Optical waveguide array and preparation method therefor, flat lens with negative refractive index, and aerial imaging device

Abstract

An optical waveguide array (11) and a preparation method therefor, a flat lens (1) with a negative refractive index, and an aerial imaging device (100). The preparation method for the optical waveguide array (11) comprises: a resin layer preparation step (S1) of preparing a resin layer (111) on a substrate; a curing step (S2) of curing the resin layer (111); a reflective layer preparation step (S3) of preparing on the cured resin layer (111) a reflective layer (112) that covers the resin layer (111); repeating the resin layer preparation step (S1), the curing step (S2) and the reflective layer preparation step (S3) until an optical waveguide block formed by alternately self-assembling a preset number of resin layers (111) and reflective layers (112) is obtained (S4); and performing cold machining on the optical waveguide block to obtain the optical waveguide array (11) (S5).

Description

Optical waveguide array and preparation method thereof, negative refraction flat lens and aerial imaging device

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0002] This application claims priority to the Chinese patent application filed with the State Intellectual Property Office of China on March 29, 2024, with application number 202410382016.7 and entitled “Optical waveguide array and its preparation method, negative refractive flat lens and aerial imaging device,” the entire contents of which are incorporated by reference into this application. Technical Field

[0003] The present disclosure relates to the field of optical manufacturing technology, and in particular to a method for preparing an optical waveguide array, an optical waveguide array, a negative refractive flat lens, and an aerial imaging device. Background Art

[0004] The negative refractive flat lens is the core optical component of aerial imaging technology. Its unique internal waveguide array structure refocuses light from the image source mid-air, achieving a premium aerial display experience. This unique waveguide array structure is currently manufactured by laminating reflective flat glass with adhesive, then forming the waveguide array through a cold working process.

[0005] However, this manufacturing process has some drawbacks. The lamination and bonding of flat glass sheets involves cumbersome processes such as support body formation, side sealing, vacuum potting, and adhesive material selection. Among other things, inconsistent support body molding heights can lead to uneven adhesive layer thickness and tilted optical waveguide arrays. Poor airtightness during side sealing and vacuum potting can cause linear bubbles to form within the optical waveguides. Mismatched adhesive material selection can lead to residual stress between the flat glass and the adhesive layer, causing problems such as warping of the flat glass. Therefore, problems in any of these steps will result in a defective final product, reducing production efficiency.

[0006] In addition, the flat glass layer is made of glass material, which is fragile, dense and expensive, limiting the widespread application of optical waveguide arrays.

[0007] Public content

[0008] The present disclosure aims to address at least one of the technical problems existing in the prior art. To this end, one objective of the present disclosure is to provide a method for fabricating an optical waveguide array. This method simplifies the fabrication process of the optical waveguide array, eliminating the cumbersome process steps in the prior art, and improving production quality and efficiency. Furthermore, the use of a resin material imparts advantages such as high strength, low density, and low cost to the optical waveguide array, thereby increasing its wide application and economic viability.

[0009] The second objective of the present disclosure is to provide an optical waveguide array.

[0010] The third object of the present disclosure is to provide a negative refractive flat lens.

[0011] A fourth objective of the present disclosure is to provide an aerial imaging device.

[0012] In order to achieve the above-mentioned purpose, the preparation method of the optical waveguide array of the first aspect embodiment of the present disclosure includes: a resin layer preparation step of preparing a resin layer on a substrate; a curing step of curing the resin layer; a reflective layer preparation step of preparing a reflective layer covering the resin layer on the cured resin layer; repeating the resin layer preparation step, the curing step and the reflective layer preparation step until an optical waveguide block is obtained in which a preset number of resin layers and the reflective layers are alternately self-assembled; and cold working the optical waveguide block to obtain the optical waveguide array.

[0013] According to the preparation method of the optical waveguide array of the embodiment of the present disclosure, a resin material is used to prepare a resin layer on a substrate. The resin material has good self-adhesion and plasticity, and can form a flat and solid surface structure after curing. The reflective layer can be tightly covered on the resin layer to achieve layer-by-layer stacking. Therefore, the resin layer can provide sufficient support and stability after preparation and curing, and no additional support body is required. At the same time, the selection of resin material also avoids the complexity of selecting adhesive materials, and there is no need to select and proportion adhesive materials. By repeating the steps of resin layer preparation, curing and reflective layer preparation, the resin layer and the reflective layer can be alternately self-assembled. This self-assembly technology can enable the optical waveguide block to be formed layer by layer without the need for tedious steps such as side sealing and vacuum glue pouring, thereby greatly simplifying the preparation process of the optical waveguide array and improving production quality and efficiency. In addition, the use of resin material makes the optical waveguide array have the advantages of high strength, low density and low cost, thereby improving its wide application and economy.

[0014] In some embodiments, the resin layer preparation step of preparing a resin layer on a substrate includes: dropping a preset dose of photosensitive resin precursor onto the substrate adsorbed by the suction cup of a coating machine; and spin-coating the photosensitive resin precursor into a photosensitive resin layer by the coating machine according to preset spin coating parameters.

[0015] In some embodiments, the photosensitive resin precursor includes one or more of unsaturated polyester, acrylate, epoxy resin, silicone resin, epoxy acrylate, polyurethane acrylate, polyester acrylate, and polyether acrylate.

[0016] In some embodiments, the step of curing the resin layer includes: irradiating the resin layer with a curing light source to cure the resin layer.

[0017] In some embodiments, the step of preparing a reflective layer covering the resin layer on the solidified resin layer comprises: depositing a reflective layer material onto the resin layer by a deposition film forming device.

[0018] In some embodiments, depositing the reflective layer material onto the resin layer by a deposition film forming device includes: depositing the reflective layer material onto the resin layer by a magnetron sputtering device or a nano-sputtering device.

[0019] In some embodiments, the reflective layer material includes a combination of metal and an all-electrolyte reflective material.

[0020] In some embodiments, the reflective layer material includes a combination of metal and one or more of silicon monoxide, magnesium fluoride, silicon dioxide, and aluminum oxide, wherein the metal includes one of aluminum, silver, copper, gold, chromium, and platinum.

[0021] In some embodiments, cold working the optical waveguide block to obtain the optical waveguide array comprises: cutting, grinding, and polishing the optical waveguide block to obtain the optical waveguide array.

[0022] In order to achieve the above-mentioned purpose, the optical waveguide array of the second embodiment of the present disclosure is prepared by the optical waveguide array preparation method described in the above embodiment.

[0023] According to the optical waveguide array of the embodiment of the present disclosure, by adopting the optical waveguide array preparation method described in the above embodiment to prepare the optical waveguide array, the preparation process of the optical waveguide array can be simplified, the cumbersome process steps in the prior art are eliminated, and the production quality and efficiency are improved. In addition, the use of resin material makes the optical waveguide array have the advantages of high strength, low density and low cost, thereby increasing its wide application and cost-effectiveness.

