Particle accommodating device, and particle contactless processing apparatus and light sensing structure thereof

Abstract

Disclosed in the present invention are a particle accommodating device, and a particle contactless processing apparatus and a light sensing structure thereof. The particle accommodating device is used for accommodating a liquid specimen that contains a plurality of particles. The accommodating device comprises a light sensing structure and a mating structure spaced apart from the light sensing structure. The light sensing structure comprises a substrate, an electrode layer and a photoelectric layer which are formed on the substrate, and an insulator formed on the photoelectric layer. The insulator comprises a charge-type track protruding from the photoelectric layer. The photoelectric layer is operable to generate a plurality of charges that are concentrated on the charge-type track, so that the charge density of the charge-type track is greater than that of the outer surface of the photoelectric layer, and thus the charge-type track can position at least one of the particles thereon by electrostatic adsorption. Thus, the particles are moved and positioned by means of the electrostatic adsorption, thereby achieving precise positioning of the particles.

Description

Particulate matter containment device and non-contact particulate matter processing equipment and its photosensitive structure

[0001] This application claims priority to U.S. Provisional Patent Application No. 63 / 643905, filed May 7, 2024, entitled “Particulate Containment Device and Non-Contact Particulate Processing Apparatus and Photosensitive Structure thereof,” the entire contents of which are incorporated herein by reference. Technical Field

[0002] This invention relates to a particulate processing device, and more particularly to a particulate container, a non-contact particulate processing device, and its photosensitive structure. Background Technology

[0003] Existing particulate processing devices can drive target particles to move by applying an electric field. However, how to move the target particles accurately along a predetermined route to a predetermined target area without contacting them is the direction in which existing particulate processing devices need further improvement and refinement.

[0004] Therefore, the inventor believed that the above-mentioned defects could be improved, and thus devoted himself to research and applied scientific principles, and finally proposed an invention that is reasonably designed and effectively improves the above-mentioned defects. Summary of the Invention

[0005] The present invention provides a particle containing device and a non-contact particle processing device and its photosensitive structure, which can effectively improve the defects that may occur in existing particle processing devices.

[0006] This invention discloses a non-contact particulate processing device, comprising: a particulate containing device for containing a liquid sample containing multiple particulates; the particulate containing device further comprising: a photosensitive structure including a first substrate, a first electrode layer formed on the first substrate, a photoelectric layer formed on the first substrate, and an insulator formed on the photoelectric layer; wherein the insulator comprises: a base layer embedded within the photoelectric layer; and a track layer connected to the base layer and at least partially protruding from the photoelectric layer, with a charge track formed at the top edge of the track layer; wherein the photoelectric layer is operable to generate multiple charges concentrated on the charge track, so that the charge track can electrostatically attract at least... A microparticle is positioned thereon, and at least one microparticle is defined as a target microparticle; a mating structure is spaced apart from the photosensitive structure, and at least one of the photosensitive structure and the mating structure is transparent; wherein the mating structure includes a second substrate and a second electrode layer formed on the second substrate, and the second electrode layer faces the photosensitive structure; a light driving device faces the microparticle receiving device; wherein the light driving device is capable of emitting light to illuminate the photosensitive structure so that the photosensitive structure forms a dielectric electrophoretic pattern; wherein when the target microparticle is electrostatically adsorbed and positioned on the charge track, the light driving device can move the target microparticle along the charge track by moving the dielectric electrophoretic pattern.

[0007] Optionally, when the photoelectric layer is in operation to generate multiple charges concentrated in charge orbitals, the charge density of the charge orbitals is greater than the charge density of the outer surface of the photoelectric layer.

[0008] Optionally, the photoelectric layer can be used to generate multiple charges concentrated in charge orbitals by receiving external ambient light.

[0009] Optionally, the orbital layer includes two arms extending from the base layer, and a gap is formed between the inner surfaces of the two arms; wherein the free ends of the two arms are located outside the photoelectric layer and are in contact with each other, such that the gap is surrounded by the inner surfaces of the two arms and the base layer, and the free ends of the two arms form at least a portion of the charge orbital.

