abstract
Claims
1. The material comprises a triazine ring-containing polymer having a repeating unit structure represented by the following formula (1), and having at least one triazine ring end, the triazine ring end of which is sealed with a hydroxyl-substituted arylamino group; a crosslinking agent; inorganic fine particles having alkali-reactive groups on their surface; and an organic solvent. The alkali-reactive group is an acid anhydride group or an epoxy group. The primary particle size of the inorganic fine particles is 20 nm or less. A pattern-forming composition characterized by the following features. 【Chemistry 1】 (In formula (1), R and R' independently represent a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, or an aralkyl group, and Q represents at least one selected from the group represented by formulas (2) to (13) and formulas (102) to (115). * represents a bond.) 【Chemistry 2】 [In formulas (2) to (13), R1 to R92 independently represent a hydrogen atom, a halogen atom, a carboxyl group, a sulfo group, a C1-C10 alkyl group, a C1-C10 halogenated alkyl group, or a C1-C10 alkoxy group.] R93 and R94 represent a hydrogen atom or an alkyl group having 1 to 10 carbon atoms. W1 and W2 independently represent a single bond, CR95 R96 (R95 and R96 independently represent a hydrogen atom, a C1-C10 alkyl group (which may together form a ring), or a C1-C10 halogenated alkyl group), C=O, O, S, SO, SO2, or NR97 (R97 represents a hydrogen atom, a C1-C10 alkyl group, or a phenyl group). X1 and X2 are independently of each other, a single bond, an alkylene group having 1 to 10 carbon atoms, or formula (14) 【Transformation 3】 (In formula (14), R 98 to R 101 represent a hydrogen atom, a halogen atom, a carboxyl group, a sulfo group, a C1-C10 alkyl group, a C1-C10 halogenated alkyl group, or a C1-C10 alkoxy group.) Y1 and Y2 independently represent single bonds or alkylene groups having 1 to 10 carbon atoms. * indicates a bonding operation. 【Chemistry 4】 (In formulas (102) to (115), R1 and R2 independently represent alkylene groups having 1 to 5 carbon atoms, which may have a branched structure. * represents a bond.)
2. The pattern-forming composition according to claim 1, wherein the hydroxyl-substituted arylamino group is represented by formula (15). 【Transformation 5】 (In equation (15), * represents a coupling.)
3. The pattern-forming composition according to claim 2, wherein the hydroxyl-substituted arylamino group is represented by formula (16). 【Transformation 6】 (In equation (16), * represents a coupling.)
4. The pattern-forming composition according to claim 1, wherein Q in formula (1) is represented by formula (17). 【Transformation 7】 (In equation (17), * represents a coupling.)
5. The pattern-forming composition according to claim 1, wherein the crosslinking agent is a polyfunctional (meth)acrylic compound.
6. The pattern-forming composition according to claim 1, wherein the inorganic fine particles include a metal oxide, a metal sulfide, or a metal nitride.
7. The pattern-forming composition according to claim 1, for use in the light extraction layer of an organic electroluminescent element.
8. A cured product made from a pattern-forming composition according to any one of claims 1 to 7.
9. An electronic device comprising a substrate and a cured product according to claim 8 formed on the substrate.
10. The electronic device according to claim 9, which is an organic electroluminescent device.
11. An optical member comprising a base material and a cured product according to claim 8 formed on the base material.
12. A method for producing a pattern, characterized by applying a pattern-forming composition according to any one of claims 1 to 7 to a substrate, evaporating an organic solvent, irradiating with light through a mask on which a pattern has been formed, developing the material, and then firing it.