[0024] In order to achieve the above-mentioned objectives, the optical waveguide array according to the third embodiment of the present disclosure includes multiple layers of resin layers and reflective layers that are alternately arranged.

[0025] According to the optical waveguide array of the embodiment of the present disclosure, resin layers and reflective layers are arranged alternately in sequence to form a multi-layer structure. Each resin layer undergoes preparation and curing steps to ensure its flatness and strength, while the reflective layer tightly covers the surface of each resin layer, realizing a layered stacked structure. Through this combination of multiple alternating resin layers and reflective layers, the preparation of the optical waveguide array becomes simpler and more efficient, eliminating the need for complex process steps such as support body formation, side sealing, and vacuum glue potting. In addition, the use of resin materials gives the optical waveguide array the advantages of high strength, low density, and low cost, thereby improving its wide application and economic efficiency.

[0026] In some embodiments, the material of the resin layer includes one or more combinations of unsaturated polyester, acrylate, epoxy resin, silicone resin, epoxy acrylate, polyurethane acrylate, polyester acrylate, and polyether acrylate.

[0027] In some embodiments, the reflective layer is a combination layer of metal and all-electrolyte reflective material.

[0028] In some embodiments, the all-electrolyte reflective material includes a combination of one or more of silicon monoxide, magnesium fluoride, silicon dioxide, and aluminum oxide, and the metal includes one of aluminum, silver, copper, gold, chromium, and platinum.

[0029] In order to achieve the above objectives, a negative refractive flat lens according to a fourth embodiment of the present disclosure comprises two optical waveguide arrays as described in the above embodiments and two transparent substrates, wherein the two optical waveguide arrays are located between the two transparent substrates.

[0030] According to the negative refractive index plate lens of the disclosed embodiment, by adopting the optical waveguide array described in the above embodiment, each optical waveguide array is composed of multiple layers of resin layers and reflective layers arranged alternately. The preparation process of this structural design is relatively simple, without the need for cumbersome process steps, thereby improving production quality and efficiency. In addition, the special structure of the optical waveguide array enables the negative refractive index plate lens to refocus light emitted by the image source in the air, achieving a high-end experience of the aerial display image. The light can maintain stability and efficiency when reflected and transmitted in the optical waveguide, reducing optical distortion and improving imaging quality. At the same time, the use of resin materials makes the optical waveguide array have the advantages of high strength, low density and low cost, thereby improving its wide application and economic efficiency.

[0031] In order to achieve the above-mentioned object, an aerial imaging device according to a fifth embodiment of the present disclosure includes the negative refractive flat plate lens according to claim 15 .

[0032] According to the aerial imaging device of the embodiment of the present disclosure, by adopting the negative refraction flat plate lens described in the above embodiment, each optical waveguide array in the negative refraction flat plate lens is composed of multiple layers of resin layers and reflective layers arranged alternately. This structural design enables the aerial imaging device to have excellent optical performance, and can re-converge the light emitted by the image source in the air, so as to achieve a high-end experience of the aerial display picture. As the core optical element of the aerial imaging device, the negative refraction flat plate lens can keep the light stable and efficient during reflection and transmission in the optical waveguide, reduce optical distortion, and improve imaging quality. In addition, the preparation process of the negative refraction flat plate lens is relatively simple, without the need for cumbersome process steps, thereby improving production quality and efficiency. At the same time, the special structure of the optical waveguide array and the use of resin materials enable the aerial imaging device to have the advantages of high strength, low density, and low cost, thereby improving its wide application and economy.

[0033] Additional aspects and advantages of the present disclosure will be given in part in the description that follows and, in part, will be obvious from the description that follows, or will be learned through practice of the present disclosure. BRIEF DESCRIPTION OF THE DRAWINGS

[0034] The above and / or additional aspects and advantages of the present disclosure will become apparent and readily understood from the description of the embodiments in conjunction with the following drawings, in which:

[0035] FIG1 is a schematic diagram of an optical waveguide array according to one embodiment of the present disclosure;

[0036] FIG2 is a flow chart of a method for preparing an optical waveguide array according to one embodiment of the present disclosure;

[0037] FIG3 is a schematic diagram of dripping a photosensitive resin precursor according to one embodiment of the present disclosure;

[0038] FIG4 is a schematic diagram of spin coating a photosensitive resin precursor according to one embodiment of the present disclosure;

[0039] FIG5 is a schematic diagram of a cured resin layer according to one embodiment of the present disclosure;

[0040] FIG6 is a schematic diagram of a magnetron sputtering device for preparing a reflective layer according to an embodiment of the present disclosure;

[0041] FIG7 is a schematic diagram of a nano-spraying device for preparing a reflective layer according to an embodiment of the present disclosure;

[0042] FIG8 is a schematic diagram of cold working an optical waveguide block according to one embodiment of the present disclosure;

[0043] FIG9 is a logic diagram of a method for manufacturing an optical waveguide array according to one embodiment of the present disclosure;

[0044] FIG10 is a schematic diagram of a negative refractive flat lens according to one embodiment of the present disclosure;

[0045] FIG11 is a block diagram of an aerial imaging device according to one embodiment of the present disclosure.

[0046] Reference numerals: aerial imaging device 100 ; negative refractive plate lens 1 ; optical waveguide array 11 ; transparent substrate 12 ; resin layer 111 ; reflective layer 112 . DETAILED DESCRIPTION

[0047] Embodiments of the present disclosure are described in detail below, and the embodiments described with reference to the accompanying drawings are exemplary.

[0048] In the prior art, the preparation method of the optical waveguide array is to stack flat glass with a reflective surface using an adhesive, and then form the optical waveguide array through a cold working process. This preparation method has some disadvantages, namely that the stacking and bonding of flat glass involves cumbersome processes such as support body formation, side sealing, vacuum glue pouring and adhesive material selection. These complicated preparation steps can easily lead to low product production quality and low production efficiency. In addition, the flat glass layer uses glass material, which is fragile, dense and expensive, limiting the widespread application of optical waveguide arrays. In response to these problems, the present disclosure proposes a preparation method for an optical waveguide array, which simplifies the preparation process of the optical waveguide array, eliminates the cumbersome process steps in the prior art, improves production quality and efficiency, and uses resin materials to make the optical waveguide array have the advantages of high strength, low density and low cost, thereby improving its wide application and economy.

[0049] To facilitate the description of the technical solution, the following first describes the optical waveguide array of the embodiment of the present disclosure. The optical waveguide array can be an optical element used in a negative refractive flat lens. The optical waveguide array is used to transmit light from one place to another and can control and focus the light. In this case, the optical waveguide array can be used as the core optical element of the aerial imaging technology to re-converge the light emitted by the image source in the air to achieve a high-end experience of the aerial display.