[0010] Optionally, the orbital layer includes two arms extending from the base layer, and a gap is formed between the inner surfaces of the two arms; wherein the free end faces of the two arms are located outside the photoelectric layer and are far apart from each other, such that the gap is connected to the outside, and the inner surfaces of the two arms form at least a portion of the charge orbital.

[0011] Optionally, the charge-type orbit includes: a plurality of transverse orbit slots, each parallel to a first direction; a plurality of longitudinal orbit slots, each parallel to a second direction, intersecting with the plurality of transverse orbit slots; wherein, the plurality of transverse orbit slots and the plurality of longitudinal orbit slots at multiple overlapping points where they intersect are each defined as a charge concentration region; wherein, when the photoelectric layer is in operation to generate multiple charges concentrated in the charge-type orbit, the charge concentration region has the maximum charge density in the photosensitive structure.

[0012] Optionally, any one of the plurality of transverse track slots and the plurality of longitudinal track slots has two adjacent inner corners and two outer corners located outside the two inner corners; in any one of the plurality of transverse track slots and the plurality of longitudinal track slots, the height position of the two inner corners is different from the height position of the two outer corners.

[0013] Optionally, the photoelectric layer includes a plurality of transistors arranged in a matrix, and the orbital layer includes a plurality of annular segments surrounding the plurality of transistors, with the plurality of annular segments being adjacent to each other and arranged in a matrix, and the top edges of the plurality of annular segments together forming a charge orbital.

[0014] Optionally, the outer contour of each annular segment is square, and a charge concentration region is formed at the center of any four annular segments that are adjacent to each other and arranged in a square; wherein, when the photoelectric layer is in operation to generate multiple charges concentrated in the charge orbitals, the charge concentration region has the maximum charge density in the photosensitive structure.

[0015] This invention also discloses a particle containing device for containing a liquid sample comprising a plurality of particles. The containing device includes: a photosensitive structure comprising: a first substrate; a first electrode layer formed on the first substrate; a photoelectric layer formed on the first substrate; an insulator formed on the photoelectric layer; wherein the insulator includes a charge track protruding from the photoelectric layer; wherein the photoelectric layer is operable to generate a plurality of charges concentrated on the charge track, such that the charge density of the charge track is greater than the charge density of the outer surface of the photoelectric layer, so that the charge track positions at least one particle thereon by electrostatic adsorption; a mating structure spaced apart from the photosensitive structure, wherein at least one of the photosensitive structure and the mating structure is transparent; wherein the mating structure includes a second substrate and a second electrode layer formed on the second substrate, and the second electrode layer faces the photosensitive structure.

[0016] Optionally, the insulator includes: a base layer embedded within the photoelectric layer; and an orbital layer connected to the base layer and protruding from the photoelectric layer, with charge orbitals formed at the top edge of the orbital layer.

[0017] Optionally, the charge-type orbit includes: a plurality of transverse orbit slots, each parallel to a first direction; a plurality of longitudinal orbit slots, each parallel to a second direction, intersecting with the plurality of transverse orbit slots; wherein, the plurality of transverse orbit slots and the plurality of longitudinal orbit slots at multiple overlapping points where they intersect are each defined as a charge concentration region; wherein, when the photoelectric layer is in operation to generate multiple charges concentrated in the charge-type orbit, the charge concentration region has the maximum charge density in the photosensitive structure.

[0018] Optionally, the photoelectric layer includes a plurality of transistors arranged in a matrix, and the orbital layer includes a plurality of annular segments surrounding the plurality of transistors, with the plurality of annular segments being adjacent to each other and arranged in a matrix, and the top edges of the plurality of annular segments together forming a charge orbital.

