Plasma generator and flow path monitoring method

JP7875079B2Active Publication Date: 2026-06-17FUJI CORP

Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
FUJI CORP
Filing Date
2022-09-07
Publication Date
2026-06-17

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Patent Text Reader

Abstract

To suitably perform plasma processing in a plasma generation device which can perform plasma processing with each of a plurality of plasma heads.SOLUTION: A plasma generation device comprises: a main channel which is connected to a supply device that supplies process gas; a plurality of branch channels which branches from the main channel; a plasma head which is supplied with the process gas from each of the plurality of branch channels; a change valve which is arranged in each of the plurality of branch channels and changes a flow rate of the process gas flowing in each branch channel; and pressure detection means which is arranged in each of the plurality of branch channels and detects a pressure of the process gas flowing in each branch channel.SELECTED DRAWING: Figure 8
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Claims

1. A main flow path connected to a supply device that supplies the processing gas, Multiple branch channels branching from the main channel, A plasma head connected to each of the aforementioned multiple branched channels, from which processing gas is supplied from the connected branched channels, A change valve is provided in each of the aforementioned multiple branch passages to change the flow rate of the processing gas flowing through each branch passage, A pressure detection means is provided in each of the aforementioned multiple branched channels for detecting the pressure of the processing gas flowing through each branched channel, Equipped with, A plasma generator in which, when the pressure of the processing gas flowing through at least one of the plurality of branched channels falls below a threshold, the flow of processing gas to the at least one branched channel is blocked by the change valve, thereby stopping the plasma processing at the plasma head connected to the at least one branched channel. However, the flow of processing gas to the branched channels other than the at least one branched channel is maintained, so that the plasma processing at the plasma heads connected to the branched channels other than the at least one branched channel continues.

2. The aforementioned plasma generator Each of the aforementioned plurality of branched channels is provided with a throttle that restricts the flow rate of the processed gas flowing through each branched channel to a predetermined amount, The plasma generator according to claim 1, wherein the pressure detection means is disposed upstream of the throttling.

3. The plasma generator according to claim 1, wherein the pressure detection means is disposed downstream of the change valve.

4. The aforementioned plasma generator A plasma generator according to any one of claims 1 to 3, comprising a regulator disposed in each of the plurality of branched flow paths.

5. A plasma generator comprising a main flow path connected to a supply device that supplies processing gas, a plurality of branch flow paths branching from the main flow path, a plasma head connected to each of the plurality of branch flow paths and supplied with processing gas from the connected branch flow paths, and a change valve that changes the flow rate of the processing gas flowing through each of the plurality of branch flow paths, In a flow path monitoring method that detects the pressure of the processing gas flowing through each of the plurality of branched flow paths and monitors each of the plurality of branched flow paths, A flow path monitoring method in which, when the pressure of the processing gas flowing through at least one of the plurality of branched flow paths falls below a threshold, the flow of processing gas to the at least one branched flow path is blocked by the change valve, thereby stopping plasma processing at the plasma head connected to the at least one branched flow path, but the flow of processing gas to the branched flow paths other than the at least one branched flow path is maintained, thereby continuing plasma processing at the plasma heads connected to the branched flow paths other than the at least one branched flow path.