[0050] FIG1 is a schematic diagram of an optical waveguide array according to an embodiment of the present disclosure. As shown in FIG1 , the optical waveguide array 11 includes a plurality of resin layers 111 and reflective layers 112 that are alternately arranged.

[0051] In some embodiments, the resin layer 111 can be a layer made of a photosensitive resin material within the optical waveguide array 11. The resin layer 111 provides support and stability for the optical waveguide array 11. The resin material can exhibit good self-adhesion and plasticity, forming a solid and flat surface structure after curing. This structure not only maintains the shape of the optical waveguide array 11 but also effectively carries and transmits optical signals. The selection and design of the resin layer 111 directly impacts the transmission and focusing of light within the optical waveguide.

[0052] In some embodiments, the reflective layer 112 can be a reflective layer covering the resin layer 111. The primary function of the reflective layer 112 is to reflect and guide light into the next resin layer 111. When light reaches the reflective layer 112, due to the characteristics of the reflective layer 112, the light is reflected back into the optical waveguide rather than passing through it. This reflection helps the light propagate repeatedly within the optical waveguide, thereby achieving focusing and refocusing functions. Therefore, through this reflection, the optical signal can be continuously transmitted within the optical waveguide array without loss or attenuation, which helps maintain the stability and intensity of the optical signal and reduce optical distortion.

[0053] In some embodiments, the optical waveguide array 11 is composed of multiple layers of resin layers 111 and reflective layers 112 that are alternately arranged. This structural design enables light to be repeatedly transmitted and reflected in the optical waveguide array 11, thereby achieving the functions of focusing and re-converging light. The reflective properties of the reflective layer 112 ensure the stability and efficiency of light during transmission, while the formation of the resin layer 111 provides good structural support and stability. Through this alternating arrangement, each layer of the resin layer 111 and the reflective layer 112 are tightly combined with each other to form a solid optical waveguide block structure, enhancing its stability and durability. This complex optical structure enables light to remain stable and efficient when reflected and transmitted in the optical waveguide. This helps to reduce optical distortion, improve imaging quality, and enhance the overall performance of the optical waveguide array.

[0054] In some embodiments, the material of the resin layer 111 includes one or more combinations of unsaturated polyester, acrylate, epoxy resin, silicone resin, epoxy acrylate, polyurethane acrylate, polyester acrylate, and polyether acrylate.

[0055] In some embodiments, unsaturated polyester is a common resin material with good chemical resistance, mechanical strength, and thermal stability. It can be used to prepare the resin layer 111 to provide structural support and stability for the optical waveguide array 11.

[0056] In some embodiments, acrylate is a type of polymer with good transparency and weather resistance, and is suitable for use in the preparation of optical components. In the optical waveguide array 11, acrylate material can be used for the resin layer 111 to help improve light transmission efficiency and stability.

[0057] In some embodiments, epoxy resin is a material with excellent adhesion, electrical insulation, and chemical corrosion resistance. In the optical waveguide array 11 , epoxy resin can be used as the material of the resin layer 111 to provide good support and protection for the optical waveguide array 11 .

[0058] In some embodiments, silicone resin has excellent high temperature resistance and chemical stability and is suitable for use in the preparation of optical components. In the optical waveguide array 11, silicone resin can be used in the resin layer 111 to improve the heat resistance and stability of the optical waveguide.

[0059] In some embodiments, epoxy acrylate is a variant of epoxy resin with high heat resistance and chemical resistance. In the optical waveguide array 11, epoxy acrylate can be used to prepare the resin layer 111 to provide additional structural support and high temperature resistance.

[0060] In some embodiments, polyurethane acrylate is a high-performance resin material with excellent wear resistance and weather resistance. In the optical waveguide array 11 , polyurethane acrylate can be used as the material of the resin layer 111 to improve the durability and stability of the optical waveguide array 11 .

[0061] In some embodiments, polyester acrylate is a resin material with high transparency and good weather resistance. In the optical waveguide array 11, polyester acrylate can be used to prepare the resin layer 111, which helps to improve the light transmission efficiency and stability.

[0062] In some embodiments, polyether acrylate is a resin material with excellent heat resistance and chemical resistance. In the optical waveguide array 11 , polyether acrylate can be used as the material of the resin layer 111 to improve the heat resistance and stability of the optical waveguide array 11 .

[0063] In general, the resin layer 111 of the optical waveguide array 11 can be made of a combination of different materials to meet the needs of different application scenarios. These materials are selected based on their physical and chemical properties, as well as their advantages in specific applications. Through reasonable combination and design, the optical waveguide array 11 can achieve stability, durability, and excellent optical performance.

[0064] In some embodiments, the reflective layer 112 is a composite layer of metal and all-electrolyte reflective material. This composite layer is designed to fully utilize the respective properties of the metal and all-electrolyte reflective materials to achieve optimal reflection and stability, suitable for the functions of reflecting and guiding light in the optical waveguide array 11.

[0065] Metal materials have excellent reflective and conductive properties, effectively reflecting and conducting optical signals. The optical properties of metal enable it to efficiently reflect light, guiding it into the next layer, resin layer 111, within the optical waveguide array 11. Furthermore, metal materials are corrosion-resistant and stable, making them suitable for the long-term use of the optical waveguide array 11.

[0066] In some embodiments, the metal may include one of aluminum, silver, copper, gold, chromium and platinum. Among them, aluminum is a common metal reflective layer material with good electrical conductivity and optical properties. It has moderate reflectivity and relatively low price, and is suitable for general reflection requirements. Silver is an excellent reflective layer material with high reflectivity and electrical conductivity. It performs well in the visible light and near-infrared spectrum range and is suitable for high-demand optical components. Copper is a commonly used metal reflective layer material with good reflective and electrical conductivity, and is suitable for reflection requirements in some specific wavelength ranges. Gold is a high-quality reflective material with good reflectivity and chemical stability. As the reflective layer 112 in the optical waveguide array 11, it can effectively reflect and transmit optical signals. Chromium is a commonly used reflective layer material with moderate reflectivity and electrical conductivity, and is suitable for general optical applications. Platinum is a high-quality reflective material with high reflectivity and electrical conductivity, and is suitable for optical components requiring high reflectivity.

[0067] In some embodiments, the all-electrolyte reflective material exhibits high optical transparency and excellent reflective properties, efficiently reflecting light within a specific wavelength range. The addition of the all-electrolyte reflective material layer can enhance the reflective effect and, to a certain extent, reduce the thickness of the metal layer, thereby reducing the weight and cost of the reflective layer 112. Furthermore, the all-electrolyte reflective material exhibits high heat and corrosion resistance, making it suitable for use in the optical waveguide array 11 under various environmental conditions.