[0019] This invention also discloses a photosensitive structure for a non-contact particle processing device, comprising: a first substrate; a first electrode layer formed on the first substrate; a photoelectric layer formed on the first substrate; and an insulator formed on the photoelectric layer; wherein the insulator includes a charge orbital protruding from the photoelectric layer; wherein the photoelectric layer is operable to generate multiple charges concentrated in the charge orbital, such that the charge density of the charge orbital is greater than the charge density of the outer surface of the photoelectric layer.

[0020] Optionally, the photoelectric layer can be used to generate multiple charges concentrated in charge orbitals by receiving external ambient light.

[0021] In summary, the particle containing device and the non-contact particle processing equipment and their photosensitive structure disclosed in the embodiments of the present invention can move and position the target particles by forming the insulator on the photoelectric layer, so that the charge track of the insulator can be matched with the operation of the photoelectric layer, thereby accurately positioning the target particles by electrostatic adsorption.

[0022] Furthermore, the charge-type track can be used in conjunction with the light-driving device to allow the target particle to be propelled by the dielectrophoretic pattern and move rapidly along the charge-type track. In other words, the target particle can be propelled by the dielectrophoretic pattern or moved along the charge-type track after being touched (or lightly bumped), thereby effectively reducing the potential damage to the target particle caused by the photomask.

[0023] To further understand the features and technical content of this invention, please refer to the following detailed description and accompanying drawings. However, these descriptions and drawings are only for illustrating the invention and are not intended to limit the scope of protection of the invention in any way. Attached Figure Description

[0024] Figure 1 is a three-dimensional schematic diagram of the non-contact particulate treatment device according to Embodiment 1 of the present invention.

[0025] Figure 2 is a cross-sectional schematic diagram of the non-contact particulate treatment device according to Embodiment 1 of the present invention.

[0026] Figure 3 is a top view of the non-contact particulate treatment device according to Embodiment 1 of the present invention.

[0027] Figure 4 is an enlarged schematic diagram of region IV in Figure 3.

[0028] Figure 5 is a schematic diagram of the subsequent actions in Figure 4.

[0029] Figure 6 is a schematic diagram of another subsequent action in Figure 4.

[0030] Figure 7 is a partial cross-sectional schematic diagram of the non-contact particulate treatment device according to Embodiment 1 of the present invention.

[0031] Figure 8 is a schematic diagram of the subsequent actions in Figure 7.

[0032] Figure 9 is a partial cross-sectional schematic diagram of the non-contact particulate treatment device according to Embodiment 2 of the present invention.

[0033] Figure 10 is a cross-sectional schematic diagram of the non-contact particulate treatment device according to Embodiment 3 of the present invention. Detailed Implementation

[0034] The following specific embodiments illustrate the implementation of the "particle containing device, non-contact particle processing equipment, and its photosensitive structure" disclosed in this invention. Those skilled in the art can understand the advantages and effects of this invention from the content disclosed in this specification. This invention can be implemented or applied through other different specific embodiments, and various details in this specification can also be modified and changed based on different viewpoints and applications without departing from the concept of this invention. Furthermore, the accompanying drawings of this invention are for simple illustrative purposes only and are not depictions of actual dimensions; this is stated in advance. The following embodiments will further describe the relevant technical content of this invention in detail, but the disclosed content is not intended to limit the scope of protection of this invention.

[0035] It should be understood that while terms such as "first," "second," and "third" may be used in this document to describe various components or features, these components or features should not be limited by these terms. These terms are primarily used to distinguish one component from another, or one feature from another. Furthermore, the term "or" as used in this document should, as appropriate, include any combination of one or more related listed items.

[0036] [Example 1]

[0037] Please refer to Figures 1 to 8, which illustrate Embodiment 1 of the present invention. As shown in Figures 1 to 4, this embodiment discloses a non-contact particulate processing device 100, which includes a particulate container 1, an AC power device 2 electrically coupled to the particulate container 1, and a light driving device 3 facing the particulate container 1. However, the present invention is not limited thereto. For example, in other embodiments of the present invention not shown, the particulate container 1 can be used independently (e.g., for sale) or in conjunction with other devices, depending on actual needs.