[0068] In some embodiments, the all-electrolyte reflective material may include a combination of one or more of silicon monoxide, magnesium fluoride, silicon dioxide and aluminum oxide. Among them, silicon monoxide is a common all-electrolyte reflective material with good optical properties and chemical stability. It has high transparency and hardness, is suitable for the preparation of optical components, and can effectively reflect light. Magnesium fluoride is a commonly used all-electrolyte reflective material with good optical transparency and excellent reflective properties. It can be used in combination with other materials to enhance the reflection effect of the optical waveguide array. Silicon dioxide is also a commonly used all-electrolyte reflective material with good optical properties and chemical stability. It can be used as part of the reflective layer 112 to enhance the reflection effect and corrosion resistance of the optical waveguide array. Aluminum oxide is a common all-electrolyte reflective material with good optical properties and chemical stability. It has high transparency and hardness, is suitable for the preparation of optical components, and can effectively reflect light.

[0069] Therefore, the reflective layer 112 adopts a combination of metal and all-electrolyte reflective material. This combination combines the advantages of metal materials and all-electrolyte reflective materials. It has good reflective and conductive properties, as well as high optical transparency and corrosion resistance. It can more effectively reflect and transmit optical signals, thereby improving the optical performance and stability of the optical waveguide array 11.

[0070] Based on the optical waveguide array 11 described in the above embodiment, a method for manufacturing the optical waveguide array 11 according to an embodiment of the present disclosure will be described below with reference to FIG. 2 .

[0071] FIG2 is a flow chart of a method for manufacturing an optical waveguide array according to an embodiment of the present disclosure. As shown in FIG2 , the method for manufacturing an optical waveguide array according to an embodiment of the present disclosure includes at least steps S1 to S5, which are specifically as follows:

[0072] S1, a resin layer preparation step of preparing a resin layer on a substrate.

[0073] In some embodiments, the substrate plays a crucial role in the fabrication of optical waveguide arrays, providing the mechanical support and structural stability required. As a carrier for the resin layer, the substrate determines the overall structure and shape of the optical waveguide array. The substrate's surface flatness directly impacts the quality and performance of the subsequent resin coating.

[0074] In some embodiments, the substrate can be a glass substrate, such as quartz glass or tempered glass. These glass substrates offer excellent optical transparency and low scattering properties, facilitating light transmission and focusing. Furthermore, glass substrates are chemically stable and are not easily corroded by environmental chemicals, helping to maintain the stable performance of the optical waveguide array.

[0075] In some embodiments, the purpose of preparing the resin layer is to provide the support and stability required for the optical waveguide array. As a basic component of the optical waveguide array, the resin layer can not only maintain the shape and structural stability of the optical waveguide array, but also carry and transmit optical signals. The preparation of the resin layer can eliminate the tedious steps involved in the formation of the support body and the selection of the adhesive in the traditional method. The traditional preparation method usually requires the use of a support body to support the structure of the optical waveguide array, and an adhesive is also required to fix the support body and the reflective layer. However, in the optical waveguide array preparation method of the presently disclosed embodiment, the resin material has good self-adhesion and plasticity, and the preparation process of the resin layer has provided sufficient support and stability, so no additional support body and adhesive are required.

[0076] S2 is a curing step for curing the resin layer.

[0077] In some embodiments, the primary purpose of curing the resin layer is to form a strong, stable layered structure on the substrate. During the curing process, cross-linking reactions occur between the resin molecules, forming a three-dimensional network. This gives the resin layer greater mechanical strength and hardness, providing the support and stability required for the optical waveguide array.

[0078] Furthermore, the physical reactions during the curing process also help to make the resin layer's surface smoother and more uniform. This is crucial for optimizing optical properties, such as increasing transparency and refractive index consistency, which facilitates the transmission and focusing of optical signals. As a result, the cured resin layer not only possesses excellent mechanical properties but also exceptional optical properties, enabling the efficient transmission and control of optical signals.

[0079] In practical applications, the cured resin layer ensures the stability and durability of the optical waveguide array under various environmental conditions while providing sufficient structural support. This design and preparation process simplifies the complex steps required in traditional methods, which require additional supports and adhesives, improving production efficiency and quality. Therefore, by curing the resin layer, the optical waveguide array can obtain a strong, stable structure and excellent optical performance, suitable for various optical applications such as high-definition display screens and aerial imaging equipment.

[0080] S3, a step of preparing a reflective layer on the solidified resin layer to cover the reflective layer.

[0081] In some embodiments, the reflective layer in the optical waveguide array reflects and guides light into the next resin layer. When light reaches the reflective layer, due to its properties, it is reflected back into the optical waveguide rather than passing through it. This reflection helps the light propagate repeatedly within the optical waveguide, thereby achieving light focusing and re-convergence. Consequently, this reflection allows the optical signal to be continuously transmitted within the optical waveguide array without loss or attenuation, helping to maintain optical signal stability and intensity, reduce optical distortion, and improve imaging quality.

[0082] In some embodiments, by preparing a reflective layer covering the resin layer on the solidified resin layer, the side sealing and vacuum potting steps in the traditional preparation method can be reduced or avoided. In the traditional preparation method, side sealing can refer to applying a layer of adhesive or sealant to the edge of the optical waveguide array and then fixing the support body to this layer of adhesive. This ensures the fixation and sealing between the support body and the reflective layer, prevents external impurities from entering the optical waveguide, and maintains the stable transmission of the optical signal. Vacuum potting can refer to placing the optical waveguide array in a vacuum chamber and then using a vacuum pump to pour glue into the gaps in the optical waveguide so that it fills the entire space. This can fill the gaps between the resin layer and the reflective layer, ensure the tight structure of the optical waveguide, and avoid the impact of the gaps on light transmission.

[0083] In the optical waveguide array preparation method of the embodiment of the present invention, the step of preparing a reflective layer by preparing a reflective layer covering the resin layer on the solidified resin layer can effectively replace the traditional side sealing and vacuum glue pouring steps. This is because during the preparation process, the resin layer has been solidified on the substrate to form a solid layered structure, and the preparation of the reflective layer can be carried out directly on the surface of the solidified resin layer, so that the reflective layer can be directly combined with the resin layer to form a solid integrated structure. This integrated structure can effectively prevent gaps and looseness between the resin layer and the reflective layer, and improve the stability and durability of the optical waveguide array. During the preparation of the reflective layer, the reflective material can be covered on the surface of the resin layer by chemical reaction or physical deposition. The formation of this covering layer can not only enhance the optical performance of the optical waveguide array, but also fill the microscopic defects and surface unevenness of the resin layer, without the need for side sealing and vacuum glue pouring.

[0084] Therefore, by preparing the reflective layer covering the resin layer on the solidified resin layer, the preparation process can be simplified, the process steps and material usage can be reduced, and the preparation efficiency and quality of the optical waveguide array can be improved.

[0085] S4, repeating the resin layer preparation step, the curing step, and the reflective layer preparation step until an optical waveguide block is obtained which is formed by alternating self-assembly of a preset number of resin layers and reflective layers.

[0086] Specifically, the repeated preparation of the resin layer can gradually stack multiple resin layers on the substrate for subsequent curing and preparation of the reflective layer. The repeated curing of the resin layer is to ensure that each resin layer has good mechanical strength and stability. The cured resin layer forms a solid structure that can serve as a support for the next resin layer. The repeated preparation of the reflective layer is to cover each cured resin layer and continuously form a new reflective layer. These reflective layers can play a role in reflecting and focusing light in the optical waveguide array. The resin layer and the reflective layer are stacked and cured in sequence to form a layered structure, and finally self-assembled into an optical waveguide block. The structure of the resin layer and the reflective layer in the optical waveguide block can enable light to be transmitted, reflected and focused therein, thereby realizing the control and regulation of the optical signal. The structure of the multiple alternating layers can improve the optical efficiency and stability of the optical waveguide array, reduce optical distortion, and improve imaging quality.

[0087] In some embodiments, the preset number of layers can be set based on specific optical needs and design requirements. Different application scenarios may require different numbers of optical waveguide array layers to achieve specific optical effects. The setting of the preset number of layers needs to take into account factors such as the transmission distance of the optical signal, the degree of light focusing, and spatial resolution. For example, an aerial imaging device with higher resolution and focusing performance may require more layers of resin and reflective layers.

[0088] S5, cold working the optical waveguide block to obtain an optical waveguide array.

[0089] In some embodiments, cold working may refer to the process of processing a material under low temperature conditions. In the preparation of an optical waveguide array, cold working may be performed by freezing or low temperature treatment, the main purpose of which is to effectively improve the surface quality and precision of the optical waveguide array, making the surface of the optical waveguide array smoother and more uniform, which helps to reduce light scattering and loss, and improve light transmission efficiency and focusing performance. This is because during the preparation process, some problems such as surface unevenness, inconsistent size or irregular shape may occur, which may affect the optical performance and transmission efficiency of the optical waveguide array. Through cold working, the surface of the optical waveguide block can be finely processed while maintaining the stability of its structure, thereby improving its surface flatness and shape accuracy.

[0090] Furthermore, cold working can prevent deformation of the optical waveguide substrate caused by high temperatures. High temperatures can soften or deform the optical waveguide substrate, potentially leading to structural instability and irregular shapes in the optical waveguide array. Cold working allows processing to be performed at low temperatures, avoiding the effects of high temperatures on the optical waveguide substrate and ensuring structural stability and precise shape of the optical waveguide array. Therefore, cold working not only improves surface quality and precision but also prevents deformation of the optical waveguide substrate caused by high temperatures.

[0091] According to the preparation method of the optical waveguide array of the embodiment of the present disclosure, a resin material is used to prepare a resin layer on a substrate. The resin material has good self-adhesion and plasticity, and can form a flat and solid surface structure after curing. The reflective layer can be tightly covered on the resin layer to achieve layer-by-layer stacking. Therefore, the resin layer can provide sufficient support and stability after preparation and curing, and no additional support body is required. At the same time, the selection of resin material also avoids the complexity of selecting adhesive materials, and there is no need to select and proportion adhesive materials. By repeating the steps of resin layer preparation, curing and reflective layer preparation, the resin layer and the reflective layer can be alternately self-assembled. This self-assembly technology can enable the optical waveguide block to be formed layer by layer without the need for tedious steps such as side sealing and vacuum glue pouring, thereby greatly simplifying the preparation process of the optical waveguide array and improving production quality and efficiency. In addition, the use of resin material makes the optical waveguide array have the advantages of high strength, low density and low cost, thereby improving its wide application and economy.

[0092] In some embodiments, the resin layer preparation step of preparing a resin layer on a substrate includes: dropping a preset dose of photosensitive resin precursor onto the substrate adsorbed by the suction cup of a coating machine, and spin-coating the photosensitive resin precursor into a photosensitive resin layer by running the coating machine according to preset spin coating parameters.

[0093] Specifically, as shown in Figures 3 and 4, when preparing the optical waveguide array, it is first necessary to prepare a photosensitive resin precursor. This precursor is a special resin material that is sensitive to ultraviolet light. The photosensitive resin precursor is easy to coat and process in a liquid state. In addition, it is also necessary to prepare a glass substrate of suitable size (depending on the volume of the spin coating chamber of the glue spreader), and center the substrate on the suction cup of the glue spreader. Specifically, it can be centered by aligning the intersection of the diagonals of the substrate with the center point of the suction cup, and then turn on the vacuum pump to turn on the negative pressure, and fix the substrate with the suction cup.

[0094] Furthermore, the photosensitive resin precursor is stored in a syringe in liquid form. The operator uses a syringe to drop a preset dose of photosensitive resin precursor onto the substrate adsorbed by the suction cup of the glue spreader, and the output can be controlled by the scale on the syringe. Among them, the glue spreader is a device used for processes such as thin film coating and glue coating, also known as a coater. In optical manufacturing, the glue spreader can be used to evenly coat liquid materials on a substrate or substrate for the preparation of optical elements, optical films and optical waveguides. In this step, the operator can run the glue spreader according to preset spin coating parameters. Spin coating parameters include parameters such as spin coating speed, spin coating acceleration, spin coating time and spin coating times. The setting of these parameters is specifically determined by the viscosity of the photosensitive resin precursor and the thickness and uniformity of the single resin layer.

[0095] Furthermore, the photosensitive resin precursor is evenly coated onto the substrate surface through the spin coating process of the spin coater. During the spin coating process, the photosensitive resin precursor gradually forms a thin film of photosensitive resin. The thickness and uniformity of this resin layer are critical for subsequent curing and reflective layer preparation. By ensuring that the resin layer thickness meets the design requirements and has a high surface flatness, the transmission and focusing of the optical signal in the optical waveguide are guaranteed.

[0096] In some embodiments, the photosensitive resin precursor includes one or more of unsaturated polyester, acrylate, epoxy resin, silicone resin, epoxy acrylate, polyurethane acrylate, polyester acrylate, and polyether acrylate.

[0097] For example, the photosensitive resin precursor can be a combination of acrylate and silicone resin. This combination material has excellent transparency and high temperature resistance, which can ensure the stability and efficiency of optical signals during transmission. The photosensitive resin precursor can be a combination of epoxy acrylate and polyurethane acrylate. This combination material has high heat resistance and corrosion resistance, and is suitable for application scenarios that need to withstand high temperature and chemical corrosion environments. The photosensitive resin precursor can be a combination of polyester acrylate and polyether acrylate. This combination material has good high transparency and heat resistance, which helps to improve the transmission efficiency and stability of light, and improve the heat resistance and stability of the optical waveguide array.

[0098] In summary, photosensitive resin precursors can be combined with different types of resin materials. The combination of these different types of resin materials can be adjusted and selected according to specific optical requirements and design needs to provide good optical properties and transmission performance, thereby achieving stable transmission of optical signals and high-quality imaging.