[0038] In this embodiment, the particle containing device 1 is a rectangular structure at the chip-scale, and it is used to contain a liquid sample S containing a plurality of particles P, but the invention is not limited thereto. For example, the number of particles P contained in the liquid sample S can also be adjusted according to actual needs (e.g., at least one).

[0039] Furthermore, in this embodiment, the microparticle P is described as a biological microparticle; more specifically, the liquid sample S can be a bodily fluid sample from an animal (e.g., blood, lymph, saliva, or urine), and the microparticle P can be a specific type of cell or cell cluster, such as circulating tumor cells (CTCs), fetal nucleated red blood cells (FNRBCs), or bacteria, but the invention is not limited to the above. For example, in other embodiments not shown in this invention, the liquid sample S can also be a liquid sample from a plant. In addition, the microparticle P can also be plastic microparticles, used to adsorb viruses, bacteria, or exosomes, depending on actual needs.

[0040] The particle containing device 1 includes a photosensitive structure 11, a mating structure 12 spaced apart from the photosensitive structure 11, and an adhesive layer 13 joining the periphery of the photosensitive structure 11 and the periphery of the mating structure 12. At least one of the photosensitive structure 11 and the mating structure 12 is transparent, and in this embodiment, the photosensitive structure 11 and the mating structure 12 are two plate-like structures arranged parallel to each other with a distance between them greater than the size of any one of the particles P; however, the invention is not limited to the above description.

[0041] More specifically, the photosensitive structure 11 includes a first substrate 111, a first electrode layer 112 formed on the first substrate 111, a photoelectric layer 113 formed on the first substrate 111, and an insulator 114 formed on the photoelectric layer 113. In this embodiment, the first electrode layer 112 is formed on the bottom side of the first substrate 111, the photoelectric layer 113 is formed on the top side of the first substrate 111, and the photoelectric layer 113 has a plurality of transistors 1131 arranged in a matrix; wherein, the photoelectric layer 113 may adopt an NPN transistor architecture, a PNP transistor architecture, an NP diode architecture, or a PN diode architecture according to actual needs, but the present invention is not limited thereto.

[0042] The mating structure 12 includes a second substrate 121 and a second electrode layer 122 formed on the second substrate 121, with the second electrode layer 122 facing the photosensitive structure 11 (e.g., the photoelectric layer 113 and the insulator 114). In this embodiment, the AC device 2 is electrically coupled to the first electrode layer 112 of the photosensitive structure 11 and the second electrode layer 122 of the mating structure 12, so that the photosensitive structure 11 can be irradiated by the light emitted by the light driving device 3 to form a dielectric pattern F, thereby moving any one of the particles P within the liquid sample S through the dielectric pattern F (e.g., Figures 5 and 6).

[0043] For example, the light driving device 3 may include a camera 31 and a light source 32 associated with the camera 31. The light driving device 3 can emit light through the light source 32 to illuminate the photosensitive structure 11, so that the photosensitive structure 11 (or the photoelectric layer 113) forms the dielectric electrophoretic pattern F.

[0044] The insulator 114 includes a charge orbital T protruding from the photoelectric layer 113, and the photoelectric layer 113 is operable to generate multiple charges concentrated on the charge orbital T, such that the charge density of the charge orbital T is greater than the charge density of the outer surface of the photoelectric layer 113, so that the charge orbital T can position at least one particle P thereon by electrostatic adsorption, and the at least one particle P is defined as a target particle P1.

[0045] The photoelectric layer 113 can be used to generate multiple charges concentrated in the charge orbital T by receiving external ambient light; or, the photoelectric layer 113 can also generate multiple charges concentrated in the charge orbital T by emitting light from the light driving device 3. The present invention does not limit this.