[0099] In some embodiments, the step of curing the resin layer includes: irradiating the resin layer with a curing light source to cure the resin layer.

[0100] In some embodiments, the curing light source can be a light source with a specific wavelength and power, such as an ultraviolet light source or a laser. By adjusting the wavelength and power of the light source, the photosensitive resin can be cured to form a solid resin layer. The choice of curing light source depends on the properties of the photosensitive resin used and the required curing conditions.

[0101] Specifically, as shown in Figure 5, in the curing step, the curing light source is aligned with the resin layer surface and properly irradiated. When the curing light source is irradiated onto the resin layer, a cross-linking reaction will occur in the photosensitizer in the photosensitive resin after being irradiated with light of a specific wavelength, forming a three-dimensional network structure, thereby curing the resin into a hardened solid layer. The curing process is the transition process from a liquid to a solid state of the resin layer, so that the resin layer has good mechanical properties and stability. The irradiation parameters of the curing light source, such as light intensity and irradiation time, need to be adjusted according to the type and thickness of the photosensitive resin used. Suitable curing parameters can ensure that the resin layer reaches the desired degree of hardening and uniformity during the curing process.

[0102] Therefore, during the curing process, the curing light source's irradiation conditions must be strictly controlled to ensure the quality and performance of the resin layer. The curing time, intensity, and uniformity play a key role in the final quality of the optical waveguide array. Excessively long or short curing times can lead to unstable resin layer quality, affecting the performance of the optical waveguide array.

[0103] In some embodiments, the step of preparing a reflective layer covering the resin layer on the solidified resin layer includes: depositing a reflective layer material onto the resin layer by a deposition film forming device.

[0104] Among them, the deposition film forming device is a device used to deposit a thin film on a surface. The device can use technologies such as physical vapor deposition (PVD) or chemical vapor deposition (CVD) to deposit the reflective layer material in the form of a thin film on the surface of the resin layer.

[0105] Specifically, during the preparation process, the deposition film-forming apparatus must first be adjusted to appropriate operating conditions, including parameters such as vacuum level, deposition rate, voltage, and gas flow rate. Next, the selected reflective layer material is placed in a deposition source. Physical or chemical techniques are used to generate metal atoms or ions from the reflective layer material. These metal atoms or ions are then deposited onto the surface of the cured resin layer in a vacuum environment. During the deposition process, the reflective layer material is uniformly deposited onto the surface of the resin layer to form a thin film, thus forming a reflective layer covering the resin layer. The thickness of the reflective layer can be adjusted by controlling the deposition time and rate. The reflective layer prepared using this method exhibits excellent optical properties and a uniform thickness.

[0106] In general, the step of preparing the reflective layer using a deposition film forming device is a key step in the preparation of the optical waveguide array. Through this step, a reflective layer with good optical properties can be formed on the resin layer, thereby achieving reflection and focusing of the optical signal.

[0107] In some embodiments, depositing the reflective layer material onto the resin layer by a deposition film forming device includes: depositing the reflective layer material onto the resin layer by a magnetron sputtering device or a nano-sputtering device.

[0108] Among them, as shown in Figure 6, magnetron sputtering is a commonly used thin film deposition technology. In the magnetron sputtering device, a suitable reflective layer material is first selected and placed on the target of the device. Then, the device is placed in a vacuum chamber and the vacuum chamber is evacuated to a high vacuum state. By applying a high voltage in the vacuum chamber, electron bombardment occurs on the surface of the metal target material, releasing metal atoms, which are then guided by the magnetic field to the surface of the cured resin layer. These metal atoms are deposited on the surface to form a dense and flat nano-scale high-gloss mirror reflective layer. By controlling the voltage, magnetic field strength and deposition time, the thickness and properties of the reflective layer can be adjusted. The magnetron sputtering device is carried out under high vacuum conditions, so that the formed thin film is dense and uniform, which helps to improve the optical performance of the reflective layer.

[0109] In some embodiments, as shown in Figure 7, a nano-spraying device can deposit metal atoms onto a substrate surface through a chemical reaction. The nano-spraying device sprays a pre-prepared chemical solution or gas onto the substrate surface with extremely fine jetting precision. The chemical reaction then deposits the metal atoms and forms a metal film. This method, typically performed under atmospheric pressure or low vacuum conditions, allows for more precise control of the amount and uniformity of metal atom deposition, resulting in a dense, smooth, nanoscale, high-gloss, specular reflective layer.

[0110] In general, both methods can be used to form a thin film of reflective layer on the resin layer, but there are some differences in the deposition principle, process and control performance. The choice of which method to use depends on the specific application requirements, process conditions and equipment availability.

[0111] Therefore, the process of preparing the reflective layer using a magnetron sputtering device or a nano-sputtering device is a key step in the fabrication of optical waveguide arrays. These technologies can achieve uniform deposition of the reflective layer material on the cured resin layer, resulting in a reflective layer with excellent optical properties. Furthermore, the operating parameters of these devices can be adjusted, allowing the thickness and quality of the reflective layer to be controlled according to actual needs.

[0112] In some embodiments, the reflective layer material comprises a combination of metal and an all-electrolyte reflective material. This combination leverages the high reflectivity of metals and the excellent electrolyte properties of all-electrolytes. Specifically, metals have excellent light reflectivity and can have high reflectivity in the visible light range, effectively reflecting light for focusing and transmission. By depositing metal atoms on the surface of the resin layer, a metal reflective layer can be formed to reflect and focus optical signals.

[0113] All-electrolyte reflective materials are specialized materials with excellent dielectric properties and high reflectivity. They can be composed of compounds containing metal oxides or nitrides, such as aluminum oxide and silicon nitride. These materials not only offer high reflectivity but also effectively prevent optical signal loss in optical waveguide arrays.

[0114] Specifically, during the fabrication process, metal atoms can first be deposited onto the resin layer using a magnetron sputtering device or nano-sputtering device to form a metal reflective layer. Then, the same device is used to deposit the all-electrolyte reflective material onto the metal layer to form a combined reflective layer. This combined reflective layer structure leverages the high reflectivity of the metal and the dielectric properties of the all-electrolyte to improve the reflection efficiency and optical performance of the optical waveguide array.

[0115] In some embodiments, the reflective layer material comprises a combination of a metal and one or more of silicon monoxide, magnesium fluoride, silicon dioxide, and aluminum oxide, wherein the metal comprises one of aluminum, silver, copper, gold, chromium, and platinum. During the preparation process, a deposition film forming apparatus can be used to deposit these materials onto the resin layer in specific proportions to form a combined reflective layer. By adjusting the deposition time and rate, the proportions and thicknesses of the various materials in the reflective layer can be controlled, thereby obtaining a reflective layer with excellent optical properties and stability.