[0046] As described above, when the target particle P1 is electrostatically adsorbed and positioned on the charge track T, the photo-driving device 3 can move the target particle P1 along the charge track T by moving the dielectrophoretic pattern F (e.g., Figures 5 and 6).

[0047] Therefore, in this embodiment, the non-contact particle processing device 100 can form the insulator 114 on the photoelectric layer 113 so that the charge orbitals T of the insulator 114 can move and position the target particle P1 by electrostatic adsorption in conjunction with the operation of the photoelectric layer 113, thereby accurately positioning the target particle P1.

[0048] Furthermore, the charge track T can be used in conjunction with the light-driving device 3 so that the target particle P1 can be propelled by the dielectrophoretic pattern F and move rapidly along the charge track T. In other words, the target particle P1 can be propelled by the dielectrophoretic pattern F (e.g., Figure 6) or moved along the charge track T after being touched (or lightly bumped) (e.g., Figure 5), thereby effectively reducing potential damage to the target particle P1 caused by the photomask.

[0049] It should be noted that the structure of the insulator 114 can be adjusted and varied according to actual needs, provided that the charged orbital T can adsorb the target particle P1 or further provide the target particle P1 to move thereon. However, in order to enable the target particle P1 to move more smoothly and quickly on the charged orbital T, the insulator 114 may optionally include at least some of the following technical features, but the present invention is not limited thereto.

[0050] In this embodiment, as shown in Figures 2, 7, and 8, the insulator 114 includes a base layer 1141 and a track layer 1142. The base layer 1141 is embedded within the photoelectric layer 113, and the track layer 1142 is connected to the base layer 1141 and at least partially protrudes from the photoelectric layer 113. The top edge of the track layer 1142 forms the charge track T. It should be noted that the structure of the insulator 114 will be described from different angles (e.g., cross-sectional or top view) in the following description, and the insulator 114 can be designed using a structure described from a specific angle according to actual needs.

[0051] Furthermore, the insulator 114, as shown in the cross-sectional view in FIG2, comprises multiple blocks with substantially the same structure. For ease of understanding, the following description uses only one block of the insulator 114 in FIG2 (e.g., FIG7), but the invention is not limited thereto. For example, in other embodiments of the invention not shown, the multiple blocks of the insulator 114 in the cross-sectional view may be formed with different structures.

[0052] In Figures 7 and 8 of this embodiment, the orbital layer 1142 includes two arms 1143 extending from the base layer 1141, and a gap G is formed between the inner surfaces 1143b of the two arms 1143. The free end faces 1143a of the two arms 1143 are located outside the photoelectric layer 113 and are in contact with each other, such that the gap G is jointly surrounded by the inner surfaces 1143b of the two arms 1143 and the base layer 1141, and the free end faces 1143a of the two arms 1143 form at least a portion of the charge-type orbital T.

[0053] Furthermore, each of the supporting arms 1143 includes an inner corner 1143c and an outer corner 1143d located on opposite sides of the free end face 1143a, and the height of the two inner corners 1143c is different from (e.g., lower than) the height of the two outer corners 1143d. In this embodiment, the two supporting arms 1143 are in contact with each other at their two inner corners 1143c, so that the charge track T formed by the two free end faces 1143a is generally V-shaped and facilitates the movement of the target particle P1 on it. Moreover, since each supporting arm 1143 has the inner corner 1143c and the outer corner 1143d, it is beneficial for multiple charges to concentrate at the inner corner 1143c and the outer corner 1143d.

[0054] From another perspective, as shown in the top views of Figures 4 to 6, the charge-type track T includes multiple transverse track slots T1 and multiple longitudinal track slots T2. Each transverse track slot T1 is parallel to a first direction D1, and each longitudinal track slot T2 is parallel to a second direction D2, intersecting with the multiple transverse track slots T1. In this embodiment, the first direction D1 and the second direction D2 are perpendicular to each other, but this is not a limitation.

[0055] Furthermore, each of the multiple transverse track slots T1 and the multiple longitudinal track slots T2 at their intersections is defined as a charge concentration region T3. When the photoelectric layer 113 is operating to generate multiple charge concentrations in the charge-type track T, the charge concentration region T3 has the highest charge density within the photosensitive structure 11, thereby facilitating the electrostatic adsorption of the target particle P1 to any one of the charge concentration regions T3.

[0056] Referring to Figures 4 and 7 together, in this embodiment, any one of the plurality of transverse track grooves T1 and the plurality of longitudinal track grooves T2 is equivalent to being formed by two support arms 1143. That is, any one of the plurality of transverse track grooves T1 and the plurality of longitudinal track grooves T2 has two adjacent inner corners 1143c and two outer corners 1143d located outside the two inner corners 1143c. Furthermore, in any one of the plurality of transverse track grooves T1 and the plurality of longitudinal track grooves T2, the height position of the two inner corners 1143c is different from (e.g., lower than) the height position of the two outer corners 1143d.

[0057] It should be further noted that, as shown in Figure 4, the transverse track groove T1 is a continuous groove along the first direction D1 without segmentation, and the longitudinal track groove T2 can also be a continuous groove along the second direction D2 without segmentation, but the present invention is not limited thereto.

[0058] Furthermore, in this embodiment, the particle containing device 1 is described with the photosensitive structure 11 in conjunction with the mating structure 12 and the bonding layer 13, but the present invention is not limited thereto. For example, in other embodiments of the present invention not shown, the photosensitive structure 11 may be used independently (e.g., for sale) or in conjunction with other structures, depending on actual needs.

[0059] [Example 2]

[0060] Please refer to Figure 9, which illustrates Embodiment 2 of the present invention. Since this embodiment is similar to Embodiment 1 described above, the similarities between the two embodiments will not be repeated. The main differences between this embodiment and Embodiment 1 are explained below:

[0061] In this embodiment, the free end faces 1143a of the two arms 1143 are located outside the photoelectric layer 113 and are far apart from each other, so that the gap G is connected to the outside, and the inner side faces 1143b of the two arms 1143 form at least a portion of the charge track T.

[0062] More specifically, the height of the inner corners 1143c of the two arms 1143 is higher than the height of the outer corners 1143d of the two arms 1143. In this embodiment, the two arms 1143 are positioned such that their inner corners 1143c are far apart from each other, so that the charge track T formed by the inner surfaces 1143b of the two arms is generally V-shaped and facilitates the movement of the target particle P1 on it. That is, the target particle P1 can be partially located within the gap G.

[0063] [Example 3]

[0064] Please refer to Figure 10, which illustrates Embodiment 3 of the present invention. Since this embodiment is similar to Embodiments 1 and 2 described above, the similarities between the two embodiments will not be repeated. The main differences between this embodiment and Embodiments 1 and 2 are explained below:

[0065] In this embodiment, each of the transverse track grooves T1 is composed of multiple segments along the first direction D1, and each of the longitudinal track grooves T2 is composed of multiple segments along the second direction D2. The segmented structure of the transverse track grooves T1 and the longitudinal track grooves T2 can be adjusted and varied according to actual needs. The following description only illustrates one optional implementation method and is not intended to limit it.

[0066] More specifically, the orbital layer 1142 includes a plurality of annular segments 1144 surrounding the plurality of transistors 1131, and the plurality of annular segments 1144 are arranged adjacent to each other in a matrix, and the top edges of the plurality of annular segments 1144 together constitute the charge-type orbits T. That is, the top edges of the plurality of annular segments 1144 together constitute a plurality of transverse orbital slots T1 and a plurality of longitudinal orbital slots T2.

[0067] Furthermore, the outer contour of each of the annular segments 1144 is square, and the charge concentration region T3 is formed at the center of any four adjacent annular segments 1144 arranged in a square. From another perspective, any two adjacent arms 1143 belong to two separate annular segments 1144.