[0116] For example, the reflective layer of an optical waveguide array can use a combination of silicon monoxide and aluminum. Silicon monoxide has good optical transparency and reflective properties, while aluminum has excellent reflectivity and conductivity. This combination can effectively reflect and transmit optical signals, achieving reflection and guidance of light in the optical waveguide array. The reflective layer of an optical waveguide array can also use a combination of magnesium fluoride and silver. Magnesium fluoride has good optical transparency and reflective properties, while silver has very high reflectivity and conductivity. This combination can achieve efficient reflection and transmission of light in the optical waveguide array, improving optical performance and stability.

[0117] FIG8 is a schematic diagram of cold working of an optical waveguide block according to an embodiment of the present disclosure. As shown in FIG8 , cold working of the optical waveguide block to obtain an optical waveguide array includes: cutting, grinding and polishing the optical waveguide block to obtain the optical waveguide array.

[0118] Specifically, the optical waveguide block needs to be cut into the desired size and shape. The cutting process needs to be precisely controlled to ensure that the size and shape of the optical waveguide array meet the design requirements. This can be achieved by laser cutting, cutting machinery, or other cutting tools.

[0119] Furthermore, the cut optical waveguide block may have some irregular surfaces and edges, which require grinding to make the surface smooth and uniform. The grinding process uses grinding machinery and abrasives to improve the surface quality and flatness by removing surface material.

[0120] Furthermore, even after grinding, the optical waveguide block may still have minor surface defects or unevenness, requiring polishing. Polishing can achieve a higher level of surface smoothness, improving the optical performance and appearance quality of the optical waveguide array. Polishing is usually achieved using polishing machinery and polishing fluid.

[0121] Through these cold working steps, the optical waveguide block can be processed into an optical waveguide array that meets the design requirements. This cold working process can obtain the desired shape, size and surface quality while maintaining the stability and optical properties of the optical waveguide material. In addition, cold working can also prevent the optical waveguide substrate from being deformed by high temperature. The optical waveguide substrate may soften or deform due to high temperature, which may cause the structure of the optical waveguide array to be unstable and the shape to be irregular. Through cold working, processing can be carried out in a low temperature environment, avoiding the influence of high temperature on the optical waveguide substrate, and ensuring the structural stability and precise shape of the optical waveguide array.

[0122] Figure 9 is a logic diagram of a method for preparing an optical waveguide array according to an embodiment of the present disclosure. As shown in Figure 9, a photosensitive resin precursor is first dripped onto a substrate. The photosensitive resin precursor is spin-coated into a photosensitive resin layer by a glue spreader. The photosensitive resin layer is then irradiated with a curing light source to cure the photosensitive resin to form a solid resin layer. The reflective layer material is then deposited onto the cured resin layer by a deposition film forming device to form a reflective layer covering the resin layer. Repeat the above steps of resin layer preparation, curing and reflective layer preparation, and stack multiple layers of resin layers and reflective layers in sequence to form an optical waveguide block with a multi-layer structure. Finally, the optical waveguide block is cut, ground and polished to obtain an optical waveguide array.

[0123] In summary, a series of steps, including substrate preparation, resin application, spin coating, curing, and coating, cyclically form a waveguide block with a certain number of layers. The waveguide block then undergoes cold processing, including cutting, grinding, and polishing, ultimately forming an optical waveguide array. This simple and efficient process can produce optical waveguide arrays with excellent performance for applications such as negative refractive index flat lenses.

[0124] The embodiment of the present disclosure further provides an optical waveguide array 11 , which is manufactured by the method for manufacturing an optical waveguide array described in the above embodiment.

[0125] According to the optical waveguide array 11 of the embodiment of the present disclosure, the resin layers 111 and the reflective layers 112 are arranged alternately in sequence to form a multi-layer structure. Each resin layer 111 undergoes preparation and curing steps to ensure its flatness and strength, while the reflective layer 112 tightly covers the surface of each resin layer 111, achieving a layered stacked structure. Through this combination of multiple layers of alternating resin layers 111 and reflective layers 112, the preparation of the optical waveguide array 11 becomes simpler and more efficient, eliminating the need for complex process steps such as support body formation, side sealing, and vacuum glue potting. In addition, the use of resin materials gives the optical waveguide array 11 the advantages of high strength, low density, and low cost, thereby improving its wide application and economic efficiency.

[0126] The negative refractive flat lens 1 according to an embodiment of the present disclosure will be described below with reference to FIG. 10 .

[0127] FIG10 is a schematic diagram of a negative refractive plate lens 1 according to an embodiment of the present disclosure. As shown in FIG10 , the negative refractive plate lens 1 includes: two optical waveguide arrays 11 as described in the above embodiments and two transparent substrates 12 .

[0128] In some embodiments, the two optical waveguide arrays 11 are fabricated with multiple resin layers 111 and reflective layers 112. This structure exhibits negative refractive properties, guiding light propagation within it and achieving a negative refraction phenomenon. The resin layer 111 provides support and positioning within the optical waveguide array 11, maintaining the stability and accuracy of the optical path. The reflective layer 112 reflects and focuses light within the optical waveguide array 11, enabling it to be reflected and propagated within the lens.

[0129] In some embodiments, the transparent substrate 12 can be made of a material with high transparency and optical properties, such as glass or plastic. The transparent substrate 12 provides mechanical support and protection for the optical waveguide array 11 while also ensuring the transmission and reflection of light.

[0130] In some embodiments, two optical waveguide arrays 11 positioned between two transparent substrates 12 can form a negative refractive index slab lens 1. The implementation of the negative refractive index slab lens 1 primarily relies on the layered structure and refractive index adjustment between the optical waveguide array 11 and the transparent substrate 12. By providing a material with a negative refractive index within the optical waveguide array 11 and combining it with the refractive index of the transparent substrate 12, a negative refractive index effect can be achieved. When light passes through the interface between the optical waveguide array 11 and the transparent substrate 12, a special optical effect occurs, causing the light to be focused onto a single point, resulting in negative refraction. This structure exhibits unique optical properties and can be applied to fields such as super-resolution imaging and laser focusing.

[0131] According to the negative refractive index plate lens 1 of the embodiment of the present disclosure, by adopting the optical waveguide array 11 described in the above embodiment, each optical waveguide array 11 is composed of multiple layers of resin layers 111 and reflective layers 112 arranged alternately. The preparation process of this structural design is relatively simple, without the need for cumbersome process steps, thereby improving production quality and efficiency. In addition, the special structure of the optical waveguide array 11 enables the negative refractive index plate lens 1 to refocus light emitted by the image source in the air, achieving a high-end experience of the aerial display image. The light can maintain stability and efficiency during reflection and transmission in the optical waveguide, reducing optical distortion and improving imaging quality. At the same time, the use of resin material gives the optical waveguide array 11 the advantages of high strength, low density, and low cost, thereby improving its wide application and economic efficiency.

[0132] The following describes an aerial imaging device 100 according to an embodiment of the present disclosure with reference to FIG. 11 .