[0068] [Technical Effects of the Embodiments of the Invention]

[0069] In summary, the particle containing device and the non-contact particle processing equipment and their photosensitive structure disclosed in the embodiments of the present invention can move and position the target particles by forming the insulator on the photoelectric layer, so that the charge track of the insulator can be matched with the operation of the photoelectric layer, thereby accurately positioning the target particles by electrostatic adsorption.

[0070] Furthermore, the charge-type track can be used in conjunction with the light-driving device to allow the target particle to be propelled by the dielectrophoretic pattern and move rapidly along the charge-type track. In other words, the target particle can be propelled by the dielectrophoretic pattern or moved along the charge-type track after being touched (or lightly bumped), thereby effectively reducing the potential damage to the target particle caused by the photomask.

[0071] The above-disclosed content is only an optional and feasible embodiment of the present invention, and is not intended to limit the patent scope of the present invention. Therefore, all equivalent technical changes made based on the content of the present invention specification and drawings are included within the patent scope of the present invention.

Claims

1. A non-contact particulate matter treatment device, characterized in that, The non-contact particulate treatment device includes: A particulate container for containing a liquid sample comprising a plurality of particles, and the particulate container comprising: A photosensitive structure includes a first substrate, a first electrode layer formed on the first substrate, a photoelectric layer formed on the first substrate, and an insulator formed on the photoelectric layer; wherein the insulator comprises: The substrate layer is embedded within the photoelectric layer; and An orbital layer, connected to the substrate layer and at least partially protruding from the photoelectric layer, wherein a charge orbital is formed at the top edge of the orbital layer; wherein the photoelectric layer is operable to generate multiple charges concentrated on the charge orbitals, so that the charge orbitals can electrostatically attract and position at least one of the particles thereon, and the at least one particle is defined as a target particle; and A mating structure is spaced apart from the photosensitive structure, and at least one of the photosensitive structure and the mating structure is transparent; wherein the mating structure includes a second substrate and a second electrode layer formed on the second substrate, and the second electrode layer faces the photosensitive structure; and A light-driven device is provided facing the particle-containing device; wherein the light-driven device is capable of emitting light to illuminate the photosensitive structure, so that the photosensitive structure forms a dielectric electrophoretic pattern. When the target particle is electrostatically adsorbed and positioned on the charge track, the light-driven device can move the target particle along the charge track by moving the dielectrophoretic pattern.

2. The non-contact particulate treatment device according to claim 1, characterized in that, When the photoelectric layer is in operation to generate multiple charges concentrated in the charge orbitals, the charge density of the charge orbitals is greater than the charge density of the outer surface of the photoelectric layer.

3. The non-contact particulate treatment device according to claim 1, characterized in that, The photoelectric layer can be used to generate multiple charges concentrated in the charge orbitals by receiving external ambient light.

4. The non-contact particulate treatment device according to claim 1, characterized in that, The orbital layer includes two arms extending from the base layer, and a gap is formed between the inner surfaces of the two arms; wherein the free end faces of the two arms are located outside the photoelectric layer and are in contact with each other, such that the gap is surrounded by the inner surfaces of the two arms and the base layer, and the free end faces of the two arms form at least a portion of the charge orbital.

5. The non-contact particulate treatment device according to claim 1, characterized in that, The orbital layer includes two arms extending from the base layer, and a gap is formed between the inner surfaces of the two arms; wherein the free end faces of the two arms are located outside the photoelectric layer and are far apart from each other, such that the gap is connected to the outside, and the inner surfaces of the two arms form at least a portion of the charge orbital.

6. The non-contact particulate treatment device according to claim 1, characterized in that, The charge orbital includes: Multiple transverse track slots, each parallel to the first direction; and Multiple longitudinal track slots, each parallel to the second direction, intersect with the multiple transverse track slots; wherein, the multiple overlapping points where the multiple transverse track slots intersect with the multiple longitudinal track slots are each defined as charge concentration regions; When the photoelectric layer is in operation to generate multiple charges concentrated in the charge orbitals, the charge concentration region has the largest charge density in the photosensitive structure.