[0133] FIG11 is a block diagram of an aerial imaging device 100 according to an embodiment of the present disclosure. As shown in FIG11 , the aerial imaging device 100 includes the negative refractive flat plate lens 1 described in the above embodiment.

[0134] In some embodiments, the aerial imaging device 100 is a device or system for implementing aerial imaging. Using optical elements and sensors, the image of an aerial target can be projected or transmitted onto a photosensitive element of the imaging system, thereby enabling imaging and observation of the aerial target.

[0135] In some embodiments, the negative refractive index flat lens 1 is a key component of the aerial imaging device 100. This lens has negative refractive properties, capable of changing the refractive index of incident light to a negative value, thereby producing a unique optical effect. Specifically, the negative refractive index flat lens 1 in the aerial imaging device 100 is used for optical imaging and can produce a very special optical effect. When light passes through the negative refractive index flat lens 1, due to the negative refractive properties, the light undergoes reverse bending inside the lens, resulting in an imaging process opposite to the imaging direction of a traditional lens. This special imaging method can be used to improve the imaging quality and performance of the aerial imaging device 100, increasing the resolution and clarity of the imaging.

[0136] In some embodiments, the aerial imaging device 100 can be an imaging system for an unmanned aerial vehicle (UAV). The UAV is equipped with a negative refractive plate lens 1 as its primary optical component, enabling clearer and more precise aerial imaging. The aerial imaging device 100 can also be used in an astronomical telescope or telescope system. By using the negative refractive plate lens 1, the telescope's imaging quality can be improved, enhancing the resolution and clarity of celestial observations. Furthermore, the negative refractive plate lens 1 can be used in LiDAR systems for detecting and imaging aerial targets.

[0137] According to the aerial imaging device 100 of the embodiment of the present disclosure, by adopting the negative refractive flat lens 1 described in the above embodiment, each optical waveguide array 11 in the negative refractive flat lens 1 is composed of multiple layers of resin layers 111 and reflective layers 112 arranged alternately. This structural design enables the aerial imaging device 100 to have excellent optical performance, and can re-converge the light emitted by the image source in the air, so as to achieve a high-end experience of the aerial display screen. As the core optical element of the aerial imaging device 100, the negative refractive flat lens 1 can keep the light stable and efficient during reflection and transmission in the optical waveguide, reduce optical distortion, and improve imaging quality. In addition, the preparation process of the negative refractive flat lens 1 is relatively simple, without the need for cumbersome process steps, thereby improving production quality and efficiency. At the same time, the special structure of the optical waveguide array 11 and the use of resin materials enable the aerial imaging device 100 to have the advantages of high strength, low density and low cost, thereby improving its wide application and economy.

[0138] Throughout this specification, reference to terms such as "one embodiment," "some embodiments," "illustrative embodiments," "example," "specific example," or "some examples" means that a specific feature, structure, material, or characteristic described in conjunction with the embodiment or example is included in at least one embodiment or example of the present disclosure. In this specification, illustrative expressions of the above terms do not necessarily refer to the same embodiment or example.

[0139] Although the embodiments of the present disclosure have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and alterations may be made to the embodiments without departing from the principles and spirit of the present disclosure, the scope of which is defined by the claims and their equivalents.

Claims

1. A method for preparing an optical waveguide array, characterized in that: The preparation method comprises: a resin layer preparation step of preparing a resin layer on a substrate; a curing step of curing the resin layer; a step of preparing a reflective layer on the solidified resin layer to cover the resin layer; Repeating the resin layer preparation step, the curing step, and the reflective layer preparation step until an optical waveguide block is obtained in which a preset number of resin layers and reflective layers are alternately self-assembled; and The optical waveguide block is cold worked to obtain an optical waveguide array.

2. The preparation method according to claim 1, characterized in that The resin layer preparation step of preparing a resin layer on a substrate comprises: Dropping a preset dose of photosensitive resin precursor onto the substrate adsorbed by the spin coater suction cup; and The photosensitive resin precursor is spin-coated into a photosensitive resin layer by the spin coater according to preset spin coating parameters.

3. The preparation method according to claim 2, characterized in that The photosensitive resin precursor includes one or more combinations of unsaturated polyester, acrylate, epoxy resin, silicone resin, epoxy acrylate, polyurethane acrylate, polyester acrylate and polyether acrylate.

4. The preparation method according to any one of claims 1 to 3, characterized in that The step of curing the resin layer includes: irradiating the resin layer with a curing light source to cure the resin layer.

5. The preparation method according to any one of claims 1 to 4, characterized in that The step of preparing a reflective layer covering the resin layer on the solidified resin layer comprises: depositing a reflective layer material onto the resin layer by a deposition film forming device.

6. The preparation method according to claim 5, characterized in that Depositing the reflective layer material onto the resin layer by a deposition film forming device includes: depositing the reflective layer material onto the resin layer by a magnetron sputtering device or a nano-sputtering device.

7. The preparation method according to claim 5 or 6, characterized in that: The reflective layer material includes a combination of metal and full-electrolyte reflective material.

8. The preparation method according to claim 7, characterized in that The reflective layer material includes a combination of metal and one or more of silicon monoxide, magnesium fluoride, silicon dioxide and aluminum oxide, wherein the metal includes one of aluminum, silver, copper, gold, chromium and platinum.

9. The preparation method according to any one of claims 1 to 8, characterized in that Cold processing is performed on the optical waveguide block to obtain an optical waveguide array, comprising: cutting, grinding and polishing the optical waveguide block to obtain the optical waveguide array.

10. An optical waveguide array (11), characterized in that The optical waveguide array (11) is prepared by the method for preparing an optical waveguide array (11) according to any one of claims 1 to 9.

11. An optical waveguide array (11), characterized in that It comprises a plurality of resin layers (111) and reflective layers (112) arranged alternately.

12. The optical waveguide array (11) according to claim 11, characterized in that The material of the resin layer (111) includes one or more combinations of unsaturated polyester, acrylate, epoxy resin, silicone resin, epoxy acrylate, polyurethane acrylate, polyester acrylate and polyether acrylate.

13. The optical waveguide array (11) according to claim 11 or 12, characterized in that: The reflective layer (112) is a composite layer of metal and full-electrolyte reflective material.

14. The optical waveguide array (11) according to claim 13, characterized in that The full-electrolyte reflective material includes a combination of one or more of silicon monoxide, magnesium fluoride, silicon dioxide and aluminum oxide, and the metal includes one of aluminum, silver, copper, gold, chromium and platinum.

15. A negative refractive flat lens (1), characterized in that: include: Two optical waveguide arrays (11) according to any one of claims 10 to 14 and two transparent substrates (12), wherein the two optical waveguide arrays (11) are located between the two transparent substrates (12).

16. An aerial imaging device (100), characterized in that The aerial imaging device (100) comprises the negative refractive flat plate lens (1) according to claim 15.

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