7. The non-contact particulate treatment device according to claim 6, characterized in that, Each of the plurality of transverse track slots and the plurality of longitudinal track slots has two adjacent inner corners and two outer corners located outside the two inner corners; in any one of the plurality of transverse track slots and the plurality of longitudinal track slots, the height position of the two inner corners is different from the height position of the two outer corners.

8. The non-contact particulate treatment device according to claim 1, characterized in that, The photoelectric layer includes a plurality of transistors arranged in a matrix, and the orbital layer includes a plurality of annular segments surrounding the plurality of transistors, with the plurality of annular segments being adjacent to each other and arranged in a matrix, and the top edges of the plurality of annular segments together forming the charge orbital.

9. The non-contact particulate treatment device according to claim 8, characterized in that, Each of the annular segments has a square outer contour, and the center of any four annular segments arranged in a square form a charge concentration region; wherein, when the photoelectric layer is in operation to generate multiple charges concentrated in the charge orbits, the charge concentration region has the maximum charge density in the photosensitive structure.

10. A particle containing device, characterized in that, The particle containing device is used to contain a liquid sample, which includes multiple particles; the containing device includes: The light-sensing structure includes: First substrate; A first electrode layer is formed on the first substrate; A photoelectric layer is formed on the first substrate; and An insulator is formed in the photoelectric layer; wherein the insulator includes charge orbitals protruding from the photoelectric layer; The photoelectric layer is operable to generate multiple charges concentrated in the charge orbitals, such that the charge density of the charge orbitals is greater than the charge density of the outer surface of the photoelectric layer, so that at least one of the particles is positioned thereon by electrostatic adsorption. A mating structure is spaced apart from the photosensitive structure, and at least one of the photosensitive structure and the mating structure is transparent; wherein the mating structure includes a second substrate and a second electrode layer formed on the second substrate, and the second electrode layer faces the photosensitive structure.

11. The particle containing device according to claim 10, characterized in that, The insulator comprises: The substrate layer is embedded within the photoelectric layer; and An orbital layer is connected to the base layer and protrudes from the photoelectric layer, and the charge orbit is formed on the top edge of the orbital layer.

12. The particle containing device according to claim 10, characterized in that, The charge orbital includes: Multiple transverse track slots, each parallel to the first direction; and Multiple longitudinal track slots, each parallel to the second direction, intersect with the multiple transverse track slots; wherein, the multiple overlapping points where the multiple transverse track slots intersect with the multiple longitudinal track slots are each defined as charge concentration regions; When the photoelectric layer is in operation to generate multiple charges concentrated in the charge orbitals, the charge concentration region has the largest charge density in the photosensitive structure.

13. The particle containing device according to claim 11, characterized in that, The photoelectric layer includes a plurality of transistors arranged in a matrix, and the orbital layer includes a plurality of annular segments surrounding the plurality of transistors, with the plurality of annular segments being adjacent to each other and arranged in a matrix, and the top edges of the plurality of annular segments together forming the charge orbital.

14. A photosensitive structure for a non-contact particulate processing device, characterized in that, The photosensitive structure of the non-contact particle processing device includes: First substrate; A first electrode layer is formed on the first substrate; A photoelectric layer is formed on the first substrate; and An insulator is formed in the photoelectric layer; wherein the insulator includes charge orbitals protruding from the photoelectric layer; The photoelectric layer can operate to generate multiple charges concentrated in the charge orbitals, such that the charge density of the charge orbitals is greater than the charge density of the outer surface of the photoelectric layer.

15. The photosensitive structure of the non-contact particle processing device according to claim 14, characterized in that, The photoelectric layer can be used to generate multiple charges concentrated in the charge orbitals by receiving external ambient light